JPH0149403B2 - - Google Patents

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Publication number
JPH0149403B2
JPH0149403B2 JP23823484A JP23823484A JPH0149403B2 JP H0149403 B2 JPH0149403 B2 JP H0149403B2 JP 23823484 A JP23823484 A JP 23823484A JP 23823484 A JP23823484 A JP 23823484A JP H0149403 B2 JPH0149403 B2 JP H0149403B2
Authority
JP
Japan
Prior art keywords
fluorine
wax
reaction
molecular weight
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP23823484A
Other languages
Japanese (ja)
Other versions
JPS61118331A (en
Inventor
Minoru Aramaki
Hiroaki Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP23823484A priority Critical patent/JPS61118331A/en
Priority to IT22683/85A priority patent/IT1191635B/en
Priority to FR8516773A priority patent/FR2573081B1/en
Priority to GB08528009A priority patent/GB2167072B/en
Priority to US06/797,463 priority patent/US4711949A/en
Priority to DE19853540280 priority patent/DE3540280A1/en
Publication of JPS61118331A publication Critical patent/JPS61118331A/en
Publication of JPH0149403B2 publication Critical patent/JPH0149403B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、含フツ素ポリマーの低分子量物の製
造方法に関し、更に詳しくはポリテトラフルオロ
エチレン等の含フツ素ポリマーと含チツ素フツ素
化合物と接触反応させる低分子量化合物(ワツク
ス)の製造方法に関するものである。
Detailed Description of the Invention (Industrial Field of Application) The present invention relates to a method for producing low molecular weight fluorine-containing polymers, and more specifically, the present invention relates to a method for producing low-molecular-weight fluorine-containing polymers, and more specifically, a method for producing low-molecular-weight fluorine-containing polymers and fluorine-containing fluorine-containing polymers such as polytetrafluoroethylene. This invention relates to a method for producing a low molecular weight compound (wax) which is subjected to a catalytic reaction with a compound.

ポリテトラフルオロエチレン(PTFE)をはじ
めとする含フツ素ポリマーの低分子量物は潤滑性
能、低表面エネルギー性などに優れているため潤
滑剤や離型剤等に広く使用されている。
Low molecular weight fluorine-containing polymers such as polytetrafluoroethylene (PTFE) have excellent lubrication performance and low surface energy properties, so they are widely used as lubricants and mold release agents.

(従来の技術) なかでも低分子量のPTFEはテトラフルオロエ
チレン(TFE)ワツクスと呼ばれ種々の製法が
提案されており、TFEのテロメリゼーシヨンに
よるワツクスの製造方法は古くから知られ工業的
にも実施されている。
(Prior art) Among them, low molecular weight PTFE is called tetrafluoroethylene (TFE) wax, and various manufacturing methods have been proposed.The method for manufacturing wax by telomerization of TFE has been known for a long time and has been used industrially. is also being implemented.

しかしながら、これまでの多くの方法は例えば
テロゲンとなる化合物を反応媒体として使用する
ため(例えば特開昭51―41085号)温度など反応
条件の制御が困難であり、分子量などのコントロ
ール技術を必要とし、モノマーとテロゲンの分離
に問題が残る。また水性反応媒体を用いる方法も
知られているが、生成ワツクスの熱安定性の問
題、反応後のモノマーとテロマーとの分離が困難
である。
However, in many of the methods to date, it is difficult to control reaction conditions such as temperature because they use a compound that becomes a telogen as a reaction medium (for example, Japanese Patent Application Laid-Open No. 51-41085), and they require techniques to control molecular weight, etc. , problems remain in the separation of monomer and telogen. A method using an aqueous reaction medium is also known, but there are problems with the thermal stability of the wax produced and difficulty in separating the monomer and telomer after the reaction.

一方、PTFEを熱分解して低分子にする方法と
してけい素、アルミニウム、マグネシウム、黒鉛
の存在下低温での熱分解する方法(特公昭56―
25446号)。空気またはO2,SO2,NO等の劣化促
進剤の存在下熱分解する方法、更にはKNO3
NaNO3溶融塩中で加熱分解する方法などが知ら
れているが原料PTFEが高価であるためスクラツ
プ以外には使用しにくく、均一な製品が得られ難
いこと、発生する有毒な熱分解ガスの廃棄処理が
困難であることなど解決する問題がある。
On the other hand, as a method of thermally decomposing PTFE to make it into low-molecular molecules, there is a method of thermally decomposing it at low temperatures in the presence of silicon, aluminum, magnesium, and graphite.
No. 25446). A method of thermal decomposition in the presence of air or a deterioration accelerator such as O 2 , SO 2 , NO , etc.
Methods such as thermal decomposition in NaNO 3 molten salt are known, but the raw material PTFE is expensive, making it difficult to use for purposes other than scrap, making it difficult to obtain a uniform product, and disposing of the toxic pyrolysis gas generated. There are problems to be solved, such as the difficulty of processing.

