JPH01238018A - Microwave discharge device - Google Patents
Microwave discharge deviceInfo
- Publication number
- JPH01238018A JPH01238018A JP6331988A JP6331988A JPH01238018A JP H01238018 A JPH01238018 A JP H01238018A JP 6331988 A JP6331988 A JP 6331988A JP 6331988 A JP6331988 A JP 6331988A JP H01238018 A JPH01238018 A JP H01238018A
- Authority
- JP
- Japan
- Prior art keywords
- bell jar
- electrical discharge
- discharge
- quartz bell
- quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012544 monitoring process Methods 0.000 claims abstract description 11
- 230000005611 electricity Effects 0.000 claims 1
- 239000010453 quartz Substances 0.000 abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 21
- 239000013307 optical fiber Substances 0.000 abstract description 6
- 230000005856 abnormality Effects 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、マイクロ波放電装置に係り、特に半導体素子
基板等の試料を処理するマイクロ波放電装置に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a microwave discharge device, and particularly to a microwave discharge device for processing samples such as semiconductor element substrates.
半導体素子基板等の試料をエツチング、成膜等の処理す
るマイクロ波放電装置としては、例えば、特囲昭61−
281883号公報等に記載のようなものが刈られてい
る。As a microwave discharge apparatus for processing samples such as semiconductor element substrates by etching, film formation, etc., for example, the
The one described in Japanese Patent No. 281883 and the like has been cut.
上記従来技術は、真空容器内でのマイクロ波放電の発生
有無をモニターする点について配慮がされておらず、何
等かの原因でマイクロ波放電が発生していなくとも、こ
れがオペレータに全−分らないといった問題がある。The above-mentioned conventional technology does not take into consideration the point of monitoring whether or not microwave discharge occurs within the vacuum container, and even if microwave discharge does not occur for some reason, the operator is not completely aware of this. There are problems like this.
本発明の目的は、オペレータが装置異常等を簡単に知る
ことができるマイクロ波放電装置を提供することにある
。SUMMARY OF THE INVENTION An object of the present invention is to provide a microwave discharge device that allows an operator to easily know about abnormalities in the device.
上記目的は、マイクロ波放電装置を、真空容器内でマイ
クロ波放電を発生させる手段と、N記真空容器内での前
記マイクロ波放電の発生有無をモニターする手段とを具
備したものとすることにより、達成される。The above object is achieved by providing a microwave discharge device with means for generating microwave discharge within a vacuum container, and means for monitoring whether or not the microwave discharge is generated within the N vacuum container. , achieved.
真空容器内でマイクロ波放電が発生している場合1例え
ば、放電による発光をモニター手段でとらえることで、
該モニター手段では、マイクロ波放電が発生しているこ
とが、検出される。一方。When microwave discharge occurs in a vacuum container 1 For example, by capturing the light emitted by the discharge with a monitoring means,
The monitoring means detects that microwave discharge is occurring. on the other hand.
真空容器内でマイクロ波放電が発生していない(何等か
の原因でマイクロ波放電が停止した状態も含む)場合、
モニター手段では、マイクロ波放電が発生していないこ
とが検出されて、オペレータに通知される。これにより
、オペレータは、装置異常等で簡単に知ることができる
。If microwave discharge is not occurring within the vacuum container (including a state where microwave discharge has stopped for some reason),
The monitoring means detects that no microwave discharge is occurring and notifies the operator. This allows the operator to easily know if there is an abnormality in the device, etc.
以下1本発明の一実施例を第1図により説明する。 An embodiment of the present invention will be described below with reference to FIG.
第1図は放電監視モニターを取付けたマイクロ波エツチ
ング装置例を示す。真空室内lには試料であるSi基板
2を載置する試料台3が設けられている。真空室lには
処理ガスを供給する処理ガス導入管4と1図示しない真
空ポンプにつながり、真空室1内を所定圧力に減圧排気
する。FIG. 1 shows an example of a microwave etching apparatus equipped with a discharge monitoring monitor. A sample stage 3 on which a Si substrate 2 as a sample is placed is provided in the vacuum chamber l. The vacuum chamber 1 is connected to a processing gas inlet pipe 4 for supplying processing gas and a vacuum pump (not shown), which evacuates the inside of the vacuum chamber 1 to a predetermined pressure.
