JPH0117673B2 - - Google Patents

Info

Publication number
JPH0117673B2
JPH0117673B2 JP56124709A JP12470981A JPH0117673B2 JP H0117673 B2 JPH0117673 B2 JP H0117673B2 JP 56124709 A JP56124709 A JP 56124709A JP 12470981 A JP12470981 A JP 12470981A JP H0117673 B2 JPH0117673 B2 JP H0117673B2
Authority
JP
Japan
Prior art keywords
koji
substrate
maintenance
moisture
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56124709A
Other languages
Japanese (ja)
Other versions
JPS5828275A (en
Inventor
Nobuo Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NAGATA JOZO KIKAI KK
Original Assignee
NAGATA JOZO KIKAI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NAGATA JOZO KIKAI KK filed Critical NAGATA JOZO KIKAI KK
Priority to JP12470981A priority Critical patent/JPS5828275A/en
Publication of JPS5828275A publication Critical patent/JPS5828275A/en
Publication of JPH0117673B2 publication Critical patent/JPH0117673B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は自動機械製麹における麹基質の手入
れ方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] This invention relates to a method for caring for a koji substrate in automatic mechanical koji production.

〔従来の技術〕[Conventional technology]

醸造業界の製麹作業において、麹基質に種菌を
植え、適切な温度、湿度の環境下に保持すると、
約10時間経過後、菌の発育繁殖とともに発熱を生
じ、約17〜20時間で麹基質は擬結する。この時間
に必要とされる手入れは、単に擬結した麹基質を
微細粉状に砕き、均等通気を求めていた。
In the process of making koji in the brewing industry, when seeds are planted in a koji substrate and kept under an environment of appropriate temperature and humidity,
After about 10 hours, fever occurs as the bacteria grow and reproduce, and the koji substrate pseudo-sets in about 17 to 20 hours. The care required during this time was simply to crush the pseudo-coagulated koji matrix into fine powder to ensure uniform aeration.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで蛋白質を麹基質とする醤油麹等の場
合、上述の方法では麹基質に亀裂が生じ、温湿風
のシヨートパス等により品温制御に困難を来た
す。
However, in the case of soy sauce koji, etc., which uses protein as a koji substrate, the above-mentioned method causes cracks in the koji substrate, making it difficult to control the product temperature due to short passes of hot and humid air.

〔問題点を解決するための手段〕[Means for solving problems]

この発明は、製麹作業において麹の発育進捗に
必要な手入れ作業を行なうにあたり、粒子形成の
手入れ手段によつて、麹基質推積層の内部水分発
散をごく自然裡に行なえるような範囲の粒の状態
になるように手入れを行ない、菌糸の切断を可及
的に防止し、通気を改善して、水分発散による蒸
発潜熱により品温制御を容易ならしめたものであ
る。この発明によると、澱粉の麹基質の場合、温
湿風の適切な調整によつて、麹基質に対する麹菌
の内部破精込みを容易にし、酒造家が求める所の
突き破精状の麹が得られるのである。
This invention aims to form grains within a range that allows for natural moisture dissipation from the koji matrix layer by means of grain formation care when performing the maintenance work necessary for the progress of koji growth in the koji production process. This is done to prevent mycelial breakage as much as possible, to improve ventilation, and to make it easier to control the product temperature using the latent heat of evaporation due to moisture dissipation. According to this invention, in the case of a starch-based koji substrate, appropriate adjustment of warm and humid air facilitates the internal breakdown of the koji mold into the koji substrate, thereby producing the koji with the pierced quality desired by sake brewers. It will be done.

次にこの発明の実施例を澱粉麹を蛋白麹につい
て分けて説明をする。
Next, examples of the present invention will be explained separately for starch koji and protein koji.

