JPH01171687A - Treatment of lead-containing waste water - Google Patents
Treatment of lead-containing waste waterInfo
- Publication number
- JPH01171687A JPH01171687A JP33162687A JP33162687A JPH01171687A JP H01171687 A JPH01171687 A JP H01171687A JP 33162687 A JP33162687 A JP 33162687A JP 33162687 A JP33162687 A JP 33162687A JP H01171687 A JPH01171687 A JP H01171687A
- Authority
- JP
- Japan
- Prior art keywords
- water
- tank
- lead
- particles
- active carbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002351 wastewater Substances 0.000 title claims abstract description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 23
- 230000004907 flux Effects 0.000 claims abstract description 22
- 239000002245 particle Substances 0.000 claims abstract description 17
- 239000007788 liquid Substances 0.000 claims abstract description 16
- 239000006228 supernatant Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 12
- 238000004062 sedimentation Methods 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 17
- 238000005406 washing Methods 0.000 abstract description 12
- 239000002699 waste material Substances 0.000 abstract description 6
- 238000001914 filtration Methods 0.000 abstract description 5
- 239000013522 chelant Substances 0.000 abstract description 4
- 238000001556 precipitation Methods 0.000 abstract description 4
- 239000011347 resin Substances 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 abstract description 2
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 abstract description 2
- 235000013922 glutamic acid Nutrition 0.000 abstract description 2
- 239000004220 glutamic acid Substances 0.000 abstract description 2
- 239000000543 intermediate Substances 0.000 abstract description 2
- 239000002923 metal particle Substances 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 229910052799 carbon Inorganic materials 0.000 abstract 5
- 229910052745 lead Inorganic materials 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 239000010865 sewage Substances 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 10
- 239000002440 industrial waste Substances 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 238000005476 soldering Methods 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 235000020681 well water Nutrition 0.000 description 3
- 239000002349 well water Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- FBOUIAKEJMZPQG-AWNIVKPZSA-N (1E)-1-(2,4-dichlorophenyl)-4,4-dimethyl-2-(1,2,4-triazol-1-yl)pent-1-en-3-ol Chemical compound C1=NC=NN1/C(C(O)C(C)(C)C)=C/C1=CC=C(Cl)C=C1Cl FBOUIAKEJMZPQG-AWNIVKPZSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- FFBHFFJDDLITSX-UHFFFAOYSA-N benzyl N-[2-hydroxy-4-(3-oxomorpholin-4-yl)phenyl]carbamate Chemical compound OC1=C(NC(=O)OCC2=CC=CC=C2)C=CC(=C1)N1CCOCC1=O FFBHFFJDDLITSX-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000002306 glutamic acid derivatives Chemical class 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
Landscapes
- Water Treatment By Sorption (AREA)
- Coating With Molten Metal (AREA)
Abstract
Description
【発明の詳細な説明】
・−=−−の°1 ノ
本発明の電子部品の製造工程などで発生する含鉛廃水の
処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for treating lead-containing wastewater generated in the manufacturing process of electronic components.
鷹末図11
電子部品は外部リードや外部電極の半田付は性を良好に
するために半田メツキしている。この半田メツキは外部
リードなどの被メツキ部を溶融半田に浸漬することによ
り形成しているが、被メツキ部が酸化していたり油で汚
染されていると半田の馴みが悪(半田付は性がばらつ(
ため、メツキ作業に先だって被メツキ部にフラツクスを
塗布している。Figure Takasue 11 For electronic parts, external leads and external electrodes are soldered to ensure good soldering properties. This solder plating is formed by dipping the part to be plated, such as an external lead, into molten solder, but if the part to be plated is oxidized or contaminated with oil, the solder will not adhere well (soldering will be difficult). Sexuality varies (
Therefore, flux is applied to the area to be plated before plating.
半田メツキが完了した電子部品は洗浄され残留フラック
スが除去される。Electronic components that have been soldered are cleaned to remove residual flux.
