JPH01239029A - Plunger for glass forming - Google Patents
Plunger for glass formingInfo
- Publication number
- JPH01239029A JPH01239029A JP6403788A JP6403788A JPH01239029A JP H01239029 A JPH01239029 A JP H01239029A JP 6403788 A JP6403788 A JP 6403788A JP 6403788 A JP6403788 A JP 6403788A JP H01239029 A JPH01239029 A JP H01239029A
- Authority
- JP
- Japan
- Prior art keywords
- plunger
- coating layer
- glass
- ceramic coating
- vapor deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007496 glass forming Methods 0.000 title description 3
- 239000011247 coating layer Substances 0.000 claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 18
- 238000005524 ceramic coating Methods 0.000 claims abstract description 13
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 8
- 230000003746 surface roughness Effects 0.000 claims abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 6
- 239000011521 glass Substances 0.000 claims description 36
- 238000000465 moulding Methods 0.000 claims description 11
- 229910000831 Steel Inorganic materials 0.000 abstract description 3
- 238000010894 electron beam technology Methods 0.000 abstract description 3
- 239000010959 steel Substances 0.000 abstract description 3
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 abstract description 2
- 229910033181 TiB2 Inorganic materials 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 238000007733 ion plating Methods 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 239000012495 reaction gas Substances 0.000 abstract description 2
- 239000011159 matrix material Substances 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- -1 TiCN Chemical compound 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000002844 melting Methods 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 150000003609 titanium compounds Chemical class 0.000 description 6
- 239000000356 contaminant Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007751 thermal spraying Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910001018 Cast iron Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B9/00—Blowing glass; Production of hollow glass articles
- C03B9/30—Details of blowing glass; Use of materials for the moulds
- C03B9/48—Use of materials for the moulds
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、衝撃強度の大きいガラス壜を成形するのに好
適なガラス成形用プランジャに関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a glass molding plunger suitable for molding glass bottles with high impact strength.
（従来の技術）
ガラス成形用プランジャは一般に鋳鉄、耐熱鋼等を母材
とし、この外表面にＮｉ系、Ｃｒ系の自溶性合金を杓０
．５ｍｍ程度肉盛り溶射して製作されており、これによ
ってプランジャ外表面が１０００℃を超す高温のガラス
と接触した際に耐摩耗性、耐熱性、耐酸化性等を発揮す
るよう改良が加えられていた。しかしＮｉ系、Ｃｒ系の
自溶性合金は耐酸化性が余り優れていないため、これら
の酸化スケールがプランジャから剥離してガラス壜内表
面に付着し場内表面を汚染することがあった。(Prior art) Plungers for glass forming generally use cast iron, heat-resistant steel, etc. as a base material, and the outer surface of the plunger is coated with Ni-based and Cr-based self-fusing alloys.
．． It is manufactured by thermal spraying with a thickness of about 5 mm, and has been improved so that it exhibits wear resistance, heat resistance, oxidation resistance, etc. when the outer surface of the plunger comes into contact with glass at a temperature exceeding 1000℃. Ta. However, since Ni-based and Cr-based self-fluxing alloys do not have very good oxidation resistance, these oxide scales sometimes peel off from the plunger and adhere to the inner surface of the glass bottle, contaminating the inner surface of the glass bottle.
又Ｎｉ系、Ｃｒ系の自溶性合金は溶射によってプランジ
ャ表面にコーティングされているために、ピンホールの
発生が避けられず高温のガラスと接触した場合に摩耗、
酸化等が促進されるばかりでなく、使用中にピンホール
内に汚れがたまりやすくこれらが場内表面を汚染してい
た。そして、前記の場内表面に付着した種々の汚染物が
結果的にはガラス壜の衝撃強度を低下させる原因となっ
ていた。In addition, since Ni-based and Cr-based self-fluxing alloys are coated on the plunger surface by thermal spraying, pinholes are unavoidable, causing wear and tear when they come into contact with high-temperature glass.
Not only was oxidation accelerated, but dirt also tended to accumulate in the pinholes during use, contaminating the surfaces inside the plant. The various contaminants adhering to the surfaces of the glass bottles eventually caused a decrease in the impact strength of the glass bottles.
従って、衝撃強度の大きいガラス壜を成形するのに好適
なガラス成形用プランジャの開発が強く求められていた
。Therefore, there has been a strong demand for the development of a plunger for glass molding suitable for molding glass bottles with high impact strength.
