JP7249092B2 - Salt, acid generator, resist composition and method for producing resist pattern - Google Patents

Description

The present invention relates to a salt, an acid generator, a resist composition, and a method for producing a resist pattern.

Patent Document 1 describes a resist composition containing a salt represented by the following formula as an acid generator.

Patent Document 2 describes a resist composition containing a salt represented by the following formula as an acid generator.

JP 2011-37837 A JP 2012-193160 A

With resist compositions containing the above salts, CD uniformity (CDU) of the obtained resist pattern was not necessarily satisfactory in some cases.

［式（ａａ）中、
Ｘ¹は、炭素数１～６のアルカントリイル基を表す。
Ｘ^a及びＸ^bは、それぞれ独立に、酸素原子又は硫黄原子を表す。
環Ｗは、少なくとも１つの置換基を有する炭素数３～３６の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－Ｓ－、－ＣＯ－又は－ＳＯ_２－で置換されていてもよい。
＊は、結合手を表す。］
［２］式（ａａ）で表される基を有するアニオンと、カチオンとからなる［１］に記載の塩。
［３］カチオンが、有機カチオンである［２］に記載の塩。
［４］式（ａａ）で表される基を有するアニオンが、式（ａａ）で表される基とスルホナートとを有するアニオンである［２］又は［３］に記載の塩。
［５］式（ａａ１）で表されるアニオンを有する塩である［１］～［４］のいずれかに記載の塩。

［式（ａａ１）中、
Ｘ^a、Ｘ^b、Ｘ¹及び環Ｗは、上記と同じ意味を表す。
Ｌ^b1は、炭素数１～２４の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基で置換されていてもよい。
Ｑ¹及びＱ²は、互いに独立に、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。］
［６］環Ｗが、式（ｗ１－１）で表される環、式（ｗ１－２）で表される環又は式（ｗ１－３）で表される環である［１］～［５］のいずれかに記載の塩。

［式（ｗ１－１）、式（ｗ１－２）及び式（ｗ１－３）中、
環に含まれる－ＣＨ_２－は、－Ｏ－、－Ｓ－、－ＣＯ－又は－ＳＯ_２－で置換されていてもよく、少なくとも一つの置換基を有している。］
［７］Ｌ^b1が、＊－ＣＯ－又は以下で表される基である［５］又は［６］に記載の塩。

（＊は、－Ｃ（Ｑ^１）（Ｑ^２）－の炭素原子との結合手を表す。）
［８］Ｘ¹が、式（Ｘ¹－１）で表される３価の基である［１］～［７］のいずれかに記載の塩。

［式中、＊は、結合手を表す。］
［９］［１］～［８］のいずれかに記載の塩を含有する酸発生剤。
［１０］［９］に記載の酸発生剤と酸不安定基を有する樹脂とを含有するレジスト組成物。
［１１］さらに、酸発生剤から発生する酸よりも酸性度の弱い酸を発生する塩を含有する［１０］に記載のレジスト組成物。
［１２］（１）［１０］又は［１１］に記載のレジスト組成物を基板上に塗布する工程、
（２）塗布後の組成物を乾燥させて組成物層を形成する工程、
（３）組成物層に露光する工程、
（４）露光後の組成物層を加熱する工程、及び
（５）加熱後の組成物層を現像する工程、
を含むレジストパターンの製造方法。 The present invention includes the following inventions.
[1] A salt having a group represented by formula (aa).

[In formula (aa),
X ¹ represents an alkanetriyl group having 1 to 6 carbon atoms.
X ^a and X ^b each independently represent an oxygen atom or a sulfur atom.
Ring W represents an alicyclic hydrocarbon group having 3 to 36 carbon atoms having at least one substituent, and —CH ₂ — contained in the alicyclic hydrocarbon group is —O—, —S—, It may be substituted with -CO- or -SO ₂ -.
* represents a bond. ]
[2] The salt according to [1], comprising an anion having a group represented by formula (aa) and a cation.
[3] The salt of [2], wherein the cation is an organic cation.
[4] The salt according to [2] or [3], wherein the anion having a group represented by formula (aa) is an anion having a group represented by formula (aa) and a sulfonate.
[5] The salt according to any one of [1] to [4], which is a salt having an anion represented by formula (aa1).

[In the formula (aa1),
X ^a , X ^b , X ¹ and ring W have the same meanings as above.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and —CH ₂ — contained in the saturated hydrocarbon group may be replaced with —O— or —CO—, and the saturated A hydrogen atom contained in the hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
Q ¹ and Q ² independently represent a fluorine atom or a C 1-6 perfluoroalkyl group. ]
[6] Ring W is a ring represented by formula (w1-1), a ring represented by formula (w1-2) or a ring represented by formula (w1-3) [1] to [5 ] The salt according to any one of

[In formula (w1-1), formula (w1-2) and formula (w1-3),
—CH ₂ — contained in the ring may be substituted with —O—, —S—, —CO— or —SO ₂ — and has at least one substituent. ]
[7] The salt according to [5] or [6], wherein L ^b1 is *—CO— or a group represented by the following.

(* represents a bond with the carbon atom of —C(Q ¹ )(Q ² )—.)
[8] The salt according to any one of [1] to [7], wherein X ¹ is a trivalent group represented by formula (X ¹ -1).

[In the formula, * represents a bond. ]
[9] An acid generator containing the salt according to any one of [1] to [8].
[10] A resist composition containing the acid generator of [9] and a resin having an acid-labile group.
[11] The resist composition of [10], further comprising a salt that generates an acid weaker in acidity than the acid generated from the acid generator.
[12] (1) a step of applying the resist composition according to [10] or [11] onto a substrate;
(2) a step of drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the composition layer after exposure; and (5) developing the composition layer after heating;
A method of manufacturing a resist pattern comprising:

Provided are a salt and a resist composition containing the salt capable of producing a resist pattern with good CD uniformity (CDU).

As used herein, "(meth)acrylic monomer" means at least one monomer having a structure of "CH ₂ =CH-CO-" or "CH ₂ =C(CH ₃ )-CO-". do. Similarly, "(meth)acrylate" and "(meth)acrylic acid" mean "at least one of acrylate and methacrylate" and "at least one of acrylic acid and methacrylic acid", respectively. In addition, among the groups described in this specification, any group that can have both a linear structure and a branched structure may be used. Where stereoisomers exist, all stereoisomers are included.
As used herein, "the solid content of the resist composition" means the total amount of components excluding the solvent (E) described below from the total amount of the resist composition.

［式（ａａ）中、
Ｘ¹は、炭素数１～６のアルカントリイル基を表す。
Ｘ^a及びＸ^bは、それぞれ独立に、酸素原子又は硫黄原子を表す。
環Ｗは、少なくとも１つの置換基を有する炭素数３～３６の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－Ｓ－、－ＣＯ－又は－ＳＯ_２－で置換されていてもよい。
＊は、結合手を表す。］ <Salt (aa)>
The salt of the present invention is a salt having a group represented by formula (aa) (hereinafter sometimes referred to as "salt (aa)"). Salt (aa) is a salt that generates an acid under the action of light.

[In formula (aa),
X ¹ represents an alkanetriyl group having 1 to 6 carbon atoms.
X ^a and X ^b each independently represent an oxygen atom or a sulfur atom.
Ring W represents an alicyclic hydrocarbon group having 3 to 36 carbon atoms having at least one substituent, and —CH ₂ — contained in the alicyclic hydrocarbon group is —O—, —S—, It may be substituted with -CO- or -SO ₂ -.
* represents a bond. ]

［式中、＊は、結合手を表す。］ The alkanetriyl group represented by X ¹ includes a methanetriyl group, an ethanetriyl group, a propanetriyl group, a butanetriyl group, a pentanetriyl group and a hexanetriyl group, and an alkanetriyl group having 1 to 4 carbon atoms. and more preferably a trivalent group represented by formula (X ¹ -1).

[In the formula, * represents a bond. ]

X ^a and X ^b are preferably the same atom, more preferably an oxygen atom.

［式（ｗ１－１）～式（ｗ１－１１）中、
環に含まれるメチレン基は酸素原子、硫黄原子、カルボニル基又はスルホニル基で置換されていてもよく、は少なくとも１つの置換基を有している。］ The alicyclic hydrocarbon group represented by ring W may be monocyclic or polycyclic.
Examples of the alicyclic hydrocarbon group represented by ring W include groups derived from rings represented by formulas (w1-1) to (w1-11), and alicyclic rings having 3 to 18 carbon atoms. A hydrocarbon group of formula ( A ring represented by w1-1) is more preferred.

[In the formulas (w1-1) to (w1-11),
A methylene group contained in the ring may be substituted with an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group, and has at least one substituent. ]

炭素数６～１０の芳香族炭化水素基としては、フェニル基、ナフチル基が挙げられる。
ヒドロキシ基と炭素数１～１２のアルキル基とを組み合わせた基としては、ヒドロキシメチル基、ヒドロキシエチル基等の炭素数１～１２のヒドロキシアルキル基が挙げられる。
炭素数１～１２のアルキル基と炭素数６～１０の芳香族炭化水素基とを組み合わせた基としては、ベンジル基等の炭素数７～２２のアラルキル基が挙げられる。 Ring W has at least one substituent, and examples of the substituent include the substituents described in Group A.
Group A: hydroxy group, cyano group, carboxyl group, alkyl group having 1 to 12 carbon atoms, alkoxy group having 1 to 12 carbon atoms, alicyclic hydrocarbon group having 3 to 12 carbon atoms, aromatic group having 6 to 10 carbon atoms Group hydrocarbon groups and groups in which these are combined As alkyl groups having 1 to 12 carbon atoms, methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group , undecyl group, dodecyl group and the like.
Examples of alkoxy groups having 1 to 12 carbon atoms include methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, octyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy, and undecyloxy. group, dodecyloxy group, and the like.
Examples of the alicyclic hydrocarbon group having 3 to 12 carbon atoms include groups shown below. * represents a bond with ring W;

Aromatic hydrocarbon groups having 6 to 10 carbon atoms include phenyl and naphthyl groups.
Groups in which a hydroxy group and an alkyl group having 1 to 12 carbon atoms are combined include hydroxyalkyl groups having 1 to 12 carbon atoms such as a hydroxymethyl group and a hydroxyethyl group.
Groups in which an alkyl group having 1 to 12 carbon atoms and an aromatic hydrocarbon group having 6 to 10 carbon atoms are combined include an aralkyl group having 7 to 22 carbon atoms such as a benzyl group.

The substituent of ring W is preferably a hydroxy group, a cyano group, an alkoxy group having 1 to 12 carbon atoms or a carboxyl group, more preferably a hydroxy group, a cyano group or an alkoxy group having 1 to 12 carbon atoms. preferable.

Salt (aa) is more preferably a salt consisting of an anion having a group represented by formula (aa) and a cation, and an anion having a group represented by formula (aa) and an organic cation It is more preferable that the salt is

［式（ａａ１）中、
Ｘ^a、Ｘ^b、Ｘ¹及び環Ｗは、上記と同じ意味を表す。
Ｌ^b1は、炭素数１～２４の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基で置換されていてもよい。
Ｑ¹及びＱ²は、互いに独立に、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。］ The anion having a group represented by formula (aa) is preferably a salt having a group represented by formula (aa) and a sulfonate anion, and is preferably an anion represented by formula (aa1). more preferred.

