JPH01102688A - Pattern recognition system - Google Patents

Pattern recognition system

Info

Publication number
JPH01102688A
JPH01102688A JP62260930A JP26093087A JPH01102688A JP H01102688 A JPH01102688 A JP H01102688A JP 62260930 A JP62260930 A JP 62260930A JP 26093087 A JP26093087 A JP 26093087A JP H01102688 A JPH01102688 A JP H01102688A
Authority
JP
Japan
Prior art keywords
feature
similarity
pattern
feature vector
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62260930A
Other languages
Japanese (ja)
Inventor
Seiichiro Kamata
清一郎 鎌田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62260930A priority Critical patent/JPH01102688A/en
Publication of JPH01102688A publication Critical patent/JPH01102688A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform high-accuracy pattern recognition by performing effective feature extraction for discrimination in consideration of differences of local feature patterns or character patterns in respective layers among categories. CONSTITUTION:This system consists of a feature point selection part 1, a linear integration arithmetic part 2, a deviation corrective arithmetic part 3, a similarity arithmetic part 4, a local feature vector storage part 5, a decision means 6 which decides a maximum value, a pattern memory 10 as a pattern storage means for storing character patterns, and a control part 70. Then feature point selection and decision analysis in consideration of differences in feature of local feature patterns or character patterns among categories is performed to calculate similarity from linear integration, thereby extracting effective features for the discrimination. Consequently, high-accuracy pattern decision making is performed.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は文字認識、あるいは、音声認識等の分野におい
て、識別に有効な特徴を提供するパターン認識方式に関
する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a pattern recognition method that provides features effective for identification in fields such as character recognition and speech recognition.

(従来の技術) 階層的に特徴を抽出し判定する方法として、特開昭57
−178578号公報に記載されている未知パターンを
複数個の部分領域に分割し、それぞれに対して複数個の
標準部分パターンと単純類似度、あるいは、複合類似度
を使って類似度を計算し入カバターンの類似度行列を求
める方法と、よく知られた方法としてパターンの局所か
らの結線の重み係数を逐次かえて各パターンに対する判
定を行うバーセプトロンがある。
(Prior art) As a method for hierarchically extracting and determining features,
- Divide the unknown pattern described in Publication No. 178578 into multiple partial areas, and calculate the similarity for each using multiple standard partial patterns and simple similarity or composite similarity. There is a method for obtaining a Kabataan similarity matrix, and a well-known method is a berseptron, in which a judgment is made for each pattern by sequentially changing the weighting coefficients of connections from the local area of the pattern.

(発明が解決しようとする問題点) 前記のような従来の技術では、各局所特徴パターン、あ
るいは各文字パターンのカテゴリ間で相関があるので、
単純類似度あるいは複合類似度をとっても、局所マツチ
ングによりノイズの影響は受けにくいものの、識別する
上で有効な少ない個数の特徴になっているとは言い難い
(Problems to be Solved by the Invention) In the conventional techniques as described above, since there is a correlation between each local feature pattern or each character pattern category,
Although simple similarity or composite similarity is less affected by noise due to local matching, it is difficult to say that it is a small number of features that are effective for identification.

また、このような従来の技術では、各局所特徴パターン
、あるいは、各文字パターンのカテゴリ間の差異が識別
に有効なように出にくいという問題がある。
Further, with such conventional techniques, there is a problem in that differences between categories of each local feature pattern or each character pattern are difficult to show in a way that is effective for identification.

本発明は該問題点を考慮にいれた、識別に有効な特徴を
抽出し判定する、パターン認識技術を提供することにあ
る。
The present invention takes this problem into consideration and provides a pattern recognition technique that extracts and determines features effective for identification.

