JPH02105305A - Double azimuth magnetic head - Google Patents
Double azimuth magnetic headInfo
- Publication number
- JPH02105305A JPH02105305A JP25748988A JP25748988A JPH02105305A JP H02105305 A JPH02105305 A JP H02105305A JP 25748988 A JP25748988 A JP 25748988A JP 25748988 A JP25748988 A JP 25748988A JP H02105305 A JPH02105305 A JP H02105305A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- head
- double azimuth
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 76
- 239000010409 thin film Substances 0.000 claims abstract description 42
- 239000010408 film Substances 0.000 claims abstract description 22
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000004804 winding Methods 0.000 abstract description 7
- 230000005294 ferromagnetic effect Effects 0.000 abstract description 6
- 229910000702 sendust Inorganic materials 0.000 abstract description 6
- 238000005530 etching Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 4
- 238000000992 sputter etching Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000005236 sound signal Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
本発明は2つのギャップが所定の間隔を有し、互いに逆
方向に傾斜したギャップをもつダブルアジマス磁気ヘッ
ドに関する。DETAILED DESCRIPTION OF THE INVENTION (A) Field of Industrial Application The present invention relates to a double azimuth magnetic head in which two gaps have a predetermined distance and are inclined in opposite directions.
(ロ)従来の技術
近年、VTR(ビデオテープレコーダ)では、スロー、
スチル再生等の特殊再生時における画質の劣化を防止す
るために特開昭60−70511号公N (Gl I
B5153)等に開示されているようなダブルアジマス
磁気ヘッドが用いられている。第1O図は従来のダブル
アジマス磁気ヘッドの要部斜視図、第11図は上記磁気
ヘッドをテープ摺接面側から観た図である。(b) Conventional technology In recent years, VTRs (video tape recorders) have been
In order to prevent deterioration of image quality during special playback such as still playback, Japanese Patent Application Laid-open No. 60-70511 (Gl I
A double azimuth magnetic head such as that disclosed in B5153) is used. FIG. 1O is a perspective view of essential parts of a conventional double azimuth magnetic head, and FIG. 11 is a view of the magnetic head viewed from the tape sliding surface side.
図中、(1)(2)は夫々へラドベース(3)に装着さ
れるヘッドチップで、各々の作動ギャップ(4)(5)
は互いに+α、−αの逆のアジマス角を有している。前
記へラドチップ(1)(2ユ)は夫々、センダストより
なる主コア(6)(7)と、該主コア(6)(7)を挟
持する補強コア(8)(9)(10)(11)とから成
る。尚、(12)(13)は巻線溝、(14)(15)
(1,6)(17)は巻線である。In the figure, (1) and (2) are the head chips attached to the helad base (3), respectively, and the respective operating gaps (4) and (5)
have opposite azimuth angles of +α and −α. The Herad chips (1) (2 units) each include main cores (6) (7) made of sendust, and reinforcing cores (8) (9) (10) (2) that sandwich the main cores (6) (7). 11). In addition, (12) and (13) are winding grooves, (14) and (15)
(1,6)(17) are windings.
しかし乍ら、上記構造のダブルアジマス磁気ヘッドでは
、各ヘッドチップ仕ハ又)が夫々独立してヘッドベース
(3)に取付けられているので、前記へッドチップロ〕
信」間の距離eを所定寸法通りにすることが困難であり
、また、前記各ヘッドチノブロ〕信」のへ7ドベース(
3)に対する突出量に段差が生じ、テープの安定走行が
妨げられ、信頼性の低下を招いた。However, in the double azimuth magnetic head having the above structure, each head chip type is independently attached to the head base (3), so the head chip size is
It is difficult to make the distance e between the two wires as specified, and it is also difficult to adjust the distance e between the
A step difference occurred in the amount of protrusion compared to 3), which hindered stable running of the tape and caused a decrease in reliability.