実施例 1 酒造用澱粉麹 併行複醗酵を基本とする清酒醸造における突破
精型麹は、製品との関連において重要な要素の一
つであつた。従来の機械製麹は培養室内が多湿の
ため、比較的総破精型の麹になりやすく、酵素力
価の高い、酒化率の良いものであつたが製品は淡
白な酒の要求に対し濃厚な酒になりがちであつ
た。また従来の機械製麹においては、推積層が約
25cmにもなるため、室内に乾湿を設けても、菌の
繁殖にともなう層内部の発生熱、すなわち内部水
分の発散が行なわれず、これに対し種々工夫がな
されたが目的は果せられなかつた。そこでこの発
明では、麹基質を粒子形成の手入れ手段によつて
麹基質の内部水分発散を自然裡に行なえるように
自己発散容易な粒状ないし塊状とし、堆積層内部
の麹を天地崩壊して室内空気にさらすと共に、通
気を容易にし、繁殖熱を自然放散容易にしたもの
である。したがつて麹基質の表面水分は適当に除
去され、麹菌の表面繁殖を抑制するため、菌糸は
水分の多い米粒内部に移向し、突き破精型の麹と
することができるのである。
Example 1 Starch koji for sake brewing In sake brewing, which is based on parallel multiple fermentation, top-grade koji was one of the important elements in relation to the product. Conventional machine-made koji has a high humidity in the culture chamber, making it relatively easy to produce koji that is completely destroyed, with a high enzyme titer and good alcoholization rate, but the product does not meet the demand for light sake. It tended to be a strong drink. In addition, in conventional machine-made koji, the estimated layer is approximately
Because the layer can grow as long as 25 cm, even if you set up a dry/humid chamber indoors, the heat generated inside the layer due to the growth of bacteria, that is, the internal moisture, could not be dissipated. Various efforts were made to solve this problem, but the purpose was not achieved. . Therefore, in this invention, the koji matrix is made into a granular or lumpy form that is easy to self-dissipate so that the internal moisture of the koji matrix can be naturally evaporated by means of particle formation, and the koji inside the sedimentary layer is collapsed vertically and brought indoors. In addition to being exposed to the air, ventilation is facilitated to facilitate natural dissipation of reproductive heat. Therefore, the surface moisture of the koji substrate is appropriately removed, and in order to suppress the proliferation of koji mold on the surface, the hyphae migrate to the interior of the rice grain, where there is a lot of moisture, and it is possible to form koji of the tsukihae type.

実験例 従来の手入れ法においては、通気停止10〜15分
の間に1〜2℃の品温上昇があつたが、通気を行
なうと4〜5分で元の温度に復する状態である。
Experimental Example In the conventional cleaning method, the product temperature rose by 1 to 2°C during 10 to 15 minutes when ventilation was stopped, but when ventilation was started, the original temperature returned to the original temperature in 4 to 5 minutes.

これに対しこの発明の手入れの方法によると、
通気を30分間に一度の割合の実施によつて、25〜
30分間通気を停止しても、品温上昇の傾向はみら
れず、更に手入れ回数を増すと、麹基質の内部水
分発散を自然裡に行なえる形式で除熱されるの
で、通気量を最少限とすることができた。
On the other hand, according to the care method of this invention,
By performing ventilation once every 30 minutes,
Even if the ventilation is stopped for 30 minutes, there is no tendency for the product temperature to rise, and if the number of times of cleaning is increased, the heat is removed in a way that allows the internal moisture of the koji matrix to evaporate naturally, so the amount of ventilation can be minimized. I was able to do this.

上記実験からして、麹基質の手入れは、従来微
細粉状に砕く手段が一つの方法として考えられて
きたが、これを粒子形成の手入れ手段によつて、
堆積層の麹基質の内部水分発散を自然裡に行な
い、通風条件を最少限に制御し、水分発散による
蒸発潜熱によつて、品温制御が容易にでき、更に
室内空気の調整条件によつては、麹基質の表面水
分を除去して、菌糸を水分の多い米粒内部に破精
込ませられることが確認された。
Based on the above experiments, one method of caring for the koji substrate has traditionally been thought to be to crush it into fine powder;
By naturally dissipating the internal moisture of the koji matrix in the deposited layer, controlling ventilation conditions to a minimum, and using the latent heat of evaporation due to moisture dissipation, product temperature can be easily controlled. It was confirmed that this method was able to remove the surface moisture of the koji matrix and infuse mycelia into the interior of the rice grain, which has a high moisture content.

