JP7489053B2 - measuring device - Google Patents

Description

An embodiment of the present invention relates to a measuring device.

Some measuring devices measure the amount of microorganisms, such as E. coli, contained in a specimen. Such measuring devices perform a specific process on the specimen to produce a sample liquid, and then measure the amount of microorganisms contained in the produced sample liquid.

Conventionally, in the process of producing sample liquid from a specimen, there is a risk that microorganisms contained in the specimen may grow and affect the measurement results.

JP 2001-526780 A

To solve the above problem, we provide a measurement device that can suppress the proliferation of microorganisms contained in a sample.

According to an embodiment, the measurement device includes a container, a suppression mechanism, a stage, an irradiator, a receiver, and a processor. The container holds a sample liquid containing a specimen. The suppression mechanism heats the sample liquid held in the container to suppress the growth of microorganisms contained in the specimen. The stage holds a substrate having a structure to which the sample liquid containing the microorganisms whose growth has been suppressed by the suppression mechanism is attached. The irradiator irradiates the structure with electromagnetic waves. The receiver receives a reflected wave or a transmitted wave from the structure. The processor measures the amount of the microorganisms contained in the sample liquid based on the intensity of the reflected wave or the transmitted wave received by the receiver. The suppression mechanism heats the sample liquid to a predetermined heating temperature according to control from the processor, and maintains the temperature of the sample liquid at the heating temperature for a predetermined time, thereby sterilizing the microorganisms.

FIG. 1 is a diagram illustrating an example of the configuration of a measurement apparatus according to a first embodiment. FIG. 2 is a block diagram showing an example of the configuration of the measurement apparatus according to the first embodiment. FIG. 3 is a top view illustrating a schematic configuration example of the substrate according to the first embodiment. FIG. 4 is a cross-sectional view that illustrates a schematic configuration example of the substrate according to the first embodiment. FIG. 5 is a flowchart showing an example of the operation of the measurement apparatus according to the first embodiment. FIG. 6 is a flowchart showing an example of the operation of the measurement apparatus according to the first embodiment. FIG. 7 is a flowchart showing an example of the operation of the measurement apparatus according to the first embodiment. FIG. 8 is a diagram illustrating an example of the configuration of a measurement apparatus according to the second embodiment. FIG. 9 is a flowchart showing an example of the operation of the measurement apparatus according to the second embodiment. FIG. 10 is a diagram illustrating an example of the configuration of a measurement apparatus according to the third embodiment. FIG. 11 is a flowchart showing an example of the operation of the measurement apparatus according to the third embodiment.

Hereinafter, the embodiments will be described with reference to the drawings. Note that each drawing is a schematic diagram for facilitating understanding of the embodiments, and the shapes, dimensions, ratios, and the like may be appropriately modified.
First Embodiment
First, the first embodiment will be described.
A measuring device according to an embodiment measures the amount of a specific microorganism (such as Escherichia coli) contained in a specimen such as food. The measuring device generates a sample liquid by performing a predetermined process on the specimen. The measuring device measures the amount of the microorganism contained in the sample liquid.

Figure 1 shows a schematic configuration example of the measuring device 1. As shown in Figure 1, the measuring device 1 includes a control device 11, an electromagnetic wave irradiator 12, a stage 16, an electromagnetic wave receiver 18, a substrate 20, an inlet 30, a mixer 31, a filter 32, a container 33, a suppression mechanism 34, a temperature sensor 35, a reaction container 36, a pipette mechanism 37, a valve 41 (a first valve 41a and a second valve 41b), a drive circuit 212, and an A/D converter 218.

The measuring device 1 may further include components as necessary in addition to the components shown in FIG. 1, or certain components may be excluded from the measuring device 1.

The control device 11 controls the entire measuring device 1. The control device 11 transmits control signals to control each part. The control device 11 also receives various signals from each part of the measuring device 1. For example, the control device 11 causes the electromagnetic wave irradiator 12 to irradiate electromagnetic waves. The control device 11 also acquires the intensity of the electromagnetic waves received by the electromagnetic wave receiver 18. The control device 11 measures the amount of microorganisms attached to the substrate 20 based on the intensity of the electromagnetic waves, etc.
The control device 11 will be described in detail later.

The inlet 30 is a hole through which the user puts in the specimen, cleaning fluid, etc. For example, the specimen is food such as meat or vegetables. The inlet 30 is connected to the upper end of the mixer 31. That is, the specimen and cleaning fluid put into the inlet 30 are put into the mixer 31. Here, the cleaning fluid containing the specimen is referred to as sample fluid 50.

The mixer 31 (crusher) crushes the specimen in the cleaning liquid. The mixer 31 is composed of a container for storing the sample liquid 50 and a blade for crushing the specimen. The mixer 31 crushes the specimen by rotating the blade inside the container.

