JPH01277347A - Production of stamper - Google Patents

Production of stamper

Info

Publication number
JPH01277347A
JPH01277347A JP10799888A JP10799888A JPH01277347A JP H01277347 A JPH01277347 A JP H01277347A JP 10799888 A JP10799888 A JP 10799888A JP 10799888 A JP10799888 A JP 10799888A JP H01277347 A JPH01277347 A JP H01277347A
Authority
JP
Japan
Prior art keywords
film
glass substrate
conductive film
stamper
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10799888A
Other languages
Japanese (ja)
Inventor
Masayasu Futagawa
正康 二川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP10799888A priority Critical patent/JPH01277347A/en
Publication of JPH01277347A publication Critical patent/JPH01277347A/en
Pending legal-status Critical Current

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  • Manufacturing Optical Record Carriers (AREA)
  • Holo Graphy (AREA)

Abstract

PURPOSE:To remove the invasion of an abrasive or the like into a recording face side without extruding the trace of a current supply jig into an electroforming film and interrupting grinding work by setting up the surface of the current supply jig connected to a conductive film to the same level or lower as/than the surface of the conductive film. CONSTITUTION:The ring-like current supply jig 21 is fixed on an edge part 12 formed as an inclined part of a glass substrate 10 on which the conductive film 20 is formed and the electroforming film 30 is deposited on the surface of the conductive film 20 by using the film 20 as a cathode. Since the surface of the current supply jig 21 is set up to the same level or lower as/than the surface of the film 20, the trace of the jig 21 is prevented from being projected from the film 30. After depositing the film 30 with a prescribed thickness, the surface side of the film 30, i.e., the rear face side of a recording plane, is smoothly ground by a grinding device in the stuck state of the film 30 to the substrate 10. After ending the grinding work, both the films 20, 30 are peeled from the substrate 10 to form a stamper. Consequently, the interruption of the grinding work due to the trace of the current supply jig 21 or the invasion of the abrasive or the like into the recording side can be removed.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は光ディスク、光カード或いはその他の光応用プ
ラスチック製品の製造に使用されるスタンパの製造方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for manufacturing a stamper used for manufacturing optical disks, optical cards, or other optical application plastic products.

〈従来の技術〉 光ディスク等には情報が記録された微細形状が表面に形
成されている。この微細形状を転写成形するにはスタン
パと呼ばれる金型によって行われる。
<Prior Art> Optical disks and the like have fine shapes on which information is recorded formed on their surfaces. Transfer molding of this fine shape is performed using a mold called a stamper.

第4図は従来のスタンパの製造方法の工程図である。な
お、説明のため第4図の導電化膜20及び電鋳膜30の
厚さは、ガラス基板IOの厚さより大きく表している。
FIG. 4 is a process diagram of a conventional stamper manufacturing method. Incidentally, for the sake of explanation, the thicknesses of the conductive film 20 and the electroformed film 30 in FIG. 4 are shown to be larger than the thickness of the glass substrate IO.

原盤材料としての円形状のガラス基板10の平滑な表面
にフォトレジスト11を均一に塗布しく第4図(a)参
照)、レーザ光り等を照射して微細形状111に対応し
たカッティングを行う (第4図G)参照)。
A photoresist 11 is uniformly coated on the smooth surface of a circular glass substrate 10 as a master material (see FIG. 4(a)), and cutting corresponding to the fine shape 111 is performed by irradiating laser light or the like (see FIG. 4(a)). (See Figure 4G).

このカッティングが施されたフォトレジスト11を現像
しく第3図(C)参照)、フォトレジスト11の表面に
導電化膜20を形成する(第4図(d)参照)。
The cut photoresist 11 is developed (see FIG. 3(C)), and a conductive film 20 is formed on the surface of the photoresist 11 (see FIG. 4(d)).

すなわち、導電化膜20は微細形状111に対応して形
成される。この導電化膜20は、例えばニッケル等の導
電性金属をスパッタリング、又は蒸着することによって
形成される。
That is, the conductive film 20 is formed corresponding to the fine shape 111. This conductive film 20 is formed, for example, by sputtering or vapor depositing a conductive metal such as nickel.

