JPH01302307A - Pattern forming method having refractive index difference and pattern transfer body used therein and image forming body - Google Patents
Pattern forming method having refractive index difference and pattern transfer body used therein and image forming bodyInfo
- Publication number
- JPH01302307A JPH01302307A JP13327288A JP13327288A JPH01302307A JP H01302307 A JPH01302307 A JP H01302307A JP 13327288 A JP13327288 A JP 13327288A JP 13327288 A JP13327288 A JP 13327288A JP H01302307 A JPH01302307 A JP H01302307A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- refractive index
- image forming
- compd
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は屈折率差のあるパターン作成方法及びそれに供
するパターン転写体及び像形成体に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for creating a pattern with a difference in refractive index, and a pattern transfer member and an image forming member used therefor.
従来の技術
従来、屈折率差のあるパターンからなる先導波路の第1
の作成方法として、次のような方法が知られている。2. Description of the Related Art Conventionally, the first waveguide of a leading waveguide consisting of a pattern with a difference in refractive index has been used.
The following methods are known as methods for creating .
1、基材の上に屈折率が低い層を設ける。1. Providing a layer with a low refractive index on the base material.
2、この上に一旦フオドレジスト、電子線レジストなど
の放射線に対して感応性がある物質を構成する。2. On top of this, a material sensitive to radiation, such as a photoresist or an electron beam resist, is formed.
3、導波路を構成したい場所だけを(または導波路以外
の場所を)マスク等を用いて放射線により感応させる。3. Sensitize only the area where the waveguide is desired (or the area other than the waveguide) to radiation using a mask or the like.
4、この場所だけの(またはこの場所以外の)レジスト
を除去する。4. Remove the resist only at this location (or at other locations).
5、エツチングにより、導波路を構成したい場所の低屈
折率層を除去する。5. Remove the low refractive index layer at the location where the waveguide is desired to be formed by etching.
6、高屈折率物質の層を構成する。6. Construct a layer of high refractive index material.
7、残留レジストを除去する。7. Remove residual resist.
また第2の方法として、屈折率差を用いた(位相変調に
よる)ホログラフィック光学素子或はホログラムとして
は、重クロムゼラチンのようなホログラム記録材料に露
光したあと、ウェットプロセスで処理するという方法が
ある。A second method is to create a holographic optical element or hologram using a refractive index difference (based on phase modulation) by exposing a hologram recording material such as dichromium gelatin to light and then processing it in a wet process. be.
また屈折率差を有するパターン作成方法の新しい流れと
して、特開昭60−166946号公報に記載のように
、予め、光によって反応することで屈折率が変化する2
種類の物質によりフィルムなどを構成し、これにパター
ンの露光を行って反応させた後未反応の物質の一方を除
去するといった方法がある。また、2つの異なる波長の
光を照射したときだけ反応が起こり屈折率が変化すると
いうような材料を用いることにより、露光プロセスだけ
でパターンを作製するという方法もある。In addition, as a new trend in the method of creating patterns having a difference in refractive index, as described in JP-A-60-166946, the refractive index is changed by reacting with light.
There is a method in which a film or the like is formed of different kinds of substances, the film is exposed in a pattern to react, and then one of the unreacted substances is removed. Another method is to create a pattern using only an exposure process by using a material that reacts and changes its refractive index only when irradiated with light of two different wavelengths.
発明が解決しようとする課題点
前記の種種の屈折率差を有するパターンの作成方法のう
ち、1番目の方法はパターンの形成された光学素子や記
録像を得るまでの処理が複雑であり、また容易ではない
。2番目の方法は複雑ではないが、ウェットプロセスで
の処理がやや容易ではなく、また、未記録状態での像形
成体が単独で感光性を有するため、未記録材料の保存安
定性の点で不利である。3番目の方法は更に簡便な方法
ではあるが、一方の未反応物質を十分に除去しないと十
分な屈折率差が得られないという問題点がある。4番目
の方法は、2つの波長の光を与えて初めて屈折率変化を
伴う反応が起こるというゲートを設けた設計であり、未
記録状態或は記録後の状態の材料の保存安定性の点でも
有利である。しかしながら、実用に十分な記録感度が得
られていないのが実状である。Problems to be Solved by the Invention Among the above-mentioned methods for creating patterns having various refractive index differences, the first method requires complicated optical elements on which the pattern is formed and the processing required to obtain the recorded image. It's not easy. The second method is less complicated, but it is a little less easy to process in a wet process, and the storage stability of the unrecorded material is affected because the image forming body in the unrecorded state is photosensitive on its own. It is disadvantageous. The third method is a simpler method, but has the problem that a sufficient refractive index difference cannot be obtained unless one of the unreacted substances is sufficiently removed. The fourth method is designed with a gate in which a reaction accompanied by a change in refractive index occurs only when light of two wavelengths is applied, and it is also important in terms of storage stability of the material in the unrecorded state or in the recorded state. It's advantageous. However, the reality is that recording sensitivity sufficient for practical use has not been achieved.
本発明者は、屈折率差を有するパターンの簡便な作成方
法を発明するに当たり、前記の従来の技術の3番目の方
法、即ち2種類の物質を光により反応させることにより
屈折率が低い方の物質の屈折率を高くするという方法に
注目した。さらに屈折率変化を伴う反応のために必要な
エネルギーとパターン記録のための信号エネルギーを分
離することにより、より多くの記録手段によってパター
ン信号(情報)の記録が行うことが出来ると考え、本発
明に至った。In inventing a simple method for creating a pattern having a difference in refractive index, the present inventors decided to use the third method of the prior art described above, that is, to make the one with the lower refractive index by causing two types of substances to react with light. We focused on the method of increasing the refractive index of materials. Furthermore, by separating the energy required for a reaction accompanied by a change in refractive index and the signal energy for recording a pattern, we believe that pattern signals (information) can be recorded by more recording means, and we have invented the present invention. reached.
本発明は、作成方法が簡便で、未記録状態の像形成体に
感熱・感光性がなく保存安定性に優れ、熱、電流、光な
どの放射線を記録エネルギーとして用いることにより、
多くの記録手段で記録が行える屈折率差を有するパター
ンの形成方法及びこれに供する転写体と像形成体を提供
することを目的とする。The present invention has a simple manufacturing method, has no heat or photosensitivity in the unrecorded image forming body, has excellent storage stability, and uses radiation such as heat, electric current, and light as recording energy.
