JPH01292034A - Production of poly(amidobenzoxazole) resin - Google Patents
Production of poly(amidobenzoxazole) resinInfo
- Publication number
- JPH01292034A JPH01292034A JP12291088A JP12291088A JPH01292034A JP H01292034 A JPH01292034 A JP H01292034A JP 12291088 A JP12291088 A JP 12291088A JP 12291088 A JP12291088 A JP 12291088A JP H01292034 A JPH01292034 A JP H01292034A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- formula
- aromatic
- poly
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 51
- 229920005989 resin Polymers 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 125000003118 aryl group Chemical group 0.000 claims abstract description 20
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000003960 organic solvent Substances 0.000 claims abstract description 6
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 5
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 3
- 229920006122 polyamide resin Polymers 0.000 claims description 24
- 238000006243 chemical reaction Methods 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 238000007363 ring formation reaction Methods 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- FDQSRULYDNDXQB-UHFFFAOYSA-N benzene-1,3-dicarbonyl chloride Chemical compound ClC(=O)C1=CC=CC(C(Cl)=O)=C1 FDQSRULYDNDXQB-UHFFFAOYSA-N 0.000 abstract description 7
- 239000004760 aramid Substances 0.000 abstract description 4
- 229920003235 aromatic polyamide Polymers 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 238000000862 absorption spectrum Methods 0.000 description 21
- 238000000921 elemental analysis Methods 0.000 description 21
- 239000010408 film Substances 0.000 description 17
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 9
- 230000009477 glass transition Effects 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- -1 triethylsilyl group Chemical group 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 229920002577 polybenzoxazole Polymers 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 125000002971 oxazolyl group Chemical group 0.000 description 4
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 3
- QIVUCLWGARAQIO-OLIXTKCUSA-N (3s)-n-[(3s,5s,6r)-6-methyl-2-oxo-1-(2,2,2-trifluoroethyl)-5-(2,3,6-trifluorophenyl)piperidin-3-yl]-2-oxospiro[1h-pyrrolo[2,3-b]pyridine-3,6'-5,7-dihydrocyclopenta[b]pyridine]-3'-carboxamide Chemical compound C1([C@H]2[C@H](N(C(=O)[C@@H](NC(=O)C=3C=C4C[C@]5(CC4=NC=3)C3=CC=CN=C3NC5=O)C2)CC(F)(F)F)C)=C(F)C=CC(F)=C1F QIVUCLWGARAQIO-OLIXTKCUSA-N 0.000 description 2
- WVDRSXGPQWNUBN-UHFFFAOYSA-N 4-(4-carboxyphenoxy)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C=C1 WVDRSXGPQWNUBN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- NZZGQZMNFCTNAM-UHFFFAOYSA-N naphthalene-2,6-dicarbonyl chloride Chemical compound C1=C(C(Cl)=O)C=CC2=CC(C(=O)Cl)=CC=C21 NZZGQZMNFCTNAM-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- 150000000183 1,3-benzoxazoles Chemical class 0.000 description 1
- HXTRQHCNHIVFEP-UHFFFAOYSA-N 1-n,3-n-bis(trimethylsilyl)-4-trimethylsilyloxybenzene-1,3-diamine Chemical compound C[Si](C)(C)NC1=CC=C(O[Si](C)(C)C)C(N[Si](C)(C)C)=C1 HXTRQHCNHIVFEP-UHFFFAOYSA-N 0.000 description 1
- PCAXITAPTVOLGL-UHFFFAOYSA-N 2,3-diaminophenol Chemical compound NC1=CC=CC(O)=C1N PCAXITAPTVOLGL-UHFFFAOYSA-N 0.000 description 1
- QDBOAKPEXMMQFO-UHFFFAOYSA-N 4-(4-carbonochloridoylphenyl)benzoyl chloride Chemical compound C1=CC(C(=O)Cl)=CC=C1C1=CC=C(C(Cl)=O)C=C1 QDBOAKPEXMMQFO-UHFFFAOYSA-N 0.000 description 1
- LFEWXDOYPCWFHR-UHFFFAOYSA-N 4-(4-carboxybenzoyl)benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C=C1 LFEWXDOYPCWFHR-UHFFFAOYSA-N 0.000 description 1
- SJVGFKBLUYAEOK-SFHVURJKSA-N 6-[4-[(3S)-3-(3,5-difluorophenyl)-3,4-dihydropyrazole-2-carbonyl]piperidin-1-yl]pyrimidine-4-carbonitrile Chemical compound FC=1C=C(C=C(C=1)F)[C@@H]1CC=NN1C(=O)C1CCN(CC1)C1=CC(=NC=N1)C#N SJVGFKBLUYAEOK-SFHVURJKSA-N 0.000 description 1
- 235000005956 Cosmos caudatus Nutrition 0.000 description 1
- MMOXZBCLCQITDF-UHFFFAOYSA-N N,N-diethyl-m-toluamide Chemical compound CCN(CC)C(=O)C1=CC=CC(C)=C1 MMOXZBCLCQITDF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XIWMTQIUUWJNRP-UHFFFAOYSA-N amidol Chemical compound NC1=CC=C(O)C(N)=C1 XIWMTQIUUWJNRP-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- YAZXITQPRUBWGP-UHFFFAOYSA-N benzene-1,3-dicarbonyl bromide Chemical compound BrC(=O)C1=CC=CC(C(Br)=O)=C1 YAZXITQPRUBWGP-UHFFFAOYSA-N 0.000 description 1
- KRJYMHQSKZCAEL-UHFFFAOYSA-N benzene-1,3-dicarbonyl iodide Chemical compound IC(=O)C1=CC=CC(C(I)=O)=C1 KRJYMHQSKZCAEL-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- VOVZXURTCKPRDQ-CQSZACIVSA-N n-[4-[chloro(difluoro)methoxy]phenyl]-6-[(3r)-3-hydroxypyrrolidin-1-yl]-5-(1h-pyrazol-5-yl)pyridine-3-carboxamide Chemical compound C1[C@H](O)CCN1C1=NC=C(C(=O)NC=2C=CC(OC(F)(F)Cl)=CC=2)C=C1C1=CC=NN1 VOVZXURTCKPRDQ-CQSZACIVSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011356 non-aqueous organic solvent Substances 0.000 description 1
- XULSCZPZVQIMFM-IPZQJPLYSA-N odevixibat Chemical compound C12=CC(SC)=C(OCC(=O)N[C@@H](C(=O)N[C@@H](CC)C(O)=O)C=3C=CC(O)=CC=3)C=C2S(=O)(=O)NC(CCCC)(CCCC)CN1C1=CC=CC=C1 XULSCZPZVQIMFM-IPZQJPLYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- KMIOJWCYOHBUJS-HAKPAVFJSA-N vorolanib Chemical compound C1N(C(=O)N(C)C)CC[C@@H]1NC(=O)C1=C(C)NC(\C=C/2C3=CC(F)=CC=C3NC\2=O)=C1C KMIOJWCYOHBUJS-HAKPAVFJSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、芳香族ポリ(アミドベンゾオキサゾ−ル)樹
脂の新規な製造法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a novel method for producing aromatic poly(amidobenzoxazole) resins.
