JPH01287078A - Production of n-acyl cyclic imine compound - Google Patents
Production of n-acyl cyclic imine compoundInfo
- Publication number
- JPH01287078A JPH01287078A JP63311986A JP31198688A JPH01287078A JP H01287078 A JPH01287078 A JP H01287078A JP 63311986 A JP63311986 A JP 63311986A JP 31198688 A JP31198688 A JP 31198688A JP H01287078 A JPH01287078 A JP H01287078A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- reaction
- amide
- basic substance
- strong basic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- -1 amide compound Chemical class 0.000 claims abstract description 95
- 238000006243 chemical reaction Methods 0.000 claims abstract description 59
- 150000001875 compounds Chemical class 0.000 claims abstract description 48
- 239000000126 substance Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000002798 polar solvent Substances 0.000 claims abstract description 8
- 239000000725 suspension Substances 0.000 claims 1
- 239000002994 raw material Substances 0.000 abstract description 14
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 12
- 239000002904 solvent Substances 0.000 abstract description 12
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 abstract description 9
- 238000002156 mixing Methods 0.000 abstract description 2
- 238000011109 contamination Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 19
- 239000000047 product Substances 0.000 description 17
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 125000003118 aryl group Chemical group 0.000 description 15
- 125000001931 aliphatic group Chemical group 0.000 description 13
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 11
- 150000001408 amides Chemical class 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- 229910052783 alkali metal Inorganic materials 0.000 description 8
- 239000003456 ion exchange resin Substances 0.000 description 7
- 229920003303 ion-exchange polymer Polymers 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 239000004202 carbamide Substances 0.000 description 6
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 6
- 125000002843 carboxylic acid group Chemical group 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 6
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 6
- 125000000542 sulfonic acid group Chemical group 0.000 description 6
- 125000002723 alicyclic group Chemical group 0.000 description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 5
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 229920006395 saturated elastomer Polymers 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 4
- 239000004952 Polyamide Chemical class 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 4
- 150000008041 alkali metal carbonates Chemical class 0.000 description 4
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 4
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 description 4
- 238000005349 anion exchange Methods 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229920002647 polyamide Chemical class 0.000 description 4
- 238000007086 side reaction Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- NAYYNDKKHOIIOD-UHFFFAOYSA-N phthalamide Chemical compound NC(=O)C1=CC=CC=C1C(N)=O NAYYNDKKHOIIOD-UHFFFAOYSA-N 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- BSSNZUFKXJJCBG-OWOJBTEDSA-N (e)-but-2-enediamide Chemical compound NC(=O)\C=C\C(N)=O BSSNZUFKXJJCBG-OWOJBTEDSA-N 0.000 description 2
- HWYGBPPFPNZPGQ-IHWYPQMZSA-N (z)-2-methylbut-2-enediamide Chemical compound NC(=O)C(/C)=C\C(N)=O HWYGBPPFPNZPGQ-IHWYPQMZSA-N 0.000 description 2
- BSSNZUFKXJJCBG-UPHRSURJSA-N (z)-but-2-enediamide Chemical compound NC(=O)\C=C/C(N)=O BSSNZUFKXJJCBG-UPHRSURJSA-N 0.000 description 2
- ULTHEAFYOOPTTB-UHFFFAOYSA-N 1,4-dibromobutane Chemical compound BrCCCCBr ULTHEAFYOOPTTB-UHFFFAOYSA-N 0.000 description 2
- IBODDUNKEPPBKW-UHFFFAOYSA-N 1,5-dibromopentane Chemical compound BrCCCCCBr IBODDUNKEPPBKW-UHFFFAOYSA-N 0.000 description 2
- WLPAQAXAZQUXBG-UHFFFAOYSA-N 1-pyrrolidin-1-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCCC1 WLPAQAXAZQUXBG-UHFFFAOYSA-N 0.000 description 2
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 2
- WYLZHEFECDEACB-UHFFFAOYSA-N 2-aminohexanediamide Chemical compound NC(=O)C(N)CCCC(N)=O WYLZHEFECDEACB-UHFFFAOYSA-N 0.000 description 2
- LRYDSZFRAHESBO-UHFFFAOYSA-N 2-cyanohexanediamide Chemical compound NC(=O)CCCC(C#N)C(N)=O LRYDSZFRAHESBO-UHFFFAOYSA-N 0.000 description 2
- YYRFAGCHLGXHTC-UHFFFAOYSA-N 2-decylbenzamide Chemical compound CCCCCCCCCCC1=CC=CC=C1C(N)=O YYRFAGCHLGXHTC-UHFFFAOYSA-N 0.000 description 2
- LVCMKNCJDCTPIB-UHFFFAOYSA-N 2-methyl-1-pyrrolidin-1-ylprop-2-en-1-one Chemical compound CC(=C)C(=O)N1CCCC1 LVCMKNCJDCTPIB-UHFFFAOYSA-N 0.000 description 2
- QFZTXSFHCXQHFT-UHFFFAOYSA-N 2-nitro-3-phenylprop-2-enamide Chemical compound NC(=O)C([N+]([O-])=O)=CC1=CC=CC=C1 QFZTXSFHCXQHFT-UHFFFAOYSA-N 0.000 description 2
- CDOJDRIBZAFDOF-UHFFFAOYSA-N 2-nitrohexanediamide Chemical compound NC(=O)CCCC(C(N)=O)[N+]([O-])=O CDOJDRIBZAFDOF-UHFFFAOYSA-N 0.000 description 2
- LSBDFXRDZJMBSC-UHFFFAOYSA-N 2-phenylacetamide Chemical compound NC(=O)CC1=CC=CC=C1 LSBDFXRDZJMBSC-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000001350 alkyl halides Chemical class 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 125000005577 anthracene group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 2
- 125000001033 ether group Chemical group 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- QZUPTXGVPYNUIT-UHFFFAOYSA-N isophthalamide Chemical compound NC(=O)C1=CC=CC(C(N)=O)=C1 QZUPTXGVPYNUIT-UHFFFAOYSA-N 0.000 description 2
- 229910001510 metal chloride Inorganic materials 0.000 description 2
- 125000001624 naphthyl group Chemical group 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229950000688 phenothiazine Drugs 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- CPRMKOQKXYSDML-UHFFFAOYSA-M rubidium hydroxide Chemical compound [OH-].[Rb+] CPRMKOQKXYSDML-UHFFFAOYSA-M 0.000 description 2
- 235000011121 sodium hydroxide Nutrition 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- 125000001174 sulfone group Chemical group 0.000 description 2
- MHSKRLJMQQNJNC-UHFFFAOYSA-N terephthalamide Chemical compound NC(=O)C1=CC=C(C(N)=O)C=C1 MHSKRLJMQQNJNC-UHFFFAOYSA-N 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- CYOKPRRWQUPENJ-UHFFFAOYSA-N (5-amino-4-carbamoyl-5-oxopentyl) acetate Chemical compound C(N)(=O)C(CCCOC(C)=O)C(N)=O CYOKPRRWQUPENJ-UHFFFAOYSA-N 0.000 description 1
- KQKDZZJOBKPZNR-CLFYSBASSA-N (Z)-2-benzylbut-2-enediamide Chemical compound C(C1=CC=CC=C1)/C(/C(O)=N)=C/C(O)=N KQKDZZJOBKPZNR-CLFYSBASSA-N 0.000 description 1
- PMMDTZOLTJMOBU-NSCUHMNNSA-N (e)-2-carbamoylbut-2-enoic acid Chemical compound C\C=C(/C(N)=O)C(O)=O PMMDTZOLTJMOBU-NSCUHMNNSA-N 0.000 description 1
- HOHPPAHUSJCHHL-CMDGGOBGSA-N (e)-dec-2-enamide Chemical compound CCCCCCC\C=C\C(N)=O HOHPPAHUSJCHHL-CMDGGOBGSA-N 0.000 description 1
- UWHSPZZUAYSGTB-UHFFFAOYSA-N 1,1,3,3-tetraethylurea Chemical compound CCN(CC)C(=O)N(CC)CC UWHSPZZUAYSGTB-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- PAAZPARNPHGIKF-UHFFFAOYSA-N 1,2-dibromoethane Chemical compound BrCCBr PAAZPARNPHGIKF-UHFFFAOYSA-N 0.000 description 1
- KNKRKFALVUDBJE-UHFFFAOYSA-N 1,2-dichloropropane Chemical compound CC(Cl)CCl KNKRKFALVUDBJE-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- VEFLKXRACNJHOV-UHFFFAOYSA-N 1,3-dibromopropane Chemical compound BrCCCBr VEFLKXRACNJHOV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- KJDRSWPQXHESDQ-UHFFFAOYSA-N 1,4-dichlorobutane Chemical compound ClCCCCCl KJDRSWPQXHESDQ-UHFFFAOYSA-N 0.000 description 1
- VSKYWEYQEJNVOT-UHFFFAOYSA-N 1-amino-1-oxobutane-2-sulfonic acid Chemical compound CCC(C(N)=O)S(O)(=O)=O VSKYWEYQEJNVOT-UHFFFAOYSA-N 0.000 description 1
- VTMMLTWGVYUZON-UHFFFAOYSA-N 1-amino-2-carbamoyl-1-oxopentane-2-sulfonic acid Chemical compound CCCC(C(N)=O)(C(N)=O)S(O)(=O)=O VTMMLTWGVYUZON-UHFFFAOYSA-N 0.000 description 1
- WFJFGMLKAISFOZ-UHFFFAOYSA-N 1-amino-3-iminourea Chemical compound NN=C(O)N=N WFJFGMLKAISFOZ-UHFFFAOYSA-N 0.000 description 1
- KMQWOHBEYVPGQJ-UHFFFAOYSA-N 1-methoxybut-1-ene Chemical compound CCC=COC KMQWOHBEYVPGQJ-UHFFFAOYSA-N 0.000 description 1
- NMIZONYLXCOHEF-UHFFFAOYSA-N 1h-imidazole-2-carboxamide Chemical compound NC(=O)C1=NC=CN1 NMIZONYLXCOHEF-UHFFFAOYSA-N 0.000 description 1
- YCHIBYPAJVZUBN-UHFFFAOYSA-N 2,2-dicarbamoylbutanoic acid Chemical compound CCC(C(N)=O)(C(N)=O)C(O)=O YCHIBYPAJVZUBN-UHFFFAOYSA-N 0.000 description 1
- BXXWFOGWXLJPPA-UHFFFAOYSA-N 2,3-dibromobutane Chemical compound CC(Br)C(C)Br BXXWFOGWXLJPPA-UHFFFAOYSA-N 0.000 description 1
