JPH01100984A - Method of filling gas in excimer laser equipment - Google Patents
Method of filling gas in excimer laser equipmentInfo
- Publication number
- JPH01100984A JPH01100984A JP25864487A JP25864487A JPH01100984A JP H01100984 A JPH01100984 A JP H01100984A JP 25864487 A JP25864487 A JP 25864487A JP 25864487 A JP25864487 A JP 25864487A JP H01100984 A JPH01100984 A JP H01100984A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- laser
- vacuum
- laser tube
- degree
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 7
- 230000010355 oscillation Effects 0.000 abstract description 6
- 239000012535 impurity Substances 0.000 abstract description 5
- 230000007423 decrease Effects 0.000 abstract description 3
- 238000002161 passivation Methods 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、エキシマレーザ装置のレーザ管内にガスを
充填する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for filling a laser tube of an excimer laser device with gas.
第１図は、エキシマレーザ装置の一例を示す概略図であ
る。FIG. 1 is a schematic diagram showing an example of an excimer laser device.
一端面に反射鏡を、他端面に半透鏡（いずれも図示省略
）を有する円筒状のレーザ管２内に、保持板５に取り付
けられた一対の放電用の電極４、ガス循環ファン６およ
びガス冷却用の熱交換器８が収納されている。更に当該
レーザ管２には、ガス導入管１０、真空引き配管１２等
が接続されており、また熱交換器８には冷却水Ｗが供給
される。A cylindrical laser tube 2 has a reflecting mirror on one end and a semi-transparent mirror on the other end (both not shown), and is equipped with a pair of discharge electrodes 4 attached to a holding plate 5, a gas circulation fan 6, and a gas circulation fan 6. A heat exchanger 8 for cooling is housed. Furthermore, a gas introduction pipe 10, a vacuum piping 12, etc. are connected to the laser tube 2, and cooling water W is supplied to the heat exchanger 8.
この装置を動作させる手順等を簡単に説明すると、まず
真空引き配管１２につながるロータリーポンプ１６によ
ってレーザ管２内を１０−’Ｔｏｒｒ程度にまで真空引
きし、次いでレーザ管２内に、希ガス（例えばＫｒ 、
Ａｒ等）、ハロゲンガス（例えばＦ２等）およびバッフ
ァガス（例えばＨｅ、Ｎｅ等）を所定割合で混合したガ
スＧを例えば３ａｔｎ＋程度充填する。充填されたガス
Ｇは、ガス循環ファン６で混合されレーザ管２内を循環
する。To briefly explain the procedure for operating this device, first, the inside of the laser tube 2 is evacuated to about 10-'Torr using the rotary pump 16 connected to the vacuum piping 12, and then a rare gas ( For example, Kr,
For example, about 3 atn+ is filled with gas G, which is a mixture of Ar, etc.), halogen gas (for example, F2, etc.), and buffer gas (for example, He, Ne, etc.) at a predetermined ratio. The filled gas G is mixed by a gas circulation fan 6 and circulated within the laser tube 2.
そしてその状態で、電極４．４間で放電を起こさせると
、レーザが発振する。In this state, when a discharge is caused between the electrodes 4 and 4, the laser oscillates.
ところがこの発振を続けると、レーザ管２内のガスＧが
劣化すると共に不純物も発生するため、レーザの出力は
徐々に低下する。従って、レーザの出力が所定以下にま
で低下したら、レーザ管２内のガスＧを新しいものと交
換する必要がある。However, if this oscillation continues, the gas G in the laser tube 2 deteriorates and impurities are generated, so the output of the laser gradually decreases. Therefore, when the laser output drops below a predetermined level, it is necessary to replace the gas G in the laser tube 2 with a new one.
ガスＧの交換に際しては、まず、劣化したガスＧを、ハ
ロゲンガスを除去するトラップ１８を通して図示しない
ガス処理装置に排気し、レーザ管２内をほぼ大気圧にす
る。次いで、前述したようにロータリポンプ１６によっ
てレーザ管２内を１ＣＩ’Ｔｏｒｒ程度に真空引きし、
次いでレーザ管２内に新しいガスＧを３ａｔｍ程度充填
する。それ以降は上記と同様である。When replacing the gas G, first, the deteriorated gas G is exhausted to a gas processing device (not shown) through the trap 18 for removing halogen gas, and the inside of the laser tube 2 is brought to approximately atmospheric pressure. Next, as described above, the inside of the laser tube 2 is evacuated to about 1 CI'Torr using the rotary pump 16.
