JPH01221886A - High-frequency heating device - Google Patents

High-frequency heating device

Info

Publication number
JPH01221886A
JPH01221886A JP4625188A JP4625188A JPH01221886A JP H01221886 A JPH01221886 A JP H01221886A JP 4625188 A JP4625188 A JP 4625188A JP 4625188 A JP4625188 A JP 4625188A JP H01221886 A JPH01221886 A JP H01221886A
Authority
JP
Japan
Prior art keywords
heated
area
bottom wall
loading table
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4625188A
Other languages
Japanese (ja)
Other versions
JPH0824066B2 (en
Inventor
Hiroshi Terasaki
寛 寺崎
Yasuhiro Inada
育弘 稲田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63046251A priority Critical patent/JPH0824066B2/en
Publication of JPH01221886A publication Critical patent/JPH01221886A/en
Publication of JPH0824066B2 publication Critical patent/JPH0824066B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)

Abstract

PURPOSE:To suppress an abnormal heating at the periphery of a loading table by making the distance between a bottom wall opposite to the loading table shorter than the rotation area of a churning plate in which the electric field is varied, concentrating the high-frequency energy to the loading area of a substance to heat, and ventilating between the loading table and the bottom wall. CONSTITUTION:The heating device is composed to rotate a churning device 9 of electric field along almost all the area of the loading area of a substance to heat 10, and the substance 10 is heated by a strong and even electric field. Although the loading table 11 is heated at the same time, the heat is absorbed to the substance 10. In this case, the distance between the bottom wall 3 and the loading table 11 is made shorter than the set area of the substance to heat 10, to weaken the electric field applied to the loading table 11. Furthermore, through ventilating holes 25-29 furnished where the distance between the loading table 11 and the bottom wall 3 is shorter, the ventilation at the part is carried out to apply a cooling air. An abnormal heating at the periphery of the loading table can be prevented consequently.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は高周波加熱装置の高周波給電方法に関するもの
で、加熱室の上下壁面にそれぞれ高周波の給電手段を有
する装置における加熱室内の高周波による黄常加熱現象
を抑制せんとするものである0 従来の技術 一般にこの種の加熱装置において、高出力の装[’e得
んとする場合、高周波の発生手段を複数個設け、同一の
加熱室内に並列運転されるそれぞれの高周波発生手段の
発した高周波を導く構成を設ける方法がとられる。特に
高出力でかつ均一加熱の目的から、高周波を加熱室へ導
び〈構成の一例として加熱室の土壁と底壁の部分に、高
周波の加熱室への給電手段を設は被加熱物を上下より加
熱するという手段も用いられている。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a high-frequency power supply method for a high-frequency heating device, and relates to a high-frequency power supply method for a high-frequency heating device, and the present invention relates to a high-frequency power supply method for a high-frequency heating device, in which yellow heating phenomenon caused by high-frequency waves in the heating chamber is prevented in a device having high-frequency power supply means on the upper and lower walls of the heating chamber. 0 Conventional Technology In general, in this type of heating device, when it is desired to obtain a high output device, a plurality of high frequency generating means are provided and are operated in parallel within the same heating chamber. A method is adopted in which a structure is provided to guide the high frequency waves generated by each high frequency generating means. In particular, for the purpose of high output and uniform heating, high frequency waves are introduced into the heating chamber. A method of heating from the top and bottom is also used.

第3図はこの様な構成をなす高周波発生装置の側方断面
を模式的に示したものである。
FIG. 3 schematically shows a side cross section of a high frequency generator having such a configuration.

加熱室1を構成する上壁2及び底壁3の一部にそれぞれ
、高周波の加熱室への供給にかがる円型の給電口4及び
6を設けて−る。給電口4,5の中心には誘電体で軸支
された給電用のアンテナ6゜7が給電口4.6の中心を
軸として回動自在に軸支されている。アンテナ6.7は
それぞれ一端を加熱室1内に突出さゼ、その端面近傍に
電界の攪拌にかかる攪拌板8,9を具備している。攪拌
板8.9は直接アンテナ6.7に固着される場合も、又
、誘電体を介して結合される場合もあり得る。
Circular power feed ports 4 and 6 for supplying high-frequency waves to the heating chamber are provided in a portion of the top wall 2 and bottom wall 3, respectively, which constitute the heating chamber 1. At the center of the power feed ports 4, 5, a power feed antenna 6.7 supported by a dielectric material is rotatably supported around the center of the power feed port 4.6. Each of the antennas 6, 7 has one end protruding into the heating chamber 1, and has stirring plates 8, 9 near the end surface for stirring the electric field. The stirring plate 8.9 may be directly fixed to the antenna 6.7, or may be coupled via a dielectric.