- CRPHFVYFFRPBQJ-UHFFFAOYSA-N 2,3-dicarbamoylbenzenesulfonic acid Chemical compound NC(=O)C1=CC=CC(S(O)(=O)=O)=C1C(N)=O CRPHFVYFFRPBQJ-UHFFFAOYSA-N 0.000 description 1
- KLWNJUGZTYIXFQ-UHFFFAOYSA-N 2,3-dicarbamoylbenzoic acid Chemical compound NC(=O)C1=CC=CC(C(O)=O)=C1C(N)=O KLWNJUGZTYIXFQ-UHFFFAOYSA-N 0.000 description 1
- MFGOFGRYDNHJTA-UHFFFAOYSA-N 2-amino-1-(2-fluorophenyl)ethanol Chemical compound NCC(O)C1=CC=CC=C1F MFGOFGRYDNHJTA-UHFFFAOYSA-N 0.000 description 1
- BAUCFIGHXLHHAI-UHFFFAOYSA-N 2-aminohex-2-enediamide Chemical compound NC(=CCCC(=O)N)C(=O)N BAUCFIGHXLHHAI-UHFFFAOYSA-N 0.000 description 1
- HQMLIDZJXVVKCW-UHFFFAOYSA-N 2-aminopropanamide Chemical compound CC(N)C(N)=O HQMLIDZJXVVKCW-UHFFFAOYSA-N 0.000 description 1
- ZFFBIQMNKOJDJE-UHFFFAOYSA-N 2-bromo-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(Br)C(=O)C1=CC=CC=C1 ZFFBIQMNKOJDJE-UHFFFAOYSA-N 0.000 description 1
- LTJMHCGDSFTOHA-UHFFFAOYSA-N 2-carbamoylbenzenesulfonic acid Chemical compound NC(=O)C1=CC=CC=C1S(O)(=O)=O LTJMHCGDSFTOHA-UHFFFAOYSA-N 0.000 description 1
- DKANUISOGBLFJN-UHFFFAOYSA-N 2-carbamoylnaphthalene-1-carboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)N)=CC=C21 DKANUISOGBLFJN-UHFFFAOYSA-N 0.000 description 1
- IAHNTGQJPGYKOD-UHFFFAOYSA-N 2-carbamoylnaphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(=O)N)=CC=C21 IAHNTGQJPGYKOD-UHFFFAOYSA-N 0.000 description 1
- STQPCKPKAIRSEL-UHFFFAOYSA-N 2-cyanobenzamide Chemical compound NC(=O)C1=CC=CC=C1C#N STQPCKPKAIRSEL-UHFFFAOYSA-N 0.000 description 1
- CWIAYCPUWVIULX-UHFFFAOYSA-N 2-ethenylbenzamide Chemical compound NC(=O)C1=CC=CC=C1C=C CWIAYCPUWVIULX-UHFFFAOYSA-N 0.000 description 1
- OAAKFAXUEYTMHF-UHFFFAOYSA-N 2-ethoxyacetamide Chemical compound CCOCC(N)=O OAAKFAXUEYTMHF-UHFFFAOYSA-N 0.000 description 1
- OXQUUXVRVJBDMA-UHFFFAOYSA-N 2-ethoxyprop-2-enamide Chemical compound CCOC(=C)C(N)=O OXQUUXVRVJBDMA-UHFFFAOYSA-N 0.000 description 1
- KSIFOIXRKPNHLO-UHFFFAOYSA-N 2-ethoxypropanamide Chemical compound CCOC(C)C(N)=O KSIFOIXRKPNHLO-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- MTEZLAATISORQK-UHFFFAOYSA-N 2-methoxyacetamide Chemical compound COCC(N)=O MTEZLAATISORQK-UHFFFAOYSA-N 0.000 description 1
- MNWSGMTUGXNYHJ-UHFFFAOYSA-N 2-methoxybenzamide Chemical compound COC1=CC=CC=C1C(N)=O MNWSGMTUGXNYHJ-UHFFFAOYSA-N 0.000 description 1
- WOGXHNJBKGZMHV-UHFFFAOYSA-N 2-methoxypropanamide Chemical compound COC(C)C(N)=O WOGXHNJBKGZMHV-UHFFFAOYSA-N 0.000 description 1
- XXUNIGZDNWWYED-UHFFFAOYSA-N 2-methylbenzamide Chemical compound CC1=CC=CC=C1C(N)=O XXUNIGZDNWWYED-UHFFFAOYSA-N 0.000 description 1
- JWUJQDFVADABEY-UHFFFAOYSA-N 2-methyltetrahydrofuran Chemical compound CC1CCCO1 JWUJQDFVADABEY-UHFFFAOYSA-N 0.000 description 1
- RTLPJNYVZDKMIY-UHFFFAOYSA-N 2-n-methylbenzene-1,2-dicarboxamide Chemical compound CNC(=O)C1=CC=CC=C1C(N)=O RTLPJNYVZDKMIY-UHFFFAOYSA-N 0.000 description 1
- KJJJZRCCFODWCZ-UHFFFAOYSA-N 2-nitropropanamide Chemical compound NC(=O)C(C)[N+]([O-])=O KJJJZRCCFODWCZ-UHFFFAOYSA-N 0.000 description 1
- GTKIGDZXPDCIKR-UHFFFAOYSA-N 2-phenylbenzamide Chemical compound NC(=O)C1=CC=CC=C1C1=CC=CC=C1 GTKIGDZXPDCIKR-UHFFFAOYSA-N 0.000 description 1
- HPRQGVLIYQVBNH-UHFFFAOYSA-N 2-phenyldecanamide Chemical compound CCCCCCCCC(C(N)=O)C1=CC=CC=C1 HPRQGVLIYQVBNH-UHFFFAOYSA-N 0.000 description 1
- DOZZSWAOPDYVLH-UHFFFAOYSA-N 2-phenylpropanamide Chemical compound NC(=O)C(C)C1=CC=CC=C1 DOZZSWAOPDYVLH-UHFFFAOYSA-N 0.000 description 1
- KZXYTQOZYCREPI-UHFFFAOYSA-N 2-propan-2-ylbenzamide Chemical compound CC(C)C1=CC=CC=C1C(N)=O KZXYTQOZYCREPI-UHFFFAOYSA-N 0.000 description 1
- IZRDLZYOQSBCNG-UHFFFAOYSA-N 2-propylbenzamide Chemical compound CCCC1=CC=CC=C1C(N)=O IZRDLZYOQSBCNG-UHFFFAOYSA-N 0.000 description 1
- FEPGCRWGNPMJMY-UHFFFAOYSA-N 3-amino-2-methyl-3-oxopropanoic acid Chemical compound NC(=O)C(C)C(O)=O FEPGCRWGNPMJMY-UHFFFAOYSA-N 0.000 description 1
- QPLWHGUVWSUCSM-UHFFFAOYSA-N 3-ethoxy-2-methylprop-2-enamide Chemical compound CCOC=C(C)C(N)=O QPLWHGUVWSUCSM-UHFFFAOYSA-N 0.000 description 1
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 1
- RCYVYYVRFGOSSX-UHFFFAOYSA-N 4-amino-2-carbamoyl-3-methyl-4-oxobut-2-enoic acid Chemical compound NC(=O)C(C)=C(C(N)=O)C(O)=O RCYVYYVRFGOSSX-UHFFFAOYSA-N 0.000 description 1
- AZEIRPAUJXANCS-UHFFFAOYSA-N 4-ethoxybenzamide Chemical compound CCOC1=CC=C(C(N)=O)C=C1 AZEIRPAUJXANCS-UHFFFAOYSA-N 0.000 description 1
- UEEYLWGLQULSPJ-UHFFFAOYSA-N 9,10-dioxoanthracene-1,2-dicarboxamide Chemical compound C1=CC=C2C(=O)C3=C(C(N)=O)C(C(=O)N)=CC=C3C(=O)C2=C1 UEEYLWGLQULSPJ-UHFFFAOYSA-N 0.000 description 1
- QNLRSUPDYDUZSS-UHFFFAOYSA-N 9,10-dioxoanthracene-1-carboxamide Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(=O)N QNLRSUPDYDUZSS-UHFFFAOYSA-N 0.000 description 1
- GVNWZKBFMFUVNX-UHFFFAOYSA-N Adipamide Chemical compound NC(=O)CCCCC(N)=O GVNWZKBFMFUVNX-UHFFFAOYSA-N 0.000 description 1
- QNSICYCVXVAUMY-UHFFFAOYSA-N C(N)(=O)C(C=CS(=O)(=O)O)(C)C(N)=O Chemical compound C(N)(=O)C(C=CS(=O)(=O)O)(C)C(N)=O QNSICYCVXVAUMY-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- YIKSCQDJHCMVMK-UHFFFAOYSA-N Oxamide Chemical compound NC(=O)C(N)=O YIKSCQDJHCMVMK-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 238000006434 Ritter amidation reaction Methods 0.000 description 1
- 229920005654 Sephadex Polymers 0.000 description 1
- 239000012507 Sephadex™ Substances 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical group OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- LAIPZVMLGUMTBM-UHFFFAOYSA-N [N+](=O)([O-])C(=CCCC(=O)N)C(=O)N Chemical compound [N+](=O)([O-])C(=CCCC(=O)N)C(=O)N LAIPZVMLGUMTBM-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
- 150000008046 alkali metal hydrides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical group 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- UMVFZJRCHRLAGC-UHFFFAOYSA-N anthracene-1-carboxamide Chemical compound C1=CC=C2C=C3C(C(=O)N)=CC=CC3=CC2=C1 UMVFZJRCHRLAGC-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical group [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- VEFXTGTZJOWDOF-UHFFFAOYSA-N benzene;hydrate Chemical compound O.C1=CC=CC=C1 VEFXTGTZJOWDOF-UHFFFAOYSA-N 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyloxyacetoaldehyde Natural products CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 1
- 229910001865 beryllium hydroxide Inorganic materials 0.000 description 1
- XTIMETPJOMYPHC-UHFFFAOYSA-M beryllium monohydroxide Chemical compound O[Be] XTIMETPJOMYPHC-UHFFFAOYSA-M 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- OHJMTUPIZMNBFR-UHFFFAOYSA-N biuret Chemical compound NC(=O)NC(N)=O OHJMTUPIZMNBFR-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- ABBZJHFBQXYTLU-UHFFFAOYSA-N but-3-enamide Chemical compound NC(=O)CC=C ABBZJHFBQXYTLU-UHFFFAOYSA-N 0.000 description 1
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- FJDQFPXHSGXQBY-UHFFFAOYSA-L caesium carbonate Chemical compound [Cs+].[Cs+].[O-]C([O-])=O FJDQFPXHSGXQBY-UHFFFAOYSA-L 0.000 description 1
- 229910000024 caesium carbonate Inorganic materials 0.000 description 1
- HUCVOHYBFXVBRW-UHFFFAOYSA-M caesium hydroxide Inorganic materials [OH-].[Cs+] HUCVOHYBFXVBRW-UHFFFAOYSA-M 0.000 description 1
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical compound [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001942 caesium oxide Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- YCLDXRHGQVDVJR-UHFFFAOYSA-N carbamothioylurea Chemical compound NC(=O)NC(N)=S YCLDXRHGQVDVJR-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- XEVRDFDBXJMZFG-UHFFFAOYSA-N carbonyl dihydrazine Chemical compound NNC(=O)NN XEVRDFDBXJMZFG-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000003857 carboxamides Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- FIMJSWFMQJGVAM-UHFFFAOYSA-N chloroform;hydrate Chemical compound O.ClC(Cl)Cl FIMJSWFMQJGVAM-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 1
- 150000001470 diamides Chemical class 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000008394 flocculating agent Substances 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- GLOLVMUOVGSPBF-UHFFFAOYSA-N hept-2-ynediamide Chemical compound NC(=O)CCCC#CC(N)=O GLOLVMUOVGSPBF-UHFFFAOYSA-N 0.000 description 1
- KITQGYOSLQTCSD-UHFFFAOYSA-N hepta-2,4-dienamide Chemical compound CCC=CC=CC(N)=O KITQGYOSLQTCSD-UHFFFAOYSA-N 0.000 description 1
- AHAREKHAZNPPMI-UHFFFAOYSA-N hexa-1,3-diene Chemical compound CCC=CC=C AHAREKHAZNPPMI-UHFFFAOYSA-N 0.000 description 1