また最近開発された方法としてPTFEに放射線
(X線,γ線)を照射して分解させる方法として、
酸素および水素を添加し照射させることで少ない
放射線量で分解の効率化を図る改良方法(特公昭
56―8043号)なども知られている。しかし放射線
は一般に取扱いにくくコスト高であるため工業的
製法として採用するにはそれ相応の設備を必要と
する。
In addition, a recently developed method is to irradiate PTFE with radiation (X-rays, gamma rays) and decompose it.
An improved method of increasing the efficiency of decomposition with a small amount of radiation by adding oxygen and hydrogen and irradiating it (Tokuko Sho)
56-8043) are also known. However, since radiation is generally difficult to handle and expensive, appropriate equipment is required to employ it as an industrial manufacturing method.

(発明が解決しようとする問題点) 本発明者らは上記従来法の欠点解消として、別
異な新規製法を種々検討した結果、含フツ素ポリ
マーを常温で安定な化合物である含チツ素フツ素
化合物と接触反応させることで高収率でコントロ
ールされた分子量分布を持つ含フツ素ポリマーの
低分子量物が得られることを見い出し本発明に到
達した。
(Problems to be Solved by the Invention) In order to overcome the drawbacks of the above-mentioned conventional methods, the present inventors investigated various new and different production methods. The inventors have discovered that a low molecular weight fluorine-containing polymer with a controlled molecular weight distribution can be obtained in high yield by contact reaction with a compound, and have thus arrived at the present invention.

(問題を解決するための手段) 本発明の具体的実施方法においては、各ポリマ
ーにより反応条件は異なるが、反応温度は250〜
550℃好ましくは350〜500℃において行われる。
250℃以下では接触反応に長時間を必要とし、550
℃以上では均一な製品が得られず該温度範囲にお
いては容易に低分子量化の反応が短時間に進行
し、ワツクス状のものが得られる。
(Means for solving the problem) In the specific implementation method of the present invention, reaction conditions vary depending on each polymer, but the reaction temperature is 250 to 250°C.
It is carried out at 550°C, preferably 350-500°C.
Below 250℃, contact reaction requires a long time, and 550℃
If the temperature is above 0.degree. C., a uniform product cannot be obtained, and in this temperature range, the reaction to lower the molecular weight easily proceeds in a short time, resulting in a wax-like product.

以下本発明を詳述する。 The present invention will be explained in detail below.

本発明における原料の含フツ素ポリマーは
PTFE、テトラフルオロエチレン―ヘキサフルオ
ロプロピレン共重合体(FEP)、テトラフルオロ
エチレン―パーフルオロアルコキシエチレン共重
合体(PFA)、クロロトリフルオロエチレン
(CTFE)エチレン―テトラフルオロエチレン共
重合体(ETFE)およびポリビニリデンフルオラ
イド(PvdF)、ポリビニルフルオライド(PVF)
などの粉末、ペレツト、シート状物スクラツプあ
るいはフイラー入りのものなどいかなる形状のも
のでも使用できる。供給する含フツ素フツ素化物
としては三フツ化窒素(NF3)、二フツ化窒素
(NF2)、四フツ化ヒドラジン(N2F4)、二フツ化
ジアジン(N2F2)、フツ化アジン(N3F)等の二
元素よりなるN―F化合物が挙げられなかんず
く、NF3は常温では無色の安定な気体(融点−
206.8℃、沸点−129.1℃)で、高温では酸化力が
強く300℃以上で容易にFラジカルを発生する特
異的なフツ素化剤であり、含フツ素ポリマーの主
鎖の切断および生成したポリマーの末端ラジカル
をカツプリング安定化させ反応制御を容易にする
ものである。
The raw material fluorine-containing polymer in the present invention is
PTFE, tetrafluoroethylene-hexafluoropropylene copolymer (FEP), tetrafluoroethylene-perfluoroalkoxyethylene copolymer (PFA), chlorotrifluoroethylene (CTFE), ethylene-tetrafluoroethylene copolymer (ETFE), and Polyvinylidene fluoride (PvdF), polyvinyl fluoride (PVF)
It can be used in any form, such as powder, pellets, scrap sheets, or filled ones. The fluorine-containing fluorides to be supplied include nitrogen trifluoride (NF 3 ), nitrogen difluoride (NF 2 ), hydrazine tetrafluoride (N 2 F 4 ), diazine difluoride (N 2 F 2 ), In particular, NF compounds consisting of two elements such as azine fluoride (N 3 F) are mentioned, and NF 3 is a colorless stable gas at room temperature (melting point -
206.8℃, boiling point -129.1℃), it is a unique fluorinating agent that has strong oxidizing power at high temperatures and easily generates F radicals at temperatures above 300℃. It couples and stabilizes the terminal radical of , making it easier to control the reaction.

