JPH0159513B2 - - Google Patents

Info

Publication number
JPH0159513B2
JPH0159513B2 JP3442183A JP3442183A JPH0159513B2 JP H0159513 B2 JPH0159513 B2 JP H0159513B2 JP 3442183 A JP3442183 A JP 3442183A JP 3442183 A JP3442183 A JP 3442183A JP H0159513 B2 JPH0159513 B2 JP H0159513B2
Authority
JP
Japan
Prior art keywords
annular
liquid
gas
seal
trough
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3442183A
Other languages
Japanese (ja)
Other versions
JPS59161677A (en
Inventor
Susumu Kamikawa
Masahiko Kobayashi
Naohiko Ugawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP3442183A priority Critical patent/JPS59161677A/en
Publication of JPS59161677A publication Critical patent/JPS59161677A/en
Publication of JPH0159513B2 publication Critical patent/JPH0159513B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 本発明は、鉱石、コークス等の粒塊物を高温、
低温の高圧ガスによつて加熱、冷却等の処理を行
なう高圧ガスによる粒塊状物処理装置に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for processing granular materials such as ore and coke at high temperatures.
The present invention relates to a high-pressure gas-based granular material processing apparatus that performs heating, cooling, and other treatments using low-temperature high-pressure gas.

前記粒塊状物処理装置は、一般に回転するガス
透過性の環状格子上に粒塊状物を層状に収容し、
高温あるいは低温の高圧ガスを前記粒塊状物に流
通させて熱交換する構造になつており、種々の鉱
石、金属化合物の加熱冷却等の処理、具体的には
ペレツトの焼成、オイルシエールの乾留、焼結材
(コークス等)の冷却等の処理に有効であつて幅
広く実用化されている。
The agglomerate processing device generally accommodates agglomerates in layers on a rotating gas-permeable annular grid,
It has a structure in which high-temperature or low-temperature high-pressure gas is passed through the granular material for heat exchange, and is used for processing such as heating and cooling of various ores and metal compounds, specifically, calcination of pellets, carbonization of oil shale, etc. It is effective in cooling sintered materials (coke, etc.) and has been widely put into practical use.

前記粒塊状物処理装置の従来例を説明すると、
第1図(環状構造体の一部横断部分のみを図示)
に示すように、内側環状部材1と外側環状部材2
およびその間に配設されたガス透過性の環状格子
3とからなり粒塊状物aを収容する環状の回転枠
4、該回転枠4を案内し回転させる環状トラツク
5と車輪6、回転枠4の上側を覆い固定された環
状の上フード7、回転枠4の下側を覆い固定され
た環状の下フード8、上フード7下部の内、外周
縁に設けられシール液イを収容した環状のトラフ
10a,10bおよび回転枠4上部の内、外環状
部材1,2の内、外側に垂設され前記シール液イ
中に没した環状のシール周側面11a,11bと
からなる上部の液シールトラフ機構12、下フー
ド8上部の内、外周縁と回転枠4下部の内、外環
状部材1,2の内、外側間に設けられた環状のト
ラフ13a,13bおよび環状のシール周側面1
4a,14bとからなる下部の液シールトラフ機
構15、および上、下フード7,8に設けたガス
管7a,8b等によつて構成され、処理用のガス
bは、ガス管8aあるいは7a側から高圧にて導
入され環状格子3および層状に堆積された粒塊状
物a中を流通し熱交換により加熱または冷却等の
処理を行なう構造になつており、また、上、下部
の液シールトラフ機構12,15は、トラフ内の
シール液イの水頭によつて高圧の内部ガスを大気
から遮断し、上、下フード7,8内のガス漏洩を
防止する役割をなしている。
A conventional example of the granular material processing device will be explained as follows.
Figure 1 (only a partial cross section of the annular structure is shown)
As shown, an inner annular member 1 and an outer annular member 2
and a gas-permeable annular lattice 3 disposed therebetween, an annular rotating frame 4 for accommodating the granular material a, an annular track 5 and wheels 6 for guiding and rotating the rotating frame 4, An annular upper hood 7 that covers and is fixed to the upper side, an annular lower hood 8 that covers and is fixed to the lower side of the rotating frame 4, and an annular trough that is provided on the inner and outer periphery of the lower part of the upper hood 7 and contains sealing liquid. 10a, 10b, and annular seal circumferential surfaces 11a, 11b that are vertically disposed on the inner and outer sides of the inner and outer annular members 1 and 2 of the upper part of the rotating frame 4 and submerged in the seal liquid. 12. Annular troughs 13a and 13b provided between the upper part of the lower hood 8, the outer peripheral edge and the lower part of the rotating frame 4, the inner and outer parts of the outer annular members 1 and 2, and the annular seal circumferential side surface 1
4a, 14b, and gas pipes 7a, 8b provided in the upper and lower hoods 7, 8. Processing gas b is supplied to the gas pipe 8a or 7a side. The structure is such that the liquid is introduced under high pressure from the annular grid 3 and flows through the granular material a deposited in layers to perform heating or cooling treatment by heat exchange. 12 and 15 serve to block high-pressure internal gas from the atmosphere by the water head of the sealing liquid I in the trough, and to prevent gas leakage in the upper and lower hoods 7 and 8.

