JPH01295900A - Surface treating method of processing material for exhibiting engraved image - Google Patents

Abstract

PURPOSE:To easily engrave the surface of a material to be processed such as glass, metal, plastic or the like in a short time, by separating and removing a support body to tightly adhere an original image, exposing, forming a resist image film and treating the surface of said working material by sandblasting or etching. CONSTITUTION:A photosensitive composite liquid is applied onto a support body made of synthetic resin film such as polyester film, polypropyrene film etc., and dried, whereby a photosensitive layer is formed. After the obtained film is adhered to the surface of a material to be processed and left for a while, the support body film is peeled off. Then, an original image drawn on a transparent base material is tightly adhered to the surface of the photosensitive layer, which is in turn irradiated by active rays and exposed. The exposed portion becomes insoluble in water by photolinking, and strongly adhered to the surface of the material to be processed. Therefore, the exposed portion is never separated away even when it is developed through washing with water. After the material to be processed is dried, a strong resist image film is formed thereon. When the material processed with the resist image film is to be worked, sandblasting as a mechanical engraving or etching by a solution of medicine as a chemical photoetching is applied.

Description

[Detailed description of the invention] The present invention is for engraving images such as photographs, patterns, and letters on the surface of processed materials such as glass, stone, ceramics, metal, plastic, and wood. Concerning surface processing methods to make it appear.

Conventional technology The conventional surface processing method for engraving an image on the surface of processed materials such as glass, metal, and plastic is to print resist ink directly onto the surface of the processed material using a screen printing method. There is a method of forming a resist film with the image of In either case, the surface of the resist film is sandblasted, and the areas where there is no resist film are polished and engraved to reveal the image, or if the processed material is glass, hydrofluoric acid or copper is applied. In this case, corrode the parts without resist film with an aqueous solution of salt and ferric oxide.
This is a method of engraving to reveal an image.

However, in the conventional method described above, the pattern image is printed by screen printing in any case, so it is efficient and advantageous when a large number of the same pattern is to be processed. When the quantity to be processed is small, as in the case of , the printing plate production (plate making) process requires a lot of cost and time, which is disadvantageous both economically and in terms of efficiency. Furthermore, these conventional methods are limited to small processing areas (printing areas), for example, printing areas of 50cm x 50cm.
For large objects over 1m, it is technically difficult,
Currently, this method is rarely implemented because it is extremely expensive.

Problems to be Solved by the Invention The present invention has been made in view of the above-mentioned circumstances, and is a method for engraving the surface of processing materials such as glass, metal, plastic, etc., in which precise and minute designs are created in a resist using a photographic method. In addition to being able to form a membrane, especially one with a small loft in terms of quantity,
The object of the present invention is to provide a method for engraving a large area easily, quickly, and economically.

In the present invention, a resist film image of a design is formed on the surface of a processed material used to engrave an image on the surface of glass, metal, plastic, wood, stone, ceramics, etc. Direct screen printing is used as a means of
Alternatively, by screen printing, the photosensitive layer surface of a laminated film in which a water-soluble or water-dispersible photosensitive composition layer is formed on a support such as a synthetic resin film is processed into a material, regardless of the method of adhering a pattern mask prepared in advance. Either the original image is adhered to the surface and the support is peeled off and exposed, or the original image is adhered to the support and exposed, the support is peeled off and the photosensitive film is washed with water, developed, and dried to form a resist. A method of forming an image film, or a method of attaching the original image to a laminated film, exposing it to light, adhering it to the surface of the processing material, washing with water, developing, and drying to form a resist film, and then sandblasting the surface of the processing material or etching with a chemical solution. This is achieved by applying

The photosensitive components of the water-soluble or water-dispersible photosensitive composition layer of the laminated film used in the present invention include (1) a water-soluble polymer and a photocrosslinking agent, such as polyvinyl alcohol and diazo resin (paraformaldehyde of 1-diazodiphenylamine); sulfate of condensate), polyvinylpyrrolidone and 4
．． Sodium 4'-bisazidostilbene-2,2'-disulfonate, polyvinyl methyl ether and mono(di)
Examples include acryloxyethyl phosphate. ■
Examples include water-soluble polymers having a photocrosslinkable group in the molecule, such as polyvinyl alcohol into which a stilbazolium group is introduced by acetalization, polyvinyl alcohol into which N-methylolacrylamide is added, and the like. (2) is a photosensitive solution of (2) or (2) in which a photopolymerizable unsaturated compound and a photopolymerization initiator are dissolved or dispersed; for example, an aqueous solution of polyvinyl alcohol and diazo resin, 2-hydroxyethyl acrylate and anthraquinone- Examples include those obtained by dissolving sodium 2-sulfonate, and those obtained by adding pentaerythritol triacrylate and benzophenone to an aqueous solution of polyvinyl alcohol into which a stilbazolium group has been introduced, and emulsifying and dispersing the mixture by stirring. Furthermore, in addition to these photosensitive components, polymer emulsions such as polyvinyl acetate, ethylene-vinyl acetate copolymer, polystyrene, and polyvinyl chloride, fine powders such as silica and alumina, colorants such as dyes and pigments, and surfactants are added. A laminated film is prepared in advance by coating a photosensitive composition liquid obtained by mixing various additives such as additives on a synthetic resin film support such as a polyester film or polypropylene film and drying it to form a photosensitive layer. use.