(問題点を解決するための手段) 本発明によれば、未知パターンを記憶するパターン記憶
手段と、複数層の各層における局所特徴パターンの特徴
点選択位置を記憶する特徴点位置記憶部と、識別結果で
ある類似度を記憶する特徴ベクトル配列記憶部と、前記
局所領域パターンで前記特徴点選択位置に従って特徴点
を選択する特徴点選択部と、各層の特徴ベクトル配列を
判別分析の手法を用いて生成するための線形統合演算部
、偏位補正演算部、類似度演算部からなる特徴抽出手段
と、最上層の特徴抽出手段の類似度演算部から出力され
た類似度の比較により予め定められた文字カテゴリに判
定する判定手段とからなり、前記パターン記憶手段の出
力を最下層の特徴ベクトル配列とし、各層においては、
下位層すべての特徴ベクトル配列で前記特徴点選択位置
に従って特徴点の選択を行った特徴ベクトルと判別分析
の手法により各層の予め定めた局所特徴パターンの特徴
ベクトルとの類似度を前記特徴ベクトル配列とすること
を特徴とするパターン認識方式が得られる。
(Means for Solving the Problems) According to the present invention, a pattern storage means for storing unknown patterns, a feature point position storage unit for storing feature point selection positions of local feature patterns in each of a plurality of layers, A feature vector array storage unit that stores the resulting similarity, a feature point selection unit that selects feature points according to the feature point selection position in the local area pattern, and a feature vector array of each layer using a discriminant analysis method. A feature extraction unit consisting of a linear integration calculation unit, a deviation correction calculation unit, and a similarity calculation unit for generating a predetermined similarity is compared with the similarity output from the similarity calculation unit of the top layer feature extraction unit. The output of the pattern storage means is used as a feature vector array in the lowest layer, and in each layer,
Using a discriminant analysis method, the similarity between the feature vectors in which feature points are selected according to the feature point selection positions in the feature vector arrays of all lower layers and the feature vectors of predetermined local feature patterns in each layer is calculated between the feature vector arrays and the feature vectors of the predetermined local feature patterns in each layer. A pattern recognition method is obtained which is characterized by the following.

(作用) 本発明では、局所特徴パターン、あるいは、文字パター
ンのカテゴリ間で特徴の差異を考慮に入れた特徴点選択
、さらに、判別分析を使っての線形統合からの類似度計
算を行うことにより識別に有効な特徴を抽出し、最終的
に高精度の判定を行うことを可能としている。
(Operation) The present invention selects feature points taking into account feature differences between local feature patterns or character pattern categories, and calculates similarity from linear integration using discriminant analysis. This makes it possible to extract features that are effective for identification and ultimately make highly accurate judgments.

本発明は、局所領域において特徴点選択と判別分析を使
った中間的な識別を行いながら、パターンの局所から全
体へと階層的に特徴を抽出し判定するパターン認識方式
であり、各層において下層の局所領域でカテゴリ内分散
とカテゴリ間分散を考慮に入れた分散比に従って特徴点
選択を行い、判別分析を使っての線形統合からの類似度
計算を行うこにより特徴を抽出するものである。
The present invention is a pattern recognition method that extracts and judges features hierarchically from the local area of the pattern to the entire pattern while performing intermediate identification using feature point selection and discriminant analysis in local regions. Features are extracted by selecting feature points in a local region according to a variance ratio that takes into account intra-category variance and inter-category variance, and calculating similarity from linear integration using discriminant analysis.

第2図は本発明の局所領域から特徴点選択を行いながら
階層的に特徴を抽出し判定する、−例である。未知パタ
ーン100は複数個のエツジに対応する特徴パターン2
00,201.・・・により識別処理を行い結果を類似
度300.301で表現する。該類似度より、セグメン
トに対応する特徴パターン400,401.・・・によ
り識別処理を行い結果を類似度500,501.・・・
で表現する。
FIG. 2 is an example of extracting and determining features hierarchically while selecting feature points from a local region according to the present invention. The unknown pattern 100 is a characteristic pattern 2 corresponding to multiple edges.
00,201. . . . performs identification processing and expresses the result as a degree of similarity of 300.301. Based on the similarity, feature patterns 400, 401 . . . . Performs identification processing and calculates the results with similarity of 500, 501. ...
Expressed as

