JPH01179930A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH01179930A JPH01179930A JP358388A JP358388A JPH01179930A JP H01179930 A JPH01179930 A JP H01179930A JP 358388 A JP358388 A JP 358388A JP 358388 A JP358388 A JP 358388A JP H01179930 A JPH01179930 A JP H01179930A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- general formula
- denotes
- formulas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 111
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 53
- 239000004332 silver Substances 0.000 title claims abstract description 52
- 239000000463 material Substances 0.000 title claims abstract description 23
- 239000000839 emulsion Substances 0.000 claims abstract description 34
- 125000003118 aryl group Chemical group 0.000 claims abstract description 32
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 29
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 18
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 15
- 125000003277 amino group Chemical group 0.000 claims abstract description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 8
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 7
- 238000001179 sorption measurement Methods 0.000 claims abstract description 7
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 5
- 238000009792 diffusion process Methods 0.000 claims abstract description 5
- 150000001450 anions Chemical class 0.000 claims abstract description 4
- 125000004437 phosphorous atom Chemical group 0.000 claims abstract description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 3
- 150000001875 compounds Chemical group 0.000 claims description 66
- 125000000623 heterocyclic group Chemical group 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 125000005843 halogen group Chemical group 0.000 claims description 9
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 7
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 6
- 125000002252 acyl group Chemical group 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 125000004104 aryloxy group Chemical group 0.000 claims description 4
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims description 4
- 230000001737 promoting effect Effects 0.000 claims description 4
- 125000005647 linker group Chemical group 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 125000000626 sulfinic acid group Chemical group 0.000 claims description 2
- 230000015572 biosynthetic process Effects 0.000 abstract description 10
- 238000000034 method Methods 0.000 description 32
- 239000000243 solution Substances 0.000 description 25
- 238000011161 development Methods 0.000 description 16
- 125000001424 substituent group Chemical group 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 14
- 239000007864 aqueous solution Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 125000003545 alkoxy group Chemical group 0.000 description 12
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 12
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 12
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 10
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- 108010010803 Gelatin Proteins 0.000 description 8
- 239000000975 dye Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 8
- 239000008273 gelatin Substances 0.000 description 8
- 229920000159 gelatin Polymers 0.000 description 8
- 235000019322 gelatine Nutrition 0.000 description 8
- 235000011852 gelatine desserts Nutrition 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 125000001624 naphthyl group Chemical group 0.000 description 7
- 230000008313 sensitization Effects 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 230000001235 sensitizing effect Effects 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical group C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 5
- 235000019441 ethanol Nutrition 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 150000002429 hydrazines Chemical class 0.000 description 4
- 125000002950 monocyclic group Chemical group 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000005070 ripening Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 125000004442 acylamino group Chemical group 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- WRSXUNSJGJUKHE-UHFFFAOYSA-N indazole Chemical compound C1=CC=C[C]2C=NN=C21 WRSXUNSJGJUKHE-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002184 metal Chemical group 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000003755 preservative agent Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000004076 pyridyl group Chemical group 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- 235000010265 sodium sulphite Nutrition 0.000 description 3
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 3
- 150000003852 triazoles Chemical group 0.000 description 3
- LUBJCRLGQSPQNN-UHFFFAOYSA-N 1-Phenylurea Chemical compound NC(=O)NC1=CC=CC=C1 LUBJCRLGQSPQNN-UHFFFAOYSA-N 0.000 description 2
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 2
- DSVIHYOAKPVFEH-UHFFFAOYSA-N 4-(hydroxymethyl)-4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(CO)CN1C1=CC=CC=C1 DSVIHYOAKPVFEH-UHFFFAOYSA-N 0.000 description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 2
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000005037 alkyl phenyl group Chemical group 0.000 description 2
- 125000004390 alkyl sulfonyl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 125000002619 bicyclic group Chemical group 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical group [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- GLVAUDGFNGKCSF-UHFFFAOYSA-N mercaptopurine Chemical compound S=C1NC=NC2=C1NC=N2 GLVAUDGFNGKCSF-UHFFFAOYSA-N 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 125000004957 naphthylene group Chemical group 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Chemical group 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical group [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- 235000017281 sodium acetate Nutrition 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- 125000001391 thioamide group Chemical group 0.000 description 2
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- NLOGTNAOFKDKBC-UHFFFAOYSA-N 1-ethyl-2-(2-methylphenyl)hydrazine Chemical compound CCNNC1=CC=CC=C1C NLOGTNAOFKDKBC-UHFFFAOYSA-N 0.000 description 1
- FSEXIIUMRZGIDN-UHFFFAOYSA-N 1-hydroxypurin-6-amine Chemical compound ON1C=NC2=NC=NC2=C1N FSEXIIUMRZGIDN-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- QDAYZTZGLPEDOB-UHFFFAOYSA-N 2-(2-hydroxyanilino)acetic acid Chemical compound OC(=O)CNC1=CC=CC=C1O QDAYZTZGLPEDOB-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- UGWULZWUXSCWPX-UHFFFAOYSA-N 2-sulfanylideneimidazolidin-4-one Chemical compound O=C1CNC(=S)N1 UGWULZWUXSCWPX-UHFFFAOYSA-N 0.000 description 1
- LTACQVCHVAUOKN-UHFFFAOYSA-N 3-(diethylamino)propane-1,2-diol Chemical compound CCN(CC)CC(O)CO LTACQVCHVAUOKN-UHFFFAOYSA-N 0.000 description 1
- IEZDTNCUMWPRTD-UHFFFAOYSA-N 346704-04-9 Chemical compound [O-][N+](=O)C1=CC=C(N2CCNCC2)C=C1N1CCCCC1 IEZDTNCUMWPRTD-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical compound SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- YLFYVPHWHWMZKU-UHFFFAOYSA-N 4-amino-1h-purin-6-one Chemical compound O=C1NC=NC2(N)C1=NC=N2 YLFYVPHWHWMZKU-UHFFFAOYSA-N 0.000 description 1
- HDGMAACKJSBLMW-UHFFFAOYSA-N 4-amino-2-methylphenol Chemical compound CC1=CC(N)=CC=C1O HDGMAACKJSBLMW-UHFFFAOYSA-N 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- BQNMWFAFTFZXOG-UHFFFAOYSA-N 4-methylpurin-6-amine Chemical compound NC1=NC=NC2(C)C1=NC=N2 BQNMWFAFTFZXOG-UHFFFAOYSA-N 0.000 description 1
- JXRGUPLJCCDGKG-UHFFFAOYSA-N 4-nitrobenzenesulfonyl chloride Chemical compound [O-][N+](=O)C1=CC=C(S(Cl)(=O)=O)C=C1 JXRGUPLJCCDGKG-UHFFFAOYSA-N 0.000 description 1
- KMVPXBDOWDXXEN-UHFFFAOYSA-N 4-nitrophenylhydrazine Chemical compound NNC1=CC=C([N+]([O-])=O)C=C1 KMVPXBDOWDXXEN-UHFFFAOYSA-N 0.000 description 1
- NKNAMTXDJGCRMX-UHFFFAOYSA-N 4-octyl-1-sulfanyl-7h-purine Chemical compound N1C=NC2(CCCCCCCC)C1=CN(S)C=N2 NKNAMTXDJGCRMX-UHFFFAOYSA-N 0.000 description 1
- IBLCKNAMOBKNNJ-UHFFFAOYSA-N 4-phenylpurin-6-amine Chemical compound N1=CN=C2C(N)=NC=NC21C1=CC=CC=C1 IBLCKNAMOBKNNJ-UHFFFAOYSA-N 0.000 description 1
- LQGKDMHENBFVRC-UHFFFAOYSA-N 5-aminopentan-1-ol Chemical compound NCCCCCO LQGKDMHENBFVRC-UHFFFAOYSA-N 0.000 description 1
- RWXZXCZBMQPOBF-UHFFFAOYSA-N 5-methyl-1H-benzimidazole Chemical compound CC1=CC=C2N=CNC2=C1 RWXZXCZBMQPOBF-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- SUTWPJHCRAITLU-UHFFFAOYSA-N 6-aminohexan-1-ol Chemical compound NCCCCCCO SUTWPJHCRAITLU-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WLJUQHJNPIQOMP-UHFFFAOYSA-N C(#N)BrCl Chemical compound C(#N)BrCl WLJUQHJNPIQOMP-UHFFFAOYSA-N 0.000 description 1
- 235000002566 Capsicum Nutrition 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
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- 241000375392 Tana Species 0.000 description 1
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- 125000004466 alkoxycarbonylamino group Chemical group 0.000 description 1
- 125000005195 alkyl amino carbonyloxy group Chemical group 0.000 description 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 description 1
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- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
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- CJPQIRJHIZUAQP-MRXNPFEDSA-N benalaxyl-M Chemical compound CC=1C=CC=C(C)C=1N([C@H](C)C(=O)OC)C(=O)CC1=CC=CC=C1 CJPQIRJHIZUAQP-MRXNPFEDSA-N 0.000 description 1
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- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
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- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
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- QWYZFXLSWMXLDM-UHFFFAOYSA-M pinacyanol iodide Chemical class [I-].C1=CC2=CC=CC=C2N(CC)C1=CC=CC1=CC=C(C=CC=C2)C2=[N+]1CC QWYZFXLSWMXLDM-UHFFFAOYSA-M 0.000 description 1
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- 239000001632 sodium acetate Substances 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- 235000011083 sodium citrates Nutrition 0.000 description 1
- DZCAZXAJPZCSCU-UHFFFAOYSA-K sodium nitrilotriacetate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CC([O-])=O DZCAZXAJPZCSCU-UHFFFAOYSA-K 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- UOULCEYHQNCFFH-UHFFFAOYSA-M sodium;hydroxymethanesulfonate Chemical compound [Na+].OCS([O-])(=O)=O UOULCEYHQNCFFH-UHFFFAOYSA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 125000006296 sulfonyl amino group Chemical group [H]N(*)S(*)(=O)=O 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- XGMYMWYPSYIPQB-UHFFFAOYSA-J tetrasodium;2-(1,2-dicarboxylatoethoxy)butanedioate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CC(C([O-])=O)OC(C([O-])=O)CC([O-])=O XGMYMWYPSYIPQB-UHFFFAOYSA-J 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 125000001544 thienyl group Chemical group 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- TYLYVJBCMQFRCB-UHFFFAOYSA-K trichlororhodium;trihydrate Chemical compound O.O.O.[Cl-].[Cl-].[Cl-].[Rh+3] TYLYVJBCMQFRCB-UHFFFAOYSA-K 0.000 description 1
- 125000004044 trifluoroacetyl group Chemical group FC(C(=O)*)(F)F 0.000 description 1
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/42—Developers or their precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/061—Hydrazine compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
- G03C5/29—Development processes or agents therefor
- G03C5/305—Additives other than developers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、硬調な画像を与えるハロゲン化銀写真感光材
料に関し、さらに詳しくは、ヒドラジン化合物による硬
調化技術に於て発生する故障に対する改良に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a silver halide photographic material that provides high-contrast images, and more particularly, to an improvement over failures that occur in high-contrast techniques using hydrazine compounds. It is something.
(従来の技術)
近年、印刷写真製版分野に於て、印刷物のカラー化や複
雑化が非常に進みつつある。その為印刷の中間媒体であ
る印刷用ハロゲン化銀写真感光材料(以下印刷感材とい
う)への品質の向上と品質の安定に対する要求も年々増
加している。従来から、一般的印刷感材は高品質を達成
する為に所謂“リス現像”処理適性が付与されている。(Prior Art) In recent years, in the field of printing and photolithography, printed matter has become increasingly colored and complex. For this reason, demands for improved and stable quality of silver halide photographic materials for printing (hereinafter referred to as printing materials), which are intermediate media for printing, are increasing year by year. Conventionally, general printing sensitive materials have been given so-called "lith development" processing suitability in order to achieve high quality.