下部の攪拌板より上側にガラス等の誘電体よりなる被加
熱物10の載置台11が加熱室をなす側壁12に設けた
支持片13により支持されているOアンテナ6.7の加
熱室外の端部は加熱室の後部に設けられた高周波発生装
置として2個のマグネトロン14.15と導波管16.
17により高周波的に結合されている。また、アンテナ
6.7の導波管16.17側の端部には、導波管16.
17外に設けた駆動モータ18,19の出力軸が結合さ
れ、マグネトロン14.15が高周波を発生している間
アンテナ6.7を給電口4,6の中心を軸に回転せしめ
る構成としている0 上記構成をなし、加熱室1内の載置台11に被加熱物1
0を載置しマグネトロン14.16にそれぞれ必要に応
じた電力を供給することで、被加熱物を上下よりしかも
、最高2倍の出力で加熱する事を可能にしている。
Above the stirring plate at the bottom, a mounting table 11 for a heated object 10 made of a dielectric material such as glass is supported by a support piece 13 provided on a side wall 12 forming the heating chamber. An end outside the heating chamber of the O antenna 6.7. The section includes two magnetrons 14.15 and a waveguide 16.15 as high frequency generators provided at the rear of the heating chamber.
17 for high frequency coupling. Further, at the end of the antenna 6.7 on the waveguide 16.17 side, a waveguide 16.
The output shafts of drive motors 18 and 19 provided outside the antenna 17 are coupled, and the antenna 6.7 is rotated around the center of the feed ports 4 and 6 while the magnetron 14.15 is generating high frequency waves. With the above configuration, the object to be heated 1 is placed on the mounting table 11 in the heating chamber 1.
By placing the 0 and supplying power to the magnetrons 14 and 16 as required, it is possible to heat the object from above and below, and at a maximum of twice the output.

発明が解決しようとする課題 この様な構成の高周波加熱装置の1つの問題点として載
置台の被加熱物の載置されていない部分の異常過熱現象
が上げられる。高周波エネルギーによりその誘電体損の
存在が、被加熱物と同時に載置台11をも加熱し、その
熱は被加熱物が存在する部分は被加熱物に吸収されるが
、被加熱物のない部分では時として1000℃以上に溶
融点を有する例えば結晶化ガラス等の高耐熱の誘電体で
あっても、これを局部的に溶融せしめる。この結果、熱
応力の発生により載置台全体が破壊に及ぶというもので
、くりかえし加熱動作が行われると蓄熱作用によりその
可能性が非常に高くなってくる。使用者にとって火傷の
原因となり、ひいては庫内よりの出火、更には本体全体
の火災にもなりかねないきわめて危険な状態を生じる可
能性があった。従来、この対応として例えば加熱室壁に
温度過昇防止手段として、サーモスタッ)20等を設は
庫内の温度が異常に上昇した場合このスイッチにより、
マグネトロ:/14.’16の入力電力を遮断し、加熱
動作を停止する様にしていたが、高周波出力が大きくな
るほど局部的加熱現象が激しく、例えば載置台の一部が
1000℃を超す状態でもサーモスタットの温度は10
0℃以下で、正常時の誤動作を防止する様に設定された
サーモスタットの動作温度に達せず、充分に機能を果さ
ないという課題を有していた。
Problems to be Solved by the Invention One of the problems with the high-frequency heating device having such a configuration is the phenomenon of abnormal overheating of the portion of the mounting table on which the object to be heated is not placed. Due to the presence of dielectric loss due to high frequency energy, the mounting table 11 is heated at the same time as the object to be heated, and the heat is absorbed by the object in the area where the object is present, but in the area where there is no object to be heated. In some cases, even a highly heat-resistant dielectric material such as crystallized glass, which has a melting point of 1000° C. or higher, is locally melted. As a result, the entire mounting table will be destroyed due to the generation of thermal stress, and if the heating operation is repeated, the possibility of this happening becomes extremely high due to heat accumulation. This could cause burns to the user, and could even cause a fire to break out from inside the refrigerator or even cause the entire device to catch fire, creating an extremely dangerous situation. Conventionally, as a countermeasure for this, for example, a thermostat (20) etc. was installed on the wall of the heating chamber as a means to prevent excessive temperature rise.If the temperature inside the refrigerator rose abnormally, this switch would be activated.
Magnetro: /14. '16's input power was cut off to stop the heating operation, but as the high frequency output increases, the local heating phenomenon becomes more intense.
At temperatures below 0°C, the operating temperature of the thermostat, which is set to prevent malfunctions during normal operation, cannot be reached and the thermostat does not function satisfactorily.

