JPH01294247A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH01294247A JPH01294247A JP1023971A JP2397189A JPH01294247A JP H01294247 A JPH01294247 A JP H01294247A JP 1023971 A JP1023971 A JP 1023971A JP 2397189 A JP2397189 A JP 2397189A JP H01294247 A JPH01294247 A JP H01294247A
- Authority
- JP
- Japan
- Prior art keywords
- optical recording
- recording medium
- film
- magneto
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- 230000003647 oxidation Effects 0.000 claims description 2
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract description 17
- 239000012298 atmosphere Substances 0.000 abstract description 17
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- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 abstract 1
- 239000010408 film Substances 0.000 description 66
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 14
- 239000012790 adhesive layer Substances 0.000 description 13
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
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- 239000011248 coating agent Substances 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
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- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
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- 230000001590 oxidative effect Effects 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920005668 polycarbonate resin Polymers 0.000 description 3
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- 238000004544 sputter deposition Methods 0.000 description 3
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- 238000004448 titration Methods 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
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- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
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- 229920006037 cross link polymer Polymers 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 229910000583 Nd alloy Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- LDKDGDIWEUUXSH-UHFFFAOYSA-N Thymophthalein Chemical compound C1=C(O)C(C(C)C)=CC(C2(C3=CC=CC=C3C(=O)O2)C=2C(=CC(O)=C(C(C)C)C=2)C)=C1C LDKDGDIWEUUXSH-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
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- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
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- 239000003989 dielectric material Substances 0.000 description 1
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- MKVYSRNJLWTVIK-UHFFFAOYSA-N ethyl carbamate;2-methylprop-2-enoic acid Chemical compound CCOC(N)=O.CC(=C)C(O)=O.CC(=C)C(O)=O MKVYSRNJLWTVIK-UHFFFAOYSA-N 0.000 description 1
- JZMPIUODFXBXSC-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.CCOC(N)=O JZMPIUODFXBXSC-UHFFFAOYSA-N 0.000 description 1
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- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 229940059574 pentaerithrityl Drugs 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
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- 229920000570 polyether Polymers 0.000 description 1
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- 229920001223 polyethylene glycol Polymers 0.000 description 1
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- 241000894007 species Species 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
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Landscapes
- Laminated Bodies (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は光記録媒体、更に詳しくは2枚のプラスチック
基板を記録層が内側になるように接着剤により接着した
貼合せ構造の光記録媒体に関する。Detailed Description of the Invention (Industrial Application Field) The present invention relates to an optical recording medium, more specifically an optical recording medium having a laminated structure in which two plastic substrates are bonded together with an adhesive so that the recording layer is on the inside. Regarding.
(従来の技術)
近年、大容量メモリーの1つとして光ディスクの商品化
、開発が活発である。その中でも書替え可能な光磁気デ
ィスクの実用化研究が精力的に行われている。(Prior Art) In recent years, optical discs have been actively commercialized and developed as a type of large-capacity memory. Among these, research is being actively conducted to put rewritable magneto-optical disks into practical use.
最近の光磁気ディスクの代表的構成として次のものを挙
げることができる。即ち、透明プラスチック基板として
ポリカーボネート、光磁気記録層にTbFeC0膜を用
い、プラスチック基板と光磁気記録膜の間の誘電体層及
び光磁気記録層の保護膜としてlnSを用いた媒体であ
る。このように、光磁気記録膜は両面もしくは片面から
誘電体により保護された構造になっている。これにより
、光磁気膜が大気にざらされている場合に比べ光磁気記
録膜の寿命は大幅に長くなる。現在の技術レベルでは5
〜6年と考えられている。Typical configurations of recent magneto-optical disks include the following. That is, this is a medium using polycarbonate as a transparent plastic substrate, a TbFeC0 film as a magneto-optical recording layer, and lnS as a dielectric layer between the plastic substrate and the magneto-optical recording layer and a protective film for the magneto-optical recording layer. In this way, the magneto-optical recording film has a structure in which it is protected by a dielectric material from both sides or one side. As a result, the lifetime of the magneto-optical recording film is significantly longer than when the magneto-optical film is exposed to the atmosphere. At the current technical level 5
It is thought to last up to 6 years.
しかし、実用化のためには少なくとも10年の寿命が必
要であることを考えると現在の技術では実用化には不充
分である。However, considering that a lifespan of at least 10 years is required for practical use, the current technology is insufficient for practical use.
前述の代表的構成の光磁気記録媒体を60℃、 90%
RHの加速試験にかけたところ、約50時間で記録膜に
ピンホールが発生し、C/N及びBER(ビットエラー
レート)の低下が認められた。A magneto-optical recording medium having the above-mentioned typical configuration was heated to 60°C and 90%
When subjected to an accelerated RH test, pinholes were generated in the recording film after about 50 hours, and a decrease in C/N and BER (bit error rate) was observed.
又、光磁気記録膜が大気に接したまま保存されると、大
気中の酸素や水により選択的に腐蝕おるいは酸化されて
しまい、情報の記録、再生が不可能となる。Furthermore, if the magneto-optical recording film is stored in contact with the atmosphere, it will be selectively corroded or oxidized by oxygen and water in the atmosphere, making it impossible to record or reproduce information.
そこで、一般には、前記光磁気記録膜の表面に保護層を
設けたり、または媒体の記録層側へ透明プラスチック基
板を接着させる(片面記録媒体)とか、2つ媒体をその
記録層が対向するように接着させる(両面記録媒体)こ
とにより耐久性向上を図ることが試みられている。Therefore, in general, a protective layer is provided on the surface of the magneto-optical recording film, a transparent plastic substrate is attached to the recording layer side of the medium (single-sided recording medium), or two media are placed so that their recording layers face each other. Attempts have been made to improve durability by adhering the media to the media (double-sided recording media).
しかしながら現状では、Sin、 S!Ozの如き防湿
性の無機保護層を設けた場合においても、均一で−様な
製膜が難しく、防湿性が充分な保護層は(qられず光磁
気記録層の経時劣化の改善は充分ではない。However, at present, Sin, S! Even when a moisture-proof inorganic protective layer such as Oz is provided, it is difficult to form a uniform and uniform film, and a protective layer with sufficient moisture-proofing properties is not sufficient to improve the aging deterioration of the magneto-optical recording layer. do not have.
また、常温硬化性樹脂による塗膜保護層でも充分な防湿
性は得られず、現段階では前述した保護用の透明プラス
チック基板を接着させるか或いは2つの光磁気記録媒体
同志を接着させることにより、水分、酸素の記録層への
透過を防止することにより、光磁気記録媒体の耐久性向
上を図ることに主眼が置かれている。所謂透明プラスチ
ック基板の貼合せによる方法である。In addition, sufficient moisture resistance cannot be obtained even with a protective coating layer made of a room-temperature curing resin, and at present, it is possible to achieve this by adhering the aforementioned protective transparent plastic substrate or by adhering two magneto-optical recording media together. The main focus is on improving the durability of magneto-optical recording media by preventing moisture and oxygen from permeating into the recording layer. This is a method of laminating so-called transparent plastic substrates.
しかし実際には、接着により貼合せ構造の光磁気記録媒
体を得ようとする場合、接着剤(樹脂)硬化時の体積収
縮による媒体の反り等の歪及びそれによる記録膜のクラ
ック発生等の問題がある。However, in reality, when trying to obtain a magneto-optical recording medium with a laminated structure by adhesion, there are problems such as distortion such as warping of the medium due to volumetric shrinkage when the adhesive (resin) hardens, and cracks in the recording film due to this. There is.
例えば、熱硬化型樹脂による接着の場合、長時間に亘る
加熱キュアのため、基板である透明プラスチック自体の
熱変形(歪など)に加えて、硬化樹脂の体積収縮に暴く
貼合せ媒体の反り、ざらには硬化樹脂の収縮が密着して
いる記録膜に歪を発生させ、クラックなどにつながる等
問題点が多く好ましくない。For example, in the case of bonding using thermosetting resin, due to the long-term heating curing, in addition to thermal deformation (distortion, etc.) of the transparent plastic substrate itself, warpage of the bonding medium due to volumetric shrinkage of the cured resin, In addition, shrinkage of the cured resin causes distortion in the adhering recording film, leading to cracks, etc., which is undesirable.
