JPH0142158B2 - - Google Patents
Info
- Publication number
- JPH0142158B2 JPH0142158B2 JP56031855A JP3185581A JPH0142158B2 JP H0142158 B2 JPH0142158 B2 JP H0142158B2 JP 56031855 A JP56031855 A JP 56031855A JP 3185581 A JP3185581 A JP 3185581A JP H0142158 B2 JPH0142158 B2 JP H0142158B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- metal vapor
- deposited film
- film layer
- ink layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010410 layer Substances 0.000 claims description 57
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 239000011521 glass Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 239000011347 resin Substances 0.000 claims description 10
- 229920005989 resin Polymers 0.000 claims description 10
- 239000012790 adhesive layer Substances 0.000 claims description 8
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 230000000873 masking effect Effects 0.000 claims 1
- 239000002585 base Substances 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000005340 laminated glass Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Landscapes
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
Description
【発明の詳細な説明】
本発明は電子レンジ等の高周波加熱装置の扉部
等に使用される透視可能な高周波電波遮蔽板及び
その製造方法に関するものである。その目的とす
るところは、内部が透視し易く、製造が容易で量
産に適した高周波電波蔽板及びその製造方法を提
供することにある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a see-through high frequency radio wave shielding plate used for the door of a high frequency heating device such as a microwave oven, and a method for manufacturing the same. The purpose is to provide a high frequency radio wave shielding plate whose interior is easy to see through, easy to manufacture, and suitable for mass production, and a method for manufacturing the same.
電子レンジ等の扉部には高周波電波を遮蔽し且
つ内部が透視できるような遮蔽板が用いられてい
る。従来このような遮蔽板としては多数の透孔を
設けた金属板或いは金属膜層をガラス板上又はガ
ラス板間に積層したものが使用されている。しか
し前記金属板を設ける場合は、一般に透孔はプレ
ス加工で行うため、加工が面倒であり且つ微細な
透孔を形成するには不適当であつた。又、金属膜
層を設ける場合には金属粉を含有するペーストを
スクリーン印刷にてガラス板に塗布形成したり、
ガラス板面にアルミニウム等を真空蒸着法にて被
着形成する方法に依つていた。しかし前者の方法
ではスクリーン印刷によるため十分に微細な透孔
を作成することができず、更に前記ペーストには
樹脂バインダーを含むため金属膜層の導電性が比
較的低いものである。更にガラス板面に融着させ
るために加熱焼付する手間のかかるものである。
又、後者の方法ではガラス板に直接真空蒸着を施
すのは手間がかかり、蒸着膜が強固に接着され難
いという欠点があり、作成されたガラス板はハー
フミラー状のものとなり電子レンジ等の内部が見
にくいものであつた。 2. Description of the Related Art A shield plate is used on the door of a microwave oven or the like to shield high frequency radio waves and to allow the inside to be seen through. Conventionally, as such a shielding plate, a metal plate having a large number of through holes or a metal film layer laminated on a glass plate or between glass plates has been used. However, when the metal plate is provided, the through holes are generally formed by press working, which is cumbersome and unsuitable for forming fine through holes. In addition, when providing a metal film layer, a paste containing metal powder is applied to the glass plate by screen printing, or
This method has relied on a method of depositing aluminum or the like on the surface of a glass plate using a vacuum evaporation method. However, since the former method uses screen printing, it is not possible to create sufficiently fine holes, and furthermore, since the paste contains a resin binder, the conductivity of the metal film layer is relatively low. Furthermore, it takes time and effort to heat and bake the glass plate in order to fuse it to the surface of the glass plate.
In addition, in the latter method, it is time-consuming to perform vacuum deposition directly on the glass plate, and the deposited film has the disadvantage that it is difficult to adhere firmly, and the glass plate created has a half-mirror shape, which can be used inside microwave ovens, etc. It was difficult to see.
本発明者らは以上のような諸欠点に鑑み、容易
に量産ができ、且つ微細で精確な透孔を設けた高
周波電波遮蔽板を提供せんとし、種々考察研究し
た結果本発明を完成するに至つたものである。即
ち本発明は、ガラス板等の透明板8面に金属蒸着
膜層4及び隠蔽性を有するインキ層5を積層し、
該二層が網点状の透孔7を有することを特徴とす
る高周波電波遮蔽板及びその製造方法である。 In view of the above-mentioned drawbacks, the inventors of the present invention sought to provide a high-frequency radio wave shielding plate that can be easily mass-produced and is provided with fine and precise through holes, and as a result of various considerations and researches, they completed the present invention. It has been reached. That is, in the present invention, a metal vapor deposited film layer 4 and an ink layer 5 having hiding properties are laminated on 8 surfaces of a transparent plate such as a glass plate,
This is a high frequency radio wave shielding plate characterized in that the two layers have dot-shaped through holes 7, and a method for manufacturing the same.