しかし“リス現像”に於ては、その現像処理液中に保恒
剤である亜硫酸イオンを高濃度に含有することが機構的
に不可能であり、そのため現像液の安定性が非常に悪い
ことは当業者間では良く知られた事実である。However, in "Lith development," it is mechanically impossible to contain high concentrations of sulfite ions, which are preservatives, in the developing solution, and as a result, the stability of the developing solution is extremely poor. is a well-known fact among those skilled in the art.
“リス現像”の不安定さを解消し、かつ“リス現像”処
理並の硬調な画像を得る為の技術としては、幾つか、そ
の試みについて特許文献の開示を見ることができる。例
えばヒドラジン化合物を使用し、硬調化画像を得る技術
が特開昭53−16623号、同53−20921号、
同53−20922号、同53−49429号、同53
−66731号、同53−66732号、同53−77
616号、同53−84714号、同53−13713
3号、同54−37732号、同54−40629号、
同55・52050号、同55・90940号、同56
−67843号等に開示されている。これらのヒドラジ
ン化合物を用いた画像形成方法における処理方法では、
ヒドラジン化合物を含有している現像液のpH値、また
はヒドラジン化合物を含有している写真感光材料の処理
現像液のpH値が比較的高いレベルにあることが硬調な
画像を得るために必要であって、この高いp)(値が現
像液の有効寿命を下げるという欠点があった。As techniques for eliminating the instability of "lithographic development" and obtaining high-contrast images comparable to the "lithographic developing" process, several attempts can be found in patent documents. For example, techniques for obtaining high-contrast images using hydrazine compounds are disclosed in JP-A-53-16623 and JP-A-53-20921.
No. 53-20922, No. 53-49429, No. 53
-66731, 53-66732, 53-77
No. 616, No. 53-84714, No. 53-13713
No. 3, No. 54-37732, No. 54-40629,
55.52050, 55.90940, 56
-67843 etc. In the processing method of the image forming method using these hydrazine compounds,
In order to obtain high-contrast images, it is necessary that the pH value of a developer containing a hydrazine compound or the pH value of a processing developer for photographic light-sensitive materials containing a hydrazine compound be at a relatively high level. However, this high p)(value) has the disadvantage that it reduces the useful life of the developer.
これに対して、特開昭56−106244号では、画像
形成時に、ヒドラジン化合物及び現像促進量のアミノ化
合物を含有することによって、硬調な画像を比較的低い
p H(11−11,5)で形成できるとしている。On the other hand, in JP-A-56-106244, a high-contrast image can be formed at a relatively low pH (11-11,5) by containing a hydrazine compound and a development-promoting amount of an amino compound during image formation. It is said that it can be formed.
これらのヒドラジン化合物を用いる画像形成方法は非常
に硬調な画像を得ることができる。一般に現像処理液は
適切な現像補充剤の補充がなされない場合は写真性能上
好ましくないカブリ発生等があるが、ヒドラジンを用い
たこの方法では現像処理液の疲労度がそれほど大きくな
い場合でも未露光部、例えば印刷感材におけるコンタク
トスクリーンを用いた撮網時に網点間に黒胡麻の様なブ
ラックドツト(以下ペラパーフォグという)の発生が見
られ、商品価値上重大な欠点となり得る故障を引き起こ
すことがある。先に掲げた特開昭53−16623号や
特開昭53−20921号に於ては、上で述べたペラパ
ーフォグを含むカブリの発生を、抑制剤であるベンゾト
リアゾールをハロゲン化銀写真乳剤に含有させることに
より抑制しているが、その効果は充分でなく、しかも硬
調性が損なわれることもあり、完成された技術であると
は言いがたい。Image forming methods using these hydrazine compounds can provide very high contrast images. In general, if a developing solution is not replenished with an appropriate developer replenisher, fogging may occur, which is unfavorable for photographic performance.However, with this method using hydrazine, even if the degree of fatigue of the developing solution is not too great, unexposed For example, when shooting with a contact screen on printed photosensitive materials, black dots resembling black sesame seeds (hereinafter referred to as Peraper Fog) can be seen between the halftone dots, which can lead to malfunctions that can be a serious drawback in terms of product value. be. In the above-mentioned JP-A-53-16623 and JP-A-53-20921, silver halide photographic emulsions containing benzotriazole, which is an inhibitor, suppress the occurrence of fog including the permeable fog mentioned above. However, the effect is not sufficient, and furthermore, the contrast may be impaired, so it cannot be said that this is a perfected technique.
本発明の発明者らは鋭意研究の結果、ヒドラジド化合物
を用いた硬調化技術の欠点であるペラパーフォグを含む
カブリを抑制しつつ硬調性を損なわないハロゲン化銀写
真感光材料を開発することができた。As a result of intensive research, the inventors of the present invention were able to develop a silver halide photographic material that does not impair high contrast while suppressing fog, including permeable fog, which is a drawback of high contrast technology using hydrazide compounds. .
(発明の目的)
本発明の第1の目的はヒドラジド化合物を用いた硬調な
画像を安定に形成し得るハロゲン化銀写真感光材料を提
供することにある。第2の目的はペラパーフォグを含め
たカプリ発生のない硬調なハロゲン化銀写真感光材料を
提供することにある。(Object of the Invention) The first object of the present invention is to provide a silver halide photographic material that can stably form high-contrast images using a hydrazide compound. The second object is to provide a silver halide photographic light-sensitive material with high contrast and free from capri occurrence including Peraper Fog.
(発明の構成)
前記本発明の目的は下記の本発明の構成によって達成さ
れる。(Structure of the Invention) The object of the present invention is achieved by the following structure of the present invention.
臭化銀含有率が50モル%以上のハロゲン化銀組成を有
し、かつ下記一般式[1]、[2]、[3]で示される
化合物を少なくとも111類含有し、かつ下記一般式[
4]、[5]または[6]で示される化合物から選ばれ
る少なくとも1種を含有する少なくとも1層のハロゲン
化銀乳剤層を有することを特徴とするハロゲン化銀写真
感光材料。It has a silver halide composition with a silver bromide content of 50 mol% or more, contains at least 111 compounds represented by the following general formulas [1], [2], and [3], and has the following general formula [
A silver halide photographic material comprising at least one silver halide emulsion layer containing at least one compound selected from compounds represented by [4], [5] or [6].
叉−/
一般式[1F
(式中、R1及びR8はアリール基またはへテロ環基を
表し、Rは有機結合基を表し、nはO〜6、mは0また
はlを表し、nが2以上のときは、各Rは同じであって
も、異なっていてもよい。)一般式[2]
(式中、R21は脂肪族基、芳香族基またはヘテーロ環
基を、R22は水素原子、置換してもよいアルコキシ基
、ヘテロ環オキシ基、アミノ基、もしくはアリールオキ
シ基を表し、Pl及びR2は水素原子、アシル基、また
はスルフィン酸基を表す。)一般式[3]
%式%
(式中、Arは耐拡散基またはハロゲン化銀吸着促進基
を少なくとも1つ含むアリール基を表し、Rllは置換
アルキル基を表す。)
一般式[4]
式中、Aはリン原子または窒素原子を示す。/ General formula [1F (wherein, R1 and R8 represent an aryl group or a heterocyclic group, R represents an organic bonding group, n represents O to 6, m represents 0 or 1, and n represents 2 In the above cases, each R may be the same or different.) General formula [2] (wherein, R21 is an aliphatic group, aromatic group, or heterocyclic group, R22 is a hydrogen atom, Represents an alkoxy group, heterocyclic oxy group, amino group, or aryloxy group that may be substituted, and Pl and R2 represent a hydrogen atom, an acyl group, or a sulfinic acid group.) General formula [3] % Formula % ( (In the formula, Ar represents an aryl group containing at least one diffusion-resistant group or silver halide adsorption promoting group, and Rll represents a substituted alkyl group.) General formula [4] In the formula, A represents a phosphorus atom or a nitrogen atom. show.
R411R4!l 43およびR44はそれぞれ置換も
しくは非置換のアルキル基、アリール基またはアラルキ
ル基を表す。X−は酸アニオンを表す。R411R4! l43 and R44 each represent a substituted or unsubstituted alkyl group, aryl group or aralkyl group. X- represents an acid anion.
一般式[5]
式中、YおよびZは窒素原子または炭素原子を表し、Y
と2はどちらか一方が窒素原子のとき、他方は炭素原子
である。Rllは水素原子、低級ア、 ルキル基、ハロ
ゲン原子またはニトロ基を表す。General formula [5] In the formula, Y and Z represent a nitrogen atom or a carbon atom, and Y
and 2, when either one is a nitrogen atom, the other is a carbon atom. Rll represents a hydrogen atom, a lower alkyl group, a halogen atom or a nitro group.
一般式[6]
式中、R81,Ra2およびRa3は水素原子、アミン
基、ヒドロキシ基、メルカプト基、アルキル基またはア
リール基を表す。General Formula [6] In the formula, R81, Ra2 and Ra3 represent a hydrogen atom, an amine group, a hydroxy group, a mercapto group, an alkyl group or an aryl group.
(発明の構成の具体的説明) 以下、本発明の構成について詳細に具体的に説明する。(Specific explanation of the structure of the invention) Hereinafter, the configuration of the present invention will be specifically explained in detail.
以下余白 1
以下一般式[1] 、[2] 、[3]について具体的
に説明する。Below is a blank space 1 General formulas [1], [2], and [3] will be specifically explained below.
一般式[11
式中、R2及びR8はアリール基またはへテロ環基を表
わし、Rは2価の有機基を表わし、nはO〜6、纏はO
またはlを表わす。General formula [11 In the formula, R2 and R8 represent an aryl group or a heterocyclic group, R represents a divalent organic group, n is O to 6, and the base is O
or represents l.
ここで、R1及びR3で表わされるアリール基としては
フェニル基、ナフチル基等が挙げられ、ヘテロ環基とし
てはピリジル基、ベンゾチアゾリル基、キノリル基、チ
エニル基等が挙げられるが、R1及びR3として好まし
くはアリール基である。Here, examples of the aryl group represented by R1 and R3 include a phenyl group, a naphthyl group, etc., and examples of the heterocyclic group include a pyridyl group, a benzothiazolyl group, a quinolyl group, a thienyl group, etc., but preferred as R1 and R3. is an aryl group.
R,及びR2で表わされるアリール基またはへテロ環基
には種々の置換基が導入できる。置換基としては例えば
ハロゲン原子(例えば塩素、フッ素など)、アルキル基
(例えばメチル、エチル、ドデシルなど)、アルコキシ
基(例えばメトキシ、エトキシ、イソプロポキシ、ブト
キシ、オクチルオキシ、ドデシルオキシなど)、アシル
アミノ基 (例えばアセチルアミノ、ピバリルアミノ、
ベンゾイルアミノ、テトラデカノイルアミノ、α−(2
,4−ジ−t−アミルフェノキシ)ブチリルアミノなど
)、スルホニルアミノ基(例えば、メタンスルホニルア
ミノ、ブタンスルホニルアミノ、ドデカンスルホニルア
ミノ、ベンゼンスルホニルアミノなト)、ウレア基(例
えば、フェニルウレア、エチルウレアなど)、チオウレ
ア基(例えば、フェニルチオウレア、エチルチオウレア
など)、ヒドロキシ基、アミン基、アルキルアミノ基(
例えば、メチルアミノ、ジメチルアミノなど)、カルボ
キシ基、アルコキシカルボニル基(例えば、エトキシカ
ルボニル)、カルバモイル基、スルホ基などが挙げられ
る。Rで表わされる2価の有機基としては、例えばアル
キレン基(例えば、メチレン、エチレン、トリメチレン
、テトラメチレンなど)、アリーレン基(例えハ、フェ
ニレン、ナフチレンなど)、アラルキレン基等が挙げら
れるがアルキレン基は結合中にオキシ基、チオ基、セレ
ノ基、カルポニル基、−N−基(R3は水素原子、アル
キル基、アリール基を表わす)、スルホニル基等を含ん
でも良い。Rで表わされる基には種々の置換基が導入で
きる。Various substituents can be introduced into the aryl group or heterocyclic group represented by R and R2. Examples of substituents include halogen atoms (e.g., chlorine, fluorine, etc.), alkyl groups (e.g., methyl, ethyl, dodecyl, etc.), alkoxy groups (e.g., methoxy, ethoxy, isopropoxy, butoxy, octyloxy, dodecyloxy, etc.), and acylamino groups. (e.g. acetylamino, pivalylamino,
Benzoylamino, tetradecanoylamino, α-(2
, 4-di-t-amylphenoxy)butyrylamino, etc.), sulfonylamino groups (e.g., methanesulfonylamino, butanesulfonylamino, dodecanesulfonylamino, benzenesulfonylamino), urea groups (e.g., phenylurea, ethylurea, etc.) , thiourea group (e.g., phenylthiourea, ethylthiourea, etc.), hydroxy group, amine group, alkylamino group (
Examples include methylamino, dimethylamino, etc.), carboxy groups, alkoxycarbonyl groups (eg, ethoxycarbonyl), carbamoyl groups, and sulfo groups. Examples of the divalent organic group represented by R include alkylene groups (e.g., methylene, ethylene, trimethylene, tetramethylene, etc.), arylene groups (e.g., phenylene, naphthylene, etc.), aralkylene groups, etc. may contain an oxy group, thio group, seleno group, carbonyl group, -N- group (R3 represents a hydrogen atom, an alkyl group, or an aryl group), a sulfonyl group, etc. in the bond. Various substituents can be introduced into the group represented by R.