- YPTKZEUCJCUXDE-UHFFFAOYSA-N hexadecanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCC(N)=O YPTKZEUCJCUXDE-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- AYBCUKQQDUJLQN-UHFFFAOYSA-N hydridoberyllium Chemical compound [H][Be] AYBCUKQQDUJLQN-UHFFFAOYSA-N 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 125000001165 hydrophobic group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- KKRYNGAZEAOPCR-UHFFFAOYSA-N icosanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCC(N)=O KKRYNGAZEAOPCR-UHFFFAOYSA-N 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- NWMAFUPEQLTLPX-UHFFFAOYSA-N iodo(iodomethoxy)methane Chemical compound ICOCI NWMAFUPEQLTLPX-UHFFFAOYSA-N 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- SANOUVWGPVYVAV-UHFFFAOYSA-N isovaleramide Chemical compound CC(C)CC(N)=O SANOUVWGPVYVAV-UHFFFAOYSA-N 0.000 description 1
- 229940116335 lauramide Drugs 0.000 description 1
- AFRJJFRNGGLMDW-UHFFFAOYSA-N lithium amide Chemical compound [Li+].[NH2-] AFRJJFRNGGLMDW-UHFFFAOYSA-N 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- SIAPCJWMELPYOE-UHFFFAOYSA-N lithium hydride Chemical compound [LiH] SIAPCJWMELPYOE-UHFFFAOYSA-N 0.000 description 1
- 229910000103 lithium hydride Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- RSHAOIXHUHAZPM-UHFFFAOYSA-N magnesium hydride Chemical compound [MgH2] RSHAOIXHUHAZPM-UHFFFAOYSA-N 0.000 description 1
- 229910012375 magnesium hydride Inorganic materials 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- WRIRWRKPLXCTFD-UHFFFAOYSA-N malonamide Chemical compound NC(=O)CC(N)=O WRIRWRKPLXCTFD-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- MRRGENYHMARORA-UHFFFAOYSA-N methyl 4-amino-2-carbamoyl-3-methyl-4-oxobut-2-enoate Chemical compound COC(=O)C(C(N)=O)=C(C)C(N)=O MRRGENYHMARORA-UHFFFAOYSA-N 0.000 description 1
- AJEZXQNUOWEYOP-UHFFFAOYSA-N methylcarbamoyl propanoate Chemical compound CCC(=O)OC(=O)NC AJEZXQNUOWEYOP-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- ZKWFSTHEYLJLEL-UHFFFAOYSA-N morpholine-4-carboxamide Chemical compound NC(=O)N1CCOCC1 ZKWFSTHEYLJLEL-UHFFFAOYSA-N 0.000 description 1
- QEALYLRSRQDCRA-UHFFFAOYSA-N myristamide Chemical compound CCCCCCCCCCCCCC(N)=O QEALYLRSRQDCRA-UHFFFAOYSA-N 0.000 description 1
- NEYDFSYOIJKORW-UHFFFAOYSA-N n,n-bis(methylamino)benzamide Chemical compound CNN(NC)C(=O)C1=CC=CC=C1 NEYDFSYOIJKORW-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- AKFWJZUGRFVFPE-UHFFFAOYSA-N naphthalene-1,2,3-tricarboxamide Chemical compound C1=CC=C2C(C(N)=O)=C(C(N)=O)C(C(=O)N)=CC2=C1 AKFWJZUGRFVFPE-UHFFFAOYSA-N 0.000 description 1
- 229930014626 natural product Natural products 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- LTHCSWBWNVGEFE-UHFFFAOYSA-N octanamide Chemical compound CCCCCCCC(N)=O LTHCSWBWNVGEFE-UHFFFAOYSA-N 0.000 description 1
- NFVUAUVSFDFOJT-UHFFFAOYSA-N octanediamide Chemical compound NC(=O)CCCCCCC(N)=O NFVUAUVSFDFOJT-UHFFFAOYSA-N 0.000 description 1
- UHHKSVZZTYJVEG-UHFFFAOYSA-N oxepane Chemical compound C1CCCOCC1 UHHKSVZZTYJVEG-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- ISBHMJZRKAFTGE-UHFFFAOYSA-N pent-2-enenitrile Chemical compound CCC=CC#N ISBHMJZRKAFTGE-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- GVBOKQZLJJPVRJ-UHFFFAOYSA-N phenyl n-ethenylcarbamate Chemical compound C=CNC(=O)OC1=CC=CC=C1 GVBOKQZLJJPVRJ-UHFFFAOYSA-N 0.000 description 1
- IBBMAWULFFBRKK-UHFFFAOYSA-N picolinamide Chemical compound NC(=O)C1=CC=CC=N1 IBBMAWULFFBRKK-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229960005235 piperonyl butoxide Drugs 0.000 description 1
- XIPFMBOWZXULIA-UHFFFAOYSA-N pivalamide Chemical compound CC(C)(C)C(N)=O XIPFMBOWZXULIA-UHFFFAOYSA-N 0.000 description 1
- 239000004597 plastic additive Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 description 1
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 description 1
- 229910000105 potassium hydride Inorganic materials 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-BJUDXGSMSA-N potassium-38 Chemical compound [38K] ZLMJMSJWJFRBEC-BJUDXGSMSA-N 0.000 description 1
- RAJUSMULYYBNSJ-UHFFFAOYSA-N prop-1-ene-1-sulfonic acid Chemical compound CC=CS(O)(=O)=O RAJUSMULYYBNSJ-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- CETXYAZNNPPNQZ-UHFFFAOYSA-N pyridine-2,3,4-tricarboxamide Chemical compound NC(=O)C1=CC=NC(C(N)=O)=C1C(N)=O CETXYAZNNPPNQZ-UHFFFAOYSA-N 0.000 description 1
- ZEXKKIXCRDTKBF-UHFFFAOYSA-N quinoline-2-carboxamide Chemical compound C1=CC=CC2=NC(C(=O)N)=CC=C21 ZEXKKIXCRDTKBF-UHFFFAOYSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- WPFGFHJALYCVMO-UHFFFAOYSA-L rubidium carbonate Chemical compound [Rb+].[Rb+].[O-]C([O-])=O WPFGFHJALYCVMO-UHFFFAOYSA-L 0.000 description 1
- 229910000026 rubidium carbonate Inorganic materials 0.000 description 1
- 229910001952 rubidium oxide Inorganic materials 0.000 description 1
- CWBWCLMMHLCMAM-UHFFFAOYSA-M rubidium(1+);hydroxide Chemical compound [OH-].[Rb+].[Rb+] CWBWCLMMHLCMAM-UHFFFAOYSA-M 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- DUIOPKIIICUYRZ-UHFFFAOYSA-N semicarbazide Chemical compound NNC(N)=O DUIOPKIIICUYRZ-UHFFFAOYSA-N 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- SYXYWTXQFUUWLP-UHFFFAOYSA-N sodium;butan-1-olate Chemical compound [Na+].CCCC[O-] SYXYWTXQFUUWLP-UHFFFAOYSA-N 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 229940037312 stearamide Drugs 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- UUCCCPNEFXQJEL-UHFFFAOYSA-L strontium dihydroxide Chemical compound [OH-].[OH-].[Sr+2] UUCCCPNEFXQJEL-UHFFFAOYSA-L 0.000 description 1
- 229910001866 strontium hydroxide Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- WNVQBUHCOYRLPA-UHFFFAOYSA-N triuret Chemical compound NC(=O)NC(=O)NC(N)=O WNVQBUHCOYRLPA-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はN−アシル環状イミン化合物の改良された製造
方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improved method for producing N-acyl cyclic imine compounds.
一般にN−置換アミド化合物は分子内の親木基と疎水基
とのバランスがよいため、各種物質との相溶性がよく、
加水分解に対する抵抗も強く、更に不飽和アミド化合物
は単独あるいは共重合性が優れている等の利点を有する
ため、接着剤、塗料、紙加工剤、繊維加工剤、エマルジ
ョン、ウレタン硬化剤、顔料分散剤、プラスチック添加
剤、高分子凝集剤、イオン交換樹脂等への広範囲な分野
への応用が知られている。また、医薬品、農薬、アミノ
酸、天然物等の複雑な構造を有する化合物の原料、中間
体及び製品として、さらにはアミン製造の原料としても
存用な化合物である。しかし、N−置換アミド化合物の
安価な工業的製造法が確立されていないため、大量に使
用されるに至ってはいない。In general, N-substituted amide compounds have a good balance between the parent group and the hydrophobic group in the molecule, so they have good compatibility with various substances.
They have strong resistance to hydrolysis, and unsaturated amide compounds have other advantages such as excellent monopolymerization or copolymerizability, so they can be used in adhesives, paints, paper processing agents, fiber processing agents, emulsions, urethane curing agents, and pigment dispersions. It is known for its application in a wide range of fields such as additives, plastic additives, polymer flocculants, and ion exchange resins. It is also a useful compound as a raw material, intermediate, and product for compounds with complex structures such as pharmaceuticals, agricultural chemicals, amino acids, and natural products, and also as a raw material for amine production. However, since an inexpensive industrial production method for N-substituted amide compounds has not been established, they have not been used in large quantities.
従来、工業的に用いられているN−置換アミド化合物の
製造法はカルボン酸クロライドとアミンとの反応による
もの、リッター反応を利用する方法などがあるが、それ
らの方法では高価なものとなるかあるいは製造し得る化
合物の種類が限定され、その応用も特定の分野に限られ
ているのが現状である。Conventionally, industrially used methods for producing N-substituted amide compounds include the reaction of a carboxylic acid chloride with an amine and the Ritter reaction, but these methods are expensive. Alternatively, the types of compounds that can be produced are limited, and their applications are currently limited to specific fields.
また、一般的なN−置換アミド化合物の製造法として、
アミド化合物をアルカリ金属アルコキシトの如き強塩基
性物質の作用で、アルカリ金属置換アミド化合物とした
後、ハロゲン化アルキルの如きハロゲン置換化合物を作
用させて、N−置換アミド化合物を製造する方法が、例
えばW、J、H4ckinboむ仁0III箸 Rea
ctions of OrganicCompou
nds第3版、Longmans、Green and
Go。In addition, as a general method for producing N-substituted amide compounds,
A method for producing an N-substituted amide compound by converting an amide compound into an alkali metal-substituted amide compound by the action of a strong basic substance such as an alkali metal alkoxide, and then reacting with a halogen-substituted compound such as an alkyl halide, For example, W, J, H4ckinbomujin 0III chopsticks Rea
tions of Organic Compou
nds 3rd edition, Longmans, Green and
Go.
(1957年)第344頁および米国特許第3,084
,191号などにより知られている。しかし、これらの
方法では製造工程が2つの工程よりなること、塩基性触
媒下でハロゲン置換化合物との反応性の高い液体アンモ
ニアあるいはアルコールなどのプロトン性溶媒を反応溶
媒として使用すること、アルカリ金属アミド、同水素化
合物、同アルコキシドのような取り扱いの面倒な極めて
塩基性の強い物質を使用すること等の種々の不都合が存
在する。それ故、目的生成物の収量が低いこと、反応さ
せるハロゲン置換化合物に汎用性がないことおよび目的
生成物がすべてN−一置換アミド化合物となり、またN
、N−二置換アミド化合物を製造する場合には同様の製
造工程を繰り返さなければならない等の問題を生じ、一
般的なN−置換アミド化合物の製造法として工業的に広
範囲に採用されるには至っていない。(1957) p. 344 and U.S. Pat. No. 3,084.
