JPH02102729A - Continuous treating apparatus for particles constituted of fluidized bed and moving bed - Google Patents
Continuous treating apparatus for particles constituted of fluidized bed and moving bedInfo
- Publication number
- JPH02102729A JPH02102729A JP25491188A JP25491188A JPH02102729A JP H02102729 A JPH02102729 A JP H02102729A JP 25491188 A JP25491188 A JP 25491188A JP 25491188 A JP25491188 A JP 25491188A JP H02102729 A JPH02102729 A JP H02102729A
- Authority
- JP
- Japan
- Prior art keywords
- fluidized bed
- bed
- moving bed
- particles
- moving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 title claims abstract description 40
- 239000006185 dispersion Substances 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 7
- 238000007664 blowing Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 29
- 239000000843 powder Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 235000019738 Limestone Nutrition 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 235000012255 calcium oxide Nutrition 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000006028 limestone Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
- B01J8/1836—Heating and cooling the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
- B01J8/087—Heating or cooling the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
- B01J8/12—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles moved by gravity in a downward flow
- B01J8/125—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles moved by gravity in a downward flow with multiple sections one above the other separated by distribution aids, e.g. reaction and regeneration sections
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、流動層を有する粒子の連続処理装置において
、装置より排出されるガスの熱回収をはかり、装置内部
の熱効率を向上させた粒子の連続処理装置に関する。Detailed Description of the Invention (Field of Industrial Application) The present invention aims to recover heat from gas discharged from the device in a continuous particle processing device having a fluidized bed, thereby improving the thermal efficiency inside the device. This invention relates to continuous processing equipment.
(従来の技術及び解決すべき課題)
粉体若しくは粒子の連続処理装置において、装置の上部
より被処理体である粉体若しくは粒子を供給し、装置の
下部より流動ガスを吹き上げて、上部より供給された粉
体若しくは粒子を浮遊懸濁の状態である流動層として粉
体若しくは粒子を連続処理することは、流動層中の粉体
若しくは粒子が均一に分散され、また、層内の温度が均
一となる等の種々の利点を有することから、様々な分野
で広く利用されている。しかし、他方、この連続処理装
置の流動層の温度と排出されるガスの出口温度が殆ど変
わらず、このことは、流出ガスに伴う熱の損失によって
連続処理装置内での熱効率が低下していることを意味す
る。この点を改良するため、流動層の上部に移動層を設
け、被処理物は移動層上部より供給され、流動層を排出
するガスと被処理物とを移動層内部において熱交換を行
ない、熱効率を向上させる試みがなされている。しかし
、流動層の上部に移動層を設けることによって成る程度
熱効率は向上するが、流動層より流出するガスは移動層
の中心部を吹き抜けるために満足すべき結果が得られな
いというのが現状である。(Prior art and problems to be solved) In a continuous processing device for powder or particles, powder or particles to be processed are supplied from the top of the device, fluidized gas is blown up from the bottom of the device, and then supplied from the top. Continuously processing the powder or particles in a fluidized bed, in which the powder or particles are suspended, ensures that the powder or particles in the fluidized bed are uniformly dispersed, and that the temperature within the bed is uniform. It is widely used in various fields because it has various advantages such as: However, on the other hand, the temperature of the fluidized bed of this continuous processing equipment and the outlet temperature of the discharged gas are almost unchanged, which means that the thermal efficiency within the continuous processing equipment is reduced due to heat loss accompanying the outflowing gas. It means that. In order to improve this point, a moving bed is provided above the fluidized bed, the material to be treated is supplied from the top of the moving bed, and the gas discharged from the fluidized bed and the material to be processed are heat exchanged inside the moving bed, resulting in thermal efficiency. Attempts are being made to improve. However, although the thermal efficiency can be improved to some extent by providing a moving bed above the fluidized bed, the current situation is that satisfactory results cannot be obtained because the gas flowing out of the fluidized bed blows through the center of the moving bed. be.
そこで、本発明者等は、このような現象を防止し、熱効
率を更に向上させるために種々検討した結果1本発明を
完成するに至ったもので、本発明の目的は、排出するガ
スの熱回収をはかった移動層と流動層とからなる粒子の
連続処理装置を提供するにある。Therefore, the inventors of the present invention have completed the present invention as a result of various studies to prevent such phenomena and further improve thermal efficiency. An object of the present invention is to provide a continuous particle processing device comprising a moving bed and a fluidized bed for recovery.