従来、芳香族ポリベンゾオキサゾールのある種のものは
、高重合度のものを得ることに成功しており、引張強度
、曲げ強度、衝撃強さなどの機械的性質、熱変形温度、
熱分解などの熱的性質、各種の溶剤に対する耐溶剤性等
の特性が優れていることが知られている。しかしこれら
のベンゾオキサゾールは、成形性が悪いため、中間段階
すなわち可溶性のポリアミドの状態で成形し、その後オ
キサゾール環を形成する方法が採用されている。Conventionally, some aromatic polybenzoxazoles have been successfully obtained with a high degree of polymerization, and have been improved in mechanical properties such as tensile strength, bending strength, impact strength, heat distortion temperature,
It is known to have excellent properties such as thermal properties such as thermal decomposition and solvent resistance to various solvents. However, since these benzoxazoles have poor moldability, a method has been adopted in which they are molded in an intermediate stage, that is, in a soluble polyamide state, and then an oxazole ring is formed.
このポリベンゾオキサゾールのオキサゾール環形成方法
は、例えばMacromol、Chem、、 83.1
67(1965)、特公昭42−19271号などによ
って公知である。This oxazole ring formation method of polybenzoxazole is described, for example, by Macromol, Chem, 83.1
67 (1965), Japanese Patent Publication No. 42-19271, etc.
一般に高分子樹脂の性質を決定するうえで、分子量の与
える影響は重要である。重合度が低く分子量が小さい場
合は、粘性や柔軟性が不充分となり、膜、t!J維、成
形品に加工することが田畑である。また加工しても強度
や耐熱性等に充分な性質が得られない。従来、知られる
高重合度のポリベンゾオキサゾールは、熱分解開始温度
が400C以上と優れた熱安定性を示すが、これに反し
て加工性に全く劣る。従来加工性を高めるためにジアミ
ン成分やジカルボン酸シバライド成分として特定の化合
物を用いることがよく行なわれ、その例としては例えば
、特開昭62−283127号などがある。In general, the influence of molecular weight is important in determining the properties of polymer resins. If the degree of polymerization is low and the molecular weight is small, the viscosity and flexibility will be insufficient, resulting in a thin film. Tabata is the processing of J-fiber and molded products. Furthermore, even if processed, sufficient properties such as strength and heat resistance cannot be obtained. Conventionally known polybenzoxazole with a high degree of polymerization exhibits excellent thermal stability with a thermal decomposition initiation temperature of 400 C or higher, but on the other hand, it is completely inferior in processability. Conventionally, specific compounds have often been used as diamine components and dicarboxylic acid cybaride components in order to improve processability; examples thereof include, for example, JP-A-62-283127.
しかしながら、これらの方法では充分な加工性、可撓性
を有するポリベンゾオキサゾールは得られない。However, by these methods, polybenzoxazole having sufficient processability and flexibility cannot be obtained.
さらに、本発明の目的物であるポリ(アミドベンゾオキ
サゾール)樹脂の製造法としては、例えば米国特許第3
322723号などがあるが、その原料トする2、4−
ジアミノフェノールの精製が困難で反応性が悪いために
高分子量の重合体を得ることは、困難であった。Further, as a method for producing poly(amidebenzoxazole) resin, which is the object of the present invention, for example, US Pat.
No. 322723, etc., but the raw materials are 2, 4-
It has been difficult to obtain high molecular weight polymers because diaminophenol is difficult to purify and has poor reactivity.