同様な処理を繰り返し行い、最終層で文字カテゴリに対
応する特徴パターン2000,2001゜・・・とでの
識別処理により結果を類似度2100゜2101、・・
・で表現し、最終層における類似度より最大の類似度を
もつ文字カテゴリを認識結果とする。例えば、図におい
て類似度210’0,2101、・・・を求める場合、
予め分散比により求めら−れな特徴点選択位置5000
.5001.・・・の特徴を使って識別処理を行い類似
度で表現するということである。
Similar processing is repeated, and in the final layer, the similarity is determined to be 2100°, 2101°, etc. by identifying feature patterns 2000, 2001°, etc. corresponding to the character category.
・The character category with the highest degree of similarity compared to the degree of similarity in the final layer is the recognition result. For example, when calculating similarities 210'0, 2101, etc. in the diagram,
5000 feature point selection positions that are not determined in advance by the variance ratio
.. 5001. This means performing identification processing using the features of... and expressing it in terms of similarity.

各層での処理は下層の局所領域での特徴点の選択から特
徴ベクトル群Xを作成し、Xに線形交換行列Aを与え、
偏位補正を行い、各局所特徴ベクトルとの類似度をとる
処理からなり、このAは該層の全局所特徴カテゴリのデ
ータ集合(φC)から求めることができる。該データ集
合(φC)として例えば各局所特徴パターンを複数個の
方向にずらしたり、線分を含むものであれば線幅を変え
たりしたパターンを含ませることができる。該局所特徴
ベクトルは線形変換行列Aにより新しく変換された特徴
軸における各局所特徴カテゴリごとの標準゛となるベク
トルである。
The processing in each layer is to create a feature vector group X from the selection of feature points in the local region of the lower layer, give a linear exchange matrix A to X,
It consists of processing to perform deviation correction and measure similarity with each local feature vector, and this A can be obtained from the data set (φC) of all local feature categories of the layer. The data set (φC) can include, for example, patterns in which each local feature pattern is shifted in a plurality of directions, or in which the line width is changed if it includes line segments. The local feature vector is a standard vector for each local feature category on the feature axis newly transformed by the linear transformation matrix A.

第S層を形成するための処理は次のようになる。ただし
、以下の式においては添え字のSは省略する。第1、・
・・、(S−1)層における特徴ベクトル配列の点(i
、j)の近傍で、ある局所領域パターンが属するカテゴ
リ内での複数個の特徴点で分散が小、他カテゴリとの間
の分散が大となるように分散比により特徴点の選択を行
う。特徴点選択により得られた特徴ベクトルXIJを判
別分析の手法により(1)式を使って線形統合を行い、
新しく変換された特徴ベクトルを求める。
The process for forming the Sth layer is as follows. However, in the following formula, the subscript S is omitted. 1st,・
..., point (i
, j), feature points are selected based on the variance ratio so that the variance is small among the plurality of feature points within the category to which a certain local area pattern belongs, and the variance between them is large between them and other categories. The feature vector XIJ obtained by feature point selection is linearly integrated using the discriminant analysis method using equation (1),
Find the newly transformed feature vector.

’J+j=  A  −X+j          (
11一方、第S層における局所特徴ベクトルの集合より
、予め求められた偏位補正ベクトルeを使って(21式
により偏位補正を行う。
'J+j= A −X+j (
11 On the other hand, the deviation correction vector e obtained in advance from the set of local feature vectors in the S-th layer is used to perform deviation correction according to Equation 21.