(課題を解決するための手段)
すなわち1本発明の要旨は、装置上端部より被処理物で
ある粒子を供給し、装置下端部より流動化ガスを吹上げ
て流動層を形成し、該流動層において粒子を処理する粒
子の連続処理装置において、流動層上部に流動層を排出
したガスと被処理物との熱交換を行なわせる移動層を設
けると共に、移動層下部に分散板を設けたことを特徴と
する粒子の連続処理装置である。(Means for Solving the Problems) In other words, the gist of the present invention is to supply particles, which are objects to be treated, from the upper end of the device, blow fluidizing gas up from the lower end of the device to form a fluidized bed, and In a continuous particle processing device that processes particles in a bed, a moving bed is provided above the fluidized bed to perform heat exchange between the gas discharged from the fluidized bed and the object to be processed, and a dispersion plate is provided below the moving bed. This is a continuous particle processing device characterized by:
更に、本発明について詳細に説明する。Furthermore, the present invention will be explained in detail.
本発明における流動層を有する粒子の連続処理装置とし
ては、従来よりこの種の反応装置として使用されている
ものはいずれでもよく、流動層、及び移動層の大きさは
処理される粒子の大きさ及び処理反応の種類によって異
なり、目的に応じて適宜決定される。The continuous particle processing apparatus having a fluidized bed in the present invention may be any conventionally used reaction apparatus of this type, and the sizes of the fluidized bed and moving bed are determined according to the size of the particles to be treated. It varies depending on the type of treatment reaction and is determined as appropriate depending on the purpose.
本発明において流動化に使用する流動ガスは、反応に対
して不活性なガスあるいは反応ガスの何れをも使用する
ことができ、例えば空気、N、ガス、C02ガス、H2
ガス、天然ガス等が使用される。流動ガスの流速は、被
処理物である粒子の粒径、密度および流動ガスの物性に
よって決定される。The fluidizing gas used for fluidization in the present invention can be either an inert gas or a reactive gas, such as air, N, gas, CO2 gas, H2
Gas, natural gas, etc. are used. The flow rate of the fluidizing gas is determined by the particle size and density of the particles to be treated, and the physical properties of the fluidizing gas.
また、移動層下部に使用されるガス分散板の孔径は被処
理物である粒子の粒径より小さくて被処理物が詰まらな
い程度であり、その開口率はガスを充分に通せる程度に
決定される。In addition, the pore size of the gas distribution plate used at the bottom of the moving bed is smaller than the particle size of the particles to be treated, so that the particles to be treated do not become clogged, and the aperture ratio is determined to be sufficient to allow gas to pass through. be done.
分散板の配列の仕方としては移動層下部に配置するだけ
に止まらず、移動層内の下方に多段に積み重ねてもよい
。The arrangement of the dispersion plates is not limited to arranging them below the moving layer, but may also be stacked in multiple stages below the moving layer.
図面について説明する。第3図において、被処理物の粒
子は原料供給ホッパーよりスクリューフィーダーにより
反応装置上部の供給口1に投入される。投入された粒子
2は移動層3内を自重降下して流動層4に至らせる。他
方、反応装置の下部にあるガス導入口5より分散板8′
を通して流動化ガスを導入し、移動層3内を降下してい
る粒子2を流動化させて、流動層4を形成する。流動層
4では、加熱装置6を設は流動層を加熱し、流動化ガス
により粒子を流動化させながら反応ガスを導入して被処
理物の処理を行ない、次いで得られた反応生成物を流動
層中を降下させ、反応装置下部の取出ロアより反応生成
物を排出させるのである。The drawings will be explained. In FIG. 3, particles of the material to be treated are fed from a raw material supply hopper to a supply port 1 at the top of the reactor by a screw feeder. The charged particles 2 fall under their own weight in the moving bed 3 and reach the fluidized bed 4 . On the other hand, the dispersion plate 8' is connected to the gas inlet 5 at the bottom of the reactor.
A fluidizing gas is introduced through the moving bed 3 to fluidize the particles 2 descending within the moving bed 3 to form a fluidized bed 4. In the fluidized bed 4, a heating device 6 is installed to heat the fluidized bed, and while fluidizing the particles with a fluidizing gas, a reaction gas is introduced to treat the object to be treated, and then the obtained reaction product is fluidized. The reaction product is lowered through the bed and discharged from the take-out lower part at the bottom of the reactor.
