JPH01204482A - Dewar vessel for liquid hydrogen - Google Patents
Dewar vessel for liquid hydrogenInfo
- Publication number
- JPH01204482A JPH01204482A JP63028082A JP2808288A JPH01204482A JP H01204482 A JPH01204482 A JP H01204482A JP 63028082 A JP63028082 A JP 63028082A JP 2808288 A JP2808288 A JP 2808288A JP H01204482 A JPH01204482 A JP H01204482A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- liquid hydrogen
- liq
- gas
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 41
- 239000001257 hydrogen Substances 0.000 title claims abstract description 40
- 239000007788 liquid Substances 0.000 title claims abstract description 39
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 33
- 239000007789 gas Substances 0.000 claims abstract description 26
- 230000001105 regulatory effect Effects 0.000 claims abstract description 13
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 11
- 239000001307 helium Substances 0.000 claims abstract description 8
- 229910052734 helium Inorganic materials 0.000 claims abstract description 8
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000007599 discharging Methods 0.000 abstract 2
- 238000007598 dipping method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 238000004880 explosion Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002887 superconductor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/32—Hydrogen storage
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Containers, Films, And Cooling For Superconductive Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、液体水素を貯蔵する液体水素用デユワ−Ｅ
こ関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention is directed to a liquid hydrogen dewar-E for storing liquid hydrogen.
This is related to this.
第３図は液体ヘリウム（以下Ｌｉｑ、Ｈ，ｐ と略す
）や液体水素（以下Ｌｉｑ、Ｈ２と略す］等を貯蔵する
ために用いられるデユワ−であり、例えば文献（電気学
会、ジョセフソン効果〈基礎と応用） Ｐ３０３〜ｐ３
０７ ） ｆこ示されている。図において、（１）は真
空槽、（２）はＬｉｑ、Ｎ２タンク、α力はこのＬｉｑ
、Ｎｚタンク（２）の中に貯えられるＬｉｑ、Ｎ２、（
４）はＬｉｑ、Ｎｚタンク、（５）はＬｉＱ、Ｈｚ−（
６１はＬｉｑ、Ｈｚ（５３をタンク（４）に導入する導
入管、■は水素ガス（以下Ｇａ５Ｈ２と略す）をタンク
（４）から導出する導出管、（８）はＬｉｑ、Ｈ２導入
バルブ、（９）はＧａ５Ｈ２導出バルブ、σＯはＧａ５
Ｈｚ、（７）はＬｉｑ、Ｎ２中に浸漬された被冷却体で
ある。Figure 3 shows a dewar used to store liquid helium (hereinafter abbreviated as Liq, H, p), liquid hydrogen (hereinafter abbreviated as Liq, H2), etc. Basics and Applications) P303-p3
07) f is shown. In the figure, (1) is a vacuum tank, (2) is a Liq, N2 tank, and α force is this Liq
, Liq, N2, (
4) is Liq, Nz tank, (5) is LiQ, Hz-(
61 is an introduction pipe that introduces Liq, Hz (53) into the tank (4), ■ is an outlet pipe that leads out hydrogen gas (hereinafter abbreviated as Ga5H2) from the tank (4), (8) is a Liq, H2 introduction valve, ( 9) is Ga5H2 derivation valve, σO is Ga5
Hz, (7) is the object to be cooled immersed in Liq, N2.
次に一動作について説明する。真空槽（１）の内部は真
空になっている。まずＬｉｑ、Ｎ２導入管叫からＬｉｑ
。Next, one operation will be explained. The inside of the vacuum chamber (1) is evacuated. First, Liq, from the N2 introduction pipe cry
.
Ｎ２０をＬｉｑ、Ｎ２タンク（２）＃ζ導入〜する。Ｌ
ｉｑ、Ｎ２σηの温度は大気圧で約−１９５，９℃であ
り、タンク（２）もこの温度に冷却される。次にＬｉｑ
、Ｈ２導入管（６）からＬｉｑ。Introduce N20 into Liq and N2 tank (2) #ζ. L
The temperature of iq, N2ση is approximately −195.9° C. at atmospheric pressure, and the tank (2) is also cooled to this temperature. Next, Liq
, Liq from the H2 inlet tube (6).