, No. 191, etc. However, these methods require the production process to consist of two steps, the use of protic solvents such as liquid ammonia or alcohol that are highly reactive with halogen-substituted compounds under basic catalysts, and the use of alkali metal amides. There are various disadvantages such as the use of highly basic substances such as hydrogen compounds, alkoxides, etc., which are difficult to handle. Therefore, the yield of the desired product is low, the halogen-substituted compound to be reacted lacks versatility, and all the desired products are N-monosubstituted amide compounds, and N
, when producing N-disubstituted amide compounds, problems arise such as having to repeat the same production process, and this method cannot be widely adopted industrially as a general method for producing N-substituted amide compounds. Not yet reached.
さらに、近年G、L、l5ele、八、Luttrin
ghous。Furthermore, in recent years G, L, l5ele, Hachi, Luttrin
ghous.
5ynthesis 1971(5) 、 266ペー
ジに開示されている如く、非プロトン性極性溶媒中で予
めアミド化合物と強塩基性物質とを反応させて、アルカ
リ金属置換アミド化合物とした後、ハロゲン化アルキル
の如きハロゲン置換化合物と反応させてN−アルキル置
換アミド化合物を製造する2段方法も知られている。し
かし、このような方法を採用しても、満足する結果は得
られていない。5ynthesis 1971 (5), p. 266, an amide compound and a strong basic substance are reacted in advance in an aprotic polar solvent to form an alkali metal-substituted amide compound, and then an alkali metal-substituted amide compound such as an alkyl halide is prepared. A two-step process for producing N-alkyl-substituted amide compounds by reaction with halogen-substituted compounds is also known. However, even if such a method is adopted, satisfactory results have not been obtained.
またUSSR発明者証第667547号では、極性溶媒
中におけるN−アルキル化有機化合物の製造方法におい
て苛性ソーダの様な塩基性物質を水溶液状態として添加
し、該塩基性物質がすべて液状態で反応を開始させる方
法が開示され、この方法において反応混合物中における
水の存在は反応の進行上極めて好都合であると記載され
ている。しかし乍ら本発明者らの研究によれば、この方
法による場合は副反応物の生成が著しく、目的とするN
−置換アミド化合物への選択性が低く、目的とするN−
置換アミド化合物によっては収率が著しく低下すること
を見出した。Furthermore, in USSR Inventor's Certificate No. 667547, a basic substance such as caustic soda is added as an aqueous solution in a method for producing an N-alkylated organic compound in a polar solvent, and the basic substance starts the reaction in a liquid state. A method is disclosed in which the presence of water in the reaction mixture is said to be highly advantageous for the progress of the reaction. However, according to the research conducted by the present inventors, this method produces a significant amount of side reactants, and the target N
- Low selectivity to substituted amide compounds, target N-
It has been found that the yield decreases significantly depending on the substituted amide compound.
本発明者らは上記したN−置換アミド化合物の製造に関
する実状に鑑み、その製造方法の改良を目的として反応
系における水の存在全と反応性との関係について鋭意検
討を進めた結果、N−置換アミド化合物、換言すればN
−アシル環状イミン化合物への選択性に及ぼす影習が極
めて大きいことを見出し本発明に到達した。即ち、従来
好都合であるとされていた反応系における水の存在が、
その推定に反して副反応を生起して目的とするN−アシ
ル環状イミン化合物の生成を阻害すること、またN−置
換反応を好適に行わしめるためには、従来のアミド化合
物と強塩基性物質とを反応せしめしかるのちハロゲン置
換化合物を反応せしめる方法ではなく、強塩基性物質、
アミド化合物およびハロゲン置換化合物を同時に接触反
応せしめることが必要であることを見出して本発明に到
達した。In view of the actual situation regarding the production of the above-mentioned N-substituted amide compounds, the present inventors conducted extensive studies on the relationship between the total presence of water in the reaction system and reactivity with the aim of improving the production method. Substituted amide compound, in other words N
-We have discovered that the effect on selectivity to acyl cyclic imine compounds is extremely large and have arrived at the present invention. In other words, the presence of water in the reaction system, which was previously thought to be advantageous,
Contrary to this assumption, in order to inhibit the formation of the target N-acyl cyclic imine compound by causing side reactions, and to perform the N-substitution reaction favorably, it is necessary to use conventional amide compounds and strong basic substances. Instead of reacting with a strong basic substance, and then reacting with a halogen-substituted compound,
The present invention was achieved by discovering that it is necessary to carry out a catalytic reaction of an amide compound and a halogen-substituted compound simultaneously.
本発明は、強塩基性物質、アミド化合物およびハロゲン
置換化合物を非プロトン性極性溶媒中で同時に接触させ
それによってN−アシル環状イミンを製造する方法にお
いて、該塩基性物質の懸濁下に反応を開始することを特
徴とする。The present invention provides a method for producing an N-acyl cyclic imine by simultaneously contacting a strong basic substance, an amide compound, and a halogen-substituted compound in an aprotic polar solvent, in which the reaction is carried out while the basic substance is suspended. Characterized by starting.
本発明において、強塩基性物質の懸濁下に反応を開始せ
しめる具体的な方法としては、非プロトン性極性溶媒に
三者を同時に供給混合して強塩基性物質を懸濁せしめて
反応させる方法、非プロトン性極性溶媒中に強塩基性物
質を懸濁せしめ、しかる後アミド化合物およびハロゲン
置換化合物を同時に供給して反応せしめる方法、並びに
非プロトン性極性溶媒にアミド化合物およびハロゲン置
換化合物を溶解もしくは懸濁せしめ、しかるのちに、強
塩基性物質を添加懸濁せしめる等の適宜の方法が採用さ
れる。In the present invention, a specific method for starting the reaction while suspending a strong basic substance is a method of simultaneously supplying and mixing the three substances in an aprotic polar solvent to suspend the strong basic substance and causing the reaction. , a method in which a strong basic substance is suspended in an aprotic polar solvent, and then an amide compound and a halogen-substituted compound are simultaneously supplied and reacted, and a method in which an amide compound and a halogen-substituted compound are dissolved or An appropriate method may be employed, such as suspending and then adding and suspending a strong basic substance.
本発明の対象となるアミド化合物は、モノアミド化合物
とジアミド化合物以上の多価アミド化合物とに大別され
る。The amide compounds that are the object of the present invention are broadly classified into monoamide compounds and polyamide compounds that are higher than diamide compounds.
モノアミド化合物として、脂肪族飽和カルボン酸アミド
、脂肪族不飽和カルボン酸アミド、芳香族カルボン酸ア
ミド、脂環式カルボン酸アミド、尿素及びその誘導体な
どである。Examples of the monoamide compound include aliphatic saturated carboxylic acid amide, aliphatic unsaturated carboxylic acid amide, aromatic carboxylic acid amide, alicyclic carboxylic acid amide, urea and its derivatives.
脂肪族飽和カルボン酸アミドは、−数式CnJn−+(
:0NH2で表わされる化合物であり、nは0〜20の
整数である。またニトロ基、シアノ基、アミノ基、カル
ボン酸基、スルホン酸基、アルコキシ基、カルボン酸エ
ステル基等の置換基の1種以上が1つ以上導入されたも
のも対象となる。The aliphatic saturated carboxylic acid amide has the formula -CnJn-+(
:0NH2, where n is an integer of 0 to 20. Furthermore, those into which one or more substituents such as a nitro group, a cyano group, an amino group, a carboxylic acid group, a sulfonic acid group, an alkoxy group, and a carboxylic acid ester group are introduced are also targeted.
脂肪族不飽和カルボン酸アミドは、−数式CnH2□l
−2−(:0NH2で表わされる化合物(式中nは2〜
20の整数、mは1〜5の整数)で、分子内に炭素炭素
二重結合または/および三重結合を1ヶ以上含む。また
ニトロ基、シアノ基、アミノ基、カルボン酸基、スルホ
ン酸基、アルコキシ基、カルボン酸エステル基などの置
換基の1搏以上が1つ以北導入されたものも対象となる
。Aliphatic unsaturated carboxylic acid amide has the formula: CnH2□l
-2-(:0NH2 compound (where n is 2 to
20, m is an integer of 1 to 5), and contains one or more carbon-carbon double bonds and/or triple bonds in the molecule. Furthermore, those in which one or more substituents such as a nitro group, cyano group, amino group, carboxylic acid group, sulfonic acid group, alkoxy group, or carboxylic acid ester group are introduced are also targeted.
芳香族カルボン酸アミドは分子内に芳香環を含むもので
、芳香環としてはベンゼン環、ナフタレン環、アントラ
セン環、などが挙げられる。更に芳香環にニトロ基、シ
アノ基、アルコキシ基、アミノ基、カルボン酸基、スル
ホン酸基、カルボン酸エステル基、アルキル基、アルケ
ニル基、アリール基などの置換基の1種以上が1つ以上
導入されたもの及びそれらの置換基あるいは芳香環がエ
ーテル基、スルホン基、スルフィド基などの芳香環に結
合している化合物も含まれる。脂環式カルボン酸アミド
は分子内に脂環式構造を存する化合物であり、また異種
元素より構成される複素環化合物も含まれる。また尿素
及びその誘導体は尿素に代表されるN−C0−N、N−
GO−N−N原子団を有する化合物である。Aromatic carboxylic acid amide contains an aromatic ring in its molecule, and examples of the aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, and the like. Furthermore, one or more substituents such as a nitro group, cyano group, alkoxy group, amino group, carboxylic acid group, sulfonic acid group, carboxylic acid ester group, alkyl group, alkenyl group, or aryl group are introduced into the aromatic ring. It also includes compounds whose substituents or aromatic rings are bonded to aromatic rings such as ether groups, sulfone groups, and sulfide groups. Alicyclic carboxylic acid amide is a compound having an alicyclic structure in the molecule, and also includes a heterocyclic compound composed of different elements. In addition, urea and its derivatives include N-C0-N and N-
It is a compound having a GO-N-N atomic group.
ト記したモノアミド化合物を例示すると、脂肪族飽和カ
ルボン酸アミドとしては、例えばホルムアミド、アセト
アミド、プロピオナミド、ブチラミド、パレラミド、イ
ソバレラミド、ピバラミド、ラウラミド、ミリスタミド
、バルミタミド、ステアラミド、メトキシアセトアミド
、エトキシアセトアミド、メトキシプロピオナミド、エ
トキシプロピオナミド、シアノブチナミド、ニトロプロ
ピオナミド、アミノプロピオナミド、カルバモイルプロ
パンスルホン酸、カルバモイルプロパン酸、カルバモイ
ルプロパン酸メチルなどがある。Examples of the monoamide compounds mentioned above include formamide, acetamide, propionamide, butyramide, pareramide, isovaleramide, pivalamide, lauramide, myristamide, valmitamide, stearamide, methoxyacetamide, ethoxyacetamide, methoxypropionamide, etc. Examples include mido, ethoxypropionamide, cyanobutinamide, nitropropionamide, aminopropionamide, carbamoylpropanesulfonic acid, carbamoylpropanoic acid, and methyl carbamoylpropanoate.
