JP7288665B2 - Method for producing ethylanilinotoluenesulfonic acid derivative - Google Patents

Method for producing ethylanilinotoluenesulfonic acid derivative Download PDF

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JP7288665B2
JP7288665B2 JP2019143039A JP2019143039A JP7288665B2 JP 7288665 B2 JP7288665 B2 JP 7288665B2 JP 2019143039 A JP2019143039 A JP 2019143039A JP 2019143039 A JP2019143039 A JP 2019143039A JP 7288665 B2 JP7288665 B2 JP 7288665B2
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賢吾 鷲見
剛 伊豆原
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D. WESTERN THERAPEUTICS INSTITUTE, INC.
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Description

この発明は,エチルアニリノトルエンスルホン酸誘導体の製造方法及びエチルアニリノトルエンスルホン酸誘導体を製造する際に生ずる新規な中間体に関する。 The present invention relates to a method for producing ethylanilinotoluenesulfonic acid derivatives and novel intermediates produced in the production of ethylanilinotoluenesulfonic acid derivatives.

特許第4200222号(特許文献1)ではブリリアントブルーG(以下,BBG)が,眼疾患治療のための手術時に眼膜を染色するための染色剤として有用であることが記載されている。また,以下の非特許文献1及び2では,BBG及びブリリアントブルーFCF(以下,BB-FCF)が,P2X7受容体やパネキシン1を阻害することで脊髄損傷やその他,炎症が関連する疾患に有効であることが記載されている。これらの実例から明らかなようにBBGやBB-FCFのようなトリアリールメタン系化合物は色素としての用途に加えて,医薬品としても応用可能な性質を併せ持っている。特開2017-95439号(特許文献2)及び中国特許102617411号(特許文献3)には,BBGやBB-FCFを得るための製造方法が記載されている。 Japanese Patent No. 4200222 (Patent Document 1) describes that brilliant blue G (hereinafter referred to as BBG) is useful as a staining agent for staining the ocular membrane during surgery for treatment of eye diseases. In addition, in Non-Patent Documents 1 and 2 below, BBG and brilliant blue FCF (hereinafter referred to as BB-FCF) are effective for spinal cord injury and other inflammation-related diseases by inhibiting P2X7 receptors and pannexin 1. Something is stated. As is clear from these examples, triarylmethane compounds such as BBG and BB-FCF have the property of being applicable not only as pigments but also as pharmaceuticals. Japanese Patent Application Laid-Open No. 2017-95439 (Patent Document 2) and Chinese Patent No. 102617411 (Patent Document 3) describe production methods for obtaining BBG and BB-FCF.

しかしながら,医薬品製造における実用性という観点から,それら既知の製法について検討したところ,中間体に相当する式(1)で表されるエチルアニリノトルエンスルホン酸誘導体(以下,化合物1)を得るための各工程において,以下に示すような問題点が存在することが判明した。 However, from the viewpoint of practicality in pharmaceutical production, when these known production methods were examined, it was found that an ethylanilinotoluenesulfonic acid derivative (hereinafter referred to as compound 1) corresponding to an intermediate represented by formula (1) was obtained. It was found that each process has the following problems.

すなわち,スルホニルクロリド化反応において超低温条件下,有機金属試薬,二酸化硫黄及び塩素化剤を使用するため,作業が煩雑である。また,ベンジルチオ基を導入する際に臭気性の高いベンゼンチオールを使用するため取り扱いが容易ではない。スルホン酸基を導入する際に高温下,発煙硫酸及び硫酸を使用するため,反応条件が激しい上に,生成物に不要な位置異性体が生じる。またそれを取り除くために再結晶を繰り返す必要があり,収率が低下する。 That is, since the sulfonyl chloride reaction uses an organometallic reagent, sulfur dioxide and a chlorinating agent under ultra-low temperature conditions, the work is complicated. In addition, since benzenethiol, which has a high odor, is used when introducing a benzylthio group, it is not easy to handle. Since fuming sulfuric acid and sulfuric acid are used at high temperature to introduce sulfonic acid groups, the reaction conditions are harsh and unwanted positional isomers are generated in the product. In addition, it is necessary to repeat recrystallization to remove it, which lowers the yield.

特許第4200222号Patent No. 4200222 特開2017-95439号JP 2017-95439 中国特許102617411号Chinese Patent No. 102617411

PNAS,2009,106(30),12489-12493.PNAS, 2009, 106(30), 12489-12493. J.Gen.Physiol.,2013,141(5),649-56.J. Gen. Physiol. , 2013, 141(5), 649-56.

本明細書に記載される発明のひとつは,BBGやBB-FCFを得るための中間体である後述する式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその塩を,安価で純度高く製造する方法を提供することを,目的とする。 One of the inventions described in the present specification is an inexpensive and highly pure ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a salt thereof, which is an intermediate for obtaining BBG or BB-FCF. The purpose is to provide a manufacturing method.

本明細書に記載される発明のひとつは,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその塩を合成するための新規中間体を提供することを目的とする。 An object of one of the inventions described in this specification is to provide a novel intermediate for synthesizing the ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a salt thereof.

本明細書に記載される発明のひとつは,出発物質として入手容易な3-メチルベンゼンスルホニルクロリドを用いて,フェノールとの反応によるスルホン酸エステルの形成,ベンジル位の臭素化,N-エチル-m-トルイジン又はN-エチルアニリンの付加そしてアルカリ性条件下での加水分解を経ることによって目的とする化合物を極めて容易に,かつ高品質で得られることを見出したものに基づく。 One of the inventions described herein uses the readily available 3-methylbenzenesulfonyl chloride as a starting material to form a sulfonate ester by reaction with phenol, benzylic bromination, N-ethyl-m - based on the discovery that the desired compound can be obtained very easily and in high quality by addition of toluidine or N-ethylaniline and hydrolysis under alkaline conditions.

本明細書に記載される最初の発明は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩の製造方法に関する。

Figure 0007288665000001
(式(1)中,Rは,水素原子又はメチル基を示す。) The first invention described in this specification relates to a method for producing an ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof.
Figure 0007288665000001
(In formula (1), R 1 represents a hydrogen atom or a methyl group.)

この方法は,式(5)で示される化合物と,N-エチル-m-トルイジン又はN-エチルアニリンを反応させて,式(6)で示される化合物を得る工程を含む。

Figure 0007288665000002

(式(5)中,Xは,脱離基を示し,Yは保護基を示す。) This method comprises reacting a compound of formula (5) with N-ethyl-m-toluidine or N-ethylaniline to obtain a compound of formula (6).
Figure 0007288665000002

(In formula (5), X 1 represents a leaving group and Y 1 represents a protecting group.)

Figure 0007288665000003
(式(6)中,Rは,水素原子又はメチル基を示し,Yは保護基を示す。)
Figure 0007288665000003
(In formula (6), R 1 represents a hydrogen atom or a methyl group, and Y 1 represents a protecting group.)

