JPH01145195A - Optical recording medium - Google Patents
Optical recording mediumInfo
- Publication number
- JPH01145195A JPH01145195A JP62303771A JP30377187A JPH01145195A JP H01145195 A JPH01145195 A JP H01145195A JP 62303771 A JP62303771 A JP 62303771A JP 30377187 A JP30377187 A JP 30377187A JP H01145195 A JPH01145195 A JP H01145195A
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituted
- formula
- atom
- hydrocarbon group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 17
- 229910052751 metal Chemical group 0.000 claims abstract description 9
- 239000002184 metal Chemical group 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract description 6
- 229910052717 sulfur Chemical group 0.000 claims abstract description 6
- 125000006615 aromatic heterocyclic group Chemical group 0.000 claims abstract description 5
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 4
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 3
- 125000004429 atom Chemical group 0.000 claims description 2
- -1 nitro, carboxyl Chemical group 0.000 abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 2
- 239000001257 hydrogen Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 239000011593 sulfur Chemical group 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 10
- 239000000975 dye Substances 0.000 description 9
- 239000010409 thin film Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 4
- 239000004431 polycarbonate resin Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000010355 oscillation Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N Acrylic acid Chemical compound OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- LKKPNUDVOYAOBB-UHFFFAOYSA-N naphthalocyanine Chemical compound N1C(N=C2C3=CC4=CC=CC=C4C=C3C(N=C3C4=CC5=CC=CC=C5C=C4C(=N4)N3)=N2)=C(C=C2C(C=CC=C2)=C2)C2=C1N=C1C2=CC3=CC=CC=C3C=C2C4=N1 LKKPNUDVOYAOBB-UHFFFAOYSA-N 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920005596 polymer binder Polymers 0.000 description 2
- 239000002491 polymer binding agent Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- VWVZFHRDLPHBEG-UHFFFAOYSA-N 1-(chloromethyl)-4-methylsulfanylbenzene Chemical group CSC1=CC=C(CCl)C=C1 VWVZFHRDLPHBEG-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910001152 Bi alloy Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 241000255925 Diptera Species 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910001215 Te alloy Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical class NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- MDPILPRLPQYEEN-UHFFFAOYSA-N aluminium arsenide Chemical compound [As]#[Al] MDPILPRLPQYEEN-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 description 1
- 239000001000 anthraquinone dye Substances 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 125000004987 dibenzofuryl group Chemical group C1(=CC=CC=2OC3=C(C21)C=CC=C3)* 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000002004 n-butylamino group Chemical group [H]N(*)C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920001290 polyvinyl ester Polymers 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical group [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
- G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
- G11B7/246—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes
- G11B7/248—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing dyes porphines; azaporphines, e.g. phthalocyanines
Landscapes
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
本発明は、半導体レーザーの集束ビームを用いて追記す
ることが可能な光学記録媒体に関するものであり、更に
詳しくは、コンピューター外部メモリー。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to an optical recording medium that can be additionally recorded using a focused beam of a semiconductor laser, and more particularly to a computer external memory.
画像、音声等の各種情報の記録に用いられる光記録媒体
に関する。The present invention relates to optical recording media used to record various types of information such as images and audio.
(従来技術および問題点) 上記した追記可能な光記録媒体としては、テルル。(Prior art and problems) The above-mentioned recordable optical recording medium is tellurium.
−テルル合金、ビスマス合金等の低融点金属薄膜の無機
系記録層を有する記録媒体が実用化されはじめている。-Recording media having an inorganic recording layer made of a thin film of a low-melting metal such as a tellurium alloy or a bismuth alloy are beginning to be put into practical use.
しかしながら、これらの記録媒体は、真空蒸着、スパッ
タリング等の真空中での薄膜形式によるため生産性が低
く、さらに記録層の熱伝導率が大きいため記録密度の点
で限界があり、またテルル等の有毒物質を使用するので
衛生性の点で問題がある。However, these recording media have low productivity because they use thin film formats in vacuum, such as vacuum evaporation and sputtering.Furthermore, the recording layer has a high thermal conductivity, which limits the recording density. Since toxic substances are used, hygiene is a problem.