[In the formula (aa1),
X ^a , X ^b , X ¹ and ring W have the same meanings as above.
L ^b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and —CH ₂ — contained in the saturated hydrocarbon group may be replaced with —O— or —CO—, and the saturated A hydrogen atom contained in the hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
Q ¹ and Q ² independently represent a fluorine atom or a C 1-6 perfluoroalkyl group. ]

Perfluoroalkyl groups represented by Q ¹ and Q ² include a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group and a perfluoropentyl group. groups and perfluorohexyl groups.
Q ¹ and Q ² are each independently preferably a fluorine atom or a trifluoromethyl group, and more preferably both Q ¹ and Q ² are fluorine atoms.

The divalent saturated hydrocarbon group represented by L ^b1 includes an alkanediyl group, a monocyclic or polycyclic bivalent alicyclic saturated hydrocarbon group, and two or more of these groups may be a combination of
Specifically, methylene group, ethylene group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1 ,7-diyl group, octane-1,8-diyl group, nonane-1,9-diyl group, decane-1,10-diyl group, undecane-1,11-diyl group, dodecane-1,12-diyl group , tridecane-1,13-diyl group, tetradecane-1,14-diyl group, pentadecane-1,15-diyl group, hexadecane-1,16-diyl group and heptadecane-1,17-diyl group. alkanediyl group;
ethane-1,1-diyl group, propane-1,1-diyl group, propane-1,2-diyl group, propane-2,2-diyl group, pentane-2,4-diyl group, 2-methylpropane- Branched alkanediyl groups such as 1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1,4-diyl group, and 2-methylbutane-1,4-diyl group;
monocyclic 2 which is a cycloalkanediyl group such as cyclobutane-1,3-diyl group, cyclopentane-1,3-diyl group, cyclohexane-1,4-diyl group, cyclooctane-1,5-diyl group; alicyclic saturated hydrocarbon group;
Polycyclic divalent alicyclic saturated hydrocarbons such as norbornane-1,4-diyl group, norbornane-2,5-diyl group, adamantane-1,5-diyl group, and adamantane-2,6-diyl group and the like.
A hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom. Examples of groups substituted with a fluorine atom include divalent groups represented below. * represents a bond with -C(Q ¹ )(Q ² )- or a bond with an oxygen atom.

Groups in which —CH ₂ — contained in the divalent saturated hydrocarbon group represented by L ^b1 is replaced with an oxygen atom or a carbonyl group are represented by formulas (X1-A) to (X1-F). and the like, preferably a group represented by formula (X1-A) or (X1-B), more preferably a group represented by formula (X1-A). In addition, the groups represented by formulas (X1-A) to (X1-F) are described with their left and right sides aligned with formula (aa1), and among the two bonds indicated by *, The left bond is bonded to the carbon atom of C(Q ¹ )(Q ² ). The same applies to specific examples of the groups represented by formulas (X1-A) to (X1-F) below.

［Ｘ^１１は、２価の炭素数１～２２の飽和炭化水素基を表す。
Ｘ^１２は、２価の炭素数１～２１の飽和炭化水素基を表す。
Ｘ^１３～Ｘ^１５及びＸ^１７は、それぞれ独立に、２価の炭素数１～１９の飽和炭化水素基を表す。
Ｘ^１６及びＸ^１８は、それぞれ独立に、単結合又は２価の炭素数１～１９の飽和炭化水素基を表す。
但し、Ｘ^１３とＸ^１４との合計炭素数、Ｘ^１５とＸ^１６との合計炭素数、及び、Ｘ^１７とＸ^１８との合計炭素数の上限は、それぞれ２０である。］

[X ¹¹ represents a divalent saturated hydrocarbon group having 1 to 22 carbon atoms.
X ¹² represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
X ¹³ to X ¹⁵ and X ¹⁷ each independently represent a divalent saturated hydrocarbon group having 1 to 19 carbon atoms.
X ¹⁶ and X ¹⁸ each independently represent a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms.
However, the upper limits of the total number of carbon atoms of ^X13 and ^X14 , the total number of carbon atoms of ^X15 and ^X16 , and the total number of carbon atoms of ^X17 and ^X18 are 20, respectively. ]

X ¹¹ is preferably an alkanediyl group having 1 to 12 carbon atoms, and is -CH ₂ -, -(CH ₂ ) ₂ -, -(CH ₂ ) ₄ -, -(CH ₂ ) ₈ - or -( It is more preferably CH ₂ ) ₁₂ —.
X ¹² to X ¹⁵ and X ¹⁷ are each independently preferably an alkanediyl group having 1 to 12 carbon atoms _or a divalent alicyclic hydrocarbon group having 3 to 12 carbon atoms; -(CH ₂ ) ₂ -, -(CH ₂ ) ₄ -, -(CH ₂ ) ₈ , -(CH ₂ ) ₁₂ - or an adamantanediyl group is more preferred.
More preferably, X ¹⁶ and X ¹⁸ are each independently a single bond, -CH ₂ -, -(CH ₂ ) ₂ - or -(CH ₂ ) ₄ -.

Examples of the divalent group represented by formula (X1-B) include the following groups.

Examples of the divalent group represented by formula (X1-C) include the following groups.

Examples of the divalent group represented by formula (X1-D) include the following groups.

Examples of the divalent group represented by formula (X1-E) include the following groups.

Examples of the divalent group represented by formula (X1-F) include the following groups.

（＊は、－Ｃ（Ｑ^１）（Ｑ^２）－の炭素原子との結合手を表す。） Among them, L ^b1 is preferably *—CO— or a group represented by the following.

(* represents a bond with the carbon atom of —C(Q ¹ )(Q ² )—.)

Specific examples of the sulfonate anion constituting the salt (aa) include the following.

The cations in salt (aa) are preferably organic cations. Organic cations include organic onium cations, organic sulfonium cations, organic iodonium cations, organic ammonium cations, benzothiazolium cations and organic phosphonium cations. Among these, organic sulfonium cations and organic iodonium cations are preferred, and arylsulfonium cations are more preferred.
Among them, cations represented by any one of formulas (b2-1) to (b2-4) (hereinafter sometimes referred to as "cation (b2-1)" and the like depending on the formula number) are preferred.

［式（ｂ２－１）～式（ｂ２－４）において、
Ｒ^ｂ４～Ｒ^ｂ６は、互いに独立に、炭素数１～３０の脂肪族炭化水素基、炭素数３～３６の脂環式炭化水素基又は炭素数６～３６の芳香族炭化水素基を表し、該脂肪族炭化水素基に含まれる水素原子は、ヒドロキシ基、炭素数１～１２のアルコキシ基、炭素数３～１２の脂環式炭化水素基又は炭素数６～１８の芳香族炭化水素基で置換されていてもよく、該脂環式炭化水素基に含まれる水素原子は、ハロゲン原子、炭素数１～１８の脂肪族炭化水素基、炭素数２～４のアシル基又はグリシジルオキシ基で置換されていてもよく、該芳香族炭化水素基に含まれる水素原子は、ハロゲン原子、ヒドロキシ基又は炭素数１～１２のアルコキシ基で置換されていてもよい。
Ｒ^ｂ４とＲ^ｂ５とは、それらが結合する硫黄原子とともに環を形成してもよく、該環に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ－又は－ＣＯ－に置き換わってもよい。
Ｒ^ｂ７及びＲ^ｂ８は、互いに独立に、ヒドロキシ基、炭素数１～１２の脂肪族炭化水素基又は炭素数１～１２のアルコキシ基を表す。
ｍ２及びｎ２は、互いに独立に、０～５のいずれかの整数を表す。
ｍ２が２以上のとき、複数のＲ^ｂ７は同一であっても異なってもよく、ｎ２が２以上のとき、複数のＲ^ｂ８は同一であっても異なってもよい。
Ｒ^ｂ９及びＲ^ｂ１０は、互いに独立に、炭素数１～３６の脂肪族炭化水素基又は炭素数３～３６の脂環式炭化水素基を表す。
Ｒ^ｂ９とＲ^ｂ１０とは、それらが結合する硫黄原子とともに環を形成してもよく、該環に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ－又は－ＣＯ－に置き換わってもよい。
Ｒ^ｂ１１は、水素原子、炭素数１～３６の脂肪族炭化水素基、炭素数３～３６の脂環式炭化水素基又は炭素数６～１８の芳香族炭化水素基を表す。
Ｒ^ｂ１２は、炭素数１～１２の脂肪族炭化水素基、炭素数３～１８の脂環式炭化水素基又は炭素数６～１８の芳香族炭化水素基を表し、該脂肪族炭化水素に含まれる水素原子は、炭素数６～１８の芳香族炭化水素基で置換されていてもよく、該芳香族炭化水素基に含まれる水素原子は、炭素数１～１２のアルコキシ基又は炭素数１～１２のアルキルカルボニルオキシ基で置換されていてもよい。
Ｒ^ｂ１１とＲ^ｂ１２とは、一緒になってそれらが結合する－ＣＨ－ＣＯ－を含む環を形成していてもよく、該環に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ－又は－ＣＯ－に置き換わってもよい。
Ｒ^ｂ１３～Ｒ^ｂ１８は、互いに独立に、ヒドロキシ基、炭素数１～１２の脂肪族炭化水素基又は炭素数１～１２のアルコキシ基を表す。
Ｌ^ｂ３１は、－Ｓ－又は－Ｏ－を表す。
ｏ２、ｐ２、ｓ２、及びｔ２は、互いに独立に、０～５のいずれかの整数を表す。
ｑ２及びｒ２は、互いに独立に、０～４のいずれかの整数を表す。
ｕ２は、０又は１を表す。
ｏ２が２以上のとき、複数のＲ^ｂ１３は同一であっても異なってもよく、ｐ２が２以上のとき、複数のＲ^ｂ１４は同一であっても異なってもよく、ｑ２が２以上のとき、複数のＲ^ｂ１５は同一であっても異なってもよく、ｒ２が２以上のとき、複数のＲ^ｂ１６は同一であっても異なってもよく、ｓ２が２以上のとき、複数のＲ^ｂ１７は同一であっても異なってもよく、ｔ２が２以上のとき、複数のＲ^ｂ１８は同一であっても異なってもよい。］

