JPH02102729A - Continuous treating apparatus for particles constituted of fluidized bed and moving bed - Google Patents

Abstract

PURPOSE:To cause a reaction in a fluidized bed in high yield by installing a moving bed for causing heat exchange between gas discharged from the fluidized bed and a material to be treated to above the fluidized bed and providing dispersing plates to a bottom of a moving bed. CONSTITUTION:Particles 2 of a material to be treated are fed from a top of an apparatus, and a fluidized bed 4 is formed by blowing fluidizing gas upwards from a bottom of the apparatus. Thus, the particles are treated in the fluidized bed 4. Also, a moving bed 3 for causing heat exchange between gas discharged from the fluidized bed 4 and the material 2 to be treated is installed to above the fluidized bed 4, and dispersing plates 8 are provided to the bottom of the moving bed 3. Thus, the gas discharged from the fluidized bed 4 is dispersed to pass through the moving bed 3 to enable to make the temp. in the moving bed uniform, causing sufficient heat exchange with the material fed from the top of the moving bed. Moreover, since the particles fed to the moving bed are heated already, a reaction is caused in the fluidized bed in high yield.

Description

Detailed Description of the Invention (Field of Industrial Application) The present invention aims to recover heat from gas discharged from the device in a continuous particle processing device having a fluidized bed, thereby improving the thermal efficiency inside the device. This invention relates to continuous processing equipment.

(Prior art and problems to be solved) In a continuous processing device for powder or particles, powder or particles to be processed are supplied from the top of the device, fluidized gas is blown up from the bottom of the device, and then supplied from the top. Continuously processing the powder or particles in a fluidized bed, in which the powder or particles are suspended, ensures that the powder or particles in the fluidized bed are uniformly dispersed, and that the temperature within the bed is uniform. It is widely used in various fields because it has various advantages such as: However, on the other hand, the temperature of the fluidized bed of this continuous processing equipment and the outlet temperature of the discharged gas are almost unchanged, which means that the thermal efficiency within the continuous processing equipment is reduced due to heat loss accompanying the outflowing gas. It means that. In order to improve this point, a moving bed is provided above the fluidized bed, the material to be treated is supplied from the top of the moving bed, and the gas discharged from the fluidized bed and the material to be processed are heat exchanged inside the moving bed, resulting in thermal efficiency. Attempts are being made to improve. However, although the thermal efficiency can be improved to some extent by providing a moving bed above the fluidized bed, the current situation is that satisfactory results cannot be obtained because the gas flowing out of the fluidized bed blows through the center of the moving bed. be.

Therefore, the inventors of the present invention have completed the present invention as a result of various studies to prevent such phenomena and further improve thermal efficiency. An object of the present invention is to provide a continuous particle processing device comprising a moving bed and a fluidized bed for recovery.

(Means for Solving the Problems) In other words, the gist of the present invention is to supply particles, which are objects to be treated, from the upper end of the device, blow fluidizing gas up from the lower end of the device to form a fluidized bed, and In a continuous particle processing device that processes particles in a bed, a moving bed is provided above the fluidized bed to perform heat exchange between the gas discharged from the fluidized bed and the object to be processed, and a dispersion plate is provided below the moving bed. This is a continuous particle processing device characterized by:

Furthermore, the present invention will be explained in detail.

The continuous particle processing apparatus having a fluidized bed in the present invention may be any conventionally used reaction apparatus of this type, and the sizes of the fluidized bed and moving bed are determined according to the size of the particles to be treated. It varies depending on the type of treatment reaction and is determined as appropriate depending on the purpose.

The fluidizing gas used for fluidization in the present invention can be either an inert gas or a reactive gas, such as air, N, gas, CO2 gas, H2
Gas, natural gas, etc. are used. The flow rate of the fluidizing gas is determined by the particle size and density of the particles to be treated, and the physical properties of the fluidizing gas.

In addition, the pore size of the gas distribution plate used at the bottom of the moving bed is smaller than the particle size of the particles to be treated, so that the particles to be treated do not become clogged, and the aperture ratio is determined to be sufficient to allow gas to pass through. be done.

The arrangement of the dispersion plates is not limited to arranging them below the moving layer, but may also be stacked in multiple stages below the moving layer.

