JP7388296B2 - Silicon-containing tetracarboxylic dianhydride, its production method and polyimide resin - Google Patents
Silicon-containing tetracarboxylic dianhydride, its production method and polyimide resin Download PDFInfo
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- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 title claims description 29
- 125000006158 tetracarboxylic acid group Chemical group 0.000 title claims description 29
- 229920001721 polyimide Polymers 0.000 title claims description 27
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 26
- 229910052710 silicon Inorganic materials 0.000 title claims description 26
- 239000010703 silicon Substances 0.000 title claims description 25
- 239000009719 polyimide resin Substances 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- -1 silane compound Chemical class 0.000 claims description 15
- 150000008065 acid anhydrides Chemical class 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 7
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- 239000003960 organic solvent Substances 0.000 description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 239000004642 Polyimide Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 229920005575 poly(amic acid) Polymers 0.000 description 5
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000002329 infrared spectrum Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- UHXCHUWSQRLZJS-UHFFFAOYSA-N (4-dimethylsilylidenecyclohexa-2,5-dien-1-ylidene)-dimethylsilane Chemical compound C[Si](C)C1=CC=C([Si](C)C)C=C1 UHXCHUWSQRLZJS-UHFFFAOYSA-N 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 2
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- DRDSKOMREAIEJM-UHFFFAOYSA-N (4-diethylsilylphenyl)-diethylsilane Chemical compound CC[SiH](CC)C1=CC=C([SiH](CC)CC)C=C1 DRDSKOMREAIEJM-UHFFFAOYSA-N 0.000 description 1
- WJPCIELTJWREGF-UHFFFAOYSA-N (4-diphenylsilylphenyl)-diphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC(=CC=1)[SiH](C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 WJPCIELTJWREGF-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- SBDAXUUMFAKLQO-UHFFFAOYSA-N 1-ethyl-4-oxatricyclo[5.2.1.02,6]dec-8-ene-3,5-dione Chemical compound O=C1OC(=O)C2C1C1(CC)C=CC2C1 SBDAXUUMFAKLQO-UHFFFAOYSA-N 0.000 description 1
- QYXVDGZUXHFXTO-UHFFFAOYSA-L 3-oxobutanoate;platinum(2+) Chemical compound [Pt+2].CC(=O)CC([O-])=O.CC(=O)CC([O-])=O QYXVDGZUXHFXTO-UHFFFAOYSA-L 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- KNRCVAANTQNTPT-UHFFFAOYSA-N methyl-5-norbornene-2,3-dicarboxylic anhydride Chemical compound O=C1OC(=O)C2C1C1(C)C=CC2C1 KNRCVAANTQNTPT-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Description
本発明は、ケイ素含有テトラカルボン酸二無水物に関し、さらに詳述すると、ポリアミド酸およびポリイミドの原料として有用なケイ素含有テトラカルボン酸二無水物、その製造方法ならびにポリイミド樹脂に関する。 The present invention relates to a silicon-containing tetracarboxylic dianhydride, and more specifically, to a silicon-containing tetracarboxylic dianhydride useful as a raw material for polyamic acid and polyimide, a method for producing the same, and a polyimide resin.
従来、ポリイミド樹脂は、耐熱性、耐燃性、電気・機械的特性などを有する樹脂として知られており、銅張積層板、多層プリント配線板材料などの複合材料として使用されている。また、ポリイミド樹脂は、LSIの多層配線用パッシベーション膜、メモリー素子用α線遮断膜、磁気ヘッドなどの多層配線絶縁膜、液晶配線向膜などのワニスとして、またフレキシブルプリント配線板基板などのフィルムとしても利用されている。
しかし、一般的なポリイミド樹脂は、芳香族テトラカルボン酸二無水物を原料とするものであり、高耐熱性である一方で、光透過性や有機溶剤への溶解性に乏しいという問題がある。
この点、光学分野での使用を目的に、光透過性を向上させるため、脂環式テトラカルボン酸二無水物を原料としたポリイミドが提案されている(特許文献1,2)が、これらのポリイミドも有機溶剤への溶解性は不十分であるうえ、合成方法が煩雑で高コストとなるという問題がある。
Conventionally, polyimide resins have been known as resins having heat resistance, flame resistance, electrical and mechanical properties, etc., and are used as composite materials such as copper-clad laminates and multilayer printed wiring board materials. Polyimide resins are also used as varnishes for passivation films for multilayer wiring in LSIs, α-ray blocking films for memory devices, multilayer wiring insulating films for magnetic heads, liquid crystal wiring alignment films, and as films for flexible printed wiring board substrates. is also used.