これら含チツ素フツ素化合物の添加量は含フツ
素ポリマーの種類、形状にもよるが含フツ素ポリ
マーの有姿100重量部に対しFとして0.01重量部
以上となるよう供給(存在)させればよく0.01重
量部より少ないとワツクス化が行えない。なお、
過剰に存在する場合は未反応として残存するた
め、これを回収再使用すればよいので特に問題は
おこらないが、大略10重量部程度迄の範囲で選択
するのが望ましい。
The amount of these fluorine-containing compounds added depends on the type and shape of the fluorine-containing polymer, but it should be supplied (present) in an amount of 0.01 part by weight or more as F per 100 parts by weight of the fluorine-containing polymer. If the amount is less than 0.01 part by weight, wax cannot be formed. In addition,
If it is present in excess, it will remain unreacted and can be recovered and reused, so no particular problem will occur. However, it is preferable to select it within a range of approximately 10 parts by weight.

使用する反応器は気体と固体が接触するような
形能のものであれば、いずれのものでも使用でき
るが例えば多段の反応棚を具備する強制循環式の
反応器、流動層などの気固接触が良好に行える反
応器が好ましい。ガスの圧力は高圧になればなる
ほど速やかに反応するが、常圧においても充分な
反応速度を持つている。また含チツ素フツ素化合
物は純粋なものでの使用はもちろんであるが窒
素、アルゴン、ヘリウム、四フツ化炭素等の不活
性ガスで希釈使用することもできる。
Any type of reactor can be used as long as it allows gas and solid to come into contact with each other. A reactor that can perform well is preferable. The higher the gas pressure, the faster the reaction occurs, but the reaction rate is sufficient even at normal pressure. Further, the nitrogen-containing fluorine compound can of course be used in its pure form, but it can also be used diluted with an inert gas such as nitrogen, argon, helium, or carbon tetrafluoride.

本発明における含チツ素フツ素化合物との反応
では従来法の熱分解による多量の不飽和の猛毒ガ
ス副生に比べ、反応で副生するガスは強力なフツ
素化能を有するフツ素化剤中で反応を行うため、
極めて少なく副生ガスはN2を始めC3F8,C2F6
CF4等安全でかつ取り扱い容易なパーフルオロカ
ーボンである。
In the reaction with the nitrogen-containing fluorine compound in the present invention, the gas produced by the reaction is a fluorinating agent that has a strong fluorinating ability, compared to the large amount of unsaturated poisonous gas by-product produced by thermal decomposition in the conventional method. In order to carry out the reaction inside the
Very few by-product gases include N 2 , C 3 F 8 , C 2 F 6 ,
CF 4 is a safe and easy-to-handle perfluorocarbon.

生成する低分子量フツ化物の分子量分布は、実
施例にも示す如く反応温度と反応時間によつて数
十万オーダから数千単位のオーダーで、その温度
の高さ及び時間の長さに大略比例して分子量を小
さく自由にコントロールすることができる。即
ち、含フツ素ポリマーの粒径が小さく含チツ素フ
ツ素化合物の添加量を多くかつ高温域で行えば低
分子量のものが取得できる。なお生成物は活性な
フツ素ラジカルの存在下で分解を行つているた
め、末端はCF3化されており、極めて安定であ
る。また、カーボンの折出が全くおこらないため
極めて純白なものが取得される。
As shown in the examples, the molecular weight distribution of the low molecular weight fluoride produced is on the order of hundreds of thousands to several thousand units depending on the reaction temperature and reaction time, and is roughly proportional to the height of the temperature and the length of the reaction time. The molecular weight can be controlled freely. That is, if the particle size of the fluorine-containing polymer is small, the amount of the fluorine-containing compound added is large, and the process is carried out in a high temperature range, a low molecular weight product can be obtained. Since the product is decomposed in the presence of active fluorine radicals, the terminal end is converted to CF3 , making it extremely stable. Furthermore, since no carbon precipitation occurs, an extremely pure white product can be obtained.