The lower end of the mixer 31 is connected to the upper end of the filter 32. That is, the sample liquid 50 in which the specimen pulverized by the mixer 31 is suspended is fed into the filter 32.

The filter 32 filters the sample liquid 50. That is, the filter 32 removes unnecessary impurities from the sample liquid 50. The filter 32 includes a filter 32a. The filter 32a allows substances of a predetermined size to pass through. That is, the filter 32a allows the microorganisms to be measured to pass through and prevents the passage of impurities.

The lower end of the filter 32 is connected to the upper end of the container 33. That is, the sample liquid 50 filtered by the filter 32 is poured into the container 33. In addition, a first valve 41a is formed between the filter 32 and the container 33. The first valve 41a controls the passage of the sample liquid 50 into the container 33.

The container 33 holds the sample liquid 50 from the filter 32. The container 33 is formed to a predetermined size. The lower end of the container 33 is connected to the reaction container 36. That is, the sample liquid 50 held in the container 33 is poured into the reaction container 36. In addition, a second valve 41b is formed between the container 33 and the reaction container 36.

The second valve 41b controls the passage of the sample liquid 50 into the reaction vessel 36. While the second valve 41b is closed, the vessel 33 holds the sample liquid 50.

The container 33 is provided with a suppression mechanism 34. The suppression mechanism 34 suppresses (inactivates) the proliferation of microorganisms (microorganisms to be detected) contained in the sample liquid 50 held by the container 33. In other words, the suppression mechanism 34 suppresses the proliferation of microorganisms contained in the specimen. For example, the suppression mechanism 34 performs a sterilization process.

Here, the suppression mechanism 34 heats the sample liquid 50 held in the container 33. The suppression mechanism 34 heats the sample liquid 50 to a predetermined heating temperature (e.g., 100°C) according to control from the control device 11, and maintains the temperature of the sample liquid 50 at the heating temperature for a predetermined heating time (e.g., 1 hour). For example, the suppression mechanism 34 is composed of a heater for heating the sample liquid 50.

The suppression mechanism 34 may suppress the proliferation of microorganisms by cooling the sample liquid 50. The suppression mechanism 34 may suppress the proliferation of microorganisms by irradiating the sample liquid 50 with ultraviolet rays, radiation, or the like. The suppression mechanism 34 may be formed in contact with the container 33 or not. The suppression mechanism 34 may be formed inside the container 33.
The configuration and suppression method of the suppression mechanism 34 are not limited to a specific configuration.

The temperature sensor 35 is formed inside the container 33. The temperature sensor 35 measures the temperature of the sample liquid 50 held in the container 33. For example, the temperature sensor 35 is composed of a thermistor or the like.

The reaction vessel 36 holds the sample liquid 50 from the vessel 33. The reaction vessel 36 is a vessel for reacting a predetermined substance with the microorganisms contained in the sample liquid 50. For example, the reaction vessel 36 is a vessel for carrying out an antigen-antibody reaction. For example, the control device 11 puts an antibody modified with magnetic beads into the reaction vessel 36, and fixes the antibody modified with magnetic beads to the microorganisms (for example, the microorganisms killed by the suppression mechanism 34). The pipette mechanism 37 applies the sample liquid 50 held in the reaction vessel 36 onto the substrate 20 under the control of the control device 11. The pipette mechanism 37 applies the sample liquid 50 onto the substrate 20 after the antigen-antibody reaction is completed.

For example, the pipette mechanism 37 has an aspiration mechanism that sucks in liquid, a liquid delivery mechanism that discharges liquid, and a movement mechanism that moves the liquid discharge position. The aspiration mechanism is fitted with a pipette tip from a pipette tip rack or the like.

The pipette mechanism 37, which serves as a liquid delivery mechanism, draws in and releases liquid from the tip of the attached pipette tip. The tip of the pipette tip attached to the pipette mechanism 37 has a shape that allows it to draw in and inject sample liquid 50 held in the reaction vessel 36, for example. This allows the pipette mechanism 37 to draw in or inject sample liquid 50 from the reaction vessel 36 through the tip of the pipette tip based on the control of the control device 11.

The pipette mechanism 37, which serves as a moving mechanism, moves the attachment portion of the pipette tip. The pipette mechanism 37 moves the attachment portion of the pipette tip three-dimensionally within the measurement device 1. For example, the pipette mechanism 37 moves the attached pipette tip to a position instructed by the control device 11, and aspirates or expels sample liquid 50 from the tip of the pipette tip.

The electromagnetic wave irradiator 12 irradiates the substrate 20 with electromagnetic waves (irradiation waves) according to control from the drive circuit 212. For example, the electromagnetic wave irradiator 12 irradiates electromagnetic waves with a frequency corresponding to the voltage applied from the drive circuit 212. For example, the electromagnetic wave irradiator 12 irradiates electromagnetic waves with a frequency of about several terahertz. The electromagnetic wave irradiator 12 may be equipped with an optical system that focuses the irradiation waves on the substrate 20.