?l+j=  3/IJ  e           
 (21偏位補正を行った特徴ベクトルhlJより各局
所特徴ベクトル(gk I  k=1.・・・、Tlと
のM似度を一例として(3)式により計算する。ここで
、該局所特徴ベクトルは偏位補正ベクトルeにより偏位
補正を行ったものである。
? l+j=3/IJ e
(21) From the feature vector hlJ subjected to deviation correction, each local feature vector (gk I k = 1..., M similarity with Tl is calculated by equation (3) as an example. Here, the local feature The vector has been subjected to deviation correction using the deviation correction vector e.

したがって、第S層における特徴ベクトル群は(4)式
で表される。
Therefore, the feature vector group in the S-th layer is expressed by equation (4).

F+ ・、・=(ftjt  +f目2  +flJ3
 1  ・・・ 、  ftjt)  (4まただし、
i’ 、j’は第S層における特徴ベクトル配列上の点
位置である。判別分析の手法は公知のものであり、例え
ば、柳井、竹内著:射影行列、−最通行列、特異値分解
(1983) 、’P 161−163、東京大学出版
社に記載されているが、簡単な概略を第3図を使って説
明する。第3(a>図のよう゛な2次元平面上の座標系
3000で各カテゴリごとに平均値3003.3004
のクラスタ3001.3002が与えられているとする
。これに判別分析を適用する。2個のクラスタ3001
.3002の縦横の2軸に対する分散が1となるように
正規化すると、第3(b)図のクラスタ3101,31
02のようにかる。ここで、座標系3100を全データ
の平均値により座標系3200に平行移動させる。さら
に、この座標系3200で散らばりが最大となるような
主軸3300を求める。この軸3300が識別に有効な
新しい特徴軸となる。
F+ ・,・=(ftjt +fth 2 +flJ3
1..., ftjt) (4 squares,
i' and j' are point positions on the feature vector array in the S-th layer. Discriminant analysis methods are well known, and are described, for example, in Yanai and Takeuchi, Projection Matrix, -Passive Matrix, Singular Value Decomposition (1983), 'P 161-163, University of Tokyo Press. A simple outline will be explained using FIG. 3. Average value 3003.3004 for each category in the coordinate system 3000 on a two-dimensional plane as shown in the third figure.
Assume that clusters 3001 and 3002 are given. Apply discriminant analysis to this. 2 clusters 3001
.. 3002 is normalized so that the variance on the vertical and horizontal two axes is 1, the clusters 3101 and 31 in FIG. 3(b) are
It costs like 02. Here, the coordinate system 3100 is translated in parallel to the coordinate system 3200 using the average value of all data. Furthermore, in this coordinate system 3200, a principal axis 3300 with the maximum scattering is determined. This axis 3300 becomes a new feature axis effective for identification.

(実施例) 以下、本発明を実施例を参照して詳細に説明する。(Example) Hereinafter, the present invention will be explained in detail with reference to Examples.

第1図は、本発明のパターン認識方式の実施例を示す構
成図である。ただし、4層構成の場合の文字パターン認
識を一例としてあげる。
FIG. 1 is a block diagram showing an embodiment of the pattern recognition method of the present invention. However, character pattern recognition in the case of a four-layer configuration will be taken as an example.

第1図において、1は特徴点選択部、2は線形統合演算
部、3は偏位補正演算部、4は類似度演算部、5は局所
特徴ベクトル記憶部、6は最大値判定を行う判定手段、
10は文字パターンを記憶するパターン記憶手段のパタ
ーンメモリ、20.21.22は各々第2.3.4層の
特徴ベクトル配列メモリ、1100.1101、・・・
は第1層における局所特徴ベクトルメモリ、1200.
1201、・・・は第2層における局所特徴ベクトルメ
モリ、1300.1301、・・・は第3層における局
所特徴ベクトルメモリ、30.31.32は第1.2.
3層における線形統合行列メモリ、40.41.42は
第1.2.3層における偏位補正ベクトルメモリ、50
.51.52.53.54.55.56はマルチプレク
サ−260,61,62は第1.2.3層における特徴
点位置メモリである。70は制御部である。
In FIG. 1, 1 is a feature point selection unit, 2 is a linear integration calculation unit, 3 is a deviation correction calculation unit, 4 is a similarity calculation unit, 5 is a local feature vector storage unit, and 6 is a determination unit for determining the maximum value. means,
10 is a pattern memory of a pattern storage means for storing character patterns; 20, 21, and 22 are feature vector array memories of the 2nd, 3, and 4th layers, respectively; 1100, 1101, . . .
is the local feature vector memory in the first layer, 1200.
1201, . . . are local feature vector memories in the second layer, 1300, 1301, .
Linear integration matrix memory in the 3rd layer, 40.41.42 is the deviation correction vector memory in the 1.2.3 layer, 50
.. 51, 52, 53, 54, 55, 56 are multiplexers, and 260, 61, 62 are feature point position memories in the 1.2.3 layer. 70 is a control section.