また、ダブルアジマス磁気ヘッドは一方のへッドチンプ
で 172フイール(1セグメント)の映像信号を記録
再生し、他方のヘッドチップで残りの172フイールド
の映像信号を記録再生する高品位V T Rに用いられ
る。Double azimuth magnetic heads are also used in high-quality VTRs, where one head chip records and plays back 172 fields (1 segment) of video signals, and the other head chip records and plays back the remaining 172 fields of video signals. .
この高品位VTRは第12図に示すように回転シリンダ
(18)の180°対向した位置に第1、第2ダブルア
ジマス磁気ヘツド(19)(20)が取付けられている
。前記第1、第2ダブルアジマス磁気ヘツド(19)(
20)は夫々、ヘッドチップ間のギャップ間距離2が3
,979μmになるようにヘッドベース(21)(22
)に取付られな第1、第2へッドチノプ(23)(24
)(25)(26)からなる。また、前記第1ダブルア
ジマス磁気ヘツド(19)の第1、第2へラドチップ(
23)(24)間には第14図に示すようにトラック段
差t (t=23μm)がある。また、前記第2ダブ
ルアジマス磁気ヘツド(20)の第1、第2へラドチッ
プ(25)(26)間にも同様にトラック段差tがある
。As shown in FIG. 12, this high-quality VTR has first and second double azimuth magnetic heads (19) and (20) mounted at positions 180° opposed to each other on a rotating cylinder (18). The first and second double azimuth magnetic heads (19) (
20) respectively, the gap distance 2 between the head chips is 3.
, 979 μm, head base (21) (22
) The first and second head tinops (23) (24
)(25)(26). Also, the first and second magnetic heads (19) of the first double azimuth magnetic head (19)
As shown in FIG. 14, there is a track step difference t (t=23 μm) between 23 and 24. Similarly, there is a track step difference t between the first and second hard disk chips (25) and (26) of the second double azimuth magnetic head (20).
この高品位VTRでは、回転シリンダ(18)は540
0 rpmと通常の3倍で回転し、1回転当り4本のト
ラックを記録するため、1フレーム当り12本の信号ト
ラックに映像音声信号を記録し解像度を向1−させてい
る。そして、このトラック走査は第13図に示すように
第1ダブルアジマス磁気ヘツド(19)の第1、第2へ
ラドチップ(23)(24)が同時に磁気テープ(31
)の第1、第2トラツク(27)(28)を走査し、こ
の走査が終了すると第2ダブルアジマス磁気ヘツド(2
0)の第1、第2ヘツドチツプ(25)(26)が同時
に第3、第4トラツク(29)(30)を走査する。In this high-quality VTR, the rotating cylinder (18) is 540
Since it rotates at 0 rpm, three times the normal speed, and records four tracks per rotation, video and audio signals are recorded on 12 signal tracks per frame, increasing the resolution. In this track scanning, as shown in FIG.
), and when this scanning is completed, the second double azimuth magnetic head (2
The first and second head chips (25, 26) of 0) simultaneously scan the third and fourth tracks (29, 30).
しかし乍ら、このような高品位VTR用のダブルアジマ
ス磁気ヘッドにおいて、前述と同様にヘッドチップ間の
距離2やトラック段差tが狂ったり、ヘッドチップの突
出量に段差が生じた場合、特殊再生のみならず通常再生
における互換性等の基本性能を低下させてしまう。However, in such a double azimuth magnetic head for high-quality VTRs, if the distance 2 between the head chips or the track step t becomes out of order, or if there is a step in the protrusion amount of the head chips, special playback may occur. In addition, basic performance such as compatibility in normal playback is degraded.
(ハ)発明が解決しようとする課題
本発明は上記従来例の欠点に鑑み為されたものであり、
記録媒体の走行性が悪化するのを防止すると共に第1の
作動ギャップと第2の作動ギャップとの位置関係を高精
度に設定することが出来るダブルアジマス磁気ヘッドを
提供することを目的とするものである。(c) Problems to be Solved by the Invention The present invention has been made in view of the drawbacks of the above-mentioned conventional examples.
