JPH01246069A - Polishing compound - Google Patents
Polishing compoundInfo
- Publication number
- JPH01246069A JPH01246069A JP63073546A JP7354688A JPH01246069A JP H01246069 A JPH01246069 A JP H01246069A JP 63073546 A JP63073546 A JP 63073546A JP 7354688 A JP7354688 A JP 7354688A JP H01246069 A JPH01246069 A JP H01246069A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- nickel
- compound
- aluminum sulfate
- nickel nitrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 58
- 150000001875 compounds Chemical class 0.000 title claims abstract description 32
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 claims abstract description 19
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 claims abstract description 16
- 239000006061 abrasive grain Substances 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 abstract description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 5
- 239000002002 slurry Substances 0.000 abstract description 4
- JUWOETZNAMLKMG-UHFFFAOYSA-N [P].[Ni].[Cu] Chemical compound [P].[Ni].[Cu] JUWOETZNAMLKMG-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract 1
- 238000007788 roughening Methods 0.000 abstract 1
- 238000007747 plating Methods 0.000 description 10
- 239000000843 powder Substances 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000010775 animal oil Substances 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000010458 rotten stone Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【発明の詳細な説明】
倉皇上段■亙立夏
本発明は、アルミニウムディスク上のニッケルーリンめ
っき皮膜の表面等被研摩物の鏡面仕上げなどに使用され
るポリッシングコンパウンドに関し、更に詳述すれば、
優れたポリッシング速度を有し、しかも被研摩物の仕上
り面が良好なポリッシングコンパウンド（液体研摩剤）
に関する。[Detailed Description of the Invention] The present invention relates to a polishing compound used for mirror-finishing an object to be polished, such as the surface of a nickel-phosphorus plating film on an aluminum disk.
A polishing compound (liquid abrasive) with excellent polishing speed and a good surface finish on the polished object.
Regarding.
の び ■が しよ と る
従来、アルミニウムディスク上に形成した無電解ニッケ
ルーリンめっき皮膜の表面などをポリッシングするため
、アルミナと水とからなるスラリーに硫酸ニッケルを添
加したコンパウンドが提案されている。Conventionally, a compound made by adding nickel sulfate to a slurry of alumina and water has been proposed for polishing the surface of an electroless nickel-phosphorus plating film formed on an aluminum disk.
しかし、この硫酸ニッケルを添加したコンパウンドは、
ポリッシング後の仕上り面に突起物が多く、良好なポリ
ッシング面を与えることができない上、ポリッシング速
度が遅いという欠点を有している。However, this compound with nickel sulfate added,
There are many protrusions on the finished surface after polishing, making it impossible to provide a good polished surface, and the polishing speed is slow.
一方、砥粒と水とからなるスラリーに醸化剤、例えば硝
酸、硝酸アルミニウム等の硝酸塩、過酸化物などを添加
したコンパウンドが利用されており、このコンパウンド
は、ポリッシングの速度を早めることはできるが、その
速度は十分とは言い難く、必ずしも満足したポリッシン
グ面を与えることができず、特に長時間使用した場合に
は、仕上り面の平滑性が低下し、光沢も減少して、表面
状態が劣るようになるという問題が生じる。更に、この
ように酸化剤を添加すると、フンパウンドのｐＨが低く
なるため、研摩機や治具が錆び易い上に作業者の手が荒
れるなど、取扱い上に問題があリ、しかも被研摩物を保
持するパッドの消耗が激しいという欠点がある。On the other hand, compounds are used that are made by adding brewing agents such as nitric acid, nitrates such as aluminum nitrate, peroxides, etc. to a slurry consisting of abrasive grains and water, and this compound can speed up the polishing speed. However, the speed is far from sufficient and it is not always possible to provide a satisfactory polished surface.Especially when used for a long time, the smoothness of the finished surface decreases, the gloss decreases, and the surface condition deteriorates. The problem arises that it becomes inferior. Furthermore, adding an oxidizing agent in this way lowers the pH of the powder, which causes handling problems, such as rusting of polishing machines and jigs and roughness of workers' hands. The disadvantage is that the pads that hold it are subject to rapid wear and tear.