置換基としては例えば、−C0NHNI!R,(R、は
上述したR1及びR3と同じ意味を表わす)、アルキル
基、アルコキシ基、ハロゲン原子、ヒドロキシ基、カル
ボキシ基、アシル基、アリール基、等が挙げられる。Examples of substituents include -C0NHNI! R, (R represents the same meaning as R1 and R3 described above), an alkyl group, an alkoxy group, a halogen atom, a hydroxy group, a carboxy group, an acyl group, an aryl group, and the like.
Rとして好ましくはアルキレン基である。R is preferably an alkylene group.
一般式[11で表わされる化合物のうち好ましくはR1
及びR8が置換または未置換のフェニル基であり、n=
■−1でRがアルキレン基を表わす化金物である。Among the compounds represented by the general formula [11, preferably R1
and R8 is a substituted or unsubstituted phenyl group, and n=
(2)-1 is a metal compound in which R represents an alkylene group.
上記一般式[Nで表される代表的な化合物を以下に示す
。Representative compounds represented by the above general formula [N are shown below.
以下余、白 )
\−−〜″
具体的化合物
■ −12
LCsH++
l −22
■ −31
■ −38
しH!
tC賜H1l
■ −50
l −53
t(4f(++
次に一般式[2]について説明する
R21で表わされる脂肪族基は、好ましくは、炭素数6
以上のものであって、特に炭素数8〜50の直鎖、分岐
または環状のアルキル基である。ここで分岐アルキル基
はその中に1つまたはそれ以上のへテロ原子を含んだ飽
和のへテロ環を形成するように環化されてもよい。また
このアルキル基はアリール基、アルコキシ基、スルホキ
シ基、等の置換基を有してもよい。The following margin is white) \--~'' Specific compound ■ -12 LCsH++ l -22 ■ -31 ■ -38 ShiH! tC gift H1l ■ -50 l -53 t(4f(++ Next, general formula [2] The aliphatic group represented by R21 preferably has 6 carbon atoms.
Among the above, it is particularly a straight chain, branched or cyclic alkyl group having 8 to 50 carbon atoms. The branched alkyl group herein may be cyclized to form a saturated heterocycle containing one or more heteroatoms therein. Further, this alkyl group may have a substituent such as an aryl group, an alkoxy group, or a sulfoxy group.
RlIで表される芳香族基は単環または2環アリール基
または不飽和へテロ環基である。ここで不飽和へテロ環
基は単環まtこは2環のアリール基と縮合してヘテロア
リール基を形成してもよい。The aromatic group represented by RlI is a monocyclic or bicyclic aryl group or an unsaturated heterocyclic group. Here, the unsaturated heterocyclic group may be condensed with a monocyclic or bicyclic aryl group to form a heteroaryl group.
例えばベンゼン環、ナフタレン環、ピリジン環、ピリミ
ジン環、イミダゾール環、ピロラゾール環、キノリン環
、インキノリン環、ベンズイミダゾール環、チアゾール
環、ベンゾチアゾール環等があるがなかでもベンゼン環
を含むものが好ましい。Examples include a benzene ring, a naphthalene ring, a pyridine ring, a pyrimidine ring, an imidazole ring, a pyrorazole ring, a quinoline ring, an inquinoline ring, a benzimidazole ring, a thiazole ring, and a benzothiazole ring, among which those containing a benzene ring are preferred.
R21として特に好ましいものはアリール基である。Particularly preferred as R21 is an aryl group.
R21のアリール基または不飽和へテロ環基は置換され
ていてもよく、代表的な置換基としては直鎖、分岐また
は環状のアルキル基(好ましくはアルキル部分の炭素数
が1〜20の単環または2環のもの)、アルコキシ基(
好ましくは炭素数1〜20のもの)、置換アミノ基(好
ましくは炭素数1〜20のアルキル基で置換されたアミ
ノ基)、アシルアミノ基(好ましくは炭素数2〜30を
持つもの)、スルホンアミド基(好ましくは炭素数1〜
30を持つもの)、ウレイド基(好ましくは炭素数1〜
30を持つもの)などがある。The aryl group or unsaturated heterocyclic group of R21 may be substituted, and typical substituents include a linear, branched or cyclic alkyl group (preferably a monocyclic alkyl group having 1 to 20 carbon atoms). or two rings), alkoxy groups (
(preferably one having 1 to 20 carbon atoms), substituted amino group (preferably an amino group substituted with an alkyl group having 1 to 20 carbon atoms), acylamino group (preferably one having 2 to 30 carbon atoms), sulfonamide Group (preferably 1 to 1 carbon atoms)
30), a ureido group (preferably a carbon number of 1 to
30).
一般式[2]のR2□で表される基のうち置換されても
よいアルコキシ基としては炭素数1〜20のものであっ
て、ハロゲン原子、アリール基などで置換されていても
よい。Among the groups represented by R2□ in general formula [2], the optionally substituted alkoxy group has 1 to 20 carbon atoms, and may be substituted with a halogen atom, an aryl group, or the like.
一般式[21においてR2□で表される基のうち置換さ
れてもよいアリールオキシ基またはへテロ環オキシ基と
しては単環のものが好ましく、また置換基としてはハロ
ゲン原子アルキル基、アルコキシ基、シアン基などがあ
る
R82で表される基のうちで好ましいものは、置換され
てもよいアルコキシ基またはアミノ基である。Among the groups represented by R2□ in general formula [21, the optionally substituted aryloxy group or heterocyclic oxy group is preferably a monocyclic group, and the substituents include a halogen atom alkyl group, an alkoxy group, Among the groups represented by R82 that include a cyan group, preferred are an optionally substituted alkoxy group or an amino group.
A、置換されてもよいアルキル基、アルコシ基または一
〇−1−S−1−N−基結合を含む環状構造であっても
よい。但しR2zがヒドラジノ基であることはない。A may be a cyclic structure containing an optionally substituted alkyl group, an alkoxy group, or a 10-1-S-1-N- group bond. However, R2z is never a hydrazino group.
一般式[2]のR21またはR22はその中にカプラー
等の不動性写真用添加剤において常用されているバラス
ト基が組み込まれているものでもよい。R21 or R22 of general formula [2] may have a ballast group commonly used in immobile photographic additives such as couplers incorporated therein.
バラスト基は8以上の炭素数を有する写真性に対して比
較的不活性な基であり、例えばアルキル基、アルコキシ
基、フェニル基、アルキルフェニル基、フェノキシ基、
アルキルフェノキシ基などの中から選ぶことができる。The ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, such as an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group,
It can be selected from alkylphenoxy groups, etc.
−
一般式[2]のRZ+またはR22はその中にハロゲン
化銀粒子表面に対する吸着を強める基が組み込まれてい
るものでもよい。かかる吸着基としては、チオ尿素基、
複素環チオアミド基、メルカプト複素環基、トリアゾー
ル基などの米国特許第4 、355 。- RZ+ or R22 in general formula [2] may have a group incorporated therein that enhances adsorption to the silver halide grain surface. Such adsorption groups include thiourea group,
U.S. Pat. No. 4,355 for heterocyclic thioamide groups, mercapto heterocyclic groups, triazole groups, etc.
105号に記載されt;基があげられる。一般式[2]
で表される化合物のうち下記一般式[2−alで表され
る化合物は特に好ましい。The group described in No. 105 is exemplified. General formula [2]
Among the compounds represented by the following general formula [2-al], the compound represented by the following general formula [2-al] is particularly preferable.
一般式[2−al
上記一般式[2−al中、
RoおよびR24は水素原子、置換されてもよいアルキ
ル基(例えばメチル基、エチル基、ブチル基、ドデシル
基、2−ヒドロキシプロピル基、2−シアノエチル基、
2−クロロエチル基)、置換されてもよいフェニル基、
ナフチル基、シクロヘキシル基、ピリジル基、ピロリジ
ル基(例えばフェニル基、p−メチルフェニル基、ナフ
チル基、α−ヒドロキシナフチル基、シクロヘキシル基
、p−メチルシクロヘキシル基、ピリジル基、4−プロ
ピル−2−ピリジル基、ピロリジル基、4−メチル−2
−ピロリジル基)を表し、
Rlsは水素原子または置換されてもよいベンジル基、
アルコキシ基及びアルキル基(例えばベンジル基、p−
メチルベンジル基、メトキシ基、エトキシ基、エチル基
、ブチル基)を表し、R21及びR1,は2価の芳香族
基(例えば7エ二レン基またはナフチレン基)を表し、
Yはイオウ原子または酸素原子を表し、Lは2価の結合
基(例えば−3OzC1(2cH2NHSO*NIl、
0CHaSOJH1−〇−1−CH−N−)を表し
、
Roは−NR’R〃または−ORよ、を表し、R’、R
“及びRzsは水素原子、置換されてもよいアルキル基
(例えばメチル基、エチル基、ドデシル基)、フェニル
基(例えばフェニル基、p−メチルフェニル基、p−メ
トキシフェニル基)またはナフチル基(例えばa−ナフ
チル基、β−ナフチル基)を表し、m、nは0または1
を表す。R1,がOR,、を表すときYはイオウ原子を
表すのが好ましい。General formula [2-al In the above general formula [2-al, Ro and R24 are hydrogen atoms, optionally substituted alkyl groups (e.g. methyl group, ethyl group, butyl group, dodecyl group, 2-hydroxypropyl group, -cyanoethyl group,
2-chloroethyl group), an optionally substituted phenyl group,
Naphthyl group, cyclohexyl group, pyridyl group, pyrrolidyl group (e.g. phenyl group, p-methylphenyl group, naphthyl group, α-hydroxynaphthyl group, cyclohexyl group, p-methylcyclohexyl group, pyridyl group, 4-propyl-2-pyridyl group) group, pyrrolidyl group, 4-methyl-2
-pyrrolidyl group), Rls is a hydrogen atom or an optionally substituted benzyl group,
Alkoxy and alkyl groups (e.g. benzyl, p-
methylbenzyl group, methoxy group, ethoxy group, ethyl group, butyl group), R21 and R1 represent a divalent aromatic group (e.g. 7-enylene group or naphthylene group),
Y represents a sulfur atom or an oxygen atom, and L represents a divalent bonding group (e.g. -3OzC1(2cH2NHSO*NIl,
0CHaSOJH1-〇-1-CH-N-), Ro represents -NR'R〃 or -OR, R', R
" and Rzs are a hydrogen atom, an optionally substituted alkyl group (e.g. methyl group, ethyl group, dodecyl group), a phenyl group (e.g. phenyl group, p-methylphenyl group, p-methoxyphenyl group), or a naphthyl group (e.g. a-naphthyl group, β-naphthyl group), m and n are 0 or 1
represents. When R1 represents OR, Y preferably represents a sulfur atom.