課題を解決するための手段 本発明はかかる載置台の異常加熱を防止せんとされたも
ので、載置台と対向する底壁間の距離を電界の変化する
攪拌板の回転領域部分に比較し、それ以外の部分を短か
くする事で、回転領域外の部分の高周波電界を弱め、そ
の高周波エネルギーを被加熱物の載置領域に集中させ、
又、載置台と底壁間の換気を行ない、載置台の被加熱物
載置領域以外の部分の異常加熱を抑えんとするものであ
る。
Means for Solving the Problems The present invention aims to prevent such abnormal heating of the mounting table, by comparing the distance between the mounting table and the opposing bottom wall with the rotating region of the stirring plate where the electric field changes, By shortening the other parts, the high-frequency electric field in the parts outside the rotation area is weakened, and the high-frequency energy is concentrated in the area where the object to be heated is placed.
In addition, ventilation is provided between the mounting table and the bottom wall to suppress abnormal heating of parts of the mounting table other than the area where the object to be heated is placed.

作用 載置台部分に印加される高周波の電界強度は、加熱室内
に生じる高周波の定在波に左右される。
The strength of the high-frequency electric field applied to the working table portion depends on the high-frequency standing waves generated within the heating chamber.

すなわち、底壁表面の電界は0であり、定在波の腹の部
分までを見ると、壁面より距離が離れるに従がい、電界
強度は強くなってい〈0本発明において、被加熱物の載
置領域は被加熱物に対し最も強い電界が印加される様、
壁面よりの距離を設定している。さらにこの領域のほぼ
全域にわ九り、電界の攪拌手段が回動する構成を設は強
く均一な電界により、被加熱物の加熱が行われる。同時
に載置台も加熱されるが、載置台に生じる熱は被加熱物
に吸収される為、この部分での載置台の異常加熱現象は
生じない。
That is, the electric field on the surface of the bottom wall is 0, and when looking at the antinode of the standing wave, the electric field strength becomes stronger as the distance from the wall increases. The heating area is set so that the strongest electric field is applied to the heated object.
The distance from the wall is set. Furthermore, a structure is provided in which an electric field stirring means rotates over almost the entire region, so that the object to be heated is heated by a strong and uniform electric field. At the same time, the mounting table is also heated, but since the heat generated on the mounting table is absorbed by the object to be heated, no abnormal heating phenomenon of the mounting table occurs in this part.

一方、被加熱物の載置領域以外で載置台が底壁に対向す
る部分は、攪拌手段の回転による電界の変動に対する効
果が少なく、定在波による局部加熱を生じようとするが
、被加熱物の設置領域に比較し、底壁と載置台との距離
を短かくしただけ載置台の部分に印加される電界が弱め
られており、これによって載置台の異常加熱は抑制され
る。
On the other hand, in the area other than the area where the object to be heated is placed, where the mounting table faces the bottom wall, there is little effect on fluctuations in the electric field due to the rotation of the stirring means, and local heating by standing waves tends to occur. Compared to the area where the object is placed, the electric field applied to the mounting table is weakened by shortening the distance between the bottom wall and the mounting table, thereby suppressing abnormal heating of the mounting table.

しかし、この方法のみでは被加熱物の外周部分、特に上
面部分は底壁側より発せられる高周波が被加熱物の底面
によって遮断されてしまい、はとんど加熱する事が出来
ない。本発明においては平面状の土壁に設けられた第2
の給電手段によって土壁に沿って高周波電磁波が加熱室
周辺に放射され各壁面によって反射され、又土壁近傍に
設けられたもう1つの攪拌板により電界を攪拌されなが
ら被加熱物上面や側面を加熱することが出来る。そして
さらに被加熱物載置領域以外の部分の高周波による加熱
は、載置台と底壁間距離が短かい部分に設けた通気口を
通し、この部分の換気を行ない冷却風の印加によりさら
に抑制される。
However, with this method alone, the outer periphery of the object to be heated, especially the upper surface thereof, cannot be heated because the high frequency waves emitted from the bottom wall side are blocked by the bottom surface of the object to be heated. In the present invention, the second
A high-frequency electromagnetic wave is radiated around the heating chamber along the earthen wall by the power feeding means, and is reflected by each wall surface.Another stirring plate installed near the earthen wall stirs the electric field and waves the top and side surfaces of the object to be heated. It can be heated. Furthermore, heating by high frequency waves in areas other than the area where the object to be heated is placed can be further suppressed by ventilating this area through a vent provided in the area where the distance between the mounting table and the bottom wall is short and applying cooling air. Ru.