しかし、従来の前記高圧ガスによる粒塊状物処
理装置においては、処理対象の粒塊状物の通気性
が極めて悪い場合の処理、ガス温度が高い場合の
処理、ガス流速が速い場合の処理に際し、粒塊状
物の通気抵抗が極めて高くなり上、下フード内の
ガス圧が極めて高圧になるため、図示のような構
造の液シールトラフ機構では実際上前記高ガス圧
に対向し得るシール液水頭を確保できずガス漏洩
を生じ、処理性能の低下、製品の品質劣化、フア
ン動力の増加等をもたらし、有害ガスによる人的
災害の発生などの欠点がある。例えば、オイルシ
エール乾留装置について説明すると、オイルシエ
ールの堆積高さを1mにするとそのシエール性状
によつて圧力損失が800mm水柱圧に達することが
あり、実際上の液シールトラフ機構の高さは、前
記水柱相当のシール液水頭のほかに圧力変動のピ
ーク率を考慮しかつトラフ、シール周側面に余裕
を設けることが必要であつて、前記シール液水頭
即ち必要水頭の約1.5〜2倍大の1200〜1600mmに
達するため、回転枠、車輪等に干渉しないように
して前記液シールトラフ機構の必要高さを確保す
るためには、回転枠、上、下フードの高さを大幅
に高くすることが必要となり、装置が著しく大型
化し大幅なコスト高および動力の増加等となる欠
点がある。
However, in the conventional apparatus for treating granular materials using high-pressure gas, when processing granular materials to be treated when the permeability of the granular material is extremely poor, when the gas temperature is high, or when the gas flow rate is high, Since the ventilation resistance of the lumps becomes extremely high and the gas pressure inside the upper and lower hoods becomes extremely high, the liquid seal trough mechanism with the structure shown in the figure actually secures a seal liquid head that can counter the high gas pressure. However, there are disadvantages such as gas leakage, resulting in decreased processing performance, deterioration of product quality, increased fan power, etc., and the occurrence of human disasters due to harmful gases. For example, regarding an oil siel carbonization device, if the oil siel stack height is 1 m, the pressure loss can reach 800 mm of water column pressure depending on the siel properties, and the actual height of the liquid seal trough mechanism is: In addition to the seal liquid head equivalent to the water column, it is necessary to take into consideration the peak rate of pressure fluctuation and to provide an allowance on the trough and seal circumferential side. Since the height reaches 1200 to 1600 mm, the height of the rotating frame, upper and lower hoods must be significantly increased in order to ensure the required height of the liquid seal trough mechanism without interfering with the rotating frame, wheels, etc. This requires a large amount of equipment, which has disadvantages such as a significant increase in cost and power.