Ｈｚ（５）をＬｉｑ、Ｎ２タンク（４）に導入する。Ｌ
ｉｑ、Ｈｚ（５）の温度は大気圧で約−２５３℃であり
、被冷却体（７）は、この温度まで冷却される。被冷却
体（７）は例えば、酸化物超伝導体を用いた超伝導マグ
ネットである。Hz (5) is introduced into the Liq, N2 tank (4). L
The temperature of iq, Hz (5) is approximately -253° C. at atmospheric pressure, and the object to be cooled (7) is cooled to this temperature. The object to be cooled (7) is, for example, a superconducting magnet using an oxide superconductor.
Ｌｉｑ、Ｎ２タンク（２〕は、 Ｌｉｑ、Ｎｚタンク（
４）への放射ｌこよる熱侵入を防ぐ働きをする。Ｌｉｑ
、Ｎ２タンク（４）への侵入熱や、被冷却体（７）の発
熱等によって、Ｌ、ｉｑ、Ｈｚ（５）は蒸発してＧａｓ
Ｈｚ ＣＧとなり、密封状態ではＬｉｑ。Liq, N2 tank (2) is Liq, Nz tank (
4) Works to prevent heat from entering due to radiation. Liq
, L, iq, and Hz (5) evaporate and become Gas due to heat entering the N2 tank (4) and heat generated by the object to be cooled (7).
Hz CG, Liq in sealed state.
Ｈ２タンク（４）内の圧力が上昇するので、Ｇａ５Ｈｚ
導出バルブ（９）を開きＧａ５Ｈｚ導出管ａ３を通して
Ｇａ５Ｈ２を外部に取りだし、Ｌｉｑ、Ｈ２タンク（４
）内の圧力を一定］こ保つ。Ｇａ５Ｈ２は爆発性がある
ので取扱いには十分な注意が必要である。Ｌｉｑ、Ｈｚ
（５）の温度を下げて実験する場合には、Ｇａ５Ｈｚ導
出管（６）の先に真空ポンプ（図示せず）を取り付け、
Ｌｉｑ、Ｈｚタンク（４）内の圧力を減圧する。この場
合１こはフランジシール面からの空気の混入に十分注意
して行なう。As the pressure inside the H2 tank (4) increases, Ga5Hz
Open the outlet valve (9) and take out Ga5H2 to the outside through the Ga5Hz outlet pipe a3.
) to keep the pressure constant. Ga5H2 is explosive and must be handled with great care. Liq, Hz
When experimenting by lowering the temperature of (5), attach a vacuum pump (not shown) to the end of the Ga5Hz outlet pipe (6),
Reduce the pressure in the Liq, Hz tank (4). In this case, be careful to prevent air from entering from the flange seal surface.
従来の液体水素用デユワ−は以上のように構成されてい
るので、１００％の濃度のＧａ５Ｈ２を外部に取り出す
必要があり、爆発事故等が生じる危険が太きいという問
題があった。また減圧して用いる場合には空気の混入に
よる爆発の危険性もある。Since the conventional dewar for liquid hydrogen is constructed as described above, it is necessary to take out Ga5H2 at a concentration of 100% to the outside, which poses a problem in that there is a great risk of an explosion or the like. Furthermore, when used under reduced pressure, there is a risk of explosion due to air being mixed in.
この発明は上記のような問題点を解消するためになされ
たもので−取り出すＧａ５Ｈ２の濃度を低くで゛きると
ともｆこ、減圧時においてもＬｉｑ、Ｈ２タンクへの空
気の混入を防止することができる安全な液体水素用デユ
ワ−を得ることを目的とする。This invention was made to solve the above-mentioned problems; it is possible to lower the concentration of Ga5H2 taken out, and it is also possible to prevent air from entering the Liq and H2 tanks even when the pressure is reduced. The purpose is to obtain a safe dewar for liquid hydrogen.
この発明に係る液体水素用デユワ−は、液体水素を貯蔵
し、この液体水素中に被冷却体を浸漬する液体水素タン
ク、上記液体水素の温度を制御する温度調整器、圧力調
整弁を介して上記液体水素タンクにヘリウムガスを導入
する管、および圧力調整弁を介して上記液体水素タンク
内のガスを導出する一管を備えたものである。The dewar for liquid hydrogen according to the present invention stores liquid hydrogen, and includes a liquid hydrogen tank for immersing an object to be cooled in the liquid hydrogen, a temperature regulator for controlling the temperature of the liquid hydrogen, and a pressure regulating valve. It is equipped with a pipe for introducing helium gas into the liquid hydrogen tank, and a pipe for leading out the gas in the liquid hydrogen tank via a pressure regulating valve.