(発明の目的)
本発明の目的は、高温高湿度雰囲気中においても光記録
層の劣化が防止され、耐湿熱劣化性のすぐれた光記録媒
体を供給することにある。(Objective of the Invention) An object of the present invention is to provide an optical recording medium in which deterioration of the optical recording layer is prevented even in a high-temperature, high-humidity atmosphere, and which has excellent moisture and heat deterioration resistance.
上記本発明の目的は、更に具体的に述べると、光記録層
への透明プラスチック基板の接着貼合せ、或いは光記録
媒体同志の接着貼合ぜにより、記録層を水分及び酸素か
ら保護するようになした貼合せ構造の光記録媒体に関し
、高温・長時間の熱硬化によるプラスチック基板の熱歪
等を発生させることなく、光記録層と接触する接着剤が
長期に亘って記録層に対し安定であり、かつ湿熱雰囲気
下においても優れた接着力を有する貼合せ構造の光記録
媒体を提供することである。More specifically, the object of the present invention is to protect the recording layer from moisture and oxygen by adhesively bonding a transparent plastic substrate to the optical recording layer or adhesively bonding optical recording media to each other. Regarding optical recording media with a laminated structure, the adhesive that comes into contact with the optical recording layer remains stable against the recording layer for a long period of time without causing thermal distortion of the plastic substrate due to heat curing at high temperatures and for a long time. It is an object of the present invention to provide an optical recording medium having a laminated structure, which has an adhesive strength even under a humid heat atmosphere.
(発明の構成)
本発明は、前述の貼合せ構造すなわち2枚の透明プラス
チック基板からなり、少なくともその一方に、記録層を
積層し、記録層が内側になるように透明プラスチック基
板を接着剤により接着させた貼合せ構造の光記録媒体に
おいて、該接着剤が(A)架橋性オリゴマー
(B)多官能のアクリル酸エステル及び/またはメタア
クリル酸エステル
(C)光重合開始剤
から主として成る紫外線硬化型樹脂であり、(1)前記
架橋性オリゴマーのアクロイル基当りの分子量が少くと
も150であり、
(2)3官能以上のアクリル酸エステル及び/またはメ
タアクリル酸エステルの含有量が少くとも15重量%で
おり、
(3)硬化後の膜の軟化点が50’C以上であることを
特徴とする光記録媒体でおる。(Structure of the Invention) The present invention consists of the above-mentioned laminated structure, that is, two transparent plastic substrates, a recording layer is laminated on at least one of them, and the transparent plastic substrate is attached with an adhesive so that the recording layer is on the inside. In an optical recording medium having a bonded laminated structure, the adhesive mainly consists of (A) a crosslinkable oligomer, (B) a polyfunctional acrylic ester and/or methacrylic ester, and (C) a photopolymerization initiator. type resin, (1) the molecular weight per acroyl group of the crosslinkable oligomer is at least 150, and (2) the content of trifunctional or higher functional acrylic ester and/or methacrylic ester is at least 15% by weight. (3) The optical recording medium is characterized in that the softening point of the film after curing is 50'C or higher.
本発明においては、紫外線硬化樹脂中、架橋性オリゴマ
ーはそのアクロイル基当りの分子量が少くとも150で
おるものを使用する。好ましくは350以上でおり、特
に好ましくは1,000以上である。In the present invention, the crosslinkable oligomer used in the ultraviolet curable resin has a molecular weight per acroyl group of at least 150. It is preferably 350 or more, particularly preferably 1,000 or more.
ここで、アクロイル基当りの分子量が150より小さい
場合、紫外線照射による架橋膜の物性は伸びが小さく脆
いものとなる。その結果、貼合せ接着力は弱くなり、更
に湿熱雰囲気下での低下が著しく実用に適さない。Here, if the molecular weight per acroyl group is less than 150, the physical properties of the crosslinked film upon irradiation with ultraviolet rays will be low elongation and brittle. As a result, the bonding adhesive strength becomes weak, and furthermore, it deteriorates significantly in a moist heat atmosphere, making it unsuitable for practical use.
架橋膜の靭性(タフネス)及び硬化時の体積収縮という
点から見て、架橋性オリゴマーのアクロイル基当りの分
子量は大きい方がより望ましい。From the viewpoint of the toughness of the crosslinked film and the volume shrinkage during curing, it is more desirable that the molecular weight per acroyl group of the crosslinkable oligomer is large.
湿熱雰囲気下等での基板変形への接着硬化膜の追随、更
には貼合せ時紫外線照銅による硬化収縮に起因する媒体
歪(記録膜の浮き上がりや媒体の反り等)を極力なくす
ためには、架橋性オリゴマーのアクロイル基当りの分子
量は350以上が好ましく、更にi、ooo以上がより
好ましい。In order to minimize media distortion (such as lifting of the recording film and warping of the medium) caused by the adhesive cured film following deformation of the substrate in a moist heat atmosphere, etc., and by curing shrinkage caused by ultraviolet light during lamination, The molecular weight per acroyl group of the crosslinkable oligomer is preferably 350 or more, more preferably i,ooo or more.
本発明で用いる架橋性オリゴマーは、分子中に少くとも
1つのエチレン性不飽和結合を有する付加重合可能な化
合物をいい、代表的なものとして次の7クリレート及び
又はメタアクリレート(以下パ(メタ)アクリレート′
と略称する場合がある)化合物を例示することができる
。The crosslinkable oligomer used in the present invention refers to an addition polymerizable compound having at least one ethylenically unsaturated bond in the molecule, and representative examples include the following 7 acrylates and/or methacrylates (hereinafter referred to as per(meth) acrylate′
(sometimes abbreviated as ) can be exemplified.
ポリエステル(メタ)アクリレート、ポリエーテル(メ
タ)アクリレート、ポリウレタン(メタ)アクリレート
、エポキシ(メタ)アクリレート。Polyester (meth)acrylate, polyether (meth)acrylate, polyurethane (meth)acrylate, epoxy (meth)acrylate.
シリコーン(メタ)アクリレート等である。これらの具
体例として、ざらに次のものを挙げることができる。silicone (meth)acrylate, etc. As specific examples of these, the following can be briefly mentioned.
ポリブチレンアジペートジアクリレート、ポリエチレン
グリコールジメタアクリレート、ポリプロピレングリコ
ールジアクリレート、(ポリエステルグリコールとイソ
シアナートから成る)ポリウレタンのジアクリレート、
スピログリコールウレタンジアクリレート、ビスフェノ
ールA型エポキシアクリレート、ビスフェノールF型エ
ポキシメタアクリレート、フェノールノボラック型エポ
キシアクリレート、クレゾールノボラック型エポキシメ
タアクリレート、ポリジメチルシロキサンジメタクリレ
ート等。polybutylene adipate diacrylate, polyethylene glycol dimethacrylate, polypropylene glycol diacrylate, diacrylate of polyurethane (consisting of polyester glycol and isocyanate),
Spiroglycol urethane diacrylate, bisphenol A type epoxy acrylate, bisphenol F type epoxy methacrylate, phenol novolac type epoxy acrylate, cresol novolac type epoxy methacrylate, polydimethylsiloxane dimethacrylate, etc.
これらのアクリレート類は実用性に冨む架橋性オリゴマ
ーとして有用であるが、これら以外の架橋性オリゴマー
として不飽和ポリエステル、ダツプ樹脂の如きアリル樹
脂、スチレン共重合体の如きビニル樹脂、あるいは、側
鎖に活性基を有するポリアミド、ポリ「クレタン、ポリ
エステル、ポリスルホン、ポリエーテルスルホン、ポリ
フェニレンオキシド等の如き樹脂をアクリル酸エステル
変性したものも充分に使用できる。These acrylates are useful as crosslinkable oligomers with a lot of practicality, but other crosslinkable oligomers include unsaturated polyesters, allyl resins such as dap resin, vinyl resins such as styrene copolymers, and side chain oligomers. Acrylic acid ester-modified resins such as polyamides, polycretanes, polyesters, polysulfones, polyethersulfones, polyphenylene oxides, and the like having active groups can also be used satisfactorily.