（発明が解決しようとする課題）
本発明は上記のような従来の問題点を解決して、高温の
ガラスと接触しても酸化、摩耗による酸化スケールの発
生を防止し、更にはピンホールによる汚染物の発生を防
止して、ガラス内表面への汚染物の付着をなくすことに
よりガラス環の衝撃強度を著しく向上させることができ
るガラス成形用プランジャを目的として完成されたもの
である。(Problems to be Solved by the Invention) The present invention solves the conventional problems as described above, prevents the formation of oxide scale due to oxidation and wear even when it comes into contact with high-temperature glass, and furthermore prevents the formation of oxide scale due to pinholes. It was completed with the aim of creating a plunger for glass forming that can significantly improve the impact strength of the glass ring by preventing the generation of contaminants and eliminating the adhesion of contaminants to the inner surface of the glass.
（課題を解決するための手段〉
本発明は、表面粗さが１．０μｍ以下であるプランジャ
母材表面に、化学蒸着法又は物理蒸着法によるＴｉＮ
、％ＴｉＣＸＴ１ＣＮ、ＴｉＢ２、ＳｉＣ等のセラミッ
クコーティング層を表面に露出させて形成したことを特
徴とするものである。(Means for Solving the Problems) The present invention provides TiN coating by chemical vapor deposition or physical vapor deposition on the surface of a plunger base material having a surface roughness of 1.0 μm or less.
, %TiCXT1CN, TiB2, SiC, etc., is formed by exposing it to the surface.
本発明において用いられるプランジャ母材としては、Ｃ
含有率が０．３〜１．０％の鋼材が好ましく、その代表
的なものとしては５ＫＤ−１１、ＭＨ−８５、ＨＰＭ−
３８等を挙げることができる。Ｔ ｉＣＮ Ｔ ｉ Ｃ
Ｎ 、、Ｓ Ｉ Ｃ中のＣ成分は鋼材に由来するもので
あるので、含有率が０．３％未満ではＴ ｉ Ｃ、Ｔ
ｉ ＣＮ 、 Ｓ ｉ Ｃ等の形成が不十分となり、１
．０％を越えるとＴｉ、Ｓｉとの反応性が低下するとと
もに表面が粗（なる。又、後述するようにプランジャ外
表面に形成するセラミックコーティング層は２〜１０μ
ｍ程度と非常に薄いために、プランジャ母材の表面粗さ
は１．０μｍ以下にしておく必要がある。即ち、プラン
ジャ外表面粗さに与える影響が大きいからである。The plunger base material used in the present invention is C
Steel materials with a content of 0.3 to 1.0% are preferred, and typical examples include 5KD-11, MH-85, and HPM-
38 etc. can be mentioned. T iCN T i C
Since the C component in N, S I C is derived from steel, if the content is less than 0.3%, T i C, T
The formation of i CN , S i C, etc. becomes insufficient, and 1
．． If it exceeds 0%, the reactivity with Ti and Si will decrease and the surface will become rough.Also, as will be described later, the ceramic coating layer formed on the outer surface of the plunger has a thickness of 2 to 10 μm.
Since the plunger base material is extremely thin, the surface roughness of the plunger base material must be 1.0 μm or less. That is, this is because the influence on the outer surface roughness of the plunger is large.
本発明においてはこのようなプランジャ母材の表面にセ
ラミックコーティング層が厚さ２〜１０μｍ程度に形成
される。２μｍ以下では薄すぎて早く摩耗し、１０μｍ
以上では厚すぎて表面剥離の原因となるからである。チ
タン化合物あるいはＳｉ化合物はガラスとの濡れ性が悪
いためにガラスとの間で反応を生じに（いうえ、高温硬
度も大きい利点があり、中でもＴｉＮ５ ＴｉＣ，Ｔ１
ＣＮ ％ Ｔ ｉＢ ２ 、Ｓ ｔ Ｃ等はコーティン
グし易いのみならず優れた表面硬度、耐摩耗性、耐熱性
等を示すものである。In the present invention, a ceramic coating layer is formed on the surface of such a plunger base material to a thickness of about 2 to 10 μm. If it is less than 2μm, it will be too thin and wear out quickly, and if it is 10μm
This is because the thickness is too thick and causes surface peeling. Titanium compounds or Si compounds have poor wettability with glass, so they tend to react with the glass (in addition, they have the great advantage of high-temperature hardness; among them, TiN5, TiC, T1
CN % TiB 2 , S t C, etc. are not only easy to coat but also exhibit excellent surface hardness, abrasion resistance, heat resistance, etc.