以下本発明について図面にもとづき更に詳しく
説明する。 The present invention will be explained in more detail below based on the drawings.
本発明においては第1図に示されるような転写
材を使用する。この転写材は基体シート1上に剥
離層2、樹脂層3、金属蒸着膜層4、インキ層
5、接着剤層6を順次積層し、金属蒸着膜層4、
インキ層5に網点状の透孔7を設けたものであ
る。 In the present invention, a transfer material as shown in FIG. 1 is used. This transfer material is made by sequentially laminating a release layer 2, a resin layer 3, a metal vapor deposited film layer 4, an ink layer 5, and an adhesive layer 6 on a base sheet 1.
The ink layer 5 is provided with halftone dot-like through holes 7.
転写材の作成は次のようになされる。まず基体
シート1上に剥離層2、樹脂層3が塗布形成され
る。基体シート1、剥離層2には通常の所謂転写
印刷方法に供される転写材に用いられるものを使
用する。樹脂層3は金属蒸着膜層4の密着度を高
めるために設けるものであり、例えばポリビニー
ル系、ポリエステル系、ポリウレタン系、ポリア
クリル系、その他繊維素系樹脂等を用いて剥離層
2上に形成される。 The transfer material is prepared as follows. First, a release layer 2 and a resin layer 3 are coated and formed on a base sheet 1 . For the base sheet 1 and the release layer 2, those used for transfer materials used in a normal so-called transfer printing method are used. The resin layer 3 is provided to increase the adhesion of the metal vapor deposited film layer 4, and is formed on the release layer 2 using, for example, polyvinyl, polyester, polyurethane, polyacrylic, or other cellulose resin. It is formed.
その上にアルミニウム、クロム、ニツケル、銅
等の金属を用いて真空蒸着方法やスパツタリング
及びイオンプレイテイング法等によつて金属蒸着
膜層4が形成される。更にインキ層5が設けられ
る。金属蒸着膜層4及びインキ層5の網点状の透
孔は次のようにして形成される。即ち、まず金属
蒸着膜が樹脂層3上に全面に設けられ、その上に
網点状の透孔7を有するインキ層5が印刷形成さ
れる。該インキ層5はアルキツド系、ビニール
系、アクリル系、ポリエステル系等のアルカリも
しくは酸に対してレジストとなるもので、隠蔽性
を有するインキを使用し、オフセツト、グラビア
等の印刷手段による。インキ層5を形成した後、
水酸化ナトリウム、水酸化カリウム等のアルカリ
液又は塩酸、硫酸等の酸性液を用いて該シートを
洗浄すると、透孔部分の金属蒸着膜が除去され、
網点状の透孔が形成される。尚、形成する透孔7
は一般印刷製版技術において通常使用する70線〜
200線、好ましくは180線〜200線のピツチで、そ
の大きさは必要とする遮蔽板の透過率に応じて適
宜選択されるが20%〜40%程度の面積占有率が好
ましい。即ちこの場合、60%〜80%の網点濃度の
インキ層5を形成するとよい(第2図参照)。 A metal vapor deposition film layer 4 is formed thereon using a metal such as aluminum, chromium, nickel, copper, etc. by vacuum vapor deposition, sputtering, ion plating, or the like. Furthermore, an ink layer 5 is provided. The mesh-like through holes in the metal vapor deposited film layer 4 and the ink layer 5 are formed as follows. That is, first, a metal vapor deposition film is provided on the entire surface of the resin layer 3, and an ink layer 5 having halftone dot-like through holes 7 is printed thereon. The ink layer 5 is made of alkyd-based, vinyl-based, acrylic-based, polyester-based, etc., which serves as a resist against alkali or acid, and uses an ink having hiding properties, and is printed by offset, gravure, or other printing means. After forming the ink layer 5,
When the sheet is washed with an alkaline solution such as sodium hydroxide or potassium hydroxide or an acidic solution such as hydrochloric acid or sulfuric acid, the metal vapor deposited film in the perforated areas is removed.