上記一般式[2]及び[2−alで表される代表的な化
合物を以下に示す。Representative compounds represented by the above general formulas [2] and [2-al] are shown below.
以下苓白゛。Below is Reihaku.
′\ − 又一;/ 一般式[21の具体例 F3 CI。′\ − Mataichi;/ Specific example of general formula [21] F3 C.I.
■
※−NIINHCCOCllzCll*SOxCllx
C)1go)1凸0
■
* NHNHCCOClliCHzSC15CLlz
1M1CH。■ *-NIINHCCOCllzCll*SOxCllx
C) 1go) 1 convex 0 ■ * NHNHCCOClliCHzSC15CLlz
1M1CH.
CIllthl(1 !I しII。CIllthl(1 ! I II.
η
※ −NHNHCCN)lc+ sH* s次に、上記
具体的化合物のうち化合物2−45゜2−47を例にと
って、その合成法を示す。η*-NHNHCCN)lc+sH*sNext, a method for synthesizing the compound 2-45°2-47 from among the above-mentioned specific compounds will be shown as an example.
化合物2−45の合成
合成スキーム
(A)
(B)
(E)
化合物4−ニトロフェニルヒドラジン1539と500
tnf:lのジエチルオキザレートを混合し、1時間還
流する。反応を進めながらエタノールを除去していき、
最後に冷却し結晶を析出させる。濾過し石油エーテルで
数回洗浄し、再結晶する。次に得られた結晶(A)のう
ち509を10100Oのメタノールで加@溶解し、p
d/C(パラジウム・炭素)触媒下に50Psiのか加
圧したH2雰°囲気で還元し、化合物CB)を得る。Synthesis of compound 2-45 Synthesis scheme (A) (B) (E) Compounds 4-nitrophenylhydrazine 1539 and 500
Mix tnf:l of diethyl oxalate and reflux for 1 hour. As the reaction progresses, ethanol is removed,
Finally, it is cooled to precipitate crystals. Filter, wash several times with petroleum ether and recrystallize. Next, 509 of the obtained crystals (A) was dissolved in 10100O methanol, and p
Reduction is carried out under a d/C (palladium on carbon) catalyst in an H2 atmosphere pressurized to 50 Psi to obtain compound CB).
この化合物(B)22gをアセトニトリル200mff
とピリジン169の溶液に溶かし室温で化合物(C)2
4gのアセトニトリル溶液を滴下した。不溶物を濾別後
、濾液を濃縮し再結晶精製して化合物(D )319を
得tこ 。22g of this compound (B) in 200mff of acetonitrile
and pyridine 169 at room temperature.
4 g of acetonitrile solution was added dropwise. After filtering off insoluble matter, the filtrate was concentrated and purified by recrystallization to obtain Compound (D) 319.
化合物(D)309を上記と同様に水添をして化合物(
E)209を得た。Compound (D) 309 was hydrogenated in the same manner as above to obtain compound (
E) 209 was obtained.
化合物(E)109をアセトニトリル100mffに溶
解しエチルインチオシアネート3.09を加え、1時間
還流した。溶媒を留去後頁結晶精製して化合物CF)7
.0gを得た。化合物(F )5.09をメタノール5
0raQに溶解してメチルアミン(40%水溶液3a+
ff)を加え攪拌した。メタノールを若干濃縮後、析出
した固体をとり出し再結晶精製して化合物2−45を得
た。Compound (E) 109 was dissolved in 100 mff of acetonitrile, 3.09 g of ethyl inthiocyanate was added, and the mixture was refluxed for 1 hour. After distilling off the solvent, the compound CF)7 was purified by crystallization.
.. Obtained 0g. Compound (F) 5.09 methanol 5
Methylamine (40% aqueous solution 3a+) was dissolved in 0raQ.
ff) was added and stirred. After slightly concentrating methanol, the precipitated solid was taken out, recrystallized and purified to obtain Compound 2-45.
化合物2−47の合成
合成スキーム
(B)
(C)
(D)
(E)
化合物2−47
化合物(B)229をピリジン200m12に溶解し攪
拌すル中へ、p−ニトロベンゼンスルホニルクロライド
229を加えた。反応混合物を水あけ、後析出する固体
をとり出し化合物(C)を得た。この化合物(C)を合
成スキームに従って化合物2−45と同様の反応により
化合物2−47を得I;。Synthesis of Compound 2-47 Synthesis Scheme (B) (C) (D) (E) Compound 2-47 Compound (B) 229 was dissolved in 200 ml of pyridine, and p-nitrobenzenesulfonyl chloride 229 was added to the stirring vessel. . The reaction mixture was poured with water, and the precipitated solid was taken out to obtain compound (C). Compound 2-47 was obtained by reacting this compound (C) in the same manner as compound 2-45 according to the synthetic scheme.
次に一般式[3]について説明する。Next, general formula [3] will be explained.
一般式[3] 。General formula [3].
禦
Ar−NIINH−C−R,、
一般式[3]中、Arは耐拡散基又はハロゲン化銀吸着
促進基を少なくとも1つを含むアリール基を表わすが、
耐拡散基としてはカプラー等の不動性写真用添加剤にお
いて常用されているバラスト基が好ましい。バラスト基
は8以上の炭素数を有する写真性に対して比較的不活性
な基であり、例えばアルキル基、アルコキシ基、フェニ
ル基、アルキルフェニル基、フェノキシ基、アルキルフ
ェノキシ基などの中から選ぶことができる。禦Ar-NIINH-C-R,, In the general formula [3], Ar represents an aryl group containing at least one diffusion-resistant group or silver halide adsorption promoting group,
The diffusion-resistant group is preferably a ballast group commonly used in immobile photographic additives such as couplers. The ballast group is a group having 8 or more carbon atoms and is relatively inert to photography, and may be selected from, for example, an alkyl group, an alkoxy group, a phenyl group, an alkylphenyl group, a phenoxy group, an alkylphenoxy group, etc. Can be done.
ハロゲン化銀吸着促進基としてはチオ尿素基、チオウレ
タン基、複素環チオアミド基、メルカプト複素環基、ト
リアゾール基などの米国特許第4゜385、108号に
記載された基が挙げられる。Examples of the silver halide adsorption promoting group include groups described in US Pat. No. 4,385,108, such as a thiourea group, a thiourethane group, a heterocyclic thioamide group, a mercapto heterocyclic group, and a triazole group.
R31は置換アルキル基を表わすが、アルキル基として
は、直鎖、分岐、環状のアルキル基を表わし、例えばメ
チル、エチル、プロピル、ブチル、イングロビル、ペン
チル、シクロヘキシル等の基が挙げられる。R31 represents a substituted alkyl group, and the alkyl group represents a linear, branched, or cyclic alkyl group, such as methyl, ethyl, propyl, butyl, inglovir, pentyl, cyclohexyl, and the like.
これらのアルキル基へ導入される置換基としては、アル
コキシ(例えばメトキシ、エトキシ等)、アリールオキ
シ(例えばフェノキシ、p−クロルフェノキシ等)、ヘ
テロ環オキシ(例えばピリジルオキシ等)、メルカプト
、アルキルチオ(メチルチオ、エチルチオ等)、アリー
ルチオ(例えばフェニルチオ、p−クロルフェニルチオ
等)、ヘテロ環チオ(例えば、ピリジルチオ、ピリミジ
ルチオ、チアジアゾリルチオ等)、アルキルスルホニル
(例えばメタンスルホニル、ブタンスルホニル等)、ア
リールスルホニル(例えばベンゼンスルホニル等)、ヘ
テロ環スルホニル(例えばピリジルスルホニル、モルホ
リノスルホニル等)、アシル(例えばアセチル、ベンゾ
イル等)、シアノ、クロル、臭素、アルコキシカルボニ
ル(例えばエトキシカルボニル、メトキシカルボニル等
)、アリールオキシカルボニル(例えばフェノキシカル
ボニル等)、カルボキシ、カルバモイル、アルキルカル
バモイル(例えば、N−メチルカルバモイル、N、N−
ジメチルカルバモイル等)、アリールカルバモイル(例
えば、N−フェニルカルバモイル等)、アミノ、アルキ
ルアミノ(例えば、メチルアミン、N、N−ジメチルア
ミノ等)、アリールアミノ(例えば、フェニルアミノ、
ナフチルアミノ等)、アシルアミノ(例えばアセチルア
ミノ、ベンゾイルアミノ等)、アルコキシカルボニルア
ミノ(例えば、エトキシカルボニルアミノ等)、アリー
ルオキシカルボニルアミノ(例えば、フェノキシカルボ
ニルアミノ等)、アシルオキシ(例えば、アセチルオキ
シ、ベンゾイルオキシ等)、アルキルアミノカルボニル
オキシ(例えばメチルアミノカルボニルオキシ等)、ア
リールアミノカルボニルオキシ(例えば、フェニルアミ
7カルポニルオキシ等)、スルホ、スルファモイル、ア
ルキルスルファモイル(例えば、メチルスルファモイル
等)、アリールスルファモイル(例えば、フェニルスル
ファモイル等)等の各基が挙げられる。Substituents introduced into these alkyl groups include alkoxy (e.g., methoxy, ethoxy, etc.), aryloxy (e.g., phenoxy, p-chlorophenoxy, etc.), heterocyclic oxy (e.g., pyridyloxy, etc.), mercapto, alkylthio (methylthio), etc. , ethylthio, etc.), arylthio (e.g., phenylthio, p-chlorophenylthio, etc.), heterocyclic thio (e.g., pyridylthio, pyrimidylthio, thiadiazolylthio, etc.), alkylsulfonyl (e.g., methanesulfonyl, butanesulfonyl, etc.), arylsulfonyl ( For example, benzenesulfonyl, etc.), heterocyclic sulfonyl (for example, pyridylsulfonyl, morpholinosulfonyl, etc.), acyl (for example, acetyl, benzoyl, etc.), cyano, chloro, bromine, alkoxycarbonyl (for example, ethoxycarbonyl, methoxycarbonyl, etc.), aryloxycarbonyl ( (e.g., phenoxycarbonyl), carboxy, carbamoyl, alkylcarbamoyl (e.g., N-methylcarbamoyl, N,N-
dimethylcarbamoyl, etc.), arylcarbamoyl (e.g., N-phenylcarbamoyl, etc.), amino, alkylamino (e.g., methylamine, N,N-dimethylamino, etc.), arylamino (e.g., phenylamino,
naphthylamino, etc.), acylamino (e.g., acetylamino, benzoylamino, etc.), alkoxycarbonylamino (e.g., ethoxycarbonylamino, etc.), aryloxycarbonylamino (e.g., phenoxycarbonylamino, etc.), acyloxy (e.g., acetyloxy, benzoyloxy), etc.), alkylaminocarbonyloxy (e.g. methylaminocarbonyloxy etc.), arylaminocarbonyloxy (e.g. phenylami7carponyloxy etc.), sulfo, sulfamoyl, alkylsulfamoyl (e.g. methylsulfamoyl etc.), arylsulf Examples include various groups such as famoyl (eg, phenylsulfamoyl, etc.).
ヒドラジンの水素原子はスルホニル基(例えばメタンス
ルホニル、トルエンスルホニル等)、アシル基(例えば
、アセチル、トリフルオロアセチル等)、オキザリル基
(例えば、エトキザリル等)等)等の置換基で置換され
ていてもよい。Even if the hydrogen atom of hydrazine is substituted with a substituent such as a sulfonyl group (e.g., methanesulfonyl, toluenesulfonyl, etc.), an acyl group (e.g., acetyl, trifluoroacetyl, etc.), an oxalyl group (e.g., ethoxalyl, etc.), good.
上記一般式[3〕で表される代表的な化合物としては、
以下に示すものがある。Representative compounds represented by the above general formula [3] include:
There are the following.