However, common polyimide resins are made from aromatic tetracarboxylic dianhydride, and while they have high heat resistance, they have the problem of poor light transmittance and poor solubility in organic solvents.
In this regard, polyimides made from alicyclic tetracarboxylic dianhydrides have been proposed for use in the optical field in order to improve light transmittance (Patent Documents 1 and 2), but these Polyimide also has problems in that it has insufficient solubility in organic solvents, and the synthesis method is complicated and expensive.
本発明は、上記事情に鑑みなされたもので、有機溶剤への溶解性および光透過性に優れるポリイミド樹脂を与えるテトラカルボン酸二無水物、その製造方法およびポリイミド樹脂を提供することを目的とする。 The present invention was made in view of the above circumstances, and aims to provide a tetracarboxylic dianhydride that provides a polyimide resin with excellent solubility in organic solvents and light transmittance, a method for producing the same, and a polyimide resin. .
本発明者は、上記課題を解決すべく鋭意検討した結果、ケイ素原子を含有する所定のテトラカルボン酸二無水物が、有機溶剤への溶解性および光透過性に優れるポリイミド樹脂を与えることを見出し、本発明を完成した。 As a result of intensive studies aimed at solving the above problems, the inventors of the present invention discovered that a certain silicon atom-containing tetracarboxylic dianhydride provides a polyimide resin with excellent solubility in organic solvents and light transmittance. , completed the invention.
即ち、本発明は、
1. 下記一般式(1)で表されるケイ素含有テトラカルボン酸二無水物、
(式中、R1は、それぞれ独立に炭素原子数1~12の一価炭化水素基であり、R2は、それぞれ独立に水素原子または炭素原子数1~12の一価炭化水素基であり、Aは、下記構造式(2)
2. 下記一般式(3)で表されるシラン化合物と、下記一般式(4)で表される酸無水物とをヒドロシリル化反応させる1記載のケイ素含有テトラカルボン酸二無水物の製造方法、
3. 1記載のケイ素含有テトラカルボン酸二無水物を含む単量体の重合物であるポリイミド樹脂
を提供する。
That is, the present invention
1. A silicon-containing tetracarboxylic dianhydride represented by the following general formula (1),
(In the formula, R 1 is each independently a monovalent hydrocarbon group having 1 to 12 carbon atoms, and R 2 is each independently a hydrogen atom or a monovalent hydrocarbon group having 1 to 12 carbon atoms. , A is the following structural formula (2)
2. The method for producing a silicon-containing tetracarboxylic dianhydride according to 1, in which a silane compound represented by the following general formula (3) and an acid anhydride represented by the following general formula (4) are subjected to a hydrosilylation reaction,
3. The present invention provides a polyimide resin which is a polymer of a monomer containing the silicon-containing tetracarboxylic dianhydride described in 1 above.
本発明のケイ素含有テトラカルボン酸二無水物は、ポリイミドの原料に使用することができる。本発明のケイ素含有テトラカルボン酸二無水物を原料に使用したポリイミドは、有機溶剤への溶解性および光透過性に優れ、光学用途などに有用である。 The silicon-containing tetracarboxylic dianhydride of the present invention can be used as a raw material for polyimide. The polyimide using the silicon-containing tetracarboxylic dianhydride of the present invention as a raw material has excellent solubility in organic solvents and light transmittance, and is useful for optical applications.
以下、本発明をさらに詳しく説明する。
本発明のケイ素含有テトラカルボン酸二無水物は、下記一般式(1)で表される。
The present invention will be explained in more detail below.
The silicon-containing tetracarboxylic dianhydride of the present invention is represented by the following general formula (1).