本発明の架橋性オリゴマーは少くとし15市ω%、好ま
しくは25重量%以上用いることが望ましい。It is desirable to use as little as possible the crosslinkable oligomer of the present invention, preferably 15% by weight or more, preferably 25% by weight or more.
この架橋性オリゴマーは、1種類でもよいし、2種以上
を併用してもよい。The number of these crosslinkable oligomers may be one type, or two or more types may be used in combination.
本発明で用いる3官能以上のアクリル酸エステル及び/
またはメタアクリル酸エステルは少くとも15重量%使
用する。好ましくは20重量%以上であり、特に好まし
くは25重量%以上である。Trifunctional or higher functional acrylic ester and/or used in the present invention
Or at least 15% by weight of methacrylic acid ester is used. It is preferably 20% by weight or more, particularly preferably 25% by weight or more.
3官能以上のアクリル酸エステル及び/またはメタアク
リル酸エステルが15重量%より少い場合、紫外線によ
り硬化した膜の架橋度が不足し、接着強力などの初期物
性の低下のみならず湿熱雰囲気下における接着力の低下
が著しく実用的でない。If the amount of trifunctional or higher functional acrylic ester and/or methacrylic ester is less than 15% by weight, the degree of crosslinking of the film cured by ultraviolet rays will be insufficient, resulting in a decrease in initial physical properties such as adhesive strength, as well as poor performance in a moist heat atmosphere. It is impractical because the adhesive strength is significantly reduced.
本発明で用いる3官能以上のアクリル酸エステル及び/
またはメタアクリル酸エステルの代表的なものとして次
のものを挙げることができる。Trifunctional or higher functional acrylic ester and/or used in the present invention
Alternatively, the following can be mentioned as representative methacrylic esters.
トリメヂロールプロパントリ(メタ)アクリレート、テ
トラメチロールメタン1〜す(メタ)アクリレート(以
上3官能)、テトラメチロールメタンテトラ(メタ)ア
クリレート2ヘキサメチレンジイソシアートとグリセリ
ン付加物のジアクリレート・ジメタクリレート(以上4
官能)、ジペンタエリスリトールへキナアクリレート、
及び次式(A)で示されるトリアクリレート・トリメタ
アクリレート(以上6官能)等である。Trimedylolpropane tri(meth)acrylate, tetramethylolmethane 1-(meth)acrylate (trifunctional), tetramethylolmethanetetra(meth)acrylate 2-hexamethylene diisocyanate and glycerin adduct diacrylate/dimethacrylate (Over 4
sensory), dipentaerythritol to cina acrylate,
and triacrylate/trimethacrylate (hexafunctional) represented by the following formula (A).
・・・・・・(A)
δ 0
実際に使用する紫外線硬化型樹脂には上記の3官能以上
の(メタ)アクリレートの外に2官能(メタ)アクリレ
ートあるいは単官能(メタ)アクリレートを併用するこ
とが可能であり、粘度調節及び硬化後の物性最適化の点
から各種のアクリル酸エステルを選ぶことができる。・・・・・・(A) δ 0 In addition to the above-mentioned trifunctional or higher functional (meth)acrylates, bifunctional (meth)acrylates or monofunctional (meth)acrylates are used in combination with the ultraviolet curable resin actually used. Various acrylic esters can be selected from the viewpoint of adjusting viscosity and optimizing physical properties after curing.
紫外線照射により得られた本発明の硬化膜の軟化点は5
0℃以上でなければならない。好ましくは80℃以上で
おり、特に好ましくは115°C以上である。The softening point of the cured film of the present invention obtained by ultraviolet irradiation is 5
Must be above 0°C. The temperature is preferably 80°C or higher, particularly preferably 115°C or higher.
ここで用いる「軟化点」の定義は次の通りである。[ダ
イナミック熱機械分析装置(米国、 DuPOnt社l
DMA 982型)により測定したヤング率損失[I+
の極大値を与える温度」を架橋により硬化した膜の軟化
点とする。The definition of "softening point" used here is as follows. [Dynamic thermomechanical analyzer (DuPOnt, USA)
Young's modulus loss [I+
The temperature that gives the maximum value of is taken as the softening point of the film cured by crosslinking.
硬化膜の軟化点が50℃より低い場合、硬化膜の耐熱性
が不足し、湿熱雰囲気下における接着力の低下が署しく
好ましくない。If the softening point of the cured film is lower than 50° C., the heat resistance of the cured film is insufficient, and the adhesive strength in a moist heat atmosphere is significantly reduced, which is not preferable.
更に、レーザー照射時の瞬間的昇温も繰返されることに
より硬化膜の疲労を促進し経時劣化を助長することにな
るので軟化点は50℃より高いことが必要であり、望ま
しくは80’C以上、特に115°C以上であれば極め
て優れた耐熱性を有することになる。Furthermore, repeated instantaneous temperature increases during laser irradiation will promote fatigue of the cured film and promote deterioration over time, so the softening point must be higher than 50°C, preferably 80'C or higher. In particular, if it is 115°C or higher, it has extremely excellent heat resistance.
一般に、高分子物質の耐熱性指標としてガラス転移点(
Tg)が多く用いられる。Generally, the glass transition point (
Tg) is often used.
しかし、架橋高分子の場合、セグメント運動単位がかな
り大きな分布を有すると考えられ、このため試料高分子
の温度変化に伴う熱的状態の変化(熱膨服係数等)は明
瞭でないことが多く、通常の鎖状高分子等で観測される
明らかなT(Iを得ることが難しい。このため、試料高
分子の粘弾性の比率tanδ(ヤング率に対するヤング
率損失の比率)を丁gと見なす例も児受けられるが、普
通tanδはTgより高く、ざらに測定周波数が高い程
tanδは高温側にずれるため好ましい方法とは言えな
い。However, in the case of crosslinked polymers, the segmental motion units are thought to have a fairly large distribution, and therefore changes in the thermal state (such as thermal expansion coefficient) due to temperature changes in the sample polymer are often not clear. It is difficult to obtain the obvious T (I) observed in ordinary chain polymers, etc. Therefore, an example in which the viscoelasticity ratio tan δ (ratio of Young's modulus loss to Young's modulus) of the sample polymer is assumed to be g. However, tan δ is usually higher than Tg, and the higher the measurement frequency, the more tan δ shifts toward the higher temperature side, so this is not a preferable method.
上記の点に留意して、本発明者らは架橋高分子の耐熱性
の指標として、先に定義した硬化膜の軟化点(試料高分
子のヤング率損失E′の極大値を与える温度)を用いた
。Keeping the above points in mind, the present inventors determined the softening point of the cured film (temperature that gives the maximum value of Young's modulus loss E' of the sample polymer) as defined above as an index of the heat resistance of the crosslinked polymer. Using.
本発明でいう軟化点を求める硬化膜は次のようにして作
成した。The cured film whose softening point is determined in the present invention was prepared as follows.
清浄なガラス板上に測定する紫外線硬化樹脂組成液を置
き、スペーサーにより硬化後の膜厚が0゜1〜0.5m
mとなるようにしてドクターナイフで均一に塗布した。Place the ultraviolet curing resin composition to be measured on a clean glass plate, and use a spacer to maintain a film thickness of 0°1 to 0.5m after curing.
It was applied uniformly with a doctor knife so that
次いでガラス板ごと樹脂の上部から高圧水銀灯(80w
/cm)により紫外線照射して硬化膜を得た。膜厚によ
り照射時間を加減し、充分架橋し物性的に満足しうる硬
化膜を得、軟化点を測定した。Next, a high-pressure mercury lamp (80W) was applied to the top of the resin together with the glass plate.
/cm) to obtain a cured film. The irradiation time was adjusted depending on the film thickness to obtain a cured film that was sufficiently crosslinked and had satisfactory physical properties, and its softening point was measured.