It is an object of the present invention to provide a method for forming a pattern having a refractive index difference that can be recorded by many recording means, and a transfer body and an image forming body used therefor.
課題を解決するための手段
反応性官能基を有する化合物Aを含む層または基材から
なる像形成体に対して、化合物Aと反応することにより
化合物Aの屈折率を変化させる化合物Bを含む転写体を
密着させ、光等の電磁波や熱のエネルギーにより転写体
から化合物Bを像形成体へ昇華または拡散により転写し
、化合物Aと反応させることによって屈折率変化を生じ
させる。Means for Solving the Problems Transfer containing a compound B that changes the refractive index of the compound A by reacting with the compound A to an image forming body consisting of a layer or base material containing the compound A having a reactive functional group. The bodies are brought into close contact with each other, and compound B is transferred from the transfer body to the image forming body by sublimation or diffusion using electromagnetic waves such as light or thermal energy, and is caused to react with compound A, thereby causing a change in the refractive index.
作用
反応性官能基ををする化合物Aを含む層が構成された像
形成体または反応性官能基を有する化合物Aを含む基材
自体が像形成体であるような像形成体の反応性官能基を
有する化合物Aを含む層または基材の部分に対して、化
合物Aと反応することにより化合物Aの屈折率を変化さ
せる化合物Bを含む転写体の、化合物Bを含む部分を密
着させ、転写体の像形成体に密着させた側の反対方法か
ら光等の電磁波や熱のエネルギーを加えると、昇華転写
型感熱記録方法と同様に転写体から化合物Bは像形成体
へ昇華または拡散により転写し、さらに転写記録時の熱
エネルギーや新たに像形成体に加える熱、光など放射線
のエネルギーにより化合物Aと反応させることによって
屈折率変化を生じさせることが出来る。Reactive functional group of an image forming body in which a layer containing a compound A having a reactive functional group or a substrate containing a compound A having a reactive functional group is itself an image forming body. A portion of a transfer body containing compound B, which changes the refractive index of compound A by reacting with compound A, is brought into close contact with a layer or a base material containing compound A, and the transfer body When energy such as electromagnetic waves such as light or heat is applied from the opposite direction to the side that is in close contact with the image forming body, compound B is transferred from the transfer body to the image forming body by sublimation or diffusion, similar to the sublimation transfer type thermal recording method. Further, a change in the refractive index can be caused by reacting with the compound A using thermal energy during transfer recording, heat newly applied to the image forming body, or radiation energy such as light.
実施例
本発明のパターン作成方法において、反応性官能基を有
する化合物Aと、化合物Aと反応することにより化合物
Aの屈折率を変化させる化合物Bとの反応は特に限定さ
れるものではない。屈折率が異なる化合物Aと化合物B
の反応を効率よく起こすことができるもので有ればよい
。化合物Aは、像形成体を構成するので、未反応の反応
性官能基がある状態でも安定であるものが好ましい。さ
らに層やフィルムを構成する上で都合がよい高分子化合
物が好ましい。また化合物Bとしては、化合物Aの反応
性官能基と反応するもので、かつ転写体内及び像形成体
内を拡散し易いものであればよい。具体的に説明するた
めに、化合物Aと化合物Bの反応に利用しうる例を挙げ
、更にその反応を利用する場合の化合物Aと化合物Bの
例を挙げる。Examples In the pattern creation method of the present invention, the reaction between compound A having a reactive functional group and compound B, which changes the refractive index of compound A by reacting with compound A, is not particularly limited. Compound A and compound B with different refractive indexes
Any material that can efficiently cause this reaction may be used. Since Compound A constitutes an image forming body, it is preferably stable even in the presence of unreacted reactive functional groups. Furthermore, polymer compounds are preferred since they are convenient for forming layers and films. Further, the compound B may be any compound that reacts with the reactive functional group of the compound A and can easily diffuse into the transfer body and the image forming body. For specific explanation, an example that can be used for the reaction of compound A and compound B will be given, and an example of compound A and compound B in which this reaction will be used will be given.
(1)オキセタン生成反応
芳香族カルボニル化合物とオレフィンによる光反応で、
下記のようなオキセタン環を存する化合物を生成する(
徳丸 克己著「有機光化学反応論」東京化学同人発行)
。(1) Oxetane production reaction A photoreaction between an aromatic carbonyl compound and an olefin,
Generates a compound containing an oxetane ring as shown below (
“Organic Photochemical Reaction Theory” by Katsumi Tokumaru, published by Tokyo Kagaku Dojin)
.
前述の特開昭60−186948号公報の感光性樹脂組
成物の反応もこれに含まれるが、反応の量子収率が比較
的高いので宵月である。The reaction of the photosensitive resin composition disclosed in JP-A No. 60-186948 mentioned above is also included in this category, but it is only a matter of time since the quantum yield of the reaction is relatively high.
化合物Aの例としては、透明性の高い物質が好ましく、
化合物Aが炭素−炭素2重結合を有する化合物になる場
合には特開昭60−186948号公報の特許請求の範
囲に記載されているような、(メタ)アクリル酸3,3
−ジメチルアリルエステルの単独または共重合体のほか
(メタ)アクリル酸の3−メチル−3−ブテニルエステ
ル、3−メチルアリルエステル、アリルエステル、2−
メチルアリルエステル、3−へブテニルエステル、3.
3−ジエチルアリルエステル、ジシクロペンテニルエス
テル、2−フルフリルエステルあるいはジビニルベンゼ
ンなどの単独重合体や他のビニルモノマーとの共重合体
がある。化合物Bとしては、置換もしくは非置換のベン
ズアルデヒド、アセトフェノン、ベンゾフェノン、1−
1または2−ナフトアルデヒド、1または2−ナフチル
メチルケトンまたは2−ナフチルフェニルケトンがある
。オキセタン生成反応の量子収率の点で好ましいのは置
換もしくは非置換のベンズアルデヒドまたはベンゾフェ
ノンである。さらに置換もしくは非置換のベンズアルデ
ヒド類として4−フルオロベンズアルデヒド、2−.3
−または4−クロロベンズアルデヒド、2−.3−また
は4−ブロモベンズアルデヒド、2. 4−、 3.
