JPH01206598A - High voltage power supply for x-ray generating device - Google Patents

High voltage power supply for x-ray generating device

Info

Publication number
JPH01206598A
JPH01206598A JP2872488A JP2872488A JPH01206598A JP H01206598 A JPH01206598 A JP H01206598A JP 2872488 A JP2872488 A JP 2872488A JP 2872488 A JP2872488 A JP 2872488A JP H01206598 A JPH01206598 A JP H01206598A
Authority
JP
Japan
Prior art keywords
voltage
high voltage
signal
command
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2872488A
Other languages
Japanese (ja)
Inventor
Hiroshi Munakata
広志 宗像
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Original Assignee
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIGAKU DENKI KK, Rigaku Denki Co Ltd filed Critical RIGAKU DENKI KK
Priority to JP2872488A priority Critical patent/JPH01206598A/en
Publication of JPH01206598A publication Critical patent/JPH01206598A/en
Pending legal-status Critical Current

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  • X-Ray Techniques (AREA)

Abstract

PURPOSE:To separate a high voltage control part from a high voltage generating part, prevent electromagnetic obstacle, and ensure stability by converting a command voltage into an optical pulse, transmitting to the high voltage generating part side via photo-conductive path, applying reversely converting treatment, and thereby reproducing the command voltage. CONSTITUTION:A command voltage a (and b) generated by a high voltage control part 14 is first converted into a signal c (c') with a frequency proportional to the voltage, and further into an optical pulse d (d') having the frequency of signal c (c'). The pulse d (d') is sent to the high voltage generating part 16 side via a photo- conductive path. On this generating part 16 side, the pulse d (d') is converted photoelectrically to obtain a signal g (g'), which is frequency-electrically converted so as to reproduce the original command voltage h (h'). On the basis of this command voltage h (h') the generating part 16 generates as objective impression voltage and supply current, which is impressed on and supplied to an X-ray bulb 10. Accordingly the control part 14 and generating part 16 are perfectly separated in electrical terms by the photo-conductive path. Thereby no electromagnetic obstacle likely to be generated by the generating part 16 will be transmitted, and operators for the control part 14 are free of high voltage to ensure their safety.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、X線発生装置の高圧電源装置に関し、特に、
指令信号を制御部から高圧発生部に伝える方式に特徴の
ある高圧電源装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a high-voltage power supply device for an X-ray generator, and in particular,
The present invention relates to a high voltage power supply device characterized by a method of transmitting a command signal from a control section to a high voltage generation section.

[従来の技術] X線発生装置は、第3図に示すように、X線管球10と
、これに高電圧を印加するための高圧電源装置12とか
らなる。高圧電源装置12は、さらに、X線管球10へ
の印加電圧および供給電流に対応する指令信号を発生す
る高電圧制御部14と、この指令信号に対応した印加電
圧および供給電流をX線管球10に印加、供給する高電
圧発生部16とからなる。指令信号としては、印加電圧
(kV単位)に対応する印加電圧指令電圧aと、供給電
流(mA単位)に対応する供給電流指令電圧すとがある
[Prior Art] As shown in FIG. 3, an X-ray generator includes an X-ray tube 10 and a high-voltage power supply 12 for applying a high voltage thereto. The high-voltage power supply device 12 further includes a high-voltage control section 14 that generates a command signal corresponding to the applied voltage and supplied current to the X-ray tube 10, and a high-voltage control section 14 that generates a command signal corresponding to the applied voltage and supplied current to the X-ray tube 10, and a high-voltage control section 14 that generates a command signal corresponding to the applied voltage and supplied current to the It consists of a high voltage generating section 16 that applies and supplies to the bulb 10. The command signals include an applied voltage command voltage a corresponding to the applied voltage (in kV units) and a supply current command voltage S corresponding to the supplied current (in mA units).

[発明が解決しようとする課題] この種の高圧電源装置では、高電圧発生部において大電
力で高速スイッチングを行うため、これによる電磁障害
が発生する。この電磁障害は、電気配線を伝って高電圧
制御部に影響を及ぼすことがある。近年、高電圧761
1111部にマイクロコンピュータを搭載して、外部信
号に基づいてX線管球の電圧、電流を制御することが行
われてきており、高電圧制御部はディジタル制御される
ようになってきている。上述の電磁障害はこのようなマ
イクロコンピュータ制御に悪影響を及ぼすことが考えら
れ、これを防止する必要が出てきている。
[Problems to be Solved by the Invention] This type of high-voltage power supply device performs high-speed switching with large power in the high-voltage generating section, which causes electromagnetic interference. This electromagnetic interference can be transmitted through electrical wiring and affect the high voltage control section. In recent years, high voltage 761
A microcomputer has been installed in the 1111 section to control the voltage and current of the X-ray tube based on external signals, and the high voltage control section has come to be digitally controlled. The electromagnetic interference described above is thought to have an adverse effect on such microcomputer control, and there is a need to prevent this.