本発明は上記事情に鑑みなされたもので、アルミニウム
ディスク上の無電解ニッケルーリンめっき皮膜などの被
研摩物を鏡面仕上げするに際して、ポリッシングの速度
が早く、しかも長時間使用しても良好な光沢を有し、平
滑な仕上り面を与えると共に、取扱い性に優れたポリッ
シングコンパウンドを提供することを目的とする。The present invention was developed in view of the above circumstances, and is suitable for polishing objects such as electroless nickel-phosphorus plating films on aluminum disks to a mirror finish. The object of the present invention is to provide a polishing compound that has a smooth surface finish and is easy to handle.
を ゛するための び
本発明者らは、上記目的を達成するため鋭意検討を進め
た結果、砥粒と水とを含有するスラリーに硫酸アルミニ
ウムと硝酸ニッケルとを併用して配合した場合、ポリッ
シング速度を早めることができる上、被研摩物に長期間
に亘り優れた仕上り面を安定して与え、このためアルミ
ニウムディスク上の無電解ニッケルーリンめっき皮膜や
ニッケルーリン−網めっき皮膜などの表面を良好な光沢
をもって平滑に仕上げることができるコンパウンドが得
られると共に、このフンパウンドは弱酸性で、取扱い性
に優れていることを知見した。In order to achieve the above object, the present inventors conducted intensive studies and found that when aluminum sulfate and nickel nitrate are combined in a slurry containing abrasive grains and water, polishing In addition to being able to speed up the polishing speed, it can stably give an excellent surface finish to the object to be polished over a long period of time, making it possible to maintain good surfaces such as electroless nickel-phosphorus plating films and nickel-phosphorus-net plating films on aluminum discs. It was discovered that a compound that can be finished smoothly with a glossy luster was obtained, and that this powder compound was weakly acidic and had excellent handling properties.
即ち、砥粒と水とを含有するコンパウンドに硫酸アルミ
ニウムと硝酸ニッケルとを併用して配合することにより
、周成分が相乗的に作用して、硫酸アルミニウムを単独
添加すると研摩面に突起物が残り易いという欠点が硝酸
ニッケルの酸化作用によって解消されると共に、硝酸ニ
ッケルを単独添加するとエツチングが起こり易くポリッ
シング速度が遅いという欠点が硫酸アルミニウムの有す
る砥粒の研摩向上効果により解消され、上述のような研
摩効果の高いポリッシングコンパウンドが得られること
、しかもこのポリッシングコンパウンドは弱酸性を呈す
るので、研摩機や治具が錆びたり作業者の手が荒れるこ
とがほとんどなく、かつ被研摩物を保持するパッドの消
耗が少なく、取扱性に優れていることを見い出し、本発
明をなすに至ったものである。In other words, by combining aluminum sulfate and nickel nitrate into a compound containing abrasive grains and water, the surrounding components act synergistically, and when aluminum sulfate is added alone, protrusions remain on the polished surface. The oxidizing effect of nickel nitrate eliminates the disadvantage that nickel nitrate is easily etched, and the disadvantage that when nickel nitrate is added alone, etching tends to occur and the polishing speed is slow is eliminated by aluminum sulfate's ability to improve the polishing of abrasive grains. It is possible to obtain a polishing compound with high polishing effect, and since this polishing compound exhibits weak acidity, the polishing machine and jig will hardly rust or the operator's hands will get rough, and the pad that holds the object to be polished will not rust. It was discovered that there is little wear and tear and the handleability is excellent, leading to the present invention.
以下、本発明につき更に詳しく説明する。The present invention will be explained in more detail below.
本発明のポリッシングコンパウンドは砥粒と水と硫酸ア
ルミニウム及び硝酸ニッケルとを配合してなるもので、
上述したように速いポリッシング速度を有すると共に、
被研摩物表面を長期に亘り良好に仕上げることができる
ものであり、各種の湿式研摩法のポリッシングコンパウ
ンドとして好適に用いられるものである。The polishing compound of the present invention is made by blending abrasive grains, water, aluminum sulfate, and nickel nitrate.
As mentioned above, it has a fast polishing speed, and
It can provide a good long-term finish on the surface of the object to be polished, and is suitably used as a polishing compound for various wet polishing methods.
