JPH01243024A - Liquid crystal oriented film formed by using patterned high-polymer film and production thereof - Google Patents

Liquid crystal oriented film formed by using patterned high-polymer film and production thereof

Info

Publication number
JPH01243024A
JPH01243024A JP7119688A JP7119688A JPH01243024A JP H01243024 A JPH01243024 A JP H01243024A JP 7119688 A JP7119688 A JP 7119688A JP 7119688 A JP7119688 A JP 7119688A JP H01243024 A JPH01243024 A JP H01243024A
Authority
JP
Japan
Prior art keywords
film
liquid crystal
alignment film
rays
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7119688A
Other languages
Japanese (ja)
Inventor
Masakazu Kamikita
正和 上北
Hiroshi Awaji
弘 淡路
Makoto Murata
誠 村田
Satoshi Mizunuma
聡 水沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP7119688A priority Critical patent/JPH01243024A/en
Publication of JPH01243024A publication Critical patent/JPH01243024A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the flawing on the surface of an oriented film and the exfoliation of the film, the failure of driving electrodes and the resultant defective orientation and the quality degradation of a display element by forming grooved patterns on the surface of the oriented film by utilizing a lithographic technique. CONSTITUTION:After a coated film consisting of a photosensitive high polymer is formed on a substrate 1 on which an electrode layer 2 is formed, the film is irradiated with UV rays and X rays through a mask having the parallel stripe patterns; thereafter, the film is irradiated with finely stopped-down electron rays. The film is then developed and is in some cases subjected further to a ring closure treatment. The liquid crystal oriented film 3 consisting of the high-polymer compd. having the fine and parallel groove-like patterns 4 is thus produced. The flawing of the surface of the oriented film 3 and the exfoliation of the film at the time of the rubbing as well as the failure of the driving electrode and the resulted defective orientation and the quantity degradation of the display element are thereby prevented.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、液晶表示素子の構成要素である液晶配向膜お
よびその製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a liquid crystal alignment film that is a component of a liquid crystal display element and a method for manufacturing the same.

[従来技術および発明が解決しようとする課題]電界の
作用により駆動する液晶表示素子においては、液晶分子
をきれいに並べて美しい表示をするため、またはガラス
基板上の電極と液晶分子が直接接触して発生する劣化を
防ぐため、電極のついた基板上に液晶配向膜を設けてい
る。
[Prior art and problems to be solved by the invention] In liquid crystal display elements driven by the action of an electric field, liquid crystal molecules are arranged neatly to display beautiful images, or when electrodes on a glass substrate come into direct contact with liquid crystal molecules. In order to prevent this deterioration, a liquid crystal alignment film is provided on the substrate with electrodes.

液晶配向膜の形成方法としては、従来から行なわれてい
るラビング法がある。この方法は、電極上に塗布された
配向膜を織布などで一定方向にこすり表面に溝をつける
という単純な方法であり、その低コストとそれからえら
れる物性のために広く採用されている。ところが、この
方法では配向膜表面の広い面積に渡って均一に微細で平
行な溝を形成することは困難である。
As a method for forming a liquid crystal alignment film, there is a conventional rubbing method. This method is a simple method in which an alignment film coated on an electrode is rubbed in a fixed direction with a cloth or the like to form grooves on the surface, and is widely used because of its low cost and the physical properties obtained from it. However, with this method, it is difficult to uniformly form fine, parallel grooves over a wide area of the surface of the alignment film.

大面積と画素数の増加が望まれるようになると表示の均
一性が不充分であったり、ラビング時の配向膜表面の傷
、駆動電極の破損により配向不良や品質低下、はこりに
よる欠陥などが重要な問題になってきている。
As larger areas and increased numbers of pixels are desired, display uniformity may be insufficient, and defects such as poor alignment and quality deterioration due to scratches on the surface of the alignment film during rubbing and damage to drive electrodes, and defects due to flaking may occur. This is becoming an important issue.