式(1)中、R1は、それぞれ独立に炭素原子数1~12の一価炭化水素基であり、R2は、それぞれ独立に水素原子または炭素原子数1~12の一価炭化水素基である。
R1およびR2の炭素原子数1~12の一価炭化水素基としては、直鎖、分岐、環状のいずれでもよく、具体例としては、メチル、エチル、n-プロピル、イソプロピル、n-ブチル、イソブチル、n-オクチル、シクロヘキシル基等のアルキル基、フェニル、トリル、ナフチル基等のアリール基などが挙げられる。これらの中でも原料入手の点から、R1およびR2は、炭素原子数1~6のアルキル基が好ましく、メチル基がより好ましい。
In formula (1), R 1 is each independently a monovalent hydrocarbon group having 1 to 12 carbon atoms, and R 2 is each independently a hydrogen atom or a monovalent hydrocarbon group having 1 to 12 carbon atoms. It is.
The monovalent hydrocarbon group having 1 to 12 carbon atoms for R 1 and R 2 may be linear, branched, or cyclic, and specific examples include methyl, ethyl, n-propyl, isopropyl, and n-butyl. Examples include alkyl groups such as , isobutyl, n-octyl, and cyclohexyl groups, and aryl groups such as phenyl, tolyl, and naphthyl groups. Among these, from the viewpoint of raw material availability, R 1 and R 2 are preferably an alkyl group having 1 to 6 carbon atoms, and more preferably a methyl group.
Aは、下記構造式(2)で表される二価の基であり、破線は、結合手を表す。 A is a divalent group represented by the following structural formula (2), and the broken line represents a bond.
本発明のケイ素含有テトラカルボン酸二無水物の具体例としては、下記のものが例示される。 Specific examples of the silicon-containing tetracarboxylic dianhydride of the present invention include the following.
本発明のケイ素含有テトラカルボン酸二無水物は、例えば、下記一般式(3)で表されるシラン化合物と、下記一般式(4)で表される酸無水物とをヒドロシリル化反応させることにより得られる。 The silicon-containing tetracarboxylic dianhydride of the present invention can be obtained, for example, by subjecting a silane compound represented by the following general formula (3) to a hydrosilylation reaction with an acid anhydride represented by the following general formula (4). can get.
式(3)および(4)中、R1およびR2は、上記式(1)中のR1およびR2と同じである。 In formulas (3) and (4), R 1 and R 2 are the same as R 1 and R 2 in formula (1) above.
シラン化合物(3)の具体例としては、1,4-ビス(ジメチルシリル)ベンゼン、1,4-ビス(ジエチルシリル)ベンゼン、1,4-ビス(ジフェニルシリル)ベンゼン、1,3-ビス(ジメチルシリル)ベンゼンなどが挙げられる。 Specific examples of the silane compound (3) include 1,4-bis(dimethylsilyl)benzene, 1,4-bis(diethylsilyl)benzene, 1,4-bis(diphenylsilyl)benzene, 1,3-bis( Examples include dimethylsilyl)benzene.
酸無水物(4)の具体例としては、5-ノルボルネン-2,3-ジカルボン酸無水物、メチル-5-ノルボルネン-2,3-ジカルボン酸無水物、エチル-5-ノルボルネン-2,3-ジカルボン酸無水物などが挙げられる。 Specific examples of the acid anhydride (4) include 5-norbornene-2,3-dicarboxylic anhydride, methyl-5-norbornene-2,3-dicarboxylic anhydride, and ethyl-5-norbornene-2,3-dicarboxylic anhydride. Examples include dicarboxylic acid anhydrides.
シラン化合物(3)と酸無水物(4)の使用量は、シラン化合物中のSi-H基1モルに対し、酸無水物中の炭素-炭素二重結合の量が1.0~3.0モルとなる量が好ましい。 The amount of the silane compound (3) and the acid anhydride (4) to be used is such that the amount of carbon-carbon double bonds in the acid anhydride is 1.0 to 3.0 to 3.0% per mole of Si--H groups in the silane compound. The amount is preferably 0 mol.
ヒドロシリル化反応触媒としては、従来から公知のものを全て使用することができる。例えば、白金金属を担持したカーボン粉末、白金黒、塩化第2白金、塩化白金酸、塩化白金酸と一価アルコールとの反応生成物、白金とジビニルテトラメチルジシロキサン等のビニルシロキサンとの錯体;塩化白金酸とオレフィン類との錯体、白金ビスアセトアセテート等の白金系触媒;パラジウム系触媒;ロジウム系触媒などの白金族金属系触媒が挙げられる。 As the hydrosilylation reaction catalyst, all conventionally known catalysts can be used. For example, carbon powder supporting platinum metal, platinum black, platinum chloride, chloroplatinic acid, reaction products of chloroplatinic acid and monohydric alcohol, complexes of platinum and vinyl siloxanes such as divinyltetramethyldisiloxane; Examples include platinum-based catalysts such as complexes of chloroplatinic acid and olefins, platinum bisacetoacetate; palladium-based catalysts; and platinum group metal-based catalysts such as rhodium-based catalysts.