[In formulas (b2-1) to (b2-4),
R ^b4 to R ^b6 each independently represent an aliphatic hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms or an aromatic hydrocarbon group having 6 to 36 carbon atoms; The hydrogen atom contained in the aliphatic hydrocarbon group is a hydroxy group, an alkoxy group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms. It may be substituted, and the hydrogen atom contained in the alicyclic hydrocarbon group is substituted with a halogen atom, an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an acyl group having 2 to 4 carbon atoms, or a glycidyloxy group. A hydrogen atom contained in the aromatic hydrocarbon group may be substituted with a halogen atom, a hydroxy group, or an alkoxy group having 1 to 12 carbon atoms.
R ^b4 and R ^b5 may form a ring together with the sulfur atom to which they are bonded, and -CH ₂ - contained in the ring may be replaced with -O-, -SO- or -CO- .
R ^b7 and R ^b8 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
m2 and n2 each independently represent an integer of 0 to 5;
When m2 is 2 or more, the plurality of R ^b7 may be the same or different, and when n2 is 2 or more, the plurality of R ^b8 may be the same or different.
R ^b9 and R ^b10 each independently represent an aliphatic hydrocarbon group having 1 to 36 carbon atoms or an alicyclic hydrocarbon group having 3 to 36 carbon atoms.
R ^b9 and R ^b10 may form a ring together with the sulfur atom to which they are bonded, and —CH ₂ — contained in the ring may be replaced with —O—, —SO— or —CO— .
R ^b11 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 36 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms or an aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^b12 represents an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms or an aromatic hydrocarbon group having 6 to 18 carbon atoms, and may be substituted with an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the hydrogen atoms contained in the aromatic hydrocarbon group are alkoxy groups having 1 to 12 carbon atoms or 1 to 1 carbon atoms. It may be substituted with 12 alkylcarbonyloxy groups.
R ^b11 and R ^b12 may together form a ring containing —CH—CO— to which they are bonded, and —CH ₂ — contained in the ring is —O—, —SO— Alternatively, it may be replaced with -CO-.
R ^b13 to R ^b18 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
L ^b31 represents -S- or -O-.
o2, p2, s2 and t2 each independently represents an integer of 0 to 5;
q2 and r2 each independently represent an integer of 0 to 4;
u2 represents 0 or 1;
When o2 is 2 or more, the plurality of R ^b13 may be the same or different, when p2 is 2 or more, the plurality of R ^b14 may be the same or different, and when q2 is 2 or more , the plurality of R ^b15 may be the same or different, when r2 is 2 or more, the plurality of R ^b16 may be the same or different, and when s2 is 2 or more, the plurality of R ^b17 may be They may be the same or different, and when t2 is 2 or more, a plurality of R ^b18 may be the same or different. ]

中でも、Ｒ^ｂ９～Ｒ^ｂ１２の脂環式炭化水素基の炭素数は、好ましくは３～１８であり、より好ましくは４～１２である。 Aliphatic hydrocarbon groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, octyl group and 2-ethylhexyl group. Alkyl groups of Among them, the aliphatic hydrocarbon groups of R ^b9 to R ^b12 preferably have 1 to 12 carbon atoms.
The alicyclic hydrocarbon group may be either monocyclic or polycyclic, and examples of monocyclic alicyclic hydrocarbon groups include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cycloalkyl groups such as a group, a cyclooctyl group, and a cyclodecyl group. The polycyclic alicyclic hydrocarbon group includes decahydronaphthyl group, adamantyl group, norbornyl group and the following groups.

Among them, the number of carbon atoms in the alicyclic hydrocarbon groups of R ^b9 to R ^b12 is preferably 3-18, more preferably 4-12.

Alicyclic hydrocarbon groups in which hydrogen atoms are substituted with aliphatic hydrocarbon groups include, for example, methylcyclohexyl group, dimethylcyclohexyl group, 2-alkyladamantan-2-yl group, methylnorbornyl group, isobornyl and the like. In the alicyclic hydrocarbon group in which a hydrogen atom is substituted with an aliphatic hydrocarbon group, the total carbon number of the alicyclic hydrocarbon group and the aliphatic hydrocarbon group is preferably 20 or less.

The aromatic hydrocarbon group includes a phenyl group, a tolyl group, a xylyl group, a cumenyl group, a mesityl group, a p-ethylphenyl group, a p-tert-butylphenyl group, a p-cyclohexylphenyl group and a p-adamantylphenyl group. , biphenylyl group, naphthyl group, phenanthryl group, 2,6-diethylphenyl group and 2-methyl-6-ethylphenyl group.
When the aromatic hydrocarbon group contains an aliphatic hydrocarbon group or an alicyclic hydrocarbon group, an aliphatic hydrocarbon group having 1 to 18 carbon atoms or an alicyclic hydrocarbon group having 3 to 18 carbon atoms is preferable.
Aromatic hydrocarbon groups in which a hydrogen atom is substituted with an alkoxy group include a p-methoxyphenyl group and the like.
Aliphatic hydrocarbon groups in which hydrogen atoms are substituted with aromatic hydrocarbon groups include aralkyl groups such as benzyl, phenethyl, phenylpropyl, trityl, naphthylmethyl and naphthylethyl groups.

Alkoxy groups include methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy, octyloxy, decyloxy and dodecyloxy groups.
Acyl groups include acetyl, propionyl and butyryl groups.
Halogen atoms include fluorine, chlorine, bromine and iodine atoms.
The alkylcarbonyloxy group includes a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an isopropylcarbonyloxy group, an n-butylcarbonyloxy group, a sec-butylcarbonyloxy group, a tert-butylcarbonyloxy group, pentylcarbonyloxy group, hexylcarbonyloxy group, octylcarbonyloxy group, 2-ethylhexylcarbonyloxy group and the like.

The ring that R ^b4 and R ^b5 may form together with the sulfur atom to which they are bonded is a monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated ring. There may be. The ring includes a ring having 3 to 18 carbon atoms, preferably a ring having 4 to 18 carbon atoms. Further, the ring containing a sulfur atom includes a 3- to 12-membered ring, preferably a 3- to 7-membered ring, and specific examples include the following rings.

The ring formed by R ^b9 and R ^b10 together with the sulfur atom to which they are bound may be a monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated ring. good. The ring includes a 3- to 12-membered ring, preferably a 3- to 7-membered ring, such as thiolan-1-ium ring (tetrahydrothiophenium ring), thian-1-ium ring, 1,4-oxathian-4-ium ring and the like.
The ring formed by R ^b11 and R ^b12 together may be a monocyclic, polycyclic, aromatic, non-aromatic, saturated or unsaturated ring. The ring includes a 3- to 12-membered ring, preferably a 3- to 7-membered ring, such as an oxocycloheptane ring, oxocyclohexane ring, oxonorbornane ring, oxoadamantane ring, and the like. be done.

Among the cations (b2-1) to (b2-4), the cation (b2-1) is preferred.

Examples of the cation (b2-1) include the following cations.

Examples of the cation (b2-2) include the following cations.

Examples of the cation (b2-3) include the following cations.

Examples of the cation (b2-4) include the following cations.

Salt (aa) is preferably a combination of a sulfonate anion and an organic cation as described above. These anions and cations can be combined arbitrarily. Tables 1 to 7 show specific examples of the salt (aa).

In Table 1, for example, salt (I-1) is the salt shown below.

Among them, salt (aa) is salt (I-1), salt (I-2), salt (I-4), salt (I-10), salt (I-11), salt (I-12) , salt (I-14), salt (I-21), salt (I-22), salt (I-24), salt (I-30), salt (I-31), salt (I-32), Salt (I-34), Salt (I-41), Salt (I-42), Salt (I-44), Salt (I-50), Salt (I-51), Salt (I-52), Salt (I-54), salt (I-61), salt (I-62), salt (I-64), salt (I-70), salt (I-71), salt (I-72), salt ( I-74), salt (I-81), salt (I-82), salt (I-84), salt (I-90), salt (I-91), salt (I-92), salt (I -94), salt (I-101), salt (I-102), salt (I-104), salt (I-110), salt (I-111), salt (I-112), salt (I- 114), salt (I-121), salt (I-122), salt (I-124), salt (I-130), salt (I-131), salt (I-132) and salt (I-134 ) is preferred, and salt (I-1), salt (I-11), salt (I-30), salt (I-81) and salt (I-91) are more preferred.

（式中、Ｘ^a、Ｘ^b、Ｌ¹、Ｑ¹、Ｑ²及びＸ¹は上記と同じ意味を表し、Ｚ^＋は有機カチオンを表す。）
反応温度は通常、２０℃～２００℃の範囲内である。
この反応における溶媒としては、クロロホルム、アセトニトリル等が挙げられる。
酸触媒としては、硫酸などが挙げられる。
式（Ｉ１－ａ）で表される化合物としては、下記式で表される塩等が挙げられ、特開２０１２－１９３１６０号公報記載の方法により、製造することができる。

式（Ｉ１－ｂ）で表される化合物としては、下記式で表される塩等が挙げられ、市場より容易に入手することができる。

<Method for producing salt (aa)>
Salt (I1) consisting of an anion represented by formula (aa1) and an organic cation (Z ⁺ ) is a salt represented by formula (I1-a) and a compound represented by formula (I1-b). can be produced by reacting in a solvent under an acid catalyst.

(Wherein, X ^a , X ^b , L ¹ , Q ¹ , Q ² and X ¹ have the same meanings as above, and Z ⁺ represents an organic cation.)
The reaction temperature is usually within the range of 20°C to 200°C.
Solvents in this reaction include chloroform, acetonitrile and the like.
Acid catalysts include sulfuric acid and the like.
Examples of the compound represented by formula (I1-a) include salts represented by the following formula, which can be produced by the method described in JP-A-2012-193160.

Examples of the compound represented by formula (I1-b) include salts represented by the following formula, etc., which are readily available on the market.

[Acid generator]
The acid generator of the present invention is an acid generator containing salt (aa). The acid generator of the present invention may contain two or more salts (aa).
The acid generator of the present invention may contain an acid generator known in the resist field (hereinafter sometimes referred to as "acid generator (B)") other than the salt (aa).
Further, when the salt (aa) and the acid generator (B) are contained as acid generators, the ratio of the contents of the salt (aa) and the acid generator (B) (mass ratio; salt (aa): acid generator Agent (B)) is generally 1:99 to 99:1, preferably 2:98 to 98:2, more preferably 5:95 to 95:5, still more preferably 10:90 to 90:10. .

[Resist composition]
The resist composition of the present invention contains a resin having an acid-labile group (hereinafter sometimes referred to as "resin (A)") and an acid generator containing a salt (aa). Here, the "acid-labile group" is a structural unit having a leaving group, and the leaving group is eliminated by contact with an acid, resulting in a structural unit having a hydrophilic group (e.g., a hydroxy group or a carboxyl group). means a group that converts to
The resist composition preferably further contains a quencher (hereinafter sometimes referred to as "quencher (C)") and a solvent (hereinafter sometimes referred to as "solvent (E)").

<Acid generator>
In the resist composition of the present invention, when the salt (aa) is used as an acid generator, the content of the salt (aa) is preferably 1 to 40% by mass with respect to the resin (A). It is more preferably 35% by mass.

<Acid Generator (B)>
Acid generators are classified into nonionic and ionic acid generators, and either of them may be used in the acid generator (B) of the resist composition of the present invention. Nonionic acid generators include organic halides, sulfonate esters (e.g. 2-nitrobenzyl esters, aromatic sulfonates, oxime sulfonates, N-sulfonyloxyimides, N-sulfonyloxyimides, sulfonyloxyketones, diazonaphthoquinones). -sulfonates), sulfones (eg, disulfones, ketosulfones, sulfonyldiazomethanes), and the like. Ionic acid generators include ionic acid generators consisting of a combination of a known cation and a known anion, exemplified by onium salts containing onium cations (e.g., diazonium salts, phosphonium salts, sulfonium salts, iodonium salts). target. Anion of the onium salt includes sulfonate anion, sulfonylimide anion, sulfonylmethide anion and the like.