本発明において得られたこれら生成物は容易に
微粉砕することができ通常のハンマータイプの粉
砕機使用であれば平均粒径100μ、ジエツトミル
で粉砕すれば平均粒径0.1〜10μ程度まで微粉砕で
きる。
These products obtained in the present invention can be easily pulverized to an average particle size of 100 μm using a normal hammer type pulverizer, and 0.1 to 10 μm using a jet mill. .

以下実施例により本発明を更に詳述する。 The present invention will be explained in more detail with reference to Examples below.

実施例 1 厚み3mmのPTFEシート(焼結成形品)を5mm
角に切断したペレツト632gを強制的にガス撹拌
するためのフアンと加熱用ヒーターを具備した20
ニツケル製反応器に仕込み、N2ガス中で440℃
に昇温したのち、真空ポンプでN2ガスの一部を
抜き、NF38gを導入して反応せしめた。反応開
始時のNF3濃度は33%で圧力は常圧であつた。
Example 1 5mm thick 3mm thick PTFE sheet (sintered molded product)
20 equipped with a fan and heater for forcibly stirring 632g of pellets cut into squares with gas.
Pour into a nickel reactor and heat at 440℃ in N2 gas.
After the temperature was raised to , part of the N 2 gas was removed using a vacuum pump, and 8 g of NF 3 was introduced to cause a reaction. At the start of the reaction, the NF 3 concentration was 33% and the pressure was normal pressure.

2時間反応させたところ、NF3が消費されN2
と少量のCF4,C2F6,C3F6ガスが副生、626gの
純白溶融状態のワツクスが得られた。固形分の収
率は99%であつた。このワツクスは融点300℃で、
米国特許第3067262号で示されている融点と分子
量の関係〔分子量=
200/685〔1/融点(〓)−1/600〕に従つて分子量
を 算出すると3700であつた。このワツクスを粗粉砕
したのち、ジエツトミルで微粉砕することによつ
て平均粒径5μmの微粒子粉末を得た。
When reacted for 2 hours, NF 3 was consumed and N 2
A small amount of CF 4 , C 2 F 6 , and C 3 F 6 gas was produced as by-products, and 626 g of pure white molten wax was obtained. The solid content yield was 99%. This wax has a melting point of 300℃,
The relationship between melting point and molecular weight shown in U.S. Patent No. 3,067,262 [molecular weight =
The molecular weight was calculated according to 200/685 [1/melting point (〓) - 1/600] and was 3700. This wax was coarsely pulverized and then finely pulverized with a jet mill to obtain a fine powder with an average particle size of 5 μm.

実施例 2 PTFEモールデングパウダー632gとNF324g
を実施例1と同様の反応器中で16時間反応させ
た。生成した固体および気体を捕集したところ
629g(収率99.5%)のワツクス状のPTFEおよ
び副生ガスとしてN2および少量のCF4,C2F6
C3F8を得た。このワツクスを粉砕したところ平
均粒径7μmの微粉末を得た。このワツクスの融
点は318℃であり、平均分子量は11700であつた。
Example 2 PTFE molding powder 632g and NF 3 24g
was reacted for 16 hours in the same reactor as in Example 1. Collecting the generated solids and gases
629g (yield 99.5%) of wax-like PTFE and by-product gases include N 2 and small amounts of CF 4 , C 2 F 6 ,
C3F8 was obtained. When this wax was pulverized, a fine powder with an average particle size of 7 μm was obtained. The melting point of this wax was 318°C and the average molecular weight was 11,700.

実施例 3 実施例2と同じPTFE50gとN2F41gを同様の
反応器中で400℃で10時間反応させた。生成した
固体および気体を捕集したところ49.5g(収率99
%)のワツクス状のPTFEおよび副生ガスとして
N2およびCF4,C2F6,C3F8を得た。このワツク
スの融点は310℃であり、平均分子量は6100であ
つた。なおこのものは容易に微粉砕できるもので
あつた。
Example 3 The same 50 g of PTFE as in Example 2 and 1 g of N 2 F 4 were reacted at 400° C. for 10 hours in the same reactor. When the generated solid and gas were collected, 49.5g (yield 99%) was collected.
%) as waxy PTFE and by-product gas
N2 and CF4 , C2F6 , C3F8 were obtained . This wax had a melting point of 310°C and an average molecular weight of 6,100. Note that this material could be easily pulverized.