触媒の使用量は、触媒としての有効量でよく、特に限定されないが、通常、上記シラン化合物と酸無水物の合計質量に対して、白金族金属の質量基準で好ましくは1~500ppm、特に好ましくは2~200ppm程度を配合するとよい。 The amount of the catalyst to be used may be an effective amount as a catalyst, and is not particularly limited, but it is usually preferably 1 to 500 ppm, particularly preferably 1 to 500 ppm based on the mass of the platinum group metal, based on the total mass of the silane compound and acid anhydride. It is preferable to mix about 2 to 200 ppm.
上記付加反応(ヒドロシリル化反応)は溶媒を用いなくても進行するが、溶媒を用いることにより穏和な条件で反応を行うことができる。溶媒としては、例えば、トルエン、キシレン等の芳香族炭化水素系溶媒;ヘキサン、オクタン等の脂肪族炭化水素系溶媒;テトラヒドロフラン、ジオキサン等のエーテル系溶媒などが挙げられ、これらは1種単独であるいは2種以上を組み合わせて用いることができる。 Although the above addition reaction (hydrosilylation reaction) proceeds without using a solvent, the reaction can be carried out under mild conditions by using a solvent. Examples of the solvent include aromatic hydrocarbon solvents such as toluene and xylene; aliphatic hydrocarbon solvents such as hexane and octane; and ether solvents such as tetrahydrofuran and dioxane. Two or more types can be used in combination.
反応温度は、20~150℃が好ましく、50~120℃がより好ましく、反応時間は、1~24時間が好ましい。 The reaction temperature is preferably 20 to 150°C, more preferably 50 to 120°C, and the reaction time is preferably 1 to 24 hours.
このようにして得られる本発明のケイ素含有テトラカルボン酸二無水物は、ポリアミド酸やポリイミドなどの原料として有用である。本発明のケイ素含有テトラカルボン酸二無水物をモノマーとして上記樹脂を製造することで、透明性および有機溶剤への溶解性の高い樹脂を得ることができる。 The silicon-containing tetracarboxylic dianhydride of the present invention thus obtained is useful as a raw material for polyamic acid, polyimide, and the like. By producing the above resin using the silicon-containing tetracarboxylic dianhydride of the present invention as a monomer, a resin having high transparency and solubility in organic solvents can be obtained.
ポリイミド樹脂を合成する際に用いられるジアミン化合物としては、特に限定されるものではなく、従来公知のジアミン化合物から適宜選択して用いることができ、その具体例としては、テトラメチレンジアミン、1,4-ジアミノシクロヘキサン、4,4’-ジアミノジシクロヘキシルメタン等の脂肪族ジアミン;o-フェニレンジアミン、m-フェニレンジアミン、p-フェニレンジアミン、4,4’-ジアミノジフェニルエーテル、2,2-ビス(4-アミノフェニル)プロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン等の芳香族ジアミンなどが挙げられ、これらはそれぞれ1種単独で用いても、2種以上組み合わせて用いてもよい。
なお、本発明においては、上述したケイ素含有テトラカルボン酸二無水物とともに、ポリイミド製造に用いられる公知のテトラカルボン酸二無水物を併用してもよいが、透明性および有機溶剤への溶解性を高めるという観点からは、本発明のケイ素含有テトラカルボン酸二無水物を単独で用いることが好ましい。
The diamine compound used when synthesizing the polyimide resin is not particularly limited, and can be appropriately selected from conventionally known diamine compounds. Specific examples include tetramethylene diamine, 1,4 - Aliphatic diamines such as diaminodicyclohexane, 4,4'-diaminodicyclohexylmethane; o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 4,4'-diaminodiphenyl ether, 2,2-bis(4-amino Examples include aromatic diamines such as phenyl)propane and 2,2-bis[4-(4-aminophenoxy)phenyl]propane, which may be used alone or in combination of two or more. good.