Examples of the acid generator (B) include JP-A-63-26653, JP-A-55-164824, JP-A-62-69263, JP-A-63-146038, JP-A-63-163452, JP-A-62-153853, JP-A-63-146029, US Pat. No. 3,779,778, US Pat. 2013-68914, 2013-3155, and 2013-11905 can be used. Moreover, you may use the compound manufactured by the well-known method.

Examples of the acid generator (B) include organic sulfonates and the like, preferably fluorine-containing acid generators, and more preferably acid generators represented by formula (B1) (hereinafter “acid generator ( B1)” may be mentioned).

［式（Ｂ１）中、
Ｑ^１１及びＱ^１２は、それぞれ独立に、フッ素原子又は炭素数１～６のペルフルオロアルキル基を表す。
Ｌ^Ｂ１は、炭素数１～２４の２価の飽和炭化水素基を表し、該２価の飽和炭化水素基に含まれる－ＣＨ_２－は－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該２価の飽和炭化水素基に含まれる水素原子はフッ素原子又はヒドロキシ基で置換されていてもよい。
Ｙは、置換基を有していてもよいメチル基又は置換基を有していてもよい炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－、－ＳＯ_２－又は－ＣＯ－に置き換わっていてもよい。
Ｚ^＋は、有機カチオンを表す。］

[In the formula (B1),
Q ¹¹ and Q ¹² each independently represent a fluorine atom or a C 1-6 perfluoroalkyl group.
L ^B1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, and —CH ₂ — contained in the divalent saturated hydrocarbon group may be replaced with —O— or —CO—, A hydrogen atom contained in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
Y represents an optionally substituted methyl group or an optionally substituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, included in the alicyclic hydrocarbon group- CH ₂ - may be replaced by -O-, -SO ₂ - or -CO-.
Z ⁺ represents an organic cation. ]

The perfluoroalkyl groups for Q ¹¹ and Q ¹² include the same groups as the perfluoroalkyl groups for Q ¹ and Q ² .
Q ¹¹ and Q ¹² are each independently preferably a fluorine atom or a trifluoromethyl group, more preferably a fluorine atom. More preferably, both Q ¹¹ and Q ¹² are fluorine atoms.

The divalent saturated hydrocarbon group for L ^B1 includes the same divalent saturated hydrocarbon group for L ^b1 .

The group in which —CH ₂ — contained in the divalent saturated hydrocarbon group of L ^B1 is replaced with —O— or —CO— is represented by any one of formulas (b1-1) to (b1-3). and the group to be carried out. In formulas (b1-1) to (b1-3), * represents a bond with -Y.

式（ｂ１－１）中、
Ｌ^b2は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b3は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれるメチレン基は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^b2とＬ^b3との炭素数合計は、２２以下である。
式（ｂ１－２）中、
Ｌ^b４は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b５は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれるメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。
ただし、Ｌ^b4とＬ^b5との炭素数合計は、２２以下である。
式（ｂ１－３）中、
Ｌ^b6は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
Ｌ^b7は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよく、該飽和炭化水素基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
ただし、Ｌ^b6とＬ^b7との炭素数合計は、２３以下である。

In formula (b1-1),
L ^b2 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b3 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated A methylene group contained in the hydrocarbon group may be replaced with -O- or -CO-.
However, the total number of carbon atoms of L ^b2 and L ^b3 is 22 or less.
In formula (b1-2),
L ^b4 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated A methylene group contained in the hydrocarbon group may be substituted with an oxygen atom or a carbonyl group.
However, the total number of carbon atoms of L ^b4 and L ^b5 is 22 or less.
In formula (b1-3),
L ^b6 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
L ^b7 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group, and the saturated —CH ₂ — contained in the hydrocarbon group may be replaced with —O— or —CO—.
However, the total number of carbon atoms of L ^b6 and L ^b7 is 23 or less.

In formulas (b1-1) to (b1-3), when —CH ₂ — contained in the saturated hydrocarbon group is replaced with —O— or —CO—, the number of carbon atoms before the replacement is The number of carbon atoms in a saturated hydrocarbon group.
The divalent saturated hydrocarbon group includes the same divalent saturated hydrocarbon group as L ^b1 .

L ^b2 is preferably a single bond.
L ^b3 is preferably an alkanediyl group having 1 to 4 carbon atoms.
L ^b4 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b5 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b6 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 4 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b7 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group. , —CH ₂ — contained in the saturated hydrocarbon group may be replaced with —O— or —CO—.

The group in which —CH ₂ — contained in the divalent saturated hydrocarbon group of L ^B1 is replaced with —O— or —CO— is a group represented by formula (b1-1) or formula (b1-3). is preferred.

式（ｂ１－４）中、
Ｌ^b8は、単結合又は炭素数１～２２の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
式（ｂ１－５）中、
Ｌ^b9は、炭素数１～２０の２価の飽和炭化水素基を表す。
Ｌ^b10は、単結合又は炭素数１～１９の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b9及びＬ^b10の合計炭素数は２０以下である。
式（ｂ１－６）中、
Ｌ^b11は、炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b12は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b11及びＬ^b12の合計炭素数は２１以下である。
式（ｂ１－７）中、
Ｌ^b13は、炭素数１～１９の２価の飽和炭化水素基を表す。
Ｌ^b14は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^b15は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b13、Ｌ^b14及びＬ^b15の合計炭素数は１９以下である。
式（ｂ１－８）中、
Ｌ^b16は、炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^b17は、炭素数１～１８の２価の飽和炭化水素基を表す。
Ｌ^b18は、単結合又は炭素数１～１７の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子又はヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b16、Ｌ^b17及びＬ^b18の合計炭素数は１９以下である。 Examples of formula (b1-1) include groups represented by formulas (b1-4) to (b1-8). In formulas (b1-4) to (b1-8), * represents a bond with -Y.

In formula (b1-4),
L ^b8 represents a single bond or a divalent saturated hydrocarbon group having 1 to 22 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
In formula (b1-5),
L ^b9 represents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms.
L ^b10 represents a single bond or a divalent saturated hydrocarbon group having 1 to 19 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total carbon number of L ^b9 and L ^b10 is 20 or less.
In formula (b1-6),
L ^b11 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b12 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total carbon number of L ^b11 and L ^b12 is 21 or less.
In formula (b1-7),
L ^b13 represents a divalent saturated hydrocarbon group having 1 to 19 carbon atoms.
L ^b14 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b15 represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total carbon number of L ^b13 , L ^b14 and L ^b15 is 19 or less.
In formula (b1-8),
L ^b16 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b17 represents a divalent saturated hydrocarbon group having 1 to 18 carbon atoms.
L ^b18 represents a single bond or a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group.
However, the total carbon number of L ^b16 , L ^b17 and L ^b18 is 19 or less.

L ^b8 is preferably an alkanediyl group having 1 to 4 carbon atoms.
L ^b9 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b10 is preferably a single bond or a C 1-19 divalent saturated hydrocarbon group, more preferably a single bond or a C 1-8 divalent saturated hydrocarbon group.
L ^b11 is preferably a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b12 is preferably a single bond or a divalent saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^b13 is preferably a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b14 is preferably a single bond or a C 1-6 divalent saturated hydrocarbon group.
L ^b15 is preferably a single bond or a C 1-18 divalent saturated hydrocarbon group, more preferably a single bond or a C 1-8 divalent saturated hydrocarbon group.
L ^b16 preferably represents a divalent saturated hydrocarbon group having 1 to 12 carbon atoms.
L ^b17 preferably represents a divalent saturated hydrocarbon group having 1 to 6 carbon atoms.
L ^b18 is preferably a single bond or a C 1-17 divalent saturated hydrocarbon group, more preferably a single bond or a C 1-4 divalent saturated hydrocarbon group.

式（ｂ１－９）中、
Ｌ^b19は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b20は、単結合又は炭素数１～２３の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアシルオキシ基に置換されていてもよい。該アシルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アシルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b19及びＬ^b20の合計炭素数は２３以下である。
式（ｂ１－１０）中、
Ｌ^b21は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b22は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b23は、単結合又は炭素数１～２１の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアシルオキシ基に置換されていてもよい。該アシルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アシルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b21、Ｌ^b22及びＬ^b23の合計炭素数は２１以下である。
式（ｂ１－１１）中、
Ｌ^b24は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。
Ｌ^b25は、炭素数１～２１の２価の飽和炭化水素基を表す。
Ｌ^b26は、単結合又は炭素数１～２０の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれる水素原子は、フッ素原子、ヒドロキシ基又はアシルオキシ基に置換されていてもよい。該アシルオキシ基に含まれる－ＣＨ_２－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよく、該アシルオキシ基に含まれる水素原子は、ヒドロキシ基に置換されていてもよい。
ただし、Ｌ^b24、Ｌ^b25及びＬ^b26の合計炭素数は２１以下である。 Examples of formula (b1-3) include groups represented by formulas (b1-9) to (b1-11). In formulas (b1-9) to (b1-11), * represents a bond with -Y.

In formula (b1-9),
L ^b19 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b20 represents a single bond or a divalent saturated hydrocarbon group having 1 to 23 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxy group or an acyloxy group. . —CH ₂ — contained in the acyloxy group may be replaced with —O— or —CO—, and a hydrogen atom contained in the acyloxy group may be substituted with a hydroxy group.
However, the total carbon number of L ^b19 and L ^b20 is 23 or less.
In formula (b1-10),
L ^b21 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b22 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b23 represents a single bond or a divalent saturated hydrocarbon group having 1 to 21 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxy group or an acyloxy group. . —CH ₂ — contained in the acyloxy group may be replaced with —O— or —CO—, and a hydrogen atom contained in the acyloxy group may be substituted with a hydroxy group.
However, the total carbon number of L ^b21 , L ^b22 and L ^b23 is 21 or less.
In formula (b1-11),
L ^b24 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom.
L ^b25 represents a divalent saturated hydrocarbon group having 1 to 21 carbon atoms.
L ^b26 represents a single bond or a divalent saturated hydrocarbon group having 1 to 20 carbon atoms, and a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom, a hydroxy group or an acyloxy group. . —CH ₂ — contained in the acyloxy group may be replaced with —O— or —CO—, and a hydrogen atom contained in the acyloxy group may be substituted with a hydroxy group.
However, the total carbon number of L ^b24 , L ^b25 and L ^b26 is 21 or less.

In formulas (b1-10) and (b1-11), when a hydrogen atom contained in a saturated hydrocarbon group is substituted with an acyloxy group, the carbon number of the acyloxy group, the CO and O and the number of carbon atoms in the saturated hydrocarbon group.