υ
しLILtr 3
※−聞811CC)120CIIICH□OCR,C)
1.OH次に化合物3−5の合成例について述べる。υ しLILtr 3 *-Kin811CC) 120CIIICH□OCR,C)
1. OHNext, a synthesis example of compound 3-5 will be described.
化合物3−5の合成 合成スキーム 化合物2−45の合成法に準じて化合物3−5を得た。Synthesis of compound 3-5 Synthesis scheme Compound 3-5 was obtained according to the synthesis method of compound 2-45.
本発明のハロゲン化銀写真感光材料に含まれる一般式[
1]、[2]、[3]の化合物の量は、本発明のハロゲ
ン化銀写真感光材料中に含有されるハロゲン化銀1モル
当り、5 X 10−’ないしs x io−’モルま
でが好ましく、更に好ましくは5 X 10−’ないし
I X 10−”モルの範囲である。General formula [
The amount of the compounds 1], [2], and [3] is from 5 x 10-' to s x io-' mol per 1 mol of silver halide contained in the silver halide photographic material of the present invention. is preferred, and more preferably in the range of 5 x 10-' to I x 10-'' moles.
本発明のハロゲン化銀乳剤層に用いられるハロゲン化銀
は、臭化銀を50モル%以上含有する塩臭化銀または塩
沃臭化銀である。臭化銀の含有率が50モル%より少な
い場合は現像処理後のフィルムにペラパーフォグを含む
カブリの発生が著しい。The silver halide used in the silver halide emulsion layer of the present invention is silver chlorobromide or silver chloroiodobromide containing 50 mol % or more of silver bromide. When the content of silver bromide is less than 50 mol %, fog including permeable fog occurs significantly on the film after development.
このハロゲン化銀の粒子径は特に制限はないが、平均粒
子が0.5μ鴎より小さいものが好ましく、全粒子数の
90%以上が平均粒子径を中心に±40%以内に入る所
謂単分散粒子であることが好ましい。There is no particular restriction on the grain size of this silver halide, but it is preferable that the average grain is smaller than 0.5 μm, and 90% or more of the total grains are so-called monodisperse, within ±40% of the average grain size. Preferably they are particles.
ハロゲン化銀粒子の晶癖は立方晶、14面体および8面
体のいずれでもよく、又、特開昭53−108525号
に開示されているタブレットを粒子でもよい。The silver halide grains may have a cubic, tetradecahedral or octahedral crystal habit, and may also be tablet grains as disclosed in JP-A-53-108525.
本発明のハロゲン化銀乳剤層のハロゲン化銀粒子の調整
方法は順混合法、逆混合法等のシングルジェット法や同
時混合法によるダブルジェット法のいずれでもよく、よ
り好ましいのは同時混合法である。またアンモニア法、
中性法、酸性法や特公昭58−3232号に開示された
変則アンモニア法等のいずれでもよく、より好ましいの
は酸性法または中性法である。The method for preparing silver halide grains in the silver halide emulsion layer of the present invention may be a single jet method such as a forward mixing method or a back mixing method, or a double jet method using a simultaneous mixing method, and more preferably a simultaneous mixing method. be. Also, ammonia method,
Any method such as a neutral method, an acid method, or the modified ammonia method disclosed in Japanese Patent Publication No. 58-3232 may be used, and the acid method or the neutral method is more preferred.
また、これらのハロゲン化銀粒子内に、イリジウム、ロ
ジウム、オスミウム、ビスマス、コバルト、ニッケル、
ルテニウム、鉄、銅、亜鉛、鉛、カドミウム等の金属原
子を含有せしめてもよい。In addition, these silver halide grains contain iridium, rhodium, osmium, bismuth, cobalt, nickel,
Metal atoms such as ruthenium, iron, copper, zinc, lead, and cadmium may be contained.
これらの金属原子を含有せしめる場合、ハロゲン化銀1
モル当り、10−”−101モルの範囲で含有させるの
が好ましい。また、ハロゲン化銀粒子は表面潜像型が好
ましい。When containing these metal atoms, silver halide 1
The content is preferably in the range of 10-101 moles per mole. Also, the silver halide grains are preferably of surface latent image type.
次に、本発明の一般式[4]で表される化合物について
説明する。Next, the compound represented by the general formula [4] of the present invention will be explained.
一般式[4]において、R、、、R、、、R、、および
R44で示される置換基を有していてもよいアルキル基
は好ましくは炭素原子数1〜8の低級アルキル基(例え
ばメチル基、エチル基、1so−プロピル基、n−ブチ
ル基、オクチル基)であり、このアルキル基の置換基と
しては例えばヒドロキシ基、スルホン基、カルボン酸基
、アミノ基、ハロゲノ基が挙げられる。In general formula [4], the optionally substituted alkyl group represented by R, , R, , R, and R44 is preferably a lower alkyl group having 1 to 8 carbon atoms (for example, methyl substituents for this alkyl group include, for example, a hydroxy group, a sulfone group, a carboxylic acid group, an amino group, and a halogeno group.
R4□IR4!IR43およびR44で示される置換基
を有していてもよいアリール基としては例えば7エ二ル
基、ナフチル基等が挙げられ好ましくはフェニル基であ
る。このアリール基の置換基としてはアルキル基(好ま
しくは炭素数1〜8の低級アルキル基)、アルコキシカ
ルボニル基、アルキルスルホニル基、アルキルカルボニ
ル基(これらの基のアルキル基部分は好ましくは炭素数
1〜8である)、ニトロ基、シアノ基、ハロゲン原子、
−N(CjHi)zHc(2−等が挙げられる。R4□IR4! Examples of the aryl group which may have a substituent represented by IR43 and R44 include a 7-enyl group and a naphthyl group, with a phenyl group being preferred. Substituents for this aryl group include alkyl groups (preferably lower alkyl groups having 1 to 8 carbon atoms), alkoxycarbonyl groups, alkylsulfonyl groups, and alkylcarbonyl groups (the alkyl portion of these groups preferably has 1 to 8 carbon atoms). 8), nitro group, cyano group, halogen atom,
-N(CjHi)zHc(2-, etc.).
R411Razi 43およびびR44で示される置換
基を有していてもよいアラルキル基としては例えばベン
ゾイル、フェネチル基等が挙げられ、好ましくはベンゾ
イル基である。このアラルキル基の置換基としては例え
ば上記アリール基における基が挙げられる。Examples of the aralkyl group which may have a substituent represented by R411Razi 43 and R44 include benzoyl and phenethyl groups, with benzoyl being preferred. Examples of substituents for this aralkyl group include the groups for the above-mentioned aryl group.
R411Razi 43およびR44のアリール基また
はアラルキル基の有する電子吸引性基の置換基としては
ニトロ基、シアノ基、ハロゲノ基、カルボニル基、カル
ボキシル基、スルホニル基、第4級アミノ基等が代表的
なものとして挙げられる。Typical substituents for the electron-withdrawing group of the aryl group or aralkyl group of R411Razi 43 and R44 include a nitro group, a cyano group, a halogeno group, a carbonyl group, a carboxyl group, a sulfonyl group, a quaternary amino group, etc. It is mentioned as.
X−によって示されるアニオンとしては例えば塩化物イ
オン、臭化物イオン、沃化物イオン、シアン化物イオン
、次亜塩素酸イオン、p−トルエンスルホン酸イオン、
ベンゼンスルホン酸イオン、水酸化物イオン等が挙げら
れる。Examples of anions represented by X- include chloride ion, bromide ion, iodide ion, cyanide ion, hypochlorite ion, p-toluenesulfonate ion,
Examples include benzenesulfonic acid ion and hydroxide ion.
一般式[4]で示される化合物は特公昭50−4066
5号に記載の方法により容易に合成することができる。The compound represented by the general formula [4] is
It can be easily synthesized by the method described in No. 5.
後記実施例に示す如く、前記一般式[4]と類似の化学
構造ではあるが、電子吸引性の置換分を有しないアリー
ル基またはアラルキル基からなる化合物を用いた場合は
、得られる写真感光材料に対してペラパーツ才グの発生
の抑制効果はない。As shown in the Examples below, when a compound having a chemical structure similar to the above general formula [4] but consisting of an aryl group or an aralkyl group without an electron-withdrawing substituent is used, the resulting photographic light-sensitive material However, there is no effect on suppressing the occurrence of Pella parts.
一般式〔4]で示される化合物の具体例として下記の化
合物を挙げるが、これに限定されるものではない。Specific examples of the compound represented by the general formula [4] include the following compounds, but the compounds are not limited thereto.
[4] −1
[4] −2
[4] −3
(4] −4
[4] −5
[4] −6
[4] −7
[4] −8
[4] −9
[4] −10
[4] −11
[4] −12
[4] −13
[4] −14
[4] −15
[4] −16
[4] −17
なお、前記一般式[4]で示される化合物をハロゲン化
銀写真感光材料の構成要素中に含有せしめるには、水ま
たは水と任意に混和可能なメタノール、エタノール等の
有機溶媒に溶解した後、構成要素に含有せしめればよい
。その添加量はハロゲン化銀の種類、含有せしめる構成
要素の種類、用いる化合物の種類等により異なるが、概
して、乳材層中に添加する場合はハロゲン化銀1モル当
り1O−7〜1O−3モル、より好ましくは10−’〜
10−4の範囲で添加することができる。[4] -1 [4] -2 [4] -3 (4) -4 [4] -5 [4] -6 [4] -7 [4] -8 [4] -9 [4] -10 [4] -11 [4] -12 [4] -13 [4] -14 [4] -15 [4] -16 [4] -17 Note that the compound represented by the above general formula [4] is halogenated In order to incorporate silver into the constituent elements of photographic materials, it may be dissolved in water or an organic solvent miscible with water such as methanol or ethanol, and then incorporated into the constituent elements. Although it varies depending on the type of silver, the type of constituent elements contained, the type of compound used, etc., in general, when added to the emulsion layer, it is 1O-7 to 1O-3 mol per mol of silver halide, more preferably 10 −'〜
It can be added in a range of 10-4.
次に、前記一般式[5]で表される化合物について説明
する。Next, the compound represented by the general formula [5] will be explained.
前記一般式[5]において、R31で示される低級アル
キル基は直鎖でも分岐でもよく、炭素数は1〜8であり
例えばメチル基、エチル基、1so−7’ロビル諷、ブ
チル基等が挙げられる。In the general formula [5], the lower alkyl group represented by R31 may be linear or branched, and has 1 to 8 carbon atoms, such as a methyl group, an ethyl group, a 1so-7' lobil group, a butyl group, etc. It will be done.
一般式[5]で示される化合物の具体的な代表例を下記
に挙げる。Specific representative examples of the compound represented by the general formula [5] are listed below.
[5]−15−ニトロインダゾール
[5]−26−二トロインダゾール
[5]−35−メチルインダゾール
[5] −46−メチルインダゾール
[5]−5 インダゾール
[5] −65−クロロベンツイミダゾール[5]−7
5−メチルベンツイミダゾール[5]−85−エチルベ
ンツイミダゾール[5]−95−二トロペンツイミダゾ
ール[5]−106−二トロベンツイミダゾール[5]
−115−クロロペンツイミダゾール[5]−12
ベンツイミダゾール
一般式[5]で示される化合物はハロゲン化銀1モル当
りl X 10−’〜l XIO−’モルの範囲の添加
量で用いられ、特に好ましくはIXIO−’〜IXIO
−”の範囲である。この化合物の添加方法は一般式[1
〕で示される化合物に準じればよい。[5] -15-nitroindazole [5] -26-nitroindazole [5] -35-methylindazole [5] -46-methylindazole [5] -5 Indazole [5] -65-chlorobenzimidazole [5] ]-7
5-Methylbenzimidazole [5]-85-ethylbenzimidazole [5]-95-nitropenzimidazole [5]-106-nitrobenzimidazole [5]
-115-chloropenzimidazole [5]-12
The compound represented by the general formula [5] of benzimidazole is used in an amount in the range of 1 x 10-' to 1
-” range.The addition method of this compound is the general formula [1
] may be applied.