そして,この方法は,式(6)で示される化合物から式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を得る工程を含む。 And this method includes a step of obtaining an ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof from a compound represented by formula (6).

上記の方法の好ましい態様は,式(5)で示される化合物を,式(3)で示される化合物をハロゲン化することで得る工程をさらに含む。この工程は,時系列的には,「式(5)で示される化合物と,N-エチル-m-トルイジン又はN-エチルアニリンを反応させて,式(6)で示される化合物を得る工程」の前に存在する工程である。

Figure 0007288665000004

(式(3)中,Yは保護基を示す。) A preferred embodiment of the above method further comprises the step of obtaining the compound of formula (5) by halogenating the compound of formula (3). In chronological order, this step is "a step of reacting a compound represented by formula (5) with N-ethyl-m-toluidine or N-ethylaniline to obtain a compound represented by formula (6)". It is a step that exists before
Figure 0007288665000004

(In formula (3), Y 1 represents a protecting group.)

上記の方法の好ましい態様は,式(3)で示される化合物を式(2)で示される化合物をエステル化することで得る工程をさらに含むものである。この工程は,時系列的には,「式(5)で示される化合物を,式(3)で示される化合物をハロゲン化することで得る工程」の前に存在する工程である。

Figure 0007288665000005
(式(2)中,Xは,脱離基を示す。) A preferred embodiment of the above method further comprises the step of obtaining the compound represented by formula (3) by esterifying the compound represented by formula (2). This step is a step that precedes "the step of obtaining the compound represented by the formula (5) by halogenating the compound represented by the formula (3)" chronologically.
Figure 0007288665000005
(In formula (2), X 2 represents a leaving group.)

上記の方法の好ましい態様は,式(5)で示される化合物を,式(4)で示される化合物をエステル化することで得る工程をさらに含むものである。この工程は,時系列的には,「式(5)で示される化合物と,N-エチル-m-トルイジン又はN-エチルアニリンを反応させて,式(6)で示される化合物を得る工程」の前に存在する工程である。

Figure 0007288665000006

(式(4)中,X及びXは,同一でも異なってもよく脱離基を示す。) A preferred embodiment of the above method further comprises the step of obtaining the compound represented by formula (5) by esterifying the compound represented by formula (4). In chronological order, this step is "a step of reacting a compound represented by formula (5) with N-ethyl-m-toluidine or N-ethylaniline to obtain a compound represented by formula (6)". It is a step that exists before
Figure 0007288665000006

(In formula (4), X 1 and X 2 may be the same or different and represent a leaving group.)

上記の方法の好ましい態様は,式(4)で示される化合物を式(2)で示される化合物をハロゲン化することで得る工程をさらに含むものである。この工程は,時系列的には,「式(5)で示される化合物を,式(4)で示される化合物をエステル化することで得る工程」の前に存在する工程である。

Figure 0007288665000007
(式(2)中,Xは,脱離基を示す。) A preferred embodiment of the above method further comprises the step of obtaining the compound represented by formula (4) by halogenating the compound represented by formula (2). This step is a step that precedes "the step of obtaining the compound represented by the formula (5) by esterifying the compound represented by the formula (4)" chronologically.
Figure 0007288665000007
(In formula (2), X 2 represents a leaving group.)

上記の方法の好ましい態様は,Xは,臭素原子を示し,Yはフェニル基を示す方法である。また,工程にXが含まれる場合,Xは塩素原子であることが好ましい。 A preferred embodiment of the above method is a method in which X 1 represents a bromine atom and Y 1 represents a phenyl group. Also, when X2 is included in the process, X2 is preferably a chlorine atom.

上記の式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩は,BBGやBB-FCFを製造する際の中間体である。つまり,この明細書は,上記の工程を含むBBG,BB-FCF,又はその薬学的に許容される塩の製造方法をも提供する。なお,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を用いて,BBGやBB-FCFを製造する方法は公知である。 The ethylanilinotoluenesulfonic acid derivative represented by the above formula (1) or a pharmaceutically acceptable salt thereof is an intermediate in the production of BBG or BB-FCF. Thus, this specification also provides a method for producing BBG, BB-FCF, or a pharmaceutically acceptable salt thereof, comprising the steps described above. A method for producing BBG or BB-FCF using the ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof is known.

本明細書に記載される上記とは別の発明は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を製造する際に用いられる新規中間体に関する。 Another invention described in this specification relates to novel intermediates used in the production of ethylanilinotoluenesulfonic acid derivatives represented by formula (1) or pharmaceutically acceptable salts thereof.

具体的な中間体の例は,フェニル-3-(ブロモメチル)ベンゼン-1-スルホン酸,又はその薬学的に許容される塩である。このものは,式(5)において,Xが臭素原子,Yがフェニル基である化合物やその塩である。この明細書は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を製造するための,フェニル-3-(ブロモメチル)ベンゼン-1-スルホン酸,又はその薬学的に許容される塩の使用をも提供する。 An example of a specific intermediate is phenyl-3-(bromomethyl)benzene-1-sulfonic acid, or a pharmaceutically acceptable salt thereof. This is a compound or a salt thereof in which X1 is a bromine atom and Y1 is a phenyl group in the formula (5). This specification describes phenyl-3-(bromomethyl)benzene-1-sulfonic acid, or its Use of pharmaceutically acceptable salts is also provided.

具体的な中間体の例は,フェニル-3-{[エチル(3-メチルフェニル)アミノ]メチル}ベンゼン-1-スルホン酸,フェニル-3-{[エチル(フェニル)アミノ]メチル}ベンゼン-1-スルホン酸,又はその薬学的に許容される塩である。これらは,式(6)において,Rがメチル基又は水素原子であり,Yがフェニル基である化合物や,それらいずれかの塩である。この明細書は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を製造するための,フェニル-3-{[エチル(3-メチルフェニル)アミノ]メチル}ベンゼン-1-スルホン酸,フェニル-3-{[エチル(フェニル)アミノ]メチル}ベンゼン-1-スルホン酸,又はその薬学的に許容される塩の使用をも提供する。 Examples of specific intermediates are phenyl-3-{[ethyl(3-methylphenyl)amino]methyl}benzene-1-sulfonic acid, phenyl-3-{[ethyl(phenyl)amino]methyl}benzene-1 - is a sulfonic acid, or a pharmaceutically acceptable salt thereof. These are compounds in which R 1 is a methyl group or a hydrogen atom and Y 1 is a phenyl group in formula (6), or salts of any of these. This specification describes phenyl-3-{[ethyl(3-methylphenyl)amino]methyl for producing ethylanilinotoluenesulfonic acid derivatives represented by formula (1) or pharmaceutically acceptable salts thereof. }benzene-1-sulfonic acid, phenyl-3-{[ethyl(phenyl)amino]methyl}benzene-1-sulfonic acid, or a pharmaceutically acceptable salt thereof.