An object of the present invention is to provide a double azimuth magnetic head that can prevent the running performance of a recording medium from deteriorating and can set the positional relationship between a first working gap and a second working gap with high precision. It is.
(ニ)課題を解決するための手段
本発明のダブルアジマス磁気ヘッドは、非磁性基板上に
厚膜部と薄膜部とを備える非磁性薄膜を被着し、前記厚
膜部上に第1の作動ギャップを有する第1のヘッド素子
を被着し、前記薄膜部上にアジマス角が前記第1の作動
ギャップと異なる第2の作動ギャップを有する第2のヘ
ッド素子を被着したことを特徴とする。(d) Means for Solving the Problems The double azimuth magnetic head of the present invention has a non-magnetic thin film having a thick film part and a thin film part deposited on a non-magnetic substrate, and a first film on the thick film part. A first head element having an operating gap is attached, and a second head element having a second operating gap having an azimuth angle different from the first operating gap is attached on the thin film portion. do.
更に、本発明のダブルアジマス磁気ヘッドは、前記厚膜
部と前記薄膜部との膜厚差が前記第1の作動ギャップと
前記第2の作動ギャップとのトラック段差に等しいこと
を特徴とする。Furthermore, the double azimuth magnetic head of the present invention is characterized in that the difference in film thickness between the thick film portion and the thin film portion is equal to the track step difference between the first working gap and the second working gap.
(ホ)作用
上記構成に依れば、第1のヘッド素子と第2のヘッド素
子とが非磁性基板上に一体に形成されているので、前記
第1のヘッド素子と前記第2のヘッド素子の媒体側への
突出量には段差は生じない。また、第1の作動ギャップ
と第2の作動ギャップとの相対位置のズレを押さえるこ
とが出来、特に、前記第1の作動ギャップと前記第2の
作動ギヤングとのトラック段差を非磁性薄膜の厚膜部と
薄膜部との膜厚差により高精度に設定することが出来る
。(E) Effect According to the above structure, since the first head element and the second head element are integrally formed on the non-magnetic substrate, the first head element and the second head element There is no step difference in the amount of protrusion toward the medium side. Furthermore, it is possible to suppress the deviation in relative position between the first working gap and the second working gap, and in particular, the track step difference between the first working gap and the second working gap can be reduced by the thickness of the non-magnetic thin film. The difference in film thickness between the film portion and the thin film portion allows highly accurate setting.
(へ)実施例
以下、図面を参照しつつ本発明の一実施例を詳細に説明
する。(F) Embodiment Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.
第1図は本実施例のダブルアジマス磁気ヘッドの外観を
示す斜視図、第2図は上記磁気ヘッドをテープ摺接面側
から観た図である。FIG. 1 is a perspective view showing the external appearance of the double azimuth magnetic head of this embodiment, and FIG. 2 is a view of the magnetic head viewed from the tape sliding surface side.
