JP7317754B2 - 金属ナノ粒子の製造方法 - Google Patents
金属ナノ粒子の製造方法 Download PDFInfo
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- JP7317754B2 JP7317754B2 JP2020048185A JP2020048185A JP7317754B2 JP 7317754 B2 JP7317754 B2 JP 7317754B2 JP 2020048185 A JP2020048185 A JP 2020048185A JP 2020048185 A JP2020048185 A JP 2020048185A JP 7317754 B2 JP7317754 B2 JP 7317754B2
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- metal nanoparticles
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Description
2 誘電体マトリックス(MgF2)
Claims (4)
- 固相中に金属ナノ粒子が分散された構造を有するグラニュラー構造体を気相成長させ形成し、
前記グラニュラー構造体の前記固相を溶解し、遊離した前記金属ナノ粒子を抽出すること特徴とする金属ナノ粒子の製造方法。 - 前記固相は、誘電体マトリックスであり、
前記グラニュラー構造体は、蒸着またはスパッタによって形成されることを特徴とする請求項1記載の金属ナノ粒子の製造方法。 - 前記誘電体マトリックスは、水溶性であり、
前記グラニュラー構造体を水中に浸漬し、水中に分散した前記金属ナノ粒子を抽出することを特徴とする請求項2記載の金属ナノ粒子の製造方法。 - 前記金属ナノ粒子の粒径が、1~20nmであることを特徴とする請求項1から3のいずれか1つに記載の金属ナノ粒子の製造方法。
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001094175A (ja) | 1999-09-22 | 2001-04-06 | Res Inst Electric Magnetic Alloys | 高電気比抵抗磁気抵抗膜 |
JP2009221529A (ja) | 2008-03-14 | 2009-10-01 | Fuji Electric Holdings Co Ltd | 金属ナノ粒子の製造方法及びそれに得られた金属ナノ粒子固定体 |
WO2011115165A1 (ja) | 2010-03-18 | 2011-09-22 | 株式会社豊田中央研究所 | ナノヘテロ構造体およびその製造方法 |
JP2015034345A (ja) | 2014-09-05 | 2015-02-19 | 尾池工業株式会社 | 無機微粒子の製造方法 |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2001094175A (ja) | 1999-09-22 | 2001-04-06 | Res Inst Electric Magnetic Alloys | 高電気比抵抗磁気抵抗膜 |
JP2009221529A (ja) | 2008-03-14 | 2009-10-01 | Fuji Electric Holdings Co Ltd | 金属ナノ粒子の製造方法及びそれに得られた金属ナノ粒子固定体 |
WO2011115165A1 (ja) | 2010-03-18 | 2011-09-22 | 株式会社豊田中央研究所 | ナノヘテロ構造体およびその製造方法 |
JP2015034345A (ja) | 2014-09-05 | 2015-02-19 | 尾池工業株式会社 | 無機微粒子の製造方法 |
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