The stage 16 is a member that supports the substrate 20. The stage 16 is fixed to a predetermined table. Note that the stage 16 may move the substrate 20 under the control of the control device 11.

The electromagnetic wave receiver 18 measures the intensity of the reflected wave. For example, the electromagnetic wave receiver 18 outputs a voltage corresponding to the intensity of the reflected wave to the control device 11. For example, the electromagnetic wave receiver 18 is composed of an optical sensor such as a phototransistor. The electromagnetic wave receiver 18 may also be equipped with an optical system that focuses the reflected wave on the optical sensor of the electromagnetic wave receiver 18.

The drive circuit 212 is connected to the electromagnetic wave irradiator 12. The drive circuit 212 controls the electromagnetic wave irradiator 12. For example, the drive circuit 212 applies a voltage to the electromagnetic wave irradiator 12 based on a control signal from the control device 11. That is, the drive circuit 212 converts the control signal into an analog signal and applies it to the electromagnetic wave irradiator 12.

The A/D converter 218 is connected to the electromagnetic wave receiver 18. The A/D converter 218 generates a sensor signal (e.g., a digital signal) indicating the voltage output by the electromagnetic wave receiver 18. That is, the A/D converter 218 converts the voltage from the electromagnetic wave receiver 18 into a digital signal. The A/D converter 218 transmits the sensor signal to the control device 11. The A/D converter 218 may include an amplifier that amplifies the voltage output by the electromagnetic wave receiver 18.

Figure 2 is a block diagram showing an example of the configuration of the control system of the measuring device 1. As shown in Figure 2, the measuring device 1 includes a control device 11, an electromagnetic wave irradiator 12, an input device 13, an electromagnetic wave receiver 18, a mixer 31, a suppression mechanism 34, a temperature sensor 35, a pipette mechanism 37, a valve 41, a drive circuit 212, an A/D converter 218, a drive circuit 231, a drive circuit 234, an A/D converter 235, a drive circuit 237, and a drive circuit 241.

The control device 11 includes a processor 111, a memory 112, an input interface 113, an interface 114, a timer 115, and a bus line 120.

The processor 111, memory 112, input interface 113, interface 114 and timer 115 are connected to the bus line 120. The input device 13 is connected to the input interface 113. The drive circuit 212, A/D converter 218, drive circuit 231, drive circuit 234, A/D converter 235, drive circuit 237 and drive circuit 241 are connected to the interface 114. The electromagnetic wave irradiator 12 is connected to the drive circuit 212. The electromagnetic wave receiver 18 is connected to the A/D converter 218. The mixer 31 is connected to the drive circuit 231. The suppression mechanism 34 is connected to the drive circuit 234. The temperature sensor 35 is connected to the A/D converter 235. The pipette mechanism 37 is connected to the drive circuit 237. The valve 41 is connected to the drive circuit 241.

The measuring device 1 may further include configurations as necessary in addition to the configuration shown in FIG. 2, or certain configurations may be excluded from the measuring device 1.

The electromagnetic wave irradiator 12, stage 16, electromagnetic wave receiver 18, substrate 20, inlet 30, mixer 31, filter 32, container 33, suppression mechanism 34, temperature sensor 35, reaction container 36, pipette mechanism 37, valve 41, drive circuit 212 and A/D converter 218 are as described above.

The processor 111 controls the operation of the entire control device 11. For example, the processor 111 causes the electromagnetic wave irradiator 12 to irradiate electromagnetic waves. The processor 111 also measures the amount of microorganisms based on the intensity of the reflected waves received by the electromagnetic wave receiver 18.

For example, the processor 111 is composed of a CPU or the like. The processor 111 may also be composed of an ASIC (Application Specific Integrated Circuit) or the like. The processor 111 may also be composed of an FPGA (Field Programmable Gate Array) or the like.

The memory 112 stores various data. For example, the memory 112 functions as a ROM, a RAM, and an NVM.
For example, the memory 112 stores a control program, control data, etc. The control program and control data are pre-installed according to the specifications of the control device 11. For example, the control program is a program that supports functions realized by the control device 11.

In addition, memory 112 temporarily stores data being processed by processor 111. Memory 112 may also store data required for the execution of application programs and the execution results of application programs.

The bus line 120 supplies control signals from the processor 111 to each component. The bus line 120 also supplies signals from each component to the processor 111.

The input interface 113 is an interface for transmitting and receiving data to and from the input device 13. The input interface 113 supplies a signal from the input device 13 to the processor 111. The input interface 113 may also supply a signal from the processor 111 to the input device 13. For example, the input interface 113 supports a USB (Universal Serial Bus) connection, etc.