第1図中、(31)は厚さ約Q、3mmの非磁性基板で
あり、該非磁性基板(31)上にはTi等よりなる非磁
性薄膜(32)が被着形成されている。前記非磁性薄膜
(32)は厚さ25μmの厚膜部(32a)と厚さ21
tmの薄膜部(32b)とからなる。前記厚膜部(32
a) −、)、にはセンダスト等の強磁性金属薄膜より
なる第1、第2磁性コア(33)(34)間に−αのア
ジマス角を有する第1の作動ギャップ(35)を備える
第1のヘッド素子(45)が形成されている。前記薄膜
部(32b) 、1−にはセンダスト等の強磁性金属薄
膜よりなる第3、第4磁性コア(36)(37)間に十
αのアジマス角を有する第2の作動ギャップ(38)を
備える第2のヘッド素子(46)が形成されている。(
39)は非磁性基板(31)、非磁性薄膜(32)の厚
膜部(32a)及び第1磁性コア(33)に亘って形成
されているを線孔であり、該巻線孔(39)の前記第1
磁性コア(33)領域での上端が前記第1の作動ギャッ
プ(35)のギヤ/プ深さを規定する。また、(40)
は非磁性基板(31)、非磁性薄膜(32)の薄膜部(
32b)及び第3磁性コア(36)に亘って形成されて
いる巻線孔であり、該巻線孔(40)の前記第3磁性コ
ア(36)領域での上端が前記第2の作動ギャップ(3
8)のギャップ深さを規定する。第2図に示すように前
記第1の作動ギャップ(35)と前記第2の作動ギャッ
プ(38)とのギャップ間距離はl、トラック段差はt
であり、このギヤツブ間段差tは前記非磁性薄膜(32
)の厚膜部(32a)と薄膜部(32b)との膜厚差に
等しい
次に、上記ダブルアジマス磁気ヘッドの製造方法につい
て説明する。In FIG. 1, (31) is a nonmagnetic substrate with a thickness of about Q, 3 mm, and a nonmagnetic thin film (32) made of Ti or the like is deposited on the nonmagnetic substrate (31). The non-magnetic thin film (32) has a thick film part (32a) with a thickness of 25 μm and a thick film part (32a) with a thickness of 21 μm.
tm thin film portion (32b). The thick film portion (32
a) -, ), a first working gap (35) having an azimuth angle of -α between the first and second magnetic cores (33, 34) made of a ferromagnetic metal thin film such as Sendust; One head element (45) is formed. The thin film portion (32b), 1- has a second working gap (38) having an azimuth angle of ten α between the third and fourth magnetic cores (36, 37) made of a ferromagnetic metal thin film such as sendust. A second head element (46) is formed. (
39) is a wire hole formed across the non-magnetic substrate (31), the thick film portion (32a) of the non-magnetic thin film (32), and the first magnetic core (33); ) of said first
The upper end in the area of the magnetic core (33) defines the gear depth of said first working gap (35). Also, (40)
are the thin film portions of the nonmagnetic substrate (31) and the nonmagnetic thin film (32).
32b) and a third magnetic core (36), and the upper end of the winding hole (40) in the third magnetic core (36) region is the second working gap. (3
8) Specify the gap depth. As shown in FIG. 2, the gap distance between the first working gap (35) and the second working gap (38) is l, and the track level difference is t.
The step t between the gears is the non-magnetic thin film (32
) is equal to the difference in film thickness between the thick film portion (32a) and the thin film portion (32b).Next, a method for manufacturing the double azimuth magnetic head will be described.
先ず、第3図に示すように巻線孔となる貫通孔(長辺的
350μm、短辺的150μm) (44a)(41b
)を備える厚さ約0.3μmの非磁性基板(31)」二
にTi等の非磁性薄膜(32)を蒸着又はスパッタリン
グ等により被着形成する。前記非磁性薄膜(32)の膜
厚は所望のトラック幅(本実施例では20μm)より大
きい。First, as shown in Fig. 3, through holes (350 μm on the long side, 150 μm on the short side) (44a) (41b) are made to become the winding holes.
) A nonmagnetic thin film (32) of Ti or the like is deposited on a nonmagnetic substrate (31) with a thickness of about 0.3 μm by vapor deposition or sputtering. The thickness of the non-magnetic thin film (32) is larger than the desired track width (20 μm in this example).
次に、前記非磁性薄膜(32)のうち、一方の貫通孔(
41b)が形成されている半分の領域にイオンミリング
等のエツチングを施して、第4図に示すように前記非磁
性薄膜(32)を前記両頁通孔(41a)(41b)の
中央部で厚膜部(32a)と薄膜部(32b)とに分断
する。尚、前記厚膜部(32a)と前記薄膜部(32b
)との膜厚の差が所望のトラック段差(実施例では23
It m )になるようにエツチング量は調整されて
いる。Next, one of the through holes (
41b) is formed by etching such as ion milling, and as shown in FIG. It is divided into a thick film part (32a) and a thin film part (32b). Note that the thick film part (32a) and the thin film part (32b
) is the desired track step difference (23 in the example).