本発明は、従来の高圧ガスによる粒塊状物処理
装置における前記のような欠点を解消するために
開発されたものであつて、内、外側環状部材とそ
の間のガス透過性環状格子とからなり粒塊状物を
収容して回転する環状の回転枠と、該回転枠の
上、下側を覆い固定された環状の上、下フード
と、該上、下フードの下部あるいは上部の内、外
周縁と前記回転枠上、下部の内、外周縁間に設け
た上、下の液シールトラフ機構とを具備し、前記
下フードあるいは上フード側から高圧ガスが供給
される粒塊状物処理装置において、少なくとも高
圧側の前記液シールトラフ機構を、環状トラフ内
に環状仕切板を設けて複数の内、外側環状液室を
設け、前記内、外環状液室のシール液中に没した
内、外シール周側面を有し前記環状仕切板上から
内外側の両シール液面の一部を覆つた密閉ガス室
を前記環状トラフ上に対設した構成にした点に特
徴を有し、液シールトラフ機構を、複数の内、外
側環状液室と環状仕切板上からその内外側の両シ
ール液面を覆つた密閉ガス室を上側に対設した構
成にすることにより、ガスシール性能を高めかつ
小型化し粒塊状物処理性能およびその信頼性を向
上させた高圧ガスによる粒塊状物処理装置を供す
る点にある。
The present invention was developed in order to eliminate the above-mentioned drawbacks in conventional high-pressure gas-based granular material processing equipment, and consists of inner and outer annular members and a gas-permeable annular lattice between them. An annular rotating frame that rotates while accommodating a lump, annular upper and lower hoods that cover and fix the upper and lower sides of the rotating frame, and inner and outer peripheral edges of the lower or upper part of the upper and lower hoods. A granular material processing apparatus comprising upper and lower liquid seal trough mechanisms provided between the upper and lower inner and outer peripheral edges of the rotating frame, and in which high-pressure gas is supplied from the lower hood or upper hood side, at least The liquid seal trough mechanism on the high pressure side is provided with an annular partition plate in the annular trough to provide a plurality of inner and outer annular liquid chambers, and the inner and outer seal peripheries are immersed in the seal liquid of the inner and outer annular liquid chambers. The liquid seal trough mechanism is characterized in that a sealed gas chamber having a side surface and covering a part of both the inner and outer seal liquid surfaces from above the annular partition plate is arranged oppositely on the annular trough. By arranging a plurality of inner and outer annular liquid chambers and a sealed gas chamber on the upper side that covers both the inner and outer sealing liquid surfaces from the annular partition plate, gas sealing performance is improved and the particle size is reduced. The object of the present invention is to provide a particulate matter processing apparatus using high pressure gas, which has improved performance and reliability in treating lump matter.

本発明は、前記の構成になつており、上、下フ
ードの下部あるいは上部の内、外周縁と回転枠
上、下部の内、外周縁間に設けた上、下の液シー
ルトラフ機構において、少なくとも高圧側の液シ
ールトラフ機構を、環状トラフ内に環状仕切板を
設けて複数の内、外側環状液室を設け、前記内、
外環状液室のシール液中に没した内、外シール周
側面を有し前記環状仕切板上から内、外側の両シ
ール液面の一部を覆つた密閉ガス室を前記環状ト
ラフ上に対設した構成にしているので、前記密閉
ガス室内のガス圧によつて内、外側環状液室内の
個々の必要シール液水頭が著しく小さくなり、ガ
スシール性能が大幅に高められ粒塊物処理性能お
よび信頼性が著しく向上されるとともに、液シー
ルトラフ機構の高さが大幅に短縮され装置の小型
化、低コスト化、駆動動力の低減などの経済上の
利点を有する。
The present invention has the above-described structure, and in the upper and lower liquid seal trough mechanisms provided between the lower part or upper part of the upper and lower hoods, the outer peripheral edge and the rotating frame, the inner part of the lower part, and the outer peripheral edge, At least the liquid seal trough mechanism on the high pressure side is provided with an annular partition plate in the annular trough to provide a plurality of inner and outer annular liquid chambers,
A sealed gas chamber having inner and outer seal circumferential surfaces submerged in the seal liquid of the outer annular liquid chamber and covering a portion of both inner and outer seal liquid surfaces from above the annular partition plate is mounted on the annular trough. Because of this structure, the required sealing liquid head in the inner and outer annular liquid chambers is significantly reduced by the gas pressure in the sealed gas chamber, and the gas sealing performance is greatly improved, and the granule processing performance and Reliability is significantly improved, and the height of the liquid seal trough mechanism is significantly shortened, resulting in economic advantages such as miniaturization of the device, cost reduction, and reduction in driving power.

