JPH01119939A - Magneto-optical recording medium and its production - Google Patents
Magneto-optical recording medium and its productionInfo
- Publication number
- JPH01119939A JPH01119939A JP62277340A JP27734087A JPH01119939A JP H01119939 A JPH01119939 A JP H01119939A JP 62277340 A JP62277340 A JP 62277340A JP 27734087 A JP27734087 A JP 27734087A JP H01119939 A JPH01119939 A JP H01119939A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- recording layer
- nitrogen
- magneto
- recording medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 24
- 238000004544 sputter deposition Methods 0.000 claims abstract description 10
- 229910052723 transition metal Inorganic materials 0.000 claims abstract description 7
- 229910000808 amorphous metal alloy Inorganic materials 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 73
- 230000007797 corrosion Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 9
- 230000003647 oxidation Effects 0.000 abstract description 8
- 238000007254 oxidation reaction Methods 0.000 abstract description 8
- 239000011241 protective layer Substances 0.000 abstract description 8
- 230000006866 deterioration Effects 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 10
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 230000005415 magnetization Effects 0.000 description 5
- 230000002265 prevention Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 101150019878 F13a1 gene Proteins 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002829 nitrogen Chemical class 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/0053—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor combined with a final operation, e.g. shaping
- B29C45/006—Joining parts moulded in separate cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2015/00—Gear wheels or similar articles with grooves or projections, e.g. control knobs
- B29L2015/003—Gears
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野］
本発明は、記録層への光ビーム照射によって記録媒体を
磁化し、情報信号の記録、再生するようにした光磁気記
録媒体に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a magneto-optical recording medium in which information signals are recorded and reproduced by magnetizing the recording medium by irradiating a recording layer with a light beam.
従来、たとえば特開昭５８−７３７４６号公報に開示さ
れるように、情報信号によって変調された光ビームを記
録媒体に照射することにより、この記録媒体を磁化して
情報信号を記録するようにした光磁気記録媒体が知られ
ている。この記録層にはＴｂ、 Ｇｙなどの希土類と遷
移金属系とのアモルファス合金が用いられ、これに光ビ
ームを照射すると、この記録層はこの光ビームの強度に
応じた強度で垂直磁化される。このことからこの記録層
に情報信号をできるが、この情報信号を再生する場合に
は、この記録層に一定強度の光ビームを照射し、この記
録層の磁化によるカー効果を利用する。Conventionally, as disclosed in, for example, Japanese Patent Laid-Open No. 58-73746, information signals have been recorded by magnetizing the recording medium by irradiating the recording medium with a light beam modulated by an information signal. Magneto-optical recording media are known. This recording layer is made of an amorphous alloy of rare earth elements such as Tb and Gy and transition metals, and when a light beam is irradiated onto this, the recording layer is perpendicularly magnetized with an intensity corresponding to the intensity of the light beam. Because of this, an information signal can be generated in this recording layer, and in order to reproduce this information signal, this recording layer is irradiated with a light beam of a constant intensity, and the Kerr effect due to the magnetization of this recording layer is utilized.
なお、この記録層は透明な基板上に設けられており、光
ビームの照射は、情報信号の記録、再生とも、基板側か
ら行なわれる。Note that this recording layer is provided on a transparent substrate, and the light beam irradiation is performed from the substrate side for both recording and reproducing information signals.
ところで、かかる光磁気記録媒体の記録層は、酸素に触
れると酸化されやすく、また、湿気によって腐蝕されや
すく、記録層の磁気特性が劣化する、このために、記録
層の表面にＳｉｇｈ、ＺｒＯ□などの酸化物やＳｔ、Ｎ
、、ＴｉＮなどの窒化物などからなる保護膜が設けられ
るのが一般的で、これによって、酸化、腐蝕を防ぐよう
にしてい曇。By the way, the recording layer of such a magneto-optical recording medium is easily oxidized when it comes into contact with oxygen, and easily corroded by moisture, which deteriorates the magnetic properties of the recording layer. oxides such as St, N
A protective film made of nitride such as TiN is generally provided to prevent oxidation and corrosion.