次に具体例を挙げる。ビスフェノールA型エポキシアク
リレート(50wt%)、トリメチロールプロパントリ
アクリレート(30wt%)及びネオペンチルグリコー
ルジアクリレート(20wt%)からなる組成物に増感
剤としてDarOC(Jr 1173 ()ferck
社)(1,0wt%)を添加し、上記の方法に従って紫
外線照射により硬化膜を得た。ダイナミック熱機械分析
装置(米国、 Du pont社、 DMA 982型
〉により測定した該硬化膜のヤング率損失(E”)は1
15℃に4粗大点を有し、これを該硬化膜の軟化点と見
做した。Next, a specific example will be given. DarOC (Jr 1173 () ferck
Inc.) (1.0 wt%) was added, and a cured film was obtained by irradiation with ultraviolet rays according to the above method. The Young's modulus loss (E'') of the cured film measured with a dynamic thermomechanical analyzer (Du Pont, USA, DMA 982 model) was 1.
It had 4 coarse points at 15° C., which was regarded as the softening point of the cured film.
一方、市販の紫外線硬化型樹脂である大日本インキ化学
工業■製品rsD−17Jについて同様な硬化膜を得、
ヤング率損失(E”)を測定したところ室温以上で極大
点を示さず、ここでいう軟化点が室温以下であり耐熱性
の低い結果を示した。On the other hand, a similar cured film was obtained for Dainippon Ink and Chemicals' product rsD-17J, which is a commercially available ultraviolet curable resin.
When Young's modulus loss (E'') was measured, it did not show a maximum point above room temperature, and the softening point here was below room temperature, indicating low heat resistance.
なお、本発明において、Tb、 DV、 Nd等の希土
類金属を含む光磁気記録膜等の如く酸化し易い記録膜に
使用する場合、特にこの記録膜等直接接して用いる場合
、その酸化劣化の防止という面から前記紫外線硬化型樹
脂は、その酸化が1.5以下であることが好ましい。更
に好ましくは0.9以下、特に好ましくは0.5以下で
ある。酸価が1.5より大きい場合、記録膜が酸化劣化
(腐蝕)され易く、例えば前述の光磁気記録膜の場合湿
熱雰囲気下に保つと、最初記録膜にピンホールが発生し
、次第に増加し、次いで記録膜は透明化し、最後に記録
膜自体が消失してしまう。なお、本発明で用いるrtt
#JJは、試料1gを中和するのに必要な水酸化カリウ
ム(KOH>のミリグラム数で表わす。In addition, in the present invention, when used in a recording film that is easily oxidized such as a magneto-optical recording film containing rare earth metals such as Tb, DV, Nd, etc., especially when used in direct contact with this recording film, prevention of oxidative deterioration of the recording film is required. From this point of view, it is preferable that the ultraviolet curable resin has an oxidation value of 1.5 or less. More preferably it is 0.9 or less, particularly preferably 0.5 or less. If the acid value is greater than 1.5, the recording film is susceptible to oxidative deterioration (corrosion). For example, in the case of the above-mentioned magneto-optical recording film, when kept in a moist heat atmosphere, pinholes initially appear in the recording film and gradually increase. Then, the recording film becomes transparent, and finally the recording film itself disappears. Note that the rtt used in the present invention
#JJ is expressed in milligrams of potassium hydroxide (KOH>) required to neutralize 1 g of sample.
この酸価は、硬化前の液状樹脂については、以下の手順
で測定する。This acid value is measured by the following procedure for a liquid resin before curing.
(ア)試料を必要1を精密にはかり取る。(a) Weigh the sample precisely.
(イ)滴定容器に移し、二酸化炭素を除いたガス(例え
ばNz)を容器中へ流し込む。(a) Transfer to a titration container, and pour the gas (for example, Nz) excluding carbon dioxide into the container.
(つ)溶媒(通常、エタノール−水等容混合物を用いる
。試料によりエチレングリコールメチルエーテル又はジ
オキサン等の溶媒を用いる)の適当量を加え、かきまぜ
ながら加温して試料を溶解する。(1) Add an appropriate amount of a solvent (usually an equal volume mixture of ethanol and water; depending on the sample, use a solvent such as ethylene glycol methyl ether or dioxane) and heat while stirring to dissolve the sample.
(工〉指示薬としてフェノールフタレイン(またはチモ
ールフタレイン)及び必要に応じ予め煮沸して中性にし
た水を加える。(Process) Add phenolphthalein (or thymolphthalein) as an indicator and, if necessary, water that has been boiled to neutralize in advance.
(オ)N/loo水酸化カリウム(KOH>を用いて滴
定する。(e) Titrate using N/loo potassium hydroxide (KOH>).
(滴定には、0.02mまで目盛られたミクロビユレッ
トを用いる)
(力)M価(Acid Value)は次式により計唾
する。(For titration, a microbiulet graduated to 0.02 m is used.) (Force) M value (Acid Value) is calculated using the following formula.
VXNX56.108X103
酸価=□
ここで、W:試料の車量[n+o ]
V:使用した水酸化カリウムの液■
[In!!]
N:水酸化カリウム液の規定度
又硬化後の硬化樹脂については、下記手順で試料を調整
後、液状樹脂の手順(1)〜(カ)と同じようにして測
定する。VXNX56.108X103 Acid value = □ Where, W: Volume of sample [n+o] V: Potassium hydroxide solution used■ [In! ! ] N: The normality of the potassium hydroxide solution and the cured resin after curing are measured in the same manner as procedures (1) to (f) for liquid resins after preparing a sample according to the following procedure.
(ア)試料となるべき硬化樹脂を充分に粉砕する。(a) Thoroughly crush the cured resin to be the sample.
(イ)粉砕した試料の必要量を精密にはかり取る。(b) Precisely measure the required amount of the crushed sample.
(つ)滴定容器に移し、二酸化炭素を除いたガス(例え
ばN2)を容器中へ流し込み充分置換する。(1) Transfer to a titration container, and pour gas (for example, N2) excluding carbon dioxide into the container for sufficient replacement.
(1)溶媒(通常、エタノール−水等容混合物を用いる
。試料によりエチレングリコールメチルエーテルまたは
ジオキサン等の溶媒を用いる)の適当量を加え、還流冷
却器(reflux conden−ser)を付けて
、少くとも60分間還流する。(1) Add an appropriate amount of a solvent (usually an equal volume mixture of ethanol and water; depending on the sample, use a solvent such as ethylene glycol methyl ether or dioxane), attach a reflux condenser, and reduce the volume. Reflux both for 60 minutes.
なあ、本発明において紫外線硬化型樹脂は、光記録媒体
においては紫外線により硬化した硬化樹脂を、製法にお
いては硬化前の液状樹脂を意味する。In the present invention, the ultraviolet curable resin refers to a cured resin cured by ultraviolet rays in the case of an optical recording medium, and refers to a liquid resin before curing in the manufacturing method.
ところで、本発明における紫外線により硬化しつる樹脂
または紫外線照射により硬化した樹脂が示す酸性の度合
い(酸価が1つの指標である)は、樹脂中に含まれる遊
離酸に依存している。即ち、アクリル酸エステルまたは
メタアクリル酸エステル中に含まれる未反応のアクリル
酸またはメタアクリル酸に代表されるカルボン酸、エス
テル反応触媒として一般に用いられる硫酸等の無機酸、
更に製造工程上混入してくる痕跡の酸性物質(α−等)
が主である。Incidentally, the degree of acidity (acid value is one indicator) exhibited by the resin cured by ultraviolet rays or the resin cured by ultraviolet irradiation in the present invention depends on the free acid contained in the resin. In other words, unreacted carboxylic acids such as acrylic acid or methacrylic acid contained in acrylic esters or methacrylic esters, inorganic acids such as sulfuric acid commonly used as ester reaction catalysts,
Furthermore, traces of acidic substances (α-, etc.) mixed in during the manufacturing process
is the main thing.