本明細書は,BBGやBB-FCFを得るための中間体である後述する式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその塩を,安価で純度高く製造する方法を提供することを,開示する。 The present specification provides a method for producing an ethylanilinotoluenesulfonic acid derivative or a salt thereof represented by the formula (1), which is an intermediate for obtaining BBG or BB-FCF, at low cost and with high purity. is disclosed.

本明細書は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその塩を合成するための新規中間体を提供することを開示する。 The present specification discloses providing novel intermediates for synthesizing ethylanilinotoluene sulfonic acid derivatives represented by formula (1) or salts thereof.

以下,図面を用いて本発明を実施するための形態について説明する。本発明は,以下に説明する形態に限定されるものではなく,以下の形態から当業者が自明な範囲で適宜修正したものも含む。以下の説明では,例えば,式(1)で示される化合物を化合物1のように表記する。 DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments for carrying out the present invention will be described below with reference to the drawings. The present invention is not limited to the embodiments described below, and includes appropriate modifications within the scope obvious to those skilled in the art from the following embodiments. In the following description, for example, the compound represented by formula (1) is expressed as compound 1.

この明細書に開示される発明の特徴のひとつは,化合物1のスルホン酸基の導入方法にある。この発明は,例えば,出発物質にあらかじめスルホン酸基へ変換容易なクロロスルホニル基が適切な位置に導入されている。このため,従来のような問題点,すなわち煩雑な反応操作,取り扱いが容易ではない試薬及び原料の使用,激しい反応条件,位置異性体の生成及びその除去といった問題を回避できる。さらにこの製造方法では,温和な反応条件下で,取り扱いが容易な試薬を使用しているため,作業面においての負担が少ない。従って,この明細書は,医薬品中間体として有用なエチルアニリノトルエンスルホン酸誘導体(化合物1)の実用性の高い製造方法を提供でき,しかもその製造方法は,化合物1や化合物1を用いて製造される化合物の大量生産に適している。この製造方法によって得られるエチルアニリノトルエンスルホン酸誘導体は,不要な異性体を含まず,かつ特別な精製操作を繰り返さなくとも,高い品質を有するため,BBG及びBB-FCFを医薬品グレードで製造する際に極めて有用な中間体として使用することができる。 One of the features of the invention disclosed in this specification is the method of introducing the sulfonic acid group of compound 1. In the present invention, for example, a chlorosulfonyl group, which can be easily converted into a sulfonic acid group, is introduced in advance into a starting material at an appropriate position. As a result, conventional problems such as complicated reaction procedures, use of reagents and raw materials that are not easy to handle, harsh reaction conditions, formation and removal of positional isomers can be avoided. Furthermore, in this production method, easy-to-handle reagents are used under mild reaction conditions, so there is little work load. Therefore, this specification can provide a highly practical method for producing an ethylanilinotoluenesulfonic acid derivative (compound 1) useful as a pharmaceutical intermediate, and the production method uses compound 1 and compound 1. suitable for mass production of compounds The ethylanilinotoluene sulfonic acid derivative obtained by this production method does not contain unnecessary isomers and has high quality without repeating special purification procedures, so BBG and BB-FCF are produced at pharmaceutical grade. It can be used as an extremely useful intermediate in some cases.

本明細書に記載される最初の発明は,式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩の製造方法に関する。

Figure 0007288665000008
(式(1)中,Rは,水素原子又はメチル基を示す。) The first invention described in this specification relates to a method for producing an ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof.
Figure 0007288665000008
(In formula (1), R 1 represents a hydrogen atom or a methyl group.)

式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩(化合物1又はその塩)は,たとえば水溶液中では電離しており,その際の化学式は(1)とは異なるものも存在する。しかし,それらの形態は,当業者にとって自明であり,電離しているものや電離していないものも当然化合物1又はその塩に含まれる。さらに,化合物1又はその塩は,溶媒和物となる場合がありうる(例えば水和物)このような形態のものも,実質的には水溶液中で化合物1又はその塩とおなじ挙動を示すため,化合物1又はその塩に含まれる。 The ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof (compound 1 or a salt thereof) is ionized, for example, in an aqueous solution, and the chemical formula at that time is (1) There are also different However, those forms are self-evident for those skilled in the art, and both ionized and non-ionized forms are naturally included in compound 1 or salts thereof. In addition, Compound 1 or its salt may be a solvate (e.g. hydrate), because such a form exhibits substantially the same behavior as Compound 1 or its salt in aqueous solution. , compound 1 or a salt thereof.

薬理学的に許容される塩の例は,無機塩基,アンモニア,有機塩基,無機酸,有機酸,塩基性有機酸,ハロゲンイオン等から成る塩,及び分子内塩を含む。無機塩基の例はアルカリ金属(Na,K等)及びアルカリ土類金属(Ca,Mg等)を含む。有機塩基の例はトリメチルアミン,トリエチルアミン,コリン,プロカイン,エタノ-ルアミン等を含む。無機酸の例は,塩酸,臭化水素酸,硫酸,硝酸,及びリン酸等を含む。有機酸の例はp-トルエンスルホン酸,メタンスルホン酸,蟻酸,トリフルオロ酢酸及びマレイン酸等を含む。塩基性有機酸の例はリジン,アルギニン,オルニチン,ヒスチジン等を含む。 Examples of pharmacologically acceptable salts include salts composed of inorganic bases, ammonia, organic bases, inorganic acids, organic acids, basic organic acids, halogen ions, etc., and intramolecular salts. Examples of inorganic bases include alkali metals (Na, K, etc.) and alkaline earth metals (Ca, Mg, etc.). Examples of organic bases include trimethylamine, triethylamine, choline, procaine, ethanolamine, and the like. Examples of inorganic acids include hydrochloric acid, hydrobromic acid, sulfuric acid, nitric acid, phosphoric acid, and the like. Examples of organic acids include p-toluenesulfonic acid, methanesulfonic acid, formic acid, trifluoroacetic acid, maleic acid, and the like. Examples of basic organic acids include lysine, arginine, ornithine, histidine and the like.

化合物1の製造方法の概要は以下のとおりである。
化合物2及び化合物3は,ハロゲン化剤を用いてベンジル位をハロゲン化することで,それぞれ,化合物4及び化合物5を得ることができる。
化合物2及び化合物4は,水酸基が直接結合した芳香族化合物を反応させて,スルホン酸エステル化を行うことで,それぞれ,化合物3及び化合物5を得ることができる。
化合物5にN-エチル-m-トルイジン又はN-エチルアニリンを作用させることで,化合物6を得ることができる。
化合物6を加水分解や脱保護することで,化合物1を得ることができる。
The outline of the method for producing compound 1 is as follows.
By halogenating the benzylic position of compound 2 and compound 3 with a halogenating agent, compound 4 and compound 5 can be obtained, respectively.
Compound 2 and compound 4 are reacted with an aromatic compound to which a hydroxyl group is directly bonded, and sulfonic acid esterification is performed to obtain compound 3 and compound 5, respectively.
Compound 6 can be obtained by reacting compound 5 with N-ethyl-m-toluidine or N-ethylaniline.
By hydrolyzing or deprotecting compound 6, compound 1 can be obtained.