Next, the laser tube 2 is filled with new gas G of about 3 atm. The rest is the same as above.
上記の場合、レーザ管２内に充填したガスＧの寿命は、
それをレーザの平均出力が５０％に低下するまでのショ
ツト数（発振回数）で表すと、従来はせいぜい５Ｘ１０
’ショット程度止まりであり、このガスＧの長寿命化が
エキシマレーザ装置において大きな技術的課題となって
いた。In the above case, the life of the gas G filled in the laser tube 2 is:
Expressing this in terms of the number of shots (number of oscillations) until the average output of the laser drops to 50%, conventionally it was at most 5x10
'The lifespan of this gas G is no more than a shot, and extending the lifespan of this gas G has become a major technical issue in excimer laser devices.
そこでこの発明は、上記のようなガスＧの長寿命化を図
ることができる手段を提供することを主たる目的とする
。Therefore, the main object of the present invention is to provide a means that can extend the life of the gas G as described above.
この発明は、エキシマレーザ装置のレーザ管内にガスを
充填する際、それに先立って当該レーザ管内を１０−３
Ｔｏｒｒオ一ダー以上の真空度にまで真空引きすること
を特徴とする。In this invention, when filling the laser tube of an excimer laser device with gas, the interior of the laser tube is
It is characterized by being evacuated to a vacuum degree of Torr or higher.
ガスを充填する前のレーザ管内の真空度を上記のように
上げることによって、ガスの寿命がかなり延びることが
確かめられた。これは、ガスを充填する前のレーザ管内
の真空度を上記のように上げると、レーザ管内に残留す
る不純ガス（例えばＯｘ 、ＨｔＯ，Ｎ！等・）の量が
減り、その結果レーザ発振に伴って、充填したガス中の
ハロゲンガス等が化合物となってその濃度が低下したり
、エキシマレーザの波長において吸収域を持つ化合物が
生じたりするのが抑えられるからである。It has been confirmed that by increasing the degree of vacuum in the laser tube before filling it with gas as described above, the life of the gas can be significantly extended. This is because if the degree of vacuum inside the laser tube is increased as described above before filling the laser tube with gas, the amount of impurity gas (e.g. Ox, HtO, N!, etc.) remaining in the laser tube will be reduced, and as a result, the laser oscillation will be affected. This is because the halogen gas or the like in the filled gas becomes a compound and its concentration decreases, and the formation of a compound that has an absorption range at the wavelength of the excimer laser is suppressed.
第２図は、この発明に係るガス充填方法による場合のガ
ス寿命による出力低下特性の一例を示すグラフである。FIG. 2 is a graph showing an example of an output reduction characteristic due to gas life when using the gas filling method according to the present invention.
これは、ガスＧを充填する前のレーザ管２内の到達真空
度をＩ Ｏ−’Ｔｏｒｒオーダーにし、ＫｒＦレーザを
繰返し率１００Ｈｚで発振させた場合の例であり、レー
ザの平均出力が５０％に低下するまでのショツト数は３
Ｘ１０’シヨツトであり、従来に比べて１桁近く多くな
っている。This is an example when the ultimate vacuum in the laser tube 2 before being filled with gas G is on the order of IO-'Torr, and the KrF laser is oscillated at a repetition rate of 100Hz, and the average output of the laser is 50%. The number of shots it takes to drop to 3
This is an X10' shot, which is nearly an order of magnitude larger than the conventional model.
しかも、レーザ管２内を上記のような真空度にまで真空
引きすることによって、レーザ管２内の残留ガス量が減
るため、レーザの発振が安定化するまでのパッシベーシ
ョン回数を低減させることもできた。Furthermore, by evacuating the inside of the laser tube 2 to the vacuum level described above, the amount of residual gas inside the laser tube 2 is reduced, so the number of passivations required until laser oscillation is stabilized can be reduced. Ta.