一方、ラビングを行なわずに液晶を配向させる方法とし
ては斜蒸着法があるが、大面積化とコスト高の問題があ
る。そこでラビングせずに良好な配向かえられる方法が
求められていた。
On the other hand, there is an oblique vapor deposition method as a method for aligning liquid crystal without rubbing, but this method has problems of increasing the area and increasing cost. Therefore, there has been a need for a method that can change the orientation favorably without rubbing.

ラビング法に代る溝の形成方法として最近、次のような
技術が新しく提案された。ひとつは高分子被膜を逆スパ
ツタリング処理し、微細な凹凸を形成する方法(特開昭
(i2−215925号公報)である。しかし、この方
法では凹凸の大きさ、形状、密度を精密に制御すること
はできない。
Recently, the following new technique has been proposed as a method for forming grooves in place of the rubbing method. One method is to reverse sputter a polymer film to form fine irregularities (Japanese Unexamined Patent Publication No. I2-215925). However, this method requires precise control of the size, shape, and density of the irregularities. It is not possible.

もうひとつは配向膜表面に分子オーダーの凹凸を形成す
る方法(特開昭62−215926号、特開昭[12−
215927号公報)であるか、これらの公報にはその
凹凸の形成方法がなんら記載されていない。
The other method is to form molecular-order irregularities on the surface of the alignment film (JP-A-62-215926, JP-A-Sho [12-
No. 215927), but these publications do not describe any method for forming the unevenness.

[課題を解決するための手段] そこで本発明者らは、リソグラフィー技術を利用し、配
向膜表面に溝状のパターンを形成することにより前記問
題点を解決した。即ち、少なくとも電極層を形成した基
板上に感光性高分子のゆ布膜を形成したのち、微細な平
行縞状のパターンをもつマスクを通して紫外線、X線を
照射したのち、または細く絞った電子線を照射したのち
現像、ばあいによってはさらに閉環処理をすることによ
り、微細で平行な溝状のパターンをもつ高分子化合物の
液晶配向膜が作製できることを見出し、実用的な液晶配
向膜を完成するに至った。
[Means for Solving the Problems] Therefore, the present inventors solved the above problems by forming a groove-like pattern on the surface of the alignment film using lithography technology. That is, after forming a photosensitive polymer film on a substrate on which at least an electrode layer is formed, ultraviolet rays or X-rays are irradiated through a mask with a pattern of fine parallel stripes, or a narrow electron beam is irradiated. He discovered that it was possible to create a liquid crystal alignment film of a polymer compound with a fine, parallel groove-like pattern by irradiating it, developing it, and in some cases further ring-closing treatment, and completed a practical liquid crystal alignment film. reached.

本発明で使用する高分子化合物は、光、電子線またはX
線で架橋または分解する感光性を有しているものであれ
ばとくに限定はされない。
The polymer compound used in the present invention can be exposed to light, electron beams or X-rays.
There are no particular limitations on the material as long as it has photosensitivity to be crosslinked or decomposed by radiation.

その望ましい一般例としては少なくとも2個の炭素原子
を有する少なくとも2価の第1の遊離基R1と、少なく
とも2個の炭素原子を有する少なくとも2価の第2の遊
離基R2とが2価の結合基によって交互に連結されてい
る線状の繰りかえし単位を有し、かつ共有結合によって
同じ繰りかえし単位へ結合した置換基を含むこともある
炭素数1〜42の炭化水素含有基または水素原子である
R3を少なくとも1つ、好ましくは2つ含む高分子化合
物である。また、炭化水素含有基はイオン結合で付与さ
れてもよい。イオン結合で炭化水素含有基を付与された
高分子化合物は、少なくとも2個の炭素原子を有する少
なくとも3価の第1の遊離基R1と、少なくとも2個の
炭素原子を存する少なくとも2価の第2の遊離基R2と
が2価の結合基によって交互に連結されている線状の繰
返し単位を有し、かつイオン結合によって同じ繰返し単
位へ結合した、置換基を含むこともある炭素数1〜42
の炭化水素含有基または水素原子R3を少な(とも1つ
含んでいる高分子化合物である。
As a desirable general example, an at least divalent first radical R1 having at least two carbon atoms and an at least divalent second radical R2 having at least two carbon atoms form a divalent bond. R3 is a hydrocarbon-containing group or a hydrogen atom having from 1 to 42 carbon atoms, which has linear repeating units alternately connected by groups and may contain substituents bonded to the same repeating unit by covalent bonds; It is a polymer compound containing at least one, preferably two. Further, the hydrocarbon-containing group may be attached through an ionic bond. The polymer compound imparted with a hydrocarbon-containing group by ionic bonding comprises at least a trivalent first radical R1 having at least two carbon atoms and an at least divalent second radical R1 having at least two carbon atoms. having linear repeating units in which the free radicals R2 of R2 are alternately connected by divalent bonding groups, and bonded to the same repeating unit by ionic bonding, and having a carbon number of 1 to 42 and may contain substituents.
It is a polymer compound containing at least one hydrocarbon-containing group or hydrogen atom R3.