従来は洗浄液として有機溶剤が用いられていたが有機溶
剤は大気濃度を管理しなければならないこと、可燃性で
あることなどの理由から取扱いが煩雑であった。Conventionally, organic solvents have been used as cleaning liquids, but organic solvents are complicated to handle because their atmospheric concentration must be controlled and they are flammable.
そのため水溶性フラックスを用い半田メツキ後の残留フ
ラックスを水溶除去するようにしている。Therefore, water-soluble flux is used to remove residual flux after soldering.
第2図に半田メツキ工程の一例を示す。図において1は
第2次フラックス塗布工程、2は第1次゛μ田ディンブ
工程、3は第2次フラックス塗布工程、4は第2次半田
ディソプ工程、5.6.7.8はそれぞれ第0次乃至第
3次水洗工程、9は水切り工程、 10は乾燥工程を示
す。FIG. 2 shows an example of the solder plating process. In the figure, 1 is the second flux coating process, 2 is the first μ solder dipping process, 3 is the second flux coating process, 4 is the second soldering process, and 5, 6, 7, and 8 are the 3rd soldering process, respectively. 0th to 3rd washing steps, 9 is a draining step, and 10 is a drying step.
電子部品は先ず第1次フラックス塗布工程1に供給され
、被メツキ部にフラックスが塗布され、第1次宇田ディ
ソプ工程2で、溶融半田に破メ。The electronic components are first supplied to the first flux application process 1, where flux is applied to the part to be plated, and in the first Uda Disop process 2, it is broken into molten solder.
キ部が浸漬されて半田メツキされる。第2次フラックス
塗布工程3で再度被メツキ部に再度フラックスが塗布さ
れ、第2次半田ディソプ工程4で、先に半田付着が不十
分な部分にも半田を十分馴ませ、メツキ仕上げをする。The open area is dipped and soldered. In the second flux application step 3, flux is applied again to the part to be plated, and in the second solder dispersion step 4, the solder is sufficiently applied to the parts where the solder has not been sufficiently adhered, and a plating finish is performed.
第0次乃至第3次水洗り程5〜8を通る間に、電子部品
に残留したフラックスが塗布される。水洗工程は電子部
品の移動速度に応じて設けられ各水洗工程での水洗時間
が短くても最終的に十分洗浄がなされるようにT程数が
設定される。各水洗工程5〜8で発生した汚水は各水洗
工程毎に設けられた汚水槽11〜14に貯えられる。水
洗を終えた電子部品は水切工程9で、エアブロウ等によ
り水切りされた後、乾燥工程10で温風乾燥される。During the 0th to 3rd water washing steps 5 to 8, the remaining flux is applied to the electronic components. The water washing steps are provided according to the moving speed of the electronic component, and the number T is set so that even if the washing time in each washing step is short, sufficient washing can be achieved in the end. The sewage generated in each washing process 5-8 is stored in sewage tanks 11-14 provided for each washing process. The electronic components that have been washed with water are drained by air blowing or the like in a draining step 9, and then dried with warm air in a drying step 10.
ところで水洗工程5〜8で生じた汚水は水溶性フラクス
成分と鉛とを含む廃水であり、鉛の規正値を満足するよ
うに濾過及び希釈され排水などの処理がされる。By the way, the wastewater generated in the washing steps 5 to 8 is wastewater containing a water-soluble flux component and lead, and is filtered and diluted so as to satisfy the standard value of lead, and then treated as wastewater.
第3図は鉛を含む廃水の処理工程の一例を示すもので、
図においてIl〜!4は汚水槽で、!5は上水受入部、
I6は軟化器、17a〜+7cはバルブ、18は産業廃
棄物貯蔵タンク、19は井戸水揚水ポンプ、20は予備
槽、21は濾過装置を示す。Figure 3 shows an example of the treatment process for wastewater containing lead.