尚、レーザ管２内を真空引きするために、従来は１／４
インチ径の真空引き配管１２とロータリーポンプ１６と
を用いていたが、ロータリーポンプ１６では到達真空度
が低く、また１／４インチ配管１２ではコンダクタンス
が小さいため、レーザ管２内を１０−３Ｔｏｒｒオーダ
ー以上の真空度にまで真空引きするためには、例えば第
３図に示すように、ロータリーポンプ１６の前段に例え
ば油拡散ポンプ、ターボ分子ポンプ、タライオポンプ等
の到達真空度の高い真空ポンプ２６を設けるのが好まし
く、またレーザ管２と真空ポンプ２６管をつなぐ真空引
き配管２２やその途中のバルブ２４もコンダクタンスの
大きい１／２インチ径以上のものを使用するのが好まし
い。そのようにすれば、レーザ管２内の到達真空度の向
上を図ることができると共に、真空引き時間も短縮する
ことができる。In addition, in order to evacuate the inside of the laser tube 2, conventionally the
An inch-diameter vacuum piping 12 and a rotary pump 16 were used, but the rotary pump 16 has a low degree of vacuum, and the 1/4-inch piping 12 has a small conductance, so the inside of the laser tube 2 is on the order of 10-3 Torr. In order to draw the vacuum to the above degree of vacuum, for example, as shown in FIG. 3, a vacuum pump 26 with a high ultimate vacuum such as an oil diffusion pump, a turbo molecular pump, a Talio pump, etc. is provided at the front stage of the rotary pump 16. It is preferable that the vacuum piping 22 connecting the laser tube 2 and the vacuum pump 26 tube and the valve 24 in the middle thereof have a diameter of 1/2 inch or more, which has a large conductance. By doing so, it is possible to improve the degree of vacuum achieved within the laser tube 2, and it is also possible to shorten the evacuation time.
また、空気や不純ガス等がレーザ管２の０リング溝やレ
ーザ管２内にあるねじの部分に溜まるのを防止する手段
を講じておくのが好ましい。そのようにすれば、レーザ
管２内の真空引き時間の短縮と到達真空度の向上を図る
ことができると共に、ガスＧの寿命も延びる。Further, it is preferable to take measures to prevent air, impure gas, etc. from accumulating in the O-ring groove of the laser tube 2 or in the threaded portion inside the laser tube 2. By doing so, it is possible to shorten the evacuation time in the laser tube 2 and improve the degree of vacuum achieved, and the life of the gas G is also extended.
例えば、前述した電極４はその保持ｖｉ５に複数本のビ
スで止められているが、例えば第４図に示すように、各
ビス３２にガス抜き用の貫通穴３４をあけておくのが好
ましい。そのようにすれば、ねじ部の底にあるガス溜り
３６内の不純ガス等は、レーザ管２内を真空引きする際
に貫通穴３４を通して排気される。尚、この貫通穴３４
の代わりに、ビス３２の側面あるいは電極４側のねじ大
の側面にガス抜き用の溝を設けておいても良い。For example, the electrode 4 described above is fixed to its holder vi5 with a plurality of screws, but it is preferable that each screw 32 has a through hole 34 for degassing, as shown in FIG. 4, for example. In this way, impurity gas and the like in the gas reservoir 36 at the bottom of the threaded portion will be exhausted through the through hole 34 when the inside of the laser tube 2 is evacuated. In addition, this through hole 34
Instead, a gas vent groove may be provided on the side surface of the screw 32 or the screw-sized side surface on the electrode 4 side.
また、レーザ管２の端面とそのＭ４４との間は、例えば
第５図に示すように、０リング溝３８内に収納したＯリ
ング４０によって真空シールされているが、この０リン
グ溝３８とレーザ管２の内側とをつなぐガス抜き用の溝
４２を円周上に何個所か設けておくのが好ましい。その
ようにすれば、０リング溝３８内にある不純ガス等は、
レーザ管２内を真空引きする際に溝４２を通して排気さ
れる。尚、この溝４２は貫通穴としても良い。Further, the end face of the laser tube 2 and its M44 are vacuum-sealed by an O-ring 40 housed in an O-ring groove 38, as shown in FIG. 5, for example. It is preferable to provide gas venting grooves 42 at several locations on the circumference to connect the inside of the tube 2. In this way, impurity gas etc. in the O-ring groove 38 will be removed.