本発明者らはポリベンゾオキサゾールの加工性、可撓性
等成形上の難点を解決するため、充分に高分子量で耐熱
性に富み、かつ加工性、可撓性にも優れた芳香族ポリ(
アミドベンゾオキサゾール)樹脂を得るべく鋭意努力し
た結果、本発明をなすに至ったー
〔問題点を解決するための手段〕
本発明は、一般式
(式中、R1は1価の有機珪素基、R3は水素または1
価の有機珪素基を示す。)で表わされる芳香族ジアミン
と一般式
(式中、Rは2価の芳香族基、Yはハロゲンを示す。)
で表わされる一種または二種以上の芳香族ジカルボン酸
シバライドを有機溶媒中で反応させて、一般式
で表わされる芳香族ポリアミド樹脂を製造し、その後、
当該ポリアミド樹脂を環化反応させて、一般式
(式中、Rは2価の芳香族基、nけ5〜200の整数を
示す。)で表わされる芳香族ポリ(アミドベンゾオキサ
ゾール)に転化させることを特徴とするポリ(アミドベ
ンゾオキサゾール)樹脂の製造方法である。In order to solve the molding difficulties of polybenzoxazole, such as its processability and flexibility, the present inventors have developed an aromatic poly(polybenzoxazole), which has a sufficiently high molecular weight, high heat resistance, and excellent processability and flexibility.
As a result of our earnest efforts to obtain a resin (amidobenzoxazole), we have achieved the present invention. [Means for solving the problems] The present invention is based on the general formula R3 is hydrogen or 1
represents a valent organosilicon group. ) and the general formula (wherein, R is a divalent aromatic group and Y is a halogen).
One or more aromatic dicarboxylic acid civalides represented by are reacted in an organic solvent to produce an aromatic polyamide resin represented by the general formula, and then,
The polyamide resin is subjected to a cyclization reaction to convert it into an aromatic poly(amidebenzoxazole) represented by the general formula (wherein R is a divalent aromatic group and n is an integer from 5 to 200). This is a method for producing poly(amidebenzoxazole) resin characterized by the following.
上記一般式lで表わされる芳香族ポリアミド樹脂は、上
記一般式(I)で表わされる芳香族ジアミンと上記一般
式(n)で表わされる一種または二種以上の芳香族ジカ
ルボン酸シバライドとの反応によって製造される。一般
式(I)の芳香族ジアミンの有する基R1、Rtの有機
珪素基の例としては、トリメチルシリル基、トリエチル
シリル基、トリプロピルシリル基等があり、具体的に例
示すると、2,4−ビス(トリメチルシリルアミノ)−
トリメチルシロキシベンゼン 2,5−ビス(トリメチ
ルシリルアミノ)−トリメチルシロキシベンゼン等が有
効である。The aromatic polyamide resin represented by the above general formula 1 is produced by the reaction between the aromatic diamine represented by the above general formula (I) and one or more aromatic dicarboxylic acid civalides represented by the above general formula (n). Manufactured. Examples of the organosilicon groups R1 and Rt of the aromatic diamine of general formula (I) include trimethylsilyl group, triethylsilyl group, tripropylsilyl group, etc. Specific examples include 2,4-bis (trimethylsilylamino)-
Trimethylsiloxybenzene 2,5-bis(trimethylsilylamino)-trimethylsiloxybenzene and the like are effective.
一般式(It)で表わされる芳香族ジカルボン酸ジノ・
ライドとしては、例えばインフタル酸ジクロリド、イソ
フタル酸ジブロミド、イソフタル酸ジイオダイド、テレ
フタル酸ジクロリド、4,4′−ビフェニルジカルボン
酸ジクロリド、ジフェニルエーテル−4,4′−ジカル
ボン酸ジクロリド、ベンゾフェノン−4,4′−ジカル
ボン酸ジクロリド、ジフェニルスルホン−4,4’−ジ
カルボン酸ジクロリド、インプロピリデンジフェニル−
4,4′−ジカルボン酸ジクロリド、ヘキサフルオロイ
ソプロピリデンジフェニル−4,4′−ジカルボン酸ジ
クロリド、ナフタレン−2,6−ジカルボン酸ジクロリ
ド等を例示できる。これらは単独でも、2種類以上を混
合して用いてもよい。Aromatic dicarboxylic acid dino-
Examples of the ride include inphthalic acid dichloride, isophthalic acid dibromide, isophthalic acid diiodide, terephthalic acid dichloride, 4,4'-biphenyldicarboxylic acid dichloride, diphenyl ether-4,4'-dicarboxylic acid dichloride, and benzophenone-4,4'-dicarboxylic acid dichloride. Acid dichloride, diphenylsulfone-4,4'-dicarboxylic acid dichloride, inpropylidene diphenyl-
Examples include 4,4'-dicarboxylic acid dichloride, hexafluoroisopropylidene diphenyl-4,4'-dicarboxylic acid dichloride, and naphthalene-2,6-dicarboxylic acid dichloride. These may be used alone or in combination of two or more.
この方法において、一般式側で表わされるポリ(アミド
ベンゾオキサゾール)樹脂の分子量は、一般式(I)で
表わされるジアミン化合物と一般式(■)で表わされる
一種または二種以上のジカルボン酸シバライドの仕込比
によって影響を受け、これらの反応成分を等モル量使用
すると高分子量の芳香族ポリ(アミドベンゾオキサゾー
ル)樹脂を製造することができる。In this method, the molecular weight of the poly(amidebenzoxazole) resin represented by the general formula is determined by the combination of the diamine compound represented by the general formula (I) and one or more dicarboxylic acid civalides represented by the general formula (■). It is possible to produce a high molecular weight aromatic poly(amidebenzoxazole) resin by using equimolar amounts of these reaction components, which are influenced by the charging ratio.
本発明における一般式(1)で表わされる芳香族ジアミ
ン化合物と一般式(It)で表わされる一種または二種
以上の芳香族ジカルボン酸ジノ・ライドとの反応は、有
機溶媒中、実質上無水の条件下で、約−30Cから10
0C1好ましくは約−207?から50Cの溶媒温度で
数分から数時間反応させて行なわせる。In the present invention, the reaction between the aromatic diamine compound represented by the general formula (1) and one or more aromatic dicarboxylic acid dino-lides represented by the general formula (It) is carried out in an organic solvent with a substantially anhydrous under conditions of approximately -30C to 10
0C1 preferably about -207? The reaction is carried out for several minutes to several hours at a solvent temperature of 50C.