本発明においてはこのようなチタン化合物層は化学蒸着
法、又は物理蒸着法によってプランジャ母材表面に形成
される。化学蒸着法は周知のようにコーティングしよう
とする材料を構成する元素からなる化合物、又は単体の
ガスを母材表面に供給し、気相中あるいは母材表面での
化学反応によりコーティング層を形成させる方法であり
、緻密で厚さが均一な、密着性に優れたコーティング層
の形成が可能である。また物理蒸着法はイオンプレーテ
ング装置内（真空度１０−４Ｔｏｒｒ台〉のカソードガ
ンに不活性ガス（Ａｒ１Ｈｅ等）を導入してプラズマ電
子ビームを発生させ、金属（Ｔｉ、Ｃｒ等）を熔解蒸発
させながらイオン化させ、外部より導入する（Ｎ２、Ｃ
２，８２等）反応ガスにより化合物（ＴｉＮｓ ＴｉＣ
ＸＴ１ＣＮ等）として負に印加した被覆物の表面に蒸着
させる方法であって、やはり均一な厚さの強固なコーテ
ィング層の形成が可能である。これらの方法によってプ
ランジャ母材の表面に形成されるセラミックコーティン
グ層は一層であっても複層であっても良く、特に化学蒸
着法による場合にはガス成分を順次切替えることによっ
てＴｉＮ、ＴｉＣ，Ｔ１ＣＮ等の複層のチタン化合物層
を金型母材上に積層状に形成することができる。尚、本
発明においてはこのようなセラミックコーティング層が
ガラスと直接接触する最も表面の部分に露出しているこ
とが必須要件であり、セラミックコーティング層の表面
に更に他のコーティング層を形成することは好ましくな
い。例えば表面にＡｌ２Ｏ３のコーティング層を形成す
ると、酸化物層は一般にチタン化合物、あるいはＳｉ化
合物よりもガラスに対する濡れ性が良いため、せっかく
セラミックコーティング層を形成してもその長所が阻害
されてしまうこととなる。In the present invention, such a titanium compound layer is formed on the surface of the plunger base material by chemical vapor deposition or physical vapor deposition. As is well known, in the chemical vapor deposition method, a compound consisting of the elements constituting the material to be coated, or a single gas, is supplied to the surface of the base material, and a coating layer is formed by a chemical reaction in the gas phase or on the surface of the base material. This method makes it possible to form a coating layer that is dense, has a uniform thickness, and has excellent adhesion. In addition, in the physical vapor deposition method, an inert gas (Ar1He, etc.) is introduced into a cathode gun in an ion plating device (with a vacuum level of 10-4 Torr) to generate a plasma electron beam, which melts and evaporates metals (Ti, Cr, etc.). It is ionized and introduced from the outside (N2, C
2,82, etc.) Compounds (TiNs TiC
XT1CN, etc.), and it is also possible to form a strong coating layer with a uniform thickness. The ceramic coating layer formed on the surface of the plunger base material by these methods may be a single layer or multiple layers, and in particular, in the case of chemical vapor deposition, by sequentially switching the gas components, TiN, TiC, T1CN can be formed. A multilayer titanium compound layer such as the above can be formed in a laminated manner on the mold base material. In addition, in the present invention, it is an essential requirement that such a ceramic coating layer be exposed at the most surface part that directly contacts the glass, and it is not necessary to form another coating layer on the surface of the ceramic coating layer. Undesirable. For example, if a coating layer of Al2O3 is formed on the surface, the oxide layer generally has better wettability to glass than titanium compounds or Si compounds, so even if a ceramic coating layer is formed, its advantages will be hindered. Become.
（作用〉
このように構成された本発明のガラス成形用プランジャ
は耐酸化性、耐摩耗性に優れると同時にガラスに対する
濡れ性が悪いセラミックコーティング層をプランジャ母
材表面に露出させて形成しであるので、高温のガラスと
接触しても酸化スケールがプランジャから剥離すること
がなく、更にはプランジャ外表面が非常に緻密で全くピ
ンホールが存在しないので、従来のようにピンホール内
に汚れがたまることもない。従って、ガラス壜内表面に
付着する汚染物の発生がほとんどみられず、クリーンな
状態でガラス壜の成形ができガラス壜の衝撃強度を著し
く向上させることができることとなる。又、セラミック
コーティング層は化学蒸着法又は物理蒸着法によってプ
ランジャ母材表面に緻密、かつ強固に密着形成されてい
るので、セラミックコーティング層の剥離のおそれもな
くプランジャ寿命を著しく増加させることができる。(Function) The plunger for glass molding of the present invention configured as described above is formed by exposing a ceramic coating layer on the surface of the plunger base material, which has excellent oxidation resistance and abrasion resistance, and at the same time has poor wettability to glass. Therefore, the oxide scale does not peel off from the plunger even when it comes into contact with high-temperature glass, and furthermore, the outer surface of the plunger is very dense and there are no pinholes, so dirt does not accumulate inside the pinholes like in the past. Therefore, there is almost no occurrence of contaminants adhering to the inner surface of the glass bottle, and the glass bottle can be molded in a clean state, and the impact strength of the glass bottle can be significantly improved. Since the ceramic coating layer is densely and firmly adhered to the surface of the plunger base material by chemical vapor deposition or physical vapor deposition, the life of the plunger can be significantly increased without fear of peeling off the ceramic coating layer.