Acyloxy groups include acetyloxy, propionyloxy, butyryloxy, cyclohexylcarbonyloxy, and adamantylcarbonyloxy groups.
The acyloxy group having a substituent includes an oxoadamantylcarbonyloxy group, a hydroxyadamantylcarbonyloxy group, an oxocyclohexylcarbonyloxy group, a hydroxycyclohexylcarbonyloxy group and the like.

Among the groups represented by formula (b1-1), the groups represented by formula (b1-4) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-1), the groups represented by formula (b1-5) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-1), the groups represented by formula (b1-6) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-1), the groups represented by formula (b1-7) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-1), the groups represented by formula (b1-8) include the following. * represents a bond with -Y.

Examples of the group represented by formula (b1-2) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-3), the groups represented by formula (b1-9) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-3), the groups represented by formula (b1-10) include the following. * represents a bond with -Y.

Among the groups represented by formula (b1-3), the groups represented by formula (b1-11) include the following. * represents a bond with -Y.

The alicyclic hydrocarbon group represented by Y may be monocyclic, polycyclic, or spirocyclic. The alicyclic hydrocarbon group represented by Y includes groups represented by formulas (Y1) to (Y38).
When —CH ₂ — contained in the alicyclic hydrocarbon group represented by Y is replaced with —O—, —SO ₂ — or —CO—, the number thereof may be one, or two or more. .

Among them, preferably a group represented by any one of formulas (Y1) to (Y20), formula (Y30) or formula (Y31), more preferably formula (Y11), formula (Y15), formula ( Y16), a group represented by formula (Y19), formula (Y30) or formula (Y31), more preferably a group represented by formula (Y11), formula (Y15) or formula (Y30). be done.

Substituents for the alicyclic hydrocarbon group of Y include a halogen atom, a hydroxy group, an alkyl group having 1 to 12 carbon atoms which may have a hydroxy group, and an alicyclic hydrocarbon group having 3 to 16 carbon atoms. , an alkoxy group having 1 to 12 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, an aralkyl group having 7 to 21 carbon atoms, an acyl group having 2 to 4 carbon atoms, a glycidyloxy group, or -(CH ₂ ) _{en '} -O-CO-R ^{b1 '} group (wherein R ^{b1 '} is an alkyl group having 1 to 16 carbon atoms, an alicyclic hydrocarbon group having 3 to 16 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms represents a hydrogen group, and ja' represents an integer of 0 to 4).

A hydroxymethyl group, a hydroxyethyl group, etc. are mentioned as an alkyl group which has a hydroxy group.
Alkoxy groups include methoxy, ethoxy, propoxy, butoxy, pentyloxy, hexyloxy, heptyloxy, octyloxy, decyloxy and dodecyloxy groups.
Aromatic hydrocarbon groups include phenyl group, naphthyl group, anthryl group, p-methylphenyl group, p-tert-butylphenyl group, p-adamantylphenyl group; tolyl group, xylyl group, cumenyl group, mesityl group, biphenyl group, phenanthryl group, 2,6-diethylphenyl group, aryl group such as 2-methyl-6-ethylphenyl, and the like.
Aralkyl groups include benzyl, phenethyl, phenylpropyl, naphthylmethyl and naphthylethyl groups.
Acyl groups include acetyl, propionyl and butyryl groups.
Halogen atoms include fluorine, chlorine, bromine and iodine atoms.

Examples of Y include the following.

Y is preferably an optionally substituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, more preferably an optionally substituted adamantyl group (constituting these groups (-CH2-) may be replaced with -O-, -SO2- or -CO-), more preferably an adamantyl group, a hydroxyadamantyl group, an oxoadamantyl group, or a group represented below.

Anions include formulas (IA-1) to (IA-49). Anions represented by formulas (IA-1) to (IA-37) [hereinafter sometimes referred to as "anion (IA-1)" or the like depending on the formula number. ] is preferable, formula (IA-1) ~ formula (IA-4), formula (IA-9), formula (IA-10), formula (IA-24) ~ formula Anions represented by any one of (IA-29), formula (IA-37), and formulas (IA-40) to (IA-43) are more preferred.

Here, R ⁱ² to R ⁱ⁷ are, for example, an alkyl group having 1 to 4 carbon atoms, preferably a methyl group or an ethyl group.
R ⁱ⁸ is, for example, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, preferably an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 5 to 12 carbon atoms, or a combination of these A formed group, more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.
L ⁴⁴ is a single bond or an alkanediyl group having 1 to 4 carbon atoms.
Q ¹¹ and Q ¹² are the same as above.

As the anion, anions represented by formulas (Ia-1) to (Ia-22) are preferable.

Examples of the organic cation for Z ⁺ include those exemplified for the organic cation in the salt (aa).

Specific examples of the acid generator (B) include salts represented by formulas (B1-1) to (B1-40). Among them, those containing an arylsulfonium cation are preferable, and formula (B1-1), formula (B1-2), formula (B1-3), formula (B1-6), formula (B1-7), formula (B1-11) ), formula (B1-12), formula (B1-13), formula (B1-14), formula (B1-20), formula (B1-21), formula (B1-22), formula (B1-23) , formula (B1-24), formula (B1-25), formula (B1-26), formula (B1-29), formula (B1-31), formula (B1-32), formula (B1-33), Any of formula (B1-34), formula (B1-35), formula (B1-36), formula (B1-37), formula (B1-38), formula (B1-39) or formula (B1-40) A salt represented by is more preferable.

The acid generator (B) may contain one kind alone, or may contain two or more kinds.
The content of the acid generator (B) is preferably 1 to 40% by mass, more preferably 3 to 35% by mass, relative to the resin (A).
In the resist composition, when the salt (aa) and the acid generator (B) are used as acid generators, the contents of the salt (aa) and the acid generator (B) are preferably is 1.5% by mass or more (more preferably 3% by mass or more), preferably 40% by mass or less (more preferably 35% by mass or less).

<Resin (A)>
Resin (A) has a structural unit having an acid-labile group (hereinafter sometimes referred to as "structural unit (a1)"). The resin (A) preferably further contains structural units other than the structural unit (a1). Structural units other than the structural unit (a1) include structural units having no acid-labile group (hereinafter sometimes referred to as "structural unit (s)"), structural units other than the structural unit (a1) and the structural unit (s). Structural units (hereinafter sometimes referred to as “structural units (t)”) and other structural units derived from monomers known in the art are included.

［式（１）中、Ｒ^a1～Ｒ^a3は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～２０の脂環式炭化水素基又はこれらを組み合わせた基を表すか、Ｒ^a1及びＲ^a2は互いに結合してそれらが結合する炭素原子とともに炭素数３～２０の２価の脂環式炭化水素基を形成する。
ｎａは、０又は１を表す。
＊は結合手を表す。］

［式（２）中、Ｒ^a1’及びＲ^a2’は、それぞれ独立に、水素原子又は炭素数１～１２の炭化水素基を表し、Ｒ^a3’は、炭素数１～２０の炭化水素基を表すか、Ｒ^a2’及びＲ^a3’は互いに結合してそれらが結合する炭素原子及びＸとともに炭素数３～２０の２価の複素環基を形成し、該炭化水素基及び該２価の複素環基に含まれる－ＣＨ₂－は、－Ｏ－又は－Ｓ－で置き換わってもよい。
Ｘは、酸素原子又は硫黄原子を表す。
＊は結合手を表す。］ <Structural unit (a1)>
The structural unit (a1) is derived from a monomer having an acid-labile group (hereinafter sometimes referred to as "monomer (a1)").
The acid-labile group contained in the resin (A) is preferably a group represented by formula (1) and/or a group represented by formula (2).

[In formula (1), R ^a1 to R ^a3 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a group combining these; ^a1 and R ^a2 are bonded to each other to form a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms together with the carbon atoms to which they are bonded.
na represents 0 or 1;
* represents a bond. ]

[In formula (2), R ^a1′ and R ^a2′ each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, and R ^a3′ represents a hydrocarbon group having 1 to 20 carbon atoms. or R ^a2′ and R ^a3′ are bonded to each other to form a divalent heterocyclic group having 3 to 20 carbon atoms together with the carbon atom to which they are bonded and X, and the hydrocarbon group and the divalent heterocyclic --CH ₂ -- contained in the ring group may be replaced with --O-- or --S--.
X represents an oxygen atom or a sulfur atom.
* represents a bond. ]

アルキル基と脂環式炭化水素基とを組み合わせた基としては、例えば、メチルシクロヘキシル基、ジメチルシクロへキシル基、メチルノルボルニル基、シクロヘキシルメチル基、アダマンチルメチル基、ノルボルニルエチル基等が挙げられる。
ｎａは、好ましくは０である。 Examples of alkyl groups of R ^a1 to R ^a3 include methyl group, ethyl group, propyl group, n-butyl group, n-pentyl group, n-hexyl group, n-heptyl group and n-octyl group.
The alicyclic hydrocarbon groups of R ^a1 to R ^a3 may be either monocyclic or polycyclic. Examples of monocyclic alicyclic hydrocarbon groups include cycloalkyl groups such as cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl groups. Examples of polycyclic alicyclic hydrocarbon groups include decahydronaphthyl group, adamantyl group, norbornyl group and the following groups (* represents a bond). The alicyclic hydrocarbon groups of R ^a1 to R ^a3 are preferably alicyclic hydrocarbon groups having 3 to 16 carbon atoms.

Examples of groups in which an alkyl group and an alicyclic hydrocarbon group are combined include a methylcyclohexyl group, a dimethylcyclohexyl group, a methylnorbornyl group, a cyclohexylmethyl group, an adamantylmethyl group, a norbornylethyl group, and the like. mentioned.
na is preferably zero.

Examples of —C(R ^a1 )(R ^a2 )(R ^a3 ) when R ^a1 and R ^a2 combine to form a divalent alicyclic hydrocarbon group include the following groups. The divalent alicyclic hydrocarbon group preferably has 3-12 carbon atoms. * represents a bond with -O-.

Examples of groups represented by formula (1) include 1,1-dialkylalkoxycarbonyl groups (groups in which R ^a1 to R ^a3 are alkyl groups in formula (1), preferably tert-butoxycarbonyl groups), 2- alkyladamantan-2-yloxycarbonyl group (in formula (1), R ^a1 , R ^a2 and the carbon atoms to which they are bonded form an adamantyl group, and R ^a3 is an alkyl group) and 1-(adamantane- 1-yl)-1-alkylalkoxycarbonyl group (in formula (1), R ^a1 and R ^a2 are alkyl groups and R ^a3 is an adamantyl group), and the like.

Ｒ^a1’及びＲ^a2’のうち、少なくとも１つは水素原子であることが好ましい。 Examples of the hydrocarbon groups of R ^a1′ to R ^a3′ include alkyl groups, alicyclic hydrocarbon groups, aromatic hydrocarbon groups and groups formed by combining these groups.
Examples of the alkyl group and the alicyclic hydrocarbon group are the same as those described above.
Aromatic hydrocarbon groups include phenyl, naphthyl, anthryl, p-methylphenyl, p-tert-butylphenyl, p-adamantylphenyl, tolyl, xylyl, cumenyl, mesityl and biphenyl groups. group, phenanthryl group, 2,6-diethylphenyl group, aryl group such as 2-methyl-6-ethylphenyl, and the like.
The divalent heterocyclic group that R ^a2′ and R ^a3′ are bonded to each other to form with the carbon atom to which they are bonded and X includes the following groups. * represents a bond.