以下では,化合物1を化合物2から製造するひとつ目のスキーム(スキーム1)を説明する。 Below, the first scheme (scheme 1) which manufactures the compound 1 from the compound 2 is demonstrated.

スキーム1
スキーム1は,化合物2→化合物3→化合物5→化合物6→化合物1の順に得るスキームを示す。各工程を場合によりスキーム1.1のように表記する。なお,この明細書は,スキーム1全体のみならず,スキーム1.1とスキーム1.2の組み合わせや,スキーム1.3とスキーム1.4の組み合わせなど,連続する任意の数のスキームを組み合わせた発明をも提供するものである。この点は,後述するスキーム2も同様である。
Scheme 1
Scheme 1 shows a scheme obtained in the order of compound 2→compound 3→compound 5→compound 6→compound 1. Each step is optionally represented as in Scheme 1.1. It should be noted that this specification is not only the entire scheme 1, but also a combination of any number of consecutive schemes, such as a combination of schemes 1.1 and 1.2, and a combination of schemes 1.3 and 1.4. An invention is also provided. This point also applies to Scheme 2, which will be described later.

Figure 0007288665000009
Figure 0007288665000009

スキーム1.1
スキーム1.1は,例えば,化合物2に,水酸基が直接結合した芳香族化合物など(例えば,Y-OHで示される化合物)を反応させて,スルホン酸エステル化を行うことで,化合物3を得るための工程である。
Scheme 1.1
In Scheme 1.1, for example, compound 2 is reacted with an aromatic compound to which a hydroxyl group is directly bonded (for example, a compound represented by Y -OH ), and sulfonic acid esterification is performed to convert compound 3 to It is a process to obtain.

式(2)中,Xは,脱離基を示す。脱離基として,公知の脱離基を適宜用いることができる。脱離基の例は,ハロゲン原子,p-トルエンスルホニル基,トリフルオロメタンスルホニル基,メタンスルホニル基及びペンタフルオロフェニルオキシ基である。ハロゲン原子の例は,フッ素原子,塩素原子,臭素原子,及びヨード原子である。好ましいXの例は塩素原子である。 In formula (2), X2 represents a leaving group. A known leaving group can be appropriately used as the leaving group. Examples of leaving groups are halogen atoms, p-toluenesulfonyl groups, trifluoromethanesulfonyl groups, methanesulfonyl groups and pentafluorophenyloxy groups. Examples of halogen atoms are fluorine, chlorine, bromine and iodine atoms. A preferred example of X2 is a chlorine atom.

は保護基である。保護基が導入されているので,スキーム1.2及びスキーム1.3において,スルホン酸エステル部位が保護される。すなわち,は,Yはスキーム1.2及びスキーム1.3において,脱保護されないスルホン酸保護基である。Yの例は,C~Cアルキル基,C~Cアルケニル基,C~Cアルキニル基,C~Cアルコキシ基,C~Cアルキルチオ基又はフッ素原子,塩素原子,臭素原子,及びヨード原子で置換されてもよいフェニル基である。Yの別の例は,2,2,2-トリクロロエチル基,2-(トリメチルシリル)エチル基,2,2,ジクロロエチル基,及び2,2-ジクロロプロピル基である。 Y 1 is a protecting group. In Scheme 1.2 and Scheme 1.3, the sulfonate ester moiety is protected because a protecting group has been introduced. That is, Y 1 is a sulfonic acid protecting group that is not deprotected in Schemes 1.2 and 1.3. Examples of Y 1 are C 1 -C 4 alkyl groups, C 2 -C 4 alkenyl groups, C 2 -C 4 alkynyl groups, C 1 -C 4 alkoxy groups, C 1 -C 4 alkylthio groups or fluorine atoms, chlorine A phenyl group optionally substituted with an atom, a bromine atom, and an iodine atom. Further examples of Y 1 are 2,2,2-trichloroethyl, 2-(trimethylsilyl)ethyl, 2,2, dichloroethyl and 2,2-dichloropropyl groups.

-OHで示される化合物は,化合物2に対し,例えば1~3当量の範囲で加えられ,1~1.5当量で加えられることがより好ましい。この反応は,ピリジン,トリエチルアミン,N,N-ジイソプロピルエチルアミン等の第3級アミンの存在下に行うことが好ましくこれらの中ではトリエチルアミンを用いることが好ましい。第3級アミンは,例えば,1~3当量の範囲で加えられ,1~1.5当量が好ましい。反応に使用される溶媒は,ジクロロメタン,クロロホルム等のハロゲン化炭化水素類;ベンゼン,トルエン,キシレン等の芳香族炭化水素類;ヘキサン,ヘプタン等の脂肪族炭化水素類;ジメチルホルムアミド(DMF),ジメチルアセトアミド(DMA),ジメチルスルホキシド(DMSO),1,3-ジメチル-2-イミダゾリジノン(DMI),1-メチル-2-ピロリドン(NMP)等の非プロトン性極性溶媒;エチルエーテル,イソプロピルエーテル,メチルtert-ブチルエーテル(MTBE),1,2-ジメトキシエタン(DME),テトラヒドロフラン(THF),ジオキサン等のエーテル類;アセトニトリル,プロピオニトリル等のニトリル類等を挙げることができる。これらの中では,ジクロロメタン,アセトニトリル,テトラヒドロフラン等の溶媒を用いることが好ましい。反応は,例えば,室温~60℃の温度で1~12時間行えばよい。例えば,得られた有機層を公知の方法を用いて洗浄し,乾燥させ濃縮することで,化合物3を得ることができる。 The compound represented by Y 1 -OH is added, for example, in the range of 1 to 3 equivalents, more preferably 1 to 1.5 equivalents, relative to compound 2. This reaction is preferably carried out in the presence of a tertiary amine such as pyridine, triethylamine, N,N-diisopropylethylamine, etc. Among them, triethylamine is preferred. The tertiary amine is added, for example, in the range of 1 to 3 equivalents, preferably 1 to 1.5 equivalents. Solvents used in the reaction include halogenated hydrocarbons such as dichloromethane and chloroform; aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as hexane and heptane; aprotic polar solvents such as acetamide (DMA), dimethylsulfoxide (DMSO), 1,3-dimethyl-2-imidazolidinone (DMI), 1-methyl-2-pyrrolidone (NMP); ethyl ether, isopropyl ether, Ethers such as methyl tert-butyl ether (MTBE), 1,2-dimethoxyethane (DME), tetrahydrofuran (THF) and dioxane; nitriles such as acetonitrile and propionitrile; Among these, solvents such as dichloromethane, acetonitrile, and tetrahydrofuran are preferred. The reaction may be carried out, for example, at room temperature to 60° C. for 1 to 12 hours. For example, compound 3 can be obtained by washing the obtained organic layer using a known method, drying and concentrating.