これらを除くためには、酸性物質を中和し、)濾過を繰
返すことが常道であるが、本発明が目指す低い酸価を達
成するためには、さらに蒸沼(低分子量化合物)、イオ
ン交換、あるいは清浄な水(または水−溶媒混合液)に
よる洗浄が必要であり、これらを組合せるか、有効な方
法を繰返すことが重要である。In order to remove these, it is common practice to neutralize acidic substances and repeat filtration, but in order to achieve the low acid value that the present invention aims for, it is necessary to use steam swamp (low molecular weight compounds), ion exchange Alternatively, washing with clean water (or water-solvent mixture) is necessary, and it is important to combine these or repeat effective methods.
更に実際に使用に際して上記紫外線硬化樹脂には周知の
如く光重合開始剤が使用される。かかる光重合開始剤と
しては、アセトフェノンやベンゾフェノン及びこれらの
各種誘導体が主でおり、これらの具体例としては次のも
のを挙げることができる。Furthermore, in actual use, a photopolymerization initiator is used in the ultraviolet curable resin as is well known. Such photopolymerization initiators are mainly acetophenone, benzophenone, and various derivatives thereof, and specific examples thereof include the following.
[)arocur 111B、 Darocur 11
73 (以上)lerck社)。[)arocur 111B, Darocur 11
73 (and above) Lerck Company).
Vicur 55 (Stauffer社) 、 Ir
gacur 651. Irgacur184(以上
Ciba−GeigV社)等である。Vicur 55 (Stauffer), Ir.
gacur651. Irgacur 184 (all manufactured by Ciba-GeigV) and the like.
ざらに、ベンゾインエチルエーテルの如きベンゾインエ
ーテル系の光重合開始剤を使用することも可能である。In addition, it is also possible to use a benzoin ether-based photopolymerization initiator such as benzoin ethyl ether.
これらは、1種のみ使用することも、また2種以上併用
することもできる。These can be used alone or in combination of two or more.
これら光重合開始剤の使用量は、紫外線硬化型樹脂組成
物100部に対し、少くとも0.3重量部、好ましくは
1.0重量部以上、特に好ましくは2.0重量部以上用
いる。The amount of these photopolymerization initiators used is at least 0.3 parts by weight, preferably 1.0 parts by weight or more, particularly preferably 2.0 parts by weight or more, based on 100 parts of the ultraviolet curable resin composition.
本発明の接着層は、以上の紫外線硬化型樹脂の塗布によ
り形成される。中でもスピンコードが膜厚の均−化及び
生産面で好ましく適用される。又、貼り合わせる両基板
に接着層を予め形成し、次いで貼り合わせる方法が気泡
混入防止等から好ましい。The adhesive layer of the present invention is formed by applying the above ultraviolet curable resin. Among these, spin cords are preferably used in terms of uniformity of film thickness and production. Further, it is preferable to form an adhesive layer on both substrates to be bonded together in advance and then bond them together in order to prevent air bubbles from being mixed in and the like.
かかる面から紫外線硬化型樹脂の粘度は、25℃におい
て10〜5,000 cpsである。好ましく−は50
〜2.000 CpS 、特に好ましくは100〜1,
000 cpsで必る。From this point of view, the viscosity of the ultraviolet curable resin is 10 to 5,000 cps at 25°C. Preferably - is 50
~2.000 CpS, particularly preferably 100-1,
000 cps required.
粘度がio cpsより低い場合、樹脂が流れ易く、貼
合せ時にタレ易いなど扱いにくい外、重ね合せる場合に
気泡が発生し易く作業性が劣り好ましくない。If the viscosity is lower than io cps, the resin tends to flow easily and sag during lamination, which is difficult to handle, and when laminated, air bubbles are likely to be generated, resulting in poor workability, which is undesirable.
5.000 cpsより高い場合、均一なHEに拡げに
くく、かつ徂ね合せる時に大きな抑圧が必要である外、
−度気泡が入ると脱泡が困難である。また、自動計量→
供給に時間がかかり作業性もよくない。If it is higher than 5.000 cps, it is difficult to spread to a uniform HE, and large suppression is required when combining.
- Once air bubbles are introduced, it is difficult to defoam. Also, automatic weighing →
It takes time to supply and the workability is not good.
なお、粘度の測定はB形粘度系BH形(東京計器製)を
用いて常法により行なう。The viscosity is measured by a conventional method using a B type viscosity system BH type (manufactured by Tokyo Keiki).
以上の本発明を、以下光磁気記録媒体を例に説明するが
、本発明は光磁気記録媒体に限定されるものではなく、
光磁気記録層と同様の劣化を伴なう光記録層を用いる光
記録媒体に広く適用できるものであることは、その趣旨
から明らかである。The present invention described above will be explained below using a magneto-optical recording medium as an example, but the present invention is not limited to a magneto-optical recording medium.
It is clear from its purpose that it can be widely applied to optical recording media that use optical recording layers that undergo deterioration similar to that of magneto-optical recording layers.
第1図、第2図は本発明になる光磁気記録媒体の代表構
成例の部分側断面図である。第1図は、光磁気記録層を
設けた透明プラスチック基板1に単なる透明プラスチッ
ク基板1゛を接着貼り合わせた片面記録媒体の例であり
、光磁気記録層3にSiO,Ai!Nなどの保護層4を
介して接着層5により透明プラスチック基板1°が貼合
されている。FIGS. 1 and 2 are partial side sectional views of typical configuration examples of magneto-optical recording media according to the present invention. FIG. 1 shows an example of a single-sided recording medium in which a simple transparent plastic substrate 1 is bonded to a transparent plastic substrate 1 provided with a magneto-optical recording layer, and the magneto-optical recording layer 3 includes SiO, Ai! A transparent plastic substrate 1° is bonded with an adhesive layer 5 through a protective layer 4 made of N or the like.
第2図は、両面記録媒体の例であり、光磁気記録層3及
び3゛上に各々保護層4,4”が形成された透明プラス
チック基板1,1°が光磁気記録層3.3°が内側にな
るように接着層5により接着貼合された例である。FIG. 2 shows an example of a double-sided recording medium, in which the transparent plastic substrates 1 and 1 degrees, on which the magneto-optical recording layers 3 and 3'' are formed with protective layers 4 and 4'', respectively, and the magneto-optical recording layer 3.3 degrees. This is an example of adhesive bonding using the adhesive layer 5 so that the inner side faces.
尚、図において2,2゛は誘電体層である。In the figure, 2, 2' is a dielectric layer.
これらの接着層5は、スパッタリング等により得られた
光磁気記録層3(3°)又は保護層4(4°)の上に、
前述の通りスピンコードあるいはロールコート等により
塗イ5する外、貼合せる透明プラスチック基板間に介在
させた後抑圧して仝而に塗布する方法等により設けるこ
とができる。塗布厚みは、0.5〜1,000 μm
、好ましくは10〜500μmである。次いで、紫外線
照射により硬化接着することができる。These adhesive layers 5 are formed on the magneto-optical recording layer 3 (3°) or the protective layer 4 (4°) obtained by sputtering etc.
As described above, it can be provided by coating by spin cord or roll coating, or by interposing it between transparent plastic substrates to be bonded and then pressing and then applying the coating. Coating thickness is 0.5 to 1,000 μm
, preferably 10 to 500 μm. Then, the adhesive can be cured by UV irradiation.
単なる透明プラスチック基板を貼合せる場合、紫外線照
射は単なる透明プラスチック基板側から行なうことで充
分に硬化させることが可能である。When bonding simple transparent plastic substrates, sufficient curing can be achieved by irradiating ultraviolet rays from the transparent plastic substrate side.
一方、光磁気記録層を形成した透明プラスチック基板同
志を貼合せる場合、記録層の部分は基板のように透明で
はないため紫外線を通しにくく、外周及び内周の記録層
のない透明部分を通過した紫外線による硬化に頼らざる
を(坪ないため短時間硬化が難しい。このため、一方ま
たは両方の貼合1面に予め光重合触媒を含むプライマー
液を塗布しておき、その上に接着層を設は貼合せた後紫
外線照射し仝而の硬化反応を短時間で終了させることが
できる。光重合触媒としては、ベンゾイルパーオキ(J
イド等の過酸化物、鉄、ニッケル等の金属イオンあるい
は酸化還元系触Is等が多く使用される。On the other hand, when bonding transparent plastic substrates on which magneto-optical recording layers are formed, the recording layer part is not transparent like the substrates, so it is difficult for ultraviolet rays to pass through. It is difficult to cure in a short period of time due to the small size of UV rays.For this reason, a primer solution containing a photopolymerization catalyst is applied to one or both of the bonded surfaces in advance, and an adhesive layer is placed on top of that. After lamination, the curing reaction can be completed in a short time by irradiation with ultraviolet rays.As a photopolymerization catalyst, benzoyl peroxide (J
Peroxides such as ions, metal ions such as iron and nickel, or redox catalytic agents Is are often used.