A dot-shaped through hole is formed. In addition, the through hole 7 to be formed
is 70 lines normally used in general printing plate making technology
The pitch is 200 lines, preferably 180 to 200 lines, and the size is appropriately selected depending on the required transmittance of the shielding plate, but an area occupation rate of about 20% to 40% is preferable. That is, in this case, it is preferable to form the ink layer 5 with a halftone dot density of 60% to 80% (see FIG. 2).
インキ層5の上に接着剤層6が塗布形成され
る。接着剤も通常の転写材に供されるものを用い
る。 An adhesive layer 6 is applied and formed on the ink layer 5. The adhesive used for ordinary transfer materials is also used.
以上のような構成の転写材を用いて透明板8面
に転写を施す。透明板8としてはガラス板や耐熱
性プラスチツク板を用いる。まず透明板8面に接
着剤層6側が接するように転写材を載置し、必要
に応じて加熱加圧し、その後基体シート1を剥離
し、前記剥離層2、樹脂層3、金属蒸着膜層4、
インキ層5及び接着剤層6を透明板8面に転写す
る。 Transfer is performed on the transparent plate 8 using the transfer material configured as described above. As the transparent plate 8, a glass plate or a heat-resistant plastic plate is used. First, a transfer material is placed so that the adhesive layer 6 side is in contact with the surface of the transparent plate 8, heated and pressed as necessary, and then the base sheet 1 is peeled off, and the peeling layer 2, resin layer 3, metal vapor deposition film layer 4,
The ink layer 5 and the adhesive layer 6 are transferred onto the surface of the transparent plate 8.
本発明にかかる高周波電波遮蔽板は以上のよう
にして得られた状態で電子レンジ等の扉部に使用
できるが、使用に際しては金属蒸着膜層4がイン
キ層5の内側に位置するように設置すると、外側
から見た場合、隠蔽性を有するインキ層5の存在
により金属蒸着膜層4は隠され、ミラー効果を防
ぐため、内部をより見易くすることができる。 The high frequency radio wave shielding plate according to the present invention obtained as described above can be used for the door of a microwave oven, etc., but when used, it must be installed so that the metal vapor deposited film layer 4 is located inside the ink layer 5. Then, when viewed from the outside, the metal vapor deposited film layer 4 is hidden by the presence of the ink layer 5 having a hiding property, and the mirror effect is prevented, so that the inside can be more easily seen.
又、剥離層2比較的硬い樹脂を用いたり、或い
は剥離層2上に更にガラス板を設置して合わせガ
ラス板様にして使用すると金属蒸着膜層4その他
の層を接触による擦傷や剥脱から防ぐことができ
る(第3図及び第4図参照)
本発明は以上述べたような高周波電波遮蔽板及
びその製造方法であるから、本発明によれば容易
に微細な網点状の透孔を有する遮蔽板を得ること
ができ、その製造方法は転写印刷方法を用いるか
ら大量生産にも適したものである。得られた遮蔽
板は電子レンジ等の扉部に適用した場合でも内部
が透視し易く、又その光透過率も必要に応じて設
計できるなど種々の効果が得られるものである。
従つて電子レンジをはじめとし、加熱室内を見る
必要のある高周波加熱装置等の遮蔽板として広く
その応用が期待される高周波電波遮蔽板及びその
製造方法である。 In addition, if a relatively hard resin is used for the release layer 2, or if a glass plate is further placed on the release layer 2 and used like a laminated glass plate, the metal vapor deposited film layer 4 and other layers can be prevented from being scratched or peeled off due to contact. (See Figures 3 and 4) Since the present invention is a high-frequency radio wave shielding plate and a method for manufacturing the same as described above, it is possible to easily form fine dot-shaped through holes according to the present invention. A shielding plate can be obtained, and since the manufacturing method thereof uses a transfer printing method, it is suitable for mass production. Even when the obtained shielding plate is applied to the door of a microwave oven or the like, it is easy to see through the inside, and its light transmittance can be designed as necessary, and various other effects can be obtained.
Therefore, the high frequency radio wave shielding plate and its manufacturing method are expected to be widely used as shielding plates for high frequency heating devices such as microwave ovens where it is necessary to see inside the heating chamber.
第1図は本発明において使用する転写材の部分
拡大断面図、第2図は該転写材中のインキ層の部
分拡大平面図、第3図及び第4図は各々本発明に
かかる高周波電波遮蔽板の実施例の部分拡大断面
図をそれぞれ示す。
図中、1……基体シート、2……剥離層、3…
…樹脂層、4……金属蒸着膜層、5……インキ
層、6……接着剤層、7……透孔、8……透明
板。
FIG. 1 is a partially enlarged sectional view of a transfer material used in the present invention, FIG. 2 is a partially enlarged plan view of an ink layer in the transfer material, and FIGS. 3 and 4 are high-frequency radio wave shielding according to the present invention. FIG. 3 shows partially enlarged cross-sectional views of embodiments of the plate, respectively. In the figure, 1...Base sheet, 2...Peeling layer, 3...