しかしながら、このように保護膜を設けても、スパッタ
リング法などによって基板上に記録層を形成する際、こ
の記録層にピンホールや柱状構造の間隙が生じ、これら
により、記録層上に同じ方法で保護膜を形成するときに
、この保護膜にピンホールや柱状構造の間隙が生ずる。However, even if a protective film is provided in this way, when a recording layer is formed on a substrate using a sputtering method or the like, pinholes or gaps in the columnar structure will occur in the recording layer, and these will prevent the formation of a recording layer on the recording layer using the same method. When the protective film is formed, pinholes and gaps in the columnar structure are generated in the protective film.
また、この原因によらずとも、保護膜にその形成過程で
ピンホールや柱状構造の間隙が生ずる。In addition, even if this is not the cause, pinholes and gaps in the columnar structure are generated in the protective film during the formation process.
このように保護層にピンホールや柱状構造の間隙がある
と、これから空気や湿気が侵入し、記録層が酸化され、
また、腐蝕されてしまい、記録層の磁気特性が劣化する
という問題があった。If there are pinholes or gaps in the columnar structure in the protective layer, air and moisture will enter and the recording layer will be oxidized.
Further, there was a problem that the magnetic properties of the recording layer deteriorated due to corrosion.
本発明の目的は、かかる問題点を解消し、記録層の酸化
防止や耐蝕性を向上させることができるようにした光磁
気記録媒体とその製造方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a magneto-optical recording medium and a method for manufacturing the same, which can solve these problems and improve the oxidation prevention and corrosion resistance of the recording layer.
上記目的を達成するために、本発明は、記録層の表面に
窒素を含む層を設けるようにしたものである。また、本
発明は、透明な基板上に蒸着法、スパッタリング法など
により、希土類−遷移金属系のアモルファス合金からな
る記録層を形成し、窒素ガスを含む雰囲気中で、逆スパ
ッタリング法により、該記録層の表面に窒素を注入する
ものである。その窒素の含有状態は該記録層の膜厚方向
に濃度勾配を持ち、その表面において一番高濃度で、最
高４Ｑａ ｔ％まで含有し、化学量論的に安定な状態で
、結晶化している。そして膜の内部に進むにつれて窒素
濃度は減少し、該記録層の厚さの１／２程度までに０と
なる。In order to achieve the above object, the present invention provides a layer containing nitrogen on the surface of the recording layer. The present invention also provides a method for forming a recording layer made of an amorphous rare earth-transition metal alloy on a transparent substrate by vapor deposition, sputtering, etc., and then forming the recording layer by reverse sputtering in an atmosphere containing nitrogen gas. Nitrogen is implanted into the surface of the layer. The nitrogen content has a concentration gradient in the thickness direction of the recording layer, with the highest concentration at the surface, up to 4Qat%, and is stoichiometrically stable and crystallized. . The nitrogen concentration decreases as it progresses into the film, reaching 0 by about 1/2 the thickness of the recording layer.
以下、本発明の実施例を図面によって説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明による光磁気記録媒体の一実施例を示す
部分断面図であって、１は基板、２はエンファシス膜、
３は磁性層、４は保護層、５は案内溝、６はプリピット
である。FIG. 1 is a partial cross-sectional view showing an embodiment of a magneto-optical recording medium according to the present invention, in which 1 is a substrate, 2 is an emphasis film,
3 is a magnetic layer, 4 is a protective layer, 5 is a guide groove, and 6 is a pre-pit.
同図において、基板１は、例えばガラス、ポリメチルメ
タクリレート（ＰＭＭＡ） 、ポリカーボネート（ＰＣ
）、エポキシなどの透明物質でもって構成されており、
片面にトラッキング信号に対応する案内溝５及びアドレ
ス信号等に対応するプリピット６が形成されている。こ
れら案内溝５及びプリピット６の形成手段としては基板
材料に応じて適宜選択することができるが、例えば、ガ
ラス製基板については所謂２Ｐ法（光硬化性樹によって
レプリカを形成する製法） 、ＰＭＭＡやＰＣなどの熱
可塑性樹脂の基板についてはｍ、エポキシなどの熱硬化
性樹脂の基板については往。In the figure, the substrate 1 is made of, for example, glass, polymethyl methacrylate (PMMA), polycarbonate (PC
), is composed of a transparent material such as epoxy,
A guide groove 5 corresponding to a tracking signal and a pre-pit 6 corresponding to an address signal etc. are formed on one side. The means for forming these guide grooves 5 and pre-pits 6 can be selected as appropriate depending on the substrate material, but for example, for glass substrates, the so-called 2P method (a method of forming a replica using a photocurable resin), PMMA, etc. m for thermoplastic resin substrates such as PC, and om for thermosetting resin substrates such as epoxy.