実施例 2 醤油用蛋白麹 醤油用の麹は蛋白原料としての脱脂大豆と、澱
粉原料としての小麦を、それぞれ加圧蒸煮及び炒
煎処理を行ない、冷却し、種菌を植えて盛込み、
品温を28〜30℃に保つておくと、約10時間経過頃
から麹菌は繁殖を始めると同時に、繁殖熱を生
じ、品温は上昇し始め、約17〜20時間経過後、繁
殖は旺盛となり、脱脂大豆及び小麦を分解して、
炭酸ガスと繁殖熱を発散し、品温は更に上昇して
手入れ時期をむかえる。
Example 2 Protein koji for soy sauce The koji for soy sauce is made by subjecting defatted soybeans as a protein raw material and wheat as a starch raw material to pressure steaming and roasting treatments, respectively, cooling them, planting seed bacteria, and incorporating them.
If the temperature of the product is kept at 28 to 30℃, the koji mold will begin to reproduce after about 10 hours, at the same time it will generate reproductive fever, and the temperature will start to rise. After about 17 to 20 hours, the koji mold will begin to reproduce actively. It decomposes defatted soybeans and wheat,
It emits carbon dioxide gas and reproductive heat, and the temperature rises even further, leading to the time for maintenance.

こゝで手入れの本来の目的は菌糸でかたまつた
麹基質をほぐし通風を良好にすることによつて、 麹基質の品温を下げる→適切な品温制御の実
現 麹菌の生育に必要な酸素を与える。
The original purpose of this care is to loosen the koji substrate that has hardened with mycelia and improve ventilation, thereby lowering the temperature of the koji substrate → realizing appropriate temperature control and providing the oxygen necessary for the growth of koji mold. .

ことであるが、麹基質の堆積層に亀裂が生じる
と、通気はシヨートパスを生じ、通気に均一性を
欠き正常な品温制御が不可能となるため、手入れ
が必要となるのである。
However, if cracks occur in the deposited layer of the koji matrix, a short pass will occur in the aeration, and the aeration will lack uniformity, making it impossible to control the product temperature properly, so maintenance is required.

この亀裂発生の一時的な対策として、従来踏み
込みと称する亀裂を潰す作業が行なわれていた。
この発明の手入れにおいては、堆積層の麹基質の
発熱量に応じた手入れ法として、従来行なわれて
来たような微細粉状の砕き手入れを行なわず、粒
子形成の手入れ手段として、麹基質堆積層の内部
水分発散を自然裡に行なえるような範囲の粒態
に、手入れを行なつて、麹基質の粒子間に空間を
形成し、水分発散による蒸発潜熱によつて、品温
制御を容易ならしめるのである。したがつて従来
法にみられるような、麹基質の分解消化によつて
生ずる、収縮現状を原因とする亀裂発生を防止す
ることができ、その対策としての踏み込み作業を
省略することができるものである。
As a temporary measure against the occurrence of cracks, a process known as treading has traditionally been carried out to crush the cracks.
In the care of this invention, as a care method according to the calorific value of the koji matrix in the deposited layer, the koji matrix is The grain size is maintained within a range that allows moisture to evaporate naturally within the layer, creating spaces between the particles of the koji matrix, and the latent heat of evaporation from moisture evaporation makes it easy to control product temperature. It's about getting used to it. Therefore, it is possible to prevent the occurrence of cracks caused by shrinkage caused by the decomposition and digestion of the koji matrix, which occurs in conventional methods, and it is possible to omit the need for additional work as a countermeasure. be.