The etching amount is adjusted so that It m ).
次に、第5図に示すように前記非磁性薄膜(32)ト、
にトラック幅に相当する厚さの第1の磁性薄膜(42)
をスパッタリング等により被着形成する。前記第1の磁
性薄膜(42)はセンダスト、Co系アモルファス合金
等よりなる2〜7μm厚の強磁性金属薄膜を810.
等よりなる約0.1 μm厚の非磁性薄膜で絶縁する
積層構造である。Next, as shown in FIG. 5, the non-magnetic thin film (32) is
a first magnetic thin film (42) with a thickness corresponding to the track width;
is deposited by sputtering or the like. The first magnetic thin film (42) is a 2-7 μm thick ferromagnetic metal thin film made of sendust, Co-based amorphous alloy, etc.
It has a laminated structure insulated by a non-magnetic thin film approximately 0.1 μm thick.
次に、第6図に示すように前記第1の磁性薄膜(42)
のうち貫通孔(41a)(41b)を含む両性側の部分
をイオンミリング等のエツチングにより除去して第2、
第4磁性コア(34)(37)を形成し、その後、該第
2、第4磁性コア(34)(37)の外側端面にダイヤ
モンドバイト等の切削加工を施すことによりギャップ形
成面(43)(44)を形成する。前記ギャップ形成面
(43)(44)は夫々前記非磁性基板(31)の法線
方向に対して所定のアジマス角−α、+α(実施例では
a=15°)だけ傾斜している。Next, as shown in FIG. 6, the first magnetic thin film (42)
Among them, the portions on the bisexual side including the through holes (41a) and (41b) are removed by etching such as ion milling, and the second
A gap forming surface (43) is formed by forming a fourth magnetic core (34) (37), and then cutting the outer end surfaces of the second and fourth magnetic cores (34) (37) with a diamond cutting tool or the like. (44) is formed. The gap forming surfaces (43) and (44) are inclined by predetermined azimuth angles -α and +α (a=15° in the embodiment) with respect to the normal direction of the nonmagnetic substrate (31), respectively.
次に、前記ギャップ形成面(43)(44)上にSiO
等のギャップスペーサを0.2〜0.3μm厚スパッタ
リング等により被着形成し、その後前記非磁性基板(3
1)上全域に第2の磁性薄膜をスパッタリング等により
被着した後、前記第2、第4磁性コア(34)(37)
上に被着した余分な第2の磁性薄膜をエツチング等によ
り除去して第7図に示すように第1、第3磁性コア(3
3)(36)を形成する。前記第2の磁性薄膜は前記第
1の磁性薄膜(42)と同様に強磁性金属薄膜と非磁性
薄膜との積層構造である。(35)(38)は前記ギャ
ップスペーサにより形成される第1、第2の作動ギャッ
プである。その後、前記第1、第2、第3、第4磁性コ
ア(33)(34)(36)(37)(7)うち、前記
貫通孔(41a)(41b)の周りをイオンミリング等
のエツチングにより除去して巻線孔(39)(40)を
形成し、前記第1、第2の作動ギャップ(35)(38
)のギャップ深さを規定する。Next, on the gap forming surfaces (43) (44), SiO
A gap spacer of 0.2 to 0.3 μm thick is formed by sputtering or the like, and then the non-magnetic substrate (3
1) After depositing a second magnetic thin film over the entire upper area by sputtering or the like, the second and fourth magnetic cores (34) (37)
The excess second magnetic thin film deposited thereon is removed by etching or the like, and the first and third magnetic cores (3) are removed as shown in FIG.
3) Form (36). Like the first magnetic thin film (42), the second magnetic thin film has a laminated structure of a ferromagnetic metal thin film and a nonmagnetic thin film. (35) and (38) are first and second working gaps formed by the gap spacers. Thereafter, etching such as ion milling is performed around the through holes (41a) (41b) among the first, second, third, and fourth magnetic cores (33) (34) (36) (37) (7). to form the winding holes (39) and (40), and the first and second working gaps (35) and (38)
) defines the gap depth.