The interface 114 is an interface for transmitting and receiving data with the drive circuit 212, the A/D converter 218, the drive circuit 231, the drive circuit 234, the A/D converter 235, the drive circuit 237, and the drive circuit 241. The interface 114 supplies signals from each section to the processor 111. The input interface 113 also supplies signals from the processor 111 to each section.

The timer 115 measures time according to the control of the processor 111. The timer 115 starts measuring time according to a signal from the processor 111. The timer 115 also sends a signal indicating the measured time to the processor 111. The timer 115 also stops measuring time or resets according to a signal from the processor 111.

The drive circuit 231 controls the mixer 31 according to control from the processor 111. For example, the drive circuit 231 supplies power to the mixer 31.

The drive circuit 234 controls the suppression mechanism 34 according to control from the processor 111. For example, the drive circuit 234 supplies power to a heater that constitutes the suppression mechanism 34. The drive circuit 234 may control the power applied to the heater that constitutes the suppression mechanism 34 according to control from the processor 111.

The A/D converter 235 generates a sensor signal (e.g., a digital signal) indicating the voltage output by the temperature sensor 35. That is, the A/D converter 235 converts the voltage from the temperature sensor 35 into a digital signal. The A/D converter 235 transmits the sensor signal to the control device 11. The A/D converter 235 may include an amplifier that amplifies the voltage output by the temperature sensor 35.

The drive circuit 237 controls the pipette mechanism 37 according to control from the processor 111. For example, the drive circuit 237 causes the pipette mechanism 37 to transport the pipette tip. The drive circuit 237 also causes the pipette mechanism 37 to aspirate or expel the sample liquid 50 from the tip of the pipette tip.

The drive circuit 241 controls the valve 41 under control of the processor 111. That is, the drive circuit 241 opens and closes the valve 41. Next, the substrate 20 will be described.
Fig. 3 is a top view of the substrate 20. Fig. 4 is a cross-sectional view taken along line F4-F4.
As shown in FIGS. 3 and 4, the substrate 20 is composed of a base material 21, a structure 22, and the like.

The substrate 21 is formed, for example, into a rectangle of a predetermined size. The substrate 21 is made of a material that does not change in response to the electromagnetic waves irradiated by the electromagnetic wave irradiator 12. That is, the substrate 21 is made of a material that is transparent in the frequency band of the electromagnetic waves irradiated by the electromagnetic wave irradiator 12. The substrate 21 is, for example, a silicon wafer made of silicon. The substrate 21 may also be made of an organic material such as polyethylene.

The thickness of the substrate is in the range of 100 to 800 μm. For example, the thickness of the substrate 21 is about 525 μm.
The material and the outer dimensions of the base material 21 are not limited to a specific configuration.

The structure 22 is supported by the base material 21. The structure 22 has a peak in the frequency characteristics of the reflectance of the electromagnetic wave. The structure 22 is composed of structures of a predetermined shape that contribute to the peak. The structure 22 has a peak in the frequency band of the electromagnetic wave irradiated by the electromagnetic wave irradiator 12, for example.
When microorganisms adhere to the structure 22, the reflectance of the structure 22 changes.

Structure 22 is a ring-shaped structure. Structure 22 is a ring-shaped structure with a portion cut off. For example, structure 22 is formed in a C-shape.

The structure 22 is formed from a conductor such as gold or aluminum (metal). The structure 22 may be a structure having multiple layers. For example, the structure 22 may have a layer of chromium or titanium as an adhesion layer with the substrate 21.

For example, the outer dimension of the structure 22 is about 18 μm. The width of the structure 22 (the width of the ring) is about 3 μm. The thickness of the structure 22 is in the range of 0.1 μm to 50 μm. The thickness of the structure 22 is about 0.2 μm.
The structures 22 may be any structure that resonates with electromagnetic waves, and the shape, size, and number of the structures 22 are not limited to a specific configuration.

The structure 22 forms a split ring resonator. The structure 22 forms an LCR (coil, capacitor, resistor) circuit by the split ring resonator. The structure 22 has a resonant characteristic at a predetermined resonant frequency by the LCR circuit.

A plurality of structures 22 are formed on the base material 21 as periodic structures, a plurality of which are periodically arranged. Note that the structure 22 may be a layer formed on the base material 21 and have voids of a predetermined shape. For example, the structure 22 may have a plurality of voids periodically arranged in a shape in which a part of a ring is cut (C-shaped).

Next, the functions realized by the control device 11 will be described. The following functions are realized by the processor 111 of the control device 11 executing a program stored in the memory 112 or the like.

First, the processor 111 has the function of causing the suppression mechanism to suppress the proliferation of microorganisms contained in the sample liquid 50.

Here, it is assumed that the user has put a sample and a cleaning solution into the inlet 30. It is also assumed that the first valve 41a and the second valve 41b are closed.