In the present invention, a known tetracarboxylic dianhydride used in the production of polyimide may be used in combination with the silicon-containing tetracarboxylic dianhydride described above, but transparency and solubility in organic solvents may be From the viewpoint of increasing the temperature, it is preferable to use the silicon-containing tetracarboxylic dianhydride of the present invention alone.
また、本発明のポリイミド樹脂は、公知の方法で製造することができる。
例えば、まず、ケイ素含有テトラカルボン酸二無水物およびジアミン化合物を溶剤中に仕込み、20~50℃程度で反応させて、ポリイミド樹脂の前駆体であるポリアミド酸を製造する。次に、得られたポリアミド酸の溶液を、好ましくは60~200℃に昇温し、ポリアミック酸の酸アミドを脱水閉環反応させてポリイミド樹脂の溶液を得た後、この溶液を、水、メタノール、エタノール、アセトニトリル等の溶剤に投入して沈殿させ、生じた沈殿物を乾燥することにより、ポリイミド樹脂を得ることができる。
Moreover, the polyimide resin of the present invention can be manufactured by a known method.
For example, first, a silicon-containing tetracarboxylic dianhydride and a diamine compound are placed in a solvent and reacted at about 20 to 50°C to produce polyamic acid, which is a precursor of polyimide resin. Next, the temperature of the obtained polyamic acid solution is preferably raised to 60 to 200°C, and the acid amide of the polyamic acid is subjected to a dehydration ring-closing reaction to obtain a polyimide resin solution. A polyimide resin can be obtained by pouring the resin into a solvent such as , ethanol, acetonitrile, etc. to precipitate it, and drying the resulting precipitate.
本発明のポリイミド樹脂の重量平均分子量は、特に限定されるものではないが、当該樹脂から得られる皮膜の強度と、溶剤への溶解性とのバランスを考慮すると、5,000~100,000が好ましく、10,000~50,000がより好ましい。
なお、本発明における重量平均分子量は、テトラヒドロフラン(THF)を溶媒とするゲル浸透クロマトグラフィー(以下、GPCと略すこともある)によるポリスチレン換算値である。
The weight average molecular weight of the polyimide resin of the present invention is not particularly limited, but considering the balance between the strength of the film obtained from the resin and the solubility in solvents, it is between 5,000 and 100,000. Preferably, 10,000 to 50,000 is more preferable.
Note that the weight average molecular weight in the present invention is a polystyrene equivalent value determined by gel permeation chromatography (hereinafter sometimes abbreviated as GPC) using tetrahydrofuran (THF) as a solvent.
以下、実施例および比較例を用いて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。 The present invention will be specifically described below using Examples and Comparative Examples, but the present invention is not limited thereto.
[実施例1-1]ケイ素含有テトラカルボン酸二無水物の製造
撹拌装置、冷却管、滴下ロートおよび温度計を備えた500mLの4つ口フラスコに、5-ノルボルネン-2,3-ジカルボン酸無水物25.0g(152ミリモル)およびトルエン62.5gを加え、撹拌しながらオイルバスを用いて80℃に加熱した。これに、2質量%塩化白金酸のエタノール溶液0.22gを添加し、撹拌しながら1,4-ビス(ジメチルシリル)ベンゼン8.88g(45.7ミリモル)を15分かけて滴下した。滴下終了後、さらに90℃で2時間加熱撹拌し、その後室温まで冷却した。析出した白色沈殿を濾別し、濾物にトルエン40gを加え、130℃で30分撹拌した。室温まで冷却した後、析出した白色沈殿を濾別した。得られた濾物を50℃、0.4kPaの環境で乾燥し、白色固体15.3g(収率64%)を得た。
この白色固体をIRおよび1H-NMRで分析した結果、下記構造式(5)で表されるケイ素含有テトラカルボン酸二無水物であることが確認された。IRおよび1H-NMR測定結果を図1および図2に示す。
[Example 1-1] Production of silicon-containing tetracarboxylic dianhydride 5-norbornene-2,3-dicarboxylic anhydride was placed in a 500 mL four-necked flask equipped with a stirring device, cooling tube, dropping funnel, and thermometer. 25.0 g (152 mmol) of C. and 62.5 g of toluene were added thereto, and the mixture was heated to 80.degree. C. using an oil bath while stirring. To this was added 0.22 g of a 2% by mass chloroplatinic acid solution in ethanol, and 8.88 g (45.7 mmol) of 1,4-bis(dimethylsilyl)benzene was added dropwise over 15 minutes while stirring. After the dropwise addition was completed, the mixture was further heated and stirred at 90° C. for 2 hours, and then cooled to room temperature. The precipitated white precipitate was filtered off, 40 g of toluene was added to the filtrate, and the mixture was stirred at 130°C for 30 minutes. After cooling to room temperature, the precipitated white precipitate was filtered off. The obtained filter material was dried in an environment of 50° C. and 0.4 kPa to obtain 15.3 g (yield: 64%) of a white solid.