このような問題点を解決するために、近年、有機系色素
を記録媒体として使用する方法が検討されており1例え
ば、ポリメチン色素(特開昭58−112790号)、
ナフトキノン色素(特開昭58−112793号)、フ
タロシアニン色素(米国特許4298975号)、ナフ
タロシアニン色素(米国特許4492750号)等の半
導体レーザー発振波長領域に吸収を有する有機色素を記
録層とした記録媒体が提案されている。しかしながら、
これまでに提案されている有機色素を用いた記録媒体で
は、耐久性2反射率の面で、十分な特性が得られなかっ
たり。In order to solve these problems, in recent years, methods of using organic dyes as recording media have been studied.
A recording medium with a recording layer made of an organic dye that absorbs in the semiconductor laser oscillation wavelength region, such as a naphthoquinone dye (Japanese Patent Application Laid-open No. 112793/1983), a phthalocyanine dye (US Pat. No. 4,298,975), or a naphthalocyanine dye (US Pat. No. 4,492,750). is proposed. however,
Recording media using organic dyes that have been proposed so far have not been able to provide sufficient characteristics in terms of durability and reflectance.
溶剤への溶解性が悪く、経済的に有利な塗布方式による
薄膜形成法が適用できないという欠点を有していた。It has a disadvantage that it has poor solubility in solvents and cannot be applied to thin film forming methods using economically advantageous coating methods.
(問題点を解決するための手段)
本発明者らは、有機色素を用いた記録媒体の問題点を改
善すべく、鋭意検討した結果、実用上優れた特性を持ち
、さらに経済的にも有利な光学記録媒体を発明するに至
った。(Means for Solving the Problems) The present inventors have made intensive studies to improve the problems of recording media using organic dyes, and have found that the recording medium has excellent practical characteristics and is also economically advantageous. This led to the invention of a new optical recording medium.
すなわち1本発明は、透明基板上に、下記一般式(I)
で示される化合物を含有する記録層を有する光学記録媒
体である。That is, 1 the present invention provides the following general formula (I) on a transparent substrate.
This is an optical recording medium having a recording layer containing a compound represented by:
式中、X、ないしX4はそれぞれ独立に炭素原子あるい
は硫黄原子を表す、また、R+ないしRユ2はそれぞれ
独立に、水素原子、ハロゲン原子、シアノ基、ニトロ基
、カルボン酸基、スルホン酸基、置換もしくは未置換の
脂肪族炭化水素基、置換もしくは−C○!I(4!、
−N −へ −尺 4コ。In the formula, X to X4 each independently represent a carbon atom or a sulfur atom, and R+ to R2 each independently represent a hydrogen atom, a halogen atom, a cyano group, a nitro group, a carboxylic acid group, a sulfonic acid group , substituted or unsubstituted aliphatic hydrocarbon group, substituted or -C○! I(4!,
-N -To -Shaku 4 pieces.
R44(Y CHzCHz) I Z−を表す。R44(YCHzCHz) represents IZ-.
(ここでRff3ないしR44は水素原子、置換もしく
は未置換の脂肪族炭化水素基、置換もしくは未置換の芳
香族炭化水素基または置換もしくは未置換の芳香族複素
環基を表す。また、YおよびZはそれぞれ独立に酸素原
子あるいは硫黄原子を表し、lは正の整数を表すものと
する。)
Mはハロゲン原子、酸素原子、*ORas)mあるいは
+OS i R46R4?R411) nを有してもよ
い金属原子、または水素原子を表す。(ここで、 R4
S、 Rab+ R4?l R411はR,ないしR3
2と同様であり1m。(Here, Rff3 to R44 represent a hydrogen atom, a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a substituted or unsubstituted aromatic heterocyclic group. each independently represents an oxygen atom or a sulfur atom, and l represents a positive integer.) M is a halogen atom, an oxygen atom, *ORas) m or +OS i R46R4? R411) Represents a metal atom that may have n or a hydrogen atom. (Here, R4
S, Rab+ R4? l R411 is R, or R3
Same as 2 and 1m.