以下、本発明の実施例を図示について説明す
る。第2図に本発明の一実施例を示しており、図
中1は内側環状部材、2は外側環状部材、3はガ
ス透過性の環状格子、1a,2aは環状配置の
内、外側枠材であつて、前記内側環状部材1、外
側環状部材2、その間に配設された環状格子3お
よび内、外側枠材1a,2aによつて粒塊状物a
を層状に収容する回転枠4が構成され、該回転枠
4は内、外側トラツク5と車輪6とによつて案内
され図示外の回転駆動機構によつて回転される構
造になつている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings. FIG. 2 shows an embodiment of the present invention, in which 1 is an inner annular member, 2 is an outer annular member, 3 is a gas permeable annular lattice, and 1a and 2a are outer frame members of the annular arrangement. The inner annular member 1, the outer annular member 2, the annular lattice 3 disposed therebetween, and the inner and outer frame members 1a and 2a allow the granular material a to be
A rotary frame 4 is constructed which houses the rotary frame 4 in layers, and the rotary frame 4 is guided by inner and outer tracks 5 and wheels 6 and rotated by a rotational drive mechanism not shown.

また、図中7は回転枠4の上側を覆つた環状の
上フード、8は回転枠4の下側を覆つた環状の下
フードであつて、上、下フード7,8は、図示の
ように構枠側に支持杆等の手段によつて固定され
高圧の処理用ガスのフードとなつており、高圧ガ
スbの導入あるいは排出用のガス管7a,8aが
設けられている。
Further, in the figure, 7 is an annular upper hood that covers the upper side of the rotating frame 4, and 8 is an annular lower hood that covers the lower side of the rotating frame 4. The upper and lower hoods 7 and 8 are as shown in the figure. It is fixed to the frame side by means such as a support rod and serves as a hood for high-pressure processing gas, and gas pipes 7a and 8a for introducing or discharging high-pressure gas b are provided.

さらに、前記上、下フード7,8の下部あるい
は上部の内、外周縁と前記回転枠4の上、下部の
内、外周縁間には上部液シールトラフ機構20と
下部液シールトラフ機構30が配設されている。
Further, an upper liquid seal trough mechanism 20 and a lower liquid seal trough mechanism 30 are provided between the lower part or the inner outer peripheral edge of the upper part of the upper and lower hoods 7 and 8 and the upper inner and outer peripheral edges of the rotary frame 4. It is arranged.

前記の上部液シールトラフ機構20は、図示の
ように回転枠4における内側環状部材1の内側お
よび外側環状部材2の外側に沿つて環状トラフ2
1a,21bを設け、環状トラフ21a,21b
内の中心線上に環状仕切板22をそれぞれ設けて
シール液イを収容した内、外側環状液室22a,
23a,22b,23bを設けるとともに、上フ
ード7下部の内、外周縁には内外側に適宜間隔を
存してそれぞれ1対の環状の内、外シール周側面
24a,25a,24b,25bを設け、前記各
内、外シール周側面24a,25a,24b,2
5bをそれぞれ対応した前記内、外側環状液室2
2a,23a,22b,23b内の中央部分にか
つシール液イ中に没した構成とし、前記上フード
7の下部および1対の内、外シール周側面24
a,25a,24b,25bによつて、環状仕切
板22,22上から内、外側環状液室22a,2
3a,22b,23bの両シール液イ面の一部を
覆つた密閉ガス室26a,26bを、環状トラフ
21a,21b上に対設した構成になつている。
The upper liquid seal trough mechanism 20 includes an annular trough 2 along the inner side of the inner annular member 1 and the outer side of the outer annular member 2 in the rotating frame 4 as shown in the figure.
1a, 21b are provided, and annular troughs 21a, 21b are provided.
An annular partition plate 22 is provided on the center line of the inner and outer annular liquid chambers 22a, each containing a sealing liquid.
23a, 22b, and 23b are provided, and a pair of annular inner and outer seal circumferential surfaces 24a, 25a, 24b, and 25b are provided on the inner and outer peripheral edges of the lower part of the upper hood 7, respectively, at appropriate intervals on the inner and outer sides. , each of the inner and outer seal peripheral surfaces 24a, 25a, 24b, 2
The inner and outer annular liquid chambers 2 correspond to the inner and outer annular liquid chambers 5b, respectively.
2a, 23a, 22b, 23b, and is submerged in the sealing liquid, and has a lower part of the upper hood 7 and a pair of inner and outer seal circumferential surfaces 24.
a, 25a, 24b, 25b, the inner and outer annular liquid chambers 22a, 2 are connected from above the annular partition plates 22, 22.
Sealed gas chambers 26a, 26b covering a portion of both seal liquid surfaces of seals 3a, 22b, 23b are disposed oppositely on annular troughs 21a, 21b.