そして最後に、前記第1、第2、第3、第4磁性コア(
33)(34)(36)(37)上にアルミナ等の非磁
性材料よりなる厚さ40〜50μmの保護膜(図示せず
)を高速スパッタリング等により被着し、その後テープ
摺接側の端面にR付加工を行い、巻線溝(39)(40
)に巻線を施して第1図に示す本実施例のダブルアジマ
ス磁気ヘッドが完成する。And finally, the first, second, third, and fourth magnetic cores (
33) A protective film (not shown) made of a non-magnetic material such as alumina with a thickness of 40 to 50 μm is deposited on (34) (36) (37) by high-speed sputtering, etc., and then the end surface on the tape sliding contact side is coated. The winding grooves (39) (40
) is wound to complete the double azimuth magnetic head of this embodiment shown in FIG.
」二連のようなダブルアジマス磁気ヘッドでは、第1の
作動ギャップ(35)を有する第1のヘッド素子(並)
と第2の作動ギャップ(38)を有する第2のヘッド素
子(46)とが同一の非磁性基板(31)上に一体に形
成されているので、前記第1のヘッド素子(45)のテ
ープ摺接部と前記第2のヘッド素子(46)のテープ摺
接部との突出量は均一であり、テープの走行性は悪化し
ない。また、上記構造のダブルアジマス磁気ヘッドでは
、前記第1、第2の作動ギャップ(35)(38)間の
距離!は第6図のエツチング工程により規定され、前記
第1、第2の作動ギャップ(35)(38)間のトラッ
ク段差tは第4図のエツチング量により規定されるので
、前記第1、第2の作動ギャップ(35)(38)間の
距離!及びトラック段差tを高精度に設定出来る。この
ため、この磁気ヘッドを高品位VTR装置に用いた場合
、通常再生における画質及び互換性の低下を防止出来る
。In a double azimuth magnetic head such as a duplex, a first head element (normal) having a first working gap (35)
and a second head element (46) having a second working gap (38) are integrally formed on the same non-magnetic substrate (31), so that the tape of the first head element (45) The amount of protrusion between the sliding contact portion and the tape sliding contact portion of the second head element (46) is uniform, and the running performance of the tape is not deteriorated. Furthermore, in the double azimuth magnetic head having the above structure, the distance between the first and second working gaps (35) and (38)! is defined by the etching process shown in FIG. 6, and the track step difference t between the first and second working gaps (35) and (38) is defined by the etching amount shown in FIG. The distance between the working gaps (35) and (38)! And the track step difference t can be set with high precision. Therefore, when this magnetic head is used in a high-quality VTR device, it is possible to prevent deterioration in image quality and compatibility during normal playback.
第8図は他の実施例のダブルアジマス磁気ヘッドの斜視
図であり、第1図と同一部分には同一符号を付しである
。第9図はテープ摺接面の要部を示す図である。FIG. 8 is a perspective view of a double azimuth magnetic head according to another embodiment, in which the same parts as in FIG. 1 are given the same reference numerals. FIG. 9 is a diagram showing the main parts of the tape sliding surface.
この実施例のダブルアジマス磁気ヘッドでは第2磁性コ
ア(34)と第4磁性コア(37)とは段差部(47)
で分断されており、第1のヘッド素子(45)と第2の
ヘッド素子(46)との間のタロストークは防止される
。この磁気ヘッドは、上述の第7図に示す工程で、第1
、第3磁性コア(33)(36)を形成した後、1fi
i記段差部(47)に被着している磁性薄膜をイオンミ
リング等のエツチングにより除去して非磁性溝III(
32)を露出させ、その後保護膜を被着することにより
形成される。In the double azimuth magnetic head of this embodiment, the second magnetic core (34) and the fourth magnetic core (37) have a stepped portion (47).
Since the first head element (45) and the second head element (46) are separated from each other, Talostalk between the first head element (45) and the second head element (46) is prevented. This magnetic head is manufactured in the step shown in FIG.