また、高電圧制御部には、X線管球への印加電圧、供給
電流を手動で設定するための操作盤が設けられているが
、操作者に対する安全性の面から、高電圧を発生する高
電圧発生部と操作盤とを電気的に完全に切り離すことが
できれば、安心である。
In addition, the high voltage control section is equipped with an operation panel for manually setting the applied voltage and supply current to the X-ray tube, but from the standpoint of operator safety, the high voltage is not generated. It would be safer if the high voltage generator and the operation panel could be electrically separated completely.

以上の点に鑑み、本発明の目的は、高電圧制御部と高電
圧発生部とを電気的に完全に切り離して、電磁障害の防
止と安全性の確保とを図った、X線発生装置の高圧電源
装置を提供することにある。
In view of the above points, an object of the present invention is to provide an X-ray generator that completely electrically separates a high voltage control section and a high voltage generation section to prevent electromagnetic interference and ensure safety. The purpose of the present invention is to provide a high voltage power supply device.

[課題を解決するための手段] 上述の目的を達成するために、本発明に係る高圧電源装
置は、次の構成要素を有する。
[Means for Solving the Problems] In order to achieve the above object, a high voltage power supply device according to the present invention has the following components.

(a) X線管球への印加電圧および供給電流に対応す
る印加電圧指令電圧および供給電流指令電圧を発生する
高電圧制御部。
(a) A high voltage control section that generates an applied voltage command voltage and a supply current command voltage corresponding to the applied voltage and supply current to the X-ray tube.

(b)前記印加電圧指令電圧および供給電流指令電圧の
大きさに比例する周波数の電気信号を発生する電圧−周
波数変換器。
(b) A voltage-frequency converter that generates an electrical signal with a frequency proportional to the magnitudes of the applied voltage command voltage and the supply current command voltage.

(c)前記電気信号を光信号に変換する電気−光変換器
(c) an electrical-optical converter that converts the electrical signal into an optical signal;

(d)前記光信号を伝送する光伝送路。(d) An optical transmission line for transmitting the optical signal.

(e)前記光伝送路からの光信号を電気信号に変換する
光−電気変換器。
(e) An optical-to-electrical converter that converts the optical signal from the optical transmission line into an electrical signal.

(f)前記光−電気変換器からの電気信号を、この電気
信号の周波数に比例する大きさの印加電圧指令電圧およ
び供給電流指令電圧に変換する周波数−電圧変換器。
(f) A frequency-voltage converter that converts the electrical signal from the optical-to-electrical converter into an applied voltage command voltage and a supply current command voltage whose magnitude is proportional to the frequency of the electrical signal.

(0)前記周波数−電圧変換器からの印加電圧指令電圧
および供給電流指令電圧に対応する印加電圧および供給
電流をX線管球に印加、供給する高電圧発生部。
(0) A high voltage generation unit that applies and supplies an applied voltage and a supply current corresponding to the applied voltage command voltage and supply current command voltage from the frequency-voltage converter to the X-ray tube.

[作用] 高電圧!IJ m部で発生する2種類の指令電圧は、ま
ず、その電圧に比例する周波数の電気信号に変換され、
ざらに、電気−光変換される。すなわち、指令電圧の大
きざに比例した周波数を有する光パルスとなる。この光
パルスは、光ファイバなどの光伝送路を経由して、高電
圧発生部側に送られる。
[Action] High voltage! The two types of command voltages generated in the IJ m section are first converted into electrical signals with frequencies proportional to the voltages,
Roughly, electricity is converted into light. In other words, it becomes a light pulse having a frequency proportional to the magnitude of the command voltage. This optical pulse is sent to the high voltage generator side via an optical transmission line such as an optical fiber.

高電圧発生部側では、この光パルスを、光−電気変換し
て、ざらに周波数−電圧変換し、元の指令電圧を再現す
る。この指令電圧に基づいて高電圧発生部では目的の印
加電圧および供給電流を発生し、これをX線管球に印加
、供給する。したがって、高電圧制御部と高電圧発生部
とは光伝送路によって電気的に完全に切り離される。
On the high voltage generator side, this optical pulse is subjected to optical-to-electrical conversion and roughly frequency-to-voltage conversion to reproduce the original command voltage. Based on this command voltage, the high voltage generator generates a target applied voltage and supply current, and applies and supplies them to the X-ray tube. Therefore, the high voltage control section and the high voltage generation section are completely electrically separated by the optical transmission line.

