JPH02115562U - - Google Patents
Info
- Publication number
- JPH02115562U JPH02115562U JP2235889U JP2235889U JPH02115562U JP H02115562 U JPH02115562 U JP H02115562U JP 2235889 U JP2235889 U JP 2235889U JP 2235889 U JP2235889 U JP 2235889U JP H02115562 U JPH02115562 U JP H02115562U
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- substrate
- sputtering
- target
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007246 mechanism Effects 0.000 claims description 11
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989022358U JPH0734922Y2 (ja) | 1989-02-27 | 1989-02-27 | 移動成膜式スパッタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989022358U JPH0734922Y2 (ja) | 1989-02-27 | 1989-02-27 | 移動成膜式スパッタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02115562U true JPH02115562U (US06826419-20041130-M00005.png) | 1990-09-17 |
| JPH0734922Y2 JPH0734922Y2 (ja) | 1995-08-09 |
Family
ID=31240403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989022358U Expired - Lifetime JPH0734922Y2 (ja) | 1989-02-27 | 1989-02-27 | 移動成膜式スパッタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0734922Y2 (US06826419-20041130-M00005.png) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014221926A (ja) * | 2013-05-13 | 2014-11-27 | 島津エミット株式会社 | 成膜装置 |
| WO2023054044A1 (ja) * | 2021-09-28 | 2023-04-06 | 芝浦機械株式会社 | 表面処理装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09209127A (ja) * | 1996-02-05 | 1997-08-12 | Idemitsu Kosan Co Ltd | 真空蒸着装置およびその真空蒸着装置を用いた有機エレクトロルミネッセンス素子の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0194454U (US06826419-20041130-M00005.png) * | 1987-12-10 | 1989-06-21 |
-
1989
- 1989-02-27 JP JP1989022358U patent/JPH0734922Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0194454U (US06826419-20041130-M00005.png) * | 1987-12-10 | 1989-06-21 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014221926A (ja) * | 2013-05-13 | 2014-11-27 | 島津エミット株式会社 | 成膜装置 |
| WO2023054044A1 (ja) * | 2021-09-28 | 2023-04-06 | 芝浦機械株式会社 | 表面処理装置 |
| TWI831391B (zh) * | 2021-09-28 | 2024-02-01 | 日商芝浦機械股份有限公司 | 表面處理裝置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0734922Y2 (ja) | 1995-08-09 |