In the figure Il~! 4 is a sewage tank! 5 is the water supply reception department;
I6 is a softener, 17a to +7c are valves, 18 is an industrial waste storage tank, 19 is a well water pump, 20 is a reserve tank, and 21 is a filtration device.
−E水受入部15から取り入れられた上水は軟化器+6
を通り、分岐されバルブ17a 、 17bを介してそ
れぞれ第0次乃至第3次汚水槽ll−14に供給される
。第0次汚水槽11の汚水は介錯16度が高いため、沈
殿が繰返され、固形物や高lr5度廃水は産業廃棄物貯
蔵タンク+8に貯蔵される。第1次乃至第3次汚水槽1
2〜14の上澄液はそれぞれ予備槽20に供給され、こ
の予備槽20には揚水ポンプ19によって汲み上げられ
た井戸水がバルブ17cを介して供給され、さらにこの
予備槽20の上澄液は濾過装置21に供給される。- The water taken in from the E water receiving part 15 is softened by +6
The water is then branched and supplied to the 0th to 3rd sewage tanks 11-14 through valves 17a and 17b, respectively. Since the sewage in the 0th stage sewage tank 11 has a high interstitial content of 16 degrees, precipitation is repeated, and the solids and high lr 5 degrees wastewater are stored in the industrial waste storage tank +8. 1st to 3rd sewage tank 1
The supernatant liquids of Nos. 2 to 14 are each supplied to a preliminary tank 20, and well water pumped up by the water pump 19 is supplied to this preliminary tank 20 via a valve 17c, and furthermore, the supernatant liquid of this preliminary tank 20 is filtered. It is supplied to the device 21.
各バルブ+7a 、 +7bは6槽■〜14.20の濃
度が規定値となるように制御されるが、第0次汚水槽1
1は鉛濃度が5ppm位となるため、外部に排水できす
産業廃棄部として処理される。一方手第1次乃至第3次
汚水槽12〜I4上水で鉛15度を0.21)l)II
程度に抑えることができるため、予備槽20内でさらに
井戸水で希釈して濾過装置2!で鉛の固形分を除去し鉛
濃度をLll以下として排水を可能にしている。Each valve +7a, +7b is controlled so that the concentration of 6 tanks - 14.20 becomes the specified value, but in the 0th sewage tank 1
No. 1 has a lead concentration of about 5 ppm, so it is drained outside and disposed of as industrial waste. On the other hand, 0.21) l) II with 15 degrees of lead in the 1st to 3rd sewage tanks 12 to 14 tap water
Since it can be suppressed to a certain extent, it is further diluted with well water in the preliminary tank 20 and filtered into the filtration device 2! The solid content of lead is removed and the lead concentration is reduced to less than Lll, making drainage possible.
光則迎jハLじ表土シJ」ILi悲
このようにして濾過と希釈により、鉛規制を満足した状
態で排水は可能であるが、鉛l口度を低(保つために、
上水などの多量の用水が必要であった。In this way, through filtration and dilution, it is possible to drain water while satisfying lead regulations, but in order to keep the lead concentration low,
A large amount of water, such as tap water, was required.
また鉛lO度は低くても、鉛排出量は積算され長期間に
わたると環境に影響することが懸念されるという問題が
あった。In addition, even if the lead 1O content is low, the amount of lead discharged is cumulative and there is a concern that it may affect the environment over a long period of time.
さらには0次汚水は産業廃棄物として処理しなければな
らないため処理費が嵩むという問題もあった。Furthermore, since the zero-level sewage must be treated as industrial waste, there is also the problem of increased treatment costs.