ガラス基板10の縁部12にリング状の通電治具21を
接続してこの導電化膜20を陰極とし、当該導電化膜2
0上に電鋳により電鋳膜30を析出゛させる(第4図(
e)参照)。
A ring-shaped energizing jig 21 is connected to the edge 12 of the glass substrate 10, and the conductive film 20 is used as a cathode.
An electroformed film 30 is deposited on 0 by electroforming (Fig. 4 (
(see e)).

この後、電鋳膜30の記録面の裏面側を研磨装置等(図
示省略)によって平滑に研磨加工し、内外径加工、洗浄
等を行った後にスタンパ40とする。
Thereafter, the back side of the recording surface of the electroformed film 30 is polished smooth using a polishing device or the like (not shown), and the stamper 40 is obtained after performing internal and external diameter processing, cleaning, and the like.

なお、内外径加工等の際の記録面の損傷を防止するため
に記録面には微細形状111を保護する樹脂がコートさ
れ、当該樹脂は洗浄によって除去される。
Note that in order to prevent damage to the recording surface during processing of the inner and outer diameters, the recording surface is coated with a resin that protects the fine features 111, and the resin is removed by cleaning.

電鋳膜30の研磨加工は、電鋳膜30をガラス基板10
から剥離した後に行う方法と、電鋳膜30がガラス基板
10に付いたままの状態で行う方法とに大別される。
The polishing process of the electroformed film 30 is performed by polishing the electroformed film 30 on the glass substrate 10.
There are two main methods: a method in which the electroformed film 30 is removed from the glass substrate 10, and a method in which the electroformed film 30 is left attached to the glass substrate 10.

〈発明が解決しようとする課題〉 しかしながら、電鋳膜30をガラス基板10から剥離し
た後に、研磨加工を行う方法では電鋳膜30の内部応力
による電鋳膜30の反りかえりを防止するために保持具
、補強板等を使用しなければならず、非常に高度の技術
や熟練を必要とする。また、保持具や補強板を電鋳膜3
0に取り付けるための特別な設備を必要とする。
<Problems to be Solved by the Invention> However, in the method of performing polishing after peeling the electroformed film 30 from the glass substrate 10, it is difficult to prevent the electroformed film 30 from warping due to internal stress of the electroformed film 30. Holders, reinforcing plates, etc. must be used, and extremely advanced technology and skill are required. In addition, the holders and reinforcing plates can be made using electroformed film 3.
Requires special equipment to attach to 0.

また、ガラス基板10に電鋳膜30が付いたままの状態
で研磨加工を行う方法では、第5図に示すように通電治
具21上にも電鋳膜30が析出するので、通電治具跡3
1は凸状態になる。この通電治具跡31は、研磨加工の
際の障害となる。また、研磨面がガラス基板10と電鋳
膜30との境目に非常に近接しているため、研磨加工の
際に、研磨剤やその他の異物が通電治具跡31から記録
面側に侵入して記録面の微細形状111を損傷するとい
う問題点がある。
Furthermore, in the method of polishing the glass substrate 10 with the electroformed film 30 still attached, the electroformed film 30 is also deposited on the energizing jig 21 as shown in FIG. Trace 3
1 becomes a convex state. This energizing jig trace 31 becomes an obstacle during polishing. In addition, since the polishing surface is very close to the boundary between the glass substrate 10 and the electroformed film 30, abrasives and other foreign substances may enter the recording surface side from the current-carrying jig marks 31 during polishing. There is a problem in that the fine features 111 on the recording surface are damaged.