磁性層３はＲＸ Ｆ ｅ Ｃｏ ｙ Ｍ ｇ （Ｒは
Ｔｂ。The magnetic layer 3 is made of RX Fe Co y M g (R is Tb.
Ｇ ’７からなり、２０≦Ｘ≦３Ｑａｔ％、５≦ｙ≦１
５ａｔ％、また、ＭはＮｂ、Ｃｒ、Ｔｉからなり、０≦
２≦１Ｑａｔ％）のアモルファス合金であり、厚さは８
００〜１６００人でその表面に窒素が注入されている。Consists of G '7, 20≦X≦3Qat%, 5≦y≦1
5at%, and M consists of Nb, Cr, and Ti, and 0≦
2≦1Qat%), and the thickness is 8
00-1600 people and nitrogen is injected into its surface.
第２図はこの磁性Ｎ３の一部を拡大して示すものであり
、３ａがＲｘＦｅＣｏ、Ｍ２のアモルファス合金層であ
って記録層をなし、３ｂがこのアモルファス合金に窒素
が注入された層（以下、窒素注入層という）である。Figure 2 shows an enlarged part of this magnetic N3, where 3a is an amorphous alloy layer of RxFeCo, M2 which forms the recording layer, and 3b is a layer in which nitrogen is implanted into this amorphous alloy (hereinafter referred to as , nitrogen injection layer).
この窒素注入層３ｂは、磁性層３のピンホールや柱状構
造の間隙内部の表面にも形成され、このために、記録層
３ａの表面は、その形状にかかわらず、窒素注入層３ｂ
によって一様に覆われる。This nitrogen injection layer 3b is also formed on the surface inside the pinhole or columnar structure gap of the magnetic layer 3, and therefore, regardless of its shape, the nitrogen injection layer 3b is formed on the surface of the recording layer 3a.
uniformly covered by.
一般に、窒素を含む層は空気や湿気を効率よく阻止する
。このために、記録Ｆ１３ ａは窒素注入層３ｂによっ
て空気や湿気から保護され、酸化防止や耐蝕性が向上し
てその磁化特性の劣化が防止できる。In general, a nitrogen-containing layer effectively blocks air and moisture. For this reason, the recording F13a is protected from air and moisture by the nitrogen injection layer 3b, and oxidation prevention and corrosion resistance are improved, thereby preventing deterioration of its magnetization characteristics.
なお、窒素注入層３ｂは、あまり薄いとその効果が得ら
れないし、あまり厚くすると記録層３ａの厚さが充分と
れず、その点から窒素が注入される厚さを磁性層３の厚
さの１／２程度（たとえば、磁性層３の厚さを１０００
人とすると、窒素が注入される厚さは５００人程度）と
するのが好ましい。また、記録層３ａは垂直磁化される
。情報信号の再生に寄与するものはこの垂直磁化された
記録層３ａである。Note that if the nitrogen injection layer 3b is too thin, the effect cannot be obtained, and if it is too thick, the recording layer 3a cannot be sufficiently thick. About 1/2 (for example, the thickness of the magnetic layer 3 is 1000
In terms of people, it is preferable that the thickness into which nitrogen is implanted is about 500 people. Further, the recording layer 3a is perpendicularly magnetized. It is this perpendicularly magnetized recording layer 3a that contributes to the reproduction of information signals.
磁性Ｎ３上には、保護効果をさらに高めるために、Ｓｉ
Ｎからなる保護層４が１０００〜２０００人の厚さで設
けられている。しかしながら、この保護層４は必ずしも
必要なものではなく、これがなくとも良好な酸化防止、
腐蝕防止が可能である。On the magnetic N3, Si is added to further enhance the protective effect.
