JPH01215775A - Production of glazed cement product - Google Patents

Production of glazed cement product

Info

Publication number
JPH01215775A
JPH01215775A JP4097688A JP4097688A JPH01215775A JP H01215775 A JPH01215775 A JP H01215775A JP 4097688 A JP4097688 A JP 4097688A JP 4097688 A JP4097688 A JP 4097688A JP H01215775 A JPH01215775 A JP H01215775A
Authority
JP
Japan
Prior art keywords
temperature
cement
glaze
cement substrate
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4097688A
Other languages
Japanese (ja)
Other versions
JP2542411B2 (en
Inventor
Takashi Soda
曽田 孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP63040976A priority Critical patent/JP2542411B2/en
Publication of JPH01215775A publication Critical patent/JPH01215775A/en
Application granted granted Critical
Publication of JP2542411B2 publication Critical patent/JP2542411B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To provide the title production process so designed that when the title product is to be manufactured, the temperature decrease after the calcination is first made at the glazed layer side before that at the cement substrate side, thereby preventing the warpage of the product or the intrusion of the glazed layer. CONSTITUTION:When the objective product A is to be manufactured by glazing 2 on a cement substrate 1 followed by calcination, the temperature decrease is first made at the glazed layer 2 side before that at the cement substrate 1 side. The calcination temperature and the melting temperature of the glazing agent are pref. <=900 deg.C, respectively. Thus, even if a glazing agent with low melting point and high shrinkage is used, the difference in the shrinkage between the cement substrate 1 and glazing agent 2 is small from the point at which the adhesive force between the substrate 1 and the glazed layer 2 begins to develop by starting solidification of the molten glazing agent to the point at which the temperature of the system is normal, the ensuring the warpage or intrusion 3 to be prevented.

Description

【発明の詳細な説明】[Detailed description of the invention]

r産業上の利用分野】 本発明は施釉セメント製品の反り、釉薬層の貫入を防止
する技術に関する。
1. Field of Industrial Application The present invention relates to a technique for preventing warpage of glazed cement products and penetration of the glaze layer.

【従来の技術】[Conventional technology]

従来より施釉セメント製品は、セメント基板に施釉した
後焼成して製造されている。焼成は雰囲気温度を上昇さ
せ釉薬を溶融させた後降温させることにより行なわれて
いる。
Glazed cement products have traditionally been manufactured by glazing a cement substrate and then firing it. Firing is carried out by raising the ambient temperature to melt the glaze, and then lowering the temperature.

【発明が解決しようとする課題】[Problem to be solved by the invention]

従来の施釉セメント製品A′には反りとか、釉薬層2に
貫入3が発生してしまっていた。 施釉セメント製品の反りとか貫入は焼成降温時に釉薬が
固化し常温に至るまでの収縮1!(熱線膨張係数)の差
によって決定される。即ち、釉薬の収縮量がセメント基
[1よりも大きい場合には第4図に示すように製品A′
は凸反りになり(同図(a))、釉薬層2に貫入3が入
る(同図(b))、逆の場合は、第5図に示すように製
品A′は6反りになり(同図(a))、釉薬層2が剥離
してしまう(同図(b))。 従って、釉薬とセメント基板の収縮量が等しくするのが
理想的ではあるが、施釉セメント製品は強度を高めるた
めに焼成後吸水させ、再びセメントの水利反応を行わせ
るので、セメント基板が吸水して膨張してもその力を吸
収できる程度に釉薬の収縮量よりもセメント基板の収縮
量が少し太き(なるように材料設計することが好ましい
。 一方、セメントの水和反応はあまり高温で焼成した後は
進行しない、一般的には焼成温度が900℃を超えると
、その後吸水しても水和反応があまり進行せず、高強度
の製品が得られない。 従って、セメント基板にとっては800℃以下で焼成す
るのが好ましいが、釉薬の方は、低温で溶融するタイプ
程、降温時に収縮量が大きいという傾向があり、従来の
方法では四部反りで釉薬層に貫入の入った製品した得ら
れないという問題があった。 本発明は上記事情に鑑みて為されたものであり、その目
的とするところは、反り及び釉薬層に貫入が発生しない
施釉セメント板の製造方法を提供することにある。 1課題を解決するための手段] 本発明の施釉セメント板の製造方法は、セメント基板1
に施釉し焼成して施釉セメント製品を製造する方法にお
いて、焼成降温時にセメント基板1gAよりも釉薬層2
側の温度を先に下げることを特徴とするものであり、こ
の構成により上記課題が達成されたものである。
In the conventional glazed cement product A', warpage and penetration 3 occurred in the glaze layer 2. Warpage and penetration of glazed cement products occur when the glaze solidifies during firing and shrinks until it reaches room temperature! (thermal expansion coefficient). That is, if the shrinkage amount of the glaze is larger than the cement base [1], the product A' as shown in FIG.
becomes a convex warp ((a) in the same figure), and a penetration 3 is made in the glaze layer 2 ((b) in the same figure).In the opposite case, as shown in Fig. 5, the product A' becomes warped by 6 ( (a) in the same figure, the glaze layer 2 peels off ((b) in the same figure). Therefore, it is ideal for the glaze and the cement substrate to have the same amount of shrinkage, but in order to increase the strength of glazed cement products, water is absorbed after firing and the cement undergoes the water-recycling reaction again, so the cement substrate absorbs water. It is preferable to design the material so that the amount of contraction of the cement substrate is slightly larger than the amount of contraction of the glaze to the extent that it can absorb the force even if it expands.On the other hand, the hydration reaction of cement is caused by firing at too high a temperature. In general, if the firing temperature exceeds 900℃, the hydration reaction will not proceed much even after water is absorbed, and a high-strength product will not be obtained.Therefore, for cement substrates, temperatures below 800℃ However, when it comes to glazes, the type that melts at a lower temperature tends to shrink more when the temperature cools down, and traditional methods result in products that are warped in all four parts and have penetration into the glaze layer. The present invention was made in view of the above circumstances, and its purpose is to provide a method for manufacturing a glazed cement board that does not cause warping or penetration into the glaze layer. 1. Means for Solving the Problems] The method for manufacturing a glazed cement board of the present invention includes a cement substrate 1
In a method of manufacturing a glazed cement product by applying glaze to a cement substrate and firing it, the glaze layer 2 is larger than the cement substrate 1gA when the temperature is lowered during firing.
This feature is characterized by lowering the temperature on the side first, and this configuration achieves the above object.