次に一般式[6]で表される化合物について説明する。Next, the compound represented by general formula [6] will be explained.
一般式[6]において、R IllR81およびR@3
で示されるアルキル基は直鎖でも分岐でもよく、好まし
くは炭素数1−16であり、例えばメチル基、エチル基
やドデシル基等の長鎖アルキル基が挙げられる。R 、
、R 、!およびR.、で示されるアリール基としては
フェニル基、ナフチル基等が挙げられる。In general formula [6], R IllR81 and R@3
The alkyl group represented by may be linear or branched, preferably having 1 to 16 carbon atoms, and includes long-chain alkyl groups such as methyl, ethyl, and dodecyl. R,
,R,! and R. Examples of the aryl group represented by , include phenyl group and naphthyl group.
一般式[6]で示される化合物の具体的な代表例として
下記の化合物が挙げられる。Specific representative examples of the compound represented by the general formula [6] include the following compounds.
(6)−1 6−アミノプリン
(6)−2 4−アミノ−6−ヒドロキシプリン(
6)−3 6−ベンジルアミノプリン(6)−4
6−メルカプトプリン(6)−5 4.6−シ
ヒドロキシプリン(6)−6 4.6−ジアミツプ
リン(6)−7 トメチル−6−アミノプリン(6
)−8 4−メチル−6−アミノプリン(6)−9
1−ヒドロキシ−6−アミノプリン(6)−10
1−メルカプト−4−オクチルプリン(6)−1
1 4−フェニル−6−アミノプリン(6)−12
1.6−ジアミツプリン一般式[6]で示される化合
物はハロゲン化銀1モル当りIX 10−’〜IXIO
−’モルの範囲の添加量で用いられ、特に好ましくはI
XIO−’〜IXIO−’モルの範囲である。この化合
物の添加方法は一般式[1]で示される化合物に準じれ
ばよい。(6)-1 6-aminopurine (6)-2 4-amino-6-hydroxypurine (
6)-3 6-Benzylaminopurine (6)-4
6-mercaptopurine (6)-5 4.6-cyhydroxypurine (6)-6 4.6-diamitpurine (6)-7 Tomethyl-6-aminopurine (6)
)-8 4-methyl-6-aminopurine (6)-9
1-hydroxy-6-aminopurine (6)-10
1-Mercapto-4-octylpurine (6)-1
1 4-phenyl-6-aminopurine (6)-12
The compound represented by the general formula [6] of 1.6-diamitpurin has IX 10-' to IXIO per mole of silver halide.
-' molar range, particularly preferably I
The range is from XIO-' to IXIO-' moles. The method for adding this compound may be similar to that for the compound represented by general formula [1].
本発明に係るハロゲン化銀乳剤層のハロゲン化銀写真乳
剤(以下本発明のハロゲン化銀写真乳剤という)は化学
増感を施すことができる。化学増感法には、硫黄増感、
還元増感および貴金属増感が包含されるが、本発明にお
いては、硫黄増感単独で化学増感を行うのが好ましい。The silver halide photographic emulsion of the silver halide emulsion layer according to the present invention (hereinafter referred to as the silver halide photographic emulsion of the present invention) can be chemically sensitized. Chemical sensitization methods include sulfur sensitization,
Although reduction sensitization and noble metal sensitization are included, in the present invention, chemical sensitization is preferably carried out using sulfur sensitization alone.
硫黄増感剤としてはゼラチン中に含まれる硫黄化合物の
ほか、種々の硫黄化合物、例えばチオ硫酸塩、チオ尿素
類、チアゾール類、ローダニン類等を用いることができ
、具体的には米国特許第1574944号、同第241
0689号、同第2728668号、特公昭59・11
892号等に記載されている硫黄増感剤を用いることが
できる。As the sulfur sensitizer, in addition to the sulfur compounds contained in gelatin, various sulfur compounds such as thiosulfates, thioureas, thiazoles, and rhodanines can be used. Specifically, US Pat. No. 1,574,944 No. 241
No. 0689, No. 2728668, Special Publication No. 11/1982
Sulfur sensitizers described in No. 892 and the like can be used.
本発明のハロゲン化銀写真乳剤は、それぞれ所望の感光
波長域に感光性を付与することができる。The silver halide photographic emulsion of the present invention can be provided with photosensitivity in a desired wavelength range.
ここで1種または2種以上の増感色素を用いて光学増感
をしてもよい。増感色素としては、種々のものを用いる
ことができるが、本発明に於て有利に使用しうる光学増
感色素としては、シアニン類、カルボシアニン類、メロ
シアニン類、三核または四核メロシアニン類、三核また
は四核シアニン類、スチリル類、ホロポーラ−シアニン
類、ヘミンシアニン類、オキソノール類、ヘミオキソノ
ール類等を挙げることができ、これらの光学増感色素は
含窒素複素環核としてその構造の1部にチアゾリン、チ
アゾール等の塩基性基またはローダニン、チオヒダント
イン、オキサゾリジンジオン、バルビッール酸、チオバ
ルビッール酸、ピラゾロン等の核を含むものが好ましく
、かかる核は、アルキル、ヒドロキシアルキルハロゲン
、フェニル、シアノ、アルコキシ置換することができ、
またこれらの光学増感色素は炭素環または複素環と縮合
していてもよい。Here, optical sensitization may be performed using one or more types of sensitizing dyes. Various sensitizing dyes can be used, but optical sensitizing dyes that can be advantageously used in the present invention include cyanines, carbocyanines, merocyanines, and trinuclear or tetranuclear merocyanines. , trinuclear or tetranuclear cyanines, styryls, holopolar cyanines, hemin cyanines, oxonols, hemioxonols, etc. These optical sensitizing dyes have a structure as a nitrogen-containing heterocyclic nucleus. Preferably, one part contains a basic group such as thiazoline or thiazole, or a nucleus such as rhodanine, thiohydantoin, oxazolidinedione, barbylic acid, thiobarbylic acid, or pyrazolone. Alkoxy can be substituted,
Further, these optical sensitizing dyes may be fused with a carbocyclic ring or a heterocyclic ring.
本発明のハロゲン化銀写真乳剤には安定剤として例えば
テトラザインデン類、カプリ防止剤として例えばトリア
ゾール類、テトラゾール類、カバーリングパワー向上剤
、イラジエーシ目ン防止剤として例えばオキサノール染
料、ジアルキルアミノベンジリデン染料等、湿潤剤とし
て例えばポリマーラテックス類、その他一般の写真用乳
剤に用いられる添加剤、例えば延展剤、硬膜剤等を添加
することは可能である。The silver halide photographic emulsion of the present invention includes stabilizers such as tetrazaindenes, anti-capri agents such as triazoles and tetrazoles, covering power improvers, and anti-irradiation agents such as oxanol dyes and dialkylaminobenzylidene dyes. It is possible to add, for example, polymer latexes as wetting agents, and other additives used in general photographic emulsions, such as spreading agents and hardening agents.
本発明のハロゲン化銀写真感光材料の支持体は、ポリエ
ステルベース、TAcベース、バライタ紙、ラミネート
加工紙、ガラス板等通常用いられるものが用いられる。As the support for the silver halide photographic material of the present invention, commonly used supports such as polyester base, TAc base, baryta paper, laminated paper, glass plate, etc. are used.
本発明のハロゲン化銀写真感光材料に使用される現像液
としては、一般的なハロゲン化銀写真感光材料に用いら
れる現像液およびリス現像液のいずれをも用いることが
できる。これら現像液の現像主薬としては、ハイドロキ
ノン、クロルハイドロキノン、カテコールの様なジヒド
ロキシベンゼン類や、l−フェニル−3−ピラゾリドン
、l−7エニルー4.4−ジメチル−3−ピラゾリドン
、l・フェニル−4−メチル−3−ピラゾリドン、l−
フェニル−4−メチル−4−ヒドロキシメチル−3−ピ
ラゾリドンの様な3−ピラゾリドン類があげられ、さら
に又、N−メチル−p−アミノフェノール、N−(4−
ヒドロキシフェニル)グリシンの様なパラアミノフェノ
ール類、β−メタンスルホンアミドエステル、エチルア
ミノトルイジン、N、N−ジエチル−p−7二二レンジ
アミンの様なp−7zニレンジアミン類及びアスコルビ
ン酸類などがあげられ、この様な現像主薬を1つ以上含
む水溶液として使用される。As the developer used in the silver halide photographic light-sensitive material of the present invention, either a developer used in a general silver halide photographic light-sensitive material or a lithium developer can be used. The developing agents of these developers include dihydroxybenzenes such as hydroquinone, chlorohydroquinone, and catechol, l-phenyl-3-pyrazolidone, l-7enyl-4,4-dimethyl-3-pyrazolidone, and l-phenyl-4. -Methyl-3-pyrazolidone, l-
Examples include 3-pyrazolidones such as phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone, and also N-methyl-p-aminophenol, N-(4-
Examples include para-aminophenols such as (hydroxyphenyl)glycine, β-methanesulfonamide ester, ethylaminotoluidine, p-7z nylene diamines such as N,N-diethyl-p-7 di-2-diamine, and ascorbic acids. , used as an aqueous solution containing one or more such developing agents.
他に現像液には亜硫酸ナトリウム、亜硫酸カリウム、ホ
ルムアルデヒド亜硫酸水素ナトリウム、ヒドロキシルア
ミン、エチレン尿素の様な保恒剤、臭化ナトリウム、臭
化カリウム1、ヨウ化カリウム等の様な無機塩の現像抑
制剤、l−フェニル−5−メルカプトテトラゾール、5
−ニトロペンツイミダゾール、5−ニトロベンゾトリア
ゾール、5−ニトロインダゾール、5−メチル−ベンゾ
トリアゾール、4−チアゾリン−2−チオン等の様な1
種以上の有機抑制剤、水酸化ナトリウム、水酸化カリウ
ム等のアルカリ剤、ジェタノールアミン、トリエタノー
ルアミン、3−ジエチルアミン−1−プロパツール、2
−メチルアミノ−1−エタノール、3−ジエチルアミノ
−1,2−プロパンジオール、ジイソプロピルアミン、
5−アミノ−1−ペンタノール、6−アミノ−1−ヘキ
サノール等の現像促進効果を有するアルカノールアミン
類、炭酸ナトリウム、リン酸ナトリウム、炭酸水溶液、
リン酸水溶液等の現像液中でバッファー効果を持つバッ
ファー剤、硫酸ナトリウム、酢酸ナトリウム、クエン酸
ナトリウムの様な塩類、エチレンジアミン4酢酸ナトリ
ウム、ニトリロ三酢酸ナトリウム、ヒドロキシジアミン
三酢酸ナトリウム等のキレート化効果による硬水軟化剤
、グルタルアルデヒドの様な現像硬膜剤、ジエチレング
リコール、ジメチルホルムアルデヒド、エチルアルコー
ル、ベンジルアルコールの様な現1主1や有機抑制剤の
溶剤、メチルイミダシリン、メチルイミダゾール、ポリ
エチレングリコール、ドデシルピリジニウムブロマイド
等の現像調整剤等を添加して構成することができる。In addition, the developer contains preservatives such as sodium sulfite, potassium sulfite, formaldehyde sodium bisulfite, hydroxylamine, ethylene urea, and inorganic salts such as sodium bromide, potassium bromide 1, potassium iodide, etc. to inhibit development. agent, l-phenyl-5-mercaptotetrazole, 5
- 1 such as nitropenzimidazole, 5-nitrobenzotriazole, 5-nitroindazole, 5-methyl-benzotriazole, 4-thiazoline-2-thione, etc.
organic inhibitors, alkaline agents such as sodium hydroxide, potassium hydroxide, jetanolamine, triethanolamine, 3-diethylamine-1-propertool, 2
-methylamino-1-ethanol, 3-diethylamino-1,2-propanediol, diisopropylamine,
Alkanolamines having a development accelerating effect such as 5-amino-1-pentanol and 6-amino-1-hexanol, sodium carbonate, sodium phosphate, aqueous carbonate solution,
Buffers that have a buffering effect in developing solutions such as phosphoric acid aqueous solutions, salts such as sodium sulfate, sodium acetate, and sodium citrate, and chelating effects such as sodium ethylenediaminetetraacetate, sodium nitrilotriacetate, and sodium hydroxydiaminetriacetate. Water softeners, developer hardeners such as glutaraldehyde, solvents and organic inhibitors such as diethylene glycol, dimethyl formaldehyde, ethyl alcohol, benzyl alcohol, methyl imidacillin, methyl imidazole, polyethylene glycol, It can be constituted by adding a development regulator such as dodecylpyridinium bromide.
