JPH01302195A - Positioning apparatus - Google Patents
Positioning apparatusInfo
- Publication number
- JPH01302195A JPH01302195A JP63131358A JP13135888A JPH01302195A JP H01302195 A JPH01302195 A JP H01302195A JP 63131358 A JP63131358 A JP 63131358A JP 13135888 A JP13135888 A JP 13135888A JP H01302195 A JPH01302195 A JP H01302195A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- vibration
- nut
- vibrate
- respect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005540 biological transmission Effects 0.000 claims 2
- 230000000694 effects Effects 0.000 abstract description 6
- 230000005489 elastic deformation Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 description 5
- 230000005284 excitation Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Of Measuring And Other Instruments (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は微細な制御を必要とする半導体製造分野におい
て使用される移動ステージなどの位置決め装置に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a positioning device such as a moving stage used in the semiconductor manufacturing field which requires fine control.
［従来の技術］
従来、この種の移動ステージとしては駆動系としてボー
ルネジやりニアモータ等、また摺動部としてはエアベア
リングやニードルベアリング等を用いた種々の方式があ
るが、ステージ自体から発生する振動の影響とか、ステ
ージ停止時に発生するステージの振動を抑えるために、
低速駆動が強いられていた。それでも数μｍ以下に位置
決めをするには相当の時間を要し、このために摩擦負荷
等を与えていた。[Prior Art] Conventionally, there have been various methods for this type of moving stage, using a ball screw or near motor as a drive system, and an air bearing, a needle bearing, etc. as a sliding part, but vibrations generated from the stage itself In order to suppress the influence of stage vibrations that occur when the stage is stopped,
They were forced to drive at low speeds. Even so, it takes a considerable amount of time to position within a few micrometers, which causes frictional loads and the like.
［発明が解決しようとする問題点］
しかしながら従来例の一つの対応である摩擦負荷にたよ
る方法では、摩擦抵抗のため起動時特性の劣化、またス
テイクスリップおよび弾性変形などによる振動の発生お
よび停止時の微振動の誘発などで必ずしも良い結果が得
られなかった。[Problems to be Solved by the Invention] However, with the method relying on frictional load, which is one of the conventional methods, frictional resistance causes deterioration of startup characteristics, and vibration generation and stoppage due to stake slip and elastic deformation. Good results were not always obtained due to the induction of minute vibrations during the process.
本発明は上記従来技術の欠点に鑑みなされたものであっ
て、位置決めすべ台可動部（ステージ）の移動開始時お
よび停止時の微振動に伴う駆動特性劣化、弾性変形等を
防止し、ステージを高速、高精度で円滑に位置決め制御
可能な位置決め装置の提供を目的とする。The present invention has been made in view of the above-mentioned drawbacks of the prior art, and it prevents deterioration of drive characteristics and elastic deformation caused by minute vibrations when the positioning slide movable part (stage) starts and stops moving. The purpose of the present invention is to provide a positioning device that can perform high-speed, high-precision, and smooth positioning control.
［問題点を解決するための手段および作用］本発明にお
いてはステージを駆動し、また位置を保持するための駆
動部と移動ステージ部との間に微振動を発生する振動素
子を配置し、移動ステージ部を駆動部および摺動部に対
して振動させることにより、微移動に伴なって生じる弾
性変形や不平衡状態、ヒステリシス等の影響を緩和しス
テージの動作特性を改良したものである。[Means and effects for solving the problem] In the present invention, a vibration element that generates minute vibrations is arranged between a drive section for driving the stage and holding the position, and a moving stage section. By vibrating the stage section relative to the drive section and sliding section, the effects of elastic deformation, unbalanced state, hysteresis, etc. that occur due to minute movements are alleviated, and the operating characteristics of the stage are improved.
［実施例］ 以下、実施例にもとづいて詳細な説明を行なう。[Example] A detailed explanation will be given below based on examples.
第１図は本発明に係る１軸移動ステージの実施例であり
、１は基板、２は駆動用モータ、３は駆動モータに直結
した送りネジ、４はナツト、５はナツトを保持するホル
ダ、６は左右一対に配置された加振素子、７はステージ
、８は基板１に対してステージ７を一方向に移動するガ
イドである。FIG. 1 shows an embodiment of a one-axis moving stage according to the present invention, in which 1 is a substrate, 2 is a drive motor, 3 is a feed screw directly connected to the drive motor, 4 is a nut, and 5 is a holder for holding the nut. 6 is a pair of vibration elements arranged on the left and right sides, 7 is a stage, and 8 is a guide for moving the stage 7 in one direction with respect to the substrate 1.
ステージの移動および動作は、駆動モータ２の回転が送
りネジ３に伝達され、ナツト４を介して直線駆動力をス
テージ７に与えステージ７はガイド８にそって移動する
。この時ナツト４のホルダ５は一端をピエゾ素子等の加
振素子６に結合され、加振素子６の他端はステージ７に
結合されている。In order to move and operate the stage, the rotation of the drive motor 2 is transmitted to the feed screw 3, and linear driving force is applied to the stage 7 via the nut 4, so that the stage 7 moves along the guide 8. At this time, the holder 5 of the nut 4 has one end coupled to a vibrating element 6 such as a piezo element, and the other end of the vibrating element 6 to a stage 7.