前記の下部液シールトラフ機構30は、下フー
ド8の上部側に環状トラフを設け、回転枠4の下
部側に内、外シール周側面を設けている点で前記
上部液シールトラフ機構20と相違している以外
は全く同様な構成になつており、環状トラフ31
a,31b、環状仕切板32、シール液イを収容
した内、外側環状液室32a,33a,32b,
33b、内、外シール周側面34a,35a,3
4b,35b、および密閉ガス室36a,36b
によつて構成されている。
The lower liquid seal trough mechanism 30 is different from the upper liquid seal trough mechanism 20 in that an annular trough is provided on the upper side of the lower hood 8 and inner and outer seal circumferential surfaces are provided on the lower side of the rotating frame 4. It has the same configuration except for the annular trough 31.
a, 31b, annular partition plate 32, inner and outer annular liquid chambers 32a, 33a, 32b containing sealing liquid A,
33b, inner and outer seal peripheral surfaces 34a, 35a, 3
4b, 35b, and sealed gas chambers 36a, 36b
It is composed of.

さらに、前記密閉ガス室26a,26b,36
a,36bには、それぞれ配管41を介しガスボ
ンベ等の加圧装置40に連通されており、前記各
密閉ガス室内を装置内の高圧ガスと大気とのほぼ
中間のガス圧にする構成になつている。
Furthermore, the sealed gas chambers 26a, 26b, 36
A and 36b are each connected to a pressurizing device 40 such as a gas cylinder via piping 41, and each of the sealed gas chambers is configured to have a gas pressure approximately intermediate between the high pressure gas in the device and the atmosphere. There is.

なお、上フード7側には粒塊状物aの供給口部
(図示省略)を設け、また、下フード8側には、
環状格子3の一部を回転させるなどの手段によつ
て落下された処理済の粒塊状物aの取出口部(図
示省略)が設けられている。
A supply port (not shown) for the granular material a is provided on the upper hood 7 side, and a supply port (not shown) is provided on the lower hood 8 side.
An outlet (not shown) is provided for the processed granular material a dropped by rotating a part of the annular lattice 3 or the like.

図示した実施例は、前記のような構成になつて
おり、回転枠4の環状格子3上に図示のように処
理対象の粒塊状物aを層状に堆積して収容し、図
示外の回転駆動機構によつて回転枠4を緩速度で
回転しつつ、かつ、例えば、下フード8のガス管
8a側から高圧の処理用ガスを導入し、その高圧
によつて下フード8側から環状格子3および粒塊
状物a中を流通させて加熱、冷却等の処理を行な
つたのち、同ガスは上フード7を介しガス管7a
から取出される。
The illustrated embodiment has the above-mentioned configuration, and the granular material a to be treated is deposited and accommodated in a layer on the annular lattice 3 of the rotating frame 4 as shown in the figure. While rotating the rotating frame 4 at a slow speed by the mechanism, high-pressure processing gas is introduced from the gas pipe 8a side of the lower hood 8, and the annular lattice 3 is caused to flow from the lower hood 8 side by the high pressure. After the gas is passed through the granular material a and subjected to processing such as heating and cooling, the gas is passed through the upper hood 7 to the gas pipe 7a.
taken from.