上述の光磁気記録媒体は、接着層を除いてその構成は特
に限定されず、公知の構成がそのまま適用できる。例え
ば透明基板としてはポリカーボネート樹脂、アクリル樹
脂等の透明プラスチック基板から、誘電体層としてはZ
nS、Sin、AiN等から、光磁気配BBとしてはF
eTbCo、 FeTbGd合金等のFcTb系の合金
、 F(1’Nd系の合金等からなるものが挙げられる
。中でも光磁気記録層が耐湿性に乏しい例示のFe丁b
CO合金等に効果が大きい。そしてこれら誘電体層、光
磁気記録層は常法例えばスパッタリング法等の物理蒸着
法によって形成される。The structure of the above-mentioned magneto-optical recording medium is not particularly limited except for the adhesive layer, and any known structure can be applied as is. For example, the transparent substrate may be a transparent plastic substrate such as polycarbonate resin or acrylic resin, and the dielectric layer may be Z.
From nS, Sin, AiN, etc., F is used as a magneto-optical distribution BB.
Examples include FcTb alloys such as eTbCo and FeTbGd alloys, and F(1'Nd alloys).
Great effect on CO alloys, etc. These dielectric layers and magneto-optical recording layers are formed by conventional methods such as physical vapor deposition methods such as sputtering methods.
以下に本発明による上述の光磁気記録媒体の実施例を具
体的に説明するが、本発明はこれらの実施例によってい
ささかの限定を受けるものではない。Examples of the above-mentioned magneto-optical recording medium according to the present invention will be described in detail below, but the present invention is not limited in any way by these examples.
実施例1〜4.比較例1,2
第1図に示す積層構成の光磁気記録媒体を以下のように
して作成した。なお、第1図において、1、]゛は透明
プラスチック基板、2は誘電体層。Examples 1-4. Comparative Examples 1 and 2 A magneto-optical recording medium having the laminated structure shown in FIG. 1 was produced as follows. In FIG. 1, 1 and ] are transparent plastic substrates, and 2 is a dielectric layer.
3は光磁気記録層、4は無機物保護層、5は接着層であ
る。3 is a magneto-optical recording layer, 4 is an inorganic protective layer, and 5 is an adhesive layer.
すなわち、直径130mm 、厚さ1.2mmの円板で
1.6μmピッチのグル−プを有するポリカーボネート
樹脂(PC)から成る基板1をターゲラ83個装着可能
な高周波マグネトロンスパッタ装置(日電アネルバ■製
5PF−430型)の真空槽内に固定し、4 x 10
−7 Torr以下になるまで排気する。なお、膜形成
において基板1は水冷し、15rpmで回転させた。That is, a high-frequency magnetron sputtering device (5PF manufactured by Nichiden Anelva ■) capable of mounting 83 targeters was used to attach a substrate 1 made of polycarbonate resin (PC) having a diameter of 130 mm, a thickness of 1.2 mm, and groups of 1.6 μm pitch. -430 type) in a vacuum chamber of 4 x 10
-7 Torr or less. Note that during film formation, the substrate 1 was water-cooled and rotated at 15 rpm.
次に、酊ガスを真空槽内へ導入し、圧力5.3×10−
3 rorrになるようにArガスの流量を調整し、直
径100mm 、厚さ5mmのZnS円盤をターゲット
とし、放電電力100W、放電周波数13.56 MH
2で高周波スパッタリングを行ない、誘電体層2として
ZnS膜を650人堆積した。Next, intoxication gas was introduced into the vacuum chamber, and the pressure was 5.3 x 10-
The flow rate of Ar gas was adjusted to 3 rorr, a ZnS disk with a diameter of 100 mm and a thickness of 5 mm was targeted, the discharge power was 100 W, and the discharge frequency was 13.56 MH.
2, high frequency sputtering was performed to deposit 650 ZnS films as dielectric layer 2.
次いで記録層3としてTI)23F 86gcOa合金
(添数字は組成(原子%)を示す)に変え、Arガスを
真空槽内に導入し上述と同様の放電条件でTbFcCo
合金膜を800人堆積した。更に、無機保護層4として
、ターゲットを AJ!Nに変え、Arガスを真空槽内
に導入し上述と同様の放電条件でAiN膜を500人堆
積した。Next, the recording layer 3 was changed to TI) 23F 86gcOa alloy (the suffix indicates the composition (atomic %)), Ar gas was introduced into the vacuum chamber, and TbFcCo was used under the same discharge conditions as above.
800 people deposited alloy films. Furthermore, as the inorganic protective layer 4, the target is AJ! Ar gas was introduced into the vacuum chamber instead of N, and 500 AiN films were deposited under the same discharge conditions as described above.
第1表に示した架橋性オリゴマー及び多官能アクリレー
トを含有する紫外線硬化型樹脂による接着層5をスピン
コーターにより約50μmの厚さに均一に塗布した後、
同じポリカーボネートよりなる単なる透明プラスチック
基板1′を気泡を入れないように市ね貼合せると共に、
少なくとも記録層3の側面まで上記紫外線硬化型樹脂で
被覆した。After uniformly applying an adhesive layer 5 made of an ultraviolet curable resin containing a crosslinkable oligomer and a polyfunctional acrylate shown in Table 1 to a thickness of about 50 μm using a spin coater,
A simple transparent plastic substrate 1' made of the same polycarbonate was bonded together without introducing air bubbles, and
At least the side surfaces of the recording layer 3 were coated with the ultraviolet curable resin.
次いで透明プラスチック基板1゛の側から804/cm
の高圧水銀灯により紫外線を照射し樹脂を硬化させるこ
とにより接着させ、側面被覆の第1図に示す貼合せ構造
の片面記録媒体を(qだ。jqられた各媒体に付いて6
0’C,90%RHの雰囲気下で加速劣化試験を行なっ
た。Next, 804/cm from the side of the transparent plastic substrate 1゛
The single-sided recording medium with the laminated structure shown in Fig. 1 with side coatings was bonded by irradiating ultraviolet rays with a high-pressure mercury lamp to harden the resin.
An accelerated deterioration test was conducted in an atmosphere of 0'C and 90% RH.
一方、前述のように、第1表に記した組成の紫外線硬化
樹脂をガラス板上に塗布し、紫外線照射により硬化膜を
得、ダイナミック熱機械分析装置(DNA 982型)
により各々硬化膜の軟化点を測定した。また、その酸価
も測定した。On the other hand, as mentioned above, an ultraviolet curable resin having the composition shown in Table 1 was applied onto a glass plate, a cured film was obtained by irradiation with ultraviolet rays, and a dynamic thermomechanical analyzer (DNA 982 model) was used.
The softening point of each cured film was measured. The acid value was also measured.
これらの結果は第1表に示した。なお、第1表において
光重合開始剤の添加量単位のPHR(Parts pe
r 旦undred Resin)は樹脂100部
に対する添加重量部のことである。These results are shown in Table 1. In addition, in Table 1, PHR (Parts pe
r (undred Resin) refers to parts by weight added to 100 parts of resin.
第1表に示した架橋性オリゴマーの化学構造式、(メタ
)アクリル酸エステル及び光重合開始剤の118号は各
々次の通りでおる。The chemical structural formula of the crosslinkable oligomer shown in Table 1, the (meth)acrylic acid ester, and the photopolymerization initiator No. 118 are as follows.