スキーム1.2
スキーム1.2は,例えば,ハロゲン化剤を用いて化合物3のベンジル位をハロゲン化することで化合物5を得る工程である。
式(5)におけるXは,脱離基を示す。脱離基として,公知の脱離基を適宜用いることができる。この脱離基は,例えば,ハロゲン化剤に由来するハロゲン原子である。脱離基の他の例は,p-トルエンスルホニル基,トリフルオロメタンスルホニル基及びメタンスルホニル基である。ハロゲン原子の例は,フッ素原子,塩素原子,臭素原子,及びヨード原子である。好ましいXの例は臭素原子である。
ハロゲン化剤の例は,臭素,塩素,N-ブロモスクシンイミド(NBS)であり,これらの中ではNBSが好ましい。加えるハロゲン化剤の量は,例えば1~10当量の範囲であり,1~3当量がより好ましい。反応を促進するために,熱,光,ラジカル開始剤を使用してもよい。ラジカル開始剤としてはアゾビスブチロニトリル(AIBN)を使用することが好ましく,AIBNは,例えば,0.1~1当量の範囲で加えられ,0.1~0.3当量で加えられてもよい。反応に使用される溶媒は,先に示した溶媒を適宜用いることができジクロロメタン,アセトニトリル等が好ましい。反応は,例えば,室温~100℃の温度で1~24時間行えばよい。例えば,得られた有機層を公知の方法を用いて洗浄し,乾燥させ濃縮することで,化合物5を得ることができる。
Scheme 1.2
Scheme 1.2 is a step to obtain compound 5 by halogenating the benzylic position of compound 3 using, for example, a halogenating agent.
X 1 in formula (5) represents a leaving group. A known leaving group can be appropriately used as the leaving group. This leaving group is, for example, a halogen atom derived from a halogenating agent. Other examples of leaving groups are p-toluenesulfonyl, trifluoromethanesulfonyl and methanesulfonyl groups. Examples of halogen atoms are fluorine, chlorine, bromine and iodine atoms. A preferred example of X 1 is a bromine atom.
Examples of halogenating agents are bromine, chlorine and N-bromosuccinimide (NBS), of which NBS is preferred. The amount of the halogenating agent to be added is, for example, in the range of 1 to 10 equivalents, more preferably 1 to 3 equivalents. Heat, light, and radical initiators may be used to accelerate the reaction. It is preferable to use azobisbutyronitrile (AIBN) as a radical initiator, and AIBN is added, for example, in the range of 0.1 to 1 equivalent, and may be added in 0.1 to 0.3 equivalent. good. As the solvent used for the reaction, the solvents shown above can be appropriately used, and dichloromethane, acetonitrile and the like are preferable. The reaction may be carried out, for example, at room temperature to 100° C. for 1 to 24 hours. For example, compound 5 can be obtained by washing the obtained organic layer using a known method, drying and concentrating.

スキーム1.3
スキーム1.3は,例えば,化合物5にN-エチル-m-トルイジン又はN-エチルアニリン(アニリン化合物)を作用させることで,化合物6を得るための工程である。
アニリン化合物は,例えば1~3当量の範囲で加えられ,1~1.5当量で加えられることがより好ましい。この反応は,例えば,炭酸リチウム,炭酸ナトリウム,炭酸カリウム,炭酸セシウム等の無機塩基の存在下に行う。これらの無機塩基の中では,炭酸カリウムが好ましい。無機塩基の添加量は,例えば,1~10当量であり,1~5当量が好ましい。反応に使用される溶媒として,先に示した溶媒を適宜用いることができアセトニトリル,テトラヒドロフラン,ジメチルホルムアミド等が好ましい。反応は,室温~100℃の温度で1~12時間行えばよい。例えば,得られた有機層を公知の方法を用いて洗浄し,乾燥させ濃縮することで,化合物6を得ることができる。
Scheme 1.3
Scheme 1.3 is a process for obtaining compound 6, for example, by reacting compound 5 with N-ethyl-m-toluidine or N-ethylaniline (aniline compound).
The aniline compound is added, for example, in the range of 1 to 3 equivalents, more preferably 1 to 1.5 equivalents. This reaction is carried out in the presence of an inorganic base such as lithium carbonate, sodium carbonate, potassium carbonate or cesium carbonate. Among these inorganic bases, potassium carbonate is preferred. The amount of inorganic base added is, for example, 1 to 10 equivalents, preferably 1 to 5 equivalents. As the solvent used for the reaction, the solvents shown above can be appropriately used, and acetonitrile, tetrahydrofuran, dimethylformamide and the like are preferable. The reaction may be carried out at room temperature to 100° C. for 1 to 12 hours. For example, compound 6 can be obtained by washing the obtained organic layer using a known method, drying and concentrating.

スキーム1.4
スキーム1.4は,例えば,化合物6を加水分解や脱保護することで,化合物1を得るための工程である。
脱保護や加水分解は公知であり,これらの処理後適宜中和することで,化合物1を得ることができる。例えば,適度な濃度に調製した水酸化ナトリウム又は水酸カリウムの水溶液を1~50当量(又は1~20当量)で添加されることにより,加水分解や脱保護を起こすことができる。この反応に使用される溶媒の例は親水性有機溶媒である。親水性有機溶媒の例は,メタノール及びエタノールである。反応は,室温~100℃の温度で1~12時間行えばよい。加水分解などの処理後,例えば,溶媒を減圧下で留去し,適量の塩酸を加えて中和する。化合物1は必要に応じて再結晶によって精製してもよい。
Scheme 1.4
Scheme 1.4 is a process for obtaining compound 1 by hydrolyzing or deprotecting compound 6, for example.
Deprotection and hydrolysis are known, and compound 1 can be obtained by appropriately neutralizing after these treatments. For example, hydrolysis and deprotection can occur by adding 1 to 50 equivalents (or 1 to 20 equivalents) of an aqueous solution of sodium hydroxide or potassium hydroxide prepared to an appropriate concentration. Examples of solvents used in this reaction are hydrophilic organic solvents. Examples of hydrophilic organic solvents are methanol and ethanol. The reaction may be carried out at room temperature to 100° C. for 1 to 12 hours. After treatment such as hydrolysis, for example, the solvent is distilled off under reduced pressure, and an appropriate amount of hydrochloric acid is added to neutralize. Compound 1 may be purified by recrystallization if necessary.

スキーム2
次に,化合物1を化合物2から製造する二つ目のスキーム(スキーム2)を説明する。スキーム2は,化合物2→化合物4→化合物5→化合物6→化合物1の順に得るスキームを示す。なお,スキーム2.3及びスキーム2.4は,それぞれスキーム1.3及びスキーム1.4と同じであるので,記載を引用することとする。
Scheme 2
Next, a second scheme (scheme 2) for producing compound 1 from compound 2 will be described. Scheme 2 shows a scheme obtained in the order of compound 2→compound 4→compound 5→compound 6→compound 1. Note that schemes 2.3 and 2.4 are the same as schemes 1.3 and 1.4, respectively, so the descriptions are cited.