〔発明の効果〕〔Effect of the invention〕

上述のように、この発明は菌糸切断を最少限に
し、総じて澱粉或いは蛋白原料麹基質の区分を問
わず、表面塗り破精込みの状態から内部突き破精
込み状に製麹できることが、本手入法の最大特徴
である。したがつて従来行なわれてきた手入れ作
業の考え方を根本的に変え、堆積層の麹基質の内
部水分発散を自然裡に行なえるような範囲の粒態
とすることを基本として、各種麹基質に対処した
それぞれの作用効果をあげうる有益有用なもので
ある。
As mentioned above, the main feature of this invention is to minimize mycelial cutting and to be able to make koji from a surface coated state to an internally penetrated state regardless of the type of starch or protein raw material koji substrate. This is the most important feature of Nuriho. Therefore, we have fundamentally changed the way of thinking about the maintenance work that has been carried out in the past, and we have developed various types of koji substrates based on the idea of creating a particle size within a range that allows the internal moisture to evaporate naturally in the koji substrates in the sedimentary layer. It is a beneficial and useful thing that can bring about the effects of each of the measures taken.

Claims (1)

【特許請求の範囲】[Claims] 1 自動機械製麹装置による製麹作業において、
麹の発育進捗に必要な手入れ作業を必要とする場
合、推積層の麹基質の発熱量に応じた手入れ法と
して、微細粉状に砕き手入れを行なうことなく粒
子形成の手入れ手段を用い、推積層の麹基質の内
部水分発散を自然裡に行なえるような範囲の粒態
に手入れを行ない、もつて通風条件を最少限に制
御しうる条件を構成して、水分発散による蒸発潜
熱によつて晶温制御を容易とし、適切な温湿風の
調整条件によつて麹菌の内部破精込みを旺盛にす
るようにした自動機械製麹装置の麹基質機械手入
れの方法。
1. In koji making work using automatic mechanical koji making equipment,
If maintenance work is necessary for the progress of koji growth, the maintenance method that corresponds to the calorific value of the koji substrate in the accumulated layer is to use a particle-forming care method instead of pulverizing it into a fine powder. By controlling the particle size within a range that allows for the internal moisture of the koji matrix to naturally evaporate, and by configuring conditions that can minimize ventilation conditions, crystallization is achieved by the latent heat of vaporization due to moisture evaporation. A method for mechanical maintenance of a koji substrate in an automatic mechanical koji production device, which facilitates temperature control and enhances the internal decomposition of koji mold through appropriate temperature and humidity air adjustment conditions.
JP12470981A 1981-08-11 1981-08-11 Method for mechanical processing of koji substrate in automatic koji-preparation apparatus Granted JPS5828275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12470981A JPS5828275A (en) 1981-08-11 1981-08-11 Method for mechanical processing of koji substrate in automatic koji-preparation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12470981A JPS5828275A (en) 1981-08-11 1981-08-11 Method for mechanical processing of koji substrate in automatic koji-preparation apparatus

Publications (2)

Publication Number Publication Date
JPS5828275A JPS5828275A (en) 1983-02-19
JPH0117673B2 true JPH0117673B2 (en) 1989-03-31

Family

ID=14892156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12470981A Granted JPS5828275A (en) 1981-08-11 1981-08-11 Method for mechanical processing of koji substrate in automatic koji-preparation apparatus

Country Status (1)

Country Link
JP (1) JPS5828275A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59174085A (en) * 1983-03-23 1984-10-02 Toshiba Corp Color solid-state image pickup device
CN111690531A (en) * 2020-06-28 2020-09-22 上海步科自动化股份有限公司 Koji making device, koji bed control system and koji making control method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913995A (en) * 1972-05-18 1974-02-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913995A (en) * 1972-05-18 1974-02-06

Also Published As

Publication number Publication date
JPS5828275A (en) 1983-02-19

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