脂肪族不飽和カルボン酸アミドては、例えばアクリルア
ミド、メタクリルアミド、ビニルアセトアミド、クロト
ナミド、デセナミド、ノナデセナミド、プロビオラミド
、ブチナミド、ヘキサジエンカルボキサミド、ベンチナ
ミド、ヘブチナミド、エトキシアクリルアミド、エトキ
シメタクリルアミド、シアノブチナミド、ニトロブチナ
ミド、アミノブチナミド、カルバモイルプロペンスルホ
ン酸、カルバモイルクロトン酸、カルバモイルクロトン
酸メチルなどがある。Aliphatic unsaturated carboxylic acid amides include, for example, acrylamide, methacrylamide, vinylacetamide, crotonamide, decenamide, nonadecenamide, proviolamide, butynamide, hexadienecarboxamide, bentinamide, hebutinamide, ethoxyacrylamide, ethoxymethacrylamide, cyanobutinamide, nitrobutinamide, aminobutinamide. Carbamoyl Examples include propenesulfonic acid, carbamoylcrotonic acid, and methyl carbamoylcrotonate.
芳香族カルボン酸アミドでは、例えばベンズアミド、ナ
ツタミド、アントラセンカルボキサミド、アントラキノ
ンカルボキサミド、ビフェニルカルボキサミド、フェニ
ルアセトアミド、フェニルプロピオナミド、フェニルデ
カナミド、ニトロシンナマミド、ニトロナツタミド、ニ
トロシンナマミド、シアノベンズアミド、メトキシベン
ズアミド、エトキシベンズアミド、メトキシナツタミド
、N、N−ジメチルアミノベンズアミド、N、N−ジメ
チルアミツナフタミド、カルバモイルベンゼンスルホン
酸、カルバモイルナフタレンスルホン酸、トルアミド、
プロピルベンズアミド、デシルベンズアミド、カルバモ
イルナフトエ酸、ビニルベンズアミド、デシルベンズア
ミド、ブテニルベンズアミド、フェニル力ルバモイルフ
ニルエーテル、ビニルカルバモイルフェニルエーテル、
フェニルカルバモイルフェニルスルホン、フェニルカル
バモイルフェニルスルフィFなどである。Examples of aromatic carboxylic acid amides include benzamide, natutamide, anthracenecarboxamide, anthraquinone carboxamide, biphenylcarboxamide, phenylacetamide, phenylpropionamide, phenyldecanamide, nitrocinnamamide, nitronatutamide, nitrocinnamamide, cyanobenzamide, methoxybenzamide , ethoxybenzamide, methoxynatutamide, N,N-dimethylaminobenzamide, N,N-dimethylamitunaphthamide, carbamoylbenzenesulfonic acid, carbamoylnaphthalenesulfonic acid, toluamide,
propylbenzamide, decylbenzamide, carbamoylnaphthoic acid, vinylbenzamide, decylbenzamide, butenylbenzamide, phenyl rubamoyl phenyl ether, vinylcarbamoyl phenyl ether,
These include phenylcarbamoylphenylsulfone, phenylcarbamoylphenylsulfy F, and the like.
脂環式カルホン酸アミドでは、例えばシクロオクタンカ
ルボキサミド、シクロブタンカルボキサミド、シクロペ
ンタンカルボキサミド、シクロペンテンカルボキサミド
、シクロヘキサンカルボキサミド、シクロへブタンカル
ボキサミド、シクロオクタンカルボキサミド、シクロオ
クテンカルボキサミド、ビロールカルボキサミド、フラ
ンカルボキサミド、チオフェンカルボキサミド、シクロ
へキシルアセトアミド、シクロへキシルプ口ビオナミド
、ピリジンカルボキサミド、ビロリヂン力ルポキサミド
、モルホリンカルボキサミド、イミダゾールカルボキサ
ミド、キノリンカルボキサミドなどがある。尿素及びそ
の銹導体では、例えば尿素、ビウレット、チオビウレッ
ト、トリウレット、セミカルバジド、カルボッヒドラジ
ド、カルバゾンなどである。In the greasy ring amide, for example, Calphonate includes, for example, cyclooctankarboxamide, cyclob tankarboxamide, cyclopenten kalboxamide, cyclohexan kalboxamide, cyclo to sicro -tankarboxamide, cycloocarboxamide, cyclo. Cyclroocarboxamide, Vyrol Calboxamide, Francarboxamide, Tioofenkarboxamide, Cyclo These include hexylacetamide, cyclohexylbionamide, pyridine carboxamide, virolidine carboxamide, morpholine carboxamide, imidazole carboxamide, and quinoline carboxamide. Examples of urea and its rust conductors include urea, biuret, thiobiuret, triuret, semicarbazide, carbohydrazide, and carbazone.
例示したこれらのアミド化合物のうち、非置換アミド化
合物が反応を効率よく行わせるという点で好適である。Among these amide compounds exemplified, unsubstituted amide compounds are preferred in that they allow the reaction to occur efficiently.
さらに好適なものとして該アミド化合物のアミド基が二
重結合に共役している共役系アミド化合物、例えばアク
リルアミド、メタクリルアミド、クロトナミドなどの如
き脂肪族不飽和アミド化合物、ベンズアミド、トリルア
ミド、イソプロピルベンズアミド、ナツタミドなどの如
き芳香族アミド化合物などがある。More preferred are conjugated amide compounds in which the amide group of the amide compound is conjugated to a double bond, such as aliphatic unsaturated amide compounds such as acrylamide, methacrylamide, crotonamide, benzamide, tolylamide, isopropylbenzamide, natutamide, etc. There are aromatic amide compounds such as.
一方、多価アミド化合物は、脂肪族飽和多価カルボン酸
アミド、脂肪族不飽和多価カルボン酸アミド、芳香族多
価カルボン酸アミド、脂環式多価カルボン酸アミドなと
である。On the other hand, the polyamide compounds include aliphatic saturated polycarboxylic acid amide, aliphatic unsaturated polycarboxylic acid amide, aromatic polycarboxylic acid amide, and alicyclic polycarboxylic acid amide.
脂肪族飽和多価カルボン酸アミドは、−数式CoHzn
−+t (CONIIz)、で表わされ、n及びmは整
数で、nは0〜20であり、mは2〜4である。また、
ニトロ基、シアノ基、アミノ基、カルボン酸基、スルホ
ン酸基、アルコキシ基、カルボン酸エステル基などの1
種以上が1つ以上導入されたものも対象となる。The aliphatic saturated polycarboxylic acid amide has the formula CoHzn
−+t (CONIIz), where n and m are integers, n is 0 to 20, and m is 2 to 4. Also,
1 such as nitro group, cyano group, amino group, carboxylic acid group, sulfonic acid group, alkoxy group, carboxylic acid ester group, etc.
Those in which one or more species or more have been introduced are also eligible.
脂肪族不飽和多価カルボン酸アミドは、−数式%式%
は整数で、nは2〜20であり、mは2〜4で、rは1
〜4である。また、ニトロ基、シアノ基、アミノ基、カ
ルボン酸基、スルホン酸基、アルコキシ基、カルボン酸
エステル基などの1種以上が1つ以上導入されたものも
対象となる。The aliphatic unsaturated polycarboxylic acid amide is an integer, n is 2 to 20, m is 2 to 4, and r is 1
~4. Furthermore, those into which one or more of a nitro group, a cyano group, an amino group, a carboxylic acid group, a sulfonic acid group, an alkoxy group, a carboxylic acid ester group, etc. are introduced are also targeted.
芳香族多価カルボン酸アミドは、分子内に芳香環を含む
もので、芳香環としてはベンゼン環、ナフタレン環、ア
ントラセン環などがあり、カルボン酸アミドの置換数は
2〜6である。更に芳香環にニトロ基、シアノ基、アミ
ノ基、カルボン酸基、スルホン酸基、アルコキシ基、カ
ルボン酸エステル基、アルキル基、アルケニル基、アリ
ール基などの1種以上が1つ以上導入されたもの及びそ
れらの置換基あるいは芳香環がエーテル基、スルホン基
、スリフィト基などで芳香環に結合している化合物も含
まれる。脂環式多価カルボン酸アミドは分子内に脂環式
構造を有する化合物であり、また異種元素より構成され
る複素環化合物も含まれ、カルボン酸アミドの置換数は
2〜5である。Aromatic polyvalent carboxylic acid amide contains an aromatic ring in the molecule, and examples of the aromatic ring include a benzene ring, a naphthalene ring, an anthracene ring, and the number of substitutions in the carboxylic acid amide is 2 to 6. Furthermore, one or more of a nitro group, a cyano group, an amino group, a carboxylic acid group, a sulfonic acid group, an alkoxy group, a carboxylic acid ester group, an alkyl group, an alkenyl group, an aryl group, etc. are introduced into the aromatic ring. Also included are compounds in which these substituents or aromatic rings are bonded to the aromatic ring via an ether group, sulfone group, sulfite group, etc. Alicyclic polyvalent carboxylic acid amide is a compound having an alicyclic structure in the molecule, and also includes a heterocyclic compound composed of different elements, and the number of substitutions in the carboxylic acid amide is 2 to 5.
次に多価アミド化合物を例示すると、脂肪族飽和カルボ
ン酸アミドとしては例えばオキサミド、マロナミド、ス
フシナミド、ゲルタラミド、アジパミド、ピメラミド、
スベラミド、アゼラミド、セバサミド、カルバモイルメ
チルメチルゲルタラミド、ブテンテトラカルボキサミド
、テトラデカンジ力ルポキサミド、オクタデカンジカル
ボキサミト、メトキシアジパミド、シアノアジパミド、
ニトロアジパミド、アミノアジパミド、ジカルバモイル
ブタンスルホン酸、ジカルバモイルブタン酸、ジカルバ
モイルブチルアセテートなどである。Next, examples of polyamide compounds include aliphatic saturated carboxylic acid amides such as oxamide, malonamide, sufcinamide, geltalamide, adipamide, pimeramide,
Suberamide, azeramide, sebaamide, carbamoylmethylmethylgeltalamide, butenetetracarboxamide, tetradecanedicarboxamide, octadecanedicarboxamide, methoxyadipamide, cyanoadipamide,
These include nitroadipamide, aminoadipamide, dicarbamoylbutanesulfonic acid, dicarbamoylbutanoic acid, dicarbamoylbutyl acetate, and the like.