[実施例] 次に、図面を参照して本発明の詳細な説明する。[Example] Next, the present invention will be described in detail with reference to the drawings.

第1図は本発明の一実施例のブロック回路図である。こ
の図に示すX線発生装置は、X線管球10と、高電圧制
御部14から高電圧発生部16に至る高圧電源装置とか
らなる。高電圧制御部14からは指令信号として、印加
電圧指令電圧aと供給電流指令電圧すとが出力される。
FIG. 1 is a block circuit diagram of one embodiment of the present invention. The X-ray generator shown in this figure consists of an X-ray tube 10 and a high-voltage power supply that extends from a high-voltage control section 14 to a high-voltage generation section 16. The high voltage control section 14 outputs an applied voltage command voltage a and a supply current command voltage S as command signals.

この2種類の指令電圧を高電圧発生部16に伝えるため
に、2系統の信号伝達系が存在する。この2系統の信号
伝達系は基本的に同じ構成であるので、主として印加電
圧指令電圧aについての信号伝達系を説明する。
Two signal transmission systems exist to transmit these two types of command voltages to the high voltage generation section 16. Since these two signal transmission systems basically have the same configuration, the signal transmission system for the applied voltage command voltage a will be mainly explained.

高電圧制御部14から出力された印加電圧指令電圧aは
、電圧−周波数変換器18、電気−光変換器20、光−
電気変換器22、周波数−電圧変換器24を介して高電
圧発生部16に伝えられる。
The applied voltage command voltage a output from the high voltage control section 14 is applied to a voltage-frequency converter 18, an electric-to-optical converter 20, an optical-
The signal is transmitted to the high voltage generator 16 via an electrical converter 22 and a frequency-voltage converter 24.

電気−光変換器20と光−電気変換器22との間は、光
ファイバで接続される。
The electrical-optical converter 20 and the optical-electrical converter 22 are connected by an optical fiber.

次に、この実施例の動作を説明する。第2図は、印加電
圧指令電圧aに対するタイミングチャートである。印加
電圧指令電圧aは、その電圧の大きざが信号情報となる
。この印加電圧指令電圧aは、電圧−周波数変換器18
で、指令電圧aの大きさに比例する周波数の電気信号C
に変換される。この電気信号Cは、この実施例では、強
弱二つの正の電圧の間で切り替わるパルス信号にされる
。この電気信号Cでは、周波数の大きざが信号情報とな
る。この電気信号Cは、電気−光変換器20で光パルス
信号dに変換される。電気−光変換器20としてはLE
Dが使用され、発光強度の異なる二つのレベルを有する
光パルス信号dが1qられる。この光パルス信号dは、
光ファイバを介して光−電気変換器22に送られ、ここ
で電気信号qに変換される。光−電気変換器22として
はホトトランジスタが使用され、二つの電圧レベルを有
する電気信号が得られる。この電気信号をコンパレータ
で2値化して電気パルス信@qが得られる。
Next, the operation of this embodiment will be explained. FIG. 2 is a timing chart for applied voltage command voltage a. For the applied voltage command voltage a, the magnitude difference of the voltage becomes signal information. This applied voltage command voltage a is applied to the voltage-frequency converter 18
Then, an electric signal C with a frequency proportional to the magnitude of the command voltage a
is converted to In this embodiment, this electrical signal C is made into a pulse signal that switches between two positive voltages, strong and weak. In this electrical signal C, the difference in frequency becomes signal information. This electrical signal C is converted into an optical pulse signal d by an electrical-optical converter 20. LE as the electrical-optical converter 20
D is used, and an optical pulse signal d having two different levels of emitted light intensity is 1q. This optical pulse signal d is
It is sent via an optical fiber to an optical-to-electrical converter 22, where it is converted into an electrical signal q. A phototransistor is used as the optical-to-electrical converter 22, and an electrical signal with two voltage levels is obtained. This electrical signal is binarized by a comparator to obtain an electrical pulse signal @q.

この電気パルス信号qは周波数−電圧変換器24で電圧
に変換されて印加電圧指令電圧りが(qられる。この電
圧りは、元の印加電圧指令電圧aと同じものである。高
電圧発生部16ではこの印加電圧信号りに対応した高電
圧を発生し、これがX線管球10に印加される。
This electric pulse signal q is converted into a voltage by the frequency-voltage converter 24 and the applied voltage command voltage q is obtained. This voltage is the same as the original applied voltage command voltage a. At 16, a high voltage corresponding to this applied voltage signal is generated, and this is applied to the X-ray tube 10.