この場合、砥粒としては、炭酸カルシウム、クレー粉、
カオリン、シリカ、ベントナイト、アルミナ、酸化クロ
ム、酸化鉄、ベンガラ、エメリー粉、トリポリ粉、ケイ
ソウ土、酸化チタン、ジルコン、ジルコニア、ホワイト
アランダム、アランダム、グリーンカーボランダム、カ
ーボランダム、ガーネット及びダイヤモンド等の天然及
び合成研摩剤の１種又は２種以上を混合したものを使用
することができる。これらの中ではアルミナやホワイト
アランダムが無電解ニッケルーリンめっき皮膜面等のニ
ッケル、ニッケル合金めっき皮膜などをポリッシングす
る際に好適に使用される。砥粒の配合量はポリッシング
コンパウンド全体の２〜３０％（重量％、以下同じ）、
特に８〜１５％とすることがポリッシング力を高めるた
めに好ましい。In this case, the abrasive grains include calcium carbonate, clay powder,
Kaolin, silica, bentonite, alumina, chromium oxide, iron oxide, red iron oxide, emery powder, tripoli powder, diatomaceous earth, titanium oxide, zircon, zirconia, white arundum, arundum, green carborundum, carborundum, garnet, diamond, etc. One or a mixture of two or more of the following natural and synthetic abrasives can be used. Among these, alumina and white alundum are preferably used when polishing nickel or nickel alloy plating films such as electroless nickel-phosphorus plating surfaces. The blending amount of abrasive grains is 2 to 30% (weight%, same below) of the entire polishing compound.
In particular, it is preferable to set the content to 8 to 15% in order to increase the polishing power.
また、砥粒の粒度はポリッシングの目的に応じて種々選
択され得るが、被研摩物表面を鏡面仕上げする場合は２
ＩＵ以下の粒径のものが好適に使用される。In addition, the grain size of the abrasive grains can be selected in various ways depending on the purpose of polishing, but when polishing the surface of the object to be polished to a mirror finish,
Particles having a particle size of IU or less are preferably used.
また、硫酸アルミニウムは各種水和した構造を有するも
のであり１本発明においてはいずれの形態の水和物を使
用しても差支えないが、中でもＡＱ、 ＜ ｓ Ｏ４）
３・１４〜１８Ｈ，Ｏが好適に使用される。その配合量
は別に制限されないが、ポリッシングコンパウンドＩＱ
中に硫酸アルミニウムの無水物として５〜４０ｇ、特に
１０〜２５ｇ添加することが好ましく、配合量が５ｇよ
り少ないと、被研摩物の表面に突起物が発生し易い上、
ポリッシング速度が遅くなる場合があり、４０ｇより多
いとポリッシング速度が速くなる反面、長時間研摩を行
なうと被研摩物の表面状態が悪くなったり、作業者の手
を荒すなど取扱い難くなる場合がある。In addition, aluminum sulfate has various hydrated structures, and any form of hydrate may be used in the present invention, but among them, AQ, < s O4)
3.14-18H,O is preferably used. The blending amount is not particularly limited, but polishing compound IQ
It is preferable to add 5 to 40 g, especially 10 to 25 g, of anhydrous aluminum sulfate in the polishing agent. If the amount is less than 5 g, protrusions are likely to occur on the surface of the object to be polished.
The polishing speed may slow down, and if the amount exceeds 40g, the polishing speed will increase, but if you polish for a long time, the surface condition of the object to be polished may deteriorate, and the operator's hands may become rough, making it difficult to handle. .
更に、硝酸ニッケルも種々の形態の水和物として使用し
得、例えばＮ１（Ｎ Ｏ，）、 ・６ Ｈ２Ｏ等が好適
に用いられる。その配合量はポリッシングコンパウンド
ＩＱ中に硝酸ニッケルの無水物として５〜５０ｇ、特に
１０〜３０ｇ添加することが好ましい。硝酸ニッケルの
配合量が５ｇ未満であると。Further, nickel nitrate can also be used as a hydrate in various forms, for example, N1(N O, ), .6 H2O, etc. are preferably used. It is preferable to add 5 to 50 g, particularly 10 to 30 g of anhydrous nickel nitrate in the polishing compound IQ. The amount of nickel nitrate is less than 5g.
ポリッシング速度が早くなるものの長時間使用や取扱い
が困難になったり、被研摩物を保持するパッドの消耗が
激しくなる場合があり、５０ｇより多いとポリッシング
速度が遅くなることがあり、いずれも本発明の目的を達
成し得ない場合がある。Although the polishing speed is faster, it may become difficult to use or handle for a long time, and the pad that holds the object to be polished may wear out rapidly.If the amount exceeds 50g, the polishing speed may become slower. may not be able to achieve its objectives.