以上の高分子化合物の中で第1および第2の遊離基R1
およびR2の一方または両方が少なくとも6個の炭素を
有するベンゼノイド構造の基であるときには、えられる
薄膜の耐熱性のすぐれたものかえられるのみならず、ベ
ンゼノイド構造の紫外部の吸収帯は紫外部の光が薄膜に
効率的に吸収されるのを助けると思われる。
In the above polymer compounds, the first and second free radicals R1
When one or both of R2 and R2 is a benzenoid structure group having at least 6 carbons, not only the resulting thin film has excellent heat resistance, but also the ultraviolet absorption band of the benzenoid structure It is believed to help light be absorbed efficiently into the thin film.

さらに高分子化合物が5員環または6員環を生成する前
駆体構造を備えていると、反応させて、5員環または6
員環をもつ耐熱性の構造へ変換できるので望ましい。
Furthermore, if the polymer compound has a precursor structure that produces a 5-membered ring or 6-membered ring, it can be reacted to produce a 5-membered ring or a 6-membered ring.
This is desirable because it can be converted into a heat-resistant structure with a membered ring.

本発明に用いる高分子化合物の望ましい具体例をあげる
と以下のとおりである。
Preferred specific examples of the polymer compound used in the present invention are as follows.

[以下余白〕 (6)式中、R6は、 −0+、   −co −、−s +、   −5Oz
 +。
[Margins below] In formula (6), R6 is -0+, -co -, -s +, -5Oz
+.

R7:アルキルまたはアリール基などである。R7: Alkyl or aryl group.

(1)〜■で、R3は水素原子または炭素数1〜42の
炭化水素含有基であり、好ましいものとして脂肪族、環
状脂肪族と脂肪族、芳香族と脂肪族の結合した基、それ
らの置換体から選ばれた1価の基があげられ、それらの
具体例としてはまた、R3が2量化または重合可能な不
飽和結合を含むばあいの具体例としてはたとえば、CH
z、=CHCCHzブ。
In (1) to ■, R3 is a hydrogen atom or a hydrocarbon-containing group having 1 to 42 carbon atoms, and preferable examples include aliphatic, cycloaliphatic and aliphatic, aromatic and aliphatic bonded groups, and groups thereof. Examples include monovalent groups selected from the substituents, and specific examples thereof include, for example, CH when R3 contains an unsaturated bond that can be dimerized or polymerized.
z,=CHCCHzbu.

CH3(CHz)IC=C−C=C(CHzr「。CH3(CHz)IC=C-C=C(CHzr".

(l+m+1−p) CH3 CHz=C−C−0(CHz)p−。(l+m+1-p) CH3 CHz=C-C-0(CHz)p-.

CHz ” CHCFIzOC(GHz)p −(pは
10〜30)などがあげられる。
CHz"CHCFIzOC(GHz)p-(p is 10 to 30).

重合性不飽和結合を含むR3の具体例の多くの例が示す
ように、重合性不飽和結合をもつ1価の基が、−0−、
−COO−、−NIICO−1−CO−1−S−1−C
3S−、−NHO2−5−C8−などで−(C)12)
n−に置換され誘導体となった基も本発明の望ましい実
施態様である。
As shown in many specific examples of R3 containing a polymerizable unsaturated bond, the monovalent group having a polymerizable unsaturated bond is -0-,
-COO-, -NIICO-1-CO-1-S-1-C
-(C)12) with 3S-, -NHO2-5-C8-, etc.
A derivative group substituted with n- is also a preferred embodiment of the present invention.