At least one of R ^a1′ and R ^a2′ is preferably a hydrogen atom.

Specific examples of the group represented by formula (2) include the following groups. * represents a bond.

Monomer (a1) is preferably a monomer having an acid labile group and an ethylenically unsaturated bond, more preferably a (meth)acrylic monomer having an acid labile group.

Among (meth)acrylic monomers having an acid-labile group, those having an alicyclic hydrocarbon group having 5 to 20 carbon atoms are preferred. When the resin (A) having a structural unit derived from the monomer (a1) having a bulky structure such as an alicyclic hydrocarbon group is used in the resist composition, the resolution of the resist pattern can be improved.

As a structural unit derived from a (meth)acrylic monomer having a group represented by formula (1), preferably a structural unit represented by formula (a1-0), represented by formula (a1-1) structural units or structural units represented by formula (a1-2). These may be used alone or in combination of two or more. In this specification, a structural unit represented by formula (a1-0), a structural unit represented by formula (a1-1), and a structural unit represented by formula (a1-2) are each referred to as structural unit (a1 -0), the structural unit (a1-1) and the structural unit (a1-2), the monomer that induces the structural unit (a1-0), the monomer that induces the structural unit (a1-1), and the structural unit (a1- The monomers that derive 2) are sometimes referred to as monomer (a1-0), monomer (a1-1) and monomer (a1-2), respectively.

［式（ａ１－０）中、
Ｌ^a01は、酸素原子又は^＊－Ｏ－（ＣＨ₂）_k01－ＣＯ－Ｏ－を表し、ｋ０１は１～７のいずれかの整数を表し、＊はカルボニル基との結合手を表す。
Ｒ^a01は、水素原子又はメチル基を表す。
Ｒ^a02、Ｒ^a03及びＲ^a04は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環式炭化水素基又はこれらを組み合わせた基を表す。］

[In the formula (a1-0),
L ^a01 represents an oxygen atom or ^* —O—(CH ₂ ) _k01 —CO—O—, k01 represents an integer of 1 to 7, and * represents a bond with a carbonyl group.
R ^a01 represents a hydrogen atom or a methyl group.
R ^a02 , R ^a03 and R ^a04 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a combination thereof. ]

［式（ａ１－１）及び式（ａ１－２）中、
Ｌ^a1及びＬ^a2は、それぞれ独立に、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k1－ＣＯ－Ｏ－を表し、ｋ１は１～７のいずれかの整数を表し、＊は－ＣＯ－との結合手を表す。
Ｒ^a4及びＲ^a5は、それぞれ独立に、水素原子又はメチル基を表す。
Ｒ^a6及びＲ^a7は、それぞれ独立に、炭素数１～８のアルキル基、炭素数３～１８の脂環式炭化水素基又はこれらを組み合わせることにより形成される基を表す。
ｍ１は０～１４のいずれかの整数を表す。
ｎ１は０～１０のいずれかの整数を表す。
ｎ１’は０～３のいずれかの整数を表す。］

[In the formulas (a1-1) and (a1-2),
L ^a1 and L ^a2 each independently represent —O— or ^* —O—(CH ₂ ) _k1 —CO—O—, k1 represents an integer of 1 to 7, * is —CO— represents a bond with
R ^a4 and R ^a5 each independently represent a hydrogen atom or a methyl group.
R ^a6 and R ^a7 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, or a group formed by combining these.
m1 represents any integer from 0 to 14;
n1 represents any integer from 0 to 10;
n1' represents an integer of 0 to 3; ]

L ^a01 is preferably an oxygen atom or ^* —O—(CH ₂ ) _k01 —CO—O— (provided that k01 is preferably any integer from 1 to 4, more preferably 1). ), more preferably an oxygen atom.
Examples of the alkyl groups, alicyclic hydrocarbon groups, and groups in which these are combined for R ^a02 , R ^a03 and R ^a04 include the same groups as those listed for R ^a1 to R ^a3 in formula (1).
The alkyl groups of R ^a02 , R ^a03 and R ^a04 preferably have 6 or less carbon atoms.
The alicyclic hydrocarbon groups of R ^a02 , R ^a03 and R ^a04 preferably have 8 or less carbon atoms, more preferably 6 or less.
It is preferable that the combined group of an alkyl group and an alicyclic hydrocarbon group has a total carbon number of 18 or less. Examples of such groups include a methylcyclohexyl group, a dimethylcyclohexyl group, a methylnorbornyl group, a methyladamantyl group, a cyclohexylmethyl group, a methylcyclohexylmethyl group, an adamantylmethyl group and a norbornylmethyl group. be done.
R ^a02 and R ^a03 are preferably alkyl groups having 1 to 6 carbon atoms, more preferably methyl or ethyl groups.
R ^a04 is preferably an alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 5 to 12 carbon atoms, more preferably a methyl group, an ethyl group, a cyclohexyl group or an adamantyl group.

L ^a1 and L ^a2 are preferably —O— or ^* —O—(CH ₂ ) _k1′ —CO—O— (provided that k1′ is any integer of 1 to 4, preferably is 1.), more preferably -O-.
R ^a4 and R ^a5 are preferably methyl groups.
Examples of the alkyl groups, alicyclic hydrocarbon groups, and groups in which these are combined for R ^a6 and R ^a7 include the same groups as those listed for R ^a1 to R ^a3 in formula (1).
The alkyl groups of R ^a6 and R ^a7 preferably have 6 or less carbon atoms.
The alicyclic hydrocarbon groups of R ^a6 and R ^a7 are preferably alicyclic hydrocarbon groups having 8 or less carbon atoms, more preferably 6 or less alicyclic hydrocarbon groups.
m1 is preferably an integer from 0 to 3, more preferably 0 or 1.
n1 is preferably an integer from 0 to 3, more preferably 0 or 1.
n1' is preferably 0 or 1.

As the structural unit (a1-0), for example, a structural unit represented by any one of formulas (a1-0-1) to (a1-0-12) is preferable, and formulas (a1-0-1) to Structural units represented by formula (a1-0-10) are more preferred.

In the above structural unit, a structural unit in which the methyl group corresponding to R ^a01 is replaced with a hydrogen atom can also be mentioned as a specific example of the structural unit (a1-0).

Examples of the monomer (a1-1) include monomers described in JP-A-2010-204646. Among them, a monomer represented by any one of formulas (a1-1-1) to (a1-1-8) is preferable, and any one of formulas (a1-1-1) to (a1-1-4) A monomer represented by is more preferable.

Examples of the monomer (a1-2) include 1-methylcyclopentan-1-yl (meth)acrylate, 1-ethylcyclopentan-1-yl (meth)acrylate, 1-methylcyclohexan-1-yl (meth) Acrylates, 1-ethylcyclohexan-1-yl (meth)acrylate, 1-ethylcycloheptan-1-yl (meth)acrylate, 1-ethylcyclooctan-1-yl (meth)acrylate, 1-isopropylcyclopentane-1 -yl (meth)acrylate, 1-isopropylcyclohexan-1-yl (meth)acrylate and the like. Monomers represented by any one of formulas (a1-2-1) to (a1-2-12) are preferred, and formula (a1-2-3), formula (a1-2-4), formula (a1- 2-9) and formula (a1-2-10) are more preferable, and monomers represented by formula (a1-2-3) and formula (a1-2-9) are more preferable.

When the resin (A) contains the structural unit (a1-0) and/or the structural unit (a1-1) and/or the structural unit (a1-2), the total content of these is the total structure of the resin (A) It is generally 10 to 95 mol %, preferably 15 to 90 mol %, more preferably 20 to 85 mol %, relative to the unit.

式（ａ１－５）中、
Ｒ^a8は、ハロゲン原子を有してもよい炭素数１～６のアルキル基、水素原子又はハロゲン原子を表す。
Ｚ^a1は、単結合又は＊－（ＣＨ₂）_h3－ＣＯ－Ｌ⁵⁴－を表し、ｈ３は１～４のいずれかの整数を表し、＊は、Ｌ⁵¹との結合手を表す。
Ｌ⁵¹、Ｌ⁵²、Ｌ⁵³及びＬ⁵⁴は、それぞれ独立に、－Ｏ－又は－Ｓ－を表す。
ｓ１は、１～３のいずれかの整数を表す。
ｓ１’は、０～３のいずれかの整数を表す。 As the structural unit derived from a (meth)acrylic monomer having a group represented by formula (2), a structural unit represented by formula (a1-5) (hereinafter referred to as "structural unit (a1-5)" There is) is also mentioned.

In formula (a1-5),
R ^a8 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.
Z ^a1 represents a single bond or *—(CH ₂ ) _h3 —CO—L ⁵⁴ —, h3 represents an integer of 1 to 4, and * represents a bond with L ⁵¹ .
L ⁵¹ , L ⁵² , L ⁵³ and L ⁵⁴ each independently represent -O- or -S-.
s1 represents any integer from 1 to 3;
s1′ represents any integer from 0 to 3;

Halogen atoms include fluorine atoms and chlorine atoms, with fluorine atoms being preferred.
Examples of the alkyl group having 1 to 6 carbon atoms which may have a halogen atom include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, fluoromethyl group and trifluoromethyl. groups.
In formula (a1-5), R ^a8 is preferably a hydrogen atom, a methyl group or a trifluoromethyl group.
L ⁵¹ is preferably an oxygen atom.
Preferably, one of L ⁵² and L ⁵³ is —O— and the other is —S—.
As for s1, 1 is preferable.
s1' is preferably an integer of 0-2.
Z ^a1 is preferably a single bond or *—CH ₂ —CO—O—.

Examples of the monomer leading to the structural unit (a1-5) include monomers described in JP-A-2010-61117. Among them, monomers represented by formulas (a1-5-1) to (a1-5-4) are preferable, and monomers represented by formula (a1-5-1) or formula (a1-5-2) is more preferred.

When the resin (A) has the structural unit (a1-5), the content thereof is preferably 1 to 50 mol%, more preferably 3 to 45 mol%, based on the total structural units of the resin (A). , 5 to 40 mol % is more preferable.

The structural unit (a1) also includes the following structural units.

樹脂（Ａ）が上記構造単位を含む場合、その含有率は、樹脂（Ａ）の全構造単位に対して、１０～９５モル％が好ましく、１５～９０モル％がより好ましく、２０～８５モル％がさらに好ましい。

When the resin (A) contains the above structural unit, its content is preferably 10 to 95 mol%, more preferably 15 to 90 mol%, and 20 to 85 mol, based on the total structural units of the resin (A). % is more preferred.

The structural unit (a) having an acid labile group in the resin (A) includes structural unit (a1-0), structural unit (a1-1), structural unit (a1-2) and structural unit (a1-5). ) is preferably at least one selected from the group consisting of, more preferably at least two or more, a combination of the structural unit (a1-1) and the structural unit (a1-2), the structural unit (a1-1) and the structural unit ( Combinations a1-5) are even more preferred. Structural unit (a1) preferably includes structural unit (a1-1).

