JPH01112245A - Method and device for development - Google Patents

Abstract

PURPOSE:To perform development in a short time and to obtain a resist image of good quality by uniformly spraying a developer on the peripheral surface of a roll while moving the spray position in the lengthwise direction of the surface of the roll and removing a necessary part of a photosensitive film by the cooperation of spray of the developer and the impact of ultrafine particles. CONSTITUTION:A plate roll R is coated with the photosensitive film and is exposed, and the roll R has both ends chucked by plate roll chucking and rotating means 1-5 and is rotated at a low speed. The plate roll R is rotated, and the developer including ultrafine particles is sprayed on the plate roll R from a developer nozzle 7, and the spray position is moved at a prescribed speed in the lengthwise direction of the surface of the roll to uniformly spray the developer on the peripheral surface of the roll, and a necessary part of the photosensitive film is removed by the cooperation of spray of the developer and the impact of ultrafine particles. Thus, development is performed in a short time and the surface of copper is not damaged to obtain the resist image of good quality.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a developing method and a developing device suitable for gravure plate making.

<Prior Art and Problems> Conventionally, a PS plate for offset printing is an aluminum plate with a satin finish, coated with an alkali-soluble photosensitive film, exposed to light, and developed with an alkaline developer. In that case, the aluminum plate was rubbed with a soft brush roll to shorten the development process. In some cases, a solvent-soluble photosensitive film is formed and developed with a solvent-based developer, but in this case, the photosensitive film swells and dissolves, so it must be rubbed with a brush roll. It was not recommended to rub with a brush roll because there was a risk of scratches.

For gravure plate making, rubbing with a soft brush roll may be considered in order to develop in a short time, but there is a risk of damaging the mirror-like copper surface and uniform rubbing contact of the brush roll is not guaranteed. Therefore, there is a risk of unevenness in the resist image, and it is difficult to use rubbing with a brush roll.

<Object of the Invention> The present invention was devised in view of the above-mentioned points, and provides a developing method and a developing method that can perform the developing process in a short time, does not cause any risk of damaging the copper surface, and can obtain a high-quality resist image. The present invention provides a developing device.

Means for Achieving the Above Object> Development method of the present invention A plate roll coated with a photosensitive film and exposed to light is rotated, a developer containing ultrafine particles is sprayed onto the plate roll, and the spraying position is controlled. By moving the roll at a predetermined speed in the longitudinal direction of the roll surface, the developer is sprayed uniformly onto the roll circumferential surface, and the required portion of the photoresist film is removed by the joint action of the spray of the developer and the impact of the ultrafine particles. Further, the developing device of the present invention is provided with a plate roll chuck rotating means for chucking and rotating a plate roll coated with a photoresist film and exposed to light at both ends; An x-y table device provided opposite to the plate roll chucked by the chuck rotation means has an ejector for mixing ultrafine particles in the developer, and directs the developer containing the ultrafine particles toward the plate roll. This is characterized in that the developer injection tube that injects the liquid is supported.

<Example> FIG. 1 is a schematic plan view of an apparatus for explaining a developing method and a developing apparatus according to an example of the present invention.

Reference numeral R denotes a plate roll to which a photoresist film was applied and exposed. The plate roll R is chucked at both ends by plate roll chuck rotation means and rotated at a low speed. The plate roll chuck rotation means includes a spindle chuck 2 rotationally driven by a guard motor 1;
A reciprocating shaft 4 stroked by an air cylinder device 3
The tail stock 5 is rotatably attached to the tip of the tail stock 5.

An XY table device 6 is attached opposite to the plate roll R chucked by the plate roll chuck rotation means. The table 6a of the X-Y table device 6 is capable of moving toward and away from the plate roll R, and reciprocates in parallel with the plate roll R. A developer injection tube 7 is supported on this table 6a, and the developer injection tube 7 is brought close to the plate roll R when it has a large diameter, and is separated when the plate roll R has a small diameter. The sensor automatically adjusts the gap between the nozzle 7a facing the plate roll H and the plate roll H to be constant. The developer injection pipe 7 is supplied with developer stored in a tank 8 via a precision filtration device 9 and a circulation pump 10 via a flexible hose 11, and is configured to inject the developer toward the plate roll. There is. Developer injection tube 7
An ejector 7b is attached to the ejector 7b, and the ejector 7b is adapted to be supplied with ultrafine particles stored in a hopper 12 provided at a high position so as to be supported by a table 6a and move together with the table 6a. The ultrafine particles are mixed with the developer and taken in by the negative pressure of the developer jetted through the ejector 7b. tank 8
is formed surrounding the plate roll R and the x-Y table device 6 so as to prevent the developer sprayed onto the plate roll R from scattering around the plate roll R, and is formed from above so that the plate roll R can be replaced. A door (not shown) is provided on the side opposite to the table. The precision filtration device 9 separates and stores the ultrafine particles that have been sprayed and the residue of the photoresist film. Note that, as the developer, a solvent type developer or an alkaline type developer is used depending on the photosensitive agent. In addition, ultrafine particles are
Since the minimum size of the cell is 10 microns square, it is preferable to use glass or silica sand fine powder grains or carporundum having a diameter of 5 microns Φ or less.