これらに対する置換基としてはハロゲン原子、ニトロ基
、アミノ基、シアノ基、メトキシ基、アセトキシ基など
があるが必須ではない。
Substituents for these include a halogen atom, nitro group, amino group, cyano group, methoxy group, acetoxy group, etc., but are not essential.

本発明の高分子化合物の分子量についてはとくに限定は
ない。しかし分子量が低くても、本発明の製膜方法によ
って製膜は可能であるが、良好な耐熱性、機械的強度、
耐薬品性をうろことはできない。また一方分子量が大き
すぎると、粘度が高すぎて製膜がうまくいかない。従っ
て、数平均分子量は2,000〜300.000程度で
、好ましくは10,000〜150.000程度である
There is no particular limitation on the molecular weight of the polymer compound of the present invention. However, even if the molecular weight is low, it is possible to form a film by the film forming method of the present invention, but it has good heat resistance, mechanical strength,
Chemical resistance cannot be underestimated. On the other hand, if the molecular weight is too large, the viscosity will be too high and film formation will not be successful. Therefore, the number average molecular weight is about 2,000 to 300,000, preferably about 10,000 to 150,000.

また、イオン結合により炭化水素含有基を導入した高分
子化合物の実用的な具体例をあげると以下のとおりであ
る。
Practical specific examples of polymer compounds into which hydrocarbon-containing groups are introduced through ionic bonding are as follows.

[以下余白] ((23)式中、R6は(6)式の定義に同じ〕(3)
〜(34)式中、−は異性を表す。
[Left below] (In formula (23), R6 is the same as the definition in formula (6))] (3)
~(34) In the formula, - represents isomerism.

例えば、下式(3)で説明すれば、 および を表わす。For example, if explained using the formula (3) below, and represents.

本発明は(3−1)または(3−2)が単独であるばあ
い、(3−1)と(3−2)が共存するばあいを含んで
いる。(2υ〜(34)のR3、R4、R5の少なくと
も一つは(1)〜■のR3の定義とその例に同じであり
、他は置換基を有することもある炭素数1〜42の炭化
水素含有基または水素原子であり、好ましくは炭素数1
〜4の炭化水素含有基または水素原子である。
The present invention includes cases in which (3-1) or (3-2) is used alone, and cases in which (3-1) and (3-2) coexist. (At least one of R3, R4, and R5 in 2υ~(34) is the same as the definition and example of R3 in (1)~■, and the others are carbon atoms with 1 to 42 carbon atoms that may have substituents. A hydrogen-containing group or a hydrogen atom, preferably having 1 carbon atom
~4 hydrocarbon-containing groups or hydrogen atoms.

高分子化合物としては前記のものを使うことができるが
、市販の感光性高分子溶液を用いるほうがより簡便であ
る。たとえば、感光性ポリイミドのばあいにはバイラリ
ン(デュポンジャパンリミテッド社製)、フォトニース
(■東し製)、セレクティラックス(メルク社製)など
を用いることができる。
Although the aforementioned polymer compounds can be used, it is easier to use a commercially available photosensitive polymer solution. For example, in the case of photosensitive polyimide, Bilarin (manufactured by DuPont Japan Limited), Photonice (manufactured by Toshi), Selectilux (manufactured by Merck & Co., Ltd.), etc. can be used.

次に、パターン化の方法について説明する。Next, a method of patterning will be explained.

まず基板上に高分子化合物の塗布膜を作製する。膜厚と
しては通常0.1〜5遍が好ましい。
First, a coating film of a polymer compound is prepared on a substrate. The film thickness is usually preferably 0.1 to 5 times.