本発明は上記事情に鑑みて創案されたもので、通電治具
の跡が研磨加工の障害になったり、研磨剤等が記録面側
に侵入することのないスタンパの製造方法を提供するこ
とを目的としている。
The present invention was devised in view of the above-mentioned circumstances, and aims to provide a method for manufacturing a stamper in which the marks of the energizing jig do not become an obstacle to the polishing process and the abrasives etc. do not enter the recording surface side. The purpose is

く課題を解決するための手段〉 本発明に係るスタンパの製造方法は、微細形状が形成さ
れたガラス基板の表面に電極として形成された導電化膜
に接続される通電治具の表面を導電化膜の表面と同一面
上又はそれ以下にしたことを特徴としている。
Means for Solving the Problems> The method for manufacturing a stamper according to the present invention includes making the surface of an energizing jig conductive, which is connected to a conductive film formed as an electrode on the surface of a glass substrate on which a fine shape is formed. It is characterized by being flush with or below the surface of the membrane.

く作用〉 略円形のガラス基板の表面にフォトレジストを例えばス
ピンオンコー・ト法等によって厚さが均一になるように
塗布し、プリベータを行う。
Effects> A photoresist is coated on the surface of a substantially circular glass substrate by, for example, a spin-on coating method so as to have a uniform thickness, and prebatering is performed.

前記フォトレジストにレーザ光等を照射してカッティン
グを行う。なお、ここでカッティングとは記録すべき情
報に対応した微細形状をフォトレジストに形成すること
をいう。すなわち、前記レーザ光は前記情報によって変
調されているのである。
Cutting is performed by irradiating the photoresist with a laser beam or the like. Note that cutting here refers to forming a fine shape on the photoresist corresponding to the information to be recorded. That is, the laser beam is modulated by the information.

カッティングが施されたフォトレジストを現像する。こ
れで、フォトレジストは記録すべき信号に対応した微細
形状を保持したまま硬化する。
Develop the cut photoresist. The photoresist is now cured while retaining the fine shape corresponding to the signal to be recorded.

硬化したフォトレジストの表面に導電化膜を形成する。A conductive film is formed on the surface of the hardened photoresist.

次に、導電化膜が形成されたガラス基板の傾斜部として
形成された縁部にリング状の通電治具を取り付け、導電
化膜を陰極として導電化膜の上に電鋳膜を析出させる。
Next, a ring-shaped electrification jig is attached to the edge formed as a slope of the glass substrate on which the conductive film is formed, and an electroformed film is deposited on the conductive film using the conductive film as a cathode.

このとき、通電治具の表面は導電化膜の表面と同一面上
又は下方にあるため、通電治具跡は電鋳膜に対して凸状
態にならない。
At this time, since the surface of the energizing jig is on the same level as or below the surface of the conductive film, the traces of the energizing jig do not become convex with respect to the electroformed film.

所定の厚さに電鋳膜が析出したならば、電鋳膜がガラス
基板に付いたままの状態で電鋳膜の表面側、すなわち記
録面の裏面側を研磨装置で平滑に研磨加工する。
Once the electroformed film has been deposited to a predetermined thickness, the front side of the electroformed film, that is, the back side of the recording surface, is polished smooth using a polishing device while the electroformed film remains attached to the glass substrate.

研磨加工が終了したならば、導電化膜と電鋳膜とをガラ
ス基板、から剥離してスタンパとする。
When the polishing process is completed, the conductive film and the electroformed film are peeled off from the glass substrate to form a stamper.

〈実施例〉 以下、図面を参照して本発明に係る一実施例を説明する
<Example> Hereinafter, an example according to the present invention will be described with reference to the drawings.

第1図は本発明に係るスタンパの製造方法に使□用され
るガラス基板の縁部を示す断面図、第2図はそのガラス
基板に通電治具が取り付けられ、電鋳膜が析出した状態
を示す断面図、第3図は本発明に係るスタンパの製造方
法の工程図である。なお、説明のため第3図の導電化膜
20及び電鋳膜30の厚さは、ガラス基板10の厚さよ
り大きく表している。また、従来のものと路間−の部品
、部分等には同一の符号を付して説明を行う。
Fig. 1 is a cross-sectional view showing the edge of a glass substrate used in the stamper manufacturing method according to the present invention, and Fig. 2 shows a state in which an electrification jig is attached to the glass substrate and an electroformed film is deposited. FIG. 3 is a process diagram of a method for manufacturing a stamper according to the present invention. Incidentally, for the sake of explanation, the thicknesses of the conductive film 20 and the electroformed film 30 in FIG. 3 are shown to be larger than the thickness of the glass substrate 10. In addition, the same reference numerals are given to the parts, parts, etc. that are different from those of the conventional one in the explanation.