・3官能以上の(メタ)アクリレート
TMPTA : トリメチロールプロパントリアクリレ
ート
CH20COCH=CH2
DPEHA ニジペンタエリスリトールへキサアクリレ
ート
・他(メタ)アクリレート
NPG−DA:ネオベンチルグリコールジアクリレート
HD−DM:1.6−ヘキサンシオールジメタクリレー
ト
・光重合開始剤
D:ダロキュア1173(メルク社製)■=バイキュア
55(ストウフトケミカル社製)B:ベンゾフェノン(
和光紬薬社製)
本発明の実施例1〜4は、比較例1,2に比較して、紫
外線硬化膜の軟化点がいずれも50℃より高く、貼合せ
媒体の湿熱雰囲気下での耐久性結果も極めて良好である
。即ち、60℃、 90%RH、1000hr経過後も
媒体の反り発生はなく、貼合せ部接着も強固で剥離の兆
候は全く見られず、かつ媒体の記録膜にもピンホール、
孔食の如き劣化は認められない。これには酸価が1.5
以下と小さい点も寄与していると考えられる。・Trifunctional or higher functional (meth)acrylate TMPTA: Trimethylolpropane triacrylate CH20COCH=CH2 DPEHA Nidipentaerythritol hexaacrylate ・Other (meth)acrylates NPG-DA: Neobentyl glycol diacrylate HD-DM: 1.6- Hexanethiol dimethacrylate/photopolymerization initiator D: Darocure 1173 (manufactured by Merck & Co.) = Bicure 55 (manufactured by Stouft Chemical) B: Benzophenone (
In Examples 1 to 4 of the present invention (manufactured by Wako Tsumugi Yakuhin Co., Ltd.), compared to Comparative Examples 1 and 2, the softening points of the ultraviolet-cured films were all higher than 50°C, and the durability of the lamination medium in a moist heat atmosphere was lower. The sexual results are also very good. That is, even after 1000 hours at 60°C and 90% RH, there was no warping of the medium, the adhesion at the bonded area was strong, and there were no signs of peeling at all, and there were no pinholes or pinholes in the recording film of the medium.
No deterioration such as pitting corrosion is observed. This has an acid value of 1.5
It is thought that the following small points also contributed.
一方、比較例1は、架橋性オリゴマーのアクロイル基当
りの分、子量が107と小さく、硬化膜の軟化点が20
℃より低い上に酸価が1.5より大きいため、貼合せ媒
体の湿熱劣化テストにより、媒体反りが大きく、接着部
の剥離を発生し、さらに記録膜は著しい酸化劣化を受は
使用に耐えない。On the other hand, in Comparative Example 1, the molecular weight per acroyl group of the crosslinkable oligomer was as small as 107, and the softening point of the cured film was 20.
℃ and the acid value is higher than 1.5, a wet heat deterioration test of the laminated media showed that the medium warped significantly and the adhesive part peeled off, and the recording film suffered significant oxidative deterioration and was unable to withstand use. do not have.
また、比較例2は、3官能以上の(メタ)アクリレート
であるトリメチロールプロパントリアクリレート(以下
TMPTAと略す)を僅か10wt%しか含有しないた
め、硬化膜の架橋密度が不足し、初期の接着力低下をも
たらし、更に軟化点(40℃)が50℃より低いこと及
び酸価が1.5より大きいことも加わって、湿熱劣化テ
スト結果は、媒体の一部剥離及び記録膜の劣化を示した
。In addition, since Comparative Example 2 contains only 10 wt% of trimethylolpropane triacrylate (hereinafter abbreviated as TMPTA), which is a (meth)acrylate with trifunctional or higher functionality, the crosslinking density of the cured film is insufficient, and the initial adhesive strength is In addition to the fact that the softening point (40°C) was lower than 50°C and the acid value was higher than 1.5, the wet heat aging test results showed partial peeling of the medium and deterioration of the recording film. .
実施例5〜8.比較例3
実施例1〜4と同様に、マグネトロンスパッタリング装
置を用い、TbFeCo合金ターゲット。Examples 5-8. Comparative Example 3 A TbFeCo alloy target was used in the same manner as Examples 1 to 4 using a magnetron sputtering device.
In203ターゲツト及びTiターゲットにより、ポリ
カーボネートよりなる透明プラスチック基板1上にIn
203 (650人)からなる誘電体層22丁bFec
。Using an In203 target and a Ti target, In is deposited on a transparent plastic substrate 1 made of polycarbonate.
22 dielectric layers bFec consisting of 203 (650 people)
.
(500人)からなる光磁気記録層3及びTi(550
人)からなる保護層4の順に膜を形成させた。(500) and magneto-optical recording layer 3 consisting of Ti (550)
Films were formed in the order of the protective layer 4 consisting of the following:
第2表に示した架橋性オリゴマー及び多官能アクリレー
トを含有する紫外線硬化型樹脂による接着層5を、上記
積層体の保護層4上とこれに貼り合わせる透明ポリカー
ボネート基板上の双方に実施例1〜4と同様にスピンコ
ーターにより夫々25μm厚に形成し、次いで透明ポリ
カーボネート基板を重ね合わせた後紫外線照射により、
第1図に示す貼合せ構造の片面記録媒体を得た。このよ
うに重ね合わせに先立ち両接着面に接着層5を形成して
おくことにより、重ね合わせの際の気泡の混入を効果的
に防止できることがわかった。得られた各媒体に付いて
60℃、90%RHの雰囲気下で加速劣化試験を行った
。An adhesive layer 5 made of an ultraviolet curable resin containing a crosslinkable oligomer and a polyfunctional acrylate shown in Table 2 was applied to both the protective layer 4 of the laminate and the transparent polycarbonate substrate to be bonded thereto in Examples 1 to 2. Similarly to 4, each layer was formed to a thickness of 25 μm using a spin coater, and then a transparent polycarbonate substrate was stacked on top of the other, and then irradiated with ultraviolet rays.
A single-sided recording medium having a laminated structure shown in FIG. 1 was obtained. It has been found that by forming the adhesive layer 5 on both adhesive surfaces prior to overlapping in this way, it is possible to effectively prevent air bubbles from being mixed in during overlapping. An accelerated deterioration test was conducted on each of the obtained media in an atmosphere of 60° C. and 90% RH.
また、第2表に示した組成の紫外線硬化樹脂につき硬化
膜の軟化点、酸価も測定した。Furthermore, the softening point and acid value of the cured film of the ultraviolet curable resin having the composition shown in Table 2 were also measured.
これらの結果は第2表に示した。These results are shown in Table 2.
第2表に示した架橋性オリゴマーの化学構造式、および
(メタ)アクリル酸エステルの略号は各々次の通りであ
る。その他略号は第1表と同じである。The chemical structural formulas of the crosslinkable oligomers and the abbreviations of the (meth)acrylic esters shown in Table 2 are as follows. Other abbreviations are the same as in Table 1.
・3官能以上の(メタ)アクリレート
U−48A:ウレタンジメタクリレートージアクリレー
ト
(他アクリレート及び光重合開始剤の略号は実施例1〜
4と同じ。)
本発明の実施例5〜8は、比較例3に比較して、紫外線
硬化膜の軟化点がいずれも50℃より高く、貼合せ媒体
の湿熱雰囲気下での耐久性試験は優れた結果である。・Trifunctional or higher functional (meth)acrylate U-48A: urethane dimethacrylate to diacrylate (abbreviations of other acrylates and photoinitiators are from Example 1)
Same as 4. ) In Examples 5 to 8 of the present invention, compared to Comparative Example 3, the softening points of the UV-cured films were all higher than 50°C, and the durability test of the lamination medium under a moist heat atmosphere gave excellent results. be.
即ら、60℃、 90%RH、1000hr経過後も貼
合せ部は強固な接着で剥離は認められなく、また記録膜
の劣化も発生しなかった。これは酸価が1.5以下と小
ざいことも寄与していると考えられる。That is, even after 1000 hours at 60° C. and 90% RH, the bonded portion had strong adhesion and no peeling was observed, and no deterioration of the recording film occurred. This is thought to be due to the small acid value of 1.5 or less.
