JPH0188942U - - Google Patents
Info
- Publication number
- JPH0188942U JPH0188942U JP18296587U JP18296587U JPH0188942U JP H0188942 U JPH0188942 U JP H0188942U JP 18296587 U JP18296587 U JP 18296587U JP 18296587 U JP18296587 U JP 18296587U JP H0188942 U JPH0188942 U JP H0188942U
- Authority
- JP
- Japan
- Prior art keywords
- developed
- developing device
- developer
- pouring
- rotated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims 2
- 230000002950 deficient Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18296587U JPH0188942U (enExample) | 1987-12-02 | 1987-12-02 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18296587U JPH0188942U (enExample) | 1987-12-02 | 1987-12-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0188942U true JPH0188942U (enExample) | 1989-06-12 |
Family
ID=31474403
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18296587U Pending JPH0188942U (enExample) | 1987-12-02 | 1987-12-02 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0188942U (enExample) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461867A (en) * | 1977-10-26 | 1979-05-18 | Sony Corp | Production of semiconductor wafer |
| JPS551114A (en) * | 1978-06-19 | 1980-01-07 | Hitachi Ltd | Method and device for washing wafer |
-
1987
- 1987-12-02 JP JP18296587U patent/JPH0188942U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5461867A (en) * | 1977-10-26 | 1979-05-18 | Sony Corp | Production of semiconductor wafer |
| JPS551114A (en) * | 1978-06-19 | 1980-01-07 | Hitachi Ltd | Method and device for washing wafer |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0188942U (enExample) | ||
| JPS6151732U (enExample) | ||
| JPS6384151U (enExample) | ||
| JPS60118162U (ja) | トナ−濃度検知装置 | |
| JPS6378949U (enExample) | ||
| JPS638762U (enExample) | ||
| JPS6212307U (enExample) | ||
| JPS6130463U (ja) | 超音波洗浄機用かご | |
| JPS6268165U (enExample) | ||
| JPS6364032U (enExample) | ||
| JPS5948787U (ja) | プラスチツクケ−ス洗滌機 | |
| JPS6384152U (enExample) | ||
| JPS59138869U (ja) | 電子写真装置の現像ヘツド | |
| JPS6151972U (enExample) | ||
| JPS61128666U (enExample) | ||
| JPH03104728U (enExample) | ||
| JPS61181368U (enExample) | ||
| JPH01177072U (enExample) | ||
| JPS6362840U (enExample) | ||
| JPS6224987U (enExample) | ||
| JPS6235259U (enExample) | ||
| JPS6220692U (enExample) | ||
| JPS6067186U (ja) | 超音波処理槽 | |
| JPS6063842U (ja) | プラテンカバ−のクリ−ニング装置 | |
| JPS59186859U (ja) | 複写機等のトナ−補給ボトル |