JPH01189382A - Cleaning apparatus - Google Patents
Cleaning apparatusInfo
- Publication number
- JPH01189382A JPH01189382A JP957088A JP957088A JPH01189382A JP H01189382 A JPH01189382 A JP H01189382A JP 957088 A JP957088 A JP 957088A JP 957088 A JP957088 A JP 957088A JP H01189382 A JPH01189382 A JP H01189382A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- diaphragm
- opening
- chemical
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 34
- 239000000126 substance Substances 0.000 claims abstract description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000010453 quartz Substances 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 238000005406 washing Methods 0.000 abstract 1
- 229920003002 synthetic resin Polymers 0.000 description 5
- 239000000057 synthetic resin Substances 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 235000003801 Castanea crenata Nutrition 0.000 description 1
- 244000209117 Castanea crenata Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
この発明はシリコウェハなどを超音波によって洗浄を行
う洗浄装置に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a cleaning apparatus for cleaning silicon wafers and the like using ultrasonic waves.
〈従来の技術〉
従来の超音波洗浄装置の洗浄槽はステンレス鋼板製で、
これに超音波振動子を取付けている。<Conventional technology> The cleaning tank of conventional ultrasonic cleaning equipment is made of stainless steel plate.
An ultrasonic transducer is attached to this.
このため酸等の腐蝕性薬液を使用して洗浄を行うことは
槽壁のステンレス鋼板か腐蝕するのて不可能であった。For this reason, cleaning using corrosive chemicals such as acids would corrode the stainless steel plates on the tank walls, making it impossible.
従って、腐蝕性薬液を用いて洗浄を行う際は、被洗浄物
と薬液を石英製等の耐薬品性槽に入れ。Therefore, when cleaning with a corrosive chemical, place the object to be cleaned and the chemical in a chemical-resistant tank made of quartz or the like.
この耐薬品槽を、水を入れたステンレス性洗浄槽内に浸
し、超音波振動子を発振させていた。This chemical-resistant tank was immersed in a stainless steel cleaning tank filled with water, and an ultrasonic vibrator was oscillated.
〈発明か解決しようとする課題〉
しかし、ステンレス製洗浄槽内の水中に出た超音波は石
英製等の耐薬品性槽で反射されるため、実際に薬品槽内
での超音波の強さは可成り弱まる。そして、この弱まり
かたは２００にＨ２以上等の高周波になればなる程顕著
である。<Problem to be solved by the invention> However, since the ultrasonic waves emitted into the water in the stainless steel cleaning tank are reflected by a chemical-resistant tank such as quartz, the actual strength of the ultrasonic waves in the chemical tank is is considerably weakened. This weakening becomes more noticeable as the frequency becomes higher, such as 200 to H2 or higher.
く課題を解決するための手段〉
そこて本発明の超音波による洗浄装置は、耐薬品性の洗
浄槽と、該洗浄槽の周囲壁または底壁に槽内の洗浄液と
接触するように設けられた石英製の振動板と、該振動板
に取付けられ、２００に８２以上の超音波を発振する超
音波振動子とを備えていることを特徴とする。Means for Solving the Problems> Therefore, the ultrasonic cleaning device of the present invention includes a chemical-resistant cleaning tank and a peripheral wall or bottom wall of the cleaning tank so as to be in contact with the cleaning liquid in the tank. It is characterized by comprising a quartz diaphragm and an ultrasonic vibrator attached to the diaphragm and oscillating 200 or more ultrasonic waves.
く実 施 例〉
図示の各実施例において、ｌは耐薬品性の洗浄槽、２は
石英製の振動板、３は超音波振動子、４は超音波振動子
を振動板２に取付けるためのエポキシ系等の接着剤を示
す。Embodiment Examples In each of the illustrated embodiments, l is a chemical-resistant cleaning tank, 2 is a quartz diaphragm, 3 is an ultrasonic vibrator, and 4 is a diaphragm for attaching the ultrasonic vibrator to the diaphragm 2. Indicates an adhesive such as epoxy.
第１図及び第２図の実施例は洗浄槽ｌを耐薬品性の合成
樹脂、例えばＰＰ、ＰＥ、ＰＥＥＫ、ＰＶＤＦ、ＰＴＥ
Ｅ、ＰＶＣて成形した場合のものである。In the embodiments shown in FIGS. 1 and 2, the cleaning tank l is made of chemical-resistant synthetic resin, such as PP, PE, PEEK, PVDF, or PTE.
E, when molded from PVC.