制御回路70の指令により、記憶された特徴ベクトル群
がパターン記憶手段のパターンメモリ10より例えば1
000のような局所領域が、マルチプレクサ−52を通
って特徴点選択部1に送られる。特徴点選択部1では特
徴点位置メモリ60に記憶されている第1層の特徴点選
択位置をマルチプレクサ−56を通して読みだし、前記
局所領域の複数個の特徴点を該特徴選択位置に従って選
択し線形統合演算部1に送られる。特徴点選択位置は例
えば第4図に示されるような階層数”l+a2、・・・
と位置(i、j)からの相対位置(bl 、 c1)、
(b2.C2>、・・・で表されている。線形統合演算
部2では第1層の線形統合行列を線形統合行列メモリ3
0からマルチプレクサ−54を通して読みだし、(1)
式により線形統合する。線形統合された結果は偏位補正
演算部3に送られ、第1層の偏位補正ベクトルを偏位補
正ベクトルメモリ40からマルチプレクサ−55を通っ
て読みだされ(2式を使って偏位補正がなされる。偏位
補正終了後、類似度演算部4は局所特徴ベクトルを局所
特徴ベクトルメモリ1100.1101・・・がら次々
にマルチプレクサ−52を通して読みだし、(3)式に
従って類似度が取られる。得られた類似度は特徴ベクト
ル配列メモリ20に書き込まれる。この一連の処理を、
パターン記憶手段のパターンメモリ10の予め定められ
た範囲で行う。
According to a command from the control circuit 70, the stored feature vector group is stored in the pattern memory 10 of the pattern storage means, for example, 1
A local region such as 000 is sent to the feature point selection section 1 through the multiplexer 52. The feature point selection unit 1 reads the feature point selection positions of the first layer stored in the feature point position memory 60 through the multiplexer 56, selects a plurality of feature points in the local area according to the feature selection positions, and linearly It is sent to the integrated calculation unit 1. The feature point selection position is, for example, the number of layers "l+a2," as shown in FIG. 4.
and the relative position (bl, c1) from the position (i, j),
(represented by b2.C2>,...) The linear integration calculation unit 2 stores the linear integration matrix of the first layer in the linear integration matrix memory 3.
0 through multiplexer 54, (1)
Linear integration is performed using Eq. The linearly integrated result is sent to the deviation correction calculation unit 3, and the deviation correction vector of the first layer is read out from the deviation correction vector memory 40 through the multiplexer 55 (deviation correction is performed using Equation 2). After the deviation correction is completed, the similarity calculation unit 4 reads the local feature vectors from the local feature vector memories 1100, 1101, etc. one after another through the multiplexer 52, and the similarity is calculated according to equation (3). The obtained similarity is written into the feature vector array memory 20.This series of processing is
This is performed within a predetermined range of the pattern memory 10 of the pattern storage means.