脂肪族不飽和多価カルボン酸アミドでは、例えばマレア
ミド、フマラミド、シトラコナミド、メサコナミド、デ
センジ力ルポキサミド、テトラデセンジ力ルポキサミド
、オクタデセンジ力ルポキサミド、ブテンテトラカルボ
キサミド、ヘキサジエンジ力ルポキサミド、ペンチンジ
カルボキサミド、メトキシブテンジ力ルポキサミド、シ
アノブチンジ力ルポキサミド、ニトロブテンジ力ルポキ
サミド、アミノブテンジカルボキサミド、ジカルバモイ
ルブテンスルホン酸、ジカルバモイルブテン酸、ジカル
バモイルブテン酸メチルなどである。芳香族多価アルボ
ン酸アジドでは、例えばフタラミド、イソフタラミド、
テレフタラミド、ナツタレンジ力ルポキサミド、アント
ラセンジ力ルポキサミド、アントラキノンジカルボキサ
ミド、ビフェニルジ力ルポキサミド、フェニルシトラコ
ナミド、ナフタレントリカルボキサミド、ピロメリッタ
ミド、ニトロアジパミド、シアノアジパミド、アミノア
ジパミド、メトキシアジパミド、N、N−ジメチルアミ
ノフタラミド、ジカルバモイルベンゼンスルホン酸、ジ
カルバモイル安息香酸、ジカルバモイルベンジルアセテ
ート、メチルフタラミド、プロビルフタラミド、アリル
フタラミド、フエニルジカルバモイルフェニルエーテル
、ビニルジカルバモイルフエニルエーテル、フエ、二ル
ジカルバモイルフェニルスルホン、フエニルジカルバモ
イルフェニルスルフィドなどである。Among the aliphatic unsaturated polycarboxylic acid amides, for example, maleamide, fumaramide, citraconamide, mesaconamide, decenedilypoxamide, tetradecendiylypoxamide, octadecendiylypoxamide, butenetetracarboxamide, hexadiene dilypoxamide, pentyne dicarboxamide, methoxybutene dilypoxamide , cyanobutene dilupoxamide, nitrobutene dicarboxamide, aminobutene dicarboxamide, dicarbamoylbutenesulfonic acid, dicarbamoylbutenoic acid, methyl dicarbamoylbutenoate, and the like. Examples of aromatic polyalboxylic acid azides include phthalamide, isophthalamide,
Terephthalamide, Natsutalene dilupoxamide, Anthracene dilupoxamide, Anthraquinone dicarboxamide, Biphenyl dilupoxamide, Phenylcitraconamide, Naphthalene tricarboxamide, Pyromelitamide, Nitroadipamide, Cyanoadipamide, Aminoadipamide, Methoxyadipamide, N,N-dimethylaminophthalamide , dicarbamoylbenzene sulfonic acid, dicarbamoyl benzoic acid, dicarbamoyl benzyl acetate, methyl phthalamide, probyl phthalamide, allyl phthalamide, phenyl dicarbamoylphenyl ether, vinyl dicarbamoyl phenyl ether, fue, dicarbamoylphenyl sulfone, phenyl dicarbamoylphenyl sulfide and the like.
脂環式多価カルボン酸アミドでは、例えばシクロブロバ
ンジカルボキサミド、シクロペンタンジ力ルポキサミド
、カンホラミド、シクロヘキサンジ力ルポキサミド、シ
クロヘキセンジ力ルポキサミド、ピロンジ力ルポキサミ
ド、ビリジンジ力ルポキサミド、ピリジントリカルボキ
サミドなどがある。Examples of the alicyclic polycarboxylic acid amides include cyclobrobanedicarboxamide, cyclopentanedilupoxamide, canforamide, cyclohexane dilupoxamide, cyclohexenedilupoxamide, pyronidilupoxamide, pyridine dilupoxamide, and pyridinetricarboxamide.
例示したこれらのアミド化合物のうち、非置換アミド化
合物が反応を効率よく行わせるという点で好適である。Among these amide compounds exemplified, unsubstituted amide compounds are preferred in that they allow the reaction to occur efficiently.
さらに好適なものとして該アミド化合物のアミド基の二
重結合に共役している共役系アミド化合物、例えばフマ
ラミド、マレアミド、シトラコナミドなどの如き脂肪族
不飽和多価アミド化合物、フタラミド、イソフタラミド
、テレフタラミド、ベンゼンドルカルボキサミドな゛ど
の如き芳香族多価アミド化合物などがある。More preferred are conjugated amide compounds conjugated to the double bond of the amide group of the amide compound, such as aliphatic unsaturated polyamide compounds such as fumaramide, maleamide, citraconamide, phthalamide, isophthalamide, terephthalamide, and benzene. Examples include aromatic polyamide compounds such as dolcarboxamide.
また、アミド化合物と反応させるジハロゲン置換化合物
としては、ジハロアルカン化合物、ビスハロアルキルエ
ーテル化合物、ビスハロアルキルスルフィド化合物など
があげられる。ジハロアルカン化合物は一般式X +
C112+nX (X :ハロゲン原子)で表わされ
、nは整数で2〜5である。具体的には、1,2−ジク
ロロプロパン、1.4−ジクロロブタン、1.5−ジク
ロロペンタン、1.2−ジブロモエタン、1.3−ジブ
ロモプロパン、1.4−ジブロモブタン、1,5−ジブ
ロモペンタン、1.2−ショートエタン、1.3−ショ
ートプロパン、1.4−ショートブタン、1.5−ショ
ートペンタンなどがある。ビスハロアルキルエーテル化
合物は一般式 x +CH2+no 十〇lh +nx
(x :ハロゲン原子)で表わされ、nは整数で1
〜3である。Further, examples of the dihalogen-substituted compound to be reacted with the amide compound include dihaloalkane compounds, bishaloalkyl ether compounds, and bishaloalkyl sulfide compounds. The dihaloalkane compound has the general formula X +
It is represented by C112+nX (X: halogen atom), where n is an integer of 2 to 5. Specifically, 1,2-dichloropropane, 1.4-dichlorobutane, 1.5-dichloropentane, 1.2-dibromoethane, 1.3-dibromopropane, 1.4-dibromobutane, 1,5 -dibromopentane, 1.2-short ethane, 1.3-short propane, 1.4-short butane, 1.5-short pentane, etc. The bishaloalkyl ether compound has the general formula x +CH2+no 10lh +nx
(x: halogen atom), where n is an integer of 1
~3.
具体的には、ビスクロロエチルエーテル、ビスクロロエ
チルエーテル、ビスクロロエチルエーテル、ビスブロモ
メチルエーテル、ビスブロモエチルエーテル、ビスブロ
モプロピルエーテル、ビスヨードメチルエーテル、ビス
ヨードエチルエーテル、ビスヨードプロピルエーテルな
どがある。ビスハロアルキルスルフィド化合物は一般式
%式%)
で表わされ、nは整数で1〜3である。具体的には、ビ
スクロロエチルスルフィド、ビスクロロエチルスルフィ
ド、ビスクロロプロビルスルフィド、ビスブロモメチル
スルフィド、ビスブロモエチルスルフィド、ビスブロモ
プロピルスルフィド、ビスヨードメチルスルフィド、ビ
スヨードエチルスルフィド、ビスヨードプロピルスルフ
ィドなどがあげられる。Specifically, bischloroethyl ether, bischloroethyl ether, bischloroethyl ether, bisbromomethyl ether, bisbromoethyl ether, bisbromopropyl ether, bisiodomethyl ether, bisiodoethyl ether, bisiodopropyl ether, etc. There is. The bishaloalkyl sulfide compound is represented by the general formula (%), where n is an integer and is 1 to 3. Specifically, bischloroethyl sulfide, bischloroethyl sulfide, bischloropropylsulfide, bisbromomethylsulfide, bisbromoethylsulfide, bisbromopropylsulfide, bisiodomethylsulfide, bisiodoethylsulfide, bisiodopropylsulfide. etc.
上記したハロゲン置換化合物との反応により、ジハロア
ルカン化合物ではN−アシル置換イミン化合物を製造で
き、例えばN−アシルエチレンイミン、N−アシルアゼ
チジン、N−アシルピロリジン、N−アシルピペリジン
などを製造できる。ビスハロアルキルエーテル化合物で
は、N−アシルモルホリンなどを、ビスハロアルキルス
ルフィド化合物では、N−アシルチオモルホリンなどを
製造できる。By reaction with the above-described halogen-substituted compound, dihaloalkane compounds can produce N-acyl-substituted imine compounds, such as N-acylethyleneimine, N-acylazetidine, N-acylpyrrolidine, and N-acylpiperidine. N-acylmorpholine and the like can be produced using a bishaloalkyl ether compound, and N-acylthiomorpholine and the like can be produced using a bishaloalkyl sulfide compound.
本発明で使用する反応溶媒は、非プロトン性極性溶媒で
あればよく、例えば、アセトニトリル、ジオキサン、ニ
トロメタン、ニトロエタン、ニトロベンゼン、゛ピリジ
ン、ジメトキシエタン、テトラハイドロフラン、テトラ
ハイドロビラン、2−メチル−テトラハイドロフラン、
ベンゾニトリル、N、N−ジメチルホルムアミド、N、
N−ジメチルアセトアミド、N、N−ジエチルホルムア
ミド、ジメチルスルホキシド、N−メチルピロリドン、
ヘキサメチルホスホルアミド、スルホラン、オキセパン
、モノグライム、ジグライム、トリグライム、テトラグ
ライム、の如きグライム類、テトラメチル尿素、テトラ
エチル尿素、■、3−ジメチルー2−イミダゾリジノン
、1.3−ジメチル−3,4,5,6−テトラヒドロー
2(II+)−ピリミジノンの如きアルキル尿素類等を
使用することが出来る。上記した溶媒のうち更に好適な
溶媒としては、アセトニトリル、N、N−ジメチルホル
ムアミド、N、N−ジメチルアセトアミド、ジメチルス
ルホキシド、スルホラン、テトラグライム、1.3−ジ
メチル−2−イミダシワジノンなどを使用できる。これ
らの溶媒は一般に水との親和性が強いので吸水による水
の混入あるいは循環再使用時における水の混入を生ずる
ので注意が必要である。The reaction solvent used in the present invention may be any aprotic polar solvent, such as acetonitrile, dioxane, nitromethane, nitroethane, nitrobenzene, pyridine, dimethoxyethane, tetrahydrofuran, tetrahydrobyran, 2-methyl-tetra hydrofuran,
Benzonitrile, N, N-dimethylformamide, N,
N-dimethylacetamide, N,N-diethylformamide, dimethyl sulfoxide, N-methylpyrrolidone,
Glymes such as hexamethylphosphoramide, sulfolane, oxepane, monoglyme, diglyme, triglyme, tetraglyme, tetramethylurea, tetraethylurea, ■, 3-dimethyl-2-imidazolidinone, 1,3-dimethyl-3, Alkylureas such as 4,5,6-tetrahydro-2(II+)-pyrimidinone, etc. can be used. Among the above-mentioned solvents, more suitable solvents include acetonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, dimethylsulfoxide, sulfolane, tetraglyme, 1,3-dimethyl-2-imidashiwadinone, and the like. Since these solvents generally have a strong affinity for water, care must be taken as water may be mixed in due to water absorption or water may be mixed in during circulation and reuse.
本発明の方法における反応系においては、強塩基性物質
の少なくとも一部が懸濁している状態で反応を開始せし
めることが必要であり、この様な状態における水の贋は
反応系における水の量として通常6重購%程度である。In the reaction system of the method of the present invention, it is necessary to start the reaction in a state where at least a part of the strong basic substance is suspended, and in such a state, the amount of water in the reaction system is Usually, it is around 6%.
而してこの場合の水の量がこれを越える場合はハロゲン
置換化合物あるいはアミド化合物の加水分解等の副反応
が起り易くなり収率は著しく低下する。反応を効率よく
行い、目的物の収率を高めるには、反応系の水含有量を
好ましくは5重量%以下、更に好ましくは2.5重量%
以下、特に好ましくは 10,000ppm以下として
行なわれる。If the amount of water in this case exceeds this, side reactions such as hydrolysis of the halogen-substituted compound or amide compound are likely to occur, resulting in a significant decrease in yield. In order to carry out the reaction efficiently and increase the yield of the target product, the water content of the reaction system is preferably 5% by weight or less, more preferably 2.5% by weight.
Below, it is particularly preferably carried out at 10,000 ppm or less.
溶媒の使用量は特に制限はないが、溶媒を含めた反応物
総量中5〜95重量%好ましくはlO〜90重計%の範
囲である。The amount of the solvent to be used is not particularly limited, but is in the range of 5 to 95% by weight, preferably 10 to 90% by weight, based on the total amount of reactants including the solvent.
