JPH01135174U

JPH01135174U -

Info

Publication number: JPH01135174U
Application number: JP2845488U
Authority: JP
Priority date: 1988-03-03
Filing date: 1988-03-03
Publication date: 1989-09-14
Anticipated expiration: 2003-03-03
Also published as: JPH0522386Y2

Description

[Brief explanation of the drawing]

第１ａ図は、本考案の一実施例の縦断面図、第
１ｂ図は、そのＩＢ―ＩＢ線断面図である。第２
ａ図は、従来の軸流方式のプラズマトーチの縦断
面図、第２ｂ図は第２ａ図のＢ―Ｂ線断面図
、第２ｃ図は第２ｄ図のＣ―Ｃ線拡大断面図
である。第３ａ図は、従来の旋回流方式のプラズ
マトーチの縦断面図、第３ｂ図はそのＢ―Ｂ
線断面図である。１：センタリングストーン（電極位置決め部材
）、２：電極棒（電極棒）、３：トーチ基体（基
体）、４：チツプ（チツプ）、５：内空間、６_１，６_５：穴、６_１１，６_５１：溝（第１ガス流路
）、６_１２，６_５２：穴（第２ガス流路）、７：
内空間（気体通流空間）、８：開口、９_１１，９
_５１：直進流、９_１２，９_５２：旋回流、１０：
内空間、１１：リング状の空間、１２：インサー
トキヤツプ、１３_１，１３_９：冷却水通流用の穴
。 FIG. 1a is a longitudinal cross-sectional view of one embodiment of the present invention, and FIG. 1b is a cross-sectional view taken along line IB--IB. Second
Fig. 2a is a vertical sectional view of a conventional axial flow type plasma torch, Fig. 2b is a sectional view taken along the line BB in Fig. 2a, and Fig. 2c is an enlarged sectional view taken along the line CC in Fig. 2d. Figure 3a is a vertical cross-sectional view of a conventional swirling flow type plasma torch, and Figure 3b is its B--B
FIG. 1: Centering stone (electrode positioning member), 2: Electrode rod (electrode rod), 3: Torch base (base body), 4: Chip (chip), 5: Inner space, 6 ₁ , 6 ₅ : Hole, 6 ₁₁ , 6 ₅₁ : Groove (first gas flow path), 6 ₁₂ , 6 ₅₂ : Hole (second gas flow path), 7:
Inner space (gas flow space), 8: Opening, 9 ₁₁ , 9
₅₁ : straight flow, 9 ₁₂ , 9 ₅₂ : swirl flow, 10:
Inner space, 11: Ring-shaped space, 12: Insert cap, 13 ₁ , 13 ₉ : Holes for cooling water flow.

Claims

[Claims for Utility Model Registration] A hollow conductor base; A conductor chip fixed to the lower end of the base and having an opening that communicates with the inner space of the base; Above the chip with a gas flow space therebetween; an electrode positioning member made of an insulator and fixed to the base; an electrode rod positioned over the center of the opening of the chip with the electrode positioning member; a continuous line from the gas flow space to the opening of the chip; for bringing a plasma gas flow straight from above to below into at least a part of the space;
a first gas flow path open to the continuous space; and a first gas flow path open to the continuous space for providing a plasma gas flow that swirls around the central axis of the electrode rod to at least a part of the continuous space; a plasma torch comprising: a second gas flow path;