前記の使用例の場合は、下フード8内が高圧ガ
スとなり、例えば800mm水柱圧とすれば、下部液
シールトラフ機構30において、密閉ガス室36
a,36b内のガス圧を加圧装置40によつて約
400mm水柱圧にして使用する。この場合内、外側
環状液室32a,32b,33a,33bにおけ
る必要なシール液イ水頭は、前記密閉ガス室36
a,36b内のガス圧によつてそれぞれ約400mm
程度となり従来機構に比べ約1/2で十分なガスシ
ール機能が得られることになり、上部液シールト
ラフ機構20においても同様に、上フード7内の
ガス圧に対応させて密閉ガス室26a,26b内
のガス圧を所定値に確保することによつて同様な
ガスシール機能が得られ、ガスシール性能が大幅
に高められ、粒塊状物aの処理性能、信頼性が著
しく向上される。従つて、本実施例の液シールト
ラフ機構20,30は、前記水頭の減少によつて
大幅に上下高を縮小でき、大幅な装置の小型化、
低コスト化等の経済上の利点が得られる。
In the case of the above usage example, if the inside of the lower hood 8 becomes high-pressure gas, for example, 800 mm of water column pressure, in the lower liquid seal trough mechanism 30, the sealed gas chamber 36
The gas pressure in a and 36b is controlled by the pressurizing device 40 to approximately
Use at 400mm water column pressure. In this case, the necessary seal liquid head in the inner and outer annular liquid chambers 32a, 32b, 33a, 33b is
Approximately 400mm each depending on the gas pressure in a and 36b
This means that a sufficient gas sealing function can be obtained with approximately 1/2 of that of the conventional mechanism. Similarly, in the upper liquid seal trough mechanism 20, the sealed gas chamber 26a, corresponding to the gas pressure in the upper hood 7, A similar gas sealing function can be obtained by ensuring the gas pressure in 26b at a predetermined value, the gas sealing performance is greatly improved, and the processing performance and reliability of the granular material a are significantly improved. Therefore, the liquid seal trough mechanisms 20, 30 of the present embodiment can significantly reduce the vertical height by reducing the water head, resulting in significant device downsizing.
Economic advantages such as cost reduction can be obtained.

なお、前記実施例においては、環状トラフ内に
1個の環状仕切板を設けた場合について説明した
が、2個の環状仕切板を配設して環状トラフ内を
複数の内、中、外の環状液室にしかつ2個の密閉
ガス室を設けることも可能であつて、さらに前記
作用効果を高めることができるとともに、一方の
フード側のガス圧があまり高くならない場合に
は、高圧側(前記説明では下トラフ側)の液シー
ルトラフ機構のみを前記の実施例の構成にするこ
とも可能である。
In the above embodiment, a case was explained in which one annular partition plate was provided inside the annular trough, but two annular partition plates were provided to divide the inside of the annular trough into multiple inner, middle, and outer sections. It is also possible to provide an annular liquid chamber and two sealed gas chambers, which can further enhance the above-mentioned effects, and when the gas pressure on one hood side does not become too high, the high-pressure side (the above-mentioned In the explanation, it is also possible to configure only the liquid seal trough mechanism (on the lower trough side) as in the above embodiment.

以上本発明を実施例について説明したが、勿論
本発明はこのような実施例にだけ局限されるもの
ではなく、本発明の精神を逸脱しない範囲内で種
種の設計の改変を施しうるものである。
Although the present invention has been described above with reference to embodiments, it goes without saying that the present invention is not limited to such embodiments, and that various design modifications can be made without departing from the spirit of the present invention. .