真空室1を構成する石英ベルジャ5を取り口しが導波管
6が取り付けてあり、導波管6の端部にマグネトロン7
が取り付けである。石英ベルジャ5の回りには、導波管
6を介して磁界発生手段であるコイル8が設けである。A waveguide 6 is attached to the opening of the quartz belljar 5 constituting the vacuum chamber 1, and a magnetron 7 is attached to the end of the waveguide 6.
is the installation. A coil 8, which is a magnetic field generating means, is provided around the quartz belljar 5 via a waveguide 6.
なお、この場合、試料台3には高周波電波9が接続され
である。In this case, a high frequency radio wave 9 is connected to the sample stage 3.
この場合、モニター手段は、石英ベルジャ5内での放電
による発光を系外に取り出す1例えば、光ファイバー1
0と、光ファイバー10からの発光量を電気信号に変換
する。例えば、フォトマル11と。In this case, the monitoring means 1 takes out the light emitted by the discharge within the quartz belljar 5 to the outside of the system, for example, the optical fiber 1.
0 and the amount of light emitted from the optical fiber 10 are converted into electrical signals. For example, with Photomaru 11.
フォトマル11からの電気信号の入力有無によって石英
ベルジャ5内での放電有無を検知しオペレータに通知す
る制御装置丘とで構成されている。光ファイバー10の
受光部は導波管6を貫通して石英ベルジャ5の、この場
合、側壁部に対応させられている。The control device detects the presence or absence of discharge within the quartz belljar 5 based on the presence or absence of an electric signal input from the photomultiplier 11 and notifies the operator. The light receiving portion of the optical fiber 10 passes through the waveguide 6 and corresponds to the side wall portion of the quartz belljar 5 in this case.
上記構成の装置により、処理ガス導管4より石英ベルジ
ャ5内に処理ガスを導入し、マグネトロン7により印加
量100〜100OWのマイクロ波を発生させて石英ベ
ルジャ5内に導入し、コイル8によって石英ベルジャ5
内に700〜1000ガウスの磁場を作用させ放電を発
生させる。この状態で、放電による発光は、石英ベルジ
ャ5を透過して光ファイバーlOの受光部にて受光され
る。With the apparatus configured as described above, a processing gas is introduced into the quartz belljar 5 through the processing gas conduit 4, a microwave with an application amount of 100 to 100 OW is generated by the magnetron 7 and introduced into the quartz belljar 5, and the coil 8 is used to introduce the processing gas into the quartz belljar 5. 5
A magnetic field of 700 to 1000 Gauss is applied within the chamber to generate a discharge. In this state, the light emitted by the discharge passes through the quartz belljar 5 and is received by the light receiving portion of the optical fiber IO.
受光された発光は元ファイバー10を介してフォトマル
11に達し、ここで、その発光量は、電気信号に変換さ
れて、制御装置しに入力される。これにより、制御装置
校では、石英ベルジャ5内での放電発生が検知される。The received emitted light reaches the photomultiplex 11 via the source fiber 10, where the amount of emitted light is converted into an electrical signal and input to the control device. As a result, the control device detects the occurrence of electrical discharge within the quartz belljar 5.
一方、何等かの原因1例えば、コイル8への通電量の震
災により石英ベルジャ5内での放電発生が無い場合、上
記電気信号は制御装置νに入力されず、従って、制御装
置校では、石英ベルクキ5内での放電発生が無いことが
検知され、例えば、警報光や警報音の発生や警報メツセ
ージの表示等によりオペレータに通知される。On the other hand, if there is no discharge in the quartz belljar 5 due to some cause 1, for example, due to an earthquake in the amount of current applied to the coil 8, the above electric signal will not be input to the control device ν, and therefore, in the control device It is detected that there is no discharge occurring within the quartz belt 5, and the operator is notified by, for example, generating an alarm light or alarm sound or displaying an alarm message.