この方法に使用できる有機溶媒は、一般に公知の非水系
有機溶媒を広範囲に用いることができる。As the organic solvent that can be used in this method, a wide variety of generally known non-aqueous organic solvents can be used.
具体的には、N、N−ジメチルホルムアミド、N。Specifically, N,N-dimethylformamide, N.
N−ジメチルアセトアミド、N−メチル−2−ピロリド
ン、1,3−ジメチルイミダゾリトン等の窒素系溶媒、
ベンゼン、トルエン、アニソール、ジフェニルエーテル
、ニトロベンゼン等のベンゼン系溶媒、クロロホルム、
四塩化炭素、トリクロルエタン等のハロゲン化炭化水素
、ジメチルスルホキシド、テトラメチルスルホン等のイ
オウ系溶媒、さらにテトラヒドロフラン等のエーテル系
溶媒等を例示できるが、これらに限定されるものではな
い。Nitrogen solvents such as N-dimethylacetamide, N-methyl-2-pyrrolidone, 1,3-dimethylimidazolitone,
Benzene, toluene, anisole, diphenyl ether, benzene solvents such as nitrobenzene, chloroform,
Examples include halogenated hydrocarbons such as carbon tetrachloride and trichloroethane, sulfur solvents such as dimethylsulfoxide and tetramethylsulfone, and ether solvents such as tetrahydrofuran, but are not limited to these.
一般式(It)で表わされるポリアミド樹脂から一般弐
潤で表わされるポリ(アミドベンゾオキサゾール)樹脂
の製造は、数秒から数時間、好壕しくけ約1時間から2
4時間、温度的100Cから500C1好ましくは約1
50t?から300Cで加熱することによね行なわれる
。一般式(1)で表わされるポリアミド樹脂のR2が水
素の場合は、ポリIJン酸などの脱水剤存在下では低温
で反応を行なうことができる。The production of the poly(amide benzoxazole) resin represented by the general formula (It) from the polyamide resin represented by the general formula (It) is carried out in a suitable trench for several seconds to several hours, and for about 1 hour to 2 hours.
4 hours at a temperature of 100C to 500C, preferably about 1
50t? This is done by heating from 300C to 300C. When R2 of the polyamide resin represented by the general formula (1) is hydrogen, the reaction can be carried out at a low temperature in the presence of a dehydrating agent such as polyIJ acid.
一般式(1)と一般式(Tl)を基にした最終生成物で
ある一般式(5)の収率は、理論収率に対して約90〜
98係ときわめて高い。The yield of general formula (5), which is the final product based on general formula (1) and general formula (Tl), is about 90 to
The number is extremely high at 98.
本発明は、一般式側で表わされる芳香族ポリ(アミドベ
ンゾオキサゾール)樹脂の有効な製造方法を提供する。The present invention provides an effective method for producing an aromatic poly(amidebenzoxazole) resin represented by the general formula.
本発明により得られる樹脂は、分子間にアミド結合とオ
キサゾール環とを含む樹脂であり、耐熱性、耐候性、機
械的強度、電気的特性等の諸性質が良好であり、かつ加
工性、可祷性に優れ成形性に富む優れた工業材料である
。The resin obtained by the present invention is a resin containing an amide bond and an oxazole ring between molecules, and has good properties such as heat resistance, weather resistance, mechanical strength, and electrical properties, and has good processability and flexibility. It is an excellent industrial material with excellent moldability and moldability.
本発明は従来のオキサゾール環を有する樹脂より充分高
分子量の樹脂を製造するだめの有利な方法を提供し、工
業的利用価値も高いものである。The present invention provides an advantageous method for producing a resin having a sufficiently higher molecular weight than conventional resins having oxazole rings, and has high industrial utility value.
以下、本発明を実施例によって更に詳細に説明する。 Hereinafter, the present invention will be explained in more detail with reference to Examples.
実施例−1
容量5011の三つロフラスコに、2.4−ビス(トリ
メチルシリルアミノ)−トリメチルシロキシベンゼン0
.851 ? (2,5mmo、、e)、N−メチル−
2−ピロリドン5.Omlを採り、窒素ガス雰囲気下で
攪拌溶解した。Example-1 2,4-bis(trimethylsilylamino)-trimethylsiloxybenzene was placed in a three-necked flask with a capacity of 5011.
.. 851? (2,5mmo,,e), N-methyl-
2-pyrrolidone5. Oml was taken and dissolved with stirring under a nitrogen gas atmosphere.
この溶液を氷・食塩で一15tll”に冷却した後、イ
ソフタル酸ジクロリド0.508 P (2,5mmo
−6)を添加した。これを6時間攪拌した後、溶液を大
量のメタノール中に投入し、ポリアミド樹脂の沈澱を得
た。生成樹脂の固有粘度は1.49 (0,5f/di
ジメチルアセトアミド、30C)であった。After cooling this solution to 115 tll with ice and salt, add 0.508 P of isophthalic acid dichloride (2.5 mmol
-6) was added. After stirring this for 6 hours, the solution was poured into a large amount of methanol to obtain a polyamide resin precipitate. The intrinsic viscosity of the produced resin is 1.49 (0.5f/di
dimethylacetamide, 30C).
赤外線吸収スペクトルおよび元素分析の結果、の)4造
であることを確認した。As a result of infrared absorption spectrum and elemental analysis, it was confirmed that it was a) 4-product.