現像液のPHは特に規定はないがpH9〜13の範囲が
好ましい。The pH of the developer is not particularly limited, but is preferably in the range of 9 to 13.
本発明のハロゲン化銀写真感光材料を現像するのに好ま
しい現像液の構成物の一例は次の通りである。現像主薬
としてハイドロキノン20〜609#および1−フェニ
ル−4−メチル−4−ヒドロキシメチル−3−ピラゾリ
ドン0.1〜29/Q又はl・フェニル−4,4−ジメ
チル−3−ピラゾリドン0.1〜2gIQ、現像液保恒
剤として亜硫酸ナトリウム10〜200g/Qまたは亜
硫酸カリウム10〜2009/(2,無機塩の現像抑制
剤として臭化ナトリウムや臭化カリウム1” 1o9I
Q、現像促進効果を持つアルカノールアミン類1〜50
9/Q、 有機抑制剤として例えば5−メチルベンゾト
リアゾール0.05〜2g/(11もしくは5−ニトロ
インダゾール0、O1〜2g/Qsバッファー剤として
炭酸ナトリウム1−509#!やリン酸水溶液(1mo
g#l) 1010−8O0/Q。An example of the composition of a preferable developer for developing the silver halide photographic material of the present invention is as follows. As a developing agent, hydroquinone 20-609# and 1-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone 0.1-29/Q or l-phenyl-4,4-dimethyl-3-pyrazolidone 0.1- 2gIQ, as a developer preservative, sodium sulfite 10-200g/Q or potassium sulfite 10-2009/(2, as an inorganic salt development inhibitor, sodium bromide or potassium bromide 1" 1o9I
Q. Alkanolamines 1 to 50 that have a development accelerating effect
9/Q, organic inhibitors such as 5-methylbenzotriazole 0.05-2 g/(11 or 5-nitroindazole 0,01-2 g/Qs buffer agents such as sodium carbonate 1-509#! or phosphoric acid aqueous solution (1 mo
g#l) 1010-8O0/Q.
キレート化剤としてエチレンジアミン四酢酸2ナトリウ
ム塩0.1= 109/<+を添加し、適当なアルカリ
剤(例えば水酸化カリウム)を用いてpi(を11.Q
〜12.5に合せた現像液である。Add ethylenediaminetetraacetic acid disodium salt 0.1 = 109/<+ as a chelating agent, and use a suitable alkaline agent (e.g. potassium hydroxide) to convert pi (11.Q
It is a developer adjusted to ~12.5.
本発明のハロゲン化銀写真感光材料は、上述した現像液
で現像された後、定理、水洗、乾燥のプロセスを経て画
像を固定される。この時現像ブロセスに於ける現像温度
と現像時間に対しては、特に制約はないが、現像温度は
20〜45℃、現像時間は15秒〜200秒の範囲が好
ましい。The silver halide photographic light-sensitive material of the present invention is developed with the above-mentioned developer, and then undergoes a process of rinsing, washing with water, and drying to fix the image. At this time, there are no particular restrictions on the development temperature and development time in the development process, but the development temperature is preferably in the range of 20 to 45°C and the development time is in the range of 15 seconds to 200 seconds.
実施例
以下実施例により本発明を更に詳細に説明するが、本発
明はこれらに限定されるものではない。EXAMPLES The present invention will be explained in more detail with reference to Examples below, but the present invention is not limited thereto.
実施例 1
50℃に保ったゼラチン水溶液中に硝酸銀水溶液とハラ
イド水溶液(KBr 98moffi%、KI 2so
Q%)とを同時に50分間で加え、その間のpAgわ7
.5に保つことにより、平均粒径0.25μiの単分散
沃臭化銀乳剤を調製した。この乳剤を常法により脱塩、
水洗を行った後、沃臭化銀1モル当りチオ硫酸ナトリウ
ム15119を添加し、60℃で60分間化学熟成を加
えt;。Example 1 Silver nitrate aqueous solution and halide aqueous solution (KBr 98 moffi%, KI 2so
Q%) was added at the same time for 50 minutes, and during that time pAg 7
.. 5, a monodisperse silver iodobromide emulsion with an average grain size of 0.25 μi was prepared. This emulsion was desalted by a conventional method.
After washing with water, 15119 sodium thiosulfate was added per mole of silver iodobromide, and chemical ripening was performed at 60° C. for 60 minutes.
次に、この乳剤に6−メチル−4−ヒドロキシ−1,3
゜3a、7−チトラザインデンを1g/AsX1モルを
加えた。増感色素としてアンヒドロ−5,5°−ジクロ
ロ−9−エチル−3,3′−ビス(3−スルホプロピル
)オキサカルボシアニンヒドロキシドナトリウム塩を2
00曹9/A9X 1モル、又、ポリエチレングリコー
ルを250mg/A9X1モル、例示のヒドラジド化合
物を1.Og/A9X1モル添加し表−1に示す様に本
発明による一般式[4]、[5]、[6]の化合物を添
加した。Next, this emulsion was added to 6-methyl-4-hydroxy-1,3
3a, 1 g of 7-chitrazaindene/1 mole of AsX was added. Anhydro-5,5°-dichloro-9-ethyl-3,3'-bis(3-sulfopropyl)oxacarbocyanine hydroxide sodium salt was used as a sensitizing dye.
00 carbonate 9/A9X 1 mol, polyethylene glycol 250 mg/A9X 1 mol, and an exemplary hydrazide compound 1. 1 mol of Og/A9X was added, and the compounds of general formulas [4], [5], and [6] according to the present invention were added as shown in Table 1.
こうして得られた乳剤にエチルアクリレートラテックス
ポリ?−29/II”、ゼラチンを2.5s/m”、
A gX粒子を銀量換算で3.59/II2になる様に
サポニン溶液を延展剤としてPETベース上に塗布した
。The emulsion thus obtained contains ethyl acrylate latex poly? -29/II", gelatin at 2.5 s/m",
AgX particles were coated on a PET base using a saponin solution as a spreading agent so that the silver content was 3.59/II2.
この乳剤層をゼラチン1.5g/m”になる様にサポニ
ン溶液と硬膜剤としてムコクロル酸とを添加した硬[オ
ーバーコート層によって保護した。This emulsion layer was protected by a hard overcoat layer containing a saponin solution and mucochloric acid as a hardening agent so that the gelatin concentration was 1.5 g/m''.
以下糸1白 ゛。Below is 1 white thread.
\−77゛
表−1
なお、ハロゲン化銀乳剤層に添加した比較化合物として
は以下の(a)〜(C)の化合物を使用した。Table 1 The following compounds (a) to (C) were used as comparative compounds added to the silver halide emulsion layer.
a)
上記No、1”13の試料を常法に従ってフィルムウェ
ッジを通してタングステン光源で階段露光を与えた後、
下記表−2に示す現像液で38°Cで30秒間現像し定
着、水洗および乾燥の後、感度、コントラストおよびペ
ラパーフォラグを評価した。a) After applying stepwise exposure to the sample No. 1"13 using a tungsten light source through a film wedge according to a conventional method,
After developing for 30 seconds at 38° C. with the developer shown in Table 2 below, fixing, washing with water and drying, sensitivity, contrast and perforation lag were evaluated.
コントラストは特性曲線の直線部の傾き(tana値)
で表し、ペラパーツ才グの発生度合を(5)は全く発生
なし、(4)は−視野に1〜2ケ、(3)は少ないが低
品位、(2)は著しく発生の4段階にランク付けした。Contrast is the slope of the straight line part of the characteristic curve (tana value)
Expressed as , the degree of occurrence of pericarp is ranked in four stages: (5) not occurring at all, (4) 1 to 2 spots in the visual field, (3) few but low quality, and (2) markedly occurring. I attached it.
//−
以下糸(白 )
表−2現像液の組成(現像液1(2)
ハイドロキノン 349N・
メチル−p−アミノフェノール 0.239エ
チレンジアミン四酢酸2ナトリウム塩 193−ジエ
チルアミノ−1,2−プロパンジオール 1595・メ
チルペンツトリアゾール 0.49NatS
Ox 76sNa
Br 39Na
CQ l 、 3
91moff、lリン酸溶液
400mffpH11,5にするのに必要なNaOHを
加えた抜水で112とする。//- Thread below (white) Table-2 Composition of developer (Developer 1 (2) Hydroquinone 349N.
Methyl-p-aminophenol 0.239 Ethylenediaminetetraacetic acid disodium salt 193-diethylamino-1,2-propanediol 1595.Methylpenztriazole 0.49 NatS
Ox76sNa
Br 39Na
CQl, 3
91moff, l phosphoric acid solution
400mff The pH was adjusted to 112 by adding NaOH necessary to bring the pH to 11.5.
く定着液処方〉
チオ硫酸アンモニウム(72,5%W/V水溶液) 2
40mQ亜硫酸ナトリウム 1
79酢酸ナトリウム・3水塩 6.5
9硼酸 6gクエ
ン酸ナトリウム・2水塩 29(組成り
)
純水(イオン交換水) 171Q
硫酸(50%W/V(7)水溶液)4.79硫酸アルミ
ニウム
(Aff203換算含量が8.1%W/Vの水溶液)
26.59定着液の使用時に水500u+ffi中に
上記組成A1組成りの順に溶かし、1aに仕上げて用い
た。この定着液のpHは酢酸で6に調整した。Fixer formulation> Ammonium thiosulfate (72.5% W/V aqueous solution) 2
40mQ Sodium Sulfite 1
79 Sodium acetate trihydrate 6.5
9 Boric acid 6g Sodium citrate dihydrate 29 (composition) Pure water (ion exchange water) 171Q
Sulfuric acid (50% W/V (7) aqueous solution) 4.79 Aluminum sulfate (aqueous solution with Aff203 equivalent content of 8.1% W/V)
When using the 26.59 fixer, it was dissolved in 500 u+ffi of water in the order of the above composition A1 and finished to 1a. The pH of this fixer was adjusted to 6 with acetic acid.
結果を表−3に示す。The results are shown in Table-3.
表−3の結果から明らかな様に、本発明により得られた
試料は感度およびコントラストを損なうことなく、ペラ
パーフォグの発生を著しく抑制していることがわかる。As is clear from the results in Table 3, it can be seen that the samples obtained according to the present invention significantly suppressed the occurrence of permeable fog without impairing sensitivity and contrast.
なお表−3に於て、感度は相対感度で表している。In Table 3, sensitivity is expressed as relative sensitivity.
実施例 2
実施例1と同様に50℃に保ったゼラチン水溶液中に硝
酸銀水溶液とハライド水溶液(KBr98モル%、に1
2モル%)をI)Agを7.5に保ちながら同時に50
分間で加えた。この乳剤を常法により脱塩、水洗を行っ
た後、ゼラチンを加えて再分散を行い、平均粒径0.2
5μ■の単分散沃臭化銀乳剤Em−1を調製した。Example 2 A silver nitrate aqueous solution and a halide aqueous solution (98 mol% KBr, 1 to 1
2 mol%) to I) 50 at the same time while keeping Ag at 7.5.
Added in minutes. This emulsion was desalted and washed with water in a conventional manner, then gelatin was added to redisperse it, and the average particle size was 0.2.