供給電流指令電圧すについてもまったく同様に処理され
て高電圧発生部16に伝えられる。そして、目的の供給
電流がX線管球10に供給される。
The supply current command voltage is also processed in exactly the same way and is transmitted to the high voltage generation section 16. Then, the target supply current is supplied to the X-ray tube 10.

2種類の指令電圧としては直流O〜IOVの範囲の電圧
が使用され、変換される周波数としてはO〜100kH
2の範囲の値が使用される。
As the two types of command voltages, voltages in the range of DC O to IOV are used, and the converted frequency is O to 100kHz.
A range of values of 2 is used.

なお、上述の実施例では、印加電圧指令電圧aとしてア
ナログ値を利用したが、ディジタル信号(印加電圧に対
応した数値を2進化したもの)を利用しても良く、この
場合はディジタル信号を直接周波数に変換すれば良い。
In the above embodiment, an analog value was used as the applied voltage command voltage a, but a digital signal (a binary coded value corresponding to the applied voltage) may also be used, and in this case, the digital signal can be directly converted into Just convert it to frequency.

本発明は、高電圧制御部から高電圧発生部に指令信号を
伝達する際に、所定の変換処理を施して、高電圧制御部
と高電圧発生部とを電気的に切り離すものであるが、逆
に高電圧発生部から高電圧il制御部に信号を送る場合
も考えられる。例えば、X線管球の実際の電圧および電
流を、高電圧制御部の制御盤上に表示する場合である。
In the present invention, when transmitting a command signal from a high voltage control section to a high voltage generation section, a predetermined conversion process is performed to electrically separate the high voltage control section and the high voltage generation section. Conversely, it is also possible to send a signal from the high voltage generation section to the high voltage il control section. For example, the actual voltage and current of the X-ray tube may be displayed on the control panel of the high voltage control section.

この場合は、これら電圧と電流に関する情報を、高電圧
発生部から高電圧制御部に伝達する必要がある。このよ
うな目的に対しては、それほど高精度を必要としないの
で、通常のアイソレーションアンプを利用することがで
きる。もし、高精度を必要とするのであれば、本発明と
同様の変換処理を施してやれば良い。
In this case, it is necessary to transmit information regarding these voltages and currents from the high voltage generation section to the high voltage control section. For such purposes, a normal isolation amplifier can be used since very high precision is not required. If high precision is required, conversion processing similar to that of the present invention may be performed.

[発明の効果] 以上説明したように本発明は、高電圧制御部で発生する
指令電圧を周波数に変換し、ざらに光パルスに変換して
、これを光伝送路で高電圧発生部側に伝え、逆の変換処
理を施して指令電圧を再環するようにしたので、高電圧
制御部と高電圧発生部とを光伝送路によって電気的に完
全に切り離すことができる。したがって、高電圧発生部
で発生する電磁障害が電気配線を伝って高電圧制御部に
影響を及ぼすことがなくなる。ざらに、高電圧制御部は
高電圧と電気的に切り離されるために操作者の安全が確
保される。
[Effects of the Invention] As explained above, the present invention converts the command voltage generated in the high voltage control section into a frequency, roughly converts it into an optical pulse, and transmits this to the high voltage generation section side through an optical transmission line. Since the command voltage is transmitted and recirculated by performing the reverse conversion process, the high voltage control section and the high voltage generation section can be electrically completely separated by the optical transmission line. Therefore, electromagnetic interference generated in the high voltage generation section will not be transmitted through the electrical wiring and affect the high voltage control section. In general, the high voltage control section is electrically isolated from the high voltage, ensuring operator safety.

また、光伝送路を延長することによって高電圧制御部と
高電圧発生部とを長い距離だけ隔てることができ、高電
圧発生部を遠隔ff1ll 1できるようになる。電気
配線を経由して指令電圧を高電圧発生部に伝えるような
従来の高圧電源装置では、もし電気配線を延長すれば、
電圧降下を生じたり、電気配線がアンテナになってしま
ったりで、好ましくないものである。
Further, by extending the optical transmission line, the high voltage control section and the high voltage generation section can be separated by a long distance, and the high voltage generation section can be remotely connected. With conventional high-voltage power supplies that transmit command voltage to the high-voltage generator via electrical wiring, if the electrical wiring is extended,
This is undesirable because it causes a voltage drop and the electrical wiring becomes an antenna.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例のブロック回路図、第2図は
この実施例のタイミングチャート、第3図は従来例のブ
ロック回路図である。 10・・・X線管球 14・・・高電圧制御部 16・・・高電圧発生部 18・・・電圧−周波数変換器 20・・・電気−光変換器 22・・・光−電気変換器 24・・・周波数−電圧変換器 時間 を 第2図
FIG. 1 is a block circuit diagram of an embodiment of the present invention, FIG. 2 is a timing chart of this embodiment, and FIG. 3 is a block circuit diagram of a conventional example. 10...X-ray tube 14...High voltage control section 16...High voltage generation section 18...Voltage-frequency converter 20...Electricity-optical converter 22...Optical-electrical conversion Figure 2 shows the frequency-voltage converter time.