赤外線吸収スペクトル1655rm−’(C=0)元息
分析 CHN
計算値(係) 66.14 3.96 11.02実
測値(Qb) 65.25 3.89 10.83次
いでこのポリアミド樹脂をジメチルアセトアミドに溶解
し、ガラス板上に展開してフィルムを成形した。Infrared absorption spectrum 1655rm-' (C=0) origin analysis CHN Calculated value (correspondence) 66.14 3.96 11.02 Actual value (Qb) 65.25 3.89 10.83 Then, this polyamide resin was treated with dimethylacetamide. A film was formed by dissolving the solution in water and spreading it on a glass plate.
このフィルムを減圧化280〜300Cで15時間加熱
処理し、透明で強じんなフィルムを得た。This film was heat-treated at a reduced pressure of 280 to 300 C for 15 hours to obtain a transparent and strong film.
赤外線吸収スペクトル(フィルムの透過法)および元素
分析の結果、次式で表されるポリ(アミドベンゾオキサ
ゾール)樹脂であることを確認し赤外線吸収スペクトル
1660m″″’(C=O)1620CrrI−’
(C=N )
元素分析
CHN
計算値(%) 71.18 3.41 11.86実
測値(係) 69.93 3.35 11.73だ。As a result of infrared absorption spectrum (film transmission method) and elemental analysis, it was confirmed that it was a poly(amide benzoxazole) resin represented by the following formula, and the infrared absorption spectrum was 1660 m''''' (C=O) 1620 CrrI-'
(C=N) Elemental analysis CHN Calculated value (%) 71.18 3.41 11.86 Actual value (correspondence) 69.93 3.35 11.73.
実施例−2
イソフタル酸ジクロリドの代わりKそれと同量゛のテレ
フタル酸ジクロリド0.508 y−(2,5mmnA
)を使用した以外、実施例−1と同じ方法で反応を行
い、ポリアミド樹脂を得た。Example-2 Instead of isophthalic acid dichloride, the same amount of terephthalic acid dichloride (0.508 y-(2.5 mmnA
) was used, but the reaction was carried out in the same manner as in Example 1 to obtain a polyamide resin.
固有粘度は1.40 (0,5f/di N−メチル
−2−ピロリドン、30C)であった。赤外線吸収スペ
クトルおよび元素分析の結果、
の構造であることを確認した。The intrinsic viscosity was 1.40 (0.5 f/di N-methyl-2-pyrrolidone, 30C). As a result of infrared absorption spectrum and elemental analysis, it was confirmed that it has the following structure.
この樹脂をN−メチル−2−ピロリドンニ溶解し、ガラ
ス板上にフィルム成形し、実施例−1と同様の熱処理を
行った。This resin was dissolved in N-methyl-2-pyrrolidone, formed into a film on a glass plate, and subjected to the same heat treatment as in Example-1.
得られた樹脂の元素分析結果および赤外線吸収スペクト
ルより下記の構造のポリ(アミドベンゾオキサゾール)
樹脂であることを確認した。From the elemental analysis results and infrared absorption spectrum of the obtained resin, poly(amidebenzoxazole) with the following structure was found.
It was confirmed that it was resin.
この樹脂のガラス転移温度は301C1引張強度け11
4MPa、初期弾性率は3.0GPaであった。The glass transition temperature of this resin is 301C1 tensile strength is 11
4 MPa, and the initial elastic modulus was 3.0 GPa.
実施例−3
N−メチル−2−ピロリドンの代わりに、それと同量の
テトラヒドロフランを溶媒として使用した以外、実施例
−1と同じ方法で反応を行い、ポリアミド樹脂を得た。Example 3 A polyamide resin was obtained by carrying out the reaction in the same manner as in Example 1, except that the same amount of tetrahydrofuran was used as a solvent instead of N-methyl-2-pyrrolidone.
固有粘度は0.73 (0,5%/d/ ジメチルア
セトアミド、30C)であった。赤外線吸収スペクトル
および元素分析の結果、実施例−1と同じ構造の樹脂で
あることを確認した。このポリアミド樹脂をジメチルア
セトアミドに溶解し実施例−1と同様の熱処理を行なっ
た。得られた樹脂の赤外゛線吸収スペクトルおよび元素
分析の結果、実施例−1と同じ構造のポリ(アミドベン
ゾオキサゾール)樹脂であることを確認した。The intrinsic viscosity was 0.73 (0.5%/d/dimethylacetamide, 30C). As a result of infrared absorption spectrum and elemental analysis, it was confirmed that the resin had the same structure as Example-1. This polyamide resin was dissolved in dimethylacetamide and subjected to the same heat treatment as in Example-1. As a result of infrared absorption spectrum and elemental analysis of the obtained resin, it was confirmed that it was a poly(amidobenzoxazole) resin having the same structure as in Example-1.
実施例−4
インフタル酸ジクロリドの代わりに、それと等モル景の
ナフタレン−2,6−ジカルポン酸ジクロリド0.63
3 f (2,5mmo、6 )を使用した以外、実施
例−1と同じ方法で反応を行い、ポリアミド樹脂を得た
。固有粘度は1.58 (0,5f/dl 濃硫酸、
30C)であった。Example-4 Instead of inphthalic acid dichloride, 0.63 of naphthalene-2,6-dicarboxylic acid dichloride, which has an equimolar proportion thereto, was used.
A polyamide resin was obtained by carrying out the reaction in the same manner as in Example-1 except that 3f (2.5mmo, 6) was used. Intrinsic viscosity is 1.58 (0.5f/dl concentrated sulfuric acid,
30C).
赤外線吸収スペクトルおよび元素分析の結果、の構造で
あることを確認した。The structure was confirmed by infrared absorption spectrum and elemental analysis.