次に、本発明で使用する強塩基性物質は、固体状物質で
あり、水に溶解あるいは懸濁した時、水溶液のpHが1
0以上好ましくは11以上のものであれば使用できる。Next, the strong basic substance used in the present invention is a solid substance, and when dissolved or suspended in water, the pH of the aqueous solution is 1.
It can be used as long as it is 0 or more, preferably 11 or more.
ただし、イオン交換樹脂及びその他のイオン交換体を用
いる場合は、この条件の適用外であり、これについては
後述する。そのような強塩基性物質としては5例えばア
ルカリ金属酸化物、アルカリ土類金属酸化物、アルカリ
金属水酸化物、アルカリ土類金属水酸化物、アルカリ金
属炭酸塩、アルカリ金属水素化物、アルカリ土類金属水
素化物、アルカリ金属アミド、アルカリ金属アルコキシ
ド、イオン交換樹脂、その他のイオン交換体などである
。However, when using ion exchange resins and other ion exchangers, this condition does not apply, and this will be described later. Examples of such strong basic substances include alkali metal oxides, alkaline earth metal oxides, alkali metal hydroxides, alkaline earth metal hydroxides, alkali metal carbonates, alkali metal hydrides, and alkaline earth metal oxides. These include metal hydrides, alkali metal amides, alkali metal alkoxides, ion exchange resins, and other ion exchangers.
上記の物質を例示すると、アルカリ金属酸化物としては
、例えば、酸化ナトリウム、酸化カリウム、酸化リチウ
ム、酸化ルビジウム、酸化セシウムである。アルカリ土
類金属酸化物は、例えば、酸化ベリリウム、酸化マグネ
シウム、酸化カルシウム、酸化ストロンチウム、酸化バ
リウムである。アルカリ金属水酸化物は、例えば、水酸
化ナトリウム、水酸化カリウム、水酸化リチウム、水酸
化ルビジウム、水酸化セシウムである。アルカリ土類金
属水酸化物は、例えば、水酸化ベリリウム、水酸化マグ
ネシウム、水酸化カルシウム、水酸化ストロンチウム、
水酸化バリウムである。To illustrate the above substances, examples of the alkali metal oxide include sodium oxide, potassium oxide, lithium oxide, rubidium oxide, and cesium oxide. Examples of alkaline earth metal oxides include beryllium oxide, magnesium oxide, calcium oxide, strontium oxide, and barium oxide. Alkali metal hydroxides are, for example, sodium hydroxide, potassium hydroxide, lithium hydroxide, rubidium hydroxide, and cesium hydroxide. Examples of alkaline earth metal hydroxides include beryllium hydroxide, magnesium hydroxide, calcium hydroxide, strontium hydroxide,
It is barium hydroxide.
アルカリ金属炭酸塩は、例えば炭酸ナトリウム、炭酸カ
リウム、炭酸リチウム、炭酸ルビジウム、炭酸セシウム
である。アルカリ金属水酸化物は、例えば、水素化ナト
リウム、水素化カリウム、水素化リチウムなどである。Alkali metal carbonates are, for example, sodium carbonate, potassium carbonate, lithium carbonate, rubidium carbonate, and cesium carbonate. Examples of the alkali metal hydroxide include sodium hydride, potassium hydride, and lithium hydride.
アルカリ土類金属水素化物は、例えば、水素化ベリリウ
ム、水素化マグネシウム、水素化カルシウムなどである
。Examples of alkaline earth metal hydrides include beryllium hydride, magnesium hydride, and calcium hydride.
アルカリ金属アミドはアンモニアのアルカリ金属置攬化
合物で、例えば、ナトリウムアミド、カリウムアミド、
リチウムアミドなどである。アルカリ金属アルコキシド
はアルコールの水酸基のプロトンをアルカリ金属で置換
した化合物であり、例えば、ナトリウムメトキシド、ナ
トリウムエトキシド、ナトリウムし一ブトキシド、カリ
ウムメトキシド、カリウムエトキシド、カリウムL−ブ
トキシドなどである。Alkali metal amides are alkali metal amide compounds of ammonia, such as sodium amide, potassium amide,
Lithium amide, etc. Alkali metal alkoxides are compounds in which the protons of the hydroxyl groups of alcohols are replaced with alkali metals, such as sodium methoxide, sodium ethoxide, sodium monobutoxide, potassium methoxide, potassium ethoxide, and potassium L-butoxide.
イオン交換樹脂では、強塩基性樹脂の叶型及び強塩基性
樹脂の遊離型か使用でき、好ましくは樹脂含仔水分か1
5%以Fのものである。その他のイオン交換体はアニオ
ン交換現象を示す物質であればよく、アニオン交換セル
ロース、アニオン交換セファデックス、アニオン交換液
、塩広性白雲石、水和酸化鉄、水和酸化ジルコニウムな
どであり、塩酸と中和反応を行える型になっていればよ
い。For ion exchange resins, either the leaf type of strongly basic resin or the free type of strongly basic resin can be used, preferably resin-containing moisture or 1
It has a F content of 5% or more. Other ion exchangers may be substances that exhibit an anion exchange phenomenon, such as anion exchange cellulose, anion exchange Sephadex, anion exchange liquid, salt dolomite, hydrated iron oxide, hydrated zirconium oxide, etc. It is sufficient if it is of a type that can perform a neutralization reaction.
上記した塩基性物質のうち、本発明の方法の実施に好適
なものは、例えば、アルカリ金属水酸化物、アルカリ土
類金属水酸化物、アルカリ金属酸化物、アルカリ土類金
属酸化物、アルカリ金属炭酸塩、イオン交換樹脂、その
他のイオン交換樹脂体であり、更に好適なものは、例え
ば、アルカリ金属水酸化物、アルカリ土類金属水酸化物
、アルカリ金属酸化物、アルカリ土類金属酸化物、アル
カリ金属炭酸塩、イオン交換樹脂、その他のイオン交換
体である。Among the above-mentioned basic substances, those suitable for carrying out the method of the present invention are, for example, alkali metal hydroxides, alkaline earth metal hydroxides, alkali metal oxides, alkaline earth metal oxides, alkali metal Carbonates, ion exchange resins, and other ion exchange resin bodies, and more suitable ones include, for example, alkali metal hydroxides, alkaline earth metal hydroxides, alkali metal oxides, alkaline earth metal oxides, Alkali metal carbonates, ion exchange resins, and other ion exchangers.
これらの強塩基性物質は通常固形状のものとして反応に
供され、反応液中で少なくとも一部は懸濁された状態で
反応は開始される。These strong basic substances are usually used in the reaction in solid form, and the reaction is initiated while at least a portion of them is suspended in the reaction solution.
本発明の実施において、原料であるアミド化合物、ハロ
ゲン置換化合物及び強塩基性物質の相対的使用量は、ハ
ロゲン置換化合物とアミド化合物との反応性等により変
化し、−概には言えないが概ね、ハロゲン置換化合物の
使用量はアミド化合物に対して 1.0〜20倍モル好
ましくは 1.5〜15倍モルの範囲であり、強塩基性
物質の使用量はアミド化合物に対して 1.5〜20モ
ル、好ましくは2.0〜1.5倍モルの範囲である。In carrying out the present invention, the relative usage amounts of the raw materials, amide compound, halogen-substituted compound, and strong basic substance, vary depending on the reactivity of the halogen-substituted compound and amide compound, etc. The amount of the halogen-substituted compound used is 1.0 to 20 times the mole of the amide compound, preferably 1.5 to 15 times the mole, and the amount of the strong basic substance used is 1.5 times the mole of the amide compound. ~20 moles, preferably 2.0 to 1.5 times the mole.
不飽和アミド化合物を使用する場合は、反応及び精製工
程での原料及び製品の重合を防止するため、重合禁止剤
を添加することが好ましい。この場合の重合禁止剤とし
ては、特に制限はないが、一般にフェノール系禁止剤、
アミン系禁止剤、メルカプタン系禁止剤及び銅粉などが
あげられる。When using an unsaturated amide compound, it is preferable to add a polymerization inhibitor to prevent polymerization of raw materials and products during the reaction and purification steps. The polymerization inhibitor in this case is not particularly limited, but generally phenolic inhibitors,
Examples include amine inhibitors, mercaptan inhibitors, and copper powder.
反応方法としては通常の反応釜を使用してもよいし、溶
解性の低い強塩基性物質を使用する場合には、それを塔
に充填して、アミド化合物とハロゲン置換化合物との混
合溶液を通液循環する流通式の方法でもよい。しかし乍
ら装置の保守管理には反応釜のほうが好都合である。For the reaction method, a normal reaction vessel may be used, or if a strongly basic substance with low solubility is used, it is packed in a column and a mixed solution of an amide compound and a halogen-substituted compound is prepared. A flow type method in which the liquid is passed and circulated may also be used. However, a reaction vessel is more convenient for equipment maintenance and management.
反応釜で製造する場合、原料の仕込み順序に制限はない
が、反応性の高いハロゲン置換化合物を使用する場合に
は、ハロゲン置換化合物を最後に添加して反応させたほ
うが、副反応を抑制する点で好都合である。When producing in a reaction vessel, there is no restriction on the order in which raw materials are added, but when using a highly reactive halogen-substituted compound, it is better to add the halogen-substituted compound last and react to suppress side reactions. It is convenient in this respect.
反応温度は使用するアミド化合物およびハロゲン置換化
合物の反応性に依存するが、反応温度が低いと反応の進
行が緩慢になり、一方温度が高いとアミド化合物の加水
分解等の副反応を生じ製品の収率が低下する。従って通
常−20〜100℃、好ましくは一1O〜70℃の温度
範囲で反応が行われ、特に好ましくは、特定のハロゲン
置換化合物を除いて、0〜50℃の温度範囲で行われる
。この温度範囲内であれば、必ずしも反応中湿度を一定
に保つ必要はなく、反応の進行を把握し、反応温度を適
宜設定して効率よく反応を行わせればよい。The reaction temperature depends on the reactivity of the amide compound and halogen-substituted compound used, but if the reaction temperature is low, the reaction progresses slowly, while if the temperature is high, side reactions such as hydrolysis of the amide compound may occur and the product may deteriorate. Yield decreases. Therefore, the reaction is usually carried out at a temperature range of -20 to 100°C, preferably -10 to 70°C, and particularly preferably at a temperature of 0 to 50°C, except for specific halogen-substituted compounds. As long as the temperature is within this range, it is not necessarily necessary to keep the humidity constant during the reaction, but it is sufficient to monitor the progress of the reaction and set the reaction temperature appropriately to carry out the reaction efficiently.
また、反応時間も反応温度と同様に使用するアミド化合
物およびハロゲン置換化合物により変動するか、長くて
も30時間、通常10時間以内である。反応の推移は反
応系の性状の変化及びガスクロマトグラフィーあるいは
高速液体クロマトグラフィーなどにより反応液中の原料
及び目的生成物の濃度を知ることにより把握できる。The reaction time also varies depending on the amide compound and halogen-substituted compound used, as does the reaction temperature, or is at most 30 hours, but usually within 10 hours. The progress of the reaction can be understood by observing changes in the properties of the reaction system and the concentrations of raw materials and target products in the reaction solution by gas chromatography or high performance liquid chromatography.