本発明に係るスタンパの製造方法に使用される原盤とし
てのガラス基板10は、その表面が平滑に仕上げられ、
かつ縁部12が段差或いは傾斜部として形成されている
。第1図(a)は縁部12が段差として形成されたもの
であり、第1図(b)は傾斜部と平坦部とを有する段差
、第1図(C)は縁部12が傾斜部として形成されたも
のであり、第1図(d)は縁部12が丸く形成されたも
のを示している。この4つのうちどのガラス基板10を
使用しても路間−の効果を示すが、以下の説明において
は第1図(C)に示すガラス基板IOによってスタンパ
40を製造するものとする。
The glass substrate 10 as a master used in the stamper manufacturing method according to the present invention has a smooth surface,
In addition, the edge portion 12 is formed as a step or an inclined portion. In FIG. 1(a), the edge 12 is formed as a step, in FIG. 1(b), the step has an inclined part and a flat part, and in FIG. 1(C), the edge 12 is formed as an inclined part. FIG. 1(d) shows one in which the edge 12 is rounded. Although any of these four glass substrates 10 can be used, the effect of the gap will be exhibited, but in the following description, it is assumed that the stamper 40 is manufactured using the glass substrate IO shown in FIG. 1(C).

次に、本発明に係るスタンパ40の製造方法を説明する
Next, a method for manufacturing the stamper 40 according to the present invention will be explained.

略円形のガラス基板10の表面にフォトレジスト11を
例えばスピンオンコート法等によって厚さが均一になる
ように塗布しく第3図(a)参照)、プリベークを行う
A photoresist 11 is coated on the surface of the substantially circular glass substrate 10 by, for example, spin-on coating so that the thickness is uniform (see FIG. 3(a)), and prebaked.

ガラス基板10に均一に塗布されたフォトレジスト11
にレーザ光り等を照射してカッティングを行う(第3図
(b)参照)。なお、ここでカッティングとは記録すべ
き情報に対応した微細形状111をフォトレジスト11
に形成することをいう。すなわち、前記レーザ光りは前
記情報によって変調されているのである。
Photoresist 11 uniformly coated on glass substrate 10
Cutting is performed by irradiating the area with laser light or the like (see FIG. 3(b)). Note that cutting here means cutting a fine shape 111 corresponding to the information to be recorded onto the photoresist 11.
It refers to the formation of That is, the laser light is modulated by the information.

カッティングが施されたフォトレジスト11を現像する
(第3図(C)参照)。これで、フォトレジスト11は
記録すべき信号に対応した微細形状111を保持したま
ま硬化する。
The cut photoresist 11 is developed (see FIG. 3(C)). The photoresist 11 is now cured while retaining the fine shape 111 corresponding to the signal to be recorded.

硬化したフォトレジスト11の表面に導電化膜20を形
成する(第3図(ロ)参照)。この導電化膜20は、ニ
ッケル等の導電性金属をスパッタリングすることによっ
てフォトレジスト11の微細形状111に沿って形成さ
れる。
A conductive film 20 is formed on the surface of the hardened photoresist 11 (see FIG. 3(b)). This conductive film 20 is formed along the fine shape 111 of the photoresist 11 by sputtering a conductive metal such as nickel.