この発明における液体水素゛ガスタンクから導出される
排気ガスはＨｅガスとＨ２ガスとの混合ガスであり、そ
の比率はＬｉｑ、Ｈｚの温度と、Ｌｉｑ、Ｈ２タンク内
圧を調整することＣζよって制御できるので、Ｈ２ガス
の濃度を極めて薄（できる。また、Ｇａ５Ｈｅを導入す
ることによりＨｚの分圧をそのままにＬｉｑ、Ｈ２タン
ク内圧を上げることができるので、Ｌｉｑ、Ｈｚの温度
を低くしたままでタンク内圧を正圧に保つことが可能で
Ｌｉｑ、Ｈ２タンク内への空気の混入を防止できる。The exhaust gas derived from the liquid hydrogen gas tank in this invention is a mixed gas of He gas and H2 gas, and the ratio can be controlled by adjusting the temperature of Liq, Hz and the internal pressure of the Liq, H2 tank. In addition, by introducing Ga5He, it is possible to increase the internal pressure of the Liq, H2 tank without changing the partial pressure of Hz. It is possible to maintain a positive pressure and prevent air from entering the Liq and H2 tanks.
り下、この発明の一実施例を図について説明する。第１
図において、（１）は真空槽であり内部を真空断熱する
１こめのちのである。（２）はＧＭ小型冷凍機Ｑ４１の
第１段で約−２００℃に冷却される放射シールドである
。（３）はＧＭ小型冷凍機σ４の第２段で約−２６０℃
まで冷却される伝導ブロックで、このブロックを介して
Ｌｉｑ、Ｈ２タンク（４）を冷却する。ｑｅｊは温度セ
ンサー、μｓは温度を上昇させるための電気ヒーターで
ある。（６）はＬ ｉ ｑ 、Ｈｚ （５１の導入管で
、（８）はＬｉｑ、Ｈ２導入用のバルブである。側はＧ
ａ５Ｈｅ導入管、（６）はこの流量を調整し、タンク（
４）内圧を一定に保つ圧力調整弁すなわち入口側タンク
内圧調整弁、艶はタンク（４）内のガスを導出する導出
管、（９）はこの流量を調整しタンク内圧を一定に保つ
圧力調整弁すなわち出口側タンク内圧調整弁である。（
７）はＬｉｑ。An embodiment of the present invention will now be described with reference to the drawings. 1st
In the figure, (1) is a vacuum chamber whose interior is vacuum insulated. (2) is a radiation shield that is cooled to about -200°C in the first stage of the GM small refrigerator Q41. (3) is approximately -260℃ at the second stage of GM small refrigerator σ4.
The conduction block is cooled to a temperature of 100 mL, through which the Liq, H2 tank (4) is cooled. qej is a temperature sensor, and μs is an electric heater for increasing the temperature. (6) is the introduction pipe for Liq, Hz (51), and (8) is the valve for introducing Liq and H2.
The a5He introduction pipe (6) adjusts this flow rate and connects the tank (
4) Pressure regulating valve that keeps the internal pressure constant, that is, the tank internal pressure regulating valve on the inlet side, the outlet pipe that takes out the gas in the tank (4), and the pressure regulator (9) that adjusts this flow rate and keeps the tank internal pressure constant. This valve is an outlet side tank internal pressure regulating valve. (
7) is Liq.
Ｈｚによって冷却される被冷却体であり、例えば酸化物
超伝導体を用い１こ超伝導マグネットである。It is a cooled body that is cooled by Hz, and is, for example, a superconducting magnet using an oxide superconductor.
ｉはＧａ５ＨｚとＧａｓ Ｈｅの混合ガスである。なお
、この例では、冷凍機σ尋、ヒーター（イ）、および温
度センサーａθにより液体水素の温度を制御する温度調
整器が構成されている。i is a mixed gas of Ga5Hz and Gas He. In this example, a temperature regulator that controls the temperature of liquid hydrogen is configured by a refrigerator σ, a heater (A), and a temperature sensor aθ.