ところで、本発明ではこのような反応装置において移動
層3下部に分散板8を設置するもので、その概要を第1
図及び第2図に示す、第1図は移動層3下部に分散板8
を設け、ノズル9から粒子2を流動層4に供給するもの
である。第2図は、移動層3内に分散板8をコーン型に
多段に積み重ねたものである。なお、分散板の移動層に
おける設置方法は被処理物とガスとが向流接触して熱交
換が行なわれる範囲において自由に変更しうる。By the way, in the present invention, a dispersion plate 8 is installed below the moving bed 3 in such a reaction apparatus, and the outline thereof will be explained in Part 1.
Figure 1 shows a dispersion plate 8 at the bottom of the moving layer 3.
is provided, and the particles 2 are supplied to the fluidized bed 4 from the nozzle 9. FIG. 2 shows a structure in which dispersion plates 8 are stacked in multiple stages in a cone shape within the moving layer 3. Note that the method of installing the dispersion plate in the moving layer can be freely changed as long as the object to be treated and the gas are in countercurrent contact and heat exchange is performed.
本発明の連続処理装置で実施出来る反応例としては、金
属酸化物粒子に炭素を反応させた金属炭化物の製造、鉄
鋼石より還元鉄の製法、石灰石より生石灰の製法等であ
る。Examples of reactions that can be carried out using the continuous processing apparatus of the present invention include the production of metal carbide by reacting metal oxide particles with carbon, the production of reduced iron from iron ore, and the production of quicklime from limestone.
(作 用)
本発明では流動層及び移動層を有する粒子の連続処理装
置において、移動層下部に分散板を設けたもので、この
分散板の作用によって、移動層を通過する流出ガスは移
動層内を分散するために。(Function) In the present invention, a dispersion plate is provided below the moving bed in a continuous particle processing apparatus having a fluidized bed and a moving bed. To disperse within.
従来のような所謂吹き抜けの現象を防止することができ
る。It is possible to prevent the so-called blow-through phenomenon that occurs in the prior art.
(実施例)
次に、実施例をもって、更に具体的に本発明を説明する
。(Example) Next, the present invention will be described in more detail with reference to Examples.
実施例1
シリカ粒子(平均粒径300μ園)を移動層の上部へ毎
分60gの割合で投入し、ガス分散板上を約2〜30I
lの厚さで移動させて予熱した後、移動層下部のノズル
より、流動層へ挿入した。流動層は静止層高を約0.3
mとし、流動化ガスは800℃の空気を使用して、空塔
基準ガス速度30cm/secに設定した。Example 1 Silica particles (average particle size: 300 μm) were introduced into the upper part of the moving bed at a rate of 60 g per minute, and the particles were spread over the gas dispersion plate for about 2 to 30 μm.
After being moved to a thickness of 1 and preheated, it was inserted into the fluidized bed through a nozzle at the bottom of the moving bed. The fluidized bed has a static bed height of approximately 0.3
m, air at 800° C. was used as the fluidizing gas, and the superficial gas velocity was set at 30 cm/sec.
装置は、第2図に示したものと同様の構造であって、流
動層の内径は74+mm、移動層の内径は170amで
、移動層内には開口率は1%、孔径が0.2鳳■のガス
分散板8が3段階に設けられている。The apparatus has a structure similar to that shown in FIG. 2, the inner diameter of the fluidized bed is 74+ mm, the inner diameter of the moving bed is 170 am, and the moving bed has an aperture ratio of 1% and a pore diameter of 0.2 mm. The gas dispersion plates 8 (2) are provided in three stages.
この装置の上部から排出されるガスの温度は約80℃で
あり、極めて熱回収効率が高いことが確認された。The temperature of the gas discharged from the upper part of this device was approximately 80° C., and it was confirmed that the heat recovery efficiency was extremely high.
比較例1
実施例1と同様であるが、第3図に示したものと同様の
構造であって、移動層内部にガス分散板が設けられてい
ない装置を使用して、同様の処理を行なった。ただし、
この場合の移動層の高さは約10c履に設定した。Comparative Example 1 The same process as in Example 1 was carried out using an apparatus having a structure similar to that shown in FIG. 3 and without a gas dispersion plate inside the moving layer. Ta. however,
The height of the moving layer in this case was set to about 10 cm.