実施例 本発明の実施例を、第1図、第2図により説明する。尚
、従来例に記す構成と同一の構成部材については同一の
番号を付す。
Embodiment An embodiment of the present invention will be explained with reference to FIGS. 1 and 2. Note that the same numbers are given to the same components as those described in the conventional example.

図に示すように、加熱室底壁3の中央には給電手段とし
て円形の高周波の給電口6f、設け、従来同様アンテナ
7とその先端に固着した平板状の撹拌板9を給電口6の
中心を軸に回動自在に軸支し駆動モータ19にエフマグ
ネトロン14.16が発振中回転する様に構成している
As shown in the figure, a circular high-frequency power feeding port 6f is provided as a power feeding means in the center of the bottom wall 3 of the heating chamber, and an antenna 7 and a flat stirring plate 9 fixed to the tip thereof are placed at the center of the feeding port 6, as in the conventional case. The F magnetrons 14 and 16 are rotatably supported on a drive motor 19 and rotated during oscillation.

加熱室1を構成する底壁3は被加熱物の載置領域と同等
又はそれ以下の大きさで攪拌板9の回転半径と大略同様
な半径の円形状の絞り部21を設ける。本実施例におい
ては、加熱室底面が330間幅X310m奥行に対し、
絞り部の直径を250間としている。絞りの深さは載置
領域部分で充分な電界強度が得られる様な寸法、すなわ
ち実施例の高周波の周波数が2450MH1の場合、絞
り部21の下端(給電口の部分)面から載置台までの高
さを26m程度としている。絞り部21の周囲は丁り鉢
状に60°の傾斜面2″2t−設け、その外側は加熱室
1の側壁まで載置台11までの距離を10m程度として
いる0加雇室1の上壁2は同様攪拌板90回転半径と同
様な半径の円形状の絞り部23を設ける。この絞り部2
3の中央には同様に給電口4が設けられており、アンテ
ナ6とその先端に固定した攪拌板8を、前述と同様給電
口4の中心を軸に回動自在に軸支し、駆動モータ18に
Lリマグネトロン14.15が発振中回転し、高周波を
加熱室内1へ放射、かつ攪拌する構成をなしている。絞
り部23の周囲1500の傾斜面24を設けその外側は
給電口4の設けられた面よりも20m低い面を形成し側
壁部に結合している。
The bottom wall 3 constituting the heating chamber 1 is provided with a circular constricted portion 21 having a size equal to or smaller than the mounting area of the object to be heated and having a radius substantially the same as the radius of rotation of the stirring plate 9. In this example, the bottom surface of the heating chamber is 330 m wide x 310 m deep, and
The diameter of the constricted portion is 250 mm. The depth of the aperture is such that sufficient electric field strength can be obtained in the mounting area, that is, when the high frequency of the embodiment is 2450 MH1, the depth of the aperture is determined from the lower end (feed port part) of the aperture part 21 to the mounting table. The height is approximately 26m. The periphery of the constriction part 21 is a bowl-shaped 60° inclined surface 2"2t, and the outer side thereof is the upper wall of the processing chamber 1, which has a distance of about 10 m from the side wall of the heating chamber 1 to the mounting table 11. 2 is provided with a circular constriction part 23 having a radius similar to the rotation radius of the stirring plate 90.This constriction part 2
Similarly, a power feed port 4 is provided in the center of the power feed port 4, and an antenna 6 and a stirring plate 8 fixed to the tip thereof are rotatably supported around the center of the power feed port 4 as described above. At 18, L remagnetrons 14 and 15 rotate during oscillation to radiate high frequency waves into the heating chamber 1 and stir it. An inclined surface 24 is provided around the periphery 1500 of the constriction portion 23, and the outer side thereof forms a surface 20 m lower than the surface on which the power supply port 4 is provided, and is connected to the side wall portion.