第１図の実施例では洗浄槽１の底壁ｌ′に、核種と相似
形て、−回り小さい開口５を設け、上記開口５の縁の上
に、該開口５よりも少し大きな石英製の振動板２を内周
に嵌めた耐薬品性、例えばパイトンなどのゴム製の嵌合
枠６を当て、その上に枠６と同形て、前述の耐薬品性合
成樹脂で成形した押え枠７を載せ、押え枠７、嵌合枠６
、開口の縁にボルト８を貫通し、ナツト８′で締付けて
嵌合枠６ごと石英製の振動板２を洗浄槽の底壁１′に固
定し、開口５を塞ぐ。In the embodiment shown in FIG. 1, a small opening 5 is provided in the bottom wall l' of the cleaning tank 1 in a similar shape to the nuclide, and a quartz opening 5 slightly larger than the opening 5 is placed on the edge of the opening 5. A chemically resistant fitting frame 6 made of rubber such as Python is placed on the inner periphery of the diaphragm 2, and a presser frame 7 molded from the chemically resistant synthetic resin described above is placed on top of the fitting frame 6, which has the same shape as the frame 6. Loading, holding frame 7, fitting frame 6
A bolt 8 is passed through the edge of the opening and tightened with a nut 8' to fix the quartz diaphragm 2 together with the fitting frame 6 to the bottom wall 1' of the cleaning tank, and the opening 5 is closed.
そして、超音波振動子３は振動板２の下面に固定する。The ultrasonic transducer 3 is fixed to the lower surface of the diaphragm 2.
ボルト、ナツト８．８′も耐薬品性合成樹脂製とし、ボ
ルト８には耐薬品性ゴムからなる０リング９を嵌め、押
え枠７の孔の内周との間でのシールを行う。The bolts and nuts 8 and 8' are also made of chemical-resistant synthetic resin, and an O-ring 9 made of chemical-resistant rubber is fitted onto the bolt 8 to form a seal with the inner periphery of the hole in the holding frame 7.
第２図の実施例の洗浄槽ｌは底面か開放し、周囲壁の下
端部には外周に張出した鍔ｌＯを有するように耐薬品性
合成樹脂で成形する。The cleaning tank l of the embodiment shown in FIG. 2 is molded from a chemical-resistant synthetic resin so that the bottom surface is open and the lower end of the surrounding wall has a flange lO projecting to the outer periphery.
そして、石英製の振動板２は上記鍔１０の外形と同大に
作り、これを鍔ＩＯの下面に耐薬品性ゴムからなるパツ
キン１１を介して当て、ボルト１２を鍔ＩＯ、パツキン
１１．振動板２に貫通し、ナツト１２′て締付けて固定
し、振動板２を洗浄槽の底壁とし、超音波振動子３は振
動板の下面に固定する。The quartz diaphragm 2 is made to have the same size as the external shape of the flange 10, and is applied to the lower surface of the tsuba IO via a gasket 11 made of chemical-resistant rubber.The bolt 12 is then attached to the tsuba IO, the gasket 11. It penetrates through the diaphragm 2 and is fixed by tightening with a nut 12', the diaphragm 2 is used as the bottom wall of the cleaning tank, and the ultrasonic vibrator 3 is fixed to the lower surface of the diaphragm.
上記第１図、第２図の実施例では洗浄槽か耐薬品性合成
樹脂からなるため被洗浄物をＲＣＡ洗浄て薬洗するため
にアンモニア、過酸化水素、フッ酸、塩酸等の薬液を入
れても腐蝕することはない。In the embodiments shown in Figures 1 and 2 above, the cleaning tank is made of a chemical-resistant synthetic resin, so chemicals such as ammonia, hydrogen peroxide, hydrofluoric acid, and hydrochloric acid are added to the cleaning tank to perform RCA cleaning and chemical cleaning of the objects to be cleaned. However, it will not corrode.
そして、槽壁の一部をなすように水密に取付けた石英製
の振動板２に超音波振動子３を固定しであるため、槽内
の液中に効率よく超音波を発射し、強力な超音波て被洗
浄物の洗浄か行える。Since the ultrasonic vibrator 3 is fixed to a quartz diaphragm 2 that is watertightly attached to form a part of the tank wall, ultrasonic waves are efficiently emitted into the liquid in the tank and powerful Objects can be cleaned using ultrasonic waves.
尚、超音波振動子は２００にＨ１以上の高周波で、厚み
振動を利用する型式のものか好適である。The ultrasonic vibrator is preferably of a type that uses thickness vibration at a high frequency of 200 to H1 or higher.
上記両実施例ては振動板２を洗浄槽の底壁に位置して固
定したか、底壁に固定することに限定されず周囲壁に位
置して固定しても同効である。In both of the above embodiments, the diaphragm 2 is positioned and fixed on the bottom wall of the cleaning tank, but it is not limited to being fixed on the bottom wall, and the same effect can be achieved even if it is positioned and fixed on the surrounding wall.
第３図の実施例は底壁を有する洗浄槽の全体を石英製と
し、その壁の外面に超音波振動子３を固定しである。In the embodiment shown in FIG. 3, the entire cleaning tank having a bottom wall is made of quartz, and an ultrasonic vibrator 3 is fixed to the outer surface of the wall.