肌蓋立奎股夾i−,i丸しΔ毛便
本発明は上記問題点に鑑み提案されたもので、鉛及び水
溶性フラックスを含む含鉛廃水を沈殿槽に導き、活性炭
フィルターに前記沈殿槽の上澄液を通して廃液中に残留
した鉛粒子及び水溶性フラックスを活性炭に吸着させて
除去することにより含鉛廃水を処理することにより上記
問題点を改善したものである。The present invention has been proposed in view of the above-mentioned problems, and leads lead-containing wastewater containing lead and water-soluble flux to a settling tank, and passes the precipitate into an activated carbon filter. The above-mentioned problems have been improved by treating lead-containing wastewater by passing the supernatant liquid from the tank and removing the lead particles and water-soluble flux remaining in the wastewater by adsorption to activated carbon.
IL阻 以下に本発明の実施例を第1図から説明する。IL inhibition An embodiment of the present invention will be described below with reference to FIG.
図において第3図と同一符号は同一物を示し説明を省略
する。図において22は沈殿槽、23は中継槽、24は
活性炭フィルタ、25は精密フィルタ、2Bはキレート
樹脂フィルタ、27は半田メツキ装置から出る半[fl
カスや装置を洗浄した際に発生する汚水を貯える洗浄廃
液槽を示す。また+7d 、 17eはバルブを示す。In the figure, the same reference numerals as in FIG. 3 indicate the same parts, and the explanation will be omitted. In the figure, 22 is a settling tank, 23 is a relay tank, 24 is an activated carbon filter, 25 is a precision filter, 2B is a chelate resin filter, and 27 is a half [fl
This shows a cleaning waste tank that stores waste water generated when cleaning waste and equipment. Further, +7d and 17e indicate valves.
上水受入部15から取り入れられた上水は軟化A I
Ei 、バルブ17aを経て、第O〜第3汚水槽H〜1
4にそれぞれ供給される。6槽■〜14の上澄液は沈殿
槽22に供給され径大の鉛を沈殿させ固形物として回収
可能とする。第0汚染槽11の排水中の鉛濃度は0.3
ppm前後に、第1〜第3汚水槽12〜14の鉛濃度は
0.2ppm前後で、粒径5μm以下が約30%、1〜
5μmのものか約65%、1μm以下の微細粒子、イオ
ン状のものが約5%程度に調整される。沈殿槽22の上
澄液は中継槽23に供給されるが、この中継槽23には
洗浄廃液槽27が接続されており、その上澄も供給され
る。The clean water taken in from the clean water receiving part 15 is softened A I
Ei, through the valve 17a, the O to third sewage tanks H to 1
4 respectively. The supernatant liquids from tanks 6-14 are supplied to a precipitation tank 22, where large-diameter lead is precipitated and can be recovered as solid matter. The lead concentration in the wastewater of No. 0 pollution tank 11 is 0.3
ppm, the lead concentration in the first to third sewage tanks 12 to 14 is around 0.2 ppm, and about 30% are particles with a particle size of 5 μm or less, and 1 to 3.
About 65% of the particles are 5 μm in size, and about 5% are fine particles of 1 μm or less and ionic particles. The supernatant liquid of the settling tank 22 is supplied to a relay tank 23, and a washing waste liquid tank 27 is connected to this relay tank 23, and the supernatant liquid is also supplied thereto.
中継槽23までで粒径5μm程度より径大の鉛は除去さ
れ、活性炭フィルタ24に供給される。Up to the relay tank 23, lead having a particle size larger than about 5 μm is removed and supplied to the activated carbon filter 24.
水溶性フラックスはグルタミン酸、グルタミン酸塩のと
の有機物を主成分とし、他に尿素、すずなとを含むが、
活性炭フィルタ24はこれらa機成針を吸着し、同時に
1μm程度より径大の鉛、すす等の金属粒子を、濾過作
用により除去できる。Water-soluble flux is mainly composed of organic substances such as glutamic acid and glutamate salts, and also contains urea and tin.
The activated carbon filter 24 adsorbs these A-mechanical needles, and at the same time can remove metal particles such as lead and soot having a diameter larger than about 1 μm through a filtering action.
