JPH01282832A - Wafer stage - Google Patents
Wafer stageInfo
- Publication number
- JPH01282832A JPH01282832A JP63113187A JP11318788A JPH01282832A JP H01282832 A JPH01282832 A JP H01282832A JP 63113187 A JP63113187 A JP 63113187A JP 11318788 A JP11318788 A JP 11318788A JP H01282832 A JPH01282832 A JP H01282832A
- Authority
- JP
- Japan
- Prior art keywords
- stage
- wafer
- wafers
- appearance
- interlocked
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 235000012431 wafers Nutrition 0.000 claims abstract description 37
- 239000000523 sample Substances 0.000 description 3
Landscapes
- Details Of Measuring And Other Instruments (AREA)
- Testing Electric Properties And Detecting Electric Faults (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はウェハーの外観や特性検査に用いるウェハース
テージに関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a wafer stage used for inspecting the appearance and characteristics of wafers.
従来、この種のウェハーステージは、第３図に示す様に
ステージ１２台２．ステージ動作つまみ５から成りステ
ージ動作つまみ５を動かすことによりステージ上のウェ
ハーを前後左右に移動させていた。Conventionally, this type of wafer stage has 12 stages 2. as shown in FIG. It consists of a stage operation knob 5, and by moving the stage operation knob 5, the wafer on the stage is moved back and forth, left and right.
上述した従来のウェハーステージは、ステージが１つし
かないため、リファレンスウェハー等との比較をする際
にはその都度ウェハーを載せかえなければならないので
作業性や効率が悪く比較もしにくいという欠点がある。The conventional wafer stage mentioned above has only one stage, so when comparing with a reference wafer, etc., the wafer must be replaced each time, which has the disadvantage of poor workability and efficiency and making comparisons difficult. .
本発明のウェハーステージは、ウェハーの外観や特性検
査に使用するウェハーステージにおいて、２つのウェハ
ーが互いに連動することを特徴とする。The wafer stage of the present invention is used for inspecting the appearance and characteristics of wafers, and is characterized in that two wafers are interlocked with each other.
第１図は本発明の一実施例の正面図である。１１゜１２
．１３．１４は探針、２１は第１のウェハー、２２は第
２のウェハー、３１は第１のステージ、３２は第２のス
テージ、４１は第１の台、４２は第２の台、５はステー
ジ動作つまみである。ステージ動作つまみ５を動作させ
ることにより、第１のステージ３１、第２のステージ３
２は連動し、その上の第１のウェハー２１、第２のウェ
ハー２２も連動するので最初に同じ位置に合わせておけ
ば以後どのように動かしても第１のウェハー２１と第２
のウェハー２２の同一地点を探針１１乃至１４で当たる
ことができる。FIG. 1 is a front view of one embodiment of the present invention. 11°12
．． 13. 14 is a probe, 21 is a first wafer, 22 is a second wafer, 31 is a first stage, 32 is a second stage, 41 is a first stage, 42 is a second stage, 5 is the stage operation knob. By operating the stage operation knob 5, the first stage 31 and the second stage 3
2 are interlocked, and the first wafer 21 and second wafer 22 above it are also interlocked, so if you align them in the same position at the beginning, no matter how you move them, the first wafer 21 and the second wafer 22 will move together.
The same point on the wafer 22 can be hit by the probes 11 to 14.
第２図は本発明の他の実施例の正面図である。FIG. 2 is a front view of another embodiment of the invention.
５１は第］の顕微鏡、５２は第２の顕微鏡、２１は第１
のウェハー、２２は第２のウェハー、３１は第１のステ
ージ、３２は第２のステージ、２は台、５はステージ動
作つまみで、この実施例では最初に同じ位置に合わせて
いれば第１のウェハー２１と第２のウェハー２２の同一
地点を第１の顕微鏡５１と第２の顕微鏡５２を選択する
だけで観察できるという利点がある。51 is the second microscope, 52 is the second microscope, and 21 is the first microscope.
, 22 is the second wafer, 31 is the first stage, 32 is the second stage, 2 is the stand, and 5 is the stage operation knob. There is an advantage that the same point on the wafer 21 and the second wafer 22 can be observed by simply selecting the first microscope 51 and the second microscope 52.
以上説明したように本発明は、２つのステージが連動す
ることにより、比較対象同志のウェハーの特性や外観等
をより効率的に、また比較し易くできる効果がある。As explained above, the present invention has the effect of making it possible to more efficiently and easily compare the characteristics, appearance, etc. of wafers to be compared by interlocking two stages.
第１図は本発明一実施例の正面図、第２図は本発明能の
実施例の正面図、第３図は従来のウェハーステージの正
面図である。
１・・・・・・ステージ、２・・・・・・台、５・・・
・・・ステージ動作つまみ、１１〜１４・・・・・・探
針、２１・・・・・・第１のウェハー、２２・・・・・
・第２のウェハー、３１・・・・・・第１のステージ、
３２・・・・・・第２のステージ、４１・・・・・・第
１の台、４２・・・・・・第２の台、５１・・・・・・
第１の顕微鏡、５２・・・・・・第２の顕微鏡。
代理人 弁理士 内 原 晋
箭２図FIG. 1 is a front view of an embodiment of the present invention, FIG. 2 is a front view of an embodiment of the present invention, and FIG. 3 is a front view of a conventional wafer stage. 1...stage, 2...stand, 5...
... Stage operation knob, 11-14 ... Probe, 21 ... First wafer, 22 ...
・Second wafer, 31...first stage,
32... Second stage, 41... First stand, 42... Second stand, 51...
First microscope, 52...Second microscope. Agent Patent Attorney Shinshu Uchihara 2
Claims (1)
ジにおいて、２つのステージが互いに連動することを特
徴とするウェハーステージ。A wafer stage used for inspecting the appearance and characteristics of wafers, which is characterized by two stages interlocking with each other.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113187A JPH01282832A (en) | 1988-05-09 | 1988-05-09 | Wafer stage |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63113187A JPH01282832A (en) | 1988-05-09 | 1988-05-09 | Wafer stage |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01282832A true JPH01282832A (en) | 1989-11-14 |
Family
ID=14605759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63113187A Pending JPH01282832A (en) | 1988-05-09 | 1988-05-09 | Wafer stage |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01282832A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220076957A1 (en) * | 2018-09-04 | 2022-03-10 | Samsung Electronics Co., Ltd. | Monitoring device, monitoring method and method of manufacturing semiconductor device |
-
1988
- 1988-05-09 JP JP63113187A patent/JPH01282832A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220076957A1 (en) * | 2018-09-04 | 2022-03-10 | Samsung Electronics Co., Ltd. | Monitoring device, monitoring method and method of manufacturing semiconductor device |
| US11764064B2 (en) * | 2018-09-04 | 2023-09-19 | Samsung Electronics Co., Ltd. | Monitoring device, monitoring method and method of manufacturing semiconductor device using reflectivity of wafer |
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