<Structural unit (s)>
Structural unit (s) is derived from a monomer having no acid-labile group (hereinafter sometimes referred to as "monomer (s)"). As a monomer leading to the structural unit (s), a monomer having no acid-labile group known in the field of resists can be used.
As the structural unit (s), a structural unit having a hydroxy group or a lactone ring and not having an acid labile group is preferred. A structural unit having a hydroxy group and no acid-labile group (hereinafter sometimes referred to as "structural unit (a2)") and/or a structure having a lactone ring and no acid-labile group When a resin having a unit (hereinafter sometimes referred to as "structural unit (a3)") is used in the resist composition of the present invention, the resolution of the resist pattern and adhesion to the substrate can be improved.

<Structural unit (a2)>
The hydroxy group possessed by the structural unit (a2) may be an alcoholic hydroxy group or a phenolic hydroxy group.
When producing a resist pattern from the resist composition of the present invention, when using a high-energy beam such as a KrF excimer laser (248 nm), an electron beam, or EUV (extreme ultraviolet light) as an exposure light source, the structural unit (a2) , it is preferable to use a structural unit (a2) having a phenolic hydroxy group. When using an ArF excimer laser (193 nm) or the like, the structural unit (a2) is preferably a structural unit (a2) having an alcoholic hydroxy group, more preferably a structural unit (a2-1). As the structural unit (a2), one type may be contained alone, or two or more types may be contained.

［式（ａ２－０）中、
Ｒ^a30は、水素原子、ハロゲン原子又はハロゲン原子を有してもよい炭素数１～６のアルキル基を表す。
Ｒ^a31は、ハロゲン原子、ヒドロキシ基、炭素数１～６のアルキル基、炭素数１～６のアルコキシ基、炭素数２～４のアシル基、炭素数２～４のアシルオキシ基、アクリロイルオキシ基又はメタクリロイルオキシ基を表す。
ｍａは０～４のいずれかの整数を表す。ｍａが２以上の整数である場合、複数のＲ^a31は互いに同一であっても異なってもよい。］ The structural unit (a2) having a phenolic hydroxy group includes a structural unit represented by formula (a2-0) (hereinafter sometimes referred to as "structural unit (a2-0)").

[In formula (a2-0),
R ^a30 represents a hydrogen atom, a halogen atom or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom.
R ^a31 is a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 4 carbon atoms, an acyloxy group having 2 to 4 carbon atoms, an acryloyloxy group, or represents a methacryloyloxy group.
ma represents any integer from 0 to 4; When ma is an integer of 2 or more, multiple R ^a31 may be the same or different. ]

The alkyl group having 1 to 6 carbon atoms which may have a halogen atom for R ^a30 includes trifluoromethyl group, difluoromethyl group, methyl group, perfluoroethyl group, 1,1,1-trifluoroethyl group, 1 , 1,2,2-tetrafluoroethyl group, ethyl group, perfluoropropyl group, 1,1,1,2,2-pentafluoropropyl group, propyl group, perfluorobutyl group, 1,1,2,2,3 , 3,4,4-octafluorobutyl group, butyl group, perfluoropentyl group, 1,1,1,2,2,3,3,4,4-nonafluoropentyl group, n-pentyl group, n-hexyl group, n-perfluorohexyl group, and the like. R ^a30 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, even more preferably a hydrogen atom or a methyl group.
The alkoxy group for R ^a31 includes methoxy, ethoxy, propoxy, butoxy, pentyloxy and hexyloxy groups. Among them, an alkoxy group having 1 to 4 carbon atoms is preferable, a methoxy group or an ethoxy group is more preferable, and a methoxy group is even more preferable.
Acyl groups include acetyl, propionyl and butyryl groups.
The acyloxy group includes acetyloxy group, propionyloxy group, butyryloxy group and the like.
ma is preferably 0, 1 or 2, more preferably 0 or 1, and still more preferably 0.

Examples of monomers that induce the structural unit (a2-0) include monomers described in JP-A-2010-204634.
Among them, the structural unit (a2-0) is represented by formula (a2-0-1), formula (a2-0-2), formula (a2-0-3) and formula (a2-0-4), respectively. are preferred, and structural units represented by formula (a2-0-1) or formula (a2-0-2) are more preferred.

The resin (A) containing the structural unit (a2-0) is polymerized using a monomer in which the phenolic hydroxy group of the monomer deriving the structural unit (a2-0) is protected with a protecting group, and then deprotected. It can be produced by processing. However, when the deprotection treatment is carried out, it is necessary to carry out in such a manner as not to significantly impair the acid-labile group of the structural unit (a1). An acetyl group etc. are mentioned as such a protecting group.

When the resin (A) has a structural unit (a2-0) having a phenolic hydroxy group, the content thereof is preferably 5 to 95 mol%, preferably 10 to 95 mol%, based on the total structural units of the resin (A). 80 mol % is more preferred, and 15 to 80 mol % is even more preferred.

式（ａ２－１）中、
Ｌ^a3は、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k2－ＣＯ－Ｏ－を表し、
ｋ２は１～７のいずれかの整数を表す。＊は－ＣＯ－との結合手を表す。
Ｒ^a14は、水素原子又はメチル基を表す。
Ｒ^a15及びＲ^a16は、それぞれ独立に、水素原子、メチル基又はヒドロキシ基を表す。
ｏ１は、０～１０のいずれかの整数を表す。 The structural unit (a2) having an alcoholic hydroxy group includes a structural unit represented by formula (a2-1) (hereinafter sometimes referred to as "structural unit (a2-1)").

In formula (a2-1),
L ^a3 represents —O— or ^* —O—(CH ₂ ) _k2 —CO—O—;
k2 represents any integer from 1 to 7; * represents a bond with -CO-.
R ^a14 represents a hydrogen atom or a methyl group.
R ^a15 and R ^a16 each independently represent a hydrogen atom, a methyl group or a hydroxy group.
o1 represents an integer from 0 to 10;

In formula (a2-1), L ^a3 is preferably —O—, —O—(CH ₂ ) _f1 —CO—O— (f1 is an integer of 1 to 4). , and more preferably -O-.
R ^a14 is preferably a methyl group.
R ^a15 is preferably a hydrogen atom.
R ^a16 is preferably a hydrogen atom or a hydroxy group.
o1 is preferably any integer from 0 to 3, more preferably 0 or 1.

Examples of structural units (a2-1) include structural units derived from monomers described in JP-A-2010-204646. Structural units represented by any one of formulas (a2-1-1) to (a2-1-6) are preferred, and any one of formulas (a2-1-1) to (a2-1-4) Structural units represented by the formula (a2-1-1) or (a2-1-3) are more preferable.

When the resin (A) contains the structural unit (a2-1), its content is usually 1 to 45 mol%, preferably 1 to 40 mol%, based on the total structural units of the resin (A). Yes, more preferably 1 to 35 mol %, still more preferably 2 to 20 mol %.

<Structural unit (a3)>
The lactone ring of the structural unit (a3) may be a monocyclic ring such as a β-propiolactone ring, γ-butyrolactone ring, δ-valerolactone ring, or a condensed ring of a monocyclic lactone ring and another ring. It's okay. A γ-butyrolactone ring, an adamantanelactone ring, or a bridged ring containing a γ-butyrolactone ring structure is preferred.

Structural unit (a3) is preferably a structural unit represented by formula (a3-1), formula (a3-2), formula (a3-3) or formula (a3-4). One of these may be contained alone, or two or more may be contained.

［式（ａ３－１）中、
Ｌ^a4は、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k3－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。
）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a18は、水素原子又はメチル基を表す。
Ｒ^a21は炭素数１～４の脂肪族炭化水素基を表す。
ｐ１は０～５のいずれかの整数を表す。ｐ１が２以上のとき、複数のＲ^a21は互いに同一又は相異なる。
式（ａ３－２）中、
Ｌ^a5は、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k3－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。
）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a19は、水素原子又はメチル基を表す。
Ｒ^a22は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
ｑ１は、０～３のいずれかの整数を表す。ｑ１が２以上のとき、複数のＲ^a22は互いに同一又は相異なる。
式（ａ３－３）中、
Ｌ^a6は、－Ｏ－又は^＊－Ｏ－（ＣＨ₂）_k3－ＣＯ－Ｏ－（ｋ３は１～７のいずれかの整数を表す。
）で表される基を表す。＊はカルボニル基との結合手を表す。
Ｒ^a20は、水素原子又はメチル基を表す。
Ｒ^a23は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
ｒ１は、０～３のいずれかの整数を表す。ｒ１が２以上のとき、複数のＲ^a23は互いに同一又は相異なる。
式（ａ３－４）中、
Ｒ^a24は、ハロゲン原子を有してもよい炭素数１～６のアルキル基、水素原子又はハロゲン原子を表す。
Ｒ^ａ２５は、カルボキシ基、シアノ基又は炭素数１～４の脂肪族炭化水素基を表す。
Ｌ^a7は、－Ｏ－、^＊－Ｏ－Ｌ^a8－Ｏ－、^＊－Ｏ－Ｌ^a8－ＣＯ－Ｏ－、^＊－Ｏ－Ｌ^a8－ＣＯ－Ｏ－Ｌ^a9－ＣＯ－Ｏ－又は^＊－Ｏ－Ｌ^a8－Ｏ－ＣＯ－Ｌ^a9－Ｏ－を表す。
＊はカルボニル基との結合手を表す。
Ｌ^a8及びＬ^a9は、互いに独立に、炭素数１～６のアルカンジイル基を表す。
ｗ１は、０～８のいずれかの整数を表す。ｗ１が２以上のとき、複数のＲ^ａ２５は互いに同一であってもよく、異なってもよい。］

[In the formula (a3-1),
L ^a4 is —O— or ^* —O—(CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7;
) represents a group represented by * represents a bond with a carbonyl group.
R ^a18 represents a hydrogen atom or a methyl group.
R ^a21 represents an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
p1 represents any integer from 0 to 5; When p1 is 2 or more, a plurality of R ^a21 are the same or different.
In formula (a3-2),
L ^a5 is —O— or ^* —O—(CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7;
) represents a group represented by * represents a bond with a carbonyl group.
R ^a19 represents a hydrogen atom or a methyl group.
R ^a22 represents a carboxy group, a cyano group or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
q1 represents an integer of 0 to 3; When q1 is 2 or more, a plurality of R ^a22 are the same or different.
In formula (a3-3),
L ^a6 is —O— or ^* —O—(CH ₂ ) _k3 —CO—O— (k3 represents an integer of 1 to 7;
) represents a group represented by * represents a bond with a carbonyl group.
R ^a20 represents a hydrogen atom or a methyl group.
R ^a23 represents a carboxy group, a cyano group or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
r1 represents an integer of 0 to 3; When r1 is 2 or more, a plurality of R ^a23 are the same or different.
In formula (a3-4),
R ^a24 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, a hydrogen atom or a halogen atom.
R ^a25 represents a carboxy group, a cyano group or an aliphatic hydrocarbon group having 1 to 4 carbon atoms.
L ^a7 is -O-, ^* -OL ^a8 -O-, ^* -OL ^a8 -CO-O-, ^* -OL ^a8 -CO-O-L ^a9 -CO-O- or ^* -O-L ^a8 -O-CO-L ^a9 -O-.
* represents a bond with a carbonyl group.
L ^a8 and L ^a9 each independently represent an alkanediyl group having 1 to 6 carbon atoms.
w1 represents any integer from 0 to 8; When w1 is 2 or more, a plurality of R ^a25 may be the same or different. ]

The aliphatic hydrocarbon groups represented by R ^a21 , R ^a22 and R ^a23 include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl and tert-butyl groups. mentioned.
Halogen atoms of R ^a24 include fluorine, chlorine, bromine and iodine atoms.
Examples of the alkyl group for R ^a24 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group and n-hexyl group. , preferably an alkyl group having 1 to 4 carbon atoms, more preferably a methyl group or an ethyl group.
The alkyl group having a halogen atom for R ^a24 includes a trifluoromethyl group, a perfluoroethyl group, a perfluoropropyl group, a perfluoroisopropyl group, a perfluorobutyl group, a perfluorosec-butyl group, a perfluorotert-butyl group, a perfluoropentyl group, and a perfluoro A hexyl group, a trichloromethyl group, a tribromomethyl group, a triiodomethyl group and the like can be mentioned.