4−または3゜5−ジクロロベンズアルデヒド、2.
4−、 3゜4−または3.5−ジブロモベンズアルデ
ヒド、4−メチルベンズアルデヒド
ピルベンズアルデヒド、4−シクロへキシルベンズアル
デヒド、2−.3−または4−メトキシベンズアルデヒ
ド、3,4−ジメトキシベンズアルデヒド3. 4.
5−)ジメトキシベンズアルデヒド、3−フェノキシベ
ンズアルデヒド、3−ヒドロキシベンズアルデヒド、フ
タルアルデヒドあるいは4−シアノベンズアルデヒドな
どなどがある。As an example of compound A, a highly transparent substance is preferable,
When compound A is a compound having a carbon-carbon double bond, (meth)acrylic acid 3,3 as described in the claims of JP-A-60-186948 is used.
- In addition to dimethyl allyl ester alone or copolymer, (meth)acrylic acid 3-methyl-3-butenyl ester, 3-methyl allyl ester, allyl ester, 2-
Methyl allyl ester, 3-hebutenyl ester, 3.
There are homopolymers of 3-diethyl allyl ester, dicyclopentenyl ester, 2-furfuryl ester, divinylbenzene, and copolymers with other vinyl monomers. Compound B includes substituted or unsubstituted benzaldehyde, acetophenone, benzophenone, 1-
These include 1- or 2-naphthaldehyde, 1- or 2-naphthylmethylketone or 2-naphthylphenylketone. Substituted or unsubstituted benzaldehyde or benzophenone is preferred in terms of quantum yield of the oxetane production reaction. Furthermore, substituted or unsubstituted benzaldehydes include 4-fluorobenzaldehyde, 2-. 3
- or 4-chlorobenzaldehyde, 2-. 3- or 4-bromobenzaldehyde, 2. 4-, 3.
4- or 3°5-dichlorobenzaldehyde, 2.
4-, 3°4- or 3.5-dibromobenzaldehyde, 4-methylbenzaldehyde pyrubenzaldehyde, 4-cyclohexylbenzaldehyde, 2-. 3- or 4-methoxybenzaldehyde, 3,4-dimethoxybenzaldehyde3. 4.
5-) Dimethoxybenzaldehyde, 3-phenoxybenzaldehyde, 3-hydroxybenzaldehyde, phthalaldehyde, 4-cyanobenzaldehyde, and the like.
また置換もしくは非置換のベンゾフェノンとして、ベン
ゾフェノン、2−.3−*たは4−クロロベンゾフェノ
ン、4.4’−ジクロロベンゾフェノン、2−.3−ま
たは4−ブロモベンゾフェノン、4−メチルベンゾフェ
ノン、4−プロピルベンゾフェノン、4−メトキシベン
ゾフェノンあるいは4−ベンゾイルベンゾフェノンなど
がある。In addition, substituted or unsubstituted benzophenones include benzophenone, 2-. 3-* or 4-chlorobenzophenone, 4,4'-dichlorobenzophenone, 2-. Examples include 3- or 4-bromobenzophenone, 4-methylbenzophenone, 4-propylbenzophenone, 4-methoxybenzophenone, and 4-benzoylbenzophenone.
(2)シクロブタン生成反応
3重項増感剤存在下でのオレフィン同士あるいは共役エ
ノンとオレフィンによる光反応で、下記のようなシクロ
ブタン環を有する化合物を生成する。また工重項からで
も励起錯体を経由してシクロブタン環を生成する化合物
もある(微光 克己著「有機光化学反応論」東京化学同
人発行)。(2) Cyclobutane production reaction A photoreaction between olefins or between a conjugated enone and an olefin in the presence of a triplet sensitizer produces the following compound having a cyclobutane ring. There are also compounds that generate cyclobutane rings even from heavy polymers via exciplexes (Katsumi Mitsumi, ``Organic Photochemical Reaction Theory,'' published by Tokyo Kagaku Dojin).
前述のオキセタン生成反応と同様に、m子板率が高い反
応もあり有用である。Similar to the above-mentioned oxetane production reaction, there is also a reaction with a high m-plate ratio, which is useful.
例えば励起錯体を経由する反応としては、芳香族ビニル
化合物同士のシクロブタン環生成反応があり、スチレン
、ビニルナフタレン、ビニルピレンやこれらの誘導体は
イオン化ポテンシャル、酸化還元電位などが適当な関係
にあればこのような反応をする。しかしながら、化合物
Aを含む記録像形成層は屈折率が低いことが望ましく、
化合物Aとしてはビニル基の残存したジビニルベンゼン
誘導体と(メタ)アクリル酸エステルの共重合体などが
好ましい。化合物Bとしてはジアルキルアミノ基やシア
ン基を有するビニルナフタレン、ビニルピレンなどがあ
る。For example, as a reaction via an exciplex, there is a cyclobutane ring formation reaction between aromatic vinyl compounds, and styrene, vinylnaphthalene, vinylpyrene, and their derivatives can undergo this type of reaction if their ionization potential, redox potential, etc. have an appropriate relationship. have a reaction. However, it is desirable that the recording image forming layer containing compound A has a low refractive index.
As the compound A, a copolymer of a divinylbenzene derivative with residual vinyl groups and a (meth)acrylic acid ester is preferable. Examples of the compound B include vinylnaphthalene and vinylpyrene having a dialkylamino group or a cyan group.
(3)ディールスφアルダー反応
炭素−炭素1重結合を介して炭素−炭素2重結合を有す
る共役ジエンとオレフィンは熱または光によってシクロ
ヘキセン環を生成するディールス・アルダ−反応を起こ
す。(3) Diels-Alder reaction A conjugated diene and an olefin having a carbon-carbon double bond through a carbon-carbon single bond undergo a Diels-Alder reaction to form a cyclohexene ring by heat or light.