さらに、底壁3の傾斜面22より外側の部分には、前方
左右に2ケ所及び後方の左右に2ケ所、それぞれ直径3
1aIの穴が複数個よりなる通気口25.26.27.
28を設ける。又、加熱室側壁12にお−いて、載置台
11よりも下方の部分も底壁との接合部分より上部にお
いて同様の小径の穴が複数個よりなる通気口29を設け
ている。加熱室底壁エフの高周波の放射に係るマグネト
ロ/16は、そのマグネトロン16と側壁の間に設けら
れたブロアーモーター300回転により冷却される構成
を有している。ブロアーモーター3oの吸気部の下部に
は前記通気1口27.28.29との間を結ぶ吸気ガイ
ド31t−設け、高周波が発生している間ブロアーモー
ター3oが回転し、マグネトロン16を冷却すると共に
、通気口28゜29.30より載置台11下部の空気を
引き出す。
Furthermore, on the outside of the inclined surface 22 of the bottom wall 3, there are two locations on the front left and right and two locations on the rear left and right, each with a diameter of 3.
Ventilation port consisting of a plurality of 1aI holes 25.26.27.
28 is provided. Further, in the heating chamber side wall 12, a vent hole 29 consisting of a plurality of similar small-diameter holes is provided in a portion below the mounting table 11 and above the joint portion with the bottom wall. The magnetron/16 related to high frequency radiation on the bottom wall of the heating chamber F has a configuration in which it is cooled by a blower motor 300 revolutions provided between the magnetron 16 and the side wall. An intake guide 31t is provided at the lower part of the intake part of the blower motor 3o to connect with the ventilation port 27, 28, 29, and while the high frequency is being generated, the blower motor 3o rotates to cool the magnetron 16 and , air from the lower part of the mounting table 11 is drawn out from the ventilation hole 28°29.30.

その分の空気は本体前面に設けられた吸気口32より本
体内にとり込まれた本体の冷却風の一部が通気口25,
26!り載置台下部への流入により補充される構成を有
している。
A portion of the cooling air of the main body is taken into the main body through the intake port 32 provided on the front of the main body,
26! It has a structure in which it is replenished by flowing into the lower part of the mounting table.

その他加熱室1t−形成する前壁33には被加熱物の中
入にかかる扉34を開閉自在に設け、両者の接触により
高周波の漏洩を防ぐ構成をなしている。又、マグネトロ
ン15を冷却した風は排気口36より本体外部に排出さ
れる。
In addition, the front wall 33 forming the heating chamber 1t is provided with a door 34 which allows the object to be heated to enter so as to be openable and closable, so that leakage of high frequency waves is prevented by contact between the two. Further, the wind that has cooled the magnetron 15 is discharged to the outside of the main body from the exhaust port 36.

以上の構成によれば、アンテナ7を介して加熱室1底部
の絞り部21に放射された高周波は、載置台11を通過
し、直接被加熱物1oの底部に吸収されるかまたは傾斜
面22に向い、この部分で反射される。傾斜面の底壁3
に対する角度により反射の方向は左右されるが、傾斜面
22の給電口を設けた面に対する傾斜t−46°以上の
角度とした場合、高周波は加熱室の中心側へ向って反射
され、被加熱物1oの底面に向うことになる。
According to the above configuration, the high frequency waves radiated to the aperture part 21 at the bottom of the heating chamber 1 via the antenna 7 pass through the mounting table 11 and are directly absorbed by the bottom of the object to be heated 1o, or are directly absorbed by the inclined surface 22. It is reflected from this part. Sloped bottom wall 3
The direction of reflection depends on the angle of the inclined surface 22 relative to the surface where the power supply port is provided, but if the angle is t-46° or more with respect to the surface where the power supply port is provided, the high frequency waves will be reflected toward the center of the heating chamber and the heated It will face the bottom of object 1o.

すなわちマグネトロン15の発した高周波はアンテナ7
を介して被加熱物10の底部の方向に向って放射され、
傾斜面22より外側へは進行しにくくなる。平板状の攪
拌板9は回転に応じて高周波のアンテナ70回転軸を中
心とした高周波の照射の方向を変える事と又、壁面を起
点とした定在波の立ち具合を変化させ、絞り部21の電
界を変化させ、被加熱物1o底面の局部加熱を防止する
In other words, the high frequency waves emitted by the magnetron 15 are transmitted to the antenna 7.
is emitted toward the bottom of the object to be heated 10 through
It becomes difficult to advance outward from the inclined surface 22. The flat stirring plate 9 changes the direction of high-frequency irradiation centered on the rotation axis of the high-frequency antenna 70 according to rotation, and also changes the standing of standing waves starting from the wall surface. The electric field is changed to prevent local heating of the bottom surface of the object to be heated 1o.