Figure 0007288665000010
Figure 0007288665000010

スキーム2.1
スキーム2.1は,例えば,ハロゲン化剤を用いて化合物2のベンジル位をハロゲン化することで,化合物4を得るための工程である。この工程は,スキーム1.2と同様にして行えばよい。
Scheme 2.1
Scheme 2.1 is a process for obtaining compound 4 by, for example, halogenating the benzylic position of compound 2 using a halogenating agent. This step may be performed in the same manner as in Scheme 1.2.

スキーム2.2
スキーム2.2は,例えば,化合物4に,水酸基が直接結合した芳香族化合物など(例えば,Y-OHで示される化合物)を反応させて,スルホン酸エステル化を行うことで,化合物5を得るための工程である。この工程は,スキーム1.1と同様にして行えばよい。
Scheme 2.2
In Scheme 2.2, for example, compound 4 is reacted with an aromatic compound (for example, a compound represented by Y 1 —OH) to which a hydroxyl group is directly bonded, and sulfonic acid esterification is performed to convert compound 5 into It is a process to obtain. This step may be performed in the same manner as in Scheme 1.1.

次に実施例を挙げて本発明を具体的に説明する。本発明は何ら実施例これらによって限定されるものではなく,公知の条件や工程を適宜組み合わせたものも本発明に含まれる。 EXAMPLES Next, the present invention will be specifically described with reference to examples. The present invention is by no means limited to these examples, and the present invention also includes a suitable combination of known conditions and processes.

化合物3aを経由する化合物5aの合成Synthesis of compound 5a via compound 3a

Figure 0007288665000011
Figure 0007288665000011

フェノール(247mg,2.62mmol)をジクロロメタン(15mL)に溶解し,トリエチルアミン(0.55mL,3.97mmol)及びm-トルエンスルホニルクロリド(2)(500mg,2.62mmol)を0℃下で加えた。混合物を室温で2時間攪拌し,酢酸エチルを加えた。有機層を0.5M塩酸,飽和炭酸水素ナトリウム水溶液及び飽和食塩水で洗浄し,無水硫酸ナトリウムで乾燥した。減圧濃縮し,化合物3aを油状物として得た(635mg)。続いて化合物3a(552mg, 2.22mmol)をアセトニトリル(11mL)に溶解し,N-ブロモスクシンイミド(594mg, 3.33mmol),及びアゾビスイソブチロニトリル(37mg, 0.23mmol)を加え,80℃で16時間加熱攪拌し,加熱を止めて室温まで戻した。続いてN,N-ジイソプロピルエチルアミン(0.39mL,2.23mmol)と亜リン酸ジエチル(0.57mL,4.42mmol)を加え,室温で2時間攪拌した。酢酸エチルを加え,有機層を5%炭酸カリウム水溶液で3回,飽和食塩水で洗浄した。無水硫酸ナトリウムで乾燥後,減圧濃縮し,化合物5aを油状物として得た(1.17g)。 Phenol (247 mg, 2.62 mmol) was dissolved in dichloromethane (15 mL), triethylamine (0.55 mL, 3.97 mmol) and m-toluenesulfonyl chloride (2) (500 mg, 2.62 mmol) were added at 0°C. . The mixture was stirred at room temperature for 2 hours and ethyl acetate was added. The organic layer was washed with 0.5M hydrochloric acid, saturated aqueous sodium hydrogencarbonate solution and saturated brine, and dried over anhydrous sodium sulfate. Concentration under reduced pressure gave compound 3a as an oil (635 mg). Subsequently, compound 3a (552 mg, 2.22 mmol) was dissolved in acetonitrile (11 mL), N-bromosuccinimide (594 mg, 3.33 mmol), and azobisisobutyronitrile (37 mg, 0.23 mmol) were added, and 80 C. for 16 hours, the heating was stopped, and the temperature was returned to room temperature. Subsequently, N,N-diisopropylethylamine (0.39 mL, 2.23 mmol) and diethyl phosphite (0.57 mL, 4.42 mmol) were added and stirred at room temperature for 2 hours. Ethyl acetate was added, and the organic layer was washed with a 5% potassium carbonate aqueous solution three times and with a saturated saline solution. After drying over anhydrous sodium sulfate, it was concentrated under reduced pressure to obtain compound 5a as an oil (1.17 g).

(5a)HNMR(500MHz,CDCl)4.47(s,2H),6.96-6.98(m,2H),7.26-7.32(m,3H),7.51(dd,1H,J = 7.6Hz),7.68(d,1H,J = 7.6Hz),7.76(d,J = 7.6Hz,1H),7.28(s,1H). (5a) 1 H NMR (500 MHz, CDCl 3 ) 4.47 (s, 2H), 6.96-6.98 (m, 2H), 7.26-7.32 (m, 3H), 7.51 ( dd, 1H, J = 7.6Hz), 7.68 (d, 1H, J = 7.6Hz), 7.76 (d, J = 7.6Hz, 1H), 7.28 (s, 1H).

化合物4aを経由する化合物5aの合成Synthesis of compound 5a via compound 4a

Figure 0007288665000012
Figure 0007288665000012

市販のm-トルエンスルホニルクロリド(2)(5.00g, 26.2mmol)をアセトニトリル(100mL)に溶解し,N-ブロモスクシンイミド(5.30g, 29.7mmol),アゾビスイソブチロニトリル(430mg, 2.62mmol)を加え,80℃で16時間加熱攪拌し,加熱を止めて室温まで戻した。減圧濃縮し,水を加え,ジクロロメタンで抽出した。有機相を無水硫酸ナトリウムで乾燥後,減圧濃縮した。化合物4aの粗生成物にジクロロメタン(50mL)を加え,この溶液をあらかじめ用意しておいたフェノール(2.46g, 26.2mmol),トリエチルアミン(3.65mL,26.2mmol)のジクロロメタン(50mL)溶液に0℃下でゆっくりと加え,同温で1時間攪拌した。水を加え,ジクロロメタンで抽出した。有機相を無水硫酸ナトリウムで乾燥後,減圧濃縮した。得られた残渣をショートカラム(ヘキサン/酢酸エチル=4/1)にかけて脱色し,化合物5aを油状物として得た(7.9g)。HNMRは,化合物3aを経由する方法で得られた化合物5aのそれと一致した。 Commercially available m-toluenesulfonyl chloride (2) (5.00 g, 26.2 mmol) was dissolved in acetonitrile (100 mL), N-bromosuccinimide (5.30 g, 29.7 mmol), azobisisobutyronitrile (430 mg , 2.62 mmol) was added, and the mixture was heated and stirred at 80°C for 16 hours, then stopped heating and allowed to return to room temperature. It was concentrated under reduced pressure, water was added, and the mixture was extracted with dichloromethane. The organic phase was dried over anhydrous sodium sulfate and then concentrated under reduced pressure. Dichloromethane (50 mL) was added to the crude product of compound 4a, and this solution was added to a prepared solution of phenol (2.46 g, 26.2 mmol) and triethylamine (3.65 mL, 26.2 mmol) in dichloromethane (50 mL). was added slowly at 0° C. and stirred at the same temperature for 1 hour. Water was added and extracted with dichloromethane. The organic phase was dried over anhydrous sodium sulfate and then concentrated under reduced pressure. The resulting residue was decolorized through a short column (hexane/ethyl acetate=4/1) to give compound 5a as an oil (7.9 g). 1 H NMR was consistent with that of compound 5a obtained by the method via compound 3a.

