JPH0157338B2 - - Google Patents
Info
- Publication number
- JPH0157338B2 JPH0157338B2 JP21212582A JP21212582A JPH0157338B2 JP H0157338 B2 JPH0157338 B2 JP H0157338B2 JP 21212582 A JP21212582 A JP 21212582A JP 21212582 A JP21212582 A JP 21212582A JP H0157338 B2 JPH0157338 B2 JP H0157338B2
- Authority
- JP
- Japan
- Prior art keywords
- base plate
- work
- light source
- light
- straight lines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 15
- 239000005338 frosted glass Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 3
- 238000004040 coloring Methods 0.000 claims description 2
- 238000010422 painting Methods 0.000 description 6
- 238000007493 shaping process Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 238000002316 cosmetic surgery Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000399 orthopedic effect Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000007591 painting process Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57212125A JPS59102236A (ja) | 1982-12-03 | 1982-12-03 | ライト・テ−ブル |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57212125A JPS59102236A (ja) | 1982-12-03 | 1982-12-03 | ライト・テ−ブル |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59102236A JPS59102236A (ja) | 1984-06-13 |
| JPH0157338B2 true JPH0157338B2 (OSRAM) | 1989-12-05 |
Family
ID=16617294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57212125A Granted JPS59102236A (ja) | 1982-12-03 | 1982-12-03 | ライト・テ−ブル |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59102236A (OSRAM) |
-
1982
- 1982-12-03 JP JP57212125A patent/JPS59102236A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59102236A (ja) | 1984-06-13 |
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