The drawings will be explained. In FIG. 3, particles of the material to be treated are fed from a raw material supply hopper to a supply port 1 at the top of the reactor by a screw feeder. The charged particles 2 fall under their own weight in the moving bed 3 and reach the fluidized bed 4 . On the other hand, the dispersion plate 8' is connected to the gas inlet 5 at the bottom of the reactor.
A fluidizing gas is introduced through the moving bed 3 to fluidize the particles 2 descending within the moving bed 3 to form a fluidized bed 4. In the fluidized bed 4, a heating device 6 is installed to heat the fluidized bed, and while fluidizing the particles with a fluidizing gas, a reaction gas is introduced to treat the object to be treated, and then the obtained reaction product is fluidized. The reaction product is lowered through the bed and discharged from the take-out lower part at the bottom of the reactor.

By the way, in the present invention, a dispersion plate 8 is installed below the moving bed 3 in such a reaction apparatus, and the outline thereof will be explained in Part 1.
Figure 1 shows a dispersion plate 8 at the bottom of the moving layer 3.
is provided, and the particles 2 are supplied to the fluidized bed 4 from the nozzle 9. FIG. 2 shows a structure in which dispersion plates 8 are stacked in multiple stages in a cone shape within the moving layer 3. Note that the method of installing the dispersion plate in the moving layer can be freely changed as long as the object to be treated and the gas are in countercurrent contact and heat exchange is performed.

Examples of reactions that can be carried out using the continuous processing apparatus of the present invention include the production of metal carbide by reacting metal oxide particles with carbon, the production of reduced iron from iron ore, and the production of quicklime from limestone.

(Function) In the present invention, a dispersion plate is provided below the moving bed in a continuous particle processing apparatus having a fluidized bed and a moving bed. To disperse within.

It is possible to prevent the so-called blow-through phenomenon that occurs in the prior art.

(Example) Next, the present invention will be described in more detail with reference to Examples.

Example 1 Silica particles (average particle size: 300 μm) were introduced into the upper part of the moving bed at a rate of 60 g per minute, and the particles were spread over the gas dispersion plate for about 2 to 30 μm.
After being moved to a thickness of 1 and preheated, it was inserted into the fluidized bed through a nozzle at the bottom of the moving bed. The fluidized bed has a static bed height of approximately 0.3
m, air at 800° C. was used as the fluidizing gas, and the superficial gas velocity was set at 30 cm/sec.

The apparatus has a structure similar to that shown in FIG. 2, the inner diameter of the fluidized bed is 74+ mm, the inner diameter of the moving bed is 170 am, and the moving bed has an aperture ratio of 1% and a pore diameter of 0.2 mm. The gas dispersion plates 8 (2) are provided in three stages.

The temperature of the gas discharged from the upper part of this device was approximately 80° C., and it was confirmed that the heat recovery efficiency was extremely high.

Comparative Example 1 The same process as in Example 1 was carried out using an apparatus having a structure similar to that shown in FIG. 3 and without a gas dispersion plate inside the moving layer. Ta. however,
The height of the moving layer in this case was set to about 10 cm.

The temperature of the gas discharged from the top of this device is approximately 400°C.
Therefore, the heat recovery efficiency was extremely low.

(Effects) In the present invention, in a continuous particle processing apparatus having a fluidized bed and a moving bed, a dispersion plate is provided below the moving bed, and by providing the dispersion plate, gas flowing out from the fluidized bed is dispersed and the moving bed is The temperature inside the moving bed can be made uniform, and the particles can be sufficiently exchanged with the workpiece supplied from the upper part of the moving bed, and the particles supplied to the moving bed are already heated. Therefore, the reaction can be carried out in a high yield in a fluidized bed.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing one embodiment of a continuous processing apparatus according to the present invention, and FIG. 2 is an explanatory diagram showing another embodiment. FIG. 3 is an explanatory diagram of a conventional particle continuous processing apparatus having a fluidized bed and a moving bed. 61 Raw material supply port 2 Particles 3 Moving bed 4 Fluidized bed 5 Fluidizing gas inlet 6 Heating device 7 Output port 8 Dispersion plate 9 Nozzle

Claims (1)

[Claims] In a continuous particle processing device, particles to be treated are supplied from the top of the device, fluidizing gas is blown up from the bottom of the device to form a fluidized bed, and the particles are processed in the fluidized bed. 1. An apparatus for continuous particle processing, characterized in that a moving bed is provided for heat exchange between the discharged gas and the object to be processed, and a dispersion plate is provided below the moving bed.