【作用1 焼成降温時にセメント基板1側よりも釉薬層2側の温度
を先に下げるので、溶融温度が低くて収縮量の大きい釉
薬を使用しても、溶融した釉薬が固化し始めセメント基
板1と接合力が出始める時から常温に至るまでのセメン
ト基板1と釉薬の収縮量に大きな差がなく、反り、貫入
等の発生が防止できるものである。 【実施例1 本発明において使用するセメント基板1は特に限定され
るものではなく、例えば、普通ポルトランドセメント、
アルミナセメント、早強セメント、ジェットセメン)等
の水硬性物質に骨材として、ケイ砂、シェルベン又は7
ライアツシユ等、焼成時に安定なものを配合し、その他
混和材料を添加した混線物を抄造成形あるいは押出成形
し、得られたセメント成形品を養生することにより製造
されたものである。 このセメント基板1の表面に釉薬が施され、焼成される
。釉薬は焼成後にセメントの水和反応を進行させるため
に800℃程度の温度で溶融するものが好ましい、この
ような釉薬としては例えば、成分(%)が5iOz:2
4.1/PbO:41.81/LitO:2,38/N
aaO:9.フ1/にJ:8.72/TiO2:9.5
7、5i02:2フ/PbO:51.5/BtOs:3
/NatO:8/TiO2:0.5/Zr0z:2.0
、SiOx:33/PbO:48.0/BzOs:3/
Na1O:8など溶融温度が600〜650℃のものを
挙げることができる。勿論、これらに限定されるもので
はない、尚、600℃以下で溶融する低温顔は耐候性、
耐摩耗性、耐薬品性等において所望の性能を期待できな
い場合があり、しかも一般的に高価であることもあって
好ましくはない。 次いで釉薬が施されたセメント基板1が焼成炉に入れら
れ、上面と下面から均一に温度をかけて焼成される。焼
成は外温工程UP%顆薬溶融工程MP、降温工程DPか
らなり、第1図に示すように徐々に昇温させ、セメント
基板1中のヒドロキシプロピルメチルセルロースのよう
な増粘剤とか水分の分解ガス成分を抜きながら、釉薬の
溶ける温度にまで上昇させる。そして釉薬の溶解した温
度を一定時間保ち、セメント基板1のガス成分を充分に
抜(と共に釉薬を均一にレベリングさせる。 この後、降温工程DPに入るが、下面、即ちセメント基
板11Mの温度よりも、上面、即ち釉薬層2側の温度を
先に下げる。 vi2図はセメント基板1及び釉薬層2の収縮量(熱線
膨張係数)と温度の関係を示しているが、降温時、釉薬
が固化し始め、セメント基板1との接合力が出始め粘性
になった時点での上面の温度をT2、下面の温度をT、
とすると、その温度から常温に冷却する迄のセメント基
板1と釉薬層2の収縮量はA1、A2となり、A+>A
tで釉薬でセメント基板1に圧縮をかけることができ、
凸反りで釉薬層2に貫入が生じない施釉セメント製品A
が得られる。尚、焼成後は吸水′!−せてセメントの水
和反応を進行させて強度を高めてお(。 ところで、セメント基板1gAの温度T、と釉薬層2@
の温度T2を同一とした場合には、T2から常温までの
セメント基板1と釉薬N2の収縮量はそれぞれAs、A
xであり、A2>1で釉薬層2の収縮量が大きいため得
られた製品は凹反りとなり、釉薬層2に貫入現象が発生
してしまう。 【発明の効果】 本発明は、セメント基板に施抛し焼成して施釉セメント
製品を製造する方法において、焼成降温時にセメント基
板側よりも釉薬層側の温度を先に下げるので、溶融温度
が低くて収縮量の大きい釉薬を使用しても、溶融した釉
薬が固化し始めセメント基板と接合力が出始める時から
常温に至るまでのセメント基板と釉薬の収縮量に大きな
差がなく、反りとか釉薬層の貫入の発生が防止で終るも
のであり、又、溶融温度の低い釉薬は流動性に優れるこ
とから、釉薬層にピンホ甲ル等の発生がすくなく、平滑
な仕上がり面を得ることができる。
[Effect 1] During firing, the temperature on the glaze layer 2 side is lowered earlier than on the cement substrate 1 side, so even if a glaze with a low melting temperature and a large shrinkage amount is used, the molten glaze begins to solidify and the cement substrate 1 There is no significant difference in the amount of shrinkage between the cement substrate 1 and the glaze from the time when bonding force begins to appear until the temperature reaches room temperature, and the occurrence of warping, penetration, etc. can be prevented. [Example 1] The cement substrate 1 used in the present invention is not particularly limited. For example, ordinary Portland cement,
Silica sand, shelben or 7
It is manufactured by blending a compound that is stable during firing, such as lye ash, and adding other admixture materials, paper-molding or extrusion molding, and curing the resulting cement molded product. A glaze is applied to the surface of this cement substrate 1 and fired. The glaze is preferably one that melts at a temperature of about 800°C to promote the hydration reaction of the cement after firing. For example, such a glaze has a composition (%) of 5iOz:2
4.1/PbO: 41.81/LitO: 2,38/N
aaO:9. F1/J:8.72/TiO2:9.5
7, 5i02:2F/PbO:51.5/BtOs:3
/NatO:8/TiO2:0.5/Zr0z:2.0
, SiOx:33/PbO:48.0/BzOs:3/
Examples include those having a melting temperature of 600 to 650°C, such as Na1O:8. Of course, it is not limited to these, but low-temperature faces that melt at 600°C or less have weather resistance,