記録時に発生する熱により、化合物Bの転移の他、化合
物Aと化合物Bの反応も起こり、有用である。The heat generated during recording causes not only the transition of compound B but also the reaction of compound A and compound B, which is useful.
化合物Aとしては置換または非置換のポリアセチレンな
どがあり、化合物Bとしてはビニル基を有する芳香族化
合物がある。ポリアセチレン類は安定性が良くなく、残
存2重結合は少ない方が好ましい。またポリアセチレン
類は共役2重結合鎖を有して可視域に吸収を有するので
、用途上不適当な場合にはブタジェン構造を有する置換
基を持つ化合物の方が好ましい。Examples of the compound A include substituted or unsubstituted polyacetylene, and examples of the compound B include aromatic compounds having a vinyl group. Polyacetylenes do not have good stability, and it is preferable that the number of residual double bonds is small. Furthermore, since polyacetylenes have a conjugated double bond chain and have absorption in the visible range, compounds having a substituent having a butadiene structure are preferable if it is inappropriate for the purpose.
上記のような化合物Aを含む層または基材からなる像形
成体としては種々の形態が考えられるが、主に、
1)化合物Aを含む基材1だけの構成(第1図)2)化
合物Aを含まない基材3上に化合物Aを含む記録像形成
層2を少なくとも有する構成(第2図)
3)化合物Aを含む基材1上に化合物Aを含む記録像形
成層2を少なくとも有する構成(第3図)
が考えられる。像形成体が、光を透過させることにより
、光学素子等として機能する場合には少なくとも必要な
波長については透明でなければならない。そのため、化
合物Aを含むところの像形成体を構成する層または基材
は、必要な波長については透明でなければならないが、
化合物A以外の物質は特に限定されたものではない。化
合物Bの拡散を容易にするためにはガラス転移温度或は
熱変形温度が余り高くない方が好ましく、40〜150
℃程度の高分子組成物がよい。さらに化合物Aと化合物
Bの反応時に架橋硬化させることを考えて、1.3−ジ
オキソラン環などの反応性官能基を有する化合物(化合
物Aであってもよい)が存在する場合には、この限りで
はない。また化合物Aを含まない基材の場合には、像形
成体に耐熱性を付与するために、高分子組成物ばがりで
なくガラス等を用いてもよい。基材の上に像形成層を設
ける場合には像形成層を設けるための塗液が必要である
が、用いる溶剤としては化合物A及び化合物B以外の高
分子組成物を溶解するものであれば良いが、例えばこれ
らの物質がアクリル系である場合にはベンゼン、トルエ
ン、メチルエチルケトン、モノクロルベンゼン、ジクロ
ロメタンなどを用いることができる。像形成層の厚みは
均一であることが望ましいが、スピンコーティング法に
より良好に形成できる。Various forms can be considered for the image forming body consisting of a layer or a base material containing compound A as described above, but mainly 1) a structure of only base material 1 containing compound A (Fig. 1) 2) compound Structure having at least a recorded image forming layer 2 containing compound A on a base material 3 not containing A (FIG. 2) 3) At least having a recorded image forming layer 2 containing compound A on a base material 1 containing compound A The following configuration (Figure 3) can be considered. When the image forming body functions as an optical element or the like by transmitting light, it must be transparent at least for necessary wavelengths. Therefore, the layer or base material constituting the image forming body that contains Compound A must be transparent for the necessary wavelengths;
Substances other than compound A are not particularly limited. In order to facilitate the diffusion of compound B, it is preferable that the glass transition temperature or heat distortion temperature is not too high, and is 40 to 150.
A polymer composition with a temperature of about ℃ is preferable. Furthermore, in consideration of crosslinking and curing during the reaction of Compound A and Compound B, if a compound (which may be Compound A) having a reactive functional group such as a 1,3-dioxolane ring is present, this limit may be applied. isn't it. Further, in the case of a base material that does not contain Compound A, in order to impart heat resistance to the image forming body, not only a polymer composition but also glass or the like may be used. When providing an image forming layer on a base material, a coating liquid is required for providing the image forming layer, but the solvent used may be one that dissolves the polymer composition other than Compound A and Compound B. For example, when these substances are acrylic, benzene, toluene, methyl ethyl ketone, monochlorobenzene, dichloromethane, etc. can be used. Although it is desirable that the thickness of the image forming layer be uniform, it can be formed satisfactorily by spin coating.
転写体は基材4の片面に転写材層5を有する構成が好ま
しい(第4図)。基材は転写材層を支持するものであり
、ポリエステル、ポリイミド、アラミド、セロハンなど
のフィルムやポリスチレン、PMMA、 ポリカーボ
ネート、ガラスなどの板状の材料を用いることができる
。サーマルヘッドで記録するために耐熱滑性層が設けて
あったり、通電記録ヘッドあるいは誘導加熱ヘッドでき
ろくするために導電層または抵抗層などが設けてあって
もよい。さらに光記録を行うために基材4の転写材層5
側に光エネルギーを熱に替えるための光吸収層6があっ
てもよい(第5図)。転写材層は少なくとも転写材(す
なわち化合物B)と結着材から構成される。転写材は上
述の通りであり、結着材には昇華転写型感熱記録体に用
いられるような結着材を用いることができる。すなわち
セルロース系、アクリル酸系、デンプン系などの水溶性
樹脂、アクリル樹脂、ポリフェニレンオキサイド、ポリ
サルホン、ポリエーテルサルホン
ルロース、アセチルセルロースなどの有機溶剤するいは
水に可溶性の樹脂などを挙げることができるが記録感度
及び転写体の保存安定性の点で、熱変形温度(ASTM
D848)が70〜150℃のものが優れている。The transfer body preferably has a structure in which a transfer material layer 5 is provided on one side of a base material 4 (FIG. 4). The base material supports the transfer material layer, and may be a film made of polyester, polyimide, aramid, cellophane, etc., or a plate-shaped material such as polystyrene, PMMA, polycarbonate, glass, etc. A heat-resistant lubricant layer may be provided for recording with a thermal head, or a conductive layer or a resistive layer may be provided to make it easier to use with an electrically conductive recording head or an induction heating head. Transfer material layer 5 of base material 4 for further optical recording
There may be a light absorption layer 6 on the side for converting light energy into heat (FIG. 5). The transfer material layer is composed of at least a transfer material (ie, compound B) and a binding material. The transfer material is as described above, and the binder may be a binder used in sublimation transfer type thermal recording materials. Namely, water-soluble resins such as cellulose-based, acrylic acid-based, and starch-based resins, organic solvent-soluble or water-soluble resins such as acrylic resin, polyphenylene oxide, polysulfone, polyethersulfone luulose, and acetylcellulose can be mentioned. In terms of recording sensitivity and storage stability of transfer material, heat distortion temperature (ASTM
D848) of 70 to 150°C is excellent.
