JPH0197547U - - Google Patents

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Publication number
JPH0197547U
JPH0197547U JP1987194548U JP19454887U JPH0197547U JP H0197547 U JPH0197547 U JP H0197547U JP 1987194548 U JP1987194548 U JP 1987194548U JP 19454887 U JP19454887 U JP 19454887U JP H0197547 U JPH0197547 U JP H0197547U
Authority
JP
Japan
Prior art keywords
substrate
view
work holder
fitting disk
inner work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1987194548U
Other languages
English (en)
Japanese (ja)
Other versions
JPH058673Y2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19454887U priority Critical patent/JPH058673Y2/ja
Priority to EP88908981A priority patent/EP0336979B1/en
Priority to KR1019890700595A priority patent/KR930003136B1/ko
Priority to US07/368,312 priority patent/US4991542A/en
Priority to PCT/JP1988/001043 priority patent/WO1989003587A1/ja
Publication of JPH0197547U publication Critical patent/JPH0197547U/ja
Application granted granted Critical
Publication of JPH058673Y2 publication Critical patent/JPH058673Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
JP19454887U 1987-10-14 1987-12-22 Expired - Lifetime JPH058673Y2 (enrdf_load_stackoverflow)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP19454887U JPH058673Y2 (enrdf_load_stackoverflow) 1987-12-22 1987-12-22
EP88908981A EP0336979B1 (en) 1987-10-14 1988-10-14 Apparatus for thin film formation by plasma cvd
KR1019890700595A KR930003136B1 (ko) 1987-10-14 1988-10-14 프라즈마 cvd에 의한 박막 형성장치
US07/368,312 US4991542A (en) 1987-10-14 1988-10-14 Method of forming a thin film by plasma CVD and apapratus for forming a thin film
PCT/JP1988/001043 WO1989003587A1 (en) 1987-10-14 1988-10-14 Method and apparatus for thin film formation by plasma cvd

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19454887U JPH058673Y2 (enrdf_load_stackoverflow) 1987-12-22 1987-12-22

Publications (2)

Publication Number Publication Date
JPH0197547U true JPH0197547U (enrdf_load_stackoverflow) 1989-06-29
JPH058673Y2 JPH058673Y2 (enrdf_load_stackoverflow) 1993-03-04

Family

ID=31485274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19454887U Expired - Lifetime JPH058673Y2 (enrdf_load_stackoverflow) 1987-10-14 1987-12-22

Country Status (1)

Country Link
JP (1) JPH058673Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH058673Y2 (enrdf_load_stackoverflow) 1993-03-04

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