第1層の処理が終了すると、制御回路70の指令により
、1001のような局所領域での記憶された特徴ベクト
ル群が特徴ベクトル配列メモリ20より、マルチプレク
サ−52を通って特徴点選択部1に送られる。特徴点選
択部1では特徴点位置メモリ61に記憶されている第2
層の特徴点選択位置をマルチプレクサ−56を通して読
みだし、前記局所領域の複数個の特徴点を該特徴選択位
置に従って選択し線形統合演算部1に送られる。
When the first layer processing is completed, a group of feature vectors stored in a local area such as 1001 is transferred from the feature vector array memory 20 to the feature point selection unit 1 through the multiplexer 52 according to a command from the control circuit 70. Sent. The feature point selection unit 1 selects the second
The feature point selection position of the layer is read out through the multiplexer 56, and a plurality of feature points in the local area are selected according to the feature selection position and sent to the linear integration calculation unit 1.

線形統合演算部1では第2層の線形統合行列を線形統合
行列メモリ31からマルチプレクサ−54を通して読み
だし、(1)式により線形統合する。線形統合された結
果は偏位補正演算部2に送られ、第2層の偏位補正ベク
トルを偏位補正ベクトルメモリ41からマルチプレクサ
−55を通って読みだされ(21式を使って偏位補正が
なされる。偏位補正終了後、類似度演算部3は局所特徴
ベクトルを局所特徴ベクトルメモリ1200.1201
、・・・から次々にマルチプレクサ−52を通して読み
だし、(3)式に従って類似度が取られる。得られた類
似度は特徴ベクトル配列メモリ21に書き込まれる。こ
の一連の処理を、特徴ベクトル配列メモリ20の予め定
められた範囲で行う。
The linear integration calculation section 1 reads out the second layer linear integration matrix from the linear integration matrix memory 31 through the multiplexer 54, and performs linear integration using equation (1). The linearly integrated result is sent to the deviation correction calculation unit 2, and the deviation correction vector of the second layer is read out from the deviation correction vector memory 41 through the multiplexer 55 (deviation correction is performed using Equation 21). After the deviation correction is completed, the similarity calculation unit 3 stores the local feature vectors in the local feature vector memories 1200 and 1201.
, . . . are read out one after another through the multiplexer 52, and the similarity is calculated according to equation (3). The obtained similarity is written into the feature vector array memory 21. This series of processing is performed within a predetermined range of the feature vector array memory 20.

第2層の処理が終了すると、制御回路70の指令により
、記憶された特徴ベクトル群が特徴ベクトル配列メモリ
21より、マルチプレクサ−52を通って特徴点選択部
1に送られる。特徴点選択部1では特徴点位置メモリ6
2に記憶されているる第3層の特徴点選択位置をマルチ
プレクサ−56を通して読みだし、前記局所領域の複数
個の特徴点を該特徴選択位置に従って選択し線形統合演
算部2にすべて送られる。線形統合演算部2では第3層
の線形統合行列を線形統合行列メモリ32からマルチプ
レクサ−54を通して読みだし、(11式により線形統
合する。線形統合された結果は偏位補正演算部3に送ら
れ、第3層の偏位補正ベクトル42からマルチプレクサ
−55を通って読みだされ(21式を使って偏位補正が
なされる。偏位補正終了後、類似度演算部4は局所特徴
ベクトル1300.1301、・・・次々にマルチプレ
クサ−52を通して読みだし、(3)式に従って類似度
が取られる。得られた類似度は特徴ベクトル配列メモリ
22に書き込まれる。
When the second layer processing is completed, the stored feature vector group is sent from the feature vector array memory 21 to the feature point selection section 1 through the multiplexer 52 in response to a command from the control circuit 70. The feature point selection unit 1 stores the feature point position memory 6.
The feature point selection position of the third layer stored in 2 is read out through the multiplexer 56, and a plurality of feature points in the local area are selected according to the feature selection position and all are sent to the linear integration calculation unit 2. The linear integration calculation section 2 reads out the linear integration matrix of the third layer from the linear integration matrix memory 32 through the multiplexer 54, and performs linear integration using equation (11).The linear integration result is sent to the deviation correction calculation section 3. , is read out from the third layer deviation correction vector 42 through the multiplexer 55 (deviation correction is performed using equation 21. After the deviation correction is completed, the similarity calculation unit 4 reads the local feature vector 1300 . 1301, . . . are read out one after another through the multiplexer 52, and the similarity is determined according to equation (3).The obtained similarity is written into the feature vector array memory 22.