フィルム成形は、ポリアミド樹脂を含む反応液をそのま
まガラス板上に展開する方法で行った。Film molding was performed by spreading a reaction solution containing a polyamide resin on a glass plate as it was.
このフィルムを減圧下、280〜300Cで15時間加
熱処理し、得られた樹脂の赤外線吸収スペクトルおよび
元素分析の結果、下記の構造のポリ(アミドベンゾオキ
サゾール)樹脂であることを確認した。This film was heat-treated at 280 to 300C for 15 hours under reduced pressure, and as a result of infrared absorption spectrum and elemental analysis of the resulting resin, it was confirmed that it was a poly(amidebenzoxazole) resin with the following structure.
この樹脂のガラス転移温度は2870であり、引張強度
は105MPa1初期弾性率は3.0GPaであった。The glass transition temperature of this resin was 2870, the tensile strength was 105 MPa, and the initial elastic modulus was 3.0 GPa.
実施例−5
イソフタル酸ジクロリドの代わりに、それと等モル量の
ジフェニル−4,4′−ジカルボン酸ジクロリド0.6
98 f (2,5mmo−g )を使用した以外、実
施例−1と同じ方法で反応を行い、ポリアミド樹脂を得
た。固有粘度は2.23 (0,5f/di 濃硫酸
、30C)であった。Example-5 Instead of isophthalic acid dichloride, an equimolar amount of diphenyl-4,4'-dicarboxylic acid dichloride 0.6
A polyamide resin was obtained by carrying out the reaction in the same manner as in Example-1 except that 98 f (2.5 mmo-g) was used. The intrinsic viscosity was 2.23 (0.5 f/di concentrated sulfuric acid, 30C).
赤外線吸収スペクトルおよび元素分析の結果、の構造で
あることを確認した。The structure was confirmed by infrared absorption spectrum and elemental analysis.
フィルム成形も実施例−4に従い行った。Film molding was also carried out according to Example-4.
赤外線吸収スペクトルおよび元素分析の結果、の構造で
あるポリ(アミドベンゾオキサゾール)樹脂であること
を確認した。As a result of infrared absorption spectrum and elemental analysis, it was confirmed that it was a poly(amidobenzoxazole) resin with the structure.
この樹脂のガラス転位温度は285″Cであり、引張強
度は120MPa、初期弾性率は3.50P aであっ
た。The glass transition temperature of this resin was 285''C, the tensile strength was 120 MPa, and the initial elastic modulus was 3.50 Pa.
実施例−6
イソフタル酸ジクロリドの代わりに、それと等モル量の
ジフェニルエーテル−4,4′−ジカルボン酸ジクロリ
ド0.738 F (2,5mmo−6)を使用した以
外、実施例−1と同じ方法で反応を行い、ポリアミド樹
脂を得た。固有粘度は0.83 (0,5%/#ジメチ
ルアセトアミド、30C)であった。Example-6 The same method as Example-1 was used, except that an equimolar amount of diphenyl ether-4,4'-dicarboxylic acid dichloride 0.738 F (2,5 mmo-6) was used instead of isophthalic acid dichloride. A reaction was carried out to obtain a polyamide resin. The intrinsic viscosity was 0.83 (0.5%/#dimethylacetamide, 30C).
赤外線吸収スペクトルおよび元素分析の結果、の構造で
あることを確認した。The structure was confirmed by infrared absorption spectrum and elemental analysis.
次いでこのポリアミド樹脂をジメチルアセトアミドに溶
解し、ガラス板上に展開してフィルムに成形した。Next, this polyamide resin was dissolved in dimethylacetamide and spread on a glass plate to form a film.
このフィルムを減圧下、280〜300Cで15時間加
熱処理した。得られた樹脂の赤外線吸収スペクトルおよ
び元素分析の結果、下記の構造のポリ(アミドベンゾオ
キサゾール)樹脂であることを確認した。This film was heat-treated at 280 to 300C for 15 hours under reduced pressure. As a result of infrared absorption spectrum and elemental analysis of the obtained resin, it was confirmed that it was a poly(amidebenzoxazole) resin having the following structure.
実施例−7
酸ジクロリド0.858 t (2,5mmoA )を
使用した以外、実施例−1と同じ方法で反応を行い、ポ
リアミド樹脂を得た。固有粘度は0.82 (0,5%
/d! ジメチルアセトアミド、30C)であったっ
赤外線吸収スペクトルおよび元素分析の結果、の構造で
あることを確認した。Example 7 A polyamide resin was obtained by carrying out the reaction in the same manner as in Example 1 except that 0.858 t (2.5 mmoA) of acid dichloride was used. Intrinsic viscosity is 0.82 (0.5%
/d! The structure was confirmed to be dimethylacetamide (30C) as a result of infrared absorption spectrum and elemental analysis.
次いでこのポリアミド樹脂を実施例−1と同様の処理を
行い、フィルムを得た。Next, this polyamide resin was treated in the same manner as in Example-1 to obtain a film.
このフィルムの赤外線吸収スペクトルおよび元素分析の
結果、
の構造のポリ(アミドベンゾオキサゾール)樹脂である
ことを確認した。As a result of infrared absorption spectrum and elemental analysis of this film, it was confirmed that it was a poly(amide benzoxazole) resin with the following structure.
この樹脂のガラス転移温度は300Cであった。The glass transition temperature of this resin was 300C.
実施例−8
容t5otnlの三つロフラスコに2,4−ビス(トリ
メチルシリルアミノ)−トリメチルシロキシペンゼy
1.70 f (5,Ommoβ)、N−メチル−2−
ピロリドン10 mlを採り、窒素ガス雰囲気下で攪拌
溶解した。この溶液を氷・食塩で一15rに冷却した後
、イソフタル酸ジクロリドo、5oB(2,smmoβ
)、テレフタル酸ジクロリド0.50854(2,5m
mo1)を添加した。Example-8 2,4-bis(trimethylsilylamino)-trimethylsiloxypenze was added to a three-necked flask with a volume of 5 otnl.