さらに精密フィルタ25で1μm程度の鉛粒子やゲル状
中間物が取り除かれ、キレート樹脂フィルタ26にて微
細粒子やイオン成分が除去される。Further, a precision filter 25 removes lead particles and gel-like intermediates of about 1 μm, and a chelate resin filter 26 removes fine particles and ionic components.
このようにして鉛や水溶性フラックス成分が沈殿吸着、
希釈を受はキレート樹脂フィルタ26から鉛濃度0.0
6ppm以下の排水が得られる。この排水はバレル17
d 、 17eの開閉操作により、放流又は第O〜第3
汚水槽It−14に環流されるが、所定時間環流させた
後、所定量放流させることを繰返すこにより鉛l農度を
0.04pp1以下に減少させることができる。In this way, lead and water-soluble flux components are precipitated and adsorbed.
When diluted, the lead concentration is 0.0 from the chelate resin filter 26.
Wastewater with a concentration of 6 ppm or less can be obtained. This drainage is barrel 17
d, by opening and closing operation of 17e, discharge or
Although it is recycled to the sewage tank It-14, by repeating the process of circulating for a predetermined time and then discharging a predetermined amount, the lead concentration can be reduced to 0.04 pp1 or less.
本発明によれば第1表のような効果が確認できた。According to the present invention, the effects shown in Table 1 were confirmed.
第1表
このように、本発明によれば鉛濃度を従来の2/3に低
減できるたけでなく、鉛排出絶対揖もクロース時間(環
流時間)を長くする程、低減でき8時間環 流の場合で
も従来の1/6に低減でき、24時間環流させれば1/
15に低減できる。Table 1 As shown, according to the present invention, not only can the lead concentration be reduced to two-thirds of the conventional level, but also the absolute lead emission can be reduced as the reflux time becomes longer. However, if the temperature is refluxed for 24 hours, the reduction can be reduced to 1/6 of the conventional level.
It can be reduced to 15.
尚、本発明は上記工程を1ユニツトとして多段接続すれ
ばより顕著な効果を得ることかができる。Incidentally, in the present invention, a more remarkable effect can be obtained if the above steps are connected in multiple stages as one unit.
主則IμN程
以上のように本発明によれば、鉛及び水溶性フラツクス
を含む介錯排水を沈殿槽に導き、この上澄液を活性炭フ
ィルタに通すことにより、排液中に残留した鉛粒子及び
水溶性フラックスを吸着させるようにしたから、排水す
べき廃液中の鉛含有Iが低減し、環流させることができ
る。As described above, according to the present invention, the intercalated wastewater containing lead and water-soluble flux is introduced into the settling tank, and the supernatant liquid is passed through the activated carbon filter, thereby removing the lead particles remaining in the wastewater. Since the water-soluble flux is adsorbed, lead-containing I in the waste liquid to be drained is reduced, and the waste liquid can be recycled.
そのため上水の使用量がすくなくてすみ、また鉛排出量
も小さくでき環境への影響を大巾に緩和できる。As a result, the amount of water used can be reduced, and lead emissions can also be reduced, greatly reducing the impact on the environment.
さらには産業廃棄物としての固形物も集約処理でき、処
理費も低減できる。Furthermore, solid materials as industrial waste can also be treated centrally, reducing processing costs.