nはいずれも0.1または2を表す。)さらに置換基に
ついて説明すると、RoないしR24は水素原子または
塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、シ
アノ基、ニトロ基、カルボン酸基、スルホン酸基または
メチル基、エチル基。All n represents 0.1 or 2. ) To further explain the substituents, Ro to R24 are a hydrogen atom, a halogen atom such as a chlorine atom, a bromine atom, or an iodine atom, a cyano group, a nitro group, a carboxylic acid group, a sulfonic acid group, a methyl group, or an ethyl group.
t−ブチル基、n−ステアリル基、トリクロルメチル基
、アミノメチル基、ヒドロキシメチル基等の置換もしく
は未置換の脂肪族炭化水素基、フェニル基。Substituted or unsubstituted aliphatic hydrocarbon groups such as t-butyl group, n-stearyl group, trichloromethyl group, aminomethyl group, hydroxymethyl group, phenyl group.
ナフチル基、アントリル基、2−メチルフェニル基。Naphthyl group, anthryl group, 2-methylphenyl group.
4−クロルメチル基、4−ジメチルアミノナフチル基等
の置換もしくは未置換の芳香族炭化水素基またはピリジ
ル基、カルバゾリル基、ジベンゾフリル基。Substituted or unsubstituted aromatic hydrocarbon groups such as 4-chloromethyl group and 4-dimethylaminonaphthyl group, or pyridyl group, carbazolyl group, and dibenzofuryl group.
ベンゾチアゾリル基、4−メチルピリジル基等の置換も
しくは未置換の芳香族複素環基、メトキシ基。Substituted or unsubstituted aromatic heterocyclic groups such as benzothiazolyl group and 4-methylpyridyl group, and methoxy group.
エトキシ基、ステアリルオキシ基、フェノキシ基。Ethoxy group, stearyloxy group, phenoxy group.
ヘキシルチオ基、t−ブチルチオ基、フェニルチオ基、
アミノ基、n−ブチルアミノ基、ジエチルアミノ基、ジ
フェニルアミノ基、ジベンジルアミノ基。hexylthio group, t-butylthio group, phenylthio group,
Amino group, n-butylamino group, diethylamino group, diphenylamino group, dibenzylamino group.
5OzNH’C4H9,−3OzN (CHz)z。5OzNH'C4H9, -3OzN (CHz)z.
Fe、Co、Ni、Zn、Mn、Pb、Si、Mg。Fe, Co, Ni, Zn, Mn, Pb, Si, Mg.
All−C1l、In−C12,Ti=O,V−0,S
i(OCgHs)g 、All O″CsH++、S
t+os 1(CHs)s)z等を表すが、これらに
限定されるものではない。All-C1l, In-C12, Ti=O, V-0, S
i(OCgHs)g, All O″CsH++, S
t+os 1(CHs)s)z, etc., but is not limited to these.
前記一般式(I)で表される化合物は可視ないし近赤外
領域に大きな吸収を有し、レーザーによる記録再生に好
適である。The compound represented by the general formula (I) has large absorption in the visible to near infrared region, and is suitable for recording and reproducing by laser.
本発明で使用する前記一般式CI)で表される化合物は
、一般には下記のような一般式(II)で表される化合
物の少なくとも一種以上を尿素および各種金属塩ととも
に好ましくは有機溶媒中で加熱することにより製造する
ことができる。The compound represented by the general formula (CI) used in the present invention generally comprises at least one compound represented by the following general formula (II) together with urea and various metal salts, preferably in an organic solvent. It can be manufactured by heating.
