JPH0124928Y2 - - Google Patents
Info
- Publication number
- JPH0124928Y2 JPH0124928Y2 JP15513184U JP15513184U JPH0124928Y2 JP H0124928 Y2 JPH0124928 Y2 JP H0124928Y2 JP 15513184 U JP15513184 U JP 15513184U JP 15513184 U JP15513184 U JP 15513184U JP H0124928 Y2 JPH0124928 Y2 JP H0124928Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- base
- protrusion
- wafer
- recess
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 description 24
- 239000010453 quartz Substances 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 230000000694 effects Effects 0.000 description 7
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Electrodes Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15513184U JPH0124928Y2 (US20050075337A1-20050407-C00081.png) | 1984-10-16 | 1984-10-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15513184U JPH0124928Y2 (US20050075337A1-20050407-C00081.png) | 1984-10-16 | 1984-10-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6170935U JPS6170935U (US20050075337A1-20050407-C00081.png) | 1986-05-15 |
| JPH0124928Y2 true JPH0124928Y2 (US20050075337A1-20050407-C00081.png) | 1989-07-27 |
Family
ID=30713127
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15513184U Expired JPH0124928Y2 (US20050075337A1-20050407-C00081.png) | 1984-10-16 | 1984-10-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0124928Y2 (US20050075337A1-20050407-C00081.png) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2804664B2 (ja) * | 1992-01-21 | 1998-09-30 | 株式会社日立製作所 | 試料の静電吸着機構及び電子線描画装置 |
| KR19980016891A (ko) * | 1996-08-29 | 1998-06-05 | 김광호 | 반도체 제조장치의 페디스탈 |
| US6449428B2 (en) * | 1998-12-11 | 2002-09-10 | Mattson Technology Corp. | Gas driven rotating susceptor for rapid thermal processing (RTP) system |
| JP2004528721A (ja) * | 2001-05-29 | 2004-09-16 | アイクストロン、アーゲー | 支持体およびその上にガス支持され回転駆動される基板保持器から構成される装置 |
-
1984
- 1984-10-16 JP JP15513184U patent/JPH0124928Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6170935U (US20050075337A1-20050407-C00081.png) | 1986-05-15 |
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