...Resin layer, 4...Metal deposited film layer, 5...Ink layer, 6...Adhesive layer, 7...Through hole, 8...Transparent plate.
Claims (1)
インキ層を積層し、該二層が網点状の透孔を有す
ることを特徴とする高周波電波遮蔽板。 2 基体シート上に剥離層、樹脂層、金属蒸着膜
層、隠蔽性を有するインキ層及び接着剤層を順次
積層し、該金属蒸着膜層及び該インキ層に網点状
の透孔を設けた転写材の該接着剤層側を透明板面
に載置し、該基体シートを剥離し、前記剥離層、
樹脂層、金属蒸着膜層、インキ層及び接着剤層を
ガラス板面に転写することを特徴とする高周波電
波遮蔽板の製造方法。[Scope of Claims] 1. A high-frequency radio wave shielding plate, characterized in that a metal vapor-deposited film layer and a masking ink layer are laminated on a transparent plate surface, and the two layers have dot-shaped through holes. 2. A release layer, a resin layer, a metal vapor deposited film layer, an ink layer having concealing properties, and an adhesive layer were sequentially laminated on the base sheet, and halftone dot-like through holes were provided in the metal vapor deposited film layer and the ink layer. The adhesive layer side of the transfer material is placed on the transparent plate surface, the base sheet is peeled off, and the peeling layer,
A method for manufacturing a high frequency radio wave shielding plate, which comprises transferring a resin layer, a metal vapor deposition film layer, an ink layer and an adhesive layer onto a glass plate surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3185581A JPS57145400A (en) | 1981-03-04 | 1981-03-04 | High frequency radio wave shielding plate and method of producing same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3185581A JPS57145400A (en) | 1981-03-04 | 1981-03-04 | High frequency radio wave shielding plate and method of producing same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57145400A JPS57145400A (en) | 1982-09-08 |
JPH0142158B2 true JPH0142158B2 (en) | 1989-09-11 |
Family
ID=12342657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3185581A Granted JPS57145400A (en) | 1981-03-04 | 1981-03-04 | High frequency radio wave shielding plate and method of producing same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57145400A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011095773A (en) * | 2011-01-21 | 2011-05-12 | Kyodo Printing Co Ltd | Shield material |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6127298U (en) * | 1984-06-25 | 1986-02-18 | 古野電気株式会社 | Shield plate for electronic equipment |
JPS61102245A (en) * | 1984-10-25 | 1986-05-20 | 釜屋化学工業株式会社 | Manufacture of transparent conductive glass plate |
JPS61209153A (en) * | 1985-03-13 | 1986-09-17 | 大日本印刷株式会社 | Electromagnetic-wave shield sheet |
JPS62178598U (en) * | 1986-04-30 | 1987-11-12 | ||
JPH0331111Y2 (en) * | 1986-05-19 | 1991-07-01 | ||
IL86113A (en) * | 1987-04-28 | 1992-02-16 | Ppg Industries Inc | Electroforming of electromagnetic pulse shielding elements |
JPH01168100A (en) * | 1987-12-24 | 1989-07-03 | Tootsuya:Kk | Transparent electromagnetic wave shielding material |
JPH0716119B2 (en) * | 1988-07-16 | 1995-02-22 | 株式会社巴川製紙所 | Method for manufacturing conductive sheet |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5370425A (en) * | 1976-12-06 | 1978-06-22 | Toppan Printing Co Ltd | Method of making vibration plate |
JPS5582499A (en) * | 1978-12-15 | 1980-06-21 | Sharp Kk | Radio wave shielding plate |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5734778Y2 (en) * | 1976-10-20 | 1982-07-31 |
-
1981
- 1981-03-04 JP JP3185581A patent/JPS57145400A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5370425A (en) * | 1976-12-06 | 1978-06-22 | Toppan Printing Co Ltd | Method of making vibration plate |
JPS5582499A (en) * | 1978-12-15 | 1980-06-21 | Sharp Kk | Radio wave shielding plate |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011095773A (en) * | 2011-01-21 | 2011-05-12 | Kyodo Printing Co Ltd | Shield material |
Also Published As
Publication number | Publication date |
---|---|
JPS57145400A (en) | 1982-09-08 |
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