In other words, in order to perform a surface treatment to engrave images such as photographs, patterns, and letters on the surface of processed materials such as glass, stone, ceramics, metal, plastic, and wood, the materials are first processed. Adhere the photosensitive layer side of the laminated film to the surface. Various methods can be applied as the bonding method. Since the photosensitive layer of the laminated film is water-soluble or partially water-soluble, it is sufficient to apply water to the surface of the material to be processed and press the photosensitive layer surface thereto for attachment. In order to make the surface of the processed material uniform, to suppress the rate of dissolution of water to the photosensitive layer, to make the adhesion operation easier, and to obtain uniform adhesion,
It is preferable to use water to which an organic solvent that is miscible with water, such as methanol, ethanol, or isopropanol, is added. When performing abrasive engraving by sandblasting, a thin layer of adhesive of 10 μm or less may be interposed, which is completely different from the photosensitive layer. Just let it happen. This is because such a thin layer does not have the resistance as a sandblasting resist film even if it remains on the entire surface after washing and development.

After the photosensitive laminated film is adhered to the surface of the processed material in this way, if it is left for a while, the adhesive force increases and becomes stronger than the adhesive force with the support film, so the support film can be easily peeled off. can. However, in the case of adhesion with water, if too much water is applied and the water content of the photosensitive layer exceeds 20% by weight, the adhesive force with the support film will be strong and it will be difficult to peel off the support film. It must be noted that after peeling off the support film, it is very effective to dry the photosensitive layer appropriately to lower the water content in order to improve the resolution and photocurability of the photosensitive layer. next,
An original image drawn on a transparent substrate is brought into close contact with the surface of this photosensitive layer and exposed to active light such as sunlight or ultraviolet rays. If very fine resolution is not required,
As described above, without peeling the support film, the original image may be exposed directly to the surface of the support film, and then the support film may be peeled off and removed. In this case, since light is scattered along the thickness cross section of the support film, the resolution imageability is somewhat reduced.

For development, the film may be soaked in water or sprayed with shower water to sufficiently absorb water, and then rubbed with a sponge or brush to wash out unexposed areas. On this occasion,
The exposed area becomes insoluble in water due to photo-crosslinking and firmly adheres to the surface of the processed material, so it will not peel off even when washed with water and developed.

Next, by drying this, a strong resist image film is formed.

In addition, in the present invention, as another method of forming a resist film,
After exposing the original image in close contact with the photosensitive layer surface of the photosensitive laminated film, it is adhered to the surface of the processing material with an adhesive, and then the support film is peeled off, washed with water, developed, and dried to form a resist image film. You can also do that.

In processing the processed material on which the resist image film has been formed in this way, there are two methods: sandblasting for mechanical engraving and etching using a chemical solution for chemical etching, both of which are commonly used methods. applies. In other words, in sandblasting, an abrasive material such as diamond sand with various particle sizes is injected from a nozzle, and the areas without a resist film are polished and engraved by the collision friction with the abrasive material, and the parts with the resist film are engraved by the impact of the abrasive material. It is not polished because it absorbs. The thickness of the resist film varies depending on the depth of the engraving, and in the case of deep engraving, the film thickness is increased to withstand long-term spraying. (For example, 60 to 100 μm) On the other hand, in the case of shallow engraving, the film thickness may be thinner.

(For example, 20 to 50 μm) The depth of engraving is adjusted by the injection pressure, injection time, distance between the processing material and the injection nozzle, and the particle size of the abrasive.

On the other hand, chemical etching is mainly used for glass,
Corrosion engraving is done by applying and dipping a hydrochloric acid aqueous solution for stones, a ferric chloride aqueous solution for copper and copper alloy processing materials, and an aqueous solution of hydrochloric acid, nitric acid, sulfuric acid, etc. for other metals. Let's do it.

Hereinafter, the present invention will be described in detail with reference to examples. Example 1: A solution of 15 parts by weight of polyvinyl alcohol (Shin-Etsu Chemical Type PA-18) dissolved in 85 parts by weight of water, with an average degree of polymerization of 1700 and a degree of saponification of 88 mol%. 120 parts by weight of ethylene-vinyl acetate copolymer emulsion (Showa Kobunshi type EVA AD-50) with a solid content concentration of 50% by weight, 5 parts by weight of diazo resin
parts by weight, 0.2 parts by weight of a water-dispersible blue pigment, and 1 part by weight of a polyoxyethylene lauryl phenyl ether nonionic activator were added and mixed to prepare a photosensitive composition liquid. The mixture was coated on a polyester film support and dried to produce a laminated film with a photosensitive layer having a thickness of 60 μm.