次に動作について説明する。まず始めにＧＭ小型冷凍機
α４を運転し放射シールド（２）を約−２００℃と伝導
ブロック（３）を所定の温度、例えば１５Ｋに冷却する
。伝導でＬｉｑ、Ｈ２タンク（４）の下部も１５Ｋに冷
却される。次にＬｉｑ、Ｈ２導入バルブ（８］を開きＬ
ｉｑ、Ｈ２導入管（６）を通してＬｉｑ、Ｈｚ（５）を
タンク（４）内Ｅこ導入する。Next, the operation will be explained. First, the GM small refrigerator α4 is operated to cool the radiation shield (2) to about -200°C and the conduction block (3) to a predetermined temperature, for example, 15K. The lower part of the Liq and H2 tank (4) is also cooled to 15K by conduction. Next, open the Liq, H2 introduction valve (8) and
Liq, Hz (5) is introduced into the tank (4) through the iq, H2 introduction pipe (6).
Ｌｉｑ、Ｈｚ（５１はタンク（４）壁面で冷却され１５
Ｋになる。Liq, Hz (51 is cooled on the wall of tank (4) and 15
Become K.
タンク（４）の温度は温度センサー０句でモニターし、
これより下った場合には温調−用ヒーター（至）を用い
て温度を１５Ｋに保つ。この時Ｌｉｑ、Ｈ２タンク（４
）内の圧力は１５Ｋにおける蒸気圧となる。第２図にＨ
ｚの蒸気圧を示す。１５にでは約０．１３ａｔａ （約
１３２ｍｂａｒ）になる。ここで入口側タンク内圧調整
弁口を開きＨｚより蒸気圧の高いＧａ５Ｈｅを導入し、
Ｌｉｑ、Ｈ２タンク内圧力を大気圧（約１０１３ｍ１０
ｌ３もしくは１、ｌａｔａ（１１１４ｍｂａｒ）程度に
する。こうして被冷却体（７）を１５Ｋに冷却する。タ
ンク内圧が所定の圧力より上昇した場合には、出口側タ
ンク内圧調整弁（９）を開いてＧａ５ＨｅとＧａ５Ｈｚ
の混合ガスを排気する。この時、Ｇａ５Ｈ２の比率が１
３％程度であるので爆発の危険性は少ない。まｔこ、内
圧を大気圧より高くできるので空気の混入もない。The temperature of the tank (4) is monitored with a temperature sensor 0,
If the temperature drops below this level, use a temperature control heater to maintain the temperature at 15K. At this time, Liq, H2 tank (4
) is the vapor pressure at 15K. H in Figure 2
Indicates the vapor pressure of z. 15, it becomes about 0.13 ata (about 132 mbar). Here, the inlet side tank internal pressure adjustment valve port was opened and Ga5He, which has a vapor pressure higher than Hz, was introduced.
Liq, H2 tank internal pressure to atmospheric pressure (approximately 1013 m10
The pressure should be about 13 or 1, lata (1114 mbar). In this way, the object to be cooled (7) is cooled to 15K. When the tank internal pressure rises above the predetermined pressure, open the outlet side tank internal pressure regulating valve (9) and adjust the Ga5He and Ga5Hz.
Exhaust the mixed gas. At this time, the ratio of Ga5H2 is 1
Since it is about 3%, there is little risk of explosion. Also, since the internal pressure can be made higher than atmospheric pressure, there is no mixing of air.
なお、上記実施例では冷却にＧＭ小型冷凍機σ４を用い
たが、スターリングサイクル冷凍機や、ヴイルマイヤー
冷凍機等の他の小型冷凍機を用いても良い。またマグネ
ットが大きくなればクロードサイクル等の他の大型冷凍
機を用いても良い。In the above embodiment, a GM small refrigerator σ4 was used for cooling, but other small refrigerators such as a Stirling cycle refrigerator or a Willmeyer refrigerator may be used. Further, if the magnet is large, other large refrigerators such as a Claude cycle may be used.
まｔこ温度が１５にの場合について示したが他の温度で
も動作可能であることはもちろんである。Although the case where the core temperature is 15 is shown, it is of course possible to operate at other temperatures.
