JPH01173688A - Manufacture of board for integrated circuit - Google Patents
Manufacture of board for integrated circuitInfo
- Publication number
- JPH01173688A JPH01173688A JP32965987A JP32965987A JPH01173688A JP H01173688 A JPH01173688 A JP H01173688A JP 32965987 A JP32965987 A JP 32965987A JP 32965987 A JP32965987 A JP 32965987A JP H01173688 A JPH01173688 A JP H01173688A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive varnish
- solvent
- metal
- metal foil
- adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000002966 varnish Substances 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims abstract description 28
- 239000002184 metal Substances 0.000 claims abstract description 28
- 230000001070 adhesive effect Effects 0.000 claims abstract description 27
- 239000000853 adhesive Substances 0.000 claims abstract description 26
- 239000002904 solvent Substances 0.000 claims abstract description 19
- 239000011888 foil Substances 0.000 claims abstract description 16
- 239000007787 solid Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 15
- 239000011342 resin composition Substances 0.000 claims abstract description 14
- 239000011256 inorganic filler Substances 0.000 claims abstract description 8
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000010981 drying operation Methods 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000011889 copper foil Substances 0.000 description 11
- 239000003822 epoxy resin Substances 0.000 description 11
- 229920000647 polyepoxide Polymers 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 239000006087 Silane Coupling Agent Substances 0.000 description 7
- 150000004984 aromatic diamines Chemical class 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 239000000945 filler Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 229920003006 Polybutadiene acrylonitrile Polymers 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 epoxy resin Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- WHOPEPSOPUIRQQ-UHFFFAOYSA-N oxoaluminum Chemical compound O1[Al]O[Al]1 WHOPEPSOPUIRQQ-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000000275 quality assurance Methods 0.000 description 1
- 239000006254 rheological additive Substances 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は、混成集積回路や発熱密度の高いプリント回路
に用いられる金属ベース基板の製造方法に関する。特に
、アルミナ等の高伝熱性で高絶縁性の無機フィラーを多
量に含む電気絶縁性・熱伝導性・接着性を兼ね備えた絶
縁層を有する金属ベース基板の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for manufacturing a metal base substrate used for hybrid integrated circuits and printed circuits with high heat generation density. In particular, the present invention relates to a method for manufacturing a metal base substrate having an insulating layer that has electrical insulation, thermal conductivity, and adhesive properties and contains a large amount of a highly heat conductive and highly insulating inorganic filler such as alumina.
混成集積回路用基板は、一般に、アルミニウム、鉄、鉄
−珪素合金等の金属基板上に厚さ数十μのエポキシ樹脂
等の有機系高分子化合物からなる接着剤層を設け、その
上に!M箔等の導電性金属箔を貼着させたものである。Substrates for hybrid integrated circuits generally consist of a metal substrate made of aluminum, iron, iron-silicon alloy, etc., with an adhesive layer several tens of microns thick made of an organic polymer compound such as epoxy resin, and then! A conductive metal foil such as M foil is attached.
従来、このような金属ベース基板は種々提案されている
が(例えば、実公昭46−25756号公報、特開昭5
6−62388号公報、特開昭58−15290号公報
)、しかし、接着剤層の接着性が十分でな(、また、電
気絶縁性、熱伝導性の面でも満足的でないなどの問題が
あった。Various metal-based substrates have been proposed in the past (for example, Japanese Utility Model Publication No. 46-25756, Japanese Unexamined Patent Publication No. 5
6-62388, JP-A-58-15290), however, there are problems such as insufficient adhesiveness of the adhesive layer (and unsatisfactory electrical insulation and thermal conductivity). Ta.
本発明は、良好な電気絶縁性、熱伝導性、および接着性
を兼ね備え、特に電気絶縁性に優れた、すなわち広い範
囲で均一に高い耐電圧を有する集積回路用基板の製造方
法を提供することを目的とする。The present invention provides a method for manufacturing an integrated circuit substrate that has good electrical insulation, thermal conductivity, and adhesion, and is particularly excellent in electrical insulation, that is, has a uniformly high withstand voltage over a wide range. With the goal.