制御回路70の指令により、判定手段6は特徴ベクトル
配列メモリ22より類似度を読みだし、最大値を有する
予め定められたカテゴリに識別を行い、該カテゴリを出
力する。
In response to a command from the control circuit 70, the determining means 6 reads the degree of similarity from the feature vector array memory 22, identifies a predetermined category having the maximum value, and outputs the category.

線形統合演算部2は乗算と加算とを必要とし、偏位補正
演算部3は減算を、類似度演算部4は加乗除算と2乗根
の演算を必要とするが、こられは公知の回路で実現でき
るので説明は省略する。
The linear integration calculation unit 2 requires multiplication and addition, the deviation correction calculation unit 3 requires subtraction, and the similarity calculation unit 4 requires addition, multiplication, division, and square root calculation, but these are performed using known methods. Since this can be realized by a circuit, the explanation will be omitted.

尚、本発明は上記実施例にのみ限定されるものではない
。例えば、各層の局所特徴パターンの大きさや個数等は
仕様に応じて定めればよいものであり、特徴の選択位置
についても必要に応じて設定すればよい。また、類似度
は正規化された内積を使っているが、ユークリッド距離
、シティブロック距離等によっても実現できる。さらに
各層は単一層としているが、−複数領域を並列に行うこ
とによっても実現できる。要するに本発明はその要旨を
逸脱しない範囲で種々に変形して実施することができる
Note that the present invention is not limited only to the above embodiments. For example, the size, number, etc. of local feature patterns in each layer may be determined according to specifications, and the selection positions of features may also be set as necessary. Furthermore, although the similarity is determined using a normalized inner product, it can also be achieved using Euclidean distance, City Block distance, or the like. Furthermore, although each layer is a single layer, it can also be realized by performing multiple regions in parallel. In short, the present invention can be modified and implemented in various ways without departing from the gist thereof.

(効果) 以上の通り、本発明によれは局所領域において分散比に
よる特徴点選択を行い判別分析を使っな中間的な識別を
行いながら、局所から全体へと階層的に特徴を抽出し判
定することにより、局所領域におけるノイズ、線幅変動
、位置移動の影響を吸収させ、各層における局所特徴パ
ターン、あるいは、文字パターンのカテゴリ間の差異を
考慮に入れた識別に有効な特徴抽出が行え、最終的に高
精度のパターン認識′が実現できる。
(Effects) As described above, according to the present invention, features are extracted and determined hierarchically from the local area to the whole, while selecting feature points based on the variance ratio in the local area and performing intermediate discrimination using discriminant analysis. By doing so, it is possible to absorb the effects of noise, line width fluctuations, and positional movement in local regions, and extract features effective for identification that take into account local feature patterns in each layer or differences between categories of character patterns. Therefore, highly accurate pattern recognition can be realized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明のパ −ン認識方式の実施例を示す構成
図、第2図は本発明の詳細な説明するための図、第3図
は判別分析を説明するための図、第4図は特徴点選択位
置を説明するための図である。図において、1は特徴点
選択部、2は線形統合演算部、3は偏位補正演算部、4
は類似度演算部、5は局所特徴ベクトル記憶部、6は判
定手段、10はパターン記憶手段、70は制御部をそれ
ぞれ示す。ただし、制御部からの配線は図が複雑になる
ので省略し、入出力を矢印で示した。
FIG. 1 is a block diagram showing an embodiment of the pattern recognition method of the present invention, FIG. 2 is a diagram for explaining the invention in detail, FIG. 3 is a diagram for explaining discriminant analysis, and FIG. The figure is a diagram for explaining feature point selection positions. In the figure, 1 is a feature point selection unit, 2 is a linear integration calculation unit, 3 is a deviation correction calculation unit, and 4
Reference numeral 5 indicates a similarity calculating section, 5 a local feature vector storage section, 6 a determining means, 10 a pattern storage means, and 70 a control section. However, since the wiring from the control section would complicate the diagram, it is omitted, and the input and output are shown with arrows.