The processor 111 causes the mixer 31 to crush the specimen in the cleaning liquid. For example, the processor 111 causes the drive circuit 231 to drive the mixer 31. The mixer 31 crushes the specimen using power from the drive circuit 231.

When the mixer 31 crushes the specimen, the processor 111 pours the sample liquid 50 in which the crushed specimen is suspended from the mixer 31 into the filter 32. For example, the processor 111 opens the opening and closing part at the bottom end of the mixer 31.

The filter 32 filters the sample liquid 50 from the mixer 31. That is, the filter 32a removes unnecessary impurities from the sample liquid.

When the filter 32 filters the sample liquid 50, the processor 111 opens the first valve 41a. That is, the processor 111 pours the sample liquid 50 from the filter 32 into the container 33.

When the sample liquid 50 is poured into the container 33, the processor 111 causes the suppression mechanism 34 to suppress the proliferation of microorganisms contained in the sample liquid 50. That is, the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50.

The suppression mechanism 34 heats the sample liquid 50 under control of the processor 111. The temperature sensor 35 measures the temperature of the sample liquid 50 under control of the processor 111. The suppression mechanism 34 heats the sample liquid 50 until the temperature of the sample liquid 50 reaches a predetermined heating temperature (for example, 100°C).

The suppression mechanism 34 also maintains the temperature of the sample liquid 50 at the heating temperature for a predetermined time (e.g., one hour). For example, when the temperature of the sample liquid 50 reaches the predetermined heating temperature, the processor 111 causes the timer 115 to start measuring time. The processor 111 causes the suppression mechanism 34 to maintain the temperature of the sample liquid 50 at the heating temperature until the time measured by the timer 115 exceeds the predetermined heating time.

The processor 111 also has the function of causing the pipette mechanism 37 to apply the sample liquid 50 onto the structure 22 of the substrate 20.

When heating of the sample liquid 50 is completed, the processor 111 opens the second valve 41b. By opening the second valve 41b, the sample liquid 50 is poured from the container 33 into the reaction container 36.

The processor 111 may perform a predetermined process (e.g., an antigen-antibody reaction) on the sample liquid 50 in the reaction vessel 36.

The pipette mechanism 37 aspirates the sample liquid 50 from the reaction vessel 36 under control of the processor 111. The pipette mechanism 37 transports the aspirated sample liquid 50 and releases the sample liquid 50 onto the structure 22 of the substrate 20 under control of the processor 111.

The processor 111 may also heat and dry the sample liquid 50 attached to the structure 22 using a specified heater or the like.

The processor 111 also has the function of measuring the amount of microorganisms contained in the sample liquid 50 attached to the substrate 20.

When the pipette mechanism 37 applies the sample liquid 50 to the structure 22 of the substrate 20, the electromagnetic wave irradiator 12 irradiates the structure 22 with electromagnetic waves under the control of the processor 111. That is, the processor 111 causes the drive circuit 212 to apply a predetermined voltage to the electromagnetic wave irradiator 12.

The electromagnetic wave emitted by the electromagnetic wave emitter 12 is reflected by the structure 22. The electromagnetic wave reflected by the structure 22 (reflected wave) is irradiated to the electromagnetic wave receiver 18.

The electromagnetic wave receiver 18 receives the reflected wave. Upon receiving the reflected wave, the electromagnetic wave receiver 18 outputs a voltage corresponding to the intensity (reception intensity) of the received reflected wave to the A/D converter 218. The A/D converter 218 outputs a sensor signal indicating the voltage from the electromagnetic wave receiver 18 to the processor 111.

The processor 111 receives the sensor signal from the A/D converter 218 to obtain the reception strength.

Once the reception strength is acquired, the processor 111 measures the amount of microorganisms based on the reception strength.

As mentioned above, when microorganisms are attached to the structure 22, the reflectance of the structure 22 changes.

The processor 111 calculates the reflectance of the structure 22 based on the intensity (irradiation intensity) of the electromagnetic waves irradiated by the electromagnetic wave irradiator 12 and the received intensity.

The processor 111 also obtains the reflectance of the structure 22 when no microorganisms are attached from the memory 112, etc.

The processor 111 determines the amount of microorganisms present in the structure 22 based on the difference between the two reflectances.

When the processor 111 determines the amount of microorganisms, it outputs the determination result. For example, the processor 111 causes the display unit to display the determination result. The processor 111 may also transmit the determination result to an external device via a communication interface or the like.

In addition, if the two reflectances match (for example, if the difference between the two reflectances is equal to or less than a predetermined threshold value), the processor 111 may determine that no microorganisms are present in the structure 22.

Next, an example of the operation of the measuring device 1 will be described.
FIG. 5 is a flowchart for explaining an example of the operation of the measurement device 1.
Here, it is assumed that the user has put a sample and a cleaning solution into the inlet 30 .