このため、本発明は固型の樹脂組成物と無機フィラーと
溶剤とからなる接着剤ワニスを、金属箔表面に塗布して
乾燥させ、ついでこの塗布および乾燥を少な(とも1回
繰り返した後、前記金属箔の接着剤ワニス塗布面を金属
板に貼着させることを特徴とする集積回路用基板の製造
方法を要旨とする。For this reason, in the present invention, an adhesive varnish consisting of a solid resin composition, an inorganic filler, and a solvent is applied to the surface of the metal foil, dried, and then this application and drying are repeated once (both once). The gist of the present invention is a method for manufacturing an integrated circuit board, characterized in that the surface of the metal foil coated with an adhesive varnish is adhered to a metal plate.
以下、本発明の構成につき詳しく説明する。Hereinafter, the configuration of the present invention will be explained in detail.
(1) 接着剤ワニス。(1) Adhesive varnish.
固型の樹脂組成物と無機フィラーと溶剤とからなる。こ
れらの配合割合は、特に限定されるものではない。必要
に応じて、他の添加剤を含有していてもよい。It consists of a solid resin composition, an inorganic filler, and a solvent. These blending ratios are not particularly limited. Other additives may be included as necessary.
■ 樹脂組成物。■Resin composition.
固型のものである。固型とは、軟化点が40℃以上、好
ましくは60℃以上の固体物をいう。溶剤乾燥後に粘着
性がなくなるためには、固型であることが不可欠である
。固型である結果として、溶剤乾燥後の接着剤付金属箔
の取り扱いが容易となり (例えば、そのままで巻き取
れるなど)、ゴミ等の異物の付着も生じない。また、塗
り重ね工程では、塗布および乾燥の工程を単にくり返す
だけで良いなど、従来技術でのB−ステージ工程を用い
ずに同じ効果を出せるので、固型の樹脂組成物を用いる
ことは本発明において必須の要素である。It is solid. Solid refers to a solid having a softening point of 40°C or higher, preferably 60°C or higher. It is essential that it is solid so that it does not become sticky after the solvent dries. As a result of being solid, it is easy to handle the adhesive-coated metal foil after the solvent dries (for example, it can be rolled up as is), and there is no adhesion of foreign substances such as dust. In addition, in the recoating process, the same effect can be achieved without using the B-stage process of conventional technology, such as by simply repeating the coating and drying processes, so it is practical to use a solid resin composition. It is an essential element in invention.
樹脂組成物を構成する樹脂としては、特に限定されるも
のではないが、非縮合型の熱硬化性樹脂を用いることが
好ましい。非縮合型の熱硬化性樹脂というのは、エポキ
シ系樹脂とかアクリル系樹脂のように、創成ガスの発生
を伴わない熱硬化性の樹脂を意味する。フェノール樹脂
、イミド系樹脂等は、−船釣に水やアルコール等の創成
ガスを発するので好ましくない。但し、これらのもので
も、副成ガスが発生せぬように、また、発生量が非常に
小さいように、予備反応させている場合にはこの限りで
ない。Although the resin constituting the resin composition is not particularly limited, it is preferable to use a non-condensable thermosetting resin. A non-condensing thermosetting resin means a thermosetting resin that does not generate a creation gas, such as an epoxy resin or an acrylic resin. Phenol resins, imide resins, etc. are undesirable because they emit gases such as water and alcohol during boat fishing. However, even in these cases, this does not apply if the preliminary reaction is carried out so that by-product gases are not generated and the amount generated is very small.
ここでいう樹脂組成物とは、用いた接着剤ワニスから溶
剤及び無機フィラーを除いた成分を示し、塗膜上に残っ
た有機材料のすべてを含む。The resin composition herein refers to the components of the adhesive varnish used, excluding the solvent and inorganic filler, and includes all organic materials remaining on the coating film.
エポキシ系樹脂の配合の場合を例にとれば、エポキシ樹
脂、硬化剤はもちろんのこと、エポキシ系樹脂の組成物
に常識的に用いられる各種添加剤(ポリマー、オリゴマ
ー、カップリング剤、希釈剤、難燃剤、レオロジー調整
剤、硬化助剤)等の加えられたすべてのものの混合物が
該当する。Taking the case of compounding an epoxy resin as an example, in addition to the epoxy resin and curing agent, various additives commonly used in epoxy resin compositions (polymer, oligomer, coupling agent, diluent, This includes mixtures of all additives (flame retardants, rheology modifiers, curing aids), etc.
■ 無機フィラー。■ Inorganic filler.
絶縁性(体積固有抵抗)が高(、熱伝導率が同時に高い
無機物の粉体であり、例えば、Be01A1z03 、
BN等が特に性能的に優れている。しかし、今日の我が
国においては、毒性や価格、また、供給面から考えて、
Alz(hだけが実用的である。It is an inorganic powder with high insulation (volume resistivity) and high thermal conductivity, such as Be01A1z03,
BN etc. are particularly excellent in performance. However, in today's Japan, considering toxicity, price, and supply,
Only Alz(h is practical.
Al2O3に的をしぼってみても、顕微鏡下での粒子形
態、水スラリー化したときのpH1純度、粒度分布、表
面物性(へき開面であるか、バイヤー法による粒子表面
であるか否かによって大きく異なる)等が実に多彩であ
って、A1□03メーカーの一社でも数百種の銘柄をそ
ろえているのが現状である。当該用途には、高純度で適
度な粒度分布、表面物性及び価格を備えたものを選べば
よい。要するにA11biのコストと要求されている性
能・価格とを照らし合わせて、Ah03銘柄と含有量を
決めれば良く、本発明では、この選択に大きな自由度を
与えている。Even if we focus on Al2O3, the particle morphology under a microscope, the pH1 purity when made into a water slurry, the particle size distribution, and the surface physical properties (whether it is a cleavage plane or a particle surface by Bayer method) greatly differ. ) etc., and the current situation is that even one A1□03 manufacturer has hundreds of brands available. For this purpose, a material with high purity, appropriate particle size distribution, surface physical properties, and price may be selected. In short, the Ah03 brand and content can be determined by comparing the cost of A11bi with the required performance and price, and the present invention provides a large degree of freedom in this selection.
ここで、シランカップリング剤処理等を施したフィラー
を用いることは可能であるけれど、それよりも低コスト
のインテグラルブレンド法で同等の性能を出すことがで
きるので、この方法によるのが好ましい。Although it is possible to use a filler that has been treated with a silane coupling agent, it is preferable to use the integral blend method, which is cheaper than the filler, as it can provide the same performance.
■ ?容 斉り 溶剤は、乾燥の過程で揮散するので製品には残らない。■? Compatibility The solvent evaporates during the drying process and does not remain in the product.
また、溶剤は、塗布する目的物を塗布可能な状態(即ち
、液状)にする上で欠かせない。樹脂組成物と溶剤との
混合物は70%固型分含量程度でも数10cps位には
低粘度化し、通常のプロペラ攪拌機等を用いて容易にフ
ィラーをそれに混合することができるし、カップリング
剤を樹脂組成物の成分として含んでいれば最も表面処理
法として効果の期待される湿式処理が何ら特別な努力を
払わなくても可能となる。Further, the solvent is essential for bringing the object to be coated into a coatable state (that is, in a liquid state). A mixture of a resin composition and a solvent has a viscosity as low as several tens of cps even when the solids content is around 70%, and a filler can be easily mixed therein using an ordinary propeller stirrer, and a coupling agent can be mixed therein. If it is included as a component of the resin composition, wet treatment, which is expected to be the most effective surface treatment method, becomes possible without any special effort.
なお、必要に応じて接着剤ワニスを濾過することもでき
るわけだが、これは溶剤によってワニスが適度な粘度に
下げられているからに他ならない。Note that the adhesive varnish can be filtered if necessary, but this is only because the varnish has been reduced to an appropriate viscosity by the solvent.
(2)本発明においては、このようにしてなる接着剤ワ
ニスを銅箔等の金属箔表面に塗布して乾燥させる。この
場合、例えば、電解銅箔の上に連続的に塗布して、その
まま乾燥炉を経て巻き取れば、塗布厚みの安定したピン
ホールの少ない安定した性能の接着剤付き銅箔が得られ
る。(2) In the present invention, the adhesive varnish thus prepared is applied to the surface of a metal foil such as copper foil and dried. In this case, for example, if the adhesive is continuously applied onto an electrolytic copper foil and then wound up as it is through a drying oven, an adhesive-coated copper foil with a stable coating thickness and stable performance with few pinholes can be obtained.
コーターの種類は、ドクターブレード、コンマコーター
、リバースコーター、グラビアコーターなどであり、こ
れらが利用可能である。いずれのコーターが最適かは、
ワニスのレオロジーに依存するが、溶剤量を適宜加減す
ることで、既存のコーターに最も合うように適合させる
ことが可能である。The types of coaters that can be used include a doctor blade, comma coater, reverse coater, and gravure coater. Which coater is best?
Depending on the rheology of the varnish, it can be adapted to best suit existing coaters by adjusting the amount of solvent accordingly.
つぎに、本発明においては、この塗布および乾燥を少な
くとも1回繰り返す。1回〜2回繰り返すのが好ましい
。これにより、金属箔表面に形成された接着剤ワニス層
にピンホールが実質的に存在しなくなる。Next, in the present invention, this application and drying are repeated at least once. It is preferable to repeat once or twice. This substantially eliminates the presence of pinholes in the adhesive varnish layer formed on the surface of the metal foil.
ついで、アルミニウム、鉄等からなる金属板に、金属箔
の接着剤ワニス塗布面を貼着させる。Next, the adhesive varnished surface of the metal foil is adhered to a metal plate made of aluminum, iron, or the like.
その後、その接着剤ワニスを硬化させることにより、金
属ベース基板を得ることができる。Thereafter, by curing the adhesive varnish, a metal base substrate can be obtained.
以下に実施例および比較例を示す。Examples and comparative examples are shown below.
実施例、比較例 (1) 実施例。Examples, comparative examples (1) Example.
接着剤ワニスの製造を次の処方に従って行った。The adhesive varnish was manufactured according to the following recipe.
芳香族ジアミン 12重量部シランカッ
プリング剤 1重量部AbOs
565重量部固型のエポキシ樹脂は、1
4%のポリブタジェンアクリロニトリル骨格を含有する
ビスフェノールA型エポキシ樹脂で、軟化魚釣70℃、
エポキシ当量約500g/eqであるが、70%の2−
ブタノン溶液を使用しているので、100重量部が固型
エポキシ樹脂で、残りの43重量部が溶剤(2−ブタノ
ン)である。Aromatic diamine 12 parts by weight Silane coupling agent 1 part by weight AbOs
565 parts by weight solid epoxy resin is 1
Bisphenol A type epoxy resin containing 4% polybutadiene acrylonitrile skeleton, softened at 70℃,
The epoxy equivalent is about 500 g/eq, but 70% 2-
Since a butanone solution is used, 100 parts by weight is the solid epoxy resin and the remaining 43 parts by weight is the solvent (2-butanone).
芳香族ジアミンは、エポキシ樹脂の硬化剤であって、常
法に従って化学量論的な処決量となっている。Aromatic diamine is a curing agent for epoxy resin, and is used in a stoichiometric amount according to conventional methods.
シランカップリング剤は、A11(hは特に効果がある
のでここでは用いている。Ah03は、平均粒径4.5
μmの微粒像メーダーアルミナである。この処方を整理
すると、樹脂組成物に相当するのは、固型エポキシ樹脂
(100重量部)と芳香族ジアミン(12重量部)とシ
ランカップリング剤(1重量部)の計113重量部であ
る。Al2O3が565重量部でちょうど樹脂組成物の
5倍量となっている。残りの63重量部が2−ブタノン
、即ち溶剤である。これより、絶縁層の成分は、Al2
O3が83重量%、残り17重量%が樹脂組成物の有機
物ということになる。これは、それぞれの比重を4.0
と1.2で換算すると、AIJ3は59容量%というこ
とになる。これら原料を第1図に示す普通のかくはん釜
に入れてかくはんを行い、粉と他の成分がきれいにまざ
ったら、釜からワニスを抜き取る。このとき、200か
ら300メツシュ程度のストレーナ−を通すと、万一、
Ah03がかたまっている場合にもそれを取り除くこと
ができる。このようにして、4万〜5万cpsのワニス
が得られる。なお、第1図において、1はモーター、2
は釜、3は原料、4はプロペラ、5は抜取り口を表わす
。The silane coupling agent is A11 (h is used here because it is particularly effective.Ah03 has an average particle size of 4.5
It is micron-sized Mader alumina. Rearranging this recipe, the resin composition corresponds to a total of 113 parts by weight of solid epoxy resin (100 parts by weight), aromatic diamine (12 parts by weight), and silane coupling agent (1 part by weight). . The amount of Al2O3 was 565 parts by weight, which was exactly 5 times the amount of the resin composition. The remaining 63 parts by weight is 2-butanone, ie, solvent. From this, the component of the insulating layer is Al2
This means that O3 is 83% by weight and the remaining 17% by weight is the organic matter of the resin composition. This makes each specific gravity 4.0
When converted by 1.2, AIJ3 has a capacity of 59%. These raw materials are placed in an ordinary stirring pot as shown in Figure 1 and stirred. When the powder and other ingredients are mixed well, the varnish is removed from the pot. At this time, if you pass it through a strainer of about 200 to 300 mesh,
Even if Ah03 is clumped, it can be removed. In this way, a varnish of 40,000 to 50,000 cps is obtained. In addition, in Fig. 1, 1 is a motor, 2
3 represents the pot, 3 represents the raw material, 4 represents the propeller, and 5 represents the extraction port.
ワニスができたらば、次いで、厚さ35μmの銅箔にそ
れを塗布し、溶剤の乾燥を行う。第2図にこのための装
置を示す。塗布は、ドクターブレードを用いて、塗布厚
みはブレードのキャップで制御する。Once the varnish is prepared, it is then applied to a 35 μm thick copper foil and the solvent is dried. FIG. 2 shows a device for this purpose. Application is performed using a doctor blade, and the application thickness is controlled by the blade cap.
第2図中、11は銅箔巻き出し部、12はドクターブレ
ード、13は乾燥炉、14は接着剤ワニス付き鋼箔の巻
き取り部を表わす。In FIG. 2, 11 represents a copper foil unwinding part, 12 a doctor blade, 13 a drying oven, and 14 a winding part of the steel foil coated with adhesive varnish.
第1回目の塗布で溶剤乾燥後50μm、第2回目の塗布
で溶剤乾燥後更に50μmの計100μmの塗布層を2
回の塗布で得た。このようにして得た接着剤付き箔を厚
さ1.0flの^1仮に熱ロールで貼り合わせ、オート
クレーブの中で等方的な圧力場10kg/cJO中で最
高温度180℃で約2時間のキュアサイクルにて硬化を
行い、アルミベースの銅張り積層板を得た。Two coating layers of 100 μm in total, 50 μm after the solvent dries in the first coating and an additional 50 μm in the second coat after the solvent dries.
Obtained in one application. The thus obtained adhesive-coated foils were temporarily pasted together with a heat roll to a thickness of 1.0 fl, and heated in an autoclave at a maximum temperature of 180°C in an isotropic pressure field of 10 kg/cJO for about 2 hours. It was cured using a cure cycle to obtain an aluminum-based copper-clad laminate.
このようにして得られる金属ベース基板の製造工程を表
1に、その性能を表2に示す。The manufacturing process of the metal base substrate thus obtained is shown in Table 1, and its performance is shown in Table 2.
(2)比較例1゜ 下記の処方により接着剤ワニスを製造した。(2) Comparative example 1゜ An adhesive varnish was manufactured according to the following formulation.
液状のエポキシ樹脂 100重量部芳香族ジア
ミン 24重量部シランカップリング剤
1重量部Al103625重量部
液状のエポキシ樹脂は、14%のポリブタジェンアクリ
ロニトリル骨格を含有するビスフェノールA型エポキシ
樹脂で、粘度約1.2万cps (25℃)、エポキシ
当量約250g/eqである。芳香族ジアミンは、実施
例同様、化学量論的な処法量を用いている。Liquid epoxy resin 100 parts by weight Aromatic diamine 24 parts by weight Silane coupling agent 1 part by weight Al103625 parts by weight The liquid epoxy resin is a bisphenol A type epoxy resin containing 14% polybutadiene acrylonitrile skeleton, and has a viscosity of approximately 1. .20,000 cps (25°C), epoxy equivalent approximately 250 g/eq. As in the examples, the aromatic diamine is used in a stoichiometric amount.
なお、芳香族ジアミンは固型であるため、液状エポキシ
樹脂の一部を約90℃に加温してその中に溶かし込んで
均一化した。シランカップリング剤は、実施例と同じも
のを同じ量だけ用いた。^1203は、平均粒径16μ
mと平均粒径32μmのものを重量比1対1で用い、混
練りに先立って先のシランカップリング剤による処理を
施しておいた。Note that, since the aromatic diamine is solid, a portion of the liquid epoxy resin was heated to about 90° C. and dissolved therein to homogenize it. The same silane coupling agent was used in the same amount as in the example. ^1203 has an average particle size of 16μ
m and an average particle size of 32 μm were used in a weight ratio of 1:1, and prior to kneading, the above-mentioned treatment with a silane coupling agent was performed.
混合には、全セラミック製の3本ロールミルを用い、金
属粉のワニスへの混入を防いだ。ロールを2回通すこと
により、グラインドゲージで40μm以上の粒子は認め
られず、十分に混練りができていることが確認された。For mixing, an all-ceramic three-roll mill was used to prevent metal powder from being mixed into the varnish. By passing the mixture through the rolls twice, no particles larger than 40 μm were observed with a grind gauge, and it was confirmed that the mixture was sufficiently kneaded.
この処方では、Ah03の含有率は83重量%で、実施
例と同一である。このようにして約30万cpsの無溶
剤接着剤を得た。これを厚さ1.0+nのAI板に50
μmの厚さで塗布し、そのままクリーンオーブン中で1
20℃×10分かけてB−ステージを行った。In this formulation, the content of Ah03 is 83% by weight, which is the same as in the example. In this way, a solvent-free adhesive of about 300,000 cps was obtained. Put this on an AI board with a thickness of 1.0+n.
Coat it to a thickness of μm and leave it in a clean oven for 1
B-stage was performed at 20° C. for 10 minutes.
これを再度くり返し、計100μmの絶縁層をAI板上
に得た。これに実施例に用いたのと同じ35μmの銅箔
を熱ロールで貼り合わせ、実施例と同様の条件でオート
クレーブの中での硬化を行った。This was repeated again to obtain an insulating layer with a total thickness of 100 μm on the AI board. The same 35 μm copper foil as used in the examples was attached to this using a hot roll, and curing was performed in an autoclave under the same conditions as in the examples.
このようにして得られる金属ベース基板の製造工程を表
1に、その性能を表2に示す。The manufacturing process of the metal base substrate thus obtained is shown in Table 1, and its performance is shown in Table 2.
(3)比較例2゜
比較例2では、実施例で用いたと同じワニスを厚さ1.
Os*の^l板の上に70μm塗布し、120℃のク
リーンオープン中で5分間乾燥したところ、塗布厚みは
50μmとなっており、表面はルーパで確認できる直径
0.1fl程度の穴がところどころに認められた。これ
をくり返して2度のコーティングを行い、比較例1と同
様の手順に従い、100μmの絶縁層の銅張積層板を得
た。(3) Comparative Example 2゜ In Comparative Example 2, the same varnish used in the example was applied to a thickness of 1.
When 70 μm of the coating was applied on an Os*^l board and dried for 5 minutes in a clean open at 120°C, the coating thickness was 50 μm, and the surface had holes of about 0.1 fl in diameter here and there that could be confirmed with a looper. was recognized. This was repeated to perform two coatings, and the same procedure as in Comparative Example 1 was followed to obtain a copper-clad laminate with an insulating layer of 100 μm.
このようにして得られる金属ベース基板の製造工程を表
1に、その性能を表2に示す。The manufacturing process of the metal base substrate thus obtained is shown in Table 1, and its performance is shown in Table 2.
なお、耐電圧は50Hzの交流電源を用い、油中で行っ
た。100fiφの銅箔をエツチングで残し、JIS−
に−6911に従って行った0表1の各項目についてみ
ていくと、Al2O2の表面処理は、比較例1が別途処
理であるため繁雑であるが、実施例では簡便である。ワ
ニス混合は、比較例1の全セラミックス3本ロールが処
理能力の点や手間、及び作業員のバラツキが多い点など
好ましくない。この点、実施例では簡便に安定した操業
が可能である。ワニスの濾過も実施例では容易に行える
ので、品質保証の上で冗長性を持たせることができて有
利である。塗布は銅箔に連続的に行い、引きつづいて乾
燥炉に導〈実施例が優れている。乾燥又はB−ステージ
tよ、単に時間だけくらべても実施例の場合が早く完了
する。Note that the withstand voltage was measured in oil using a 50 Hz AC power source. Leave 100fiφ copper foil by etching, JIS-
Looking at each item in Table 1, the surface treatment of Al2O2 is complicated in Comparative Example 1 because it is a separate treatment, but it is simple in the Example. Mixing the varnish is not preferable since the three rolls made of all ceramics in Comparative Example 1 are not preferable in terms of processing capacity, labor, and large variations among workers. In this respect, the embodiment allows simple and stable operation. Since the varnish can be easily filtered in the embodiment, redundancy can be provided in terms of quality assurance, which is advantageous. The coating was carried out continuously on the copper foil, which was then passed through a drying oven (the example is better). The drying or B-stage is completed more quickly in the embodiment than only in terms of time.
ラミネート及び硬化は、実施例、比較例ともに特別かわ
るところはない。このように本発明は、工程そのものの
手間や設備面でも従来のやり方よりも格段に優れている
。There is no particular difference in lamination and curing in both the Examples and Comparative Examples. As described above, the present invention is significantly superior to conventional methods in terms of the time and equipment required for the process itself.
表2では、本発明及び従来の方法により製造した積層板
の性能等をチエツクした。フィラー含有量は全く等しい
にもかかわらず比較例2において、熱伝導率が低いこと
は、細かな穴がルーパで確認されたこととあわせても、
ボイドができていることの証拠と思われる。比較例2は
湿熱劣化後のハンダ耐熱も著しく劣るが、何よりも耐電
圧の低さ、バラツキの多さ、温熱劣化後には、もはや絶
縁性を失っておることが問題である。一方、同じワニス
であっても銅箔に塗布し、乾燥していた実施例では、こ
のようなことはなく、極めて性能の優れたものになって
いる。このことからも、溶剤を用いるワニスが問題とす
る見解は間違いであって、本発明によって開示される製
法に従えば、従来のやり方である比較例1よりも優れた
性能をだせることが判る。In Table 2, the performance etc. of the laminates manufactured by the present invention and the conventional method were checked. The fact that the thermal conductivity was low in Comparative Example 2 even though the filler content was exactly the same, even when combined with the fact that small holes were confirmed with the looper.