塗布法としてはスピンコード、キャスト、デイツプ法な
どが採用される。ついでこの塗布膜にマスクを通して紫
外線、X線などを照射するか、電子線を照射して描画す
る。とくに紫外線が望ましく、さらにKrFなどのエキ
シマ−レーザー光を使うことは高解像度のパターンをう
ろことができ、露光時間を短縮することもできるので望
ましい。
As the application method, spin cord, cast, dip method, etc. are adopted. Next, this coating film is irradiated with ultraviolet rays, X-rays, etc. through a mask, or is irradiated with an electron beam for drawing. In particular, ultraviolet light is desirable, and it is further desirable to use excimer laser light such as KrF because it allows a high-resolution pattern to be scanned and the exposure time can be shortened.

たとえばポジマスクを通して紫外線を露光したのち、露
光部を現像剤で溶解除去することによってパターンをう
ることができる。
For example, a pattern can be obtained by exposing to ultraviolet light through a positive mask and then dissolving and removing the exposed areas with a developer.

このばあいSJ、 Kosar rLlght Sen
sltlveSystems J  (John Wi
ley & 5ons、 Inc、 NewYork、
 1985)の9.143〜148.180〜188に
記載されている増感剤を用いることが好ましいばあいが
ある。たとえばミヒラケトン、ベンゾイルエーテル、2
−1−ブチル−9,10−アントラキノン、1.2−ベ
ンゾ−9,10−アントラキノン、4,4゛−ビス(ジ
エチルアミノ)ベンゾフェノンなどがある。
In this case SJ, Kosar rLight Sen
sltlveSystems J (John Wi
ley & 5ons, Inc., New York,
In some cases, it is preferable to use the sensitizers described in 1985), 9.143-148.180-188. For example, mihiraketone, benzoyl ether, 2
Examples include -1-butyl-9,10-anthraquinone, 1,2-benzo-9,10-anthraquinone, and 4,4'-bis(diethylamino)benzophenone.

現像剤は、ジメチルアセトアミド、ジメチルホルムアミ
ド、ジメチルスルホキシド、ヘキサメチルホスホルアミ
ド、N−メチルピロリドンなどと、メタノール、エタノ
ールなどとの混合溶剤系が好ましい。また、アンモニア
水やアルカリ性溶液も使用可能なばあいがある。
The developer is preferably a mixed solvent system of dimethylacetamide, dimethylformamide, dimethylsulfoxide, hexamethylphosphoramide, N-methylpyrrolidone, etc., and methanol, ethanol, etc. In some cases, ammonia water and alkaline solutions can also be used.

かくしてえられる本発明の液晶配向膜(3)は、たとえ
ば第1〜2図に示すように、ガラス基板(1)に形成さ
れた透明電極(2)上に溝状のパターンを有するように
形成されている。第1図に示す実施態様は電極(2)面
まで溝(4)が形成されているものであるが、第2図に
示すように配向膜(3)の底部に一部高分子膜を残すよ
うに設計してもよい。
The thus obtained liquid crystal alignment film (3) of the present invention is formed so as to have a groove-like pattern on a transparent electrode (2) formed on a glass substrate (1), as shown in FIGS. 1 and 2, for example. has been done. In the embodiment shown in Fig. 1, the groove (4) is formed up to the electrode (2) surface, but as shown in Fig. 2, a portion of the polymer film is left at the bottom of the alignment film (3). It may be designed as such.

溝の深さ(ω、溝の福山)および溝の間隔、すなわちラ
イン幅(C)はいずれも10〜3000nm、生産性の
点から好ましくは50〜1000nfflの範囲に入る
のが好ましい。なおそれらの関係は必ずしも等しくなく
てもよく、用途、液晶型式、液晶材料などによって適宜
選定すればよい。
The depth of the groove (ω, Fukuyama of the groove) and the interval between the grooves, that is, the line width (C) are both preferably in the range of 10 to 3000 nm, preferably in the range of 50 to 1000 nffl from the viewpoint of productivity. Note that these relationships do not necessarily have to be equal, and may be appropriately selected depending on the application, liquid crystal type, liquid crystal material, etc.