（実施例）
実施例１
ガラスと直接接触する部分の表面粗さを１．０μｍ以下
にした冷間金型用工具ｍ（ＳＫＩ）−１１）製のガラス
成形用プランジャの表面に、化学蒸着法によりＴｉＣ，
ＴｉＣＮＸＴｉＮの３層のチタン化合物層を順次形成し
た。蒸着の手順はまずプランジャ母材を加熱炉中のチャ
ンバー内に入れ、Ｈ２、ＡｒＸＮ２、ＣＨ４の混合ガス
中で１０００００まで昇温し、ＴｉＣｌ４を主成分とす
る反応ガスをチャンバー内に２時間供給して化学蒸着を
行わせ４時間の冷却後チャンバー内から取出した。形成
された３層のチタン化合物層は全体で６μｍの厚みを有
し、その硬度はビッカースで１３００であった。このプ
ランジャを用いてＩｓ型ガラス成形機で重量１７０ｇｒ
、内容量３００■の薄肉ガラス環をプレスブロー成形し
た。得られたガラス壜（ｎ＝２０本）の衝撃強度、及び
連続使用可能時間（単位二時間）を測定したところ第１
表のとおりであった。一方、従来のＮｉ系の溶射コーテ
ィングしたプランジャを用いて成形した同様のガラス壜
の衝撃強度等は比較例のとおりであった。(Example) Example 1 A chemical vapor deposition method was applied to the surface of a plunger for glass molding made by cold mold tool m (SKI)-11), which has a surface roughness of 1.0 μm or less in the part that directly contacts the glass. TiC,
Three titanium compound layers of TiCNXTiN were sequentially formed. The vapor deposition procedure is as follows: First, the plunger base material is placed in a chamber in a heating furnace, the temperature is raised to 100,000 in a mixed gas of H2, ArXN2, and CH4, and a reaction gas containing TiCl4 as the main component is supplied into the chamber for 2 hours. After cooling for 4 hours, the sample was removed from the chamber. The three titanium compound layers formed had a total thickness of 6 μm and a Vickers hardness of 1300. Using this plunger, the weight is 170g with an Is type glass molding machine.
A thin glass ring having an inner volume of 300 .mu.m was press-blow molded. The impact strength and continuous use time (unit: 2 hours) of the obtained glass bottles (n = 20 bottles) were measured.
It was as shown in the table. On the other hand, the impact strength, etc. of a similar glass bottle molded using a conventional Ni-based thermal spray coated plunger were as in the comparative example.
実施例２
表面粗さを１．０μｍ以下にした冷間金型工具ｊｉ （
ＳＫＤ−１１）製のガラス成形用プランジャを１０−４
Ｔｏｒｒの真空チャンバー内に入れ、加熱温度５００℃
でカソードガンにＡｒを導入してプラズマ電子ビームを
発生させ、Ｔｉを溶解蒸発させなからＮ２反応ガスによ
りＴ ｉ Ｎとして負に印加したプランジャ表面に物理
蒸着した。ＴｉＮの厚さは２μｍであった。このプラン
ジャを用いて実施例１と同様のガラス壜を成形し、衝撃
強度（ｎ−２０本）、及び連続使用可能時間を測定した
結果は第１表のとおりであった。Example 2 Cold mold tool ji with surface roughness of 1.0 μm or less (
SKD-11) glass molding plunger 10-4
Placed in a Torr vacuum chamber and heated to 500°C.
Then, Ar was introduced into the cathode gun to generate a plasma electron beam, and Ti was not dissolved and evaporated, but was physically vapor deposited as TiN on the negatively applied plunger surface using N2 reactive gas. The thickness of TiN was 2 μm. A glass bottle similar to that in Example 1 was formed using this plunger, and the impact strength (n-20 bottles) and continuous usable time were measured. The results are shown in Table 1.
