JPH0193055U - - Google Patents
Info
- Publication number
- JPH0193055U JPH0193055U JP18768587U JP18768587U JPH0193055U JP H0193055 U JPH0193055 U JP H0193055U JP 18768587 U JP18768587 U JP 18768587U JP 18768587 U JP18768587 U JP 18768587U JP H0193055 U JPH0193055 U JP H0193055U
- Authority
- JP
- Japan
- Prior art keywords
- scatterer
- electron beam
- beam irradiation
- irradiation device
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 claims description 13
- 238000010586 diagram Methods 0.000 description 5
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Radiation-Therapy Devices (AREA)
Description
第1図はこの考案の実施例による電子線照射装
置の電子線平坦化装置を示す概要図、第2図は第
2散乱体の支持構造を示すもので、aは同正面図
、bは同平面図、第3図は装置本体の電子線照射
端面部の断面図、第4図は電子線照射装置の正面
図、第5図は従来装置の電子線平坦化装置を示す
概要図、第6図は第2散乱体の種々の形状を示す
正面図と平面図、第7図は患部に照射された電子
線エネルギの線量分布図、第8図は患部に対する
電子線の散乱説明図である。
1は装置本体、4は第1散乱体、5は第2散乱
体。なお、図中、同一符号は同一、又は相当部分
を示す。
Fig. 1 is a schematic diagram showing an electron beam flattening device of an electron beam irradiation device according to an embodiment of the invention, and Fig. 2 shows a support structure for a second scatterer, where a is a front view of the same and b is a same diagram. 3 is a sectional view of the electron beam irradiation end face of the main body of the device, FIG. 4 is a front view of the electron beam irradiation device, FIG. 5 is a schematic diagram showing a conventional electron beam flattening device, and FIG. The figures are front views and plan views showing various shapes of the second scatterer, FIG. 7 is a dose distribution diagram of the electron beam energy irradiated to the affected area, and FIG. 8 is an explanatory diagram of scattering of the electron beam to the affected area. 1 is the device main body, 4 is a first scatterer, and 5 is a second scatterer. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.
Claims (1)
体と、前記第1散乱体で拡散された線量分布を平
坦化する第2散乱体を有する電子線照射装置にお
いて、装置本体に対し前記第2散乱体を着脱可能
に支持する散乱体支持部を該装置本体に具備した
ことを特徴とする電子線照射装置。 (2) 第2散乱体は円錐形であることを特徴とす
る実用新案登録請求の範囲第(1)項記載の電子線
照射装置。 (3) 第2散乱体は径を異にする円板を同心状に
重ねて構成したことを特徴とする実用新案登録請
求の範囲第(1)項記載の電子線照射装置。 (4) 第2散乱体は径を異にするリングを円心状
に組み合せて構成したことを特徴とする実用新案
登録請求の範囲第(1)項記載の電子線照射装置。[Claims for Utility Model Registration] (1) Electron beam irradiation having a first scatterer that diffuses the dose distribution of the irradiated electron beam and a second scatterer that flattens the dose distribution diffused by the first scatterer. An electron beam irradiation apparatus, characterized in that the apparatus main body is provided with a scatterer support section that supports the second scatterer in a detachable manner with respect to the apparatus main body. (2) The electron beam irradiation device according to claim (1), wherein the second scatterer has a conical shape. (3) The electron beam irradiation device according to claim 1, wherein the second scatterer is constructed by concentrically stacking disks having different diameters. (4) The electron beam irradiation device according to claim 1, wherein the second scatterer is constructed by combining rings having different diameters in a circular shape.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18768587U JPH0193055U (en) | 1987-12-11 | 1987-12-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18768587U JPH0193055U (en) | 1987-12-11 | 1987-12-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0193055U true JPH0193055U (en) | 1989-06-19 |
Family
ID=31478821
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18768587U Pending JPH0193055U (en) | 1987-12-11 | 1987-12-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0193055U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007267904A (en) * | 2006-03-31 | 2007-10-18 | Hitachi Ltd | Particle beam treatment device |
-
1987
- 1987-12-11 JP JP18768587U patent/JPH0193055U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007267904A (en) * | 2006-03-31 | 2007-10-18 | Hitachi Ltd | Particle beam treatment device |