本実施例では、オペレータが装置異常等を簡単に知るこ
とができる。また、これにより放電発生が無い状態で試
料を誤って処理操作しようとする等の誤作業を未然に防
止することができる。In this embodiment, the operator can easily know about abnormalities in the apparatus. Moreover, this makes it possible to prevent erroneous operations such as attempting to process a sample erroneously in a state where no discharge occurs.
なお、モニター手段としては、上記実施例以外に、例え
ば1石英ベルジャの側壁部と対向する導波管に採光窓を
設け、該窓と対向させてフォトマルを設置するようにし
ても勿論良い。また、本実施例のように石英ベルジャが
導波管により囲まれ。In addition to the above-mentioned embodiment, as a monitoring means, for example, a light window may be provided in the waveguide facing the side wall of the quartz bell jar, and a photomultiplier may be placed opposite the window. Furthermore, as in this embodiment, the quartz belljar is surrounded by a waveguide.
石英ベルジャ内での放電による発光が系外へ出るのを遮
へいされた構造のもので、モニター手段を設けることに
よる効果は、特に生じるが、この他に、石英ベルジャが
ヤベレータの目に届きにくい場所や位置に設置されてい
る場合にも、同様に生しる。The quartz belljar has a structure that prevents the light emitted from the discharge caused by the discharge from exiting the system, and the effect of providing a monitoring means is particularly high. The same effect occurs even if it is installed in a different position.
本発明によれば、真空容器内でのマイクロ波放電の発生
有無をオペレータが知ることができるので、装置異常等
をオペレータが簡単に知ることができる効果がある。According to the present invention, since the operator can know whether microwave discharge is occurring in the vacuum container, there is an effect that the operator can easily know the abnormality of the apparatus or the like.
第1図は、本発明の一実施例のマイクロ波放電装置の縦
断面図である。
1・・・・・・真空室、5・・・・・・石英ベルジャ、
6・・・・・・導波管、7・・・・・・マグネトロン、
8・・・・・・コイル、10・・・光ファイバー、11
・・・・・・フォトマル、丘・・・・・・制御装置
代理人 弁理士 小 川 勝 男−〕〉2、(、−
\!−/FIG. 1 is a longitudinal sectional view of a microwave discharge device according to an embodiment of the present invention. 1... Vacuum chamber, 5... Quartz bell jar,
6... Waveguide, 7... Magnetron,
8... Coil, 10... Optical fiber, 11
...Photomaru, Oka... Control device agent Patent attorney Katsuo Ogawa -〉〉2, (, - \!-/
Claims (1)
前記真空容器内での前記マイクロ波放電の発生有無をモ
ニターする手段とを具備したことを特徴とするマイクロ
波放電装置。1. A means for generating microwave desire electricity in a vacuum container;
A microwave discharge device comprising: means for monitoring whether or not the microwave discharge occurs within the vacuum container.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6331988A JPH01238018A (en) | 1988-03-18 | 1988-03-18 | Microwave discharge device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6331988A JPH01238018A (en) | 1988-03-18 | 1988-03-18 | Microwave discharge device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01238018A true JPH01238018A (en) | 1989-09-22 |
Family
ID=13225829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6331988A Pending JPH01238018A (en) | 1988-03-18 | 1988-03-18 | Microwave discharge device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01238018A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60241227A (en) * | 1984-05-16 | 1985-11-30 | Hitachi Ltd | Microwave plasma device |
JPS62122217A (en) * | 1985-11-22 | 1987-06-03 | Hitachi Ltd | Processing equipment employing microwave plasma |
-
1988
- 1988-03-18 JP JP6331988A patent/JPH01238018A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60241227A (en) * | 1984-05-16 | 1985-11-30 | Hitachi Ltd | Microwave plasma device |
JPS62122217A (en) * | 1985-11-22 | 1987-06-03 | Hitachi Ltd | Processing equipment employing microwave plasma |
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