JPH0199662A - Dip coating device - Google Patents

Dip coating device

Info

Publication number
JPH0199662A
JPH0199662A JP25606987A JP25606987A JPH0199662A JP H0199662 A JPH0199662 A JP H0199662A JP 25606987 A JP25606987 A JP 25606987A JP 25606987 A JP25606987 A JP 25606987A JP H0199662 A JPH0199662 A JP H0199662A
Authority
JP
Japan
Prior art keywords
substrate
coated
pulled
soln
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25606987A
Other languages
Japanese (ja)
Inventor
Takashi Kanagawa
尚 神奈川
Shinichi Nomura
晋一 野村
Fumiyuki Suda
文之 須田
Yoichi Fukuda
洋一 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
Original Assignee
Stanley Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanley Electric Co Ltd filed Critical Stanley Electric Co Ltd
Priority to JP25606987A priority Critical patent/JPH0199662A/en
Publication of JPH0199662A publication Critical patent/JPH0199662A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0525Coating methods

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To prevent the generation of bubbles at the time of puling up a substrate to be coated from a soln. tank and to remarkably reduce the coating film defects by providing a piston mechanism to a substrate holder, and increasing the internal volume of the substrate when pulled up. CONSTITUTION:The cylindrical substrate 1 to be coated closed on one end is held by a holding part 2 and dipped in the coating soln. 9 in the soln. tank 8 to form a coating film on the outer periphery. In that case, a recess 5 for a cylinder is provided on the lower surface of the holder 2 to be fitted in the substrate 1. A piston 6 acting to increase the content volume of the substrate 1 when pulled up is inserted into the recess 5, and connected to a supporting rod 4 for vertical movement. As a result, since the internal volume of the substrate is increased when the substrate is pulled up from the soln. tank, the generation of bubbles can be prevented at this time, and the coating film defects can be remarkably reduced.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、筒状の被塗布基体、例えば電子写真複写機の
感光体の外周面に塗膜を形成する浸漬塗布装置に関する
ものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a dip coating device for forming a coating film on the outer peripheral surface of a cylindrical substrate to be coated, such as a photoreceptor of an electrophotographic copying machine.

〔従来の技術〕[Conventional technology]

電子写真複写機の感光体など、少なくとも一端が密閉さ
れている円筒状被塗布基体の外周面に塗膜を形成するに
は、例えば第6図に示すように被塗布基体21を支持部
乙により支持し、これを液槽乙の塗布液翼内に徐々に降
下させて第7図のように全体を浸漬した後、第8図のよ
うに引き上げている。
In order to form a coating film on the outer circumferential surface of a cylindrical substrate to be coated, which has at least one end sealed, such as a photoconductor of an electrophotographic copying machine, the substrate to be coated 21 is moved by a support part A as shown in FIG. 6, for example. After supporting it and gradually lowering it into the coating liquid blade of the liquid tank B and immersing it as a whole as shown in FIG. 7, it is pulled up as shown in FIG.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

このようにして被塗布基体21の外周面に塗膜を形成し
ているが、被塗布基体21を液槽おより引き上げる際、
被塗布基体21の内側空間に存在する空気5が気圧変化
に伴って膨張し、第8図のように被塗布基体21の下端
から気泡26が出て、被塗布基体21外周面に沿って浮
上し、その一部が付着するため、塗膜欠陥が生じる。
In this way, a coating film is formed on the outer peripheral surface of the substrate 21 to be coated, but when the substrate 21 to be coated is pulled up from the liquid tank,
The air 5 existing in the inner space of the substrate to be coated 21 expands as the atmospheric pressure changes, and air bubbles 26 come out from the lower end of the substrate to be coated 21 as shown in FIG. However, some of it adheres, causing coating defects.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、一端が密閉されている筒状被塗布基体を支持
部により支持し、液槽の塗布液に浸漬してその外周面に
塗膜を形成する浸漬塗布装置において、前記被塗布基体
に嵌合する支持具の下面側にシリンダーとしての凹部を
設け、この凹部に被塗布基体の引き上げ時に内部容積を
増加させるように動作するピストンを嵌入して、これを
上下動用の支持棒に連結したことを特徴とするものであ
る。
The present invention provides a dip coating apparatus in which a cylindrical substrate to be coated with one end sealed is supported by a support part, and is immersed in a coating liquid in a liquid tank to form a coating film on the outer peripheral surface of the substrate. A recessed part as a cylinder was provided on the lower surface side of the support to be fitted, a piston that operated to increase the internal volume when the substrate to be coated was pulled up was inserted into this recessed part, and this was connected to a support rod for vertical movement. It is characterized by this.

〔実施例〕〔Example〕

以下、本発明を図示の実施例に基づいて詳細に説明する
Hereinafter, the present invention will be explained in detail based on illustrated embodiments.

第1図〜第5図は本発明の一実施例を示すもので、円筒
状の被塗布基体1に支持具2をQ IJソングを介して
嵌合させ、これに支持棒4を連結している。支持具2に
はシリンダーとしての凹部5をその下面側に設け、これ
にピストン6を挿入して取付ねじ7により前記支持棒4
の先端部に固定している。これにより、被塗布基体lを
液槽8の塗布液9に浸漬する際、その下降時には第2図
のようにピストン6が支持具2の下面側に位置し、上昇
時(引き上げ時)には第3図のように凹部5の底面(図
示上側)に位置するようにしている。つまり、浸漬時(
下降時)には被塗布基体1の内側空間の容積が小さくな
り、引き上げ時にはピストン5のストロークの分だけ内
容積が大きくなるようにしている。
1 to 5 show an embodiment of the present invention, in which a support 2 is fitted onto a cylindrical substrate 1 to be coated via a QIJ song, and a support rod 4 is connected to this. There is. The support 2 is provided with a recess 5 serving as a cylinder on its lower surface, a piston 6 is inserted into the recess 5, and the support rod 4 is secured by a mounting screw 7.
It is fixed to the tip of the As a result, when the substrate 1 to be coated is immersed in the coating liquid 9 in the liquid tank 8, the piston 6 is located on the lower surface side of the support 2 as shown in FIG. 2 when it is lowered, and when it is raised (raised) As shown in FIG. 3, it is located at the bottom surface (upper side in the figure) of the recess 5. In other words, during immersion (
The volume of the inner space of the substrate 1 to be coated decreases when the substrate 1 is lowered, and the inner volume increases by the stroke of the piston 5 when the substrate 1 is pulled up.

