JPH02104633U - - Google Patents

Info

Publication number

JPH02104633U

JPH02104633U JP1312189U JP1312189U JPH02104633U JP H02104633 U JPH02104633 U JP H02104633U JP 1312189 U JP1312189 U JP 1312189U JP 1312189 U JP1312189 U JP 1312189U JP H02104633 U JPH02104633 U JP H02104633U

Authority

JP

Japan

Prior art keywords

semiconductor wafer

nozzles

drying

air gas

item

Prior art date

1989-02-08

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 239000004065 semiconductor Substances 0.000 claims description 18
• 238000001035 drying Methods 0.000 claims description 14
• 238000002347 injection Methods 0.000 claims description 4
• 239000007924 injection Substances 0.000 claims description 4
• 239000007789 gas Substances 0.000 claims 3
• IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 1
• 238000004140 cleaning Methods 0.000 claims 1
• 229910001873 dinitrogen Inorganic materials 0.000 claims 1
• 238000010586 diagram Methods 0.000 description 4
• 238000005507 spraying Methods 0.000 description 1