式中、Xは炭素原子あるいは硫黄原子を表し、A1ない
しA、はそれぞれ一般式(I)におけるR1ないしRo
llと同様である。In the formula, X represents a carbon atom or a sulfur atom, and A1 to A represent R1 to Ro in general formula (I), respectively.
It is the same as ll.
これらの化合物の製造にはアルコール類、グリコール類
その池水酸基を有する脂肪族有機溶媒を広く使用するこ
とができる。In the production of these compounds, alcohols, glycols, and aliphatic organic solvents having hydroxyl groups can be widely used.
また、原料となる金属塩は種々の金属塩を使用すること
ができる。Furthermore, various metal salts can be used as the raw material metal salt.
以下に本発明で使用する一般式CI)で表されるチオア
ントラシアニン系化合物の代表例を挙げるが。Representative examples of the thioanthracyanine compounds represented by the general formula CI) used in the present invention are listed below.
本発明は以下の代表例に限定されるものではない。The present invention is not limited to the following representative examples.
S か 度 も + ユ 、ぐ ◆ ? 工 θ リ 。S mosquito Every time too + Yu ,ingredient ◆ ? Engineering θ Li.
a
〆N
ど\
七
工
ご
f?
本発明において用いられる透明基板としては、信号の書
き込みや読み出しを行なうための光の透過率が、好まし
くは85%以上であり、かつ光学異方性の小さいものが
望ましい。例えば、ガラス、またはアルクル樹脂、ポリ
カーボネート樹脂、ポリエステル樹脂、ポリアミド樹脂
、塩化ビニル樹脂、ポリビニルエステル樹脂、ポリスチ
レン系樹脂、ポリオレフィン樹脂(ポリ−4−メチルペ
ンテン等)、ポリエーテルスルホン樹脂などの熱可塑性
樹脂やエポキシ樹脂、アリル樹脂などの熱硬化樹脂を用
いた基板が挙げられる。これらの中で、成形のしやすさ
、案内溝やアドレス信号等の付与のしやすさなどから前
記した熱可塑性樹脂が好ましく、更に光学特性や機械的
特性からアクリル樹脂やポリカーボネート樹脂が特に望
ましい。a 〆N d\ Shichigo f? The transparent substrate used in the present invention preferably has a transmittance of light for writing and reading signals of preferably 85% or more and has small optical anisotropy. For example, glass or thermoplastic resins such as alkyl resins, polycarbonate resins, polyester resins, polyamide resins, vinyl chloride resins, polyvinyl ester resins, polystyrene resins, polyolefin resins (poly-4-methylpentene, etc.), and polyethersulfone resins. Examples include substrates using thermosetting resins such as epoxy resins, allyl resins, etc. Among these, the above-mentioned thermoplastic resins are preferred from the viewpoint of ease of molding and ease of providing guide grooves, address signals, etc., and acrylic resins and polycarbonate resins are particularly preferred from the viewpoint of optical properties and mechanical properties.
本発明においては、これらの透明な基板の厚さは。In the present invention, the thickness of these transparent substrates is .
特に制限がなく、板状でもフィルム状でも良い。また、
その形状は9円形やカード状でもよく、その大きさには
特に制限はない。There is no particular restriction, and it may be in the form of a plate or a film. Also,
Its shape may be nine circles or card-like, and its size is not particularly limited.
また本発明の透明基板には、記録および読み出しの際の
位置制御のための案内溝やアドレス信号や各種マーク等
のプリフォーマット用の凹凸を通常有しているが、これ
らの凹凸は前記したような熱可塑性樹脂を成形(射出、
圧縮等)する際にスタンパ−などを用いて付与するのが
、好ましい。Further, the transparent substrate of the present invention usually has unevenness for preformatting, such as guide grooves for position control during recording and reading, address signals, and various marks, as described above. Molding (injection,
It is preferable to apply it using a stamper or the like during compression (compression, etc.).