次に、導電化膜20が形成されたガラス基板10の傾斜
部として形成された縁部12にリング状の通電治具21
を取り付け、導電化膜20を陰極として導電化膜20の
上に電鋳膜30を析出させる(第3図(e)参照)、こ
のとき、第2図(a)に示すように通電治具21の表面
は導電化膜20の表面より下方にあるため、通電治具跡
31は電鋳膜30に対して凸状態にならない。
Next, a ring-shaped energizing jig 21 is attached to the edge 12 formed as an inclined part of the glass substrate 10 on which the conductive film 20 is formed.
is attached, and the electroformed film 30 is deposited on the conductive film 20 using the conductive film 20 as a cathode (see FIG. 3(e)). At this time, as shown in FIG. Since the surface of 21 is below the surface of the conductive film 20, the energizing jig trace 31 does not protrude with respect to the electroformed film 30.

所定の厚さに電鋳膜30が析出したならば、電鋳膜30
がガラス基板10に付いたままの状態で電鋳膜30の表
面側、すなわち記録面の裏面側を研磨装置(図示省略)
で平滑に研磨加工する(第3図げ)参照)。従って、ガ
ラス基板10から電鋳膜30を剥離した後に研磨加工を
行う方法と違って、電鋳膜30の内部応力による電鋳膜
30の反りかえりを矯正する設備等が不要となる。
Once the electroformed film 30 has been deposited to a predetermined thickness, the electroformed film 30
While still attached to the glass substrate 10, the front side of the electroformed film 30, that is, the back side of the recording surface, is polished using a polishing device (not shown).
(See Figure 3). Therefore, unlike a method in which polishing is performed after peeling the electroformed film 30 from the glass substrate 10, equipment for correcting warping of the electroformed film 30 due to internal stress of the electroformed film 30 is not required.

研磨加工が終了したならば、導電化膜20と電鋳膜30
とをガラス基板10から剥離する(第3図(6)参照)
。ガラス基板10から剥離された導電化膜20と電鋳膜
30とは第3図(C)に示したもの、すなわちカッティ
ングされて現像されたフォトレジスト11とは逆の微細
形状111を有するようになっている。
After the polishing process is completed, the conductive film 20 and the electroformed film 30 are removed.
and is peeled off from the glass substrate 10 (see FIG. 3 (6)).
. The conductive film 20 and electroformed film 30 peeled off from the glass substrate 10 have a microscopic shape 111 as shown in FIG. It has become.

また、この微細形状111を保護するために樹脂で微細
形状をコートし、この状態で導電化膜20と電鋳膜30
との内外径加工や洗浄等を行ってスタンパ40とする。
Further, in order to protect this fine shape 111, the fine shape is coated with resin, and in this state, the conductive film 20 and the electroformed film 30 are coated.
The stamper 40 is then processed by processing the inner and outer diameters and cleaning.

このスタンパ40によって光ディスク等を製造する。ス
タンパ40の記録面の微細形状111は第3図(C)に
示したものの逆になっているため、製造された光ディス
ク等の記録面の微細形状111は第3図(C)に示した
ものと同一になる。
This stamper 40 is used to manufacture optical discs and the like. Since the fine shape 111 on the recording surface of the stamper 40 is the reverse of that shown in FIG. 3(C), the fine shape 111 on the recording surface of the manufactured optical disk etc. is the same as that shown in FIG. 3(C). becomes the same as

なお、上記実施例では第1図(C)に示すガラス基板1
0を使用したが、本発明がこれに限定されるものではな
(、例えば第1図(a)、(ロ)、(イ)に示すような
ガラス基板10を用いても同一の効果をもたらすことが
できる。
In the above embodiment, the glass substrate 1 shown in FIG.
Although the present invention is not limited to this, for example, the same effect can be achieved by using glass substrates 10 as shown in FIGS. 1(a), (b), and (a). be able to.

また、従来と同様のガラス基板10を用いても第2図(
ロ)に示すように通電治具21をガラス基板10に取り
付けると、通電治具跡31が凸状態にならないので同様
の効果をもたらすことができる。
Furthermore, even if a glass substrate 10 similar to the conventional one is used, it is also possible to use the glass substrate 10 shown in FIG.
If the energizing jig 21 is attached to the glass substrate 10 as shown in b), the same effect can be achieved since the energizing jig trace 31 does not become convex.