そしてこの部分における載置台11は被加熱物1゜が熱
を吸収し異常加熱現象を生じない。さらに、傾斜面22
よフ外側へ出た高周波は、載置台11を通過し、加熱室
1内へ放射されるが、前述のごと〈底壁3よりの載置台
11までの距離を10■とじた事で、この部分における
定在波による電界強度が低くなり、従来10分間の本体
動作にて3oo℃以上の温度となっていた部分を140
”C以下とする事が出来る様になっ−fI:、。
In this part of the mounting table 11, the object to be heated 1° absorbs heat and does not cause any abnormal heating phenomenon. Furthermore, the inclined surface 22
The high frequency waves emitted to the outside pass through the mounting table 11 and are radiated into the heating chamber 1, but as mentioned above, by reducing the distance from the bottom wall 3 to the mounting table 11 by 10 mm, this The electric field strength due to standing waves in the area has become low, and the area that previously had a temperature of 300°C or more after 10 minutes of main unit operation has been changed to 140°C.
``It is now possible to set it to C or lower - fI:,.

さらに、通気口2g、26より底壁3と載置台11間へ
流入し通気口27,28.29部分より排出される空気
の流れハ、101111という狭い空間を流れる為、載
置台11の表面近傍の流速も被加熱物1oの載置領域す
なわち絞り部21に比較しきわめて早くその表面に対す
る冷却効果もきわめて高くなっている。結果、10分間
の温度上杵はさらに140℃の部分が110℃前後まで
低下するに至っ九。さらに常時空気の流れが存在する事
で、この空間部分の蓄熱を防止し、長時間使用時におけ
る被加熱物1oの載置領域外における200℃を超える
異常加熱現象は皆無とする事が出来、載置台11の破壊
を未然に防ぐ事が可能となった。
Furthermore, the flow of air that flows into between the bottom wall 3 and the mounting table 11 through the vents 2g and 26 and is discharged from the vents 27, 28, and 29 is near the surface of the mounting table 11 because it flows through a narrow space of 101111. The flow velocity is also much faster than that in the area where the object to be heated 1o is placed, that is, the constricted portion 21, and the cooling effect on the surface thereof is also extremely high. As a result, the temperature of the 140°C part of the punch for 10 minutes was further reduced to around 110°C. Furthermore, the constant flow of air prevents heat accumulation in this space, and there is no abnormal heating phenomenon exceeding 200°C outside the area where the heated object 1o is placed during long-term use. It is now possible to prevent the mounting table 11 from being destroyed.

一方、この方法のみでは、被加熱物1oの上面及び側面
を充分に加熱する事が内錐であるが、本発明においては
加熱室の土壁にもその中央部分に給電口4を設ける事で
アンテナ6L9発射される高周波にエフ充分加熱し得る
On the other hand, with this method alone, it is the inner cone that sufficiently heats the top and side surfaces of the object to be heated 1o, but in the present invention, the power supply port 4 is also provided in the center of the earthen wall of the heating chamber. The antenna 6L9 can be sufficiently heated by the emitted high frequency waves.

アンテナ6の先端に設けられた攪拌板8により傾斜面2
4に向った高周波は、この傾斜面24にて反射される。
The inclined surface 2 is created by the stirring plate 8 provided at the tip of the antenna 6.
The high frequency waves directed toward 4 are reflected by this inclined surface 24.

傾斜面の上!!3に対する角度を500とした事で反射
された高周波はその位置から直下より若干内側へ向い、
被加熱物10へ進入していく。載置台11と給電口4間
の距離は、給電口6との距離に比軟し、被加熱物10の
載置用の空間が必要な分だけ大きく、高周波の集束性が
低下している為、傾斜部24の直下部分に設置された被
加熱物も充分加熱され、結果被加熱物は上下方向エフ充
分に加熱され、それエフ外部の被加熱物10の載置され
ない載置台11の周辺部分へは高周波の進入が少なくな
り給電口4より加熱室内へ照射された高周波によっても
載置台11の異常加熱を生じない。
On the slope! ! By setting the angle to 3 to 500, the reflected high frequency waves are directed slightly inward from directly below,
It advances into the object to be heated 10. The distance between the mounting table 11 and the power supply port 4 is smaller than the distance from the power supply port 6, and is large enough to require a space for placing the object to be heated 10, which reduces the focusing ability of high frequencies. , the object to be heated installed directly below the inclined portion 24 is also sufficiently heated, and as a result, the object to be heated is sufficiently heated in the vertical direction. The amount of high frequency waves that enter into the heating chamber is reduced, and abnormal heating of the mounting table 11 is not caused even by the high frequency waves that are irradiated into the heating chamber from the power supply port 4.