First, the processor 111 of the measurement device 1 causes the mixer 31 to crush the sample (ACT 11). After causing the mixer 31 to crush the sample, the processor 111 passes the sample liquid 50 from the mixer 31 through the filter 32 to remove unnecessary impurities from the sample liquid 50 (ACT 12).

After removing unnecessary impurities from the sample liquid 50, the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50 (ACT 13). After causing the suppression mechanism 34 to heat the sample liquid 50, the processor 111 causes the pipette mechanism 37 to attach the sample liquid 50 to the structure 22 of the substrate 20 (ACT 14).

When the pipette mechanism 37 applies the sample liquid 50 to the structure 22 of the substrate 20, the processor 111 measures the amount of microorganisms applied to the structure 22 using the electromagnetic wave irradiator 12 and the electromagnetic wave receiver 18 (ACT 15). When the amount of microorganisms is measured, the processor 111 ends the operation.

Next, an example of an operation (ACT 13) in which the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50 will be described.
6 and 7 are flow charts for explaining an example of an operation (ACT 13) in which the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50. In the example of FIG.

First, the processor 111 causes the drive circuit 241 to open the first valve 41a (ACT 21). After causing the drive circuit 241 to open the first valve 41a, the processor 111 obtains the preset heating temperature and heating time from the memory 112 or the like (ACT 22).

After acquiring the heating temperature and heating time, the processor 111 causes the suppression mechanism 34 to start heating the sample liquid 50 (ACT 23). After causing the suppression mechanism 34 to start heating the sample liquid 50, the processor 111 causes the temperature sensor 35 to measure the temperature of the sample liquid 50 (ACT 24).

After the temperature sensor 35 measures the temperature of the sample liquid 50, the processor 111 determines whether the temperature of the sample liquid 50 has reached the heating temperature (ACT 25). If it is determined that the temperature of the sample liquid 50 has not reached the heating temperature (ACT 25, NO), the processor 111 returns to ACT 24.

When it is determined that the temperature of the sample liquid 50 has reached the heating temperature (ACT 25, YES), the processor 111 causes the suppression mechanism 34 to end the heating of the sample liquid 50 (ACT 26). When the suppression mechanism 34 ends the heating of the sample liquid 50, the processor 111 starts the timer 115 (ACT 27).

When the timer 115 is started, the processor 111 causes the temperature sensor 35 to measure the temperature of the sample liquid 50 (ACT 28). When the temperature sensor 35 measures the temperature of the sample liquid 50, the processor 111 determines whether the measured temperature is the heating temperature (ACT 29).

If it is determined that the measured temperature is not the heating temperature (ACT 29, NO), the processor 111 causes the suppression mechanism 34 to start heating the sample liquid 50 (ACT 30).

When it is determined that the measured temperature is the heating temperature (ACT 29, YES), the processor 111 causes the suppression mechanism 34 to end heating of the sample liquid 50 (ACT 31). Note that if the suppression mechanism 34 is not heating the sample liquid 50, the processor 111 does not need to execute ACT 31.

When the suppression mechanism 34 is caused to start heating the sample liquid 50 (ACT 30), or when the suppression mechanism 34 is caused to stop heating the sample liquid 50 (ACT 31), the processor 111 determines whether the time measured by the timer 115 has reached the heating time (ACT 32).

If the processor 111 determines that the time measured by the timer 115 has not reached the heating time (ACT 32, NO), the processor 111 returns to ACT 28.

When it is determined that the time measured by the timer 115 has reached the heating time (ACT 32, YES), the processor 111 stops the timer 115 (ACT 33). When the timer 115 is stopped, the processor 111 causes the drive circuit 241 to open the second valve 41b (ACT 34).

When the drive circuit 241 opens the second valve 41b, the processor 111 ends its operation.

The pipette mechanism 37 may attach the sample liquid 50 to the substrate 20 that is set at a predetermined location other than the stage 16. In this case, the processor 111 may cause a predetermined moving mechanism to set the substrate 20 with the sample liquid 50 attached from the predetermined location to the stage 16. The user may also set the substrate 20 with the sample liquid 50 attached to the stage 16.

The measuring device 1 may also measure the amount of microorganisms based on the intensity of the transmitted wave that passes through the structure 22. For example, the electromagnetic wave receiver 18 is formed at a position facing the electromagnetic wave irradiator 12 with respect to the substrate 20. The electromagnetic wave receiver 18 measures the intensity of the transmitted wave that passes through the substrate 20.

The measurement device 1 may also measure the amount of microorganisms contained in the sample liquid 50 using other methods. The method by which the measurement device 1 measures the amount of microorganisms contained in the sample liquid 50 is not limited to a specific method.