Claims (1)

【特許請求の範囲】 1、未知パターンを記憶するパターン記憶手段と、複数
層の各層における局所特徴パターンの特徴点選択位置を
記憶する特徴点位置記憶部と、識別結果である類似度を
記憶する特徴ベクトル配列記憶部と、前記局所領域パタ
ーンで前記特徴点選択位置に従って特徴点を選択する特
徴点選択部と、各層の特徴ベクトル配列を判別分析の手
法を用いて生成するための線形統合演算部、偏位補正演
算部、類似度演算部からなる特徴抽出手段と、最上層の
特徴抽出手段の類似度演算部から出力された類似度の比
較により予め定められた文字カテゴリに判定する判定手
段とからなり、前記パターン記憶手段の出力を最下層の
特徴ベクトル配列とし、各層においては、下位層すべて
の特徴ベクトル配列で前記特徴点選択位置に従って特徴
点の選択を行った特徴ベクトルと判別分析の手法により
各層の予め定めた局所特徴パターンの特徴ベクトルとの
類似度を前記特徴ベクトル配列とすることを特徴とする
パターン認識方式。 2、類似度は前記特徴ベクトル群と前記局所特徴ベクト
ルとの正規化された内積により求めることを特徴とする
特許請求の範囲第1項記載のパターン認識方式。
[Claims] 1. A pattern storage unit that stores unknown patterns, a feature point position storage unit that stores feature point selection positions of local feature patterns in each of the plurality of layers, and stores similarities that are identification results. a feature vector array storage unit, a feature point selection unit that selects feature points according to the feature point selection position in the local area pattern, and a linear integration calculation unit that generates a feature vector array of each layer using a discriminant analysis method. , a feature extracting means comprising a deviation correction calculating section and a similarity calculating section, and a determining means for determining a character into a predetermined category by comparing the degrees of similarity output from the similarity calculating section of the top layer feature extracting means. The output of the pattern storage means is taken as the feature vector array of the lowest layer, and in each layer, feature vectors are selected according to the feature point selection positions in the feature vector arrays of all the lower layers, and a discriminant analysis method is used. A pattern recognition method characterized in that the degree of similarity between a predetermined local feature pattern of each layer and a feature vector is set as the feature vector array. 2. The pattern recognition method according to claim 1, wherein the degree of similarity is determined by a normalized inner product of the feature vector group and the local feature vector.
JP62260930A 1987-10-15 1987-10-15 Pattern recognition system Pending JPH01102688A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62260930A JPH01102688A (en) 1987-10-15 1987-10-15 Pattern recognition system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62260930A JPH01102688A (en) 1987-10-15 1987-10-15 Pattern recognition system

Publications (1)

Publication Number Publication Date
JPH01102688A true JPH01102688A (en) 1989-04-20

Family

ID=17354743

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62260930A Pending JPH01102688A (en) 1987-10-15 1987-10-15 Pattern recognition system

Country Status (1)

Country Link
JP (1) JPH01102688A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009116385A (en) * 2007-11-01 2009-05-28 Sony Corp Information processor, information processing method, image identification device, image identification method, and program

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009116385A (en) * 2007-11-01 2009-05-28 Sony Corp Information processor, information processing method, image identification device, image identification method, and program
US8374437B2 (en) 2007-11-01 2013-02-12 Sony Corporation Information processing apparatus, information processing method, image identifying apparatus, image identifying method, and program

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