JPH0192127U - - Google Patents
Info
- Publication number
- JPH0192127U JPH0192127U JP18871187U JP18871187U JPH0192127U JP H0192127 U JPH0192127 U JP H0192127U JP 18871187 U JP18871187 U JP 18871187U JP 18871187 U JP18871187 U JP 18871187U JP H0192127 U JPH0192127 U JP H0192127U
- Authority
- JP
- Japan
- Prior art keywords
- cvd apparatus
- low
- pressure cvd
- wafer transfer
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 3
- 239000012495 reaction gas Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 4
- 238000011017 operating method Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18871187U JPH0192127U (de) | 1987-12-10 | 1987-12-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18871187U JPH0192127U (de) | 1987-12-10 | 1987-12-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0192127U true JPH0192127U (de) | 1989-06-16 |
Family
ID=31479785
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18871187U Pending JPH0192127U (de) | 1987-12-10 | 1987-12-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0192127U (de) |
-
1987
- 1987-12-10 JP JP18871187U patent/JPH0192127U/ja active Pending