A protective layer 4 made of N is provided with a thickness of 1000 to 2000 layers. However, this protective layer 4 is not necessarily necessary, and even without it, good oxidation prevention and
It is possible to prevent corrosion.
第３図は本発明による光磁気記録媒体の製造方法の一実
施例を示す説明図であって、７は真空槽、８は基板、９
はターゲット、１０はシャッタ、１１は真空ポンプ、１
２は弁、１３．１４は切換スイッチ、１５は電源である
。FIG. 3 is an explanatory diagram showing an embodiment of the method for manufacturing a magneto-optical recording medium according to the present invention, in which 7 is a vacuum chamber, 8 is a substrate, and 9 is a
is the target, 10 is the shutter, 11 is the vacuum pump, 1
2 is a valve, 13 and 14 are changeover switches, and 15 is a power source.
同図において、接地された真空槽７内に基板８とこれに
対向してターゲット９が設けられている。In the figure, a substrate 8 and a target 9 are provided in a grounded vacuum chamber 7 in opposition to the substrate 8.
また、基板８とターゲット９との間にシャッタ１０が設
けられている。基板８は第１図に示した光磁気記録媒体
のエンハンス膜２を有する基板１となるものであり、案
内溝やプリピットが設けられており、エンハンス膜２が
ターゲット９側を向いている。ターゲット９は第１図に
示した光磁気記録媒体の磁性層の材料となる希土類−遷
移金属系合金、たとえばＴ ｂ Ｆ ｅ Ｃｏ Ｎ ｂ
合金である。Further, a shutter 10 is provided between the substrate 8 and the target 9. The substrate 8 serves as the substrate 1 having the enhancement film 2 of the magneto-optical recording medium shown in FIG. 1, and is provided with guide grooves and pre-pits, and the enhancement film 2 faces the target 9 side. The target 9 is made of a rare earth-transition metal alloy that is the material of the magnetic layer of the magneto-optical recording medium shown in FIG. 1, such as T b Fe Co N b
It is an alloy.
基板８は切換スイッチ１３の固定接点Ａと切換スイッチ
１４の固定接点Ｂとに接続され、ターゲット９は切換ス
イッチ１３の固定接点Ｂと切換スイッチ１４の固定接点
Ａとに接続されている。また、切換スイッチ１３の可動
接点Ｃは接地端子に、切換スイッチ１４の可動接点Ｃは
正の電源１５に接続されている。The substrate 8 is connected to the fixed contact A of the changeover switch 13 and the fixed contact B of the changeover switch 14, and the target 9 is connected to the fixed contact B of the changeover switch 13 and the fixed contact A of the changeover switch 14. Further, the movable contact C of the changeover switch 13 is connected to a ground terminal, and the movable contact C of the changeover switch 14 is connected to a positive power source 15.
このように基板８とターゲット９が配置された状態で、
真空ポンプ１１により、真空槽７内を所定の真空度にし
、シャッタ１０を開いて弁１２からＡｒガスを真空槽７
内に注入する。そして、切換スイッチ１３．１４を固定
接点Ａ側に閉じて基板８を接地し、ターゲット９に電源
１５から高電圧を印加する。これにより、基板８上には
ターゲット９によってスパッタされ、希土類−遷移金属
系アモルファス合金からなる磁性層が形成される。With the substrate 8 and target 9 arranged in this way,
The inside of the vacuum chamber 7 is brought to a predetermined degree of vacuum by the vacuum pump 11, and the shutter 10 is opened to supply Ar gas to the vacuum chamber 7 through the valve 12.
Inject inside. Then, the changeover switches 13 and 14 are closed to the fixed contact A side, the substrate 8 is grounded, and a high voltage is applied to the target 9 from the power source 15. As a result, a magnetic layer made of a rare earth-transition metal amorphous alloy is formed on the substrate 8 by sputtering with the target 9.