As a surface treatment material, thickness 8mm, size 90cm
To adhere a laminated film to the entire surface of a 100 cm glass plate, apply water containing 10% by volume of isopropyl alcohol to the surface of the glass plate uniformly with a sponge, then roll the laminated film with the photosensitive layer outside and attach it to the glass plate. Uniform adhesion was obtained by crimping from one end and then unrolling and pasting. After the adhesion was left for several minutes, the support film was removed and dried by blowing hot air at 40° C. for about 10 minutes to form a photosensitive layer on the glass plate.

Next, a positive film consisting of lines with a width of 1 to 5 m was closely attached to the surface of the photosensitive layer, exposed to light for 3 minutes at a distance of 1.5 m using a 3KW metal halide lamp, and developed by washing with water. It was eluted into water, and a resist image film opposite to the positive one was formed on the glass plate. This glass plate was placed in a sandblasting machine, and an abrasive of Alundum #80 was sprayed at a compressed air pressure of 4 kg/cIll from a distance of about 10cnl from a nozzle with a diameter of 3.6MO+ to engrave on the abrasive surface. The membrane part is 3
Even if sprayed for 0 seconds, the resist film will not be damaged.
The glass plate was never polished. On the other hand, in the area where there was no resist film and the glass surface was exposed, polishing engraving progressed to a depth of about 1) 1m1 in 10 seconds, and an image faithful to the original was engraved. After engraving, the processed material was wetted with water to absorb water and rubbed with a brush to remove the film.

Example 2 N-methyl-γ-(p-formylstyryl)-pyridinium methosulfate was added to polyvinyl alcohol (Shin-Etsu Chemical Type P^-18) with an average degree of polymerization of 1700 and a saponification degree of 88 mol% by an acetalization reaction. Acrylate oligomer (Aronixt 8030 manufactured by Toagosei Kagaku Co., Ltd.
), 15 parts by weight of pentaerythritol triacrylate, and 3 parts by weight of 2-chlorothioxanthone (Nippon Kayaku Kayacure CTX) as a photopolymerization initiator were added and dispersed with stirring. Furthermore, 55 parts by weight of a 50M1)t% 4 degree polyvinyl acetate aqueous emulsion (MA-6 manufactured by Hoechst Synthesis) and 0.2 parts by weight of a water-dispersible purple pigment were added and mixed to this dispersion to form a photosensitive composition solution. was prepared.

This photosensitive solution was applied onto a polyester film support having a thickness of 50 μm and dried to produce a laminated film having a photosensitive layer having a thickness of 30 μm.

A glass plate with a thickness of 5 m was used as the surface treatment material, and a laminated film was pasted in the same manner as in Example 1, and the original image was exposed to close contact.
A resist image film having a thickness of 30 μm was formed on the surface of the glass plate by washing with water, developing and drying. In corroding this, 3
After applying a 0% by weight hydrofluoric acid aqueous solution and washing with water after approximately 3 minutes, an image with a corrosion depth of 35 μl could be etched. Finally, to remove the resist film, the resist film was decomposed by applying a 1% aqueous solution of sodium periodate, and was completely removed by washing with water.

Example 3 Using a copper plate with a thickness of 2 mm+ as a surface treatment material, the photosensitive laminated film produced in Example 2 was adhered to the copper plate in the same manner as in Example 2, and exposed, washed with water, developed, and dried in the same manner as in Example 2. A resist image film with a thickness of 30 μm was formed on the surface of the copper plate. To corrode this, when it was immersed in a ferric chloride aqueous solution with a specific gravity of 1.3 for 15 minutes, an image with a corrosion depth of 20 μm could be engraved. Thereafter, the resist film was decomposed and removed in the same manner as in Example 2.

Claims (3)

[Claims] (1) The photosensitive layer surface of a laminated film in which a water-soluble or water-dispersible photosensitive composition layer is formed on a film support is adhered to the surface of the processing material, and the support is peeled off and the original image is adhered. A method for surface processing of the processed material, characterized in that the obtained photosensitive film is washed with water, developed and dried to form a resist image film, and the surface of the processed material is subjected to sandblasting or etching. . (2) The photosensitive layer surface of a laminated film in which a water-soluble or water-dispersible photosensitive composition layer is formed on a film-like support is adhered to the surface of the processing material, and the original image is brought into close contact with the support and exposed. The surface of the processed material is characterized in that the support is peeled off, the obtained photosensitive film is washed and developed with water, and dried to form a resist image film, and the surface of the processed material is subjected to sandblasting or etching. Processing method. (3) After exposing the original image to the photosensitive layer surface or the support surface of a laminated film in which a water-soluble or water-dispersible photosensitive composition layer is formed on a film-like support, it is adhered to the surface of the processing material and developed by washing with water. and drying to form a resist image film, and then sandblasting or chemically etching the surface of the processed material.