本発明の光学記録媒体において1本発明の化合物を含有
する記録層を透明な基板上に定着するには。1. Fixing the recording layer containing the compound of the present invention on a transparent substrate in the optical recording medium of the present invention.
例えば真空蒸着法、スパッタリング法、イオンプレート
法およびLB法などの方法で薄膜化できるが。For example, the film can be made into a thin film by a vacuum evaporation method, a sputtering method, an ion plate method, an LB method, or the like.
これらの方法は操作が繁雑であり、かつ生産性の点で劣
るので、いわゆる塗布による方法が最も好ましい。塗布
法によって記録層を形成する場合には、フタロシアニン
誘導体をアルコール類、ケトン類、アミド類、スルホキ
シド類、エーテル類、エステル類。Since these methods require complicated operations and are inferior in productivity, so-called coating methods are most preferred. When forming a recording layer by a coating method, the phthalocyanine derivatives are alcohols, ketones, amides, sulfoxides, ethers, and esters.
脂肪族ハロゲン化炭化水素類、芳香族炭化水素類等の一
般の有機溶媒に分散または溶解して塗布する。It is applied by dispersing or dissolving it in a general organic solvent such as aliphatic halogenated hydrocarbons or aromatic hydrocarbons.
また、この時、場合によっては、高分子バインダーを加
えても良い。高分子バインダーとしては、塩化ビニル樹
脂、アクリル酸樹脂、ポリエステル樹脂。Further, at this time, a polymer binder may be added depending on the case. Polymer binders include vinyl chloride resin, acrylic acid resin, and polyester resin.
ポリエチレン樹月旨、ポリアミド樹月旨、ポリカーボネ
ート樹脂、エポキシ樹脂、メタクリル酸樹脂、酢酸ビニ
ル樹脂、ニトロセルロース、ポリプロピレン樹脂、ポリ
エチレンテレフタレート樹脂、フェノール樹脂およびこ
れらの共重合体などがあげられる。その際本発明の化合
物に対する樹脂の比率は10wt%以下が好ましい。Examples include polyethylene resin, polyamide resin, polycarbonate resin, epoxy resin, methacrylic acid resin, vinyl acetate resin, nitrocellulose, polypropylene resin, polyethylene terephthalate resin, phenol resin, and copolymers thereof. In this case, the ratio of the resin to the compound of the present invention is preferably 10 wt% or less.
透明基板上に形成する本発明の化合物を含有する記録層
は、10μm以下で、好ましくは500人〜2μmであ
る。また塗布した後、クロロホルム、テトラヒドロフラ
ン、トルエン等の有機溶媒の蒸気にさらすことによって
、薄膜の吸収波長が長波長にシフトし、半導体レーザー
の発振波長域の光に対する感度を著しく向上させること
ができる場合もある。The recording layer containing the compound of the present invention formed on a transparent substrate has a thickness of 10 μm or less, preferably 500 μm to 2 μm. In addition, by exposing the thin film to the vapor of an organic solvent such as chloroform, tetrahydrofuran, or toluene after coating, the absorption wavelength of the thin film shifts to longer wavelengths, and the sensitivity to light in the oscillation wavelength range of semiconductor lasers can be significantly improved. There is also.
また、これらの記録層を保護するために、ANzO,、
St○21 S 10.S n O等の無機化合物を蒸
着して保護層を設けても良い。また、保護層として。In addition, in order to protect these recording layers, ANzO,...
St○21 S 10. A protective layer may be provided by vapor depositing an inorganic compound such as SnO. Also as a protective layer.
高分子を塗布しても良い。A polymer may also be applied.
上記の様にして得られた記録媒体への記録は、基板上に
設けた記録層に1μm程度に集束したレーザー光、好ま
しくは半導体レーザー光を照射することにより行なう。Recording on the recording medium obtained as described above is carried out by irradiating the recording layer provided on the substrate with laser light, preferably semiconductor laser light, focused to about 1 μm.