なお、硫酸アルミニウムと硝酸ニッケルとの添加割合は
適宜調整し得るが、硫酸アルミニウムの添加量を無水物
換算で重量で１とした場合、硝酸ニッケルを無水物とし
て０．４〜５、特に０．７〜２の割合で添加することが
好ましい。硝酸ニッケルの添加比が０．４より少ないと
、被研摩物の仕上り面に突起物が多くできたり、コンパ
ウンドの取扱いが不便になる場合があり、添加比が５よ
り多いとポリッシング速度が低下し、エツ°チングが発
生する場合がある。Note that the addition ratio of aluminum sulfate and nickel nitrate can be adjusted as appropriate, but when the amount of aluminum sulfate added is 1 by weight in terms of anhydride, the ratio of nickel nitrate as anhydride is 0.4 to 5, especially 0. It is preferable to add at a ratio of 7 to 2. If the addition ratio of nickel nitrate is less than 0.4, many protrusions may be formed on the finished surface of the polished object, and handling of the compound may become inconvenient.If the addition ratio is more than 5, the polishing speed may decrease. , etching may occur.
本発明に係るポリッシングコンパウンドは、弱酸性とす
ることが好ましく、特にそのｐＨを４〜５の範囲とする
ことが取扱い性の点から好適である。The polishing compound according to the present invention is preferably weakly acidic, and particularly preferably has a pH in the range of 4 to 5 from the viewpoint of ease of handling.
本発明においては、上記成分以外に使用目的等に応じて
その他の非酸化性塩や酸化性塩の１種又は２種以上を本
発明の目的に支障のない範囲内で配合することができる
。In the present invention, in addition to the above-mentioned components, one or more other non-oxidizing salts and oxidizing salts may be blended in accordance with the purpose of use, etc., within a range that does not interfere with the purpose of the present invention.
また、本発明のポリッシングコンパウンドには非研摩物
の表面に光沢を付与し、表面状態を良くするのに有効な
各種の添加剤を添加しても差支えなく、例えば必要に応
じ動物油、植物油、脂肪酸、ワックス、金属石けん等の
油脂類、界面活性剤などを添加配合することができる。In addition, various additives effective for imparting gloss to the surface of non-abrasive objects and improving the surface condition may be added to the polishing compound of the present invention, such as animal oil, vegetable oil, fatty acid, etc., if necessary. , waxes, oils and fats such as metal soaps, surfactants, etc. can be added and blended.
見皿五羞米
本発明に係るポリッシングコンパウンドは、砥粒と水と
を含有し、かつ硫酸アルミニウムと硝酸ニッケルとを併
用しているため、早いポリッシング速度を有し、しかも
長時間使用しても被研摩物の仕上り面を光沢よく平滑で
優れた状態に保つものであり、しかもコンパウンド自身
が弱酸性であるので研摩機や治具が錆び難く、作業者の
手を荒すことがほとんどなく、取扱いが容易である上。The polishing compound according to the present invention contains abrasive grains and water, and also uses aluminum sulfate and nickel nitrate, so it has a fast polishing speed and can be used for a long time. It keeps the finished surface of the object to be polished glossy, smooth, and in excellent condition, and since the compound itself is slightly acidic, the polishing machine and jig are hard to rust, and the operator's hands are hardly rough, making it easy to handle. Above is easy.
被研摩物を保持するパッドを長時間使用することができ
る。The pad that holds the object to be polished can be used for a long time.
以下、実施例と比較例を挙げて、本発明を説明するが、
本発明は下記の実施例に制限されるものではない。The present invention will be explained below with reference to Examples and Comparative Examples.
The invention is not limited to the following examples.
第１表に示す組成のポリッシングコンパウンド９種類を
作成し、下記装置及び条件を用いてポリッシングテスト
を行なった。結果を第２表に示す。Nine types of polishing compounds having the compositions shown in Table 1 were prepared, and a polishing test was conducted using the following equipment and conditions. The results are shown in Table 2.