When the inside of the laser tube 2 is evacuated, it is evacuated through the groove 42. Note that this groove 42 may be a through hole.
以上のようにこの発明によれば、ガスを充填する前のレ
ーザ管内に残留する不純ガス等の量を減らせることがで
き、その結果ガスの長寿命化を図ることができる。また
、レーザの発振が安定化するまでのパッシベーション回
数を低減させることもできる。As described above, according to the present invention, it is possible to reduce the amount of impure gas, etc. remaining in the laser tube before it is filled with gas, and as a result, the life of the gas can be extended. Furthermore, it is also possible to reduce the number of passivations required until laser oscillation is stabilized.
第１図は、エキシマレーザ装置の一例を示す概略図であ
る。第２図は、この発明に係るガス充填方法による場合
のガス寿命による出力低下特性の一例を示すグラフであ
る。第３図は、真空排気系の一例を示すブロック図であ
る。第４図は、レーザ管内の電極部分の一例を示す拡大
断面図である。
第５図は、レーザ管の端部の一例を示す部分断面図であ
り、第１図の線Ｖ−■方向の断面図に相当する。
２、・・ レーザ管、１６・・・ ロータリーポンプ、
２６・・・到達真空度の高い真空ポンプ、Ｇ・・・ガス
。FIG. 1 is a schematic diagram showing an example of an excimer laser device. FIG. 2 is a graph showing an example of an output reduction characteristic due to gas life when using the gas filling method according to the present invention. FIG. 3 is a block diagram showing an example of a vacuum evacuation system. FIG. 4 is an enlarged sectional view showing an example of an electrode portion within the laser tube. FIG. 5 is a partial sectional view showing an example of the end portion of the laser tube, and corresponds to a sectional view taken along line V--■ in FIG. 2. Laser tube, 16. Rotary pump,
26...Vacuum pump with high ultimate vacuum, G...Gas.
Claims (1)
する際、それに先立って当該レーザ管内を１０＾−＾３
Ｔｏｒｒオーダー以上の真空度にまで真空引きすること
を特徴とするエキシマレーザ装置のガス充填方法。(1) When filling the laser tube of an excimer laser device with gas, first clean the inside of the laser tube by 10^-^3
A gas filling method for an excimer laser device, which is characterized by evacuation to a degree of vacuum of Torr order or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62258644A JP2535960B2 (en) | 1987-10-14 | 1987-10-14 | Gas filling method for excimer laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62258644A JP2535960B2 (en) | 1987-10-14 | 1987-10-14 | Gas filling method for excimer laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01100984A true JPH01100984A (en) | 1989-04-19 |
| JP2535960B2 JP2535960B2 (en) | 1996-09-18 |
Family
ID=17323131
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62258644A Expired - Lifetime JP2535960B2 (en) | 1987-10-14 | 1987-10-14 | Gas filling method for excimer laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2535960B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997036352A1 (en) * | 1996-03-22 | 1997-10-02 | Komatsu Ltd. | Gas laser |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6041276A (en) * | 1983-08-17 | 1985-03-04 | Mitsubishi Electric Corp | Laser medium gas exchanger |
| JPS6316473U (en) * | 1986-07-17 | 1988-02-03 |
-
1987
- 1987-10-14 JP JP62258644A patent/JP2535960B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6041276A (en) * | 1983-08-17 | 1985-03-04 | Mitsubishi Electric Corp | Laser medium gas exchanger |
| JPS6316473U (en) * | 1986-07-17 | 1988-02-03 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997036352A1 (en) * | 1996-03-22 | 1997-10-02 | Komatsu Ltd. | Gas laser |
| US6151350A (en) * | 1996-03-22 | 2000-11-21 | Komatsu Ltd. | Gas laser |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2535960B2 (en) | 1996-09-18 |
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