一方、比較例3は、架橋性オリゴマーのアクロイル基当
りの分子種が121と小さいため、紫外線硬化後に硬化
膜の収縮に起因すると考えられる媒体の反りが大きく実
用上問題である。ざらに、硬化膜の軟化点が20℃以下
と低く酸価も1.5より大きいため、60℃、90%R
H雰囲気下での耐久性結果も、接着層剥離及び記録膜の
劣化を示した。On the other hand, in Comparative Example 3, since the molecular species per acroyl group of the crosslinkable oligomer is as small as 121, the medium warps, which is thought to be caused by shrinkage of the cured film after UV curing, and is a practical problem. Roughly speaking, the softening point of the cured film is as low as 20°C or lower, and the acid value is higher than 1.5, so 60°C and 90% R
Durability results under H atmosphere also showed adhesive layer peeling and recording film deterioration.
(発明の効果)
前述したところから明らかなように、本発明によれば、
貼合せ構造の光記録媒体において、接着剤として、
(A)架橋性オリゴマー
(8)多官能(メタ)アクリル酸エステル(C)光重合
開始剤
かう主として成り、
(1)前記架橋性オリゴマーのアクロイル基当りの分子
量が少くとも150であり、
(2)3官能以上のアクリル酸エステル及び/またはメ
タアクリル酸エステルの含有量が少くとも15重量%で
あり、
(3)硬化膜の軟化点が50℃以上
でおることを特徴とする紫外線硬化型樹脂を用いれば、
高温多湿雰囲気下においても長期耐久性(高接着性の維
持、記録膜の安定性)の充分優れた光記録媒体が1qら
れる。特に酸価が1.5以下のものについては記録膜の
劣化に対して有利でおる。(Effects of the Invention) As is clear from the above, according to the present invention,
In the optical recording medium with a laminated structure, the adhesive mainly consists of (A) a crosslinkable oligomer (8) a polyfunctional (meth)acrylic acid ester (C) a photopolymerization initiator; (1) an acroyl of the crosslinkable oligomer; The molecular weight per group is at least 150, (2) the content of trifunctional or higher functional acrylic ester and/or methacrylic ester is at least 15% by weight, and (3) the softening point of the cured film is 50. If you use an ultraviolet curable resin that is resistant to temperatures above ℃,
An optical recording medium with sufficiently excellent long-term durability (maintenance of high adhesion, stability of recording film) even in a high temperature and high humidity atmosphere is obtained. Particularly, those having an acid value of 1.5 or less are advantageous against deterioration of the recording film.
従って、本発明は上述した如く記録膜劣化が問題となる
TbFeCo系合金あるいはNdDyFeCo系合金等
で代表される希土類金属と遷移金属の合金膜からなる光
磁気記録膜を用いる光磁気記録媒体において特に大きな
効果を秦する。このように、本発明は光記録媒体、中で
も光磁気記録媒体の耐久性向上に大きく寄与するもので
ある。Therefore, the present invention is particularly useful in magneto-optical recording media that use magneto-optical recording films made of alloy films of rare earth metals and transition metals, such as TbFeCo alloys or NdDyFeCo alloys, where recording film deterioration is a problem as described above. Qin effect. As described above, the present invention greatly contributes to improving the durability of optical recording media, especially magneto-optical recording media.
第1図は、本発明になる単なる透明プラスチック基板を
貼合せた片面記録の光磁気記録媒体の例の部分概略断面
図である。
第2図は、第1図の単なる透明プラスチック基板を記録
層付に替えて貼合せた両面記録の例の部分概略断面図で
ある。
1.1° :透明プラスチック基板、2,2° :誘電
体層、3.3’:光磁気記録層、4.4’:保護層、5
:接着層FIG. 1 is a partial schematic sectional view of an example of a magneto-optical recording medium for single-sided recording in which a simple transparent plastic substrate according to the present invention is laminated. FIG. 2 is a partial schematic sectional view of an example of double-sided recording in which the simple transparent plastic substrate of FIG. 1 is laminated with a recording layer instead. 1.1°: Transparent plastic substrate, 2,2°: Dielectric layer, 3.3': Magneto-optical recording layer, 4.4': Protective layer, 5
: Adhesive layer
Claims (1)
、少なくともその一方に、記録層を積層し、かつ記録層
が内側になるように透明プラスチック基板を接着剤によ
り接着させた貼合せ構造の光記録媒体において、該接着
剤が (A)架橋性オリゴマー (B)多官能のアクリル酸エステル及び/またはメタア
クリル酸エステル (C)光重合開始剤 から主として成る紫外線硬化型樹脂であり、(1)前記
架橋性オリゴマーのアクロイル基当りの分子量が少くと
も150であり、 (2)3官能以上のアクリル酸エステル及び/またはメ
タアクリル酸エステルの含有量が少くとも15重量%で
あり、 (3)硬化後の膜の軟化点が50℃以上であることを特
徴とする光記録媒体。 2、前記紫外線硬化樹脂の酸化が1.5以下である請求
項第1項記載の光記録媒体。 3、前記記録層が光磁気記録層である請求項第1項又は
第2項記載の光記録媒体。 4、該記録層の基板側に誘電体層が、接着側に保護層が
設けられた請求項第1項、第2項又は第3項項記載の光
記録媒体。[Claims] Consisting of one or two disk-shaped transparent plastic substrates, a recording layer is laminated on at least one of them, and the transparent plastic substrates are adhered with an adhesive so that the recording layer is on the inside. In the optical recording medium with a laminated structure, the adhesive is an ultraviolet curable resin mainly consisting of (A) a crosslinkable oligomer, (B) a polyfunctional acrylic ester and/or methacrylic ester, and (C) a photopolymerization initiator. (1) the molecular weight per acroyl group of the crosslinkable oligomer is at least 150, and (2) the content of trifunctional or higher functional acrylic ester and/or methacrylic ester is at least 15% by weight. (3) An optical recording medium characterized in that the softening point of the film after curing is 50°C or higher. 2. The optical recording medium according to claim 1, wherein the oxidation of the ultraviolet curable resin is 1.5 or less. 3. The optical recording medium according to claim 1 or 2, wherein the recording layer is a magneto-optical recording layer. 4. The optical recording medium according to claim 1, 2 or 3, wherein a dielectric layer is provided on the substrate side of the recording layer, and a protective layer is provided on the adhesive side of the recording layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1023971A JP2555178B2 (en) | 1988-02-03 | 1989-02-03 | Optical recording medium |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63-22122 | 1988-02-03 | ||
JP2212288 | 1988-02-03 | ||
JP1023971A JP2555178B2 (en) | 1988-02-03 | 1989-02-03 | Optical recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01294247A true JPH01294247A (en) | 1989-11-28 |
JP2555178B2 JP2555178B2 (en) | 1996-11-20 |
Family
ID=26359298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1023971A Expired - Lifetime JP2555178B2 (en) | 1988-02-03 | 1989-02-03 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2555178B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003212939A (en) * | 2002-01-25 | 2003-07-30 | Mitsubishi Rayon Co Ltd | Photocurable film and optical disk |
JP2003212938A (en) * | 2002-01-24 | 2003-07-30 | Mitsubishi Rayon Co Ltd | Active energy ray-curable composition and transfer sheet |
JP2003231725A (en) * | 2002-02-08 | 2003-08-19 | Mitsubishi Rayon Co Ltd | Actinic radiation-curable composition, and optical disk |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62234254A (en) * | 1986-04-04 | 1987-10-14 | Tdk Corp | Magneto-optical recording medium |
-
1989
- 1989-02-03 JP JP1023971A patent/JP2555178B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62234254A (en) * | 1986-04-04 | 1987-10-14 | Tdk Corp | Magneto-optical recording medium |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003212938A (en) * | 2002-01-24 | 2003-07-30 | Mitsubishi Rayon Co Ltd | Active energy ray-curable composition and transfer sheet |
JP2003212939A (en) * | 2002-01-25 | 2003-07-30 | Mitsubishi Rayon Co Ltd | Photocurable film and optical disk |
JP2003231725A (en) * | 2002-02-08 | 2003-08-19 | Mitsubishi Rayon Co Ltd | Actinic radiation-curable composition, and optical disk |
Also Published As
Publication number | Publication date |
---|---|
JP2555178B2 (en) | 1996-11-20 |
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