溝の深さ(ωは照射時のエネルギーによって調節するこ
とができ、溝の幅(b>とライン幅(C)、いわゆるラ
インアンドスペースのサイズは紫外線およびX線露光の
ばあいはマスクのラインアンドスペースのサイズにより
、電子線露光のばあいは電子線の線幅と描画の間隔によ
り調節できる。
The depth of the groove (ω can be adjusted by the energy during irradiation, the width of the groove (b>) and the line width (C), the so-called line and space size, can be adjusted by the line of the mask in the case of ultraviolet and X-ray exposure. In the case of electron beam exposure, the size of the space can be adjusted by adjusting the line width of the electron beam and the drawing interval.

さらに、これらの方法によってえられた本発明の高分子
化合物のパターンは、該高分子化合物が5員環または6
員環を生成する前駆体構造を備えているばあいには、パ
ターンをえたのち反応させて5員環または6員環の構造
へと変換して、耐熱性高分子薄膜のパターンを形成する
ことができ、分子構造の選択によって300℃以上、好
ましくは500℃以上の耐熱性を実現することができる
。(1)〜(34)の例のうち、(3)〜四、および(
2Il〜(30)かへテロ原子を含む5員環または6H
環へ部分的に、または完全に閉環させることができる例
であり、完全閉環後の構造は次のようになる。
Furthermore, the pattern of the polymer compound of the present invention obtained by these methods shows that the polymer compound has a 5-membered ring or a 6-membered ring.
When a precursor structure that generates a membered ring is provided, a pattern is obtained and then reacted to convert it into a 5- or 6-membered ring structure to form a pattern of a heat-resistant polymer thin film. By selecting the molecular structure, heat resistance of 300°C or higher, preferably 500°C or higher can be achieved. Among the examples (1) to (34), (3) to 4, and (
2Il~(30) or a 5-membered ring containing a heteroatom or 6H
This is an example in which the ring can be partially or completely closed, and the structure after complete ring closure is as follows.

閉環の方法についてはとくに限定されないが、たとえば
先の(5)式の具体例であるイミド化のばあいには30
0〜400℃近辺の温度に加熱することによって(5)
式の高分子化合物 (5)” + 2 R3011 の反応が起って閉環が達成される。このとき、エステル
化のために導入した基がアルコールとして脱離するが、
この脱離したアルコールは200’〜400℃近辺の温
度で必要ならガスの流れの下に置くか、真空下に置くこ
とによって飛散させることができるので非常に耐熱性の
よいポリイミド薄膜をうろことができる。
The ring closing method is not particularly limited, but for example, in the case of imidization, which is a specific example of the above formula (5), 30
By heating to a temperature around 0-400℃ (5)
The reaction of the polymer compound (5)" + 2 R3011 of the formula occurs and ring closure is achieved. At this time, the group introduced for esterification is eliminated as an alcohol,
This desorbed alcohol can be dispersed by placing it under a gas flow or under a vacuum at a temperature of around 200' to 400°C, so it cannot pass through the extremely heat-resistant polyimide thin film. can.

勿論、一般的なイミド化の際に使用される無水酢酸やピ
リジン、イソキノリンのような化学キュア剤、またはそ
れと熱を併用してもよい。
Of course, a chemical curing agent such as acetic anhydride, pyridine, or isoquinoline used in general imidization, or heat may be used in combination with the curing agent.

液晶素子は、このように作製した液晶配向膜を形成した
2枚のガラス基板の高分子膜面同志を対向させた状態に
保持して一部を残して接着し、このように接着したセル
に、この開口部から強誘電性液晶を注入したのち、開口
部を封止することによりえられる。
The liquid crystal element is produced by holding the polymer film surfaces of two glass substrates on which the liquid crystal alignment films prepared in this way are facing each other and bonding them with a portion left, and then attaching them to the cell bonded in this way. , is obtained by injecting ferroelectric liquid crystal through this opening and then sealing the opening.

つぎに実施例をあげて本発明の液晶配向膜を説明するが
、本発明はかかる実施例のみに限定されるものではない
Next, the liquid crystal alignment film of the present invention will be explained with reference to Examples, but the present invention is not limited to these Examples.