よって、ポリスチレン、ポリビニルブチラール、ポリカ
ーボネート、メタクリル樹脂、アクリロニトリル・スチ
レン共重合体、ポリエステル樹脂、ウレタン樹脂、塩素
化ポリエチレン、塩素化ポリプロピレンなどが好ましい
。また転写材層には、可塑剤、記録後の像形成体との剥
離をよくする等の目的の滑剤や界面活性剤等を含んでい
てもよい。そして前記の転写材・結着材などを含んだ転
写材層を構成するための塗液を調製するに当り、5使用
する溶剤としては、メタノール、エタノール、プロパツ
ール、ブタノールナトのアルコール類、メチルセロソル
ブ、エチルセロソルブなどのセロソルブ類、ベンゼン、
トルエン、キシレンなどの芳香族類、酢酸ブチルなどの
エステル類、アセトン、2−ブタノン、シクロヘキサノ
ンなどのケトン類、N. N−ジメチルホルムアミド
などの窒素化合物類、ジクロルメタン、クロルベンゼン
、クロロホルムなどのハロゲン化炭化水素などが使■で
きるが、水溶性または水分散性の水性樹脂を結着材とし
て用いる場合には、水または水と上記の溶剤を混合して
使用することもできる。更に、塗液をフィルム状の基材
上に塗布する方法としては、リバースロールコータ−、
グラビアコーター、ロッドコーター、フレキンコーター
、エアドクタコーターなどを使用して実施することがで
き、また板状の基材上に塗布する方法としてはスピンコ
ーティングが代表的テある。Therefore, polystyrene, polyvinyl butyral, polycarbonate, methacrylic resin, acrylonitrile-styrene copolymer, polyester resin, urethane resin, chlorinated polyethylene, chlorinated polypropylene, and the like are preferred. The transfer material layer may also contain a plasticizer, a lubricant, a surfactant, etc. for the purpose of improving peeling from the image forming body after recording. In preparing the coating liquid for constituting the transfer material layer containing the above-mentioned transfer material/binder, etc., the solvents used are methanol, ethanol, propatool, alcohols such as butanol, methyl Cellosolves such as cellosolve and ethyl cellosolve, benzene,
Aromatics such as toluene and xylene, esters such as butyl acetate, ketones such as acetone, 2-butanone and cyclohexanone, N. Nitrogen compounds such as N-dimethylformamide, halogenated hydrocarbons such as dichloromethane, chlorobenzene, and chloroform can be used, but when using water-soluble or water-dispersible water-based resins as a binder, water or It is also possible to use a mixture of water and the above-mentioned solvents. Furthermore, as a method for applying the coating liquid onto a film-like base material, a reverse roll coater,
It can be carried out using a gravure coater, a rod coater, a flexible coater, an air doctor coater, etc. Spin coating is a typical method for coating on a plate-shaped base material.
次に更に詳細な例を挙げて説明する。Next, a more detailed example will be given and explained.
実施例1
まず3−メチル−2−ブテノ−ルー1 11gとトリエ
チルアミン 15g及びジオキサン 200gを500
mlの3つロフラスコにいれ、撹拌しながら塩化メタク
ロイル 16gとジオキサン50gの混合液を30分か
けて滴下した。さらに30分撹拌放置した後、これに1
00gの水をいれて撹拌し、これらの反応液を濾過した
。さらに有機層を抽出した後、炭酸水素ナトリウム水溶
液、ついで水で洗浄した。これをエバポレーターにてジ
オキサンを除去した後、減圧蒸留を2回繰り返して 2
0gのメタクリル酸3.3−ジメチルアリルエステルを
得た。これによって得た5gのメタクリル酸3,3−ジ
メチルアリルエステルと15gのメタクリル酸メチル、
そして0.1gのAIBNを200gのベンゼンに溶解
し、窒素雰囲気下でラジカル重合させて15gのメタク
リル酸3,3−ジメチルアリルエステルとメタクリル酸
メチルとの共重合体を得た。この共重合体をジクロロメ
タンに溶解させて、塗液とした。この塗液を用いてガラ
ス基板上にスピンコードし、基材上に像形成層を設けた
像形成体IAとした。Example 1 First, 11 g of 3-methyl-2-buteno-1, 15 g of triethylamine, and 200 g of dioxane were mixed into 500 g of
A mixed solution of 16 g of methacroyl chloride and 50 g of dioxane was added dropwise to the mixture over 30 minutes while stirring. After stirring for another 30 minutes, add 1
00 g of water was added and stirred, and these reaction solutions were filtered. After further extracting the organic layer, it was washed with an aqueous sodium hydrogen carbonate solution and then with water. After removing dioxane from this using an evaporator, vacuum distillation was repeated twice.
0 g of methacrylic acid 3,3-dimethylallyl ester was obtained. 5 g of methacrylic acid 3,3-dimethylallyl ester and 15 g of methyl methacrylate obtained thereby,
Then, 0.1 g of AIBN was dissolved in 200 g of benzene, and radical polymerization was performed in a nitrogen atmosphere to obtain 15 g of a copolymer of 3,3-dimethylallyl methacrylate and methyl methacrylate. This copolymer was dissolved in dichloromethane to prepare a coating liquid. This coating liquid was used to spin code onto a glass substrate to obtain an image forming body IA having an image forming layer provided on the base material.