化合物1aの合成Synthesis of compound 1a

Figure 0007288665000013
Figure 0007288665000013

化合物5a(1.17g)をアセトニトリル(10mL)に溶解し,N-エチル-m-トルイジン(270mg,2.00mmol),炭酸カリウム(338mg,2.45mmol)を加え,80℃で18時間加熱攪拌し,加熱を止め室温に戻した。ろ過により炭酸カリウムを除去した後,減圧濃縮した。得られた残渣をショートカラム(ヘキサン/酢酸エチル=4/1)にかけて脱色することで化合物6aを油状物として得た(719mg)。 Compound 5a (1.17 g) was dissolved in acetonitrile (10 mL), N-ethyl-m-toluidine (270 mg, 2.00 mmol) and potassium carbonate (338 mg, 2.45 mmol) were added, and the mixture was heated and stirred at 80°C for 18 hours. Then, the heating was stopped and the temperature was returned to room temperature. After removing potassium carbonate by filtration, the solution was concentrated under reduced pressure. The obtained residue was subjected to a short column (hexane/ethyl acetate=4/1) for decolorization to obtain compound 6a as an oil (719 mg).

続いて化合物6a(719mg)をメタノール(10mL)に溶解し,2M水酸化ナトリウム水溶液(10mL)を加え,70℃で2時間加熱攪拌し,加熱を止めて室温まで戻した。減圧濃縮し,メタノールを除去後,水層をMTBEで洗浄し,0.5M塩酸を注意深く加え,中和した。さらにトルエンを加え,水浴を60℃に設定して減圧濃縮した。得られた残渣にメタノールを加え,不溶性成分をろ過によって取り除き,ろ液を減圧濃縮した。得られたアモルファス状の固形物を減圧乾燥した後,イソプロピルアルコール(5mL),MTBE(5mL)を加え,60℃にて攪拌し,固形物の洗浄を行った。0℃にて冷却後,ろ過を行い,固体を取り出し,減圧乾燥を行うことで化合物1aを淡褐色固体として得た(505mg,1.65mmol,HPLC純度94%)。 Subsequently, compound 6a (719 mg) was dissolved in methanol (10 mL), 2M aqueous sodium hydroxide solution (10 mL) was added, and the mixture was heated and stirred at 70°C for 2 hours. After concentrating under reduced pressure to remove methanol, the aqueous layer was washed with MTBE and neutralized by carefully adding 0.5 M hydrochloric acid. More toluene was added, and the water bath was set at 60° C. and concentrated under reduced pressure. Methanol was added to the resulting residue, insoluble components were removed by filtration, and the filtrate was concentrated under reduced pressure. After drying the obtained amorphous solid under reduced pressure, isopropyl alcohol (5 mL) and MTBE (5 mL) were added and stirred at 60° C. to wash the solid. After cooling at 0° C., the solid was filtered and dried under reduced pressure to obtain compound 1a as a pale brown solid (505 mg, 1.65 mmol, HPLC purity 94%).

(6a)HNMR(500MHz,CDCl)1.18(t,3H,J = 7.0Hz),2.27(s,3H),3.43(q,2H,J = 7.0Hz),4.52(s,2H),6.41(d,1H,J = 7.7Hz),6.46(s,1H),6.54(d,1H,J = 7.7Hz),6.91-6.93(m,2H),7.07(dd,1H,J = 7.5Hz),7.22-7.25(m,3H),7.44(dd,1H,J = 7.5Hz),7.54(d,1H,J = 7.5Hz),7.69(d,1H,J = 7.5Hz),7.72(s,1H). (6a) 1 H NMR (500 MHz, CDCl3 ) 1.18 (t, 3H, J = 7.0 Hz), 2.27 (s, 3H), 3.43 (q, 2H, J = 7.0 Hz), 4.52 (s, 2H), 6.41 (d, 1H, J = 7.7Hz), 6.46 (s, 1H), 6.54 (d, 1H, J = 7.7Hz), 6. 91-6.93 (m, 2H), 7.07 (dd, 1H, J = 7.5Hz), 7.22-7.25 (m, 3H), 7.44 (dd, 1H, J = 7 .5Hz), 7.54 (d, 1H, J = 7.5Hz), 7.69 (d, 1H, J = 7.5Hz), 7.72 (s, 1H).

(1a)HNMR(500MHz, DO)1.05(t,3H,J = 7.0 Hz),2.13 (s,3H),3.32 (q,2H,J = 7.0 Hz),4.46(s,2H),6.50(d,1H,J = 8.0 Hz),6.53 (d,1H,J = 8.5 Hz)6.57(s,1H),7.02(dd,1H,J = 9.0 Hz),7.28(d,1H,J = 7.4 Hz), 7.32(dd,1H,J =7.4 Hz),7.50(s,1H),7.53(d,1H,J = 8.5Hz). (1a) 1 H NMR (500 MHz, D 2 O) 1.05 (t, 3H, J = 7.0 Hz), 2.13 (s, 3H), 3.32 (q, 2H, J = 7.0 Hz), 4.46 (s, 2H), 6.50 (d, 1H, J = 8.0 Hz), 6.53 (d, 1H, J = 8.5 Hz) 6.57 (s, 1H ), 7.02 (dd, 1H, J = 9.0 Hz), 7.28 (d, 1H, J = 7.4 Hz), 7.32 (dd, 1H, J = 7.4 Hz), 7.50 (s, 1H), 7.53 (d, 1H, J = 8.5Hz).

化合物1bの合成

Figure 0007288665000014
実施例1と同様な方法でN-エチル-m-トルイジンの代わりにN-エチルアニリンを用いることで化合物1bを白色固体として得た(2工程収率59%,HPLC純度95%)。
Synthesis of compound 1b
Figure 0007288665000014
Compound 1b was obtained as a white solid in the same manner as in Example 1 using N-ethylaniline instead of N-ethyl-m-toluidine (2 step yield 59%, HPLC purity 95%).