反応後、副生する金属塩化物を濾別して常法により減圧
蒸留すれば高純度の目的生成物が得られる。ただし、金
属塩化物が反応液に溶解する場合とか、昇華性の原料ア
ミド化合物が残存する場合には溶媒を留去した後、ベン
ゼン−水、クロロホルム−水のような二層を形成する溶
剤の組合せでE記物質を除去した後、減圧蒸留すれば高
純度の目的生成物が得られる。また、目的生成物が高沸
点であるとか熱分解性を有する場合には、溶剤抽出、訂
結晶等の方法で目的生成物を精製できる。After the reaction, by-produced metal chlorides are filtered off and distilled under reduced pressure using a conventional method to obtain a highly pure target product. However, if a metal chloride is dissolved in the reaction solution or if a sublimable raw material amide compound remains, after distilling off the solvent, use a solvent that forms two layers such as benzene-water or chloroform-water. After removing the substances listed in E in combination, the target product with high purity can be obtained by distillation under reduced pressure. Furthermore, when the desired product has a high boiling point or is thermally decomposable, the desired product can be purified by methods such as solvent extraction and crystallization.
反応溶媒が、ジメチルスルホキシドの如く、水との親和
性が大きく、目的生成物がN−アルキル置換アミド化合
物の如く親油性に富む場合には、反応後、反応液に水を
添加して目的物を油層として分離する方法、あるいはベ
ンゼン、トルエン、クロロホルムの如く水と二層を形成
する溶剤で目的物を抽出分離する方法なども適用できる
。When the reaction solvent has a high affinity for water, such as dimethyl sulfoxide, and the desired product is highly lipophilic, such as an N-alkyl-substituted amide compound, water is added to the reaction solution after the reaction to obtain the desired product. A method in which the target product is separated as an oil layer, or a method in which the target product is extracted and separated using a solvent that forms two layers with water, such as benzene, toluene, or chloroform, can also be applied.
本発明によれば、極めて多種類の様々な機能を有するN
−置換アミド化合物を一段で安価に製造することができ
る。そして従来応用できなかった多種用途へ、N−置換
アミド化合物を供給することが可能になる。According to the present invention, N
- Substituted amide compounds can be produced in one step at low cost. In addition, it becomes possible to supply N-substituted amide compounds to a variety of uses that could not be applied conventionally.
また、本発明は同一の反応様式をとるので、同一反応器
で多品種のN−置換アミド化合物を製造することができ
、少量多品科の製品の生産に向くという利点がある。Furthermore, since the present invention employs the same reaction pattern, it is possible to produce a wide variety of N-substituted amide compounds in the same reactor, which has the advantage of being suitable for producing a wide variety of products in small quantities.
次に本発明を実施例により更に説明する。Next, the present invention will be further explained by examples.
実施例I
N−アクリロイルピロリジンの製造
ジメチルスルホキシド150mILにアクリルアミド目
g、水酸化カリウム及び1,4−ジクロロブタン38g
添加し攪拌し、40”Cで4時間反応を行った。Example I Preparation of N-acryloylpyrrolidine 150 ml of dimethyl sulfoxide, g of acrylamide, potassium hydroxide and 38 g of 1,4-dichlorobutane
The mixture was added, stirred, and reacted at 40"C for 4 hours.
反応後不溶物を濾別し、濾液を蒸留し101i−108
℃/10ma+t1g留分を採取し、N−アクリロイル
ピロリジン19gを採取した。After the reaction, insoluble matter was filtered off, and the filtrate was distilled to obtain 101i-108.
℃/10ma+t1g fraction was collected, and 19g of N-acryloylpyrrolidine was collected.
実施例2
N−メタクリロイルピロリジンの製造
N、N−ジメチルホルムアミド150mJlにメタクリ
ルアミド 17g、 1.4−ジブロモブタン65g及
びフェノチアジンα、05gを添加し、水浴中で攪拌し
ながら水酸化カリウム25gを徐々に添加した。反応温
度を10℃に保ち、6時間反応を行った。Example 2 Production of N-methacryloylpyrrolidine 17 g of methacrylamide, 65 g of 1,4-dibromobutane and 0.5 g of phenothiazine α were added to 150 mJl of N,N-dimethylformamide, and 25 g of potassium hydroxide was gradually added while stirring in a water bath. Added. The reaction temperature was maintained at 10°C and the reaction was carried out for 6 hours.
反応後、不溶部を濾別し、濾液を蒸留し、+ 10−1
11℃/15mmt1g留分を採取し、N−メタクリロ
イルピロリジン 23g(収率82%)を得た。After the reaction, the insoluble part is filtered off, the filtrate is distilled, and the
A 1g fraction at 11°C/15mmt was collected to obtain 23g (yield: 82%) of N-methacryloylpyrrolidine.
実施例3〜7
表−1記載の原料、強塩基性物質、溶媒の組合せで表−
1記載の条件で反応を行った。なお、実施例3及び6〜
7ではフェノチアジン0.05gを添加して反応を行っ
た。Examples 3 to 7 Combinations of raw materials, strong basic substances, and solvents listed in Table 1 were prepared.
The reaction was carried out under the conditions described in 1. In addition, Examples 3 and 6~
In No. 7, 0.05 g of phenothiazine was added to carry out the reaction.
反応後、実施例2と全く同様の方法で処理を行い、表−
2記載の生成物を表−2記載の蒸留条件で分難した。After the reaction, treatment was carried out in exactly the same manner as in Example 2, and the results shown in Table-
The products listed in Table 2 were separated under the distillation conditions listed in Table 2.
実施例8
N、N”−カルポニルージピロリジンの製造N、N−ジ
メチルホルムアミド+50mR,に尿素13g、l、4
−ジブロモブタン9fig及び水酸化カリウム50gを
添加して、20℃で4時間反応を行った。Example 8 Preparation of N,N''-Carponyl dipyrrolidine N,N-dimethylformamide + 50mR, urea 13g, l, 4
-9 figs of dibromobutane and 50 g of potassium hydroxide were added, and the reaction was carried out at 20° C. for 4 hours.
反応後、不溶部を濾別し、濾液を蒸留し、38−40℃
10.6mmHg留分を採取し、N、N’−カルポニル
ージピロリジン29g(収率78%)を得た。After the reaction, the insoluble portion was filtered off, the filtrate was distilled and heated to 38-40°C.
A 10.6 mmHg fraction was collected to obtain 29 g of N,N'-carponyl dipyrrolidine (yield 78%).
実施例9
N、N’−カルポニルージビベリジンの製造1.3−ジ
メチル−2−イミダゾリジノン150mftに尿素13
g 、 1.5−ジブロモペンタン150g及び水酸化
カリウム50gを添加して、20℃で4時間反応を行っ
た。Example 9 Production of N,N'-carponyl dibiberidine 1.3-dimethyl-2-imidazolidinone 150 mft and urea 13
g, 150 g of 1,5-dibromopentane and 50 g of potassium hydroxide were added, and the reaction was carried out at 20° C. for 4 hours.
反応後、不溶部を濾別し、濾液より溶媒及び、原料を留
去後、残部を再結晶して、融点45−46℃のN、N’
−カルボニルージピベリジンを33g(収率77%)を
得た。After the reaction, the insoluble portion is filtered off, the solvent and raw materials are distilled off from the filtrate, and the remainder is recrystallized to obtain N, N' with a melting point of 45-46°C.
-33 g (yield 77%) of carbonyl dipiveridine was obtained.
Claims (1)
化合物を非プロトン性極性溶媒中で同時に接触させて反
応させ、それによってN−アシル環状イミン化合物を製
造する方法において、該塩基性物質の懸濁下に反応を開
始することを特徴とするN−アシル環状イミン化合物の
製造方法。 2、反応の開始時における反応系の水の量が5重量%以
下である請求項第1項記載の方法。[Claims] 1. A method for producing an N-acyl cyclic imine compound by simultaneously contacting and reacting a strongly basic substance, an amide compound, and a dihalogen-substituted compound in an aprotic polar solvent, wherein the base 1. A method for producing an N-acyl cyclic imine compound, characterized in that the reaction is initiated in the presence of a suspension of a cyclic imine compound. 2. The method according to claim 1, wherein the amount of water in the reaction system at the start of the reaction is 5% by weight or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311986A JPH01287078A (en) | 1988-12-12 | 1988-12-12 | Production of n-acyl cyclic imine compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63311986A JPH01287078A (en) | 1988-12-12 | 1988-12-12 | Production of n-acyl cyclic imine compound |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19844181A Division JPS58103348A (en) | 1981-01-17 | 1981-12-11 | Preparation of n-substituted amide compound |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01287078A true JPH01287078A (en) | 1989-11-17 |
JPH048425B2 JPH048425B2 (en) | 1992-02-17 |
Family
ID=18023826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63311986A Granted JPH01287078A (en) | 1988-12-12 | 1988-12-12 | Production of n-acyl cyclic imine compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01287078A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0613892A1 (en) * | 1993-01-22 | 1994-09-07 | DSM Chemie Linz GmbH | Cyclization and process for the preparation of N-cyclic and N,N'-dicylic ureas |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58103348A (en) * | 1981-12-11 | 1983-06-20 | Mitsui Toatsu Chem Inc | Preparation of n-substituted amide compound |
-
1988
- 1988-12-12 JP JP63311986A patent/JPH01287078A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58103348A (en) * | 1981-12-11 | 1983-06-20 | Mitsui Toatsu Chem Inc | Preparation of n-substituted amide compound |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0613892A1 (en) * | 1993-01-22 | 1994-09-07 | DSM Chemie Linz GmbH | Cyclization and process for the preparation of N-cyclic and N,N'-dicylic ureas |
Also Published As
Publication number | Publication date |
---|---|
JPH048425B2 (en) | 1992-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4835312A (en) | Production process of N-substituted amide compounds | |
EP0226501B1 (en) | Process for the synthesis of n-dialkylaminoalkyl (meth)acryl amide | |
US3149155A (en) | Production of acid chlorides | |
US2701814A (en) | Fluorocarbon compounds | |
JPH01287078A (en) | Production of n-acyl cyclic imine compound | |
US4885409A (en) | Process for the hydrogenation of bis-phenols | |
JPS60193979A (en) | N-(omega-glycidoxyalkyl) substituted amide and its preparation | |
US3574760A (en) | Process for the preparation of amines | |
JPH0328412B2 (en) | ||
US3023241A (en) | Preparation of acyl hydrazine derivatives | |
HERBST et al. | The synthesis of nitro-and amino-phenyltetrazoles | |
JPS641458B2 (en) | ||
JPH0753721B2 (en) | Method for producing cyclic urethane compound | |
SU472506A3 (en) | Method for producing morpholine derivatives | |
JPS5920258A (en) | Preparation of n-substituted alkoxycarboxylic acid amide compound | |
US4968841A (en) | Synthesis of ethylidene bisformamide from vinyl acetate | |
US3914312A (en) | Process for the preparation of propargylamine | |
JPH0530825B2 (en) | ||
JPS5916831A (en) | Preparation of n-substituted amide compound | |
US2956051A (en) | Process for preparing cyclic amides | |
US2459686A (en) | Acetoxy-aliphatic amides | |
JPS5920259A (en) | Preparation of n-substituted amide compound | |
Agekyan et al. | Synthesis of p-aminobenzoic acid diamides based on 4-(4-methoxyphenyl) tetrahydro-2 H-pyran-4-carboxylic acid and [4-(4-methoxyphenyl) tetrahydro-2 H-pyran-4-yl] methylamine | |
JPH046180B2 (en) | ||
RU2019542C1 (en) | Process for preparing benzamide |