The measuring device configured as described above heats the sample liquid in the process of generating the sample liquid to be applied to the substrate from the specimen. Therefore, the measuring device can suppress the proliferation of microorganisms contained in the sample liquid. As a result, the measuring device can accurately measure the amount of microorganisms contained in the specimen.
Second Embodiment
Next, a second embodiment will be described.
The measuring device according to the second embodiment differs from the measuring device 1 according to the first embodiment in that an inlet 30 is connected to a container 33. Therefore, the other points are denoted by the same reference numerals and detailed description thereof will be omitted.

Figure 8 shows a schematic configuration example of a measuring device 1' according to the second embodiment. As shown in Figure 8, the measuring device 1' includes a control device 11, an electromagnetic wave irradiator 12, a stage 16, an electromagnetic wave receiver 18, a substrate 20, an inlet 30, a mixer 31, a filter 32, a container 33, a suppression mechanism 34, a temperature sensor 35, a reaction container 36, a pipette mechanism 37, a second valve 41b, a drive circuit 212, and an A/D converter 218.

In addition, the measuring device 1' may include additional components as necessary in addition to the components shown in FIG. 8, or certain components may be excluded from the measuring device 1'.

The control device 11 controls the entire measuring device 1'.

The inlet 30 is connected to the upper end of the container 33. That is, the specimen and cleaning solution introduced into the inlet 30 are introduced into the container 33.

The lower end of the container 33 is connected to the upper end of the mixer 31. That is, the sample liquid 50 held in the container 33 is introduced into the mixer 31. The suppression mechanism 34 suppresses the growth of microorganisms before the mixer 31 crushes the specimen.
In addition, a second valve 41b is formed between the container 33 and the mixer 31. The second valve 41b controls the passage of the sample liquid 50 to the reaction container 36. While the second valve 41b is closed, the container 33 holds the sample liquid 50.

The lower end of the mixer 31 is connected to the upper end of the filter 32. That is, the sample liquid 50 in which the specimen pulverized by the mixer 31 is suspended is fed into the filter 32.

The lower end of the filter 32 is connected to the reaction vessel 36. That is, the sample liquid 50 filtered by the filter 32 is poured into the reaction vessel 36.

Next, an example of the operation of the measuring device 1' will be described.
FIG. 9 is a flowchart for explaining an example of the operation of the measurement device 1′.
Here, it is assumed that the user has put a sample and a cleaning solution into the inlet 30 .

First, the processor 111 of the measurement device 1' causes the suppression mechanism 34 to heat the sample liquid 50, which is composed of the introduced specimen and cleaning liquid (ACT 41). After heating the sample liquid 50, the processor 111 causes the mixer 31 to crush the specimen (ACT 42). After causing the mixer 31 to crush the specimen, the processor 111 passes the sample liquid 50 from the mixer 31 through the filter 32 to remove unnecessary impurities from the sample liquid 50 (ACT 43).

After removing unwanted contaminants from the sample liquid 50, the processor 111 causes the pipette mechanism 37 to apply the sample liquid 50 to the structure 22 of the substrate 20 (ACT 44).

When the pipette mechanism 37 applies the sample liquid 50 to the structure 22 of the substrate 20, the processor 111 measures the amount of microorganisms applied to the structure 22 using the electromagnetic wave irradiator 12 and the electromagnetic wave receiver 18 (ACT 45). When the amount of microorganisms is measured, the processor 111 ends the operation.

An example of the operation (ACT41) in which the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50 is similar to ACT13, and therefore will not be described. Note that in the second embodiment, the processor 111 does not need to execute ACT21.

The measuring device configured as described above heats the sample liquid before the process of crushing the specimen and the process of filtering the sample liquid. Therefore, the measuring device can suppress the proliferation of microorganisms at an earlier stage. Therefore, the measuring device can measure the amount of microorganisms contained in the specimen more accurately.
Third Embodiment
Next, a third embodiment will be described.

The measuring device according to the third embodiment differs from the measuring device 1 according to the first embodiment in that the container 33 is connected to the inlet 30 and the reaction container 36. Therefore, the other points are given the same reference numerals and detailed explanations are omitted.

Figure 10 shows a schematic configuration example of a measuring device 1'' according to the third embodiment. As shown in Figure 10, the measuring device 1' includes a control device 11, an electromagnetic wave irradiator 12, a stage 16, an electromagnetic wave receiver 18, a substrate 20, an input port 30, a container 33, a suppression mechanism 34, a temperature sensor 35, a reaction container 36, a pipette mechanism 37, a second valve 41b, a drive circuit 212, and an A/D converter 218.

In addition, the measuring device 1'' may be provided with additional components as necessary in addition to the components shown in FIG. 10, or certain components may be excluded from the measuring device 1''.

The control device 11 controls the entire measuring device 1''.

The inlet 30 is connected to the upper end of the container 33. That is, the specimen and cleaning solution introduced into the inlet 30 are introduced into the container 33.

The lower end of the container 33 is connected to the reaction container 36. That is, the sample liquid 50 from the container 33 is poured into the reaction container 36. In addition, a second valve 41b is formed between the container 33 and the reaction container 36.