1.70 f (5, Ommoβ), N-methyl-2-
10 ml of pyrrolidone was taken and dissolved with stirring under a nitrogen gas atmosphere. After cooling this solution with ice and salt to -15r, isophthalic acid dichloride o,5oB(2,smmoβ
), terephthalic acid dichloride 0.50854 (2.5m
mo1) was added.
これを6時間攪拌した後、溶液を大量のメタノール中に
投入し、ポリアミド樹脂の沈澱を得た。After stirring this for 6 hours, the solution was poured into a large amount of methanol to obtain a polyamide resin precipitate.
生成樹脂の固有粘度は0.71 (0,5%/# 濃
硫酸、30C)であった。The intrinsic viscosity of the resulting resin was 0.71 (0.5%/# concentrated sulfuric acid, 30C).
赤外線吸収スペクトルおよび元素分析の結果、の二つの
繰り返し単位からなる構造であることを確認した。As a result of infrared absorption spectrum and elemental analysis, it was confirmed that the structure consists of two repeating units.
次いでこのポリアミド樹脂に実施例−1と同様の処理を
行い、フィルムを得た、このフィルムの赤外線吸収スペ
クトルおよび元素分析の結果、の二つの繰り返し単位か
らなる構造のポリ(アミドベンゾオキサゾール)樹脂で
あることを確認した。Next, this polyamide resin was subjected to the same treatment as in Example 1 to obtain a film.The results of the infrared absorption spectrum and elemental analysis of this film revealed that it was a poly(amidebenzoxazole) resin with a structure consisting of two repeating units. I confirmed that there is.
この樹脂のガラス転移温度は283Cであった。The glass transition temperature of this resin was 283C.
実施例−9
テレフタルやジクロリドの代わりに1それと等モル量の
ジフェニル−4,4′−ジカルボン酸ジクロリド0.6
98 !i’ (2,5mmo/ )を使用した以外、
実施例−8と同じ方法で反応を行い、ポリアミド樹脂を
得た。Example-9 Instead of terephthal or dichloride, use 1 and equimolar amount of diphenyl-4,4'-dicarboxylic acid dichloride 0.6
98! Except for using i' (2,5 mmo/ ),
The reaction was carried out in the same manner as in Example 8 to obtain a polyamide resin.
固有粘度は1.67 (0,591−/di 濃硫酸
、30C)であった。The intrinsic viscosity was 1.67 (0,591-/di concentrated sulfuric acid, 30C).
赤外線吸収スペクトルおよび元素分析の結果、の二つの
繰り返し単位からなる構造であることをWi認した。As a result of infrared absorption spectrum and elemental analysis, it was confirmed that it had a structure consisting of two repeating units.
次いでこのポリアミド樹脂を実施例−1と同様の処理を
行い、強じんなフィルムを得た。This polyamide resin was then treated in the same manner as in Example 1 to obtain a strong film.
得られた樹脂の赤外線吸収スペクトルおよび元素分析よ
り下記の二つの繰り返し単位からなる構造のポリ(アミ
ドペンゾオキザール)樹脂であることを確認した。The infrared absorption spectrum and elemental analysis of the obtained resin confirmed that it was a poly(amidepenzoxal) resin having a structure consisting of the following two repeating units.
この樹脂のガラス転移温度は264Cであり、引張強度
114MPa、初期弾性率は3.1GPaであった。The glass transition temperature of this resin was 264C, the tensile strength was 114MPa, and the initial elastic modulus was 3.1GPa.
実施例−10
ド0.633 f (2,5mmo−g )を使用した
以外、実施例−8と同じ方法で反応を行い、ポリアミド
樹脂を得た。Example 10 A polyamide resin was obtained by carrying out the reaction in the same manner as in Example 8, except that 0.633 f (2.5 mmog) was used.
固有粘度は1.52 (0,5%/d+!! 濃硫酸
、30C)であった。The intrinsic viscosity was 1.52 (0.5%/d+!! concentrated sulfuric acid, 30C).
赤外線スペクトルおよび元素分析の結果、の二つの繰り
返し単位からなる構造であることを確認した。As a result of infrared spectrum and elemental analysis, it was confirmed that the structure consists of two repeating units.
次いでこの樹脂を実施例−1と同様の処理を行い、強じ
んなフィルムを得た。This resin was then treated in the same manner as in Example 1 to obtain a strong film.
得られた樹脂の赤外線吸収スペクトルおよび元素分析よ
り下記の二つの繰り返し単位からなる構造の化合物であ
ることを確認した。It was confirmed from the infrared absorption spectrum and elemental analysis of the obtained resin that it was a compound with a structure consisting of the following two repeating units.
このポリ(アミドベンゾオキサゾール)樹脂のガラス転
移温度は269Cであり、引張強度104MPa、初期
弾性率は2.4GPaであった。This poly(amidebenzoxazole) resin had a glass transition temperature of 269C, a tensile strength of 104 MPa, and an initial elastic modulus of 2.4 GPa.
比較例−1
容量50m1の三ツロフラスコに2,4−ジアミノフェ
ノール5 mmoAとN−メチル−2−ピロリドン10
dを採り、窒素ガス雰囲気下で攪拌溶解した。Comparative Example-1 2,4-diaminophenol 5 mmoA and N-methyl-2-pyrrolidone 10 were placed in a 50 ml Mitsulo flask.
d was taken and dissolved with stirring under a nitrogen gas atmosphere.