この磁性層が８００〜１６００人の厚さになると、シャ
ッタ１０を閉じ、弁１２を通してＡｒガスが存在する真
空槽７内に窒素（Ｎ２）ガスを注入し、その濃度が５〜
１００％となるようにする。When this magnetic layer reaches a thickness of 800 to 1600 people, the shutter 10 is closed and nitrogen (N2) gas is injected through the valve 12 into the vacuum chamber 7 where Ar gas is present, so that its concentration is 5 to
Make it 100%.
そして、切換スイッチ１３．１４を固定接点Ｂ側に閉じ
、基板８に電源１５から高電圧を印加してターゲット９
を接地する。このときの投入電力密度は０．５〜１．０
Ｗ／ｃｄであり、これにより、逆スパッタリングが行
なわれて基板８上の磁性層の表面から窒素が注入される
。この逆スパッタリングを２〜５分間行なうことにより
、磁性層の厚さの１／２の厚さの領域が窒素注入層とな
る。Then, the changeover switches 13 and 14 are closed to the fixed contact B side, and a high voltage is applied to the board 8 from the power supply 15, so that the target 9
Ground. The input power density at this time is 0.5 to 1.0
W/cd, thereby performing reverse sputtering and injecting nitrogen from the surface of the magnetic layer on the substrate 8. By performing this reverse sputtering for 2 to 5 minutes, a region having a thickness of 1/2 of the thickness of the magnetic layer becomes a nitrogen-implanted layer.
磁性層の上に保護層を設ける場合には、さらにＳｉなど
のターゲットを設けておき、これをＡｒガスとＮ２ガス
の雰囲気内でスパッタリングすることにより、ＳｉＮの
保１！層が得られる。When a protective layer is provided on the magnetic layer, a target of Si or the like is further provided and sputtering is performed in an atmosphere of Ar gas and N2 gas to improve the retention of SiN. You get layers.
このようにして、第１図および第２図に示した光磁気記
録媒体が得られるが、その記録再生特性は、
最小記録パワー：３〜４ｍＷ
最小記録磁場 ニー１５０〜−５００ｅ限界再生パワー
：２．５ｍＷ
Ｃ／Ｎ ：５２ｄＢ
であり、窒素ガスを注入しない上記従来の光磁気記録媒
体と同程度であった。In this way, the magneto-optical recording medium shown in FIGS. 1 and 2 is obtained, and its recording and reproducing characteristics are as follows: Minimum recording power: 3 to 4 mW Minimum recording magnetic field Knee 150 to -500e Limit reproduction power: 2 .5 mW C/N: 52 dB, which was comparable to the above-mentioned conventional magneto-optical recording medium in which nitrogen gas was not injected.
この製造方法によると、以上のように、基板８上の各層
の形成は、同一の装置で連続的に行なうことができる。According to this manufacturing method, as described above, each layer on the substrate 8 can be formed continuously using the same device.
第４図はｌＮＮａＣ１水溶液での本発明による光磁気記
録媒体の一例と従来の光磁気記録媒体との混錬試験の結
果、すなわち光透過率の経時変化を示し、第５図は８０
℃、９５％ＲＨでの本発明による光磁気記録媒体と従来
の光磁気記録媒体との高温高温環境試験の結果、すなわ
ち飽和磁化の経時的変化率を示すものである。これら第
４図、第５図において、曲線Ａは磁性層をＴｂｚｂＦｅ
ｉｔＣｏａ＋（但し、数字はａｔ％）とする従来の光磁
気記録媒体、曲線Ｂは磁性層をＴｂｔ、Ｆｅ、。ＣＯＩ
！Ｎｂ、とする従来の光磁気記録媒体、曲′！ｉＡＣは
磁性層がＴｂｚ５ＦｅｂｏｃＯ＋ｔＮｂｚの記録層とこ
れに窒素が注入された窒素注入層からなる本発明による
光磁気記録媒体であり、これらはいずれもガラス基板に
直接磁性層が設けられたものである。FIG. 4 shows the results of a kneading test of an example of the magneto-optical recording medium according to the present invention and a conventional magneto-optical recording medium in an lNNaC1 aqueous solution, that is, the change in light transmittance over time, and FIG.
3 shows the results of a high-temperature environment test of the magneto-optical recording medium according to the present invention and the conventional magneto-optical recording medium at 95% RH, that is, the rate of change in saturation magnetization over time. In FIGS. 4 and 5, curve A indicates that the magnetic layer is made of TbzbFe.