第１表
（発明の効果）
本発明は以上の説明からも明らかなように、ガラス壜成
形時におけるプランジャからの場内表面への汚染物の付
着を防止して、ガラス壜の衝撃強度を著しく向上させる
ことができるものであり、又、プランジャ寿命延長によ
る実用上の効果も併せて有するものであるから、従来の
問題点を解決したガラス成形用プランジャとして、業界
に寄与するところは極めて大きいものである。Table 1 (Effects of the Invention) As is clear from the above description, the present invention significantly improves the impact strength of glass bottles by preventing contaminants from adhering to the inside surface from the plunger during glass bottle forming. It also has the practical effect of extending the life of the plunger, so it will make an extremely large contribution to the industry as a plunger for glass molding that solves the problems of conventional glass molding. be.
Claims (1)
表面に、化学蒸着法又は物理蒸着法によるＴｉＮ、Ｔｉ
Ｃ、ＴｉＣＮ、ＴｉＢ＿２、ＳｉＣ等のセラミックコー
ティング層を表面に露出させて形成したことを特徴とす
るガラス成形用プランジャ。[1] TiN, Ti is deposited on the plunger base material surface with a surface roughness of 1.0 μm or less by chemical vapor deposition or physical vapor deposition.
A plunger for glass molding, characterized in that it is formed with a ceramic coating layer of C, TiCN, TiB_2, SiC, etc. exposed on the surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63064037A JPH07121812B2 (en) | 1988-03-17 | 1988-03-17 | Glass forming plunger |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63064037A JPH07121812B2 (en) | 1988-03-17 | 1988-03-17 | Glass forming plunger |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01239029A true JPH01239029A (en) | 1989-09-25 |
| JPH07121812B2 JPH07121812B2 (en) | 1995-12-25 |
Family
ID=13246517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63064037A Expired - Fee Related JPH07121812B2 (en) | 1988-03-17 | 1988-03-17 | Glass forming plunger |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07121812B2 (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60141629A (en) * | 1983-12-27 | 1985-07-26 | Olympus Optical Co Ltd | Mold for forming optical glass element |
| JPS60176929A (en) * | 1984-02-21 | 1985-09-11 | Matsushita Electric Ind Co Ltd | Mold for press molding glass lens |
-
1988
- 1988-03-17 JP JP63064037A patent/JPH07121812B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60141629A (en) * | 1983-12-27 | 1985-07-26 | Olympus Optical Co Ltd | Mold for forming optical glass element |
| JPS60176929A (en) * | 1984-02-21 | 1985-09-11 | Matsushita Electric Ind Co Ltd | Mold for press molding glass lens |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07121812B2 (en) | 1995-12-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5679448A (en) | Method of coating the surface of a substrate and a coating material | |
| GB2086943A (en) | A process of physical vapor deposition | |
| US5230755A (en) | Protective layer for a metal substrate and a method of producing same | |
| US20220162739A1 (en) | Improved coating processes | |
| US20040185182A1 (en) | Method for protecting articles, and related compositions | |
| US5476134A (en) | CRN coated die-casting tools for casting low aluminum iron alloys and method of making same | |
| JP3080651B2 (en) | Method for producing immersion member for molten metal bath | |
| JP2004137541A (en) | Dlc gradient structural hard film, and its manufacturing method | |
| US20040022662A1 (en) | Method for protecting articles, and related compositions | |
| JPH01239029A (en) | Plunger for glass forming | |
| JPH07109561A (en) | Chromium nitride film coated substrate | |
| EP1099002B1 (en) | Composition for production of a protective gradient coating on a metal substrate by electron beam evaporation and condensation under vacuum | |
| EP0603797B1 (en) | Silicide coating having good resistance to molten metals | |
| JPH05209259A (en) | Member for molten metal bath with coating film excellent in corrosion resistance to molten metal and exfoliation resistance and its production | |
| JPH0383824A (en) | Complex mold for molding of optical member | |
| JPH0429612B2 (en) | ||
| JPS63156020A (en) | Mold for glass | |
| JPH02129035A (en) | Mold for molding optical element | |
| JPH0925583A (en) | Ceramic coated roll in hot dip zinc bath | |
| KR940000280B1 (en) | Method for making two-layer plating steel sheet of galvanized coat with al/zn-fe alloy | |
| JP2587807B2 (en) | Method for forming carbide film and article having the film | |
| JPH07258821A (en) | Metallic article with hard film and its production | |
| JPS6349750B2 (en) | ||
| JP2000052018A (en) | Thixotropy die of magnesium alloy | |
| JP4830882B2 (en) | Mold for optical element molding |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |