JPH01171986A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH01171986A JPH01171986A JP62332803A JP33280387A JPH01171986A JP H01171986 A JPH01171986 A JP H01171986A JP 62332803 A JP62332803 A JP 62332803A JP 33280387 A JP33280387 A JP 33280387A JP H01171986 A JPH01171986 A JP H01171986A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substrate
- recording medium
- phthalocyanine
- independently represent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 19
- -1 naphthalocyanine compound Chemical class 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 24
- 229910052751 metal Chemical class 0.000 claims abstract description 13
- 239000002184 metal Chemical class 0.000 claims abstract description 13
- 239000010409 thin film Substances 0.000 claims abstract description 11
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000004429 atom Chemical group 0.000 claims description 5
- 125000001624 naphthyl group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 claims description 2
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 2
- 125000006267 biphenyl group Chemical group 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 12
- 238000000034 method Methods 0.000 abstract description 8
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000003960 organic solvent Substances 0.000 abstract description 6
- 230000035945 sensitivity Effects 0.000 abstract description 6
- 239000000975 dye Substances 0.000 abstract description 5
- 150000003839 salts Chemical class 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 3
- 238000002834 transmittance Methods 0.000 abstract description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000010410 layer Substances 0.000 description 18
- 229920005989 resin Polymers 0.000 description 12
- 239000011347 resin Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 6
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 239000001007 phthalocyanine dye Substances 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- MKILROQBJOOZKC-UHFFFAOYSA-N 6-tert-butylnaphthalene-2,3-dicarbonitrile Chemical compound C1=C(C#N)C(C#N)=CC2=CC(C(C)(C)C)=CC=C21 MKILROQBJOOZKC-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000005110 aryl thio group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001746 carotenes Chemical class 0.000 description 1
- 235000005473 carotenes Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000002925 chemical effect Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000002004 n-butylamino group Chemical group [H]N(*)C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004708 n-butylthio group Chemical group C(CCC)S* 0.000 description 1
- 125000004718 n-hexylthio group Chemical group C(CCCCC)S* 0.000 description 1
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical class N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 150000003022 phthalic acids Chemical class 0.000 description 1
- 125000005543 phthalimide group Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
- G11B7/248—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes porphines; azaporphines, e.g. phthalocyanines
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は、レーザー光線によって情報を書き込んだり、
読取ったりすることが可能な光学記録媒体に関するもの
である。[Detailed Description of the Invention] [Object of the Invention] (Industrial Application Field) The present invention provides a method for writing information using a laser beam,
The present invention relates to optical recording media that can be read and read.
(従来の技術)
従来、レーザー光線を用いて情報を記録する媒体には種
々のものがあるが、その一つにレーザー光線を基板上の
記録層に照射することによって、照射部分を局部的に加
熱し、融解、蒸発または分解等の物理的変化を起させ情
報を記録するものがある。(Prior Art) Conventionally, there are various types of media that record information using laser beams. One of them is a method that locally heats the irradiated area by irradiating a recording layer on a substrate with a laser beam. , there are some that record information by causing physical changes such as melting, evaporation, or decomposition.
これまで基板上の記録層として、As、Te、Se、T
i等の金属や合金の薄膜層が使用されてきた。Until now, As, Te, Se, T
Thin film layers of metals and alloys such as i have been used.
このような記録層を有する光学記録媒体は、一般に比較
的書き込み感度が高く、また記録再生の光学系が小型に
できる半導体レーザーにも適用することができるが、熱
伝導率が大きい1反射率が小さい等の理由で記録時にレ
ーザー光線のエネルギー炎効率よく利用できず、高速走
査で記録するには大出力のレーザー光線が必要となる場
合がある。また、これらの記録層は化学的に不安定であ
り、空気中で劣化されることがある。Optical recording media with such a recording layer generally have relatively high writing sensitivity, and can also be applied to semiconductor lasers where the optical system for recording and reproduction can be made compact. For reasons such as small size, the energy flame of the laser beam cannot be used efficiently during recording, and high-power laser beams may be required to record at high speed scanning. Furthermore, these recording layers are chemically unstable and may deteriorate in the air.
この様なことから、近年比較的長波長(例えば780n
m以上)のレーザー光線を用いて、基板上の有機薄膜層
に情報を書き込んだり読み取ったりする光記録媒体の研
究がなされている。For this reason, in recent years relatively long wavelengths (e.g. 780n) have been
Research has been carried out on optical recording media in which information is written to and read from an organic thin film layer on a substrate using a laser beam with a wavelength of 2.0 m or more.
この様な有a薄膜層は、半導体レーザーを用いて融解、
蒸発または分解等によって容易に小さな凹部(ピット)
を形成できる利点を持っている。Such a thin film layer is melted using a semiconductor laser,
Small depressions (pits) easily formed by evaporation or decomposition, etc.
It has the advantage of being able to form
有機薄膜層を基板の上に形成させ、レーザー光線を用い
て一情報を記録、再生する光ディスクとして特開昭57
−82093.特開昭58−56892゜特開昭60−
89842.特開昭60−15024 3等の各号公報
がすでに公知である。しかしながら。Unexamined Japanese Patent Publication No. 57 (1982) as an optical disc in which an organic thin film layer is formed on a substrate and information is recorded and reproduced using a laser beam.
-82093. Japanese Patent Publication No. 58-56892゜ Japanese Publication No. 60-
89842. Japanese Patent Laid-Open No. 60-15024 3 and other publications are already known. however.
半導体レーザー光線に対して吸収係数が大きい、記録感
度の高い光記録媒体として完全に満足できるものは開発
されていないのが実情である。The reality is that a completely satisfactory optical recording medium with high recording sensitivity and a large absorption coefficient for semiconductor laser beams has not been developed.
(発明が解決しようとする問題点)
本発明は、化学的、物理的に安定でレーザー光線で高感
度で記録再生できる安価な特定のナフタロシアニン化合
物を用いた光記録媒体を提供するものである。(Problems to be Solved by the Invention) The present invention provides an optical recording medium using an inexpensive specific naphthalocyanine compound that is chemically and physically stable and capable of recording and reproducing data with high sensitivity using a laser beam.
(問題を解決するための手段)
本発明者等は鋭意研究を行った結果、基板上に特定の構
造を有するフタロシアニン系化合物を含有する記録層を
有する光記録媒体が優れた種々の特性を有することを見
出し1本発明を完成するに到った。(Means for Solving the Problem) As a result of intensive research, the present inventors have found that an optical recording medium having a recording layer containing a phthalocyanine compound having a specific structure on a substrate has various excellent properties. This discovery led to the completion of the present invention.
即ち本発明は基板上に下記一般式(1)で示される特定
のフタロシアニン系化合物を含有する記録層を形成させ
ることを特徴とする。That is, the present invention is characterized in that a recording layer containing a specific phthalocyanine compound represented by the following general formula (1) is formed on a substrate.
一般式(1)
式中、W、ないしW4はそれぞれ独立に置換基を有して
もよいベンゼン環あるいはナフタリン環を表す。X、な
いしXa、Y+ないしYa、Z+ないしZ4はそれぞれ
独立に−N=N−、−CH=N−または−CH=CH−
を表す。AIないしA4.BlないしB、、C,ないし
C41はそれぞれ独立に置換基を有してもよいフェニル
基、ナフチル基、アントリル基、ビフェニル基を表す。General Formula (1) In the formula, W to W4 each independently represent a benzene ring or a naphthalene ring which may have a substituent. X, to Xa, Y+ to Ya, Z+ to Z4 are each independently -N=N-, -CH=N- or -CH=CH-
represents. AI to A4. Bl to B, C, to C41 each independently represent a phenyl group, a naphthyl group, an anthryl group, or a biphenyl group which may have a substituent.
Mは、水素原子またはハロゲン、酸素原子を有してもよ
い金属原子、または(OR+)s、 (SR2)t。M is a hydrogen atom, a halogen, a metal atom which may have an oxygen atom, or (OR+)s, (SR2)t.
(N R3R4)tl+ (−0S i R5R6R
?)X 有してもよい金属原子を表す。(ここでR1
ないし、R7゜水素原子、置換もしくは未置換の脂肪族
炭化水素基。(N R3R4)tl+ (-0S i R5R6R
? )X represents an optional metal atom. (Here R1
to R7゜hydrogen atom, substituted or unsubstituted aliphatic hydrocarbon group.
置換もしくは未置換の芳香族炭化水素基または置換もし
くは未置換の芳香族複素環基を表す。s、 t。Represents a substituted or unsubstituted aromatic hydrocarbon group or a substituted or unsubstituted aromatic heterocyclic group. s, t.
u、vはOないし2の整数を表す。)
n、p、q、rはそれぞれ独立にOまたは1を表し、j
、に、1.mはそれぞれ独立にOないし4の整数を表す
が、すべてが同時にOになることはない。u and v represent integers from O to 2. ) n, p, q, r each independently represent O or 1, and j
, 1. Each m independently represents an integer from O to 4, but not all of them are O at the same time.
WlないしWa、AIないしAa、B+ないしB、、C
,ないしC4,の置換基について更に詳しく説明すると
、塩素原子、臭素原子、ヨウ素原子などのハロゲン原子
、水酸基、ニトロ基、シアノ基。Wl or Wa, AI or Aa, B+ or B,,C
, to C4, are explained in more detail: halogen atoms such as chlorine atom, bromine atom, and iodine atom, hydroxyl group, nitro group, and cyano group.
アミノ基、n−ブチルアミノ基、n−ステアリルアミノ
基などのアルキルアミノ基、ジエチルアミノ基。Alkylamino groups such as amino groups, n-butylamino groups, and n-stearylamino groups, and diethylamino groups.
ジーn−へキシルアミノ基、ジー(2−エチルヘキシル
)−アミノ基などのジアルキルアミノ基、メチル5.t
−ブチル基、neo−ペンチルM、n−デシル基などの
アルキル基、メトキシ基、n−ブトキシ基、ステアリル
オキシ基、フェノキシ基などのアルコキシ基、トリメチ
ルシロキシ基、トリフェニルシロキシ基、などのシロキ
シ基、n−ブチルチオ基。Di-n-hexylamino group, dialkylamino group such as di(2-ethylhexyl)-amino group, methyl5. t
- Alkyl groups such as butyl group, neo-pentyl M, n-decyl group, alkoxy groups such as methoxy group, n-butoxy group, stearyloxy group, phenoxy group, siloxy group such as trimethylsiloxy group, triphenylsiloxy group, etc. , n-butylthio group.
n−へキシルチオ基、フェニルチオ基などのアルキル、
またはアリールチオ基などであるが、これらの置換基に
限られるものではない。Alkyl such as n-hexylthio group and phenylthio group,
or arylthio group, but is not limited to these substituents.
Mは、Hz+ Naz、t、i2.Cu、Fe、C。M is Hz+Naz, t, i2. Cu, Fe, C.
Ni、Zn、Mn、Sn、Pb、Mg、Al−C1゜I
n−Cl、Ti=O,V=O,Si+CI)z。Ni, Zn, Mn, Sn, Pb, Mg, Al-C1゜I
n-Cl, Ti=O, V=O, Si+CI)z.
S i+0H)z、 Ge+Cl)2. Ge+0H)
z、 S i÷O3i (CH,)3 ) z 、
Ge+O3t (CH、)3)、などを表すが、
その他、フタロシアニンと金属キレートを形成する多数
の金属を含んでいる。S i+0H)z, Ge+Cl)2. Ge+0H)
z, S i÷O3i (CH,)3) z,
It represents Ge+O3t (CH,)3), etc.
It also contains many other metals that form metal chelates with phthalocyanine.
上記−最大(1)で表されるフタロシアニン系化合物は
、可視から近赤外に大きな吸収を存し、半導体レーザー
光線による記録再生に好適である。The phthalocyanine compound represented by maximum (1) above has large absorption in the visible to near infrared range, and is suitable for recording and reproducing using a semiconductor laser beam.
本発明で使用する上記−最大(1)で表わされるフタロ
シアニン系化合物は、一般には下記−最大(II)で示
されるオルソジシアノ化合物一種以上と各種金属塩(無
金属フタロシアニン系の場合は使用しない)とを好まし
くは有機溶媒中で加熱することにより製造することがで
きる。The phthalocyanine compound represented by maximum (1) above used in the present invention is generally one or more orthodicyano compounds represented by maximum (II) below and various metal salts (not used in the case of metal-free phthalocyanine). Preferably, it can be produced by heating in an organic solvent.
一般式(n)
式中、環W、 X、 Y、 Z、 A、 BおよびCは
、それぞれ−最大(1)中のWIないしw4.XIない
しX4.YlないしY4.ZIないしZ4.AIないし
A4.BlないしB4.およびC,ないしC4を表す。General formula (n) In the formula, rings W, X, Y, Z, A, B and C each represent -maximum WI to w4. in (1). XI to X4. Yl to Y4. ZI or Z4. AI to A4. Bl to B4. and C, to C4.
nは一般式(1)中のnと同様であり、iは一般式(1
)中のj、に、1またはmを表すが。n is the same as n in the general formula (1), and i is the same as n in the general formula (1).
) represents 1 or m.
環Wに別の置換基を有する場合は、iは0ないし2の整
数を表す。When ring W has another substituent, i represents an integer of 0 to 2.
また−最大(1)のフタロシアニン系化合物は。Also - maximum (1) phthalocyanine compound.
フタル酸類、フタルイミド類を出発原料としても製製造
することができる。It can also be produced using phthalic acids and phthalimides as starting materials.
これらのフタロシアニン系化合物の製造にはアルコール
類、グリコール類、キシレン、キノリン、α−クロルナ
フタレン、ニトロベンゼン、スルホラン。Alcohols, glycols, xylene, quinoline, α-chloronaphthalene, nitrobenzene, and sulfolane are used in the production of these phthalocyanine compounds.
N−Nジメチルホルムアミド等の一般の有機溶媒を使用
することができるが、無溶媒でも得られる。A general organic solvent such as N--N dimethylformamide can be used, but it can also be obtained without a solvent.
また、触媒としてアルカリやジアザビシクロウンデセン
(DBU)、 シクロヘキシルアミン等の有機アミン
を使用した方が好ましい場合がある。Further, it may be preferable to use an alkali or an organic amine such as diazabicycloundecene (DBU) or cyclohexylamine as a catalyst.
また、原料となる金属塩は種々の金属塩が使用できる。Furthermore, various metal salts can be used as the raw material metal salts.
本発明において用いられる透明基板としては、信号の書
き込みや読み出しを行なうための光の透過率が、好まし
くは85%以上であり、かつ光学異方性の小さいものが
望ましい。例えば、ガラス、またはアルクル樹脂、ポリ
カーボネート樹脂、ポリエステル樹脂、ポリアミド樹脂
、塩化ビニル樹脂、ポリビニルエステル樹脂、ポリスチ
レン系樹脂、ポリオレフィン樹脂(ポリ−4−メチルペ
ンテン等)、ポリエーテルスルホン樹脂などの熱可塑性
樹脂やエポキシ樹脂、アリル樹脂などの熱硬化樹脂を用
いた基板が挙げられる。これらの中で、成形のしやすさ
、案内溝やアドレス信号等の付与のしやすさなどから前
記した熱可塑性樹脂が好ましく、更に光学特性や機械的
特性からアクリル樹脂やポリカーボネート樹脂が特に望
ましい。The transparent substrate used in the present invention preferably has a transmittance of light for writing and reading signals of preferably 85% or more and has small optical anisotropy. For example, glass or thermoplastic resins such as alkyl resins, polycarbonate resins, polyester resins, polyamide resins, vinyl chloride resins, polyvinyl ester resins, polystyrene resins, polyolefin resins (poly-4-methylpentene, etc.), and polyethersulfone resins. Examples include substrates using thermosetting resins such as epoxy resins, allyl resins, etc. Among these, the above-mentioned thermoplastic resins are preferred from the viewpoint of ease of molding and ease of providing guide grooves, address signals, etc., and acrylic resins and polycarbonate resins are particularly preferred from the viewpoint of optical properties and mechanical properties.
本発明においては、これらの透明な基板の厚さは。In the present invention, the thickness of these transparent substrates is .
特に制限がなく、板状でもフィルム状でも良い。また、
その形状は9円形やカード状でもよく、その大きさには
特に制限はない。There is no particular restriction, and it may be in the form of a plate or a film. Also,
Its shape may be nine circles or card-like, and its size is not particularly limited.
また本発明の透明基板には、記録および読み出しの際の
位置制御のための案内溝やアドレス信号や各種マーク等
のプリフォーマット用の凹凸を通常有しているが、これ
らの凹凸は前記したような熱可塑性樹脂を成形(射出、
圧縮等)する際にスタンパ−などを用いて付与するのが
、好ましい。Further, the transparent substrate of the present invention usually has unevenness for preformatting, such as guide grooves for position control during recording and reading, address signals, and various marks, as described above. Molding (injection,
It is preferable to apply it using a stamper or the like during compression (compression, etc.).
本発明q光学記録媒体において、フタロシアニン系色素
を含有する記録層を透明な基板上に定着するには2例え
ば真空蒸着法、スパンタリング法、イオンプレート法お
よびL B法(ラングミュアブロジエット法)などの方
法で薄膜化できるが、これらの方法は操作が繁雑であり
、かつ生産性の点で劣るので。In the optical recording medium of the present invention (q), in order to fix the recording layer containing a phthalocyanine dye on a transparent substrate, there are two methods, such as vacuum evaporation method, sputtering method, ion plate method, and LB method (Langmuir-Blodgiett method). However, these methods require complicated operations and are inferior in terms of productivity.
いわゆる塗布による方法が最も好ましい。塗布法によっ
て記録層を形成する場合には、フタロシアニン系化合物
をアルコール類、ケトン類、アミド類、スルホキシド類
、エーテル類、エステル類、脂肪族ハロゲン化炭化水素
類、芳香族炭化水素類等の一般の有機溶媒に分散または
溶解して塗布する。この際。The so-called coating method is most preferred. When forming a recording layer by a coating method, the phthalocyanine compound may be a general compound such as alcohols, ketones, amides, sulfoxides, ethers, esters, aliphatic halogenated hydrocarbons, aromatic hydrocarbons, etc. It is applied by dispersing or dissolving it in an organic solvent. On this occasion.
フタロシアニン系色素のアミノ基と有機酸とによる造塩
体を形成させることにより、溶解性が増大するため、上
記の有機溶媒中に、酢酸、プロピオン酸。By forming a salt formed by the amino group of the phthalocyanine dye and an organic acid, solubility is increased, so acetic acid and propionic acid are added to the above organic solvent.
酪酸、オレイン酸、ステアリン酸等の有機酸を混合して
使用することもできる。また、このとき場合によっては
、高分子バインダーを加えても良い。高分子バインダー
としては、塩化ビニル樹脂、アクリル酸樹脂、ポリエス
テル樹脂、ポリエチレン樹脂、ポリアミド樹脂、ポリカ
ーボネート樹脂、エポキシ樹脂、メタクリル酸樹脂、酢
酸ビニル樹脂、ニトロセルロース、ポリプロピレン樹脂
、ポリエチレンテレフタレート樹脂、フェノール樹脂ま
たはこれらの共重合体などがあげられる。その際フタロ
シアニン系色素に対する樹脂の比率は10tnt%以下
が好ましい。It is also possible to use a mixture of organic acids such as butyric acid, oleic acid, and stearic acid. Further, at this time, a polymer binder may be added depending on the case. Examples of the polymer binder include vinyl chloride resin, acrylic acid resin, polyester resin, polyethylene resin, polyamide resin, polycarbonate resin, epoxy resin, methacrylic acid resin, vinyl acetate resin, nitrocellulose, polypropylene resin, polyethylene terephthalate resin, phenol resin, or Examples include copolymers of these. In this case, the ratio of resin to phthalocyanine dye is preferably 10 tnt% or less.
また1本発明のフタロシアニン系化合物に、他の色素を
混合分散あるいは混合溶解して使用することもできる。Further, it is also possible to use the phthalocyanine compound of the present invention by mixing and dispersing or mixing and dissolving other dyes.
混合して使用できる色素としては、すでに公知の例えば
、芳香族または不飽和脂肪族ジアミン系金属錯体、芳香
族または不飽和脂肪族ジチオール系金属錯体、フタロシ
アニン系錯体、ナフタロシアニン系錯体、スクアリウム
系色素、ナフトキノン系錯体、アントラキノン系色素や
ポリメチン系色素が挙げられる。Examples of dyes that can be used in combination include already known aromatic or unsaturated aliphatic diamine metal complexes, aromatic or unsaturated aliphatic dithiol metal complexes, phthalocyanine complexes, naphthalocyanine complexes, and squalium dyes. , naphthoquinone complexes, anthraquinone dyes, and polymethine dyes.
また9本発明のフタロシアニン系化合物の光退色を抑制
し、光安定性を向上させるために、−重項酸素クエンチ
ャー例えばカロチン類1色素類、アミン類、フェノール
類、ニッケル錯体類、スルフィド類などを、混合溶解し
て使用してもよい。In addition, in order to suppress photobleaching and improve photostability of the phthalocyanine compounds of the present invention, - doublet oxygen quenchers such as carotenes, pigments, amines, phenols, nickel complexes, sulfides, etc. may be mixed and dissolved before use.
透明基板上に形成するフタロシアニン系色素を含有する
記録層は、10μm以下で、好ましくは500人/2μ
mである。また塗布した後、クロロホルム、テトラヒド
ロフラン、トルエン等の有機溶媒の蒸気にさらすことに
よって、薄膜の吸収波長が長波長にシフトし、半導体レ
ーザーの発振波長域の光に対する感度を著しく向上させ
ることができる場合もある。The recording layer containing a phthalocyanine dye formed on a transparent substrate has a thickness of 10 μm or less, preferably 500 people/2 μm.
It is m. In addition, by exposing the thin film to the vapor of an organic solvent such as chloroform, tetrahydrofuran, or toluene after coating, the absorption wavelength of the thin film shifts to longer wavelengths, and the sensitivity to light in the oscillation wavelength range of semiconductor lasers can be significantly improved. There is also.
また、これらの記録層を保護するために、Aft03+
S i oZI S 1O1S n O等の無機化合
物を蒸着して保護層を設けても良い。また、保護層とし
て。In addition, in order to protect these recording layers, Aft03+
The protective layer may be provided by vapor depositing an inorganic compound such as S ioZI S 1O1S n O. Also as a protective layer.
高分子を塗布しても良い。A polymer may also be applied.
上記の様にして得られた記録媒体への記録は、基板上に
設けた記録層に1μm程度に集束したレーザー光、好ま
しくは半導体レーザー光を照射することにより行なう。Recording on the recording medium obtained as described above is carried out by irradiating the recording layer provided on the substrate with laser light, preferably semiconductor laser light, focused to about 1 μm.
レーザー光の照射された部分は、レーザーエネルギーの
吸収による分解、蒸発、溶融等の記録層の熱的な状態変
化が生じた部分と、生じていない部分の反射率の差を読
み取ることにより行なう。This is determined by reading the difference in reflectance between the areas irradiated with the laser beam and the areas where the thermal state of the recording layer has changed, such as decomposition, evaporation, or melting due to absorption of laser energy, and the area where no changes have occurred.
光源としては、He−Neレーザー、Arレーザー、半
導体レーザー等の各種レーザーを用いることができるが
2価格、大きさの点で半纏体レーザーが特に好ましい。As the light source, various lasers such as a He--Ne laser, an Ar laser, and a semiconductor laser can be used, but a semi-integrated laser is particularly preferable in terms of cost and size.
半導体レーザーとしては、中心波長830nm、 7
80nmおよびそれより短波長のレーザーを使用するこ
とができる。As a semiconductor laser, the center wavelength is 830 nm, 7
Lasers with wavelengths of 80 nm and shorter can be used.
次に1本発明を実施例により、更に具体的に説明するが
1本発明は、以下の実施例に限定されるものではない。Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the following Examples.
例中部は重量部である。In the example, the middle part is the part by weight.
(以下余白) (実 施 例) 〔合成例1 化合物No、3の合成〕 上式で示されるオルソジシアノ化合物8.12部 。(Margin below) (Example) [Synthesis Example 1 Synthesis of Compound No. 3] 8.12 parts of orthodicyano compound represented by the above formula.
三塩化バナジウム1.6部、ジアザビシクロウンデゼン
(DBU)3.0部をn−アミルアルコール50部に加
え5時間加熱還流した後冷却、メタノールs。1.6 parts of vanadium trichloride and 3.0 parts of diazabicycloundezene (DBU) were added to 50 parts of n-amyl alcohol, heated under reflux for 5 hours, and then cooled, followed by methanol s.
0部で希釈し、生物を日別、メタノールで洗浄、乾燥す
ると、化合物No、34.8部が得られる。Diluting with 0 parts and washing the organism daily with methanol and drying yields 34.8 parts of compound no.
〔合成例2 化合物No、8の合成〕
上式で示されるオリソジシアノ化合物9.4部、三塩化
バナジウム2.0部をキノリン50部に加え160〜1
70℃で3時間加熱攪拌した後冷却、メタノール500
部で希釈し、生物を日別、メタノールで洗浄、乾燥する
と、化合物N0.85.1部が得られる。[Synthesis Example 2 Synthesis of Compound No. 8] 9.4 parts of the orisodicyano compound represented by the above formula and 2.0 parts of vanadium trichloride were added to 50 parts of quinoline to give 160 to 1
After heating and stirring at 70°C for 3 hours, cool and methanol 500ml.
0.85.1 part of compound N is obtained by diluting 1 part and washing the organism daily with methanol and drying.
〔合成例3 化合物No、11の合成〕上式で示される
オルソジシアノ化合物5.5部、6−tert−ブチル
−2,3−ジシアノナフタレン2.4部、無水塩化アル
ミニウム2.7部をα−クロロナフタレン100部に加
え150〜160℃で5時間加熱攪拌した後冷却、メタ
ノール800部で希釈し、生成物を日別、メタノール、
n−ヘキサンで洗浄、乾燥した後、ジクロロエタンに溶
解し、アルミナカラムで分離精製すると、化合物No、
11が1.2部得られる。[Synthesis Example 3 Synthesis of Compounds No. 11] 5.5 parts of the orthodicyano compound represented by the above formula, 2.4 parts of 6-tert-butyl-2,3-dicyanonaphthalene, and 2.7 parts of anhydrous aluminum chloride were mixed with α - Added to 100 parts of chloronaphthalene, heated and stirred at 150 to 160°C for 5 hours, cooled, diluted with 800 parts of methanol, and the product was divided into methanol,
After washing with n-hexane and drying, it was dissolved in dichloroethane and separated and purified using an alumina column to obtain compound No.
1.2 parts of 11 are obtained.
実施例1
パイレックス基板上に、フタロシアニン系化合物No、
33.0部とジクロロエタン97.0部からなる溶液を
滴下した後、この基板を1100Orpの速度で15秒
間回転した。Example 1 On a Pyrex substrate, phthalocyanine compound No.
After dropping a solution consisting of 33.0 parts and 97.0 parts of dichloroethane, the substrate was rotated at a speed of 1100 Orp for 15 seconds.
次にこの基板を80℃で40分間乾燥して記録媒体を得
た。Next, this substrate was dried at 80° C. for 40 minutes to obtain a recording medium.
この記録層の膜厚は800人であった。この薄膜の最大
吸収波長は806 nmであり、830部mの波長の光
に対する反射率は27%であった。The thickness of this recording layer was 800. The maximum absorption wavelength of this thin film was 806 nm, and the reflectance for light with a wavelength of 830 parts m was 27%.
この光学記録媒体をターンテーブル上に取りつけターン
テーブルを180Orpmで回転させながら。This optical recording medium was mounted on a turntable, and the turntable was rotated at 180 rpm.
1.0.crmに集中した8 30 nmのレーザー5
mW。1.0. 8 30 nm laser 5 focused on crm
mW.
8MHzで照射して記録を行った。Recordings were made with irradiation at 8 MHz.
この記録を行った光学記録媒体表面を走査型電子顕微鏡
観察を行ったところ、鮮明なピットの形成が認められた
。また、この光学記録媒体に830部m。When the surface of the optical recording medium on which this recording was performed was observed using a scanning electron microscope, the formation of clear pits was observed. Moreover, 830 copies m were added to this optical recording medium.
0、4 n Wのレーザー光を照射し1反射光の検出を
行ったところ、C/N比が45dBであった。When laser light of 0.4 nW was irradiated and one reflected light was detected, the C/N ratio was 45 dB.
実施例2
ポリカーボネート樹脂基板上に、フタロシアニン系化合
物No、82.6部と、メチルセロソルブ98.0部か
ら成る溶液を滴下した後、この基板を70orpmの速
度で20秒間回転した。Example 2 A solution consisting of 82.6 parts of phthalocyanine compound No. and 98.0 parts of methyl cellosolve was dropped onto a polycarbonate resin substrate, and then the substrate was rotated at a speed of 70 rpm for 20 seconds.
次に、この基板を減圧下80℃で30分間乾燥して記録
媒体を得た。Next, this substrate was dried at 80° C. for 30 minutes under reduced pressure to obtain a recording medium.
この記録層の膜厚は650人であった。この薄膜の最大
吸収波長は820部mであり、830部mの波長の光に
対する反射率は26%であった。The thickness of this recording layer was 650. The maximum absorption wavelength of this thin film was 820 parts m, and the reflectance for light with a wavelength of 830 parts m was 26%.
またこの記録媒体を実施例1と同様に記録を行ったとこ
ろ、記録層表面に鮮明なビット形成が認められ、また、
C/N比が43dBであった。Further, when recording was performed on this recording medium in the same manner as in Example 1, clear bit formation was observed on the surface of the recording layer.
The C/N ratio was 43 dB.
実施例3〜13
パイレックス基板上にフタロシアニン系化合物No、1
.2.4〜7.9〜13を実施例1と同様な方法により
塗布して記録媒体を得た。Examples 3 to 13 Phthalocyanine compound No. 1 on Pyrex substrate
.. 2.4 to 7.9 to 13 were applied in the same manner as in Example 1 to obtain a recording medium.
この薄膜の最大吸収波長および830部mの波長光に対
する反射率、およびこの記録媒体に実施例1と同様な記
録再生を行った結果を表1に示す。Table 1 shows the maximum absorption wavelength of this thin film, the reflectance for light with a wavelength of 830 parts m, and the results of recording and reproducing the same recording and reproduction as in Example 1 on this recording medium.
表 1
3 1 802nm 17% 37
4 2 815nm 30% 45
5 4 806nm 24% 45
6 5 800nm 23% 47
7 6 810na+ 26% 44
8 7 830nm 27% 46
9 9 825nm 32% 48
1010 817nm 28% 43
1111 820nm 33% 45
1212 830nn+ 30% 491313 81
5nm 31% 45
〔発明の効果〕
本発明は以上のような構成によりなり、化学的。Table 1 3 1 802nm 17% 37 4 2 815nm 30% 45 5 4 806nm 24% 45 6 5 800nm 23% 47 7 6 810na+ 26% 44 8 7 830nm 27% 46 9 9 825nm 32% 4 8 1010 817nm 28% 43 1111 820nm 33% 45 1212 830nn+ 30% 491313 81
5 nm 31% 45 [Effects of the Invention] The present invention has the above-mentioned structure, and has a chemical effect.
物理的に安定でレーザー光線で高感度で記録再生できる
特徴を有する。It is physically stable and can be recorded and reproduced with high sensitivity using laser beams.
Claims (1)
ニン系化合物の少なくとも一種以上を含有する有機薄膜
層を有することを特徴とする光学記録媒体。 一般式〔 I 〕 ▲数式、化学式、表等があります▼ 式中、W_1ないしW_4はそれぞれ独立に置換基を有
してもよいベンゼン環あるいはナフタリン環を表す。X
_1ないしX_4、Y_1ないしY_4、Z_1ないし
Z_4はそれぞれ独立に−N=N−、−CH=N−また
は−CH=CH−を表す。A_1ないしA_4、B_1
ないしB_4、C_1ないしC_4はそれぞれ独立に置
換基を有してもよいフェニル基、ナフチル基、アントリ
ル基、ビフェニル基を表す。 Mは、水素原子またはハロゲン、酸素原子を有してもよ
い金属原子、または(OR_1)_s、(SR_2)_
t、(NR_3R_4)_u、(OSiR_5R_6R
_7)_vを有してもよい金属原子を表す。(ここでR
_1ないしR_7は水素原子、置換もしくは未置換の脂
肪族炭化水素基、置換もしくは未置換の芳香族炭化水素
基または置換もしくは未置換の芳香族複素環基を表す。 s、t、u、vは0ないし2の整数を表す。) n、p、q、rはそれぞれ独立に0または1を表し、j
、k、l、mはそれぞれ独立に0ないし4の整数を表す
が、すべてが同時に0になることはない。[Claims] 1. An optical recording medium characterized by having an organic thin film layer containing at least one phthalocyanine compound represented by the following general formula [I] on a substrate. General formula [I] ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ In the formula, W_1 to W_4 each independently represent a benzene ring or a naphthalene ring which may have a substituent. X
_1 to X_4, Y_1 to Y_4, and Z_1 to Z_4 each independently represent -N=N-, -CH=N-, or -CH=CH-. A_1 to A_4, B_1
to B_4 and C_1 to C_4 each independently represent a phenyl group, a naphthyl group, an anthryl group, or a biphenyl group which may have a substituent. M is a hydrogen atom, a halogen, a metal atom that may have an oxygen atom, or (OR_1)_s, (SR_2)_
t, (NR_3R_4)_u, (OSiR_5R_6R
_7) Represents a metal atom that may have __v. (Here R
_1 to R_7 represent a hydrogen atom, a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a substituted or unsubstituted aromatic heterocyclic group. s, t, u, and v represent integers from 0 to 2. ) n, p, q, r each independently represent 0 or 1, and j
, k, l, and m each independently represent an integer from 0 to 4, but they cannot all be 0 at the same time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62332803A JPH01171986A (en) | 1987-12-28 | 1987-12-28 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62332803A JPH01171986A (en) | 1987-12-28 | 1987-12-28 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01171986A true JPH01171986A (en) | 1989-07-06 |
Family
ID=18258977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62332803A Pending JPH01171986A (en) | 1987-12-28 | 1987-12-28 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01171986A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7148345B2 (en) * | 2004-08-09 | 2006-12-12 | Silverbrook Research Pty Ltd | Synthetically expedient water-dispersible IR dyes having improved lightfastness |
US7699920B2 (en) | 2004-08-09 | 2010-04-20 | Silverbrook Research Pty Ltd | Ink comprising gallium naphthalocyanine dye |
JP2015059137A (en) * | 2013-09-17 | 2015-03-30 | 富士フイルム株式会社 | Coloring composition, photosensitive coloring composition, color filter and method of producing the same, liquid crystal display device, organic electroluminescent element, and solid state image sensor |
-
1987
- 1987-12-28 JP JP62332803A patent/JPH01171986A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7148345B2 (en) * | 2004-08-09 | 2006-12-12 | Silverbrook Research Pty Ltd | Synthetically expedient water-dispersible IR dyes having improved lightfastness |
US7699920B2 (en) | 2004-08-09 | 2010-04-20 | Silverbrook Research Pty Ltd | Ink comprising gallium naphthalocyanine dye |
US7750147B2 (en) | 2004-08-09 | 2010-07-06 | Silverbrook Research Pty Ltd | Gallium naphthalocyanine dye |
US7892339B2 (en) | 2004-08-09 | 2011-02-22 | Silverbrook Research Pty Ltd | IR-absorbing gallium naphthalocyanine dye |
US7959724B2 (en) | 2004-08-09 | 2011-06-14 | Silverbrook Research Pty Ltd | Substrate having inkjet ink comprising naphthalocyanine dye disposed thereon |
US7964719B2 (en) | 2004-08-09 | 2011-06-21 | Silverbrook Research Pty Ltd | Inkjet ink comprising gallium naphthalocyanine dye |
JP2015059137A (en) * | 2013-09-17 | 2015-03-30 | 富士フイルム株式会社 | Coloring composition, photosensitive coloring composition, color filter and method of producing the same, liquid crystal display device, organic electroluminescent element, and solid state image sensor |
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