This seems to be evidence that a void has formed. In Comparative Example 2, the solder heat resistance after deterioration due to moist heat is also significantly inferior, but above all, the problem is that the withstand voltage is low, there is a large amount of variation, and the insulating property is already lost after deterioration due to heat. On the other hand, in the example in which the same varnish was applied to the copper foil and dried, this problem did not occur, and the performance was extremely excellent. This also shows that the idea that varnishes using solvents are a problem is wrong, and that if the manufacturing method disclosed by the present invention is followed, it will be possible to achieve better performance than Comparative Example 1, which is the conventional method.
以上説明したように本発明によれば、工程が容易である
し、品質的にも、特に絶縁性の信頼性の高い製品を生み
出すことが可能である。As explained above, according to the present invention, the process is easy and it is possible to produce a product with high quality, especially reliable insulation.
第1図はかくはん釜の一例を示す説明図、第2図は塗布
乾燥装置の一例を示す説明図である。
1・・・モーター、2・・・釜、3・・・原料、4・・
・プロペラ、5・・・抜取り口、11・・・銅箔巻き出
し部、12・・・ドクターブレード、13・・・乾燥炉
、14・・・接着剤ワニス付き銅箔の巻き取り部。
代理人 弁理士 小 川 信 −FIG. 1 is an explanatory diagram showing an example of a stirring pot, and FIG. 2 is an explanatory diagram showing an example of a coating drying device. 1...Motor, 2...Kettle, 3...Raw materials, 4...
- Propeller, 5... Extraction port, 11... Copper foil unwinding part, 12... Doctor blade, 13... Drying oven, 14... Copper foil winding part with adhesive varnish. Agent Patent Attorney Nobuo Ogawa −
Claims (1)
剤ワニスを、金属箔表面に塗布して乾燥させ、ついでこ
の塗布および乾燥を少なくとも1回繰り返した後、前記
金属箔の接着剤ワニス塗布面を金属板に貼着させること
を特徴とする集積回路用基板の製造方法。An adhesive varnish consisting of a solid resin composition, an inorganic filler, and a solvent is applied to the surface of the metal foil and dried, and after repeating this application and drying at least once, the adhesive varnish is applied to the metal foil. A method for manufacturing an integrated circuit board, which comprises bonding a surface to a metal plate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62329659A JP2557672B2 (en) | 1987-12-28 | 1987-12-28 | Manufacturing method of substrate for integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62329659A JP2557672B2 (en) | 1987-12-28 | 1987-12-28 | Manufacturing method of substrate for integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01173688A true JPH01173688A (en) | 1989-07-10 |
JP2557672B2 JP2557672B2 (en) | 1996-11-27 |
Family
ID=18223822
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62329659A Expired - Fee Related JP2557672B2 (en) | 1987-12-28 | 1987-12-28 | Manufacturing method of substrate for integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2557672B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001284820A (en) * | 2000-03-30 | 2001-10-12 | Nippon Zeon Co Ltd | Insulating material, method of manufacturing the same, and method of manufacturing multilayer circuit board |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605598A (en) * | 1983-06-23 | 1985-01-12 | 松下電器産業株式会社 | Method of producing high thermal conductive metal base printed board |
-
1987
- 1987-12-28 JP JP62329659A patent/JP2557672B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605598A (en) * | 1983-06-23 | 1985-01-12 | 松下電器産業株式会社 | Method of producing high thermal conductive metal base printed board |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001284820A (en) * | 2000-03-30 | 2001-10-12 | Nippon Zeon Co Ltd | Insulating material, method of manufacturing the same, and method of manufacturing multilayer circuit board |
Also Published As
Publication number | Publication date |
---|---|
JP2557672B2 (en) | 1996-11-27 |
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