実施例 フエトニース3100 (■東し製の感光性樹脂)をネ
サパターンを形成したガラス基板上にスピンコーターを
用いて塗布しく 3000回転で30秒間)、膜厚1.
3虜とする。次に、クリーンオーブンを用いて80℃で
60分間プリベークする。この前駆体の薄膜を1虜のラ
インアンドスペースを持つフォトマスクを通して超高圧
水銀灯(10Ilv/C112)テ3秒間露光する。
EXAMPLE Coat Fetnis 3100 (photosensitive resin manufactured by Toshi Co., Ltd.) using a spin coater on a glass substrate on which a Nesa pattern has been formed (3000 rpm for 30 seconds), and the film thickness is 1.
Take three prisoners. Next, prebaking is performed at 80° C. for 60 minutes using a clean oven. This thin film of the precursor was exposed to light for 3 seconds using an ultra-high pressure mercury lamp (10Ilv/C112) through a photomask with lines and spaces.

次いで、専用現像液DV−140(−東し製)を用いて
超音波現像しく35秒間、25°C)、インプロパツー
ルを用いて超音波リンスをする(15秒間、25℃)。
Next, ultrasonic development is performed using a special developer DV-140 (manufactured by Toshi Co., Ltd.) for 35 seconds at 25°C), and ultrasonic rinsing is performed using an inproper tool (for 15 seconds at 25°C).

最後に、窒素雰囲気中で熱キユアしイミド化する(18
0℃30分間+ 300℃30分間+ 400’030
分間)。
Finally, imidization is carried out by heat curing in a nitrogen atmosphere (18
0℃ 30 minutes + 300℃ 30 minutes + 400'030
minutes).

えられた配向膜の溝状パターンの溝の深さは550na
+、溝の幅は11000n、ライン幅は11000nで
ある。
The groove depth of the groove-like pattern of the obtained alignment film is 550 na.
+, the groove width is 11000n, and the line width is 11000n.

このように作製した液晶配向膜を形成した2枚のガラス
基板のポリイミド膜面同志を対向させた状態に保持して
、一部を残して接着する。
The polyimide film surfaces of the two glass substrates on which the liquid crystal alignment films produced in this way were formed are held in a state where they are opposed to each other, and are bonded to each other, leaving only a portion.

このように接着したセルに、この開口部から強誘電性液
晶(メルク社製、ZL13489)を注入したのち、開
口部を封止して液晶素子を作製する。
A ferroelectric liquid crystal (manufactured by Merck & Co., Ltd., ZL13489) is injected into the thus bonded cell through the opening, and then the opening is sealed to produce a liquid crystal element.

このセルを用いて液晶の配向性を評佑したところ配向む
らのない良好な配向性を示した。
When this cell was used to evaluate the alignment of the liquid crystal, it showed good alignment with no alignment unevenness.

液晶として強誘電性液晶を用いたが、必ずしもこれに限
定されるものではなく、ツィステッドネマチック型およ
びスーパーツィステッドネマチック型でもよい。
Although ferroelectric liquid crystal is used as the liquid crystal, it is not necessarily limited to this, and twisted nematic type and super twisted nematic type may also be used.

[発明の効果コ この発明は以上説明したように、感光性高分子化合物の
塗布膜に紫外線、電子線、またはX線を照射して露光し
、現像、ばあいによっては閉環することで作製したパタ
ーン化された高分子膜を液晶配向膜に応用することで、
従来のラビング法で生じていた配向膜表面の傷や膜のは
がれ、駆動電極の破損とそれによる配向不良や表示素子
の品質低下を防ぐことが可能であり、良好な配向性と高
い耐熱性を有する液晶配向膜を作製することが可能であ
る。
[Effects of the Invention] As explained above, this invention is made by exposing a coated film of a photosensitive polymer compound to ultraviolet rays, electron beams, or X-rays, developing it, and subjecting it to ring closure in some cases. By applying a patterned polymer film to a liquid crystal alignment film,
It is possible to prevent scratches on the surface of the alignment film, peeling of the film, damage to the drive electrodes, and resulting poor alignment and deterioration in the quality of display elements that occur with conventional rubbing methods, and provides good alignment and high heat resistance. It is possible to produce a liquid crystal alignment film having the following properties.