このような構造とすると、第4図のように支持棒4を下
降させて被塗布基体1を液槽8の塗布液9内にその全体
が浸たるようにした後、支持棒4を引き上げた場合、ま
ずピストン6が一定のストロークスライドしてから被塗
布基体1が引き上げられるようになり(第5図)、基体
1の下端部の液面11は基体1内となって、引き上げの
際の気圧変化に伴って内部空気12に膨張が生じても、
気泡の発生が防止される。即ち、塗膜欠陥の発生が抑制
される。
With this structure, as shown in FIG. 4, the support rod 4 is lowered so that the substrate 1 to be coated is completely immersed in the coating liquid 9 in the liquid tank 8, and then the support rod 4 is pulled up. In this case, first, the piston 6 slides a certain stroke and then the substrate 1 to be coated is lifted up (Fig. 5), and the liquid level 11 at the lower end of the substrate 1 becomes inside the substrate 1, and when it is pulled up. Even if the internal air 12 expands due to changes in atmospheric pressure,
Generation of air bubbles is prevented. That is, the occurrence of coating film defects is suppressed.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明によれば、基体支持具にピストン機
構を設け、引き上げ時に基体内側の容積を増加させるよ
うにしたので、被塗布基体を液槽より引き上げる際に気
泡の発生を防止できるようになり、塗膜欠陥を大幅に減
少させることができる。
As described above, according to the present invention, the piston mechanism is provided in the substrate support to increase the volume inside the substrate when it is pulled up, so that it is possible to prevent the generation of air bubbles when lifting the substrate to be coated from the liquid tank. This can significantly reduce coating film defects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る浸漬塗布装置の一実施例を示す断
面図、第2図及び第3図は同実施例における被塗布基体
と支持具部分の連結状態を示す拡大断面図、第4図及び
第5図は同実施例による浸漬塗布状況を示す断面図−第
6図〜第8図は従来例を示す断面図である。 l・・・・・・被塗布基体、  2・・・・・・支持具
、3・・・・・・0リング    4・・・・・・支持
棒、5・・・・・・凹部、      6・・・・・・
ピストン、8・・・・・・液槽、     9・・・・
・・塗布液。 特許出願人  スタンレー電気株式会社第1図
FIG. 1 is a sectional view showing an embodiment of the dip coating apparatus according to the present invention, FIGS. 5 and 5 are cross-sectional views showing the state of dip coating according to the same embodiment, and FIGS. 6 to 8 are cross-sectional views showing the conventional example. l...Substrate to be coated, 2...Support, 3...0 ring 4...Support rod, 5...Recess, 6・・・・・・
Piston, 8...Liquid tank, 9...
...Coating liquid. Patent applicant: Stanley Electric Co., Ltd. Figure 1

Claims (1)

【特許請求の範囲】[Claims] 一端が密閉されている筒状被塗布基体を支持部により支
持し、液槽の塗布液に浸漬してその外周面に塗膜を形成
する浸漬塗布装置において、前記被塗布基体に嵌合する
支持具の下面側にシリンダーとしての凹部を設け、この
凹部に被塗布基体の引き上げ時に内部容積を増加させる
ように動作するピストンを嵌入して、これを上下動用の
支持棒に連結したことを特徴とする浸漬塗布装置。
In a dip coating apparatus in which a cylindrical substrate to be coated, which is sealed at one end, is supported by a support part and immersed in a coating liquid in a liquid tank to form a coating film on the outer peripheral surface thereof, the support is fitted to the substrate to be coated. A recess as a cylinder is provided on the lower surface of the tool, a piston that operates to increase the internal volume when the substrate to be coated is pulled up is inserted into the recess, and the piston is connected to a support rod for vertical movement. Dip coating equipment.
JP25606987A 1987-10-09 1987-10-09 Dip coating device Pending JPH0199662A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25606987A JPH0199662A (en) 1987-10-09 1987-10-09 Dip coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25606987A JPH0199662A (en) 1987-10-09 1987-10-09 Dip coating device

Publications (1)

Publication Number Publication Date
JPH0199662A true JPH0199662A (en) 1989-04-18

Family

ID=17287468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25606987A Pending JPH0199662A (en) 1987-10-09 1987-10-09 Dip coating device

Country Status (1)

Country Link
JP (1) JPH0199662A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103771720A (en) * 2014-02-27 2014-05-07 青岛众瑞智能仪器有限公司 Large-sized automatic-feeding pulling film coating device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594468A (en) * 1982-07-01 1984-01-11 Mitsubishi Chem Ind Ltd Device for holding and immersing cylindrical body in liquid
JPS6265763A (en) * 1985-09-18 1987-03-25 Canon Inc Coater

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS594468A (en) * 1982-07-01 1984-01-11 Mitsubishi Chem Ind Ltd Device for holding and immersing cylindrical body in liquid
JPS6265763A (en) * 1985-09-18 1987-03-25 Canon Inc Coater

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103771720A (en) * 2014-02-27 2014-05-07 青岛众瑞智能仪器有限公司 Large-sized automatic-feeding pulling film coating device

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