第1図は本発明による方法を説明する図面、第2図は半
田メツキ処理を説明する工程図、第3図は従来の3鉛廃
水の処理方法の一例を示す図面である。
22・・・沈殿槽、24・・・活性炭フィルタ。
墨 ] 図
汀 2 図FIG. 1 is a diagram illustrating a method according to the present invention, FIG. 2 is a process diagram illustrating a solder plating process, and FIG. 3 is a diagram illustrating an example of a conventional method for treating lead 3 wastewater. 22... Sedimentation tank, 24... Activated carbon filter. Sumi] Illustration 2
Claims (1)
、活性炭フィルタに前記沈殿槽の上澄液を通して廃液中
に残留した鉛粒子及び水溶性フラッグを活性炭に吸着さ
せて除去するようにしたことを特徴とする含鉛廃水の処
理方法。Lead-containing wastewater containing lead and water-soluble flux is led to a sedimentation tank, and the supernatant liquid of the sedimentation tank is passed through an activated carbon filter to remove lead particles and water-soluble flags remaining in the wastewater by adsorption to the activated carbon. A method for treating lead-containing wastewater, characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33162687A JPH01171687A (en) | 1987-12-26 | 1987-12-26 | Treatment of lead-containing waste water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33162687A JPH01171687A (en) | 1987-12-26 | 1987-12-26 | Treatment of lead-containing waste water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01171687A true JPH01171687A (en) | 1989-07-06 |
Family
ID=18245760
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33162687A Pending JPH01171687A (en) | 1987-12-26 | 1987-12-26 | Treatment of lead-containing waste water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01171687A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105600900A (en) * | 2015-11-10 | 2016-05-25 | 山东建筑大学 | Device and method used for removing lead ions in industrial wastewater via gamma-polyglutamic acid adsorption |
JP6065997B1 (en) * | 2016-02-17 | 2017-01-25 | 学校法人同志社 | Smokeless flux for hot dip galvanizing and hot dip galvanizing method using the flux |
-
1987
- 1987-12-26 JP JP33162687A patent/JPH01171687A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105600900A (en) * | 2015-11-10 | 2016-05-25 | 山东建筑大学 | Device and method used for removing lead ions in industrial wastewater via gamma-polyglutamic acid adsorption |
JP6065997B1 (en) * | 2016-02-17 | 2017-01-25 | 学校法人同志社 | Smokeless flux for hot dip galvanizing and hot dip galvanizing method using the flux |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN104692579B (en) | A kind of method of metallurgical off-gas acid-making waste water resource utilization advanced treatment | |
JPH0226557B2 (en) | ||
KR100502755B1 (en) | Apparatus for treating waste water and method for treating waste water | |
JP2620839B2 (en) | Method of treating a chelating agent solution containing radioactive contaminants | |
JPH01171687A (en) | Treatment of lead-containing waste water | |
US5080806A (en) | Decontamination treatment of process water | |
JP4490565B2 (en) | Method for recovering treatment agent components in metal surface treated rinse water | |
JP2000246262A (en) | Method for reducing sludge generated when heavy metal is removed from waste liquid | |
CN104370392A (en) | Treatment method for smelting waste water containing sulfuric acid and heavy metal | |
FR2627481A1 (en) | PROCESS FOR THE PURIFICATION OF WASTEWATER FROM THE GLASS INDUSTRY | |
JP3715570B2 (en) | Removal of radium in water | |
JP3001748B2 (en) | Treatment of radioactive liquid waste | |
JP2002085942A (en) | Recovery process of liquid chemical component in water used for washing metal surface treatment | |
JP3784940B2 (en) | Method for removing arsenic in copper electrolyte | |
US5462671A (en) | Method of removing heavy metals from solutions of amino-carboxylic acids for disposal purposes | |
US5348722A (en) | Removal of detrimental metal ions from hydrofluoric acid solution for cleaning silicon surfaces | |
CN104233340A (en) | Pickling solution regeneration treatment method | |
SU1189498A1 (en) | Method of recovery of charcoal filter for purifying drinking water | |
JPS5836695A (en) | Treatment of waste liquid of chemical washing | |
US20020144522A1 (en) | Removal of solubilized solids from phenol-formaldehyde resin process streams | |
JP2010240615A (en) | Method for regenerating used denitration catalyst | |
JP2833944B2 (en) | Ultrapure water production method | |
JP2691016B2 (en) | How to regenerate iron liquid | |
DE4229662A1 (en) | Process for removing heavy metals, in particular mercury, from waste water from flue gas scrubbers | |
JPH06279005A (en) | Purification of liquid containing hydrofluoric acid |