レーザー光の照射された部分は、レーザーエネルギーの
吸収による分解、蒸発、溶融等の記S!層の熱的な状態
変化が生じた部分と、生じていない部分の反射率の差を
読み取ることにより行なう。The area irradiated with the laser light will decompose, evaporate, melt, etc. due to absorption of laser energy. This is done by reading the difference in reflectance between a portion of the layer where a thermal state change has occurred and a portion where no change has occurred.
また9本発明の化合物に、他の色素を混合分散あるいは
混合溶解して使用することもできる。Further, it is also possible to use the compound of the present invention by mixing and dispersing or mixing and dissolving other dyes.
混合して使用できる色素としてはすでに公知の例えば、
芳香族または不飽和脂肪族ジアミン系金属錯体、芳香族
または不飽和脂肪族ジチオール系金属錯体、フタロシア
ニン系錯体、ナフタロシアニン系錯体、スクアリウム系
色素、ナフトキノン系錯体、アントラキノン系色素やポ
リメチン系色素が挙げられる。Examples of known pigments that can be used in combination include:
Examples include aromatic or unsaturated aliphatic diamine metal complexes, aromatic or unsaturated aliphatic dithiol metal complexes, phthalocyanine complexes, naphthalocyanine complexes, squalium dyes, naphthoquinone complexes, anthraquinone dyes and polymethine dyes. It will be done.
光源としては、He−Neレーザー、Arレーザー、半
導体レーザー等の各種レーザーを用いること□ができる
が1価格、大きさの点で半導体レーザーが特に好ましい
。半導体レーザーとしては、中心波長830nm、
780nmおよびそれより短波長のレーザーを使用する
ことができる。As the light source, various lasers such as a He--Ne laser, an Ar laser, and a semiconductor laser can be used, but semiconductor lasers are particularly preferred in terms of cost and size. As a semiconductor laser, the center wavelength is 830 nm,
Lasers of 780 nm and shorter wavelengths can be used.
次に9本発明を実施例により、更に具体的に説明するが
5本発明は、以下の実施例に限定されるものではない。Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to the following Examples.
例中部は重量部である。In the example, the middle part is the part by weight.
実施例1
アクリル樹脂基板上に本発明の化合物(7)3部とメチ
ルセロソルブ100部からなる溶液を滴下した後、この
基板を80Orpmの速度で20秒間回転させた。Example 1 A solution consisting of 3 parts of the compound (7) of the present invention and 100 parts of methyl cellosolve was dropped onto an acrylic resin substrate, and then the substrate was rotated at a speed of 80 Orpm for 20 seconds.
次に、この基板を90℃で1時間乾燥して記録媒体を得
た。この記録層の膜厚は900人であった。Next, this substrate was dried at 90° C. for 1 hour to obtain a recording medium. The thickness of this recording layer was 900.
この光記録媒体をターンテーブル上に取り付け。Mount this optical recording medium on the turntable.
ターンテーブルを80Orpmで回転させながら、1゜
0μmに集束したガリウムーアルミニウムーヒ素半導体
レーザー(830部m)を5mW、8MHzで記録層に
トラック状に照して記録を行った。While rotating the turntable at 80 rpm, recording was performed by shining a gallium-aluminum-arsenide semiconductor laser (830 parts m) focused at 1°0 μm onto the recording layer in a track shape at 5 mW and 8 MHz.
この記録を行なった光記録媒体表面を走査型電子顕微鏡
観察を行なったところ、鮮明なピットが認められた。ま
た、この光記録媒体に低出力ガリウムーアルミニウムー
ヒ素半導体ルーザー光を照射し1反射光の検地を行った
ところ、実用に十分なS/N比を有する波形を示した。When the surface of the optical recording medium on which this recording was performed was observed under a scanning electron microscope, clear pits were observed. Furthermore, when this optical recording medium was irradiated with a low-power gallium-aluminum-arsenic semiconductor loser light and one reflected light was detected, it showed a waveform with a practically sufficient S/N ratio.