A conventional magneto-optical recording medium with itCoa+ (the number is at%), curve B shows a magnetic layer made of Tbt, Fe, or the like. COI
! Conventional magneto-optical recording medium with Nb, song'! iAC is a magneto-optical recording medium according to the present invention in which the magnetic layer is composed of a recording layer of Tbz5FebocO+tNbz and a nitrogen-injected layer into which nitrogen is injected, and both of these have a magnetic layer directly provided on a glass substrate.
これらの試験結果から明らかなように、本発明による光
磁気記録媒体は、従来の光磁気記録媒体に比べ、耐蝕性
が非常に優れている。酸化防止についても同様である。As is clear from these test results, the magneto-optical recording medium according to the present invention has much better corrosion resistance than conventional magneto-optical recording media. The same holds true for oxidation prevention.
なお、上記実施例では、数値を具体的に示したが、これ
らは−例にすぎず、本発明はこれらによって限定される
ものではない、また、エンハンス膜、保護層の材料とし
ては、上記以外のものであってもよい。In addition, although numerical values were specifically shown in the above examples, these are only examples, and the present invention is not limited thereto. Furthermore, materials for the enhancement film and the protective layer may be other than those mentioned above. It may be of.
さらに、上記窒化層は室温で自発磁化を持ち得る。これ
を利用すれば、保護層としてのみならず、記録層として
も用いることができる。たとえば、窒素を１０〜４０ａ
ｔ％含むＴｂ”Ｆｅ−Ｇｏ薄膜においては、飽和磁化５
００〜１５００ｅｍｕ／ ｃ ｃ、保磁力０．５〜２ｋ
Ｏａで従来の磁気ヘッドによる記録再生が可能である。Furthermore, the nitride layer may have spontaneous magnetization at room temperature. If this is utilized, it can be used not only as a protective layer but also as a recording layer. For example, nitrogen at 10-40a
In the Tb"Fe-Go thin film containing t%, the saturation magnetization is 5
00~1500emu/cc, coercive force 0.5~2k
Recording and reproduction using a conventional magnetic head is possible with Oa.
以上説明したように、本発明によれば、充分に記録層の
酸化が防止され、該記録層の耐蝕性が大幅に向上し、記
録、再生特性の劣化を防止することができるし、製造工
程の簡略化、製造時間の短縮化がはかれ、安定したかつ
優れた特性の光磁気記録媒体を低コストで提供すること
ができる。As explained above, according to the present invention, oxidation of the recording layer is sufficiently prevented, the corrosion resistance of the recording layer is greatly improved, deterioration of recording and reproduction characteristics can be prevented, and the manufacturing process This simplifies the process and shortens the manufacturing time, making it possible to provide a magneto-optical recording medium with stable and excellent characteristics at a low cost.
第１図は本発明による光磁気記録媒体の一実施例を示す
部分断面図、第２図は第１図における磁性層の部分拡大
図、第３図は本発明による光磁気記録媒体の製造方法の
一実施例を示す説明図、第 □４図は本発明による
磁気記録媒体の一例と従来の光磁気記録媒体との混練試
験結果を示すグラフ図、第５図は同じく高温高温環境試
験結果を示すグラフ図である。
１・・・・・・基板、３・・・・・・磁性層、３ａ・・
・・・・記録層、３ｂ・・・・・・窒素注入層、７・・
・・・・真空槽、８・・・・・・基板、９・・・・・・
ターゲット、１０・・・・・・シャッタ、１２・・・・
・・ガス注入弁、１３．１４・・・・・・切換スイッチ
、１５・・・・・・電源。
第１図
第３図
第４図
吟へ′！（ｍｉｎ ）
第５図
す閘 （ｈｒｓ）FIG. 1 is a partial cross-sectional view showing an embodiment of the magneto-optical recording medium according to the present invention, FIG. 2 is a partially enlarged view of the magnetic layer in FIG. 1, and FIG. 3 is a method for manufacturing the magneto-optical recording medium according to the present invention. An explanatory diagram showing one embodiment, Fig. 4 is a graph showing the results of a kneading test between an example of the magnetic recording medium according to the present invention and a conventional magneto-optical recording medium, and Fig. 5 is a graph showing the results of the high-temperature environment test. FIG. 1...Substrate, 3...Magnetic layer, 3a...
