JP7794338B2 - 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物 - Google Patents

共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

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Publication number
JP7794338B2
JP7794338B2 JP2024569800A JP2024569800A JP7794338B2 JP 7794338 B2 JP7794338 B2 JP 7794338B2 JP 2024569800 A JP2024569800 A JP 2024569800A JP 2024569800 A JP2024569800 A JP 2024569800A JP 7794338 B2 JP7794338 B2 JP 7794338B2
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JP
Japan
Prior art keywords
group
carbon atoms
copolymer
polymerizable monomer
hydrogen atom
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Active
Application number
JP2024569800A
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English (en)
Japanese (ja)
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JPWO2024209937A1 (https=
JPWO2024209937A5 (https=
Inventor
佐和子 土肥
真幸 畑瀬
純平 植野
良平 清水
秀也 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
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DIC Corp
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Publication of JPWO2024209937A1 publication Critical patent/JPWO2024209937A1/ja
Publication of JPWO2024209937A5 publication Critical patent/JPWO2024209937A5/ja
Priority to JP2025177042A priority Critical patent/JP2026009169A/ja
Application granted granted Critical
Publication of JP7794338B2 publication Critical patent/JP7794338B2/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/285—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety
    • C08F220/287—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing a polyether chain in the alcohol moiety and containing polypropylene oxide in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04—Homopolymers or copolymers of monomers containing silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/47—Levelling agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
JP2024569800A 2023-04-06 2024-03-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物 Active JP7794338B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025177042A JP2026009169A (ja) 2023-04-06 2025-10-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023061960 2023-04-06
JP2023061960 2023-04-06
PCT/JP2024/010922 WO2024209937A1 (ja) 2023-04-06 2024-03-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025177042A Division JP2026009169A (ja) 2023-04-06 2025-10-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

Publications (3)

Publication Number Publication Date
JPWO2024209937A1 JPWO2024209937A1 (https=) 2024-10-10
JPWO2024209937A5 JPWO2024209937A5 (https=) 2025-03-12
JP7794338B2 true JP7794338B2 (ja) 2026-01-06

Family

ID=92973127

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024569800A Active JP7794338B2 (ja) 2023-04-06 2024-03-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物
JP2025177042A Pending JP2026009169A (ja) 2023-04-06 2025-10-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025177042A Pending JP2026009169A (ja) 2023-04-06 2025-10-21 共重合体および当該共重合体を含むコーティング組成物又はレジスト組成物

Country Status (6)

Country Link
EP (1) EP4692141A1 (https=)
JP (2) JP7794338B2 (https=)
KR (1) KR20250166860A (https=)
CN (1) CN120882765A (https=)
TW (1) TW202440690A (https=)
WO (1) WO2024209937A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW202540239A (zh) * 2024-03-26 2025-10-16 日商Ｄｉｃ股份有限公司 硬塗層形成用組成物、膜、積層體、偏光板及圖像顯示裝置
WO2025249552A1 (ja) * 2024-05-31 2025-12-04 大阪有機化学工業株式会社 硬化性組成物、硬化物、ポリマー、および、レジスト用ポリマー

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029680A (ja) 2002-06-28 2004-01-29 Fuji Photo Film Co Ltd 平版印刷版用原板
JP2006225389A (ja) 2005-02-15 2006-08-31 L'oreal Sa ポリマー粒子分散体を含む化粧品組成物、ポリマー粒子分散体およびこれを使用する美容方法
JP2007524519A (ja) 2004-01-23 2007-08-30 ユニバーシティー オブ マサチューセッツ 構造化材料および方法
WO2021131726A1 (ja) 2019-12-25 2021-07-01 Dic株式会社 重合体及び当該重合体を含むコーティング組成物
WO2022244586A1 (ja) 2021-05-18 2022-11-24 Dic株式会社 シリコーン鎖含有重合体、コーティング組成物、レジスト組成物及び物品

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL128965C (https=) 1963-09-06
JP4097434B2 (ja) 2002-02-07 2008-06-11 楠本化成株式会社 非水塗料用平滑剤

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004029680A (ja) 2002-06-28 2004-01-29 Fuji Photo Film Co Ltd 平版印刷版用原板
JP2007524519A (ja) 2004-01-23 2007-08-30 ユニバーシティー オブ マサチューセッツ 構造化材料および方法
JP2006225389A (ja) 2005-02-15 2006-08-31 L'oreal Sa ポリマー粒子分散体を含む化粧品組成物、ポリマー粒子分散体およびこれを使用する美容方法
WO2021131726A1 (ja) 2019-12-25 2021-07-01 Dic株式会社 重合体及び当該重合体を含むコーティング組成物
WO2022244586A1 (ja) 2021-05-18 2022-11-24 Dic株式会社 シリコーン鎖含有重合体、コーティング組成物、レジスト組成物及び物品

Also Published As

Publication number Publication date
JP2026009169A (ja) 2026-01-19
JPWO2024209937A1 (https=) 2024-10-10
WO2024209937A1 (ja) 2024-10-10
TW202440690A (zh) 2024-10-16
CN120882765A (zh) 2025-10-31
KR20250166860A (ko) 2025-11-28
EP4692141A1 (en) 2026-02-11

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