次にベンゾフェノン1gとブチラール樹脂(漬水化学
エスレックB BX−1)2gをトルエン21g1
メチルエチルケトン9gに溶解して塗液IBとした。ま
たこれを 倍に希釈した塗液を塗液IB’ とした。記
録及びその結果については、他の実施例と併せて後述す
る。Next, 1 g of benzophenone and butyral resin (Tsukusui Kagaku)
Eslec B BX-1) 2g to toluene 21g1
It was dissolved in 9 g of methyl ethyl ketone to prepare coating liquid IB. Further, a coating liquid diluted to twice this amount was designated as coating liquid IB'. The recording and its results will be described later along with other examples.
実施例2
塩化メタクロイルとフルフリル アルコールを原料とし
て実施例1と同様の操作でメタクリル酸フルフリルエス
テルを得た。メタクリル酸フルフリルエステル5g1
メタクリル酸[2−メチル−2−(2−オキソプロピル
)−1,3−ジオキソラン−4−イル]エステル2g1
メタクリル酸メチル10gとアクリル酸エチル3gを
同様にラジカル重合して15gの4元共重合体を得た。Example 2 Methacroyl chloride and furfuryl methacrylic acid furfuryl ester was obtained in the same manner as in Example 1 using alcohol as raw materials. Furfuryl methacrylate ester 5g1
Methacrylic acid [2-methyl-2-(2-oxopropyl)-1,3-dioxolan-4-yl] ester 2g1
10 g of methyl methacrylate and 3 g of ethyl acrylate were similarly radically polymerized to obtain 15 g of a quaternary copolymer.
これを熱プレス成形して11厚みの板を得た。これを像
形成体2Aとした。This was hot press molded to obtain a plate with a thickness of 11. This was designated as image forming body 2A.
次に実施例1と同様にして4−ブロムベンズアルデヒド
を化合物Bとする塗液2B12B′を得た。Next, a coating liquid 2B12B' containing 4-bromobenzaldehyde as compound B was obtained in the same manner as in Example 1.
実施例3
p−ジビニルベンゼン4gとメタクリル酸メチル16g
を実施例1と同様にラジカル重合してジビニルベンゼン
の未反応ビニル基の残る共重合体13gを得た。これを
トルエンに溶解し、211m厚のPMMAキャスト板(
協和ガス化学工業(株)バラクラス)上にスピンコーテ
ィングして像形成体3Aとした。Example 3 4 g of p-divinylbenzene and 16 g of methyl methacrylate
was subjected to radical polymerization in the same manner as in Example 1 to obtain 13 g of a copolymer in which unreacted vinyl groups of divinylbenzene remained. This was dissolved in toluene and a 211m thick PMMA cast plate (
An image-forming body 3A was obtained by spin coating on Kyowa Gas Kagaku Kogyo Co., Ltd. (Balaclas).
次に2−ビニルナフタレン1gとAS樹脂(電気化学工
業(株)デンカスチロール A S −S U)2gを
トルエン21g、メチルエチルケトン9gに溶解し、2
−ビニルナフタレンを化合物Bとする塗液3Bとした。Next, 1 g of 2-vinylnaphthalene and 2 g of AS resin (Denka Styrol AS-SU, manufactured by Denki Kagaku Kogyo Co., Ltd.) were dissolved in 21 g of toluene and 9 g of methyl ethyl ketone.
- Coating liquid 3B containing vinylnaphthalene as compound B was prepared.
さらにこれを 倍に希釈したものを塗液3B’ とした
。This was further diluted to 20% and designated as coating liquid 3B'.
実施例4
ポリフェニルアセチレン 10重量部とPMMA90重
量部をトルエンに溶解し、ガラス上にスピンコーティン
グして像形成体4Aとした。Example 4 10 parts by weight of polyphenylacetylene and 90 parts by weight of PMMA were dissolved in toluene and spin coated onto glass to obtain an image forming member 4A.
次に実施例3と同様に2−ビニルナフタレンを化合物B
とする塗液4B並びに塗液4B”を作成した。Next, in the same manner as in Example 3, 2-vinylnaphthalene was added to compound B.
Coating liquid 4B and coating liquid 4B'' were prepared.
実施例1〜4の記録及び結果
(記録方法1)
光硬化性樹脂及びシリカ微粒子からなる耐熱滑性層を設
けた4μmのPETフィルムの耐熱滑性層を設けていな
い面に実施例1〜4の塗液1〜4Bをワイヤーバーで塗
布し、約1μmの転写材層を構成して転写体1〜4Cと
した。これら転写体の転写材層と像形成体の像形成層が
接するように重ね合わせ(像形成層を有しない像形成体
2Aの場合にはどちら側でも良い)、転写体の耐熱滑性
層の側からサーマルヘッドによって、下記の条件にて記
録を行った。Recording and Results of Examples 1 to 4 (Recording Method 1) Examples 1 to 4 were recorded on the side of a 4 μm PET film provided with a heat resistant slip layer made of a photocurable resin and silica fine particles, on which the heat resistant slip layer was not provided. Coating liquids 1 to 4B were applied using a wire bar to form a transfer material layer of about 1 μm to form transfer bodies 1 to 4C. The transfer material layer of the transfer body and the image forming layer of the image forming body are overlapped so that they are in contact with each other (in the case of the image forming body 2A which does not have an image forming layer, either side is fine), and the heat-resistant slipping layer of the transfer body is Recording was performed from the side using a thermal head under the following conditions.
サーマルヘッド記録条件
主走査の線密度 : 4ドツト/■■副走査の線密度
二 8ドツト/關
記録電力 : 0.7W/dotヘツドの加
熱時間 :8ms/dot
副走査方向に1ラインだけ記録
記録後の像形成体1〜4Aの各々について、300W高
圧水銀灯を30秒間照射したあと、記録ライン上にプリ
ズムを2個距離を離して置き、一方のプリズムからヘリ
ウム・ネオンレーザ−光を入射させると、どの像形成体
についても他方のプリズムから記録ラインの先導波路を
導波してきた光が出射するのを観測できた。また、像形
成層に混入した異物による乱反射から、光が記録ライン
部分だけを導波していることも確認できた。Thermal head recording conditions Main scanning linear density: 4 dots/■■ Sub-scanning linear density 28 dots/corresponding Recording power: 0.7 W/dot Head heating time: 8 ms/dot Recording only one line in the sub-scanning direction After irradiating each of the subsequent image forming bodies 1 to 4A with a 300W high-pressure mercury lamp for 30 seconds, two prisms were placed at a distance from each other on the recording line, and helium-neon laser light was incident from one of the prisms. For each image forming body, it was possible to observe that the light that had been guided through the leading waveguide of the recording line was emitted from the other prism. Furthermore, it was confirmed that the light was guided only in the recording line portion due to diffuse reflection caused by foreign matter mixed in the image forming layer.