実施例 4 厚さ3mmのFEPシートを5mm角に切断したペ
レツト620gとNF38gを同様に420℃で3時間反
応させたところ、615g(収率99.2%)のワツク
スおよび副生ガスとしてN2および少量のCF4
C2F6,C3F8を得た。ワツクスの融点は244℃で容
易に粉砕できるものであつた。
Example 4 When 620 g of pellets obtained by cutting a 3 mm thick FEP sheet into 5 mm squares and 8 g of NF 3 were similarly reacted at 420°C for 3 hours, 615 g of wax (yield 99.2%) and N 2 as by-product gas were produced. and a small amount of CF4 ,
C 2 F 6 and C 3 F 8 were obtained. The wax had a melting point of 244°C and could be easily crushed.

実施例 5 PFAペレツト(3mmφ×5mm)630gとNF38
gを450℃で2時間反応させたところ、620g(収
率98.4%)のワツクスと、副生ガスとしてN2
よび少量のCF4,C2F6,C3F8を得た。ワツクスの
融点は253℃で容易に粉砕できるものであつた。
Example 5 PFA pellets (3mmφ×5mm) 630g and NF 3 8
When the mixture was reacted at 450° C. for 2 hours, 620 g (yield: 98.4%) of wax, N 2 and small amounts of CF 4 , C 2 F 6 , and C 3 F 8 were obtained as by-product gases. The wax had a melting point of 253°C and could be easily crushed.

実施例 6 CTFEパイプ(10φ)を10mmの長さに切断した
ものを500gとNF3ガス8gを400℃で2時間反応
させたところ、450g(収率90%)のワツクスお
よび副生ガスとしてN2と少量のCF4,C2F6
CF3Clを得た。ワツクスの融点は240℃で容易に
粉砕できるものであつた。
Example 6 When 500g of CTFE pipe (10φ) cut into 10mm length was reacted with 8g of NF3 gas at 400℃ for 2 hours, 450g of wax (yield 90%) and N as a by-product gas were produced. 2 and small amounts of CF 4 , C 2 F 6 ,
CF 3 Cl was obtained. The wax had a melting point of 240°C and could be easily crushed.

Claims (1)

【特許請求の範囲】[Claims] 1 含フツ素ポリマーを250〜550℃において、含
チツ素フツ素化合物と接触反応させることを特徴
とする含フツ素樹脂の低分子量物の製造方法。
1. A method for producing a low-molecular-weight fluorine-containing resin, which comprises catalytically reacting a fluorine-containing polymer with a fluorine-containing compound at 250 to 550°C.
JP23823484A 1984-11-14 1984-11-14 Production of fluorine-contained resin having low molecular weight Granted JPS61118331A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP23823484A JPS61118331A (en) 1984-11-14 1984-11-14 Production of fluorine-contained resin having low molecular weight
IT22683/85A IT1191635B (en) 1984-11-14 1985-10-31 CONVERSION PROCEDURE OF A HIGH POLYMER CONTAINING FLUORIDE IN A LOWER MOLECULAR WEIGHT POLYMET
FR8516773A FR2573081B1 (en) 1984-11-14 1985-11-13 PROCESS FOR CONVERSION OF A HIGH POLYMER CONTAINING FLUOR into a POLYMER OF LOWER MOLECULAR WEIGHT
GB08528009A GB2167072B (en) 1984-11-14 1985-11-13 Method of converting fluorine-containing high polymer into lower molecular weight polymer
US06/797,463 US4711949A (en) 1984-11-14 1985-11-13 Method of converting fluorine-containing high polymer into lower molecular weight polymer
DE19853540280 DE3540280A1 (en) 1984-11-14 1985-11-13 METHOD FOR CONVERTING FLUORINE HIGH POLYMERS TO POLYMERS WITH LOWER MOLECULAR WEIGHT

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23823484A JPS61118331A (en) 1984-11-14 1984-11-14 Production of fluorine-contained resin having low molecular weight

Publications (2)

Publication Number Publication Date
JPS61118331A JPS61118331A (en) 1986-06-05
JPH0149403B2 true JPH0149403B2 (en) 1989-10-24

Family

ID=17027137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23823484A Granted JPS61118331A (en) 1984-11-14 1984-11-14 Production of fluorine-contained resin having low molecular weight

Country Status (1)

Country Link
JP (1) JPS61118331A (en)

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* Cited by examiner, † Cited by third party
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JP3990663B2 (en) * 2002-10-25 2007-10-17 新日本製鐵株式会社 Surface-treated metal plate, manufacturing method thereof, and lubricating resin and lubricating resin coating composition used in the manufacturing method
EP1605011B1 (en) 2003-02-28 2013-01-23 Daikin Industries, Ltd. Granulated powder of low-molecular polytetrafluoro- ethylene and powder of low-molecular polytetrafluoro- ethylene and processes for producing both

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