この溶液を氷・食塩で一15Cに冷却した後、イソフタ
ル酸ジクロリド5 mmo−gを添加した。これを6時
間攪拌した後、溶液を大量のメタノール中に投入し、ポ
リアミド樹脂の粉末沈澱を得た。After cooling this solution to -15C with ice and salt, 5 mmo-g of isophthalic acid dichloride was added. After stirring this for 6 hours, the solution was poured into a large amount of methanol to obtain a powdery precipitate of polyamide resin.
この樹脂の固有粘度は0.31 (0,5f/di
ジメチルアセトアミド、30C)であ〆った。The intrinsic viscosity of this resin is 0.31 (0.5f/di
The mixture was finished with dimethylacetamide (30C).
このポリアミド樹脂は実施例−1のポリアミド樹脂に比
べ粘度が極めて低く、フィルム成形できなかった。This polyamide resin had an extremely low viscosity compared to the polyamide resin of Example-1, and could not be formed into a film.
上記実施例により得られたポリ(アミドベンゾオキサゾ
ール)樹脂は、固有粘度およびガラス転移温度が高く耐
熱性が優れている。1だ、得られたこれらの樹脂は引張
強度や弾性率が大きいので成形性可撓性も優れ、工業上
の有用性が大きい。The poly(amidebenzoxazole) resin obtained in the above example has a high intrinsic viscosity and a high glass transition temperature, and has excellent heat resistance. 1. These resins obtained have high tensile strength and elastic modulus, and therefore have excellent moldability and flexibility, and are of great industrial utility.
特許出願人 コスモ石油株式会社Patent applicant: Cosmo Oil Co., Ltd.
Claims (1)
は1価の有機珪素基を示す。)で表わされる芳香族ジア
ミンと一般式 ▲数式、化学式、表等があります▼(II) (式中、Rは2価の芳香族基、Yはハロゲンを示す。)
で表わされる一種または二種以上の芳香族ジカルボン酸
ジハライドを有機溶媒中で反応させて、 一般式 ▲数式、化学式、表等があります▼(III) (式中、Rは2価の芳香族基、R_2は水素または1価
の有機珪素基、nは5〜200の整数を示す。)で表わ
される芳香族ポリアミド樹脂を製造し、その後、当該ポ
リアミド樹脂を環化反応させて、一般式 ▲数式、化学式、表等があります▼(IV) (式中、Rは2価の芳香族基、nは5〜200の整数を
示す。)で表わされる芳香族ポリ(アミドベンゾオキサ
ゾール)に転化させることを特徴とするポリ(アミドベ
ンゾオキサゾール)樹脂の製造方法。[Claims] 1. General formula ▲ Numerical formula, chemical formula, table, etc. ▼ (I) (In the formula, R_1 represents a monovalent organosilicon group, and R_2 represents hydrogen or a monovalent organosilicon group.) Aromatic diamine represented by the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (II) (In the formula, R represents a divalent aromatic group and Y represents a halogen.)
One or more aromatic dicarboxylic acid dihalides represented by are reacted in an organic solvent to form the general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (III) (In the formula, R is a divalent aromatic group. , R_2 is hydrogen or a monovalent organosilicon group, and n is an integer from 5 to 200.), and then the polyamide resin is subjected to a cyclization reaction to form the general formula ▲ , chemical formulas, tables, etc. ▼(IV) (In the formula, R is a divalent aromatic group, and n is an integer from 5 to 200.) Conversion to aromatic poly(amidebenzoxazole) A method for producing a poly(amidebenzoxazole) resin characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12291088A JPH01292034A (en) | 1988-05-19 | 1988-05-19 | Production of poly(amidobenzoxazole) resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12291088A JPH01292034A (en) | 1988-05-19 | 1988-05-19 | Production of poly(amidobenzoxazole) resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01292034A true JPH01292034A (en) | 1989-11-24 |
Family
ID=14847636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12291088A Pending JPH01292034A (en) | 1988-05-19 | 1988-05-19 | Production of poly(amidobenzoxazole) resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01292034A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013245206A (en) * | 2012-05-28 | 2013-12-09 | Iwate Univ | Hydroxy group-containing aromatic diamine, polyamide resin, resin composition, and applications thereof |
CN109354684A (en) * | 2018-10-23 | 2019-02-19 | 长江师范学院 | A kind of new process of the double oxazoles of synthesis polyparaphenylene's benzo |
US11414520B2 (en) | 2017-12-11 | 2022-08-16 | Lg Chem, Ltd. | Polyamide-imide copolymer and polyamide-imide film comprising the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62283127A (en) * | 1986-05-30 | 1987-12-09 | Central Glass Co Ltd | Production of polybenzoxazole resin |
-
1988
- 1988-05-19 JP JP12291088A patent/JPH01292034A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62283127A (en) * | 1986-05-30 | 1987-12-09 | Central Glass Co Ltd | Production of polybenzoxazole resin |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013245206A (en) * | 2012-05-28 | 2013-12-09 | Iwate Univ | Hydroxy group-containing aromatic diamine, polyamide resin, resin composition, and applications thereof |
US11414520B2 (en) | 2017-12-11 | 2022-08-16 | Lg Chem, Ltd. | Polyamide-imide copolymer and polyamide-imide film comprising the same |
CN109354684A (en) * | 2018-10-23 | 2019-02-19 | 长江师范学院 | A kind of new process of the double oxazoles of synthesis polyparaphenylene's benzo |
CN109354684B (en) * | 2018-10-23 | 2021-01-05 | 长江师范学院 | Process for synthesizing poly (p-phenylene benzobisoxazole) |
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