(記録方法2)
カーボン含有のアラミドフィルム(厚み8μm1シ一ト
抵抗約IKΩ/口)に実施例1〜4の塗液1〜4Bをワ
イヤーバーで塗布し、約1μmの転写材層を構成して、
転写体1〜4Dとした。記録方法1と同様にして転写体
と像形成体を重ね合わせ、転写体のフィルム側からライ
ン型通電ヘッドを用いて、下記の条件で記録した。(Recording method 2) Coating liquids 1 to 4B of Examples 1 to 4 were applied with a wire bar to a carbon-containing aramid film (thickness: 8 μm, 1 sheet resistance: approximately IKΩ/hole) to form a transfer material layer of approximately 1 μm. hand,
Transfer bodies 1 to 4D were used. The transfer member and the image forming member were placed one on top of the other in the same manner as in Recording Method 1, and recording was performed from the film side of the transfer member using a line-type current-carrying head under the following conditions.
通電ヘッド記録条件
主走査の線密度 : 1oドツト/ am副走査の線
密度 : 2oドツト/龍印加電圧 : 5
0V
印加パルス幅 = 80μs
副走査方向に1ラインだけ記録
記録方法1の場合と同様の処理をした後、同様の先導波
の実験を行ったところ、どの像形成体でも先導波路とし
て機能していることが確認できた。Current-carrying head recording conditions Linear density of main scanning: 1o dots/am Linear density of sub-scanning: 2o dots/dragon Applied voltage: 5
0V Applied pulse width = 80μs Recording only one line in the sub-scanning direction After performing the same processing as in recording method 1, a similar experiment with a leading wave was conducted, and it was found that every image forming body functioned as a leading wave path. This was confirmed.
(記録方法3)
厚さ1,1■、外径130−w、内径15m−のガラス
基板にカーボンブラックを分散させたエチルセルロース
溶液をスピンコードし、2μmの光吸収層を設けた。さ
らに実施例1〜4の塗液1〜4B’をスピンコードして
1μmの転写材層を設けて転写体1〜4Eとした。予め
外径130−m、内径15■に加工した像形成体を記録
像形成層と転写体の転写材層が重なるように転写体に密
着させた。これを光デイスク用光記録デツキにて、線速
度10m/s16mL 径方向送りピッチ2μm1無変
調で記録した。記録後転写体と像形成体を剥離させ、像
形成体に300W高圧水銀灯で30秒間光照射した。(Recording method 3) An ethyl cellulose solution in which carbon black was dispersed was spin-coded onto a glass substrate having a thickness of 1.1 mm, an outer diameter of 130 mm, and an inner diameter of 15 m, to provide a light absorption layer of 2 μm. Furthermore, coating liquids 1 to 4B' of Examples 1 to 4 were spin-coded to provide a transfer material layer of 1 μm to prepare transfer bodies 1 to 4E. An image forming body previously processed to have an outer diameter of 130 mm and an inner diameter of 15 mm was brought into close contact with the transfer body so that the recorded image forming layer and the transfer material layer of the transfer body overlapped. This was recorded on an optical recording deck for optical discs at a linear velocity of 10 m/s, 16 mL, and a radial feed pitch of 2 μm, with no modulation. After recording, the transfer member and the image forming member were separated, and the image forming member was irradiated with light for 30 seconds using a 300 W high pressure mercury lamp.
これらの像形成体に0.5mWのヘリウム・ネオンレー
ザ−を垂直入射させたところ、回折光が観測でき、回折
格子などの光学素子の作成が可能なことが判った。When a 0.5 mW helium-neon laser was vertically incident on these image forming bodies, diffracted light could be observed, and it was found that it was possible to create optical elements such as diffraction gratings.
発明の効果
本発明に基づく屈折率差を有するパターンの作成方法は
、反応性官能基を佇する化合物Aを含む層または基材か
らなる像形成体に対して、化合物Aと反応することによ
り化合物Aの屈折率を変化させる化合物Bを含む転写体
を密着させ、光等の電磁波や熱のエネルギーにより転写
体がら化合物Bを像形成体へ昇華または拡散により転写
し、化合物Aと反応させることによって屈折率変化を生
じさせるため、作成方法が簡便で、未記録状態の像形成
体に感熱・感光性がなく保存安定性に優れ、熱、電流、
光などの放射線を記録エネルギーとして用いることによ
り、多くの記録手段で記録が行える。Effects of the Invention The method for creating a pattern having a refractive index difference based on the present invention provides a method for forming a pattern having a refractive index difference by reacting with the compound A on an image forming body consisting of a layer or a base material containing the compound A in which a reactive functional group is present. By bringing a transfer body containing compound B that changes the refractive index of A into close contact with each other, and transferring compound B from the transfer body to an image forming body by sublimation or diffusion using electromagnetic waves such as light or thermal energy, and reacting with compound A. Because the refractive index changes, the preparation method is simple, and the unrecorded image forming body has no heat or photosensitivity and has excellent storage stability.
By using radiation such as light as recording energy, recording can be performed with many recording means.