Desired performance in terms of wear resistance, chemical resistance, etc. may not be expected in some cases, and moreover, it is generally expensive, so it is not preferable. Next, the cement substrate 1 coated with glaze is placed in a firing furnace and fired by applying a uniform temperature to the top and bottom surfaces. Firing consists of an external temperature step UP%, a granule melting step MP, and a temperature lowering step DP, in which the temperature is gradually raised as shown in Figure 1, and the thickener such as hydroxypropyl methylcellulose in the cement substrate 1 and water are decomposed. While removing gas components, raise the temperature to the point where the glaze melts. Then, the temperature at which the glaze is melted is maintained for a certain period of time, and the gas components of the cement substrate 1 are sufficiently removed (and the glaze is evenly leveled. After this, the temperature lowering step DP is started, but the temperature is lower than that of the lower surface, that is, the cement substrate 11M. , lower the temperature of the upper surface, that is, the glaze layer 2 side first. Figure VI2 shows the relationship between the shrinkage amount (thermal linear expansion coefficient) of the cement substrate 1 and the glaze layer 2 and the temperature, and when the temperature is lowered, the glaze solidifies. At the beginning, when the bonding force with the cement substrate 1 starts to appear and becomes viscous, the temperature of the upper surface is T2, the temperature of the lower surface is T,
Then, the amount of shrinkage of the cement substrate 1 and glaze layer 2 from that temperature to room temperature is A1, A2, and A+>A.
Compression can be applied to the cement substrate 1 with glaze at t,
Glazed cement product A that does not penetrate the glaze layer 2 due to convex warping
is obtained. In addition, it absorbs water after firing! - At the same time, the hydration reaction of the cement proceeds to increase its strength (. By the way, the temperature T of the cement substrate 1 gA and the glaze layer 2 @
When the temperature T2 is the same, the shrinkage amounts of the cement substrate 1 and the glaze N2 from T2 to room temperature are As and A, respectively
x, and when A2>1, the amount of shrinkage of the glaze layer 2 is large, so the obtained product becomes concavely warped, and a penetration phenomenon occurs in the glaze layer 2. Effects of the Invention In the method of manufacturing glazed cement products by coating and firing a cement substrate, the present invention lowers the temperature on the glaze layer side earlier than the cement substrate side during firing, so the melting temperature is low. Even if a glaze with a large amount of shrinkage is used, there is no significant difference in the amount of shrinkage between the cement substrate and glaze from the time when the molten glaze begins to solidify and develop bonding force with the cement substrate until it reaches room temperature, and there is no possibility of warpage or glaze shrinkage. This prevents the occurrence of layer penetration, and since a glaze with a low melting temperature has excellent fluidity, pinholes and the like are less likely to occur in the glaze layer, and a smooth finished surface can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例における焼成時間と雰囲気温
度との関係を示すグラフ、第2図は温度と収縮量との関
係を示すグラブ、第3図は同上により得られた施釉セメ
ント製品を示す断面図、第4図(a)(b)及び第5図
(a)(b)は従来の方法により製造した施鞘セメント
製品を示す断面図であって、Aは施稽セメント製品、1
はセメント基板、2は釉薬層である。 代理人 弁理士 石 1)長 七 笥13 2v3 盲3悶
Fig. 1 is a graph showing the relationship between firing time and ambient temperature in one embodiment of the present invention, Fig. 2 is a graph showing the relationship between temperature and shrinkage amount, and Fig. 3 is a glazed cement product obtained by the above method. 4(a)(b) and FIG. 5(a)(b) are cross-sectional views showing applied cement products manufactured by conventional methods, where A is an applied cement product, 1
2 is a cement substrate, and 2 is a glaze layer. Agent Patent Attorney Ishi 1) Chief Shichiman 13 2v3 Blind 3 Agony