【図面の簡単な説明】[Brief explanation of the drawing]

第1〜2図はいずれも本発明の液晶配向膜を基板上に設
けたときの概略斜視図である。 (図面の主要符号) (1)ニガラス基板 (21=透明電極 (3):配向膜 (4):溝 (a):溝の深さ 山):溝の幅 (C)ニライン幅 特許出願人  鐘淵化学工業株式会社
1 and 2 are schematic perspective views of the liquid crystal aligning film of the present invention provided on a substrate. (Main symbols in the drawings) (1) Ni glass substrate (21 = transparent electrode (3): alignment film (4): groove (a): groove depth peak): groove width (C) Ni line width Patent applicant Kane Fuchi Chemical Industry Co., Ltd.

Claims (1)

【特許請求の範囲】 1 少なくとも電極層が形成された基板上に形成されて
いる平行な溝状のパターンをもつ高分子膜である液晶配
向膜。 2 溝状のパターンの溝の垂直方向の深さが10nm〜
3000nm、好ましくは50nm〜1000nmとな
っていることを特徴とする請求項1記載の液晶配向膜。 3 溝状のパターンの溝の水平方向の幅が10nm〜3
000nm、好ましくは50nm〜1000nmとなっ
ていることを特徴とする請求項1記載の液晶配向膜。 4 溝状のパターンの溝の間隔が10nm〜3000n
m、好ましくは50nm〜1000nmとなっているこ
とを特徴とする請求項1記載の液晶配向膜。 5 感光性高分子化合物の塗布膜に紫外線、電子線、ま
たはX線を照射したのち、現像、ばあいよっては閉環処
理をしてえられた請求項1、請求項2、請求項3または
請求項4記載の液晶配向膜の製造法。
[Claims] 1. A liquid crystal alignment film which is a polymer film having a pattern of parallel grooves formed on a substrate on which at least an electrode layer is formed. 2 The vertical depth of the grooves in the groove-like pattern is 10 nm ~
The liquid crystal aligning film according to claim 1, characterized in that the thickness is 3000 nm, preferably 50 nm to 1000 nm. 3 The horizontal width of the grooves in the groove-like pattern is 10 nm to 3
2. The liquid crystal aligning film according to claim 1, wherein the liquid crystal alignment film has a thickness of 000 nm, preferably 50 nm to 1000 nm. 4 The interval between the grooves of the groove-like pattern is 10nm to 3000n
2. The liquid crystal alignment film according to claim 1, wherein the liquid crystal alignment film has a thickness of 50 nm to 1000 nm. 5. Claim 1, Claim 2, Claim 3, or Claim obtained by irradiating a coating film of a photosensitive polymer compound with ultraviolet rays, electron beams, or X-rays, and then subjecting it to development or ring-closing treatment. Item 4. The method for producing a liquid crystal alignment film according to item 4.
JP7119688A 1988-03-24 1988-03-24 Liquid crystal oriented film formed by using patterned high-polymer film and production thereof Pending JPH01243024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7119688A JPH01243024A (en) 1988-03-24 1988-03-24 Liquid crystal oriented film formed by using patterned high-polymer film and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7119688A JPH01243024A (en) 1988-03-24 1988-03-24 Liquid crystal oriented film formed by using patterned high-polymer film and production thereof

Publications (1)

Publication Number Publication Date
JPH01243024A true JPH01243024A (en) 1989-09-27

Family

ID=13453673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7119688A Pending JPH01243024A (en) 1988-03-24 1988-03-24 Liquid crystal oriented film formed by using patterned high-polymer film and production thereof

Country Status (1)

Country Link
JP (1) JPH01243024A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587822A (en) * 1994-01-28 1996-12-24 Samsung Electronics Co., Ltd. Liquid crystal orientation control layer method and apparatus for manufacturing the same and mask for use in the manufacturing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5587822A (en) * 1994-01-28 1996-12-24 Samsung Electronics Co., Ltd. Liquid crystal orientation control layer method and apparatus for manufacturing the same and mask for use in the manufacturing

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