, after forming the third magnetic core (33) (36), 1fi
The magnetic thin film adhering to the stepped portion (47) is removed by etching such as ion milling to form the non-magnetic groove III (
32) is exposed and then a protective film is applied.
(ト)発明の効果
本発明に依れば、テープ走行を安定させると共に第1の
作動ギャップと第2の作動ギャップの位装
置ズレを防止したダブルアジマス磁気ヘッドを提供し得
る。(G) Effects of the Invention According to the present invention, it is possible to provide a double azimuth magnetic head that stabilizes tape running and prevents device misalignment between the first working gap and the second working gap.
第1図乃至第9図は本発明に係り、第1図はダブルアジ
マス磁気ヘッドの外観を示す斜視図、第2図はダブルア
ジマス磁気ヘッドのテープ摺接面を示す図、第3図、第
4図、第5図、第6図及び第7図は夫々ダブルアジマス
磁気ヘッドの製造方法を示す図、第8図は他の実施例の
ダブルアジマス磁気ヘッドの外観を示す斜視図、第9図
は他の実施例のダブルアジマス磁気ヘッドのテープ摺接
面の要部を示す図である。第10図は従来のダブルアジ
マス磁気ヘッドの要部斜視図、第11図はL記グブルア
ジマス磁気ヘッドをテープ摺接面側から観た図、第12
図は回転シリンダを示す図、第13図は走査トラックを
示す図、第14図はへラドチップの段差を示す図である
。1 to 9 relate to the present invention; FIG. 1 is a perspective view showing the external appearance of a double azimuth magnetic head, FIG. 2 is a view showing the tape sliding surface of the double azimuth magnetic head, FIGS. 4, 5, 6, and 7 are diagrams showing a method of manufacturing a double azimuth magnetic head, respectively. FIG. 8 is a perspective view showing the external appearance of a double azimuth magnetic head of another embodiment, and FIG. 9. FIG. 3 is a diagram showing a main part of a tape sliding surface of a double azimuth magnetic head according to another embodiment. Fig. 10 is a perspective view of the main parts of a conventional double azimuth magnetic head, Fig. 11 is a view of the L double azimuth magnetic head viewed from the tape sliding surface side, Fig. 12
13 is a diagram showing a rotating cylinder, FIG. 13 is a diagram showing a scanning track, and FIG. 14 is a diagram showing a step difference in a Herad tip.
Claims (2)
薄膜を被着し、前記厚膜部上に第1の作動ギャップを有
する第1のヘッド素子を被着し、前記薄膜部上にアジマ
ス角が前記第1の作動ギャップと異なる第2の作動ギャ
ップを有する第2のヘッド素子を被着したことを特徴と
するダブルアジマス磁気ヘッド。(1) A nonmagnetic thin film having a thick film part and a thin film part is deposited on a nonmagnetic substrate, a first head element having a first working gap is deposited on the thick film part, and the thin film 1. A double azimuth magnetic head, comprising: a second head element having a second working gap having an azimuth angle different from the first working gap;
作動ギャップと前記第2の作動ギャップとのトラック段
差に等しいことを特徴とする請求項(1)記載のダブル
アジマス磁気ヘッド。(2) The double azimuth according to claim (1), wherein the difference in film thickness between the thick film part and the thin film part is equal to the track step difference between the first working gap and the second working gap. magnetic head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25748988A JPH02105305A (en) | 1988-10-13 | 1988-10-13 | Double azimuth magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP25748988A JPH02105305A (en) | 1988-10-13 | 1988-10-13 | Double azimuth magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02105305A true JPH02105305A (en) | 1990-04-17 |
Family
ID=17307000
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP25748988A Pending JPH02105305A (en) | 1988-10-13 | 1988-10-13 | Double azimuth magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02105305A (en) |
-
1988
- 1988-10-13 JP JP25748988A patent/JPH02105305A/en active Pending
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