JPH02102720U - - Google Patents
Info
- Publication number
- JPH02102720U JPH02102720U JP989889U JP989889U JPH02102720U JP H02102720 U JPH02102720 U JP H02102720U JP 989889 U JP989889 U JP 989889U JP 989889 U JP989889 U JP 989889U JP H02102720 U JPH02102720 U JP H02102720U
- Authority
- JP
- Japan
- Prior art keywords
- detection device
- pattern
- optical system
- pattern detection
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 9
- 230000003287 optical effect Effects 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Spectrometry And Color Measurement (AREA)
Description
第１図は本案の一実施例の概略図、第２図は公
知のパターン検出装置の概略図、第３図は投影レ
ンズの色収差を示す概念図である。
１……レテイクル、２……投影レンズ、３……
ウエハ、３′……ウエハ上の位置合せ用パターン
、４……ウエハステージ、５……結像光学系、６
……波長選択ミラー、７，７′……２次結像光学
系、８……スリツト板、９……スリツト、１０…
…光検出器。
FIG. 1 is a schematic diagram of an embodiment of the present invention, FIG. 2 is a schematic diagram of a known pattern detection device, and FIG. 3 is a conceptual diagram showing chromatic aberration of a projection lens. 1... Reticle, 2... Projection lens, 3...
Wafer, 3'... alignment pattern on wafer, 4... wafer stage, 5... imaging optical system, 6
...Wavelength selection mirror, 7, 7'...Secondary imaging optical system, 8...Slit plate, 9...Slit, 10...
...photodetector.
Claims (1)
へ転写すると共に、被露光体に設けた位置合せ用
ターゲツトパターンを上記投影レンズを介し、複
数種の波長の光を用いて検出するパターン検出装
置を有する光露光装置で、前述のパターン検出装
置内に波長選択ミラーと、各々の波長の光により
結像される上記ターゲツトマークの各々の結像位
置に対応した光学系を設け、各々光検出器を配備
することにより複数の波長による検出を同時に検
出できる事を特徴とするパターン検出装置。 ２ 請求項１において、前記各々の光検出器が結
像を走査するためのスリツト板を共有し、かつ前
記スリツト板には、各々の光学系に応じたスリツ
トが設けられていて、スリツト板を１回動作させ
ることにより同時に各々の検出器の検出が実行さ
れることを特徴とするパターン検出装置。[Claims for Utility Model Registration] 1. An original pattern is transferred to an exposed object through a projection lens, and a target pattern for alignment provided on the exposed object is emitted with light of multiple wavelengths through the projection lens. A light exposure apparatus having a pattern detection device for detection using a pattern detection device, which includes a wavelength selection mirror in the pattern detection device, and an optical system corresponding to each image formation position of the target mark imaged by light of each wavelength. What is claimed is: 1. A pattern detection device characterized in that it is capable of simultaneously detecting detection using a plurality of wavelengths by providing a photodetector for each. 2. In claim 1, each of the photodetectors shares a slit plate for scanning an image, and the slit plate is provided with a slit corresponding to each optical system, and the slit plate is provided with a slit corresponding to each optical system. A pattern detection device characterized in that detection by each detector is executed simultaneously by operating the device once.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP989889U JPH02102720U (en) | 1989-02-01 | 1989-02-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP989889U JPH02102720U (en) | 1989-02-01 | 1989-02-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02102720U true JPH02102720U (en) | 1990-08-15 |
Family
ID=31217049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP989889U Pending JPH02102720U (en) | 1989-02-01 | 1989-02-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02102720U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05175096A (en) * | 1991-12-26 | 1993-07-13 | Hitachi Ltd | Optical projection exposure device |
-
1989
- 1989-02-01 JP JP989889U patent/JPH02102720U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05175096A (en) * | 1991-12-26 | 1993-07-13 | Hitachi Ltd | Optical projection exposure device |
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