この装置の上部から排出されるガスの温度は約400℃
であり、熱回収効率が極めて低かった。The temperature of the gas discharged from the top of this device is approximately 400°C.
Therefore, the heat recovery efficiency was extremely low.
(効 果)
本発明では流動層及び移動層を有する粒子の連続処理装
置において、移動層下部に分散板を設け、分散板を設け
ることによって、流動層より流出するガスを分散させて
移動層を通過させ移動層内の温度を均一にすることがで
き、移動層上部より供給される被処理物と十分に熱交換
を行なうことができると共に、移動層に供給される粒子
は既に加熱されているので流動層内では高収率で反応を
行なうことができる。(Effects) In the present invention, in a continuous particle processing apparatus having a fluidized bed and a moving bed, a dispersion plate is provided below the moving bed, and by providing the dispersion plate, gas flowing out from the fluidized bed is dispersed and the moving bed is The temperature inside the moving bed can be made uniform, and the particles can be sufficiently exchanged with the workpiece supplied from the upper part of the moving bed, and the particles supplied to the moving bed are already heated. Therefore, the reaction can be carried out in a high yield in a fluidized bed.
第1図は本発明に係る連続処理装置の一実施例を示す説
明図、第2図は他の実施例を示す説明図である。第3図
は従来の流動層及び移動層を有する粒子の連続処理装置
の説明図である61 原料供給口 2 粒子
3 移動層 4 流動層
5 流動化ガス導入口 6 加熱装置
7 取り出し口 8 分散板
9 ノズルFIG. 1 is an explanatory diagram showing one embodiment of a continuous processing apparatus according to the present invention, and FIG. 2 is an explanatory diagram showing another embodiment. FIG. 3 is an explanatory diagram of a conventional particle continuous processing apparatus having a fluidized bed and a moving bed. 61 Raw material supply port 2 Particles 3 Moving bed 4 Fluidized bed 5 Fluidizing gas inlet 6 Heating device 7 Output port 8 Dispersion plate 9 Nozzle
Claims (1)
り流動化ガスを吹上げて流動層を形成し、該流動層にお
いて粒子を処理する粒子の連続処理装置において、流動
層上方に流動層を排出したガスと被処理物との熱交換を
行なわせる移動層を設けると共に、移動層下部に分散板
を設けたことを特徴とする粒子の連続処理装置。In a continuous particle processing device, particles to be treated are supplied from the top of the device, fluidizing gas is blown up from the bottom of the device to form a fluidized bed, and the particles are processed in the fluidized bed. 1. An apparatus for continuous particle processing, characterized in that a moving bed is provided for heat exchange between the discharged gas and the object to be processed, and a dispersion plate is provided below the moving bed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63254911A JP2694541B2 (en) | 1988-10-12 | 1988-10-12 | Continuous particle treatment equipment consisting of fluidized bed and moving bed |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63254911A JP2694541B2 (en) | 1988-10-12 | 1988-10-12 | Continuous particle treatment equipment consisting of fluidized bed and moving bed |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02102729A true JPH02102729A (en) | 1990-04-16 |
JP2694541B2 JP2694541B2 (en) | 1997-12-24 |
Family
ID=17271562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63254911A Expired - Lifetime JP2694541B2 (en) | 1988-10-12 | 1988-10-12 | Continuous particle treatment equipment consisting of fluidized bed and moving bed |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2694541B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020118482A1 (en) * | 2018-12-10 | 2020-06-18 | 储晞 | Reaction device for preparing particles and method for preparing particles |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4813628U (en) * | 1971-06-29 | 1973-02-15 | ||
JPS50302U (en) * | 1973-04-27 | 1975-01-06 |
-
1988
- 1988-10-12 JP JP63254911A patent/JP2694541B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4813628U (en) * | 1971-06-29 | 1973-02-15 | ||
JPS50302U (en) * | 1973-04-27 | 1975-01-06 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020118482A1 (en) * | 2018-12-10 | 2020-06-18 | 储晞 | Reaction device for preparing particles and method for preparing particles |
Also Published As
Publication number | Publication date |
---|---|
JP2694541B2 (en) | 1997-12-24 |
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