以上のように、この発明によれば、液体水素を貯蔵し、
この液体水素中に被冷却体を浸漬する液体水素タンク、
上記液体水素の温度を制御する温度調整器、圧力調整弁
を介して上記液体水素タンクにヘリウムガスを導入する
管、および圧力調整弁を介して上記液体水素タンク内の
ガスを導出する管を備えたので、ガス導出管より導出さ
れるガスの水素ガス濃度を低くできると共に、減圧時に
おいても液体水素タンク内への空気の混入を防止できる
ような安全な液体水素用デユワ−が得られる効果がある
。As described above, according to the present invention, liquid hydrogen is stored,
A liquid hydrogen tank in which the object to be cooled is immersed in this liquid hydrogen;
A temperature regulator for controlling the temperature of the liquid hydrogen, a pipe for introducing helium gas into the liquid hydrogen tank via a pressure regulation valve, and a pipe for leading out the gas in the liquid hydrogen tank via the pressure regulation valve. As a result, the hydrogen gas concentration of the gas discharged from the gas outlet pipe can be lowered, and a safe dewar for liquid hydrogen can be obtained that can prevent air from entering the liquid hydrogen tank even during depressurization. be.
第１図はこの発明の一実施例による液体水素デユワ−を
模式的に示す構成図、第２図はＨ２ガスの蒸気圧を示す
グラフ、第３図は従来の液体水素デユワ−を模式的に示
す構成図である。
図Ｅとおいて、（４）はＬｉｑ、Ｈ２タンク、（５）は
Ｌｉｑ、Ｈ２、（７）は被冷却体、（９１、Ｑｌは圧力
調整弁、□□□は混合ガス導出管、（２）はヘリウムガ
ス導入管、σ４は小型冷凍機１．四は温調用ヒーター、
αＧは温度センサーである。
なお、各図中同一符号は同一または相当部分を示すもの
とする。Fig. 1 is a schematic configuration diagram of a liquid hydrogen dewar according to an embodiment of the present invention, Fig. 2 is a graph showing the vapor pressure of H2 gas, and Fig. 3 is a schematic diagram of a conventional liquid hydrogen dewar. FIG. In Figure E, (4) is Liq, H2 tank, (5) is Liq, H2, (7) is the object to be cooled, (91, Ql is the pressure regulating valve, □□□ is the mixed gas outlet pipe, (2 ) is a helium gas introduction pipe, σ4 is a small refrigerator 1.4 is a temperature control heater,
αG is a temperature sensor. Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
する液体水素タンク、上記液体水素の温度を制御する温
度調整器、圧力調整弁を介して上記液体水素タンクにヘ
リウムガスを導入する管、および圧力調整弁を介して上
記液体水素タンク内のガスを導出する管を備えた液体水
素用デュワー。A liquid hydrogen tank that stores liquid hydrogen and immerses an object to be cooled in the liquid hydrogen, a temperature regulator that controls the temperature of the liquid hydrogen, and a pipe that introduces helium gas into the liquid hydrogen tank via a pressure regulating valve. , and a dewar for liquid hydrogen, comprising a pipe for leading out the gas in the liquid hydrogen tank through a pressure regulating valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63028082A JPH01204482A (en) | 1988-02-09 | 1988-02-09 | Dewar vessel for liquid hydrogen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63028082A JPH01204482A (en) | 1988-02-09 | 1988-02-09 | Dewar vessel for liquid hydrogen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01204482A true JPH01204482A (en) | 1989-08-17 |
Family
ID=12238858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63028082A Pending JPH01204482A (en) | 1988-02-09 | 1988-02-09 | Dewar vessel for liquid hydrogen |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01204482A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03123200U (en) * | 1990-03-28 | 1991-12-16 | ||
| US5293750A (en) * | 1991-11-27 | 1994-03-15 | Osaka Gas Company Limited | Control system for liquefied gas container |
| WO2017195657A1 (en) * | 2016-05-10 | 2017-11-16 | 国立研究開発法人産業技術総合研究所 | Low temperature cooling system |
-
1988
- 1988-02-09 JP JP63028082A patent/JPH01204482A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03123200U (en) * | 1990-03-28 | 1991-12-16 | ||
| US5293750A (en) * | 1991-11-27 | 1994-03-15 | Osaka Gas Company Limited | Control system for liquefied gas container |
| WO2017195657A1 (en) * | 2016-05-10 | 2017-11-16 | 国立研究開発法人産業技術総合研究所 | Low temperature cooling system |
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