JPH0157338B2 - - Google Patents

Info

Publication number
JPH0157338B2
JPH0157338B2 JP21212582A JP21212582A JPH0157338B2 JP H0157338 B2 JPH0157338 B2 JP H0157338B2 JP 21212582 A JP21212582 A JP 21212582A JP 21212582 A JP21212582 A JP 21212582A JP H0157338 B2 JPH0157338 B2 JP H0157338B2
Authority
JP
Japan
Prior art keywords
base plate
work
light source
light
straight lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21212582A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59102236A (ja
Inventor
Takashi Numakura
Sukeaki Umehara
Yoichi Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YAMATOYA SHOKAI KK
Original Assignee
YAMATOYA SHOKAI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YAMATOYA SHOKAI KK filed Critical YAMATOYA SHOKAI KK
Priority to JP57212125A priority Critical patent/JPS59102236A/ja
Publication of JPS59102236A publication Critical patent/JPS59102236A/ja
Publication of JPH0157338B2 publication Critical patent/JPH0157338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57212125A 1982-12-03 1982-12-03 ライト・テ−ブル Granted JPS59102236A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57212125A JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57212125A JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Publications (2)

Publication Number Publication Date
JPS59102236A JPS59102236A (ja) 1984-06-13
JPH0157338B2 true JPH0157338B2 (cg-RX-API-DMAC7.html) 1989-12-05

Family

ID=16617294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57212125A Granted JPS59102236A (ja) 1982-12-03 1982-12-03 ライト・テ−ブル

Country Status (1)

Country Link
JP (1) JPS59102236A (cg-RX-API-DMAC7.html)

Also Published As

Publication number Publication date
JPS59102236A (ja) 1984-06-13

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