...Recording layer, 3b...Nitrogen injection layer, 7...
...Vacuum chamber, 8...Substrate, 9...
Target, 10...Shutter, 12...
...Gas injection valve, 13.14...Choice switch, 15...Power supply. Figure 1 Figure 3 Figure 4 Go to Gin'! (min) Figure 5 Lock (hrs)
Claims (2)
する光磁気記録媒体において、該記録層の表面に窒素を
含有する層を設けたことを特徴とする光磁気記録媒体。(1) A magneto-optical recording medium having a recording layer made of an amorphous rare earth-transition metal alloy, characterized in that a layer containing nitrogen is provided on the surface of the recording layer.
により、希土類−遷移金属系のアモルファス合金層を形
成し、窒素ガスを含む雰囲気中で、逆スパッタリング法
により、該合金層の表面に窒素を注入することを特徴と
する光磁気記録媒体の製造方法。(2) Form a rare earth-transition metal amorphous alloy layer on a transparent substrate by vapor deposition, sputtering, etc., and apply nitrogen to the surface of the alloy layer by reverse sputtering in an atmosphere containing nitrogen gas. 1. A method for manufacturing a magneto-optical recording medium, which comprises injecting.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62277340A JPH01119939A (en) | 1987-11-04 | 1987-11-04 | Magneto-optical recording medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62277340A JPH01119939A (en) | 1987-11-04 | 1987-11-04 | Magneto-optical recording medium and its production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01119939A true JPH01119939A (en) | 1989-05-12 |
Family
ID=17582161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62277340A Pending JPH01119939A (en) | 1987-11-04 | 1987-11-04 | Magneto-optical recording medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01119939A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0366048A (en) * | 1989-08-04 | 1991-03-20 | Asahi Chem Ind Co Ltd | Production of magneto-optical recording medium |
| JPH0373430A (en) * | 1989-08-14 | 1991-03-28 | Asahi Chem Ind Co Ltd | Optical recording medium |
| WO1994003892A1 (en) * | 1992-07-29 | 1994-02-17 | Seiko Epson Corporation | Magneto-optic recording medium and method of its manufacture method |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60143460A (en) * | 1983-12-13 | 1985-07-29 | Toshiba Corp | Optothermomagnetic recording medium and its production |
| JPS61188760A (en) * | 1985-02-18 | 1986-08-22 | Matsushita Electric Ind Co Ltd | Photomagnetic recording medium |
| JPS62175946A (en) * | 1986-01-29 | 1987-08-01 | Fujitsu Ltd | Photomagnetic disk |
| JPS6353735A (en) * | 1986-08-23 | 1988-03-08 | Sony Corp | Magneto-optical recording medium |
-
1987
- 1987-11-04 JP JP62277340A patent/JPH01119939A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60143460A (en) * | 1983-12-13 | 1985-07-29 | Toshiba Corp | Optothermomagnetic recording medium and its production |
| JPS61188760A (en) * | 1985-02-18 | 1986-08-22 | Matsushita Electric Ind Co Ltd | Photomagnetic recording medium |
| JPS62175946A (en) * | 1986-01-29 | 1987-08-01 | Fujitsu Ltd | Photomagnetic disk |
| JPS6353735A (en) * | 1986-08-23 | 1988-03-08 | Sony Corp | Magneto-optical recording medium |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0366048A (en) * | 1989-08-04 | 1991-03-20 | Asahi Chem Ind Co Ltd | Production of magneto-optical recording medium |
| JPH0373430A (en) * | 1989-08-14 | 1991-03-28 | Asahi Chem Ind Co Ltd | Optical recording medium |
| WO1994003892A1 (en) * | 1992-07-29 | 1994-02-17 | Seiko Epson Corporation | Magneto-optic recording medium and method of its manufacture method |
| US5976688A (en) * | 1992-07-29 | 1999-11-02 | Seiko Epson Corporation | Magneto-optical recording medium and method of manufacturing the same |
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