Claims (3)

【特許請求の範囲】[Claims] (1)セメント基板に施釉し焼成して施釉セメント製品
を製造する方法において、焼成降温時にセメント基板側
よりも釉薬層側の温度を先に下げることを特徴とする施
釉セメント製品の製造方法。
(1) A method for manufacturing a glazed cement product by applying a glaze to a cement substrate and firing it, which is characterized in that the temperature on the glaze layer side is lowered earlier than on the cement substrate side when the temperature is lowered during firing.
(2)焼成温度が900℃以下であることを特徴とする
請求項1記載の施釉セメント製品の製造方法。
(2) The method for producing a glazed cement product according to claim 1, characterized in that the firing temperature is 900°C or less.
(3)釉薬の溶融温度が900℃以下であることを特徴
とする請求項1記載の施釉セメント製品の製造方法。
(3) The method for producing a glazed cement product according to claim 1, characterized in that the melting temperature of the glaze is 900° C. or lower.
JP63040976A 1988-02-24 1988-02-24 Glazed cement product manufacturing method Expired - Lifetime JP2542411B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63040976A JP2542411B2 (en) 1988-02-24 1988-02-24 Glazed cement product manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63040976A JP2542411B2 (en) 1988-02-24 1988-02-24 Glazed cement product manufacturing method

Publications (2)

Publication Number Publication Date
JPH01215775A true JPH01215775A (en) 1989-08-29
JP2542411B2 JP2542411B2 (en) 1996-10-09

Family

ID=12595472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63040976A Expired - Lifetime JP2542411B2 (en) 1988-02-24 1988-02-24 Glazed cement product manufacturing method

Country Status (1)

Country Link
JP (1) JP2542411B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151386A (en) * 1982-03-03 1983-09-08 工業技術院長 Glazed cement baked body
JPS5992981A (en) * 1982-11-16 1984-05-29 旭化成株式会社 Foamed concrete laminated with glaze layer and manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151386A (en) * 1982-03-03 1983-09-08 工業技術院長 Glazed cement baked body
JPS5992981A (en) * 1982-11-16 1984-05-29 旭化成株式会社 Foamed concrete laminated with glaze layer and manufacture

Also Published As

Publication number Publication date
JP2542411B2 (en) 1996-10-09

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