(6b)HNMR(500MHz,CDCl)1.18(t,3H,J = 7.0Hz),3.31(q,2H,J = 7.0Hz),4.51(s,2H),6.61-6.62(m,2H),6.71(dd,1H,J = 7.0Hz),6.90-6.92(m,2H),7.17-7.26(m,5H),7.44(dd,1H,J = 7.6Hz),7.54(d,1H,J = 7.6Hz),7.70(d,1H,J = 7.6Hz),7.71(s,1H). (6b) 1 H NMR (500 MHz, CDCl3 ) 1.18 (t, 3H, J = 7.0 Hz), 3.31 (q, 2H, J = 7.0 Hz), 4.51 (s, 2H), 6.61-6.62 (m, 2H), 6.71 (dd, 1H, J = 7.0Hz), 6.90-6.92 (m, 2H), 7.17-7.26 (m , 5H), 7.44 (dd, 1H, J = 7.6Hz), 7.54 (d, 1H, J = 7.6Hz), 7.70 (d, 1H, J = 7.6Hz), 7 .71(s, 1H).

(1b)HNMR(500MHz,DO)0.90(t,3H,J = 6.7Hz),3.16(q,2H,J = 6.7Hz),4.26(s,2H),6.52-6.56(m,3H),6.99-7.02(m,2H),7.09(d,1H,J = 7.5Hz),7.14(dd,1H,J = 7.5Hz),7.49(d,1H,J = 7.5Hz),7.50(s,1H). (1b) 1 H NMR (500 MHz, D2O ) 0.90 (t, 3H, J = 6.7 Hz), 3.16 (q, 2H, J = 6.7 Hz), 4.26 (s, 2H) , 6.52-6.56 (m, 3H), 6.99-7.02 (m, 2H), 7.09 (d, 1H, J = 7.5Hz), 7.14 (dd, 1H, J = 7.5 Hz), 7.49 (d, 1H, J = 7.5 Hz), 7.50 (s, 1H).

[参考例]
化合物1aから化合物7の合成

Figure 0007288665000015
[Reference example]
Synthesis of compound 7 from compound 1a
Figure 0007288665000015

実施例1で得られた純度の高い化合物1aを用いて,特許文献2に記載の方法に従って,化合物7の合成を行ったところ,高収率,高純度で化合物7が得られることが判明した。すなわち本発明の製造方法によって得られた化合物1aは,次工程においても十分に使用可能な品質を持つことが示された。 Using the highly pure compound 1a obtained in Example 1, compound 7 was synthesized according to the method described in Patent Document 2, and it was found that compound 7 was obtained in high yield and high purity. . That is, it was shown that the compound 1a obtained by the production method of the present invention has sufficient quality to be used in the next step.

本発明は,エチルアニリノトルエンスルホン酸誘導体の製造方法や,その中間体に関するので,化学産業や医薬産業において利用され得る。


INDUSTRIAL APPLICABILITY The present invention relates to methods for producing ethylanilinotoluenesulfonic acid derivatives and intermediates thereof, and can be used in the chemical and pharmaceutical industries.


Claims (8)

式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩の製造方法であって,
Figure 0007288665000016
(式(1)中,Rは,水素原子又はメチル基を示す。)
式(5)で示される化合物と,N-エチル-m-トルイジン又はN-エチルアニリンを反応させて,式(6)で示される化合物を得る工程と,
Figure 0007288665000017
(式(5)中,Xは,脱離基を示し,Yは保護基を示す。)
Figure 0007288665000018
(式(6)中,Rは,水素原子又はメチル基を示し,Yは保護基を示す。)
式(6)で示される化合物から式(1)で示されるエチルアニリノトルエンスルホン酸誘導体又はその薬学的に許容される塩を得る工程と,を含む,
方法。
A method for producing an ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof,
Figure 0007288665000016
(In formula (1), R 1 represents a hydrogen atom or a methyl group.)
a step of reacting a compound represented by formula (5) with N-ethyl-m-toluidine or N-ethylaniline to obtain a compound represented by formula (6);
Figure 0007288665000017
(In formula (5), X 1 represents a leaving group and Y 1 represents a protecting group.)
Figure 0007288665000018
(In formula (6), R 1 represents a hydrogen atom or a methyl group, and Y 1 represents a protecting group.)
obtaining an ethylanilinotoluenesulfonic acid derivative represented by formula (1) or a pharmaceutically acceptable salt thereof from a compound represented by formula (6);
Method.
請求項1に記載の方法であって,
前記式(5)で示される化合物を,式(3)で示される化合物をハロゲン化することで得る工程をさらに含む,
Figure 0007288665000019
(式(3)中,Yは保護基を示す。)
方法。
The method of claim 1, wherein
Further comprising a step of obtaining the compound represented by the formula (5) by halogenating the compound represented by the formula (3),
Figure 0007288665000019
(In formula (3), Y 1 represents a protecting group.)
Method.
請求項2に記載の方法であって,前記式(3)で示される化合物を式(2)で示される化合物をエステル化することで得る工程をさらに含む,
Figure 0007288665000020
(式(2)中,Xは,脱離基を示す。)
方法。
3. The method of claim 2, further comprising the step of obtaining the compound of formula (3) by esterifying the compound of formula (2),
Figure 0007288665000020
(In formula (2), X 2 represents a leaving group.)
Method.
請求項1に記載の方法であって,
前記式(5)で示される化合物を,式(4)で示される化合物をエステル化することで得る工程をさらに含む,
Figure 0007288665000021
(式(4)中,X及びXは,同一でも異なってもよく脱離基を示す。)
方法。
The method of claim 1, wherein
Further comprising a step of obtaining the compound represented by the formula (5) by esterifying the compound represented by the formula (4),
Figure 0007288665000021
(In formula (4), X 1 and X 2 may be the same or different and represent a leaving group.)
Method.
請求項4に記載の方法であって,前記式(4)で示される化合物を式(2)で示される化合物をハロゲン化することで得る工程をさらに含む,
Figure 0007288665000022
(式(2)中,Xは,脱離基を示す。)
方法。
5. The method of claim 4, further comprising the step of obtaining the compound of formula (4) by halogenating the compound of formula (2).
Figure 0007288665000022
(In formula (2), X 2 represents a leaving group.)
Method.
請求項1~5のいずれかに記載の方法であって,Xは,臭素原子を示し,Yはフェニル基を示す方法。 A method according to any one of claims 1 to 5, wherein X 1 represents a bromine atom and Y 1 represents a phenyl group. フェニル-3-(ブロモメチル)ベンゼン-1-スルホン酸,又はその薬学的に許容される塩。 Phenyl-3-(bromomethyl)benzene-1-sulfonic acid, or a pharmaceutically acceptable salt thereof. フェニル-3-{[エチル(3-メチルフェニル)アミノ]メチル}ベンゼン-1-スルホン酸,フェニル-3-{[エチル(フェニル)アミノ]メチル}ベンゼン-1-スルホン酸,又はその薬学的に許容される塩。

Phenyl-3-{[ethyl(3-methylphenyl)amino]methyl}benzene-1-sulfonic acid, phenyl-3-{[ethyl(phenyl)amino]methyl}benzene-1-sulfonic acid, or the pharmaceutically acceptable salt.

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