As a result of analyzing this white solid by IR and 1 H-NMR, it was confirmed that it was a silicon-containing tetracarboxylic dianhydride represented by the following structural formula (5). The results of IR and 1 H-NMR measurements are shown in FIGS. 1 and 2.
1H-NMR:7.46ppm(4H,s,Hi)、2.96~2.89ppm(4H,m,Hb,c)、2.83~2.77ppm(4H,m,Ha,d)、1.69~1.54ppm(4H,m,Hf,g)、1.18~1.11ppm(4H,m,Hf,g)、0.94~0.86ppm(2H,m,He)、0.31ppm、および0.30ppm(12H,s,Hh) 1 H-NMR: 7.46 ppm (4H, s, H i ), 2.96 to 2.89 ppm (4H, m, H b,c ), 2.83 to 2.77 ppm (4H, m, H a, d ), 1.69 to 1.54 ppm (4H, m, H f,g ), 1.18 to 1.11 ppm (4H, m, H f,g ), 0.94 to 0.86 ppm (2H, m , H e ), 0.31 ppm, and 0.30 ppm (12H,s,H h )
[実施例2-1]ポリイミド樹脂の製造
撹拌装置、冷却管および温度計を備えた100mLの3つ口フラスコに、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン1.57g(3.82ミリモル)およびN,N-ジメチルアセトアミド(DMAc)14.3gを加え、撹拌して均一になったところに、実施例1-1で得られた化合物2.00g(3.83ミリモル)を加え、室温で17時間撹拌を続けた。次に、トリエチルアミン1.16g(11.5ミリモル)、無水酢酸1.17g(11.5ミリモル)を順に加え、80℃で3時間イミド化を行った。溶液を室温まで冷却した後、50gのメタノールに滴下して沈殿を析出させた。沈殿を濾別し、50gのメタノールで洗浄後、80℃、0.4kPaの環境で乾燥し、白色粉末状の樹脂2.96g(収率87%)を得た。THFを溶媒とするGPCにより、この樹脂の重量平均分子量(ポリスチレン換算)を測定したところ、21,000であった。
得られた樹脂のIRスペクトルを図3に示す。1706および1774cm-1にイミドカルボニル由来のC=O伸縮振動が見られることから、ポリイミド樹脂であることが確認された。
[Example 2-1] Production of polyimide resin 1.57 g of 2,2-bis[4-(4-aminophenoxy)phenyl]propane was placed in a 100 mL three-necked flask equipped with a stirrer, a cooling tube, and a thermometer. (3.82 mmol) and 14.3 g of N,N-dimethylacetamide (DMAc) were added and stirred until the mixture became homogeneous. Then, 2.00 g (3.83 mmol) of the compound obtained in Example 1-1 was added. ) and continued stirring at room temperature for 17 hours. Next, 1.16 g (11.5 mmol) of triethylamine and 1.17 g (11.5 mmol) of acetic anhydride were added in this order, and imidization was performed at 80° C. for 3 hours. After the solution was cooled to room temperature, it was added dropwise to 50 g of methanol to precipitate. The precipitate was filtered, washed with 50 g of methanol, and dried at 80° C. and 0.4 kPa to obtain 2.96 g of white powdery resin (87% yield). The weight average molecular weight (in terms of polystyrene) of this resin was measured by GPC using THF as a solvent and found to be 21,000.
The IR spectrum of the obtained resin is shown in FIG. Since C═O stretching vibrations derived from imidocarbonyl were observed at 1706 and 1774 cm −1 , it was confirmed that it was a polyimide resin.
得られた樹脂は、クロロホルム、THF、およびDMAcに溶解した。 The resulting resin was dissolved in chloroform, THF, and DMAc.