〈発明の効果〉 本発明に係るスタンパの製造方法は、微細形状が形成さ
れたガラス基板の表面に電極として形成された導電化膜
に接続される通電治具の表面を導電化膜の表面と同一面
上又はそれ以下にしたので、通電治具跡が電鋳膜に突出
しないので、電鋳膜がガラス基板に付いたままの状態で
研磨加工を施しても、電鋳膜を研磨加工する場合の障害
となることがない。
<Effects of the Invention> The stamper manufacturing method according to the present invention connects the surface of an energizing jig connected to a conductive film formed as an electrode on the surface of a glass substrate on which a fine shape is formed with the surface of the conductive film. Since it is on the same surface or less than that, the traces of the energizing jig will not protrude into the electroformed film, so even if the electroformed film is polished while it is still attached to the glass substrate, the electroformed film can be polished. It will not be a hindrance in case.

また、ガラス基板と電鋳膜との境目が研磨面から離れて
いるので、研磨加工の際に研磨剤等の異物が記録面側に
侵入して記録面を損傷することがない。
Furthermore, since the boundary between the glass substrate and the electroformed film is separated from the polishing surface, foreign substances such as abrasives will not enter the recording surface side and damage the recording surface during polishing.

従って、平面度が高(膜厚が均一な、高品質のスタンパ
を製造することができる。
Therefore, a high-quality stamper with high flatness (uniform film thickness) can be manufactured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係るスタンパの製造方法に使用される
ガラス基板の縁部を示す断面図、第2図はそのガラス基
板に通電治具が取り付けられ、電鋳膜が析出した状態を
示す断面図、第3図は本発明に係るスタンパの製造方法
の工程図、第4図は従来のスタンパの製造方法の工程図
、第5図は従来のスタンパの製造方法に使用されるガラ
ス基板の縁部に通電治具が取り付けられ、電鋳膜が析出
した状態を示す断面図である。 10・・・ガラス基板、111  ・・・微細形状、1
2・・・縁部、20・・・導電化膜、21・・・通電治
具、40・・・スタンパ。
Fig. 1 is a cross-sectional view showing the edge of a glass substrate used in the stamper manufacturing method according to the present invention, and Fig. 2 shows a state in which an electrification jig is attached to the glass substrate and an electroformed film is deposited. 3 is a process diagram of the stamper manufacturing method according to the present invention, FIG. 4 is a process diagram of the conventional stamper manufacturing method, and FIG. 5 is a process diagram of the glass substrate used in the conventional stamper manufacturing method. FIG. 3 is a cross-sectional view showing a state in which an energizing jig is attached to the edge and an electroformed film is deposited. 10... Glass substrate, 111... Fine shape, 1
2... Edge, 20... Conductive film, 21... Current supply jig, 40... Stamper.

Claims (1)

【特許請求の範囲】[Claims] (1)微細形状が形成されたガラス基板の表面に電極と
して形成された導電化膜に接続される通電治具の表面を
導電化膜の表面と同一面上又はそれ以下にしたことを特
徴とするスタンパの製造方法。
(1) The surface of the energizing jig connected to the conductive film formed as an electrode on the surface of the glass substrate on which a fine shape is formed is on the same level as or below the surface of the conductive film. A method for manufacturing a stamper.
JP10799888A 1988-04-29 1988-04-29 Production of stamper Pending JPH01277347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10799888A JPH01277347A (en) 1988-04-29 1988-04-29 Production of stamper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10799888A JPH01277347A (en) 1988-04-29 1988-04-29 Production of stamper

Publications (1)

Publication Number Publication Date
JPH01277347A true JPH01277347A (en) 1989-11-07

Family

ID=14473391

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10799888A Pending JPH01277347A (en) 1988-04-29 1988-04-29 Production of stamper

Country Status (1)

Country Link
JP (1) JPH01277347A (en)

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