The second valve 41b controls the passage of the sample liquid 50 into the reaction vessel 36. While the second valve 41b is closed, the vessel 33 holds the sample liquid 50.

Next, an example of the operation of the measuring device 1'' will be described.
FIG. 11 is a flowchart for explaining an example of the operation of the measuring device 1 ″.
Here, it is assumed that the user has put a sample and a cleaning solution into the inlet 30 .

First, the processor 111 of the measuring device 1 causes the suppression mechanism 34 to heat the sample liquid 50, which is composed of the sample and cleaning liquid that have been introduced (ACT 51). After heating the sample liquid 50, the processor 111 causes the pipette mechanism 37 to attach the sample liquid 50 to the structure 22 of the substrate 20 (ACT 52).

When the pipette mechanism 37 applies the sample liquid 50 to the structure 22 of the substrate 20, the processor 111 measures the amount of microorganisms applied to the structure 22 using the electromagnetic wave irradiator 12 and the electromagnetic wave receiver 18 (ACT 53). When the amount of microorganisms is measured, the processor 111 ends the operation.

An example of the operation (ACT51) in which the processor 111 causes the suppression mechanism 34 to heat the sample liquid 50 is similar to ACT13, and therefore will not be described. Note that in the third embodiment, the processor 111 does not need to execute ACT21.

The measuring device configured as described above does not perform the process of crushing the input specimen or the process of removing impurities. Therefore, the measuring device can measure the amount of microorganisms contained in the sample liquid without the need for the above processes.

Although some embodiments of the present invention have been described, these embodiments are presented as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the spirit of the invention. These embodiments and their modifications are included in the scope and spirit of the invention, and are included in the scope of the invention and its equivalents described in the claims.
In addition, the claims as originally filed of this application are set forth below.
[C1]
A container for holding a sample liquid containing a specimen;
an inhibition mechanism for inhibiting the proliferation of microorganisms contained in the specimen;
a stage for holding a substrate having a structure to which the sample liquid containing the microorganisms whose proliferation has been inhibited by the inhibition mechanism is applied;
An irradiator that irradiates the structure with electromagnetic waves;
A receiver for receiving a reflected wave or a transmitted wave from the structure;
a processor that measures the amount of the microorganisms contained in the sample liquid based on the intensity of the reflected wave or the transmitted wave received by the receiver;
A measuring device comprising:
[C2]
The suppression mechanism heats the sample liquid held in the container.
2. The measuring device of claim 1.
[C3]
A crusher for crushing the specimen is provided.
3. The measuring device according to claim 1 or 2.
[C4]
The measurement device according to claim 3 , wherein the suppression mechanism suppresses the proliferation of the microorganisms after the crusher crushes the specimen.
[C5]
The measurement device according to claim 3 , wherein the suppression mechanism suppresses the proliferation of the microorganisms before the crusher crushes the specimen.

1...measuring device, 1'...measuring device, 1''...measuring device, 11...control device, 12...electromagnetic wave irradiator, 13...input device, 16...stage, 18...electromagnetic wave receiver, 20...substrate, 21...base material, 22...structure, 30...inlet, 31...mixer, 32...filter, 32a...filter, 33...container, 34...suppression mechanism, 35...temperature sensor, 36...reaction vessel, 37...pipette mechanism, 41...valve, 41a...first valve, 41b...second valve, 50...sample liquid, 111...processor, 112...memory, 113...input interface, 114...interface, 115...timer, 120...bus line, 212...drive circuit, 218...A/D converter, 231...drive circuit, 234...drive circuit, 235...A/D converter, 237...drive circuit, 241...drive circuit.

Claims (4)

A container for holding a sample liquid containing a specimen;
an inhibition mechanism for heating the sample liquid held in the container to inhibit the proliferation of microorganisms contained in the specimen;
a stage for holding a substrate having a structure to which the sample liquid containing the microorganisms whose proliferation has been inhibited by the inhibition mechanism is applied;
An irradiator that irradiates the structure with electromagnetic waves;
A receiver for receiving a reflected wave or a transmitted wave from the structure;
a processor that measures the amount of the microorganisms contained in the sample liquid based on the intensity of the reflected wave or the transmitted wave received by the receiver ;
the suppression mechanism performs a sterilization process on the microorganisms by heating the sample liquid to a predetermined heating temperature and maintaining the temperature of the sample liquid at the heating temperature for a predetermined heating time under the control of the processor;
measuring device. A crusher for crushing the specimen is provided.
2. The measuring device of claim 1 . The measurement device according to claim 2 , wherein the suppression mechanism suppresses the proliferation of the microorganisms after the crusher crushes the specimen. The measurement device according to claim 2 , wherein the suppression mechanism suppresses the growth of the microorganisms before the crusher crushes the specimen.