ポリッシングテスド び
ポリッシングマシン：９Ｂ−５ＬＰ
（スピードファム社製）
バット：ポリウレタンバット
回転数：６０ｒｐｍ
面圧：１００ｇ／ａ１
コンパウンド供給量：５０ａＱ／分
ポリッシュ時間：３分
ワーク：３．５インチアルミニウム製ディスク表面に無
電解ニッケルーリンめっきを
施したちの１チヤ一ジ１０枚
ポリッシングの終了したワークについて１表面の粗さを
測定装置としてサーフコム５５０Ａ （東京精密社製）
を用いて評価した。Polishing test and polishing machine: 9B-5LP (manufactured by Speed Fam) Bat: Polyurethane Bat rotation speed: 60 rpm Surface pressure: 100 g/a1 Compound supply amount: 50 aQ/min Polishing time: 3 minutes Work: 3.5 inch aluminum Surfcom 550A (manufactured by Tokyo Seimitsu Co., Ltd.) is used as a device to measure the roughness of the surface of 10 pieces of polished workpieces with electroless nickel-phosphorus plating applied to the disk surface.
It was evaluated using
なお、ポリッシングの性能は１０回、３０回及び５０回
目のポリッシングを行なった時のワーク表面の粗さをそ
れぞれ測定することにより行ない、各ポリッシングコン
パウンドの粗さを比較した。The polishing performance was measured by measuring the roughness of the workpiece surface after the 10th, 30th, and 50th polishing, and the roughness of each polishing compound was compared.
＊’ｌ、 ＊３ 光 沢 表面状態 Ｏ非常によい 非常に良い。*’l, *3 Light, swamp, surface condition O Very good Very good.
０ 良 い 良 いΔ普通
普通
×悪い 悪い
なお、表面状態は顕ｓｗａｍで、スクラッチ。0 Good Good Δ Average
Fair x Bad Bad, the surface condition is obvious swam and scratches.
突起物、均一性（研磨目）を調べた結果である。These are the results of examining protrusions and uniformity (polishing marks).
第２表の結果から、硫酸アルミニウムや硝酸ニッケルを
配合しないポリッシングコンパウンドでワークをポリッ
シングした場合、長時間のポリッシングと共にワーク表
面の粗さが大きくなり、光沢や外観も悪くなることがわ
かる。これに対し。From the results in Table 2, it can be seen that when a workpiece is polished with a polishing compound that does not contain aluminum sulfate or nickel nitrate, the surface roughness of the workpiece increases with long-term polishing, and the gloss and appearance deteriorate. Against this.
硫酸アルミニウムと硝酸ニッケルとを配合することによ
り、ワーク表面が良好な光沢を有し、平滑な仕上り面が
得られることが知見される。It has been found that by blending aluminum sulfate and nickel nitrate, the workpiece surface has good gloss and a smooth finished surface can be obtained.
また、上記コンパウンドはニッケルーリンめっき皮膜や
ニッケルーリン−銅めっき皮膜の他に、アルマイトや樹
脂皮膜にも効果的に利用することができた。Furthermore, the above compound could be effectively used for alumite and resin coatings in addition to nickel-phosphorus plating films and nickel-phosphorus-copper plating films.
出願人 上材工業 株式会社 代理人 弁理士 小 島 隆 司Applicant Uezai Kogyo Co., Ltd. Agent: Patent Attorney Takashi Kojima
Claims (1)
おいて、硫酸アルミニウムと硝酸ニッケルとを配合して
なることを特徴とするポリッシングコンパウンド。1. A polishing compound containing abrasive grains and water, which is characterized by containing aluminum sulfate and nickel nitrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63073546A JPH01246069A (en) | 1988-03-28 | 1988-03-28 | Polishing compound |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63073546A JPH01246069A (en) | 1988-03-28 | 1988-03-28 | Polishing compound |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01246069A true JPH01246069A (en) | 1989-10-02 |
Family
ID=13521341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63073546A Pending JPH01246069A (en) | 1988-03-28 | 1988-03-28 | Polishing compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01246069A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001047358A (en) * | 1999-05-28 | 2001-02-20 | Nissan Chem Ind Ltd | Composition for polishing |
-
1988
- 1988-03-28 JP JP63073546A patent/JPH01246069A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001047358A (en) * | 1999-05-28 | 2001-02-20 | Nissan Chem Ind Ltd | Composition for polishing |
| JP4557105B2 (en) * | 1999-05-28 | 2010-10-06 | 日産化学工業株式会社 | Polishing composition |
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