尚本実施例において傾斜部22.24の傾斜角は60°
と600という値に設定しているが、この角度は加熱室
10寸法、絞り部の寸法、あるいは被加熱物の種類、形
状によっては被加熱物10の加熱具合と、載置台11の
周辺部の温度の上昇の具合に応じて最適値全設定するよ
うにしている0また、土壁に設゛けた絞V部234+1
設けなくても載置台12の温度の上昇をある程度おさえ
る事が可能である。すなわち、載置台の外周部は攪拌板
90回転域に比較し、壁面エフの距離が近い為、加熱に
係る充分な高周波電界が生じないのは前述のごとくであ
る。
In this embodiment, the angle of inclination of the inclined portions 22 and 24 is 60°.
However, depending on the dimensions of the heating chamber 10, the dimensions of the constriction section, or the type and shape of the object to be heated, this angle may vary depending on the degree of heating of the object 10 and the peripheral area of the mounting table 11. All optimum values are set according to the degree of temperature rise.In addition, the throttle V part 234+1 installed in the earthen wall
Even if it is not provided, it is possible to suppress the temperature rise of the mounting table 12 to some extent. That is, as described above, since the distance between the wall surface F and the outer circumferential portion of the mounting table is shorter than that in the stirring plate 90 rotation range, a sufficient high-frequency electric field for heating is not generated.

さらに本実施例においては、載置台11と底壁3の間の
換気を行うため、ブロアーモーター300回転による負
圧により、この空間の空気を引き出す方法を示したが、
他の実施例としてこの空間の換気は逆にブロアーモータ
ー3oにより例えば通気口29等より強制的にこの空間
へ空気を送り込み正圧とし、他の通気口25.26等よ
り加熱室壁外へ排出させる事もあり得る。この場合は、
実施例に比較し、空気の流速が高く、載置台はさらに良
く冷却され、異常加熱を抑制するに効果的である。
Furthermore, in this embodiment, in order to ventilate between the mounting table 11 and the bottom wall 3, a method was shown in which the air in this space is drawn out by negative pressure generated by a blower motor 300 revolutions.
In another embodiment, this space is ventilated by forcing air into this space from, for example, a vent 29 using a blower motor 3o, creating a positive pressure, and then discharging it to the outside of the heating chamber wall from other vents 25, 26, etc. It is also possible to do so. in this case,
Compared to the example, the air flow rate is higher, the mounting table is further cooled, and it is effective in suppressing abnormal heating.

発明の効果 以上の構成により本発明は、当初の目的通シ被加熱物の
載置台の外周部分における異常加熱を未然に防ぐことが
出来る様になったと同時に以下のごとき効果も合わせて
得ることが出来る様になった0 (1)  被加熱物の加熱室内への出入にがかる扉と対
向する加熱室の前壁の接触部分等への高周波の進入が軽
減され電界が弱められる事でこの部分よりの高周波の漏
洩の軽減を計ることが出来た〇更にはこの部分の高周波
による加熱現象をも大幅に低減する事が出来、被加熱物
出入の際のこの接触部分に触れることによる火傷を未然
に防ぐ事が出来る様になV安全性を向上させる事が出来
た。
Effects of the Invention With the above-described configuration, the present invention achieves the original purpose of preventing abnormal heating in the outer peripheral portion of the mounting table for the object to be heated, and at the same time can also obtain the following effects. 0 (1) The entry of high frequency waves into the contact area of the front wall of the heating chamber facing the door through which the object to be heated enters and exits the heating chamber is reduced, and the electric field is weakened. We were able to reduce the leakage of high frequency waves in this area.In addition, we were able to significantly reduce the heating phenomenon caused by high frequency waves in this area, and prevent burns caused by touching this contact area when entering and exiting the heated object. We were able to improve V safety so that it could be prevented.

(23日影の絞り部と傾斜部を設け、この中で攪拌板を
回転させる事で、アンテナから見た負荷インピーダンス
の変動が従来にくらべきわめて少なくなり、従来、載置
台へ吸収されていた高周波が底面より被加熱物へ吸収さ
れることと相まって、大幅に加熱効率を向上する事がで
き念。
(23) By providing a constriction part and an inclined part in the shade, and rotating the stirring plate within this part, fluctuations in the load impedance seen from the antenna are extremely reduced compared to conventional methods, and high-frequency waves that were conventionally absorbed by the mounting table are Combined with the fact that the heat is absorbed into the heated object from the bottom, heating efficiency can be greatly improved.