第1図〜第3図は、本発明の実施例における像形成体の
断面模式図、第4および第5図は本発明の実施例におけ
るパターン転写体の断面模式図である。
1・・・・・・化合物Aを含む基材、2・・・・・・化
合物Aを含む記録像形成層、3・旧・・化合物Aを含ま
ない基材、4・・・・・・基材、5・旧・・転写材層、
6・旧・・光吸収層。
代理人の氏名 弁理士 中尾敏男 はが1名第1図
第2図
第3図1 to 3 are schematic cross-sectional views of an image forming body in an embodiment of the present invention, and FIGS. 4 and 5 are schematic cross-sectional views of a pattern transfer body in an embodiment of the present invention. 1...Base material containing compound A, 2...Recording image forming layer containing compound A, 3. Old...Base material not containing compound A, 4... Base material, 5. Old transfer material layer,
6. Old...Light absorption layer. Name of agent: Patent attorney Toshio Nakao (1 person) Figure 1 Figure 2 Figure 3
Claims (5)
材からなる像形成体に対して、化合物Aと反応すること
により化合物Aの屈折率を変化させる化合物Bを含む転
写体を密着させ、光等の電磁波や熱のエネルギーにより
転写体から化合物Bを像形成体へ昇華または拡散により
転写し、化合物Aと反応させることによって屈折率変化
を生じさせることを特徴とする屈折率差を有するパター
ンの作成方法。(1) A transfer body containing a compound B that changes the refractive index of the compound A by reacting with the compound A is brought into close contact with an image forming body consisting of a layer or a base material containing a compound A having a reactive functional group. , has a refractive index difference characterized by causing a change in refractive index by transferring Compound B from the transfer body to the image forming body by sublimation or diffusion using electromagnetic waves such as light or heat energy, and causing a change in the refractive index by reacting with Compound A. How to create a pattern.
1に記載の屈折率差を有するパターンの作成方法。 (イ)化合物Aは、置換または非置換のアリル基と(メ
タ)アクリル酸とのエステルの単独重合体あるいは、置
換または非置換のアリル基と(メタ)アクリル酸とのエ
ステルを5重量%以上含む他のビニルモノマーとの共重
合体であって、 かつ重合体中に置換または非置換のアリル基の二重結合
が残存している(共)重合体 (ロ)化合物Bは、非置換または置換基を有するベンズ
アルデヒド、ベンゾフェノンまたはナフチルフェニルケ
トン(2) The method for creating a pattern having a refractive index difference according to claim 1, wherein compound A and compound B are the following compounds. (a) Compound A is a homopolymer of an ester of a substituted or unsubstituted allyl group and (meth)acrylic acid, or an ester of a substituted or unsubstituted allyl group and (meth)acrylic acid at 5% by weight or more. Compound B is a copolymer (co)polymer with other vinyl monomers containing a double bond of a substituted or unsubstituted allyl group, and in which a double bond of a substituted or unsubstituted allyl group remains. Benzaldehyde, benzophenone or naphthylphenyl ketone with substituents
1に記載の屈折率差を有するパターンの作成方法。 (イ)化合物Aは、(メタ)アクリル酸の3,3−ジメ
チルアリルエステルの単独重合体または(メタ)アクリ
ル酸の3,3−ジメチルアリルエステルを5重量%以上
含む他のビニルモノマーとの共重合体であって、かつ重
合体中に3,3−ジメチルアリル基の二重結合が残存し
ている(共)重合体 (ロ)化合物Bは、非置換または置換基を有するベンズ
アルデヒド、ベンゾフェノンまたはナフチルフェニルケ
トン(3) The method for creating a pattern having a refractive index difference according to claim 1, wherein compound A and compound B are the following compounds. (a) Compound A is a homopolymer of 3,3-dimethylallyl ester of (meth)acrylic acid or a polymer containing 3,3-dimethylallyl ester of (meth)acrylic acid with another vinyl monomer containing 5% by weight or more. (2) Compound B is a copolymer in which a double bond of 3,3-dimethylallyl group remains in the polymer. or naphthylphenyl ketone
成方法に供される、反応性官能基を有する化合物Aを含
む層または基材からなる像形成体。(4) An image forming body comprising a layer or a base material containing a compound A having a reactive functional group, which is subjected to the method for creating a pattern having a refractive index difference according to claim 1.
成方法に供される、化合物Aと反応することにより化合
物Aの屈折率を変化させる化合物Bを含む転写記録体。(5) A transfer recording material containing a compound B that changes the refractive index of the compound A by reacting with the compound A, which is used in the method for creating a pattern having a refractive index difference according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63133272A JPH081487B2 (en) | 1988-05-31 | 1988-05-31 | METHOD FOR CREATING OPTICAL ELEMENT HAVING PATTERN WITH DIFFERENTIAL INDEX, PATTERN TRANSFER PRODUCT AND IMAGE FORMING PRODUCT |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63133272A JPH081487B2 (en) | 1988-05-31 | 1988-05-31 | METHOD FOR CREATING OPTICAL ELEMENT HAVING PATTERN WITH DIFFERENTIAL INDEX, PATTERN TRANSFER PRODUCT AND IMAGE FORMING PRODUCT |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01302307A true JPH01302307A (en) | 1989-12-06 |
JPH081487B2 JPH081487B2 (en) | 1996-01-10 |
Family
ID=15100749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63133272A Expired - Fee Related JPH081487B2 (en) | 1988-05-31 | 1988-05-31 | METHOD FOR CREATING OPTICAL ELEMENT HAVING PATTERN WITH DIFFERENTIAL INDEX, PATTERN TRANSFER PRODUCT AND IMAGE FORMING PRODUCT |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH081487B2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5969706A (en) * | 1982-10-14 | 1984-04-20 | Nippon Sheet Glass Co Ltd | Production of synthetic resin optical circuit |
JPS59204803A (en) * | 1983-05-09 | 1984-11-20 | Nippon Sheet Glass Co Ltd | Manufacture of optical circuit of synthetic resin |
JPS60166946A (en) * | 1983-10-14 | 1985-08-30 | Kyowa Gas Chem Ind Co Ltd | Photosensitive resin composition and formation of pattern having refractive index difference by using it |
-
1988
- 1988-05-31 JP JP63133272A patent/JPH081487B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5969706A (en) * | 1982-10-14 | 1984-04-20 | Nippon Sheet Glass Co Ltd | Production of synthetic resin optical circuit |
JPS59204803A (en) * | 1983-05-09 | 1984-11-20 | Nippon Sheet Glass Co Ltd | Manufacture of optical circuit of synthetic resin |
JPS60166946A (en) * | 1983-10-14 | 1985-08-30 | Kyowa Gas Chem Ind Co Ltd | Photosensitive resin composition and formation of pattern having refractive index difference by using it |
Also Published As
Publication number | Publication date |
---|---|
JPH081487B2 (en) | 1996-01-10 |
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