したがって、加振素子６による振動はホルダ５に対して
ステージ７を振動させるとともに、ナツト４を送りネジ
３に対して振動させ、また、送りネジ３も軸受９へのス
ラスト方向の振動となり。Therefore, the vibration caused by the vibration element 6 vibrates the stage 7 with respect to the holder 5, vibrates the nut 4 with respect to the feed screw 3, and the feed screw 3 also vibrates in the thrust direction toward the bearing 9.
更にモータ２を微回転振動させることになる。Furthermore, the motor 2 is caused to vibrate slightly.
このように加振素子６の振動は駆動部および摺動部の各
部に伝播する。In this way, the vibration of the vibrating element 6 propagates to each part of the drive section and the sliding section.
加振素子６の制御はステージ駆動制御装置（図示せず）
に連動して、別置された振動制御装置（図示せず）によ
り行なわれる。The vibration element 6 is controlled by a stage drive control device (not shown).
This is performed by a separately installed vibration control device (not shown) in conjunction with the above.
振動ｔｊＩＪａＩ装置による制御の１つはステージの移
動開始前に行ない、始動特性を向上することと、停止直
前より行ない、停止時のステージの振動を防止すること
である。One of the controls by the vibration tjIJaI device is to perform it before the stage starts moving to improve the starting characteristics, and to perform it immediately before stopping to prevent the stage from vibrating when the stage is stopped.
一般に、数μｍ以下の微小移動を行なうか位置決めを行
なう場合には、摺動部の抵抗によりステイクスリップや
ボールネジまたはニードルベアリングの弾性変形による
抵抗や振動の影響が大きくなる。また、抵抗の多い静止
摩擦から動摩擦への転換をはかる場合などには、微振動
が上記現象の緩和に効果的である。Generally, when performing minute movements of several micrometers or less or performing positioning, the effects of resistance and vibration due to stake slip and elastic deformation of ball screws or needle bearings become large due to resistance of sliding parts. In addition, when trying to change from static friction, which has a lot of resistance, to dynamic friction, microvibration is effective in alleviating the above phenomenon.
加振素子６への制御信号としては数ＫＨｚの一定周期、
一定振幅の０．１μｍ程度の微振動を継続して供給する
方法と、上記したようにステージの状況によりより効果
的な周期または振幅を定常状態より減衰方向に変調して
与える。The control signal to the excitation element 6 is a constant cycle of several KHz,
There is a method of continuously supplying fine vibrations of about 0.1 μm with a constant amplitude, and a method of modulating a more effective period or amplitude in the direction of attenuation than in a steady state depending on the stage conditions as described above.
すなわち、ステージ起動時には始動抵抗を少なくする方
向に、移動中は高周期振動により滑かな移動を幇助し、
停止時には高振幅から低振幅への減衰振動を行ないステ
ージ振動を抑制するように作動させる。一般的に加振素
子による振動周期は数千Ｈｚから数百Ｈｚ程度であり、
振勅撮幅は数μｍから０．０１μｍ程度である。In other words, when starting the stage, the starting resistance is reduced, and during movement, high-frequency vibration helps smooth movement.
When stopped, the stage is operated to suppress stage vibration by performing damped vibration from high amplitude to low amplitude. Generally, the vibration period of an excitation element is about several thousand Hz to several hundred Hz,
The scanning width is from several μm to about 0.01 μm.
これらは対象とする目的または加振物体の固有振動数等
により最適なものとして与えられる。These are given as optimal depending on the purpose of the object or the natural frequency of the vibrating object.
上記実施例では加振素子６をホルダ５とステージ７の間
に配置したが、これに限定されるものではなく、ステー
ジ７の起動、走行および停止時の動作特性を効果的に行
なえる場所に設置すればよい。In the above embodiment, the vibration element 6 is placed between the holder 5 and the stage 7, but the present invention is not limited to this, and the vibration element 6 is placed in a place where the operating characteristics of the stage 7 when starting, running, and stopping can be effectively controlled. Just set it up.
また、ステージ振動発生時等で効果的な制御を行なうた
めに、ステージ上に振動検出器を設置することも可能で
ある。Further, in order to perform effective control when stage vibration occurs, it is also possible to install a vibration detector on the stage.
さらに２軸ステージとして構成することも可能である。Furthermore, it is also possible to configure it as a two-axis stage.
［発明の効果］
以上説明したようにステージを強制的に振動することに
より、ステージ始動をなめらかにし、また停止時に発生
する振動を抑えるとともに停止時の静止状態の安定性を
向上する。[Effects of the Invention] As explained above, by forcibly vibrating the stage, the stage starts smoothly, vibrations generated when stopped are suppressed, and the stability of the stationary state when stopped is improved.