特にこの傾向は軽負荷時に顕著に表われた。実施例にお
いて、マグネトロンに一定の入力電力゛  を印加した
場合、2Jの水負荷に対する260aoの水負荷時の高
周波出力の割合は、従来60〜66−程度であったもの
が80%以上の11ヲ得ることが出来るに至り、従来1
分の加熱時間を要していた被加熱物を46〜60秒にて
加熱する事が可能となったのである。
This tendency was particularly noticeable under light loads. In the example, when a constant input power ゛ is applied to the magnetron, the ratio of high frequency output at a water load of 260ao to a water load of 2J is 11゜, which is more than 80%, whereas the ratio of high frequency output when a water load of 260ao is conventionally about 60 to 66. It has now been possible to obtain
It is now possible to heat the object in 46 to 60 seconds, which used to take several minutes to heat.

【図面の簡単な説明】[Brief explanation of the drawing]

第1囚は本発明の実施例の要部を示す平面断面図、第2
図は本発明の実施例を示す側方断面口、第3図は従来例
を示す側方断面図である01・・・・・・加熱室、3・
・・・・・底壁、6・・・・・・給電口、7・・・・・
・アンテナ、9・・・・・・攪拌板、1o・・・・・・
被加熱物、11・・・・・・載置台、21・・・・・・
絞り部、22・・・・・・傾斜面、2B 、26.27
.28.29・・・・・・通気口0代理人の氏名 弁理
士 中 尾 敏 男 ほか1名第1図 第2図 第3rM
The first figure is a plan sectional view showing the main part of the embodiment of the present invention,
The figure shows a side sectional view showing an embodiment of the present invention, and FIG. 3 shows a side sectional view showing a conventional example.
...Bottom wall, 6...Power supply port, 7...
・Antenna, 9... Stirring plate, 1o...
Heated object, 11... Placement table, 21...
Aperture part, 22... Slanted surface, 2B, 26.27
.. 28.29・・・Vent 0 Name of agent Patent attorney Toshio Nakao and 1 other person Figure 1 Figure 2 Figure 3 rM

Claims (1)

【特許請求の範囲】[Claims] 本体内に加熱室を設け、その加熱室を構成する上壁及び
底壁の壁面の中央部にそれぞれ高周波の給電手段および
その給電手段を中心に回動する攪拌板を設け、少なくと
も前記底壁には被加熱物の載置領域と同等あるいはそれ
以下の前記攪拌板の回動領域と略同一寸法の外形で、前
記攪拌板の回転軸を中心とする被加熱物側に向って開い
たすり鉢状の傾斜面を周囲に有する円形の絞り部を設け
、さらにその絞り部より外側部分に通気口を設け、加熱
動作中、この絞り部より外側部分の換気を行なう構成と
を有する事を特長とする高周波加熱装置。
A heating chamber is provided in the main body, and a high-frequency power supply means and a stirring plate that rotates around the power supply means are provided at the center of the upper wall and bottom wall constituting the heating chamber, respectively, and at least the bottom wall is a mortar-shaped mortar with an outer shape that is approximately the same as the rotating area of the stirring plate, which is equal to or smaller than the mounting area of the object to be heated, and is open toward the object to be heated around the rotation axis of the stirring plate. It is characterized by having a configuration in which a circular constriction part having a sloping surface around the circumference is provided, and a vent is provided outside the constriction part, and the part outside the constriction part is ventilated during heating operation. High frequency heating device.
JP63046251A 1988-02-29 1988-02-29 High frequency heating equipment Expired - Lifetime JPH0824066B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63046251A JPH0824066B2 (en) 1988-02-29 1988-02-29 High frequency heating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63046251A JPH0824066B2 (en) 1988-02-29 1988-02-29 High frequency heating equipment

Publications (2)

Publication Number Publication Date
JPH01221886A true JPH01221886A (en) 1989-09-05
JPH0824066B2 JPH0824066B2 (en) 1996-03-06

Family

ID=12741949

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63046251A Expired - Lifetime JPH0824066B2 (en) 1988-02-29 1988-02-29 High frequency heating equipment

Country Status (1)

Country Link
JP (1) JPH0824066B2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6259436A (en) * 1985-09-04 1987-03-16 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ Communicating method for data

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6259436A (en) * 1985-09-04 1987-03-16 フィリップス エレクトロニクス ネムローゼ フェンノートシャップ Communicating method for data

Also Published As

Publication number Publication date
JPH0824066B2 (en) 1996-03-06

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