Next, the effect will be explained.

First, a door (not shown) is opened, and the plate roll R coated with a photoresist film and exposed to light is stored horizontally in the tank 8 manually, by a stacker crane, or by a robot, and is placed between the spindle chuck 2 and the tail chuck 5. When the air cylinder device 3 is maintained, the air cylinder device 3 is driven to extend, the plate roll R is chucked at both ends, and a door (not shown) is closed.

Next, the card motor 1 is driven to rotate the plate roll R, and the table 6a of the XY table device 6 is rotated.
moves from the initial position (position corresponding to the left end of the plate roll H) in the X direction (roll axis direction) in the Y direction approaching the plate roll H, and the nozzle 7a at the tip of the developer injection tube 7 and the plate roll Maintain a constant distance from R.

Subsequently, the circulation pump 10 is driven, and the developer stored in the tank 8 is supplied to the developer injection pipe 7, and is injected from the nozzle 7a toward the plate roll R at a predetermined pressure. It moves along the roll at a predetermined low speed in the direction of the tailstock 5. When the developer is ejected from the nozzle 7a, the ultrafine particles stored in the hopper 12 are mixed into the developer from the ejector 7b. When the nozzle 7a comes to the right end of the plate roll R, the -cutting drive temporarily stops, the table 6a leaves the roll and returns to its initial position, and the unillustrated door of the tank 8 opens.

In this way, when the developing solution containing ultrafine particles is injected onto the rotating plate roll while moving its position in the longitudinal direction of the roll surface, the developing solution is uniformly injected onto the circumferential surface of the roll. Then, a necessary portion of the photoresist film is removed by the joint action of the jetting of the developer and the impact of the ultrafine particles.

Modified Example - Company/not shown> High pressure water is supplied to the developer injection pipe, and the ejector is made of a composite structure to take in the developer and ultrafine particles under negative pressure.
The developer and ultrafine particles may be disposable.

<Effects of the Invention> As explained above, the developing method of the present invention rotates the plate roll, moves the developer containing ultrafine particles in the longitudinal direction of the roll surface, and uniformly injects the developer onto the roll circumferential surface. This method removes the necessary parts of the photoresist film through the joint action of developer jet and ultrafine particle impact. Development can be done in a short time, there is no risk of damaging the copper surface, and high-quality resist images can be produced. can get.

Further, the developing device of the present invention includes a plate roll chuck rotating means and an X-Y table device.
Since it has an ejector for mixing ultrafine particles and is equipped with a developer jet tube that sprays developer toward the plate roll, it is a device that implements the above development method, and can perform the development process in a short time. A high-quality resist image can be obtained without the risk of damaging the surface.

Furthermore, according to the method and apparatus of the present invention, development

[Brief explanation of the drawing]

FIG. 1 is a schematic plan view of an apparatus for explaining a developing method and a developing apparatus according to an embodiment of the present invention. R fist... plate roll, 1 to 5... plate roll chuck rotation means, 1... guard fist motor, 2-- spindle chuck, 3-φ air cylinder device, 4... reciprocating shaft, 5・Meeting・Tail stock, 6--@X-Y table device, 6a...Table 6a. 7...Developer injection pipe, 7a11...Nozzle, 7b...Ejector, 8e...Tank, 9...Precision filtration device, 10...Circulation pump, 11.e.Flexible hose, 12.φ ·hopper,

Claims (2)

[Claims] (1) By rotating a plate roll coated with a photosensitive film and exposed to light, spraying a developer containing ultrafine particles onto the plate roll, and moving the spraying position at a predetermined speed in the longitudinal direction of the roll surface, A developing method characterized in that the developer is uniformly sprayed onto the circumferential surface of a roll, and a necessary portion of the photoresist film is removed by the joint action of the spray of the developer and the impact of ultrafine particles. (2) A plate roll chuck rotation means is provided which chucks and rotates the plate roll coated with a photoresist film and exposed at both ends, and is provided facing the plate roll chucked by the plate roll chuck rotation means. X-Y
A developing device characterized in that a developer injection tube having an ejector for mixing ultrafine particles in the developer and spraying the developer containing the ultrafine particles toward the plate roll is supported on the table of the table device. Device.