A monodisperse silver iodobromide emulsion Em-1 of 5 .mu.m was prepared.
次に水溶性イリジウム化合物であるヘキサクロロイリジ
ウム(IV)酸カリウムIX 10−’モル/AgX1
モルをハライド水溶液に加えた以外はEm−1と同様の
方法により、平均粒径0.25μ−の単分散沃臭化銀乳
剤Em−2を調製した。Next, water-soluble iridium compound potassium hexachloroiridate (IV) IX 10-' mol/AgX1
A monodispersed silver iodobromide emulsion Em-2 having an average grain size of 0.25 .mu.m was prepared in the same manner as Em-1 except that mol was added to the aqueous halide solution.
続いて、水溶性ロジウム塩である三塩化ロジウム三水塩
2−28X 10−’モル/Agx1モルをハライド水
溶液に加えた以外はEmlと同様の方法により、平均粒
径0.24μmの単分散沃臭化銀乳剤Em−3を調製し
た。Subsequently, monodispersed iodine with an average particle size of 0.24 μm was prepared in the same manner as in Eml except that rhodium trichloride trihydrate, which is a water-soluble rhodium salt, 2-28X 10-' mol/Agx 1 mol was added to the halide aqueous solution. Silver bromide emulsion Em-3 was prepared.
これらEm−1,2および3の各乳剤に実施例1と同様
に化学熟成からオーバーコート層で保護する迄の操作を
施し、試料No、13〜No、18を得た。These Em-1, Em-2 and Em-3 emulsions were subjected to the same operations as in Example 1, from chemical ripening to protection with an overcoat layer, to obtain Samples No. 13 to No. 18.
以後、露光、現像および評価も実施例1の方法に従って
行った。実験に使用した本発明の化合物の内容と評価の
結果を表−4に示す。Thereafter, exposure, development and evaluation were also carried out according to the method of Example 1. Table 4 shows the contents of the compounds of the present invention used in the experiment and the evaluation results.
表−4
表−4から明らかな様に、本発明の化合物を用いた試料
No、16〜No、18は、イリジウム、ロジウム等の
金属ドーピングした乳剤に於ても著しいペッパフォグ抑
制効果があることが確認できた。Table 4 As is clear from Table 4, samples Nos. 16 to 18 using the compounds of the present invention have a remarkable pepper fog suppressing effect even in emulsions doped with metals such as iridium and rhodium. It could be confirmed.
実施例 3
次に示すA液、B液およびC液の溶液を用いて、塩沃臭
化銀乳剤Em−4〜Em−8を調製した。Example 3 Silver chloroiodobromide emulsions Em-4 to Em-8 were prepared using the following solutions of liquid A, liquid B, and liquid C.
尚溶液Cに使用した塩化ナトリウム、臭化カリウムおよ
び沃化カリウムの添加量は表−5に調製乳剤のハロゲン
化銀粒子組成と共に示した。The amounts of sodium chloride, potassium bromide and potassium iodide used in Solution C are shown in Table 5 together with the silver halide grain composition of the prepared emulsion.
オセインゼラチン 17i(両
イオン交換処理剤、ゼリー強度250)ポリイソプロピ
レンーポリエチレンオキシジコハク酸エステルナトリウ
ム塩lθ%エタノール溶液 5
mQ蒸留水 1280
纏Q〔溶液B〕
硝酸銀 170g蒸留
水 410sff〔溶
液C〕
塩化ナトリウム 表−5記載量臭化カリ
ウム 表−5記載量沃化カリウム
表−5記載量オセインゼラチン
119ポリイソプロピレン・ポリエチレ
ンオキシジコハク酸エステルナトリウム塩lO%エタノ
ール溶液 3w、Q蒸留水
412鳳Q溶液Aに溶液
Bと溶液Cとを同時混合法により添加を行った。表−6
に添加時の保温温度および溶液Bと溶液Cの添加時間を
示した。このとき、系中のp、Agは表−6に示した値
で制御を行い、又、pHはすべてpH−3に制御した。Ossein gelatin 17i (both ion exchange treatment agent, jelly strength 250) polyisopropylene-polyethylene oxydisuccinate sodium salt lθ% ethanol solution 5
mQ distilled water 1280
Matome Q [Solution B] Silver nitrate 170 g Distilled water 410 sff [Solution C] Sodium chloride Table-5 Amount of potassium bromide Table-5 Amount of potassium iodide
Table-5 Listed amount ossein gelatin
119 Polyisopropylene polyethylene oxydisuccinate sodium salt 10% ethanol solution 3w, Q distilled water
Solution B and solution C were added to 412 Otori Q solution A by a simultaneous mixing method. Table-6
The insulating temperature at the time of addition and the addition time of solution B and solution C are shown. At this time, p and Ag in the system were controlled at the values shown in Table 6, and the pH was all controlled to pH-3.
溶液Bと溶液Cとを添加終了後、その保温温度で10分
間才ストワイド熟成を行い、その後常法により脱塩、水
洗を行い、その後オセインゼラチンの水溶液600i*
Q(オセインゼラチン309含有)を加えて55℃で3
0分間撹拌により分散した乳剤E m −4〜Em−8
を得た。After addition of solution B and solution C, stir-wide ripening was performed for 10 minutes at the insulated temperature, followed by desalting and washing with water using a conventional method, followed by a 600i* aqueous solution of ossein gelatin.
Add Q (containing ossein gelatin 309) and incubate at 55℃ for 3 minutes.
Emulsions Em-4 to Em-8 dispersed by stirring for 0 minutes
I got it.
これらの乳剤は平均粒径0.22〜0.27μ儀で全粒
子の90%以上が±0.1μlに入る単分散乳剤である
ことが電子顕微鏡による観察で明らかになった。Observation using an electron microscope revealed that these emulsions were monodisperse emulsions with an average grain size of 0.22 to 0.27 μm and more than 90% of the total grains falling within ±0.1 μl.
こうして得られたEm−4〜Em・8の各乳剤に実施例
1と同様にして化学熟成からオーバーコート層で保護す
るまでの操作を施し、試料No、19〜No、23を得
た。Each of the emulsions Em-4 to Em-8 thus obtained was subjected to operations from chemical ripening to protection with an overcoat layer in the same manner as in Example 1 to obtain samples No. 19 to No. 23.
以後の露光、現像および評価も実施例1の方法に従って
行った。Subsequent exposure, development and evaluation were also carried out according to the method of Example 1.
実験に使用した本発明の化合物の内容と評価の結果を表
−7に示した。Table 7 shows the contents of the compounds of the present invention used in the experiment and the evaluation results.
表−7
表−7から明らかな様に、50モル%未満のAgBr含
有乳剤を使用した試料No、22およびNo、23では
、本発明の化合物[11−1および[2]−16を添加
してもペラパーフォグを抑制することは出来ず、50モ
ル%以上の臭化銀含有乳剤を使用した試料No−19〜
No、20に於てのみペラパーフォラグ抑制効果がある
。Table 7 As is clear from Table 7, in samples No. 22 and No. 23 using emulsions containing less than 50 mol% AgBr, compounds [11-1 and [2]-16 of the present invention were added. However, it was not possible to suppress Peraper Fog, and sample No. 19~ using an emulsion containing silver bromide of 50 mol% or more
Only in No. 20, there is a permeability lag suppressing effect.
(発明の効果)
ヒドラジド化合物を用いたハロゲン化銀写真感光材料に
よる硬調画像の形成において、硬調化を損なわずにペラ
パーフォラグの発生が改良される。(Effects of the Invention) In the formation of high contrast images using a silver halide photographic material using a hydrazide compound, the occurrence of perforation lag is improved without impairing high contrast.
Claims (1)
し、かつ、下記一般式[1]、[2]、[3]で示され
る化合物を少なくとも1種類含有し、かつ下記一般式[
4]、[5]または[6]で示される化合物から選ばれ
る少なくとも1種を含有する少なくとも1層のハロゲン
化銀乳剤層を有することを特徴とするハロゲン化銀写真
感光材料。 一般式[1] ▲数式、化学式、表等があります▼ (式中、R_1及びR_2はアリール基またはヘテロ環
基を表し、Rは有機結合基を表し、nは0〜6、mは0
または1を表し、nが2以上のときは、各Rは同じであ
っても、異なっていてもよい。)一般式[2] ▲数式、化学式、表等があります▼ (式中、R_2_1は脂肪族基、芳香族基またはヘテロ
環基を、R_2_2は水素原子、置換してもよいアルコ
キシ基、ヘテロ環オキシ基、アミノ基、もしくはアリー
ルオキシ基を表し、P_1及びP_2は水素原子、アシ
ル基、またはスルフィン酸基を表す。)一般式[3] ▲数式、化学式、表等があります▼ (式中、Arは耐拡散基またはハロゲン化銀吸着促進基
を少なくとも1つ含むアリール基を表し、R_3_1は
置換アルキル基を表す。) 一般式[4] ▲数式、化学式、表等があります▼ 〔式中、Aはリン原子または窒素原子を表す。 R_4_1、R_4_2、R_4_3およびR_4_4
はそれぞれ置換もしくは非置換のアルキル基、アリール
基またはアラルキル基を表す。 X^−は酸アニオンを表す。〕 一般式[5] ▲数式、化学式、表等があります▼ 〔式中、YおよびZは窒素原子または炭素原子を表し、
YとZはどちらか一方が窒素原子のとき、他方は炭素原
子である。 R_5_1は水素原子、低級アルキル基、ハロゲン原子
またはニトロ基を表す。〕 一般式[6] ▲数式、化学式、表等があります▼ 〔式中、R_6_1、R_6_2およびR_6_3は水
素原子、アミノ基、ヒドロキシ基、メルカプト基、アル
キル基またはアリール基を表す。〕[Scope of Claims] A silver halide composition having a silver bromide content of 50 mol % or more, and containing at least one compound represented by the following general formulas [1], [2], and [3] and the following general formula [
A silver halide photographic material comprising at least one silver halide emulsion layer containing at least one compound selected from compounds represented by [4], [5] or [6]. General formula [1] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, R_1 and R_2 represent an aryl group or a heterocyclic group, R represents an organic bonding group, n is 0 to 6, m is 0
or 1, and when n is 2 or more, each R may be the same or different. ) General formula [2] ▲ Numerical formulas, chemical formulas, tables, etc. Represents an oxy group, an amino group, or an aryloxy group, and P_1 and P_2 represent a hydrogen atom, an acyl group, or a sulfinic acid group.) General formula [3] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (In the formula, Ar represents an aryl group containing at least one diffusion-resistant group or silver halide adsorption promoting group, and R_3_1 represents a substituted alkyl group.) General formula [4] ▲ Contains numerical formulas, chemical formulas, tables, etc. ▼ [In the formula, A represents a phosphorus atom or a nitrogen atom. R_4_1, R_4_2, R_4_3 and R_4_4
each represents a substituted or unsubstituted alkyl group, aryl group or aralkyl group. X^- represents an acid anion. ] General formula [5] ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ [In the formula, Y and Z represent nitrogen atoms or carbon atoms,
When one of Y and Z is a nitrogen atom, the other is a carbon atom. R_5_1 represents a hydrogen atom, a lower alkyl group, a halogen atom, or a nitro group. [In the formula, R_6_1, R_6_2 and R_6_3 represent a hydrogen atom, an amino group, a hydroxy group, a mercapto group, an alkyl group, or an aryl group. ]
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP358388A JPH01179930A (en) | 1988-01-11 | 1988-01-11 | Silver halide photographic sensitive material |
EP19890100221 EP0324391A3 (en) | 1988-01-11 | 1989-01-07 | Method for the formation of high-contrast images |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP358388A JPH01179930A (en) | 1988-01-11 | 1988-01-11 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01179930A true JPH01179930A (en) | 1989-07-18 |
Family
ID=11561473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP358388A Pending JPH01179930A (en) | 1988-01-11 | 1988-01-11 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01179930A (en) |
-
1988
- 1988-01-11 JP JP358388A patent/JPH01179930A/en active Pending
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