ほかに、ステージの固有振動数よりも高い周波数で強制
振動を行なうことによ′す、ステージが外乱により振動
することを防ぐことが可能である。In addition, by performing forced vibration at a frequency higher than the natural frequency of the stage, it is possible to prevent the stage from vibrating due to external disturbances.
また、ステージ駆動装置のサーボ系などにより生ずる振
動に対してシステムの応答速度などに関しての時間差（
ヒステリシス）をもうけることが可能なため、サーボ系
などによる振動の発生を防ぐことが可能となる。In addition, there is a time difference (
Since it is possible to create hysteresis), it is possible to prevent vibrations caused by the servo system, etc.
第１図は本発明の一実施例の構成図である。 １：基板、 ２：モータ、 ３：送りネジ、 ４：ナツト、 ５：ホルダ、 ６：加振素子、 ７：ステージ。 特許出願人 キャノン株式会社 代理人 弁理士 伊 東 哲 也 代理人 弁理士 伊 東 辰 雄 FIG. 1 is a block diagram of an embodiment of the present invention. 1: Substrate, 2: Motor, 3: Feed screw, 4: Natsuto, 5: Holder, 6: Excitation element, 7: Stage. Patent applicant: Canon Co., Ltd. Agent Patent Attorney Tetsuya Ito Agent Patent Attorney Tatsuo Ito
Claims (5)
可動部を移動させるための駆動手段と、前記固定部およ
び可動部に対し強制的に振動を与えるための振動手段と
を具備したことを特徴とする位置決め装置。(1) A fixed part, a movable part that moves relative to the fixed part, a driving means for moving the movable part, and a vibration means for forcibly applying vibration to the fixed part and the movable part. A positioning device characterized by comprising:
御可能としたことを特徴とする特許請求の範囲第１項記
載の位置決め装置。(2) The positioning device according to claim 1, wherein the amplitude and frequency of vibration by the vibration means can be controlled.
動部に伝達する駆動伝達手段を介して前記固定部および
可動部間に介装されたことを特徴とする特許請求の範囲
第１項または第２項記載の位置決め装置。(3) The vibration means is interposed between the fixed part and the movable part via a drive transmission means that transmits the driving force from the drive means to the movable part. The positioning device according to item 1 or 2.
する特許請求の範囲第１項、第２項または第３項記載の
位置決め装置。(4) The positioning device according to claim 1, 2, or 3, wherein the vibration means comprises a piezo element.
段は該モータに連結された送りネジおよびナットからな
り、該ナットに対し前記ピエゾ素子を装着するとともに
可動部を連結したことを特徴とする特許請求の範囲第４
項記載の位置決め装置。(5) The drive means comprises a motor, the drive transmission means comprises a feed screw and a nut connected to the motor, and the piezo element is attached to the nut and the movable part is connected thereto. Claim 4
Positioning device as described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63131358A JPH01302195A (en) | 1988-05-31 | 1988-05-31 | Positioning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63131358A JPH01302195A (en) | 1988-05-31 | 1988-05-31 | Positioning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01302195A true JPH01302195A (en) | 1989-12-06 |
Family
ID=15056060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63131358A Pending JPH01302195A (en) | 1988-05-31 | 1988-05-31 | Positioning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01302195A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088530A (en) * | 2007-09-28 | 2009-04-23 | Asml Netherlands Bv | Lithographic apparatus, stage apparatus, and method of manufacturing device |
| CN107683431A (en) * | 2015-06-02 | 2018-02-09 | 生命技术公司 | For making the stable system and method for the sample stage in structured lighting imaging system |
-
1988
- 1988-05-31 JP JP63131358A patent/JPH01302195A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009088530A (en) * | 2007-09-28 | 2009-04-23 | Asml Netherlands Bv | Lithographic apparatus, stage apparatus, and method of manufacturing device |
| JP2012151490A (en) * | 2007-09-28 | 2012-08-09 | Asml Netherlands Bv | Lithographic apparatus, stage apparatus and device manufacturing method |
| US8384881B2 (en) | 2007-09-28 | 2013-02-26 | Asml Netherlands B.V. | Lithographic apparatus, stage apparatus and device manufacturing method |
| CN107683431A (en) * | 2015-06-02 | 2018-02-09 | 生命技术公司 | For making the stable system and method for the sample stage in structured lighting imaging system |
| US20180157023A1 (en) * | 2015-06-02 | 2018-06-07 | Life Technologies Corporation | Systems and methods for stabilizing a sample stage in a structured illumination imaging system |
| JP2018522268A (en) * | 2015-06-02 | 2018-08-09 | ライフ テクノロジーズ コーポレーション | System and method for securing a sample stage in a structured illumination imaging system |
| US10921574B2 (en) | 2015-06-02 | 2021-02-16 | Life Technologies Corporation | Systems and methods for stabilizing a sample stage in a structured illumination imaging system |
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