Claims (1)

【特許請求の範囲】[Claims] (1)次の構成要素を有するX線発生装置の高圧電源装
置。 (a)X線管球への印加電圧および供給電流に対応する
印加電圧指令電圧および供給電流指令電圧を発生する高
電圧制御部。 (b)前記印加電圧指令電圧および供給電流指令電圧の
大きさに比例する周波数の電気信号を発生する電圧−周
波数変換器。 (c)前記電気信号を光信号に変換する電気−光変換器
。 (d)前記光信号を伝送する光伝送路。 (e)前記光伝送路からの光信号を電気信号に変換する
光−電気変換器。 (f)前記光−電気変換器からの電気信号を、この電気
信号の周波数に比例する大きさの印加電圧指令電圧およ
び供給電流指令電圧に変換する周波数−電圧変換器。 (g)前記周波数−電圧変換器からの印加電圧指令電圧
および供給電流指令電圧に対応する印加電圧および供給
電流をX線管球に印加、供給する高電圧発生部。
(1) A high-voltage power supply device for an X-ray generator having the following components: (a) A high voltage control unit that generates an applied voltage command voltage and a supply current command voltage corresponding to the applied voltage and supply current to the X-ray tube. (b) A voltage-frequency converter that generates an electrical signal with a frequency proportional to the magnitudes of the applied voltage command voltage and the supply current command voltage. (c) an electrical-optical converter that converts the electrical signal into an optical signal; (d) An optical transmission line for transmitting the optical signal. (e) An optical-to-electrical converter that converts the optical signal from the optical transmission line into an electrical signal. (f) A frequency-voltage converter that converts the electrical signal from the optical-to-electrical converter into an applied voltage command voltage and a supply current command voltage whose magnitude is proportional to the frequency of the electrical signal. (g) A high voltage generation unit that applies and supplies an applied voltage and a supply current corresponding to the applied voltage command voltage and supply current command voltage from the frequency-voltage converter to the X-ray tube.
JP2872488A 1988-02-12 1988-02-12 High voltage power supply for x-ray generating device Pending JPH01206598A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2872488A JPH01206598A (en) 1988-02-12 1988-02-12 High voltage power supply for x-ray generating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2872488A JPH01206598A (en) 1988-02-12 1988-02-12 High voltage power supply for x-ray generating device

Publications (1)

Publication Number Publication Date
JPH01206598A true JPH01206598A (en) 1989-08-18

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Application Number Title Priority Date Filing Date
JP2872488A Pending JPH01206598A (en) 1988-02-12 1988-02-12 High voltage power supply for x-ray generating device

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005055676A1 (en) * 2003-12-01 2005-06-16 Hamamatsu Photonics K.K. Power supply and x-ray generating device including it
JP2007256022A (en) * 2006-03-22 2007-10-04 Institute Of National Colleges Of Technology Japan Method and device for measuring loss current by high-potential-side detection type-displacement current bypass method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661845A (en) * 1979-10-24 1981-05-27 Mitsubishi Electric Corp Optical transmission device
JPS616679U (en) * 1984-06-19 1986-01-16 三菱電機株式会社 starter
JPS62222169A (en) * 1985-12-30 1987-09-30 Nissin Electric Co Ltd Beam current measurement apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661845A (en) * 1979-10-24 1981-05-27 Mitsubishi Electric Corp Optical transmission device
JPS616679U (en) * 1984-06-19 1986-01-16 三菱電機株式会社 starter
JPS62222169A (en) * 1985-12-30 1987-09-30 Nissin Electric Co Ltd Beam current measurement apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005055676A1 (en) * 2003-12-01 2005-06-16 Hamamatsu Photonics K.K. Power supply and x-ray generating device including it
JP2007256022A (en) * 2006-03-22 2007-10-04 Institute Of National Colleges Of Technology Japan Method and device for measuring loss current by high-potential-side detection type-displacement current bypass method

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