実施例2
ニトロセルロース樹脂2部をメチルエチルケトン10部
に溶解し2本発明の化合物(3)4部およびジクロルエ
タン96部を上記の樹脂溶液と混合溶解した。Example 2 Two parts of nitrocellulose resin were dissolved in 10 parts of methyl ethyl ketone, and 4 parts of the compound (3) of the present invention and 96 parts of dichloroethane were mixed and dissolved with the above resin solution.
この溶液をパイレ・ノクス基板上に滴下した後、この基
板を80Orpmで回転させた。次にこの基板を90℃
で2時間乾燥して記録媒体を得た。After dropping this solution onto a Pyre Nox substrate, the substrate was rotated at 80 rpm. Next, heat this board to 90°C.
The mixture was dried for 2 hours to obtain a recording medium.
この記録層の膜厚は800人であった。The thickness of this recording layer was 800.
また、この記録媒体を実施例1と同様に記録を行ったと
ころ、記録層表面に鮮明なピットが認められ。Further, when recording was performed on this recording medium in the same manner as in Example 1, clear pits were observed on the surface of the recording layer.
更に実施例1と同様な入射レーザー光線に対する反射光
の検地を行ったところ実用に十分なS/N比を有する波
形を示した。Furthermore, when the reflected light with respect to the incident laser beam was detected in the same manner as in Example 1, a waveform having a practically sufficient S/N ratio was shown.
実施例3
エチルセロソルブ100重量部に本発明の化合物(8)
3.5重量部を溶解し、この溶液をポリカーボネート樹
脂基板上に800rpmスピナーコーティング法で塗布
した後、減圧下80〜90°で1時間乾燥して約800
人の記録層を得た。Example 3 Compound (8) of the present invention was added to 100 parts by weight of ethyl cellosolve.
After dissolving 3.5 parts by weight and applying this solution onto a polycarbonate resin substrate using an 800 rpm spinner coating method, it was dried at 80 to 90° under reduced pressure for 1 hour to give a
Obtained a human record layer.
このようにして作製した光記録媒体を実施例1と同様に
記録を行ったところ、この記録層は電子顕微鏡により鮮
明なピットが観察された。また実施例1と同様な入射レ
ーザーの反射光の検地を行ったところ実用に十分なS/
N比を有する波形を示した。When recording was performed on the optical recording medium thus produced in the same manner as in Example 1, clear pits were observed in this recording layer using an electron microscope. In addition, when the reflected light of the incident laser was detected in the same manner as in Example 1, the S/S was sufficient for practical use.
A waveform with an N ratio was shown.
実施例4
真空度10−’Torrにおいて厚さ1m+mのアクリ
ル基板上に基板温度を室温にし2本発明の化合物(2)
の蒸着を行い、膜厚約700人の記録層を得た。Example 4 Compound (2) of the present invention was placed on an acrylic substrate with a thickness of 1 m + m at a vacuum degree of 10-' Torr with the substrate temperature at room temperature.
was deposited to obtain a recording layer with a thickness of approximately 700 nm.
このようにして作製した光記録媒体を実施例1と同様に
記録を行ったところ、鮮明なピットが電子顕微鏡により
観察された。また、実施例1と同様な入射レーザー光線
の反射光の検地を行ったところ実用に十分なS/N比を
有する波形を示した。When recording was performed on the optical recording medium thus produced in the same manner as in Example 1, clear pits were observed using an electron microscope. Further, when the reflected light of the incident laser beam was detected in the same manner as in Example 1, a waveform having a practically sufficient S/N ratio was shown.
本発明は以上のような構成によりなり、化学的。 The present invention has the above-mentioned structure, and is based on a chemical structure.
物理的に安定で、半導体レーザー発振領域において高感
度な記録媒体を作製し得る特徴を有する。It has the characteristics of being physically stable and capable of producing a highly sensitive recording medium in the semiconductor laser oscillation region.