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の粒塊状物処理装置における環状
構造体の一部縦断面図、第2図は本発明の一実施
例を示す環状構造体の一部のみの縦断面図であ
る。 1:内側環状部材、2:外側環状部材、3:環
状格子、4:環状回転枠、7:上フード、8:下
フード、21a,21b,31a,31b:環状
トラフ、22,32:環状仕切枠、22a,22
b,23a,23b,32a,32b,33a,
33b:内、外側環状液室、24a,24b,2
5a,25b,34a,34b,35a,35
b:内、側シール周側面、26a,26b,36
a,36b:密閉ガス室。
FIG. 1 is a partial longitudinal cross-sectional view of an annular structure in a conventional granular material processing apparatus, and FIG. 2 is a longitudinal cross-sectional view of only a portion of the annular structure showing an embodiment of the present invention. 1: Inner annular member, 2: Outer annular member, 3: Annular lattice, 4: Annular rotating frame, 7: Upper hood, 8: Lower hood, 21a, 21b, 31a, 31b: Annular trough, 22, 32: Annular partition Frame, 22a, 22
b, 23a, 23b, 32a, 32b, 33a,
33b: Inner and outer annular liquid chambers, 24a, 24b, 2
5a, 25b, 34a, 34b, 35a, 35
b: Inner, side seal peripheral surface, 26a, 26b, 36
a, 36b: Closed gas chamber.

Claims (1)

【特許請求の範囲】[Claims] 1 内、外側環状部材とその間のガス透過性環状
格子とからなり粒塊状物を収容して回転する環状
の回転枠と、該回転枠の上、下側を覆い固定され
た環状の上、下フードと、該上、下フードの下部
あるいは上部の内、外周縁と前記回転枠上、下部
の内、外周縁間に設けた上、下の液シールトラフ
機構とを具備し、前記下フードあるいは上フード
側から高圧ガスが供給される粒塊状物処理装置に
おいて、少なくとも高圧側の前記液シールトラフ
機構を、環状トラフ内に環状仕切板を設けて複数
の内、外側環状液室を設け、前記内、外環状液室
のシール液中に没した内、外シール周側面を有し
前記環状仕切板上から内、外側の両シール液面の
一部を覆つた密閉ガス室を前記環状トラフ上に対
設した構成にしたことに特徴を有する高圧ガスに
よる粒塊物処理装置。
1. An annular rotating frame consisting of inner and outer annular members and a gas-permeable annular lattice therebetween, which rotates while accommodating granular materials, and annular upper and lower parts that cover the upper and lower sides of the rotating frame and are fixed. hood, and upper and lower liquid seal trough mechanisms provided between the lower part or the inner or outer peripheral edge of the upper part of the upper or lower hood and the inner or outer peripheral edge of the upper or lower part of the rotating frame, In a particulate matter processing apparatus to which high pressure gas is supplied from the upper hood side, at least the liquid seal trough mechanism on the high pressure side is provided with an annular partition plate in the annular trough to provide a plurality of inner and outer annular liquid chambers, and A sealed gas chamber having inner and outer seal circumferential surfaces submerged in the seal liquid of the inner and outer annular liquid chambers and covering a portion of both the inner and outer seal liquid surfaces from above the annular partition plate is provided on the annular trough. A device for processing granular materials using high pressure gas, which is characterized in that it is configured to be installed opposite to the device.
JP3442183A 1983-03-04 1983-03-04 Device for treating granular and massive material by high-pressure gas Granted JPS59161677A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3442183A JPS59161677A (en) 1983-03-04 1983-03-04 Device for treating granular and massive material by high-pressure gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3442183A JPS59161677A (en) 1983-03-04 1983-03-04 Device for treating granular and massive material by high-pressure gas

Publications (2)

Publication Number Publication Date
JPS59161677A JPS59161677A (en) 1984-09-12
JPH0159513B2 true JPH0159513B2 (en) 1989-12-18

Family

ID=12413735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3442183A Granted JPS59161677A (en) 1983-03-04 1983-03-04 Device for treating granular and massive material by high-pressure gas

Country Status (1)

Country Link
JP (1) JPS59161677A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101813421A (en) * 2010-04-29 2010-08-25 中冶长天国际工程有限责任公司 Recirculation cooler and supporting beam thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101387476B (en) * 2008-11-03 2010-08-11 中冶长天国际工程有限责任公司 End sealing body for ring air duct
CN102853679B (en) * 2012-05-18 2015-04-01 中冶华天工程技术有限公司 Water sealing ring cooling machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101813421A (en) * 2010-04-29 2010-08-25 中冶长天国际工程有限责任公司 Recirculation cooler and supporting beam thereof

Also Published As

Publication number Publication date
JPS59161677A (en) 1984-09-12

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