こ＼では底壁の下面に超音波振動子を固定しであるため
、底壁か振動板２になる。In this case, the ultrasonic transducer is fixed to the lower surface of the bottom wall, so the bottom wall becomes the diaphragm 2.
この実施例は洗浄槽の全体か耐薬品性の石英ガラス製で
あって、超音波振動子３か発射する超音波を減衰させな
いため、壁の外面のどこに超音波振動子を固定しても腐
蝕性薬液を用い、超音波を併用して被洗浄物を効率よく
、短時間で洗浄を行うことかできる。In this embodiment, the entire cleaning tank is made of chemical-resistant quartz glass, and the ultrasonic waves emitted by the ultrasonic transducer 3 are not attenuated, so no matter where on the outer surface of the wall the ultrasonic transducer is fixed, it will not corrode. The object to be cleaned can be cleaned efficiently and in a short time by using a chemical liquid and ultrasonic waves.
〈発明の効果〉 本発明によれば洗浄槽に腐蝕性薬液を満たし。<Effect of the invention> According to the present invention, a cleaning tank is filled with a corrosive chemical solution.
そのなかに被洗浄物を浸漬し、２００に８２以上の超音
波を作用させるのて被洗浄物を破損することなく、且つ
効率よく、短時間て被洗浄物を洗浄することかてきる。By immersing the object to be cleaned in it and applying ultrasonic waves of 82 or higher to 200, the object can be efficiently cleaned in a short time without damaging the object.
第１図は本発明の第１実施例の要部の断面図、第２図は
同じく第２実施例の要部の断面図、第３図は同じく他の
一実施例の要部の断面図である。
図中、ｌは耐薬品性の洗浄槽、２は石英ガラス製の振動
板、３は超音波振動子を示す。
特許出願人 栗 １）工 業 株式会社°二１
．７
同 代理人 弁理士 福 １） 武 通 ”ｉ
註ｊ：１１″ノ。イ、９人 弁オヤ 福 □
賢 ヨ 層“””’ ””’！、′１．・ １ ′
〜FIG. 1 is a sectional view of a main part of a first embodiment of the present invention, FIG. 2 is a sectional view of a main part of a second embodiment, and FIG. 3 is a sectional view of a main part of another embodiment. It is. In the figure, l indicates a chemical-resistant cleaning tank, 2 indicates a quartz glass diaphragm, and 3 indicates an ultrasonic vibrator. Patent applicant Kuri 1) Industry °21 Co., Ltd.
．． 7 Same Agent Patent Attorney Fuku 1) Taketori “i”
Note: 11″. I, 9 people Benoya Fuku □
Kenyo layer “””’ ””’!, ’1.・1 ′ ~
Claims (1)
内の洗浄液と接触するように設けられた石英製の振動板
と、該振動板に取付けられ、２００ＫＨＺ以上の超音波
を発振する超音波振動子とを備えていることを特徴とす
る洗浄装置。A chemical-resistant cleaning tank, a quartz diaphragm installed on the peripheral wall or bottom wall of the cleaning tank so as to be in contact with the cleaning liquid in the tank, and a quartz diaphragm attached to the diaphragm that emits ultrasonic waves of 200 KHZ or higher. A cleaning device comprising: an oscillating ultrasonic vibrator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP957088A JPH01189382A (en) | 1988-01-21 | 1988-01-21 | Cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP957088A JPH01189382A (en) | 1988-01-21 | 1988-01-21 | Cleaning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01189382A true JPH01189382A (en) | 1989-07-28 |
Family
ID=11723958
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP957088A Pending JPH01189382A (en) | 1988-01-21 | 1988-01-21 | Cleaning apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01189382A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100473785B1 (en) * | 2002-06-20 | 2005-03-08 | 주식회사 울쏘하이텍 | Assembled In A Water Tank A Ultrasonic Vibration Device |
| JP2005265808A (en) * | 2004-03-22 | 2005-09-29 | Shimadzu Corp | Automatic sampler |
| JP2010266728A (en) * | 2009-05-15 | 2010-11-25 | Tosoh Corp | Method and apparatus for cleaning photomask substrate |
-
1988
- 1988-01-21 JP JP957088A patent/JPH01189382A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100473785B1 (en) * | 2002-06-20 | 2005-03-08 | 주식회사 울쏘하이텍 | Assembled In A Water Tank A Ultrasonic Vibration Device |
| JP2005265808A (en) * | 2004-03-22 | 2005-09-29 | Shimadzu Corp | Automatic sampler |
| JP2010266728A (en) * | 2009-05-15 | 2010-11-25 | Tosoh Corp | Method and apparatus for cleaning photomask substrate |
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