Claims (1)
態変化を生じさせ記録を行う情報記録媒体において、透
明基板上に下記一般式〔 I 〕で示されるチオアントラ
シアニン系化合物の少なくとも一種以上を含有する記録
層を有することを特徴とする光学記録媒体。一般式[
I ] ▲数式、化学式、表等があります▼ 式中、X_1ないしX_4はそれぞれ独立に炭素原子あ
るいは硫黄原子を表す。また、R_1ないしR_3_2
はそれぞれ独立に、水素原子、ハロゲン原子、シアノ基
、ニトロ基、カルボン酸基、スルホン酸基、置換もしく
は未置換の脂肪族炭化水素基、置換もしくは未置換の芳
香族炭化水素基、置換もしくは未置換の芳香族複素環基
、−OR_3_3、−SR_3_4、▲数式、化学式、
表等があります▼、式%式、▲数式、化学式、表等があ
ります▼、−NHCOR_4_1、−CO_2R_4_
2、−N=N−R_4_3R_4_4(YCH_2CH
_2)_lZ−を表す。 (ここでR_3_3ないしR_4_4は水素原子、置換
もしくは未置換の脂肪族炭化水素基、置換もしくは未置
換の芳香族炭化水素基または置換もしくは未置換の芳香
族複素環基を表す。また、YおよびZはそれぞれ独立に
酸素原子あるいは硫黄原子を表し、lは正の整数を表す
ものとする。) Mはハロゲン原子、酸素原子、■OR_4_5)_mあ
るいは■OSiR_4_6R_4_7R_4_8)_n
を有してもよい金属原子、または水素原子を表す。(こ
こで、R_4_5、R_4_6、R_4_7、R_4_
8はR_1ないしR_3_2と同様であり、m、nはい
ずれも0、1または2を表す。)[Claims] An information recording medium that performs recording by causing a state change by irradiation with high-density energy such as a laser beam, in which at least one thioanthracyanine compound represented by the following general formula [I] is provided on a transparent substrate. An optical recording medium characterized by having a recording layer containing. General formula [
I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, X_1 to X_4 each independently represent a carbon atom or a sulfur atom. Also, R_1 to R_3_2
each independently represents a hydrogen atom, a halogen atom, a cyano group, a nitro group, a carboxylic acid group, a sulfonic acid group, a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a substituted or unsubstituted aromatic hydrocarbon group. Substituted aromatic heterocyclic group, -OR_3_3, -SR_3_4, ▲mathematical formula, chemical formula,
There are tables, etc.▼, formula% formula, ▲mathematical formula, chemical formula, table, etc.▼, -NHCOR_4_1, -CO_2R_4_
2, -N=N-R_4_3R_4_4(YCH_2CH
_2) Represents _lZ-. (Here, R_3_3 to R_4_4 represent a hydrogen atom, a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a substituted or unsubstituted aromatic heterocyclic group. each independently represents an oxygen atom or a sulfur atom, and l represents a positive integer.) M is a halogen atom, an oxygen atom, ■OR_4_5)_m or ■OSiR_4_6R_4_7R_4_8)_n
Represents a metal atom that may have , or a hydrogen atom. (Here, R_4_5, R_4_6, R_4_7, R_4_
8 is the same as R_1 to R_3_2, and m and n each represent 0, 1 or 2. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62303771A JPH01145195A (en) | 1987-12-01 | 1987-12-01 | Optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62303771A JPH01145195A (en) | 1987-12-01 | 1987-12-01 | Optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01145195A true JPH01145195A (en) | 1989-06-07 |
Family
ID=17925088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62303771A Pending JPH01145195A (en) | 1987-12-01 | 1987-12-01 | Optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01145195A (en) |
-
1987
- 1987-12-01 JP JP62303771A patent/JPH01145195A/en active Pending
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