得られた樹脂を10質量%のTHF溶液とし、枠を設けたスライドガラス上に広げ、40℃1時間、次いで80℃1時間の環境下にさらし、15μm厚みのフィルムを作製した。分光光度計(U3310型((株)日立製作所製))を用いてこのフィルムが付いたガラスの光透過率、およびガラス単体の光透過率を測定し、その差からフィルムの透過率を算出したところ、波長400~800nmの範囲で98%以上であった。 The resulting resin was made into a 10% by mass THF solution, spread on a slide glass provided with a frame, and exposed to an environment of 40° C. for 1 hour and then 80° C. for 1 hour to produce a 15 μm thick film. The light transmittance of the glass with this film attached and the light transmittance of the glass itself were measured using a spectrophotometer (Model U3310 (manufactured by Hitachi, Ltd.)), and the transmittance of the film was calculated from the difference. However, it was 98% or more in the wavelength range of 400 to 800 nm.
上記のように、本発明のケイ素含有テトラカルボン酸二無水物を原料に使用したポリイミド樹脂は、有機溶剤への溶解性、および光透過性に優れる材料となることが示された。 As described above, it has been shown that the polyimide resin using the silicon-containing tetracarboxylic dianhydride of the present invention as a raw material is a material with excellent solubility in organic solvents and excellent light transmittance.
Claims (4)
(式中、R1は、それぞれ独立にメチル基、エチル基またはフェニル基であり、R2は、水素原子であり、R 2 ’は、それぞれ独立に水素原子、メチル基またはエチル基であり、Aは、下記構造式(2)
(In the formula, R 1 is each independently a methyl group, ethyl group, or phenyl group, R 2 is a hydrogen atom, and R 2 ' is each independently a hydrogen atom , methyl group, or ethyl group , A is the following structural formula (2)
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Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1702097A (en) | 2005-07-01 | 2005-11-30 | 清华大学 | Optical polyimide containing isosorbide unit and process for preparing same |
JP2008163090A (en) | 2006-12-27 | 2008-07-17 | Mitsubishi Chemicals Corp | Tetracarboxylic acid dianhydride, method for producing the same and polymer |
JP2009143848A (en) | 2007-12-14 | 2009-07-02 | Shin Etsu Chem Co Ltd | Novel silphenylene compound, and method of preparing the same |
WO2010095329A1 (en) | 2009-02-18 | 2010-08-26 | 日立化成工業株式会社 | Novel liquid tetracarboxylic dianhydrides and process for the preparation thereof |
WO2013061823A1 (en) | 2011-10-25 | 2013-05-02 | セントラル硝子株式会社 | Siloxane-based composition and cured product thereof, and use therefor |
JP2015000983A (en) | 2013-06-13 | 2015-01-05 | 達興材料股▲ふん▼有限公司Daxin Materials Corporation | Siloxane diacid anhydride, polymer, liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display |
JP2017115163A (en) | 2017-03-30 | 2017-06-29 | Jxtgエネルギー株式会社 | Polymer, photosensitive composition, pattern formation method and color filter |
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Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1702097A (en) | 2005-07-01 | 2005-11-30 | 清华大学 | Optical polyimide containing isosorbide unit and process for preparing same |
JP2008163090A (en) | 2006-12-27 | 2008-07-17 | Mitsubishi Chemicals Corp | Tetracarboxylic acid dianhydride, method for producing the same and polymer |
JP2009143848A (en) | 2007-12-14 | 2009-07-02 | Shin Etsu Chem Co Ltd | Novel silphenylene compound, and method of preparing the same |
WO2010095329A1 (en) | 2009-02-18 | 2010-08-26 | 日立化成工業株式会社 | Novel liquid tetracarboxylic dianhydrides and process for the preparation thereof |
WO2013061823A1 (en) | 2011-10-25 | 2013-05-02 | セントラル硝子株式会社 | Siloxane-based composition and cured product thereof, and use therefor |
JP2015000983A (en) | 2013-06-13 | 2015-01-05 | 達興材料股▲ふん▼有限公司Daxin Materials Corporation | Siloxane diacid anhydride, polymer, liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display |
JP2017115163A (en) | 2017-03-30 | 2017-06-29 | Jxtgエネルギー株式会社 | Polymer, photosensitive composition, pattern formation method and color filter |
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