The alkanediyl groups of L ^a8 and L ^a9 include methylene group, ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group, pentane-1,5 -diyl group, hexane-1,6-diyl group, butane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2-diyl group, pentane-1, 4-diyl group, 2-methylbutane-1,4-diyl group and the like.

In formulas (a3-1) to (a3-3), L ^a4 to L ^a6 are each independently preferably -O- or *-O- in which k3 is an integer of 1 to 4. A group represented by (CH ₂ ) _k3 --CO--O--, more preferably --O-- and *--O--CH ₂ --CO--O--, more preferably an oxygen atom.
R ^a18 to R ^a21 are preferably methyl groups.
R ^a22 and R ^a23 are each independently preferably a carboxy group, a cyano group or a methyl group.
p1, q1 and r1 are each independently preferably an integer of 0 to 2, more preferably 0 or 1.

（式中、Ｒ^ａ２４、及びＬ^ａ７は、上記と同じ意味を表す。） In formula (a3-4),
R ^a24 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group or an ethyl group, still more preferably a hydrogen atom or a methyl group.
L ^a7 is preferably -O- or ^* -O-L ^a8 -CO-O-, more preferably -O-, -O-CH ₂ -CO-O- or -O-C ₂ H ₄ -CO-O-.
R ^a25 is preferably a carboxy group, a cyano group or a methyl group.
w1 is preferably an integer from 0 to 2, more preferably 0 or 1.
In particular, formula (a3-4) is preferably formula (a3-4)'.

(In the formula, R ^a24 and L ^a7 have the same meanings as above.)

Examples of the monomer leading to the structural unit (a3) include the monomers described in JP-A-2010-204646, the monomers described in JP-A-2000-122294, and the monomers described in JP-A-2012-41274. mentioned. The structural unit (a3) includes formulas (a3-1-1) to (a3-1-4), formulas (a3-2-1) to (a3-2-4), and formula (a3-3- 1) Structural units represented by any one of formulas (a3-3-4) and formulas (a3-4-1) to (a3-4-12) are preferred, and formula (a3-1-1), Represented by any of formula (a3-1-2), formula (a3-2-3) to formula (a3-2-4) and formula (a3-4-1) to formula (a3-4-12) Structural units are more preferable, and structural units represented by any one of formulas (a3-4-1) to (a3-4-12) are more preferable, and formulas (a3-4-1) to (a3- Structural units represented by any one of 4-6) are even more preferred.

In the structural units represented by the following formulas (a3-4-1) to (a3-4-12), the compound in which the methyl group corresponding to R ^a24 is replaced with a hydrogen atom also includes the structural unit (a3-4 ) can be cited as a specific example.

When the resin (A) contains the structural unit (a3), the total content is usually 5 to 70 mol%, preferably 10 to 65 mol%, based on the total structural units of the resin (A). , more preferably 10 to 60 mol %.
Further, the content of structural unit (a3-1), structural unit (a3-2), structural unit (a3-3) and structural unit (a3-4) is 5 to 60 mol % is preferred, 5 to 50 mol % is more preferred, and 10 to 50 mol % is even more preferred.

<Other structural units (t)>
The structural unit (t) includes a structural unit having a halogen atom other than the structural unit (a2) and the structural unit (a3) (hereinafter sometimes referred to as "structural unit (a4)") and a non-eliminating hydrocarbon group. structural unit (hereinafter sometimes referred to as "structural unit (a5)") having a

［式（ａ４－０）中、
Ｒ⁵は、水素原子又はメチル基を表す。
Ｌ⁴は、単結合又は２価の炭素数１～４の脂肪族飽和炭化水素基を表す。
Ｌ³は、炭素数１～８のペルフルオロアルカンジイル基又は炭素数３～１２のペルフルオロシクロアルカンジイル基を表す。
Ｒ⁶は、水素原子又はフッ素原子を表す。］ Structural units (a4) include structural units represented by formula (a4-0).

[In the formula (a4-0),
^R5 represents a hydrogen atom or a methyl group.
L ⁴ represents a single bond or a divalent C 1-4 aliphatic saturated hydrocarbon group.
L ³ represents a perfluoroalkanediyl group having 1 to 8 carbon atoms or a perfluorocycloalkanediyl group having 3 to 12 carbon atoms.
^R6 represents a hydrogen atom or a fluorine atom. ]

The divalent aliphatic saturated hydrocarbon group represented by L ⁴ includes alkanediyl groups having 1 to 4 carbon atoms, such as methylene, ethylene, propane-1,3-diyl, butane-1, straight-chain alkanediyl groups such as 4-diyl groups, straight-chain alkanediyl groups having side chains of alkyl groups (especially methyl groups, ethyl groups, etc.), ethane-1,1-diyl groups, branched alkanediyl groups such as propane-1,2-diyl group, butane-1,3-diyl group, 2-methylpropane-1,3-diyl group and 2-methylpropane-1,2-diyl group; be done.

The perfluoroalkanediyl group for L ³ includes a difluoromethylene group, a perfluoroethylene group, a perfluoroethylfluoromethylene group, a perfluoropropane-1,3-diyl group, a perfluoropropane-1,2-diyl group, and a perfluoropropane-2,2 -diyl group, perfluorobutane-1,4-diyl group, perfluorobutane-2,2-diyl group, perfluorobutane-1,2-diyl group, perfluoropentane-1,5-diyl group, perfluoropentane-2,2 -diyl group, perfluoropentane-3,3-diyl group, perfluorohexane-1,6-diyl group, perfluorohexane-2,2-diyl group, perfluorohexane-3,3-diyl group, perfluoroheptane-1,7 -diyl group, perfluoroheptane-2,2-diyl group, perfluoroheptane-3,4-diyl group, perfluoroheptane-4,4-diyl group, perfluorooctane-1,8-diyl group, perfluorooctane-2,2 -diyl group, perfluorooctane-3,3-diyl group, perfluorooctane-4,4-diyl group and the like.
The perfluorocycloalkanediyl group for L ³ includes a perfluorocyclohexanediyl group, a perfluorocyclopentanediyl group, a perfluorocycloheptanediyl group, a perfluoroadamantanediyl group, and the like.

L ⁴ is preferably a single bond, a methylene group or an ethylene group, more preferably a single bond or a methylene group.
L ³ is preferably a C 1-6 perfluoroalkanediyl group, more preferably a C 1-3 perfluoroalkanediyl group.

Examples of the structural unit (a4-0) include structural units shown below and structural units in which a methyl group corresponding to R ⁵ in the following structural units is replaced with a hydrogen atom.

［式（ａ４－１）中、
Ｒ^a41は、水素原子又はメチル基を表す。
Ｒ^a42は、置換基を有していてもよい炭素数１～２０の炭化水素基を表し、該炭化水素基に含まれる－ＣＨ₂－は、－Ｏ－又は－ＣＯ－に置き換わっていてもよい。
Ａ^a41は、置換基を有していてもよい炭素数１～６のアルカンジイル基又は式（ａ－ｇ１）で表される基を表す。

〔式（ａ－ｇ１）中、
ｓは０又は１を表す。
Ａ^a42及びＡ^a44は、それぞれ独立に、置換基を有していてもよい炭素数１～５の２価の脂肪族炭化水素基を表す。
Ａ^a43は、単結合又は置換基を有していてもよい炭素数１～５の２価の脂肪族炭化水素基を表す。
Ｘ^a41及びＸ^a42は、それぞれ独立に、－Ｏ－、－ＣＯ－、－ＣＯ－Ｏ－又は－Ｏ－ＣＯ－を表す。
ただし、Ａ^a42、Ａ^a43、Ａ^a44、Ｘ^a41及びＸ^a42の炭素数の合計は７以下である。〕
＊は結合手であり、右側の＊が－Ｏ－ＣＯ－Ｒ^a42との結合手である。］ Structural units (a4) include structural units represented by formula (a4-1).

[In formula (a4-1),
R ^a41 represents a hydrogen atom or a methyl group.
R ^a42 represents an optionally substituted hydrocarbon group having 1 to 20 carbon atoms, and —CH ₂ — contained in the hydrocarbon group may be replaced with —O— or —CO— good.
A ^a41 represents an optionally substituted alkanediyl group having 1 to 6 carbon atoms or a group represented by formula (a-g1).

[In the formula (a-g1),
s represents 0 or 1;
A ^a42 and A ^a44 each independently represent an optionally substituted divalent aliphatic hydrocarbon group having 1 to 5 carbon atoms.
A ^a43 represents a single bond or an optionally substituted C 1-5 divalent aliphatic hydrocarbon group.
X ^a41 and X ^a42 each independently represent -O-, -CO-, -CO-O- or -O-CO-.
However, the total number of carbon atoms of A ^a42 , A ^a43 , A ^a44 , X ^a41 and X ^a42 is 7 or less. ]
* is a bond, and * on the right is a bond with —O—CO—R ^a42 . ]

The hydrocarbon group for R ^a42 includes chain and cyclic aliphatic hydrocarbon groups, aromatic hydrocarbon groups, and groups formed by combining these groups.
Chain and cyclic aliphatic hydrocarbon groups may have a carbon-carbon unsaturated bond, but chain and cyclic saturated aliphatic hydrocarbon groups are preferred. The saturated aliphatic hydrocarbon group includes a linear or branched alkyl group, a monocyclic or polycyclic alicyclic hydrocarbon group, and an aliphatic hydrocarbon group formed by combining an alkyl group and an alicyclic hydrocarbon group. group hydrocarbon groups and the like.

芳香族炭化水素基としては、フェニル基、ナフチル基、アントリル基、ビフェニリル基、フェナントリル基及びフルオレニル基が挙げられる。 Chain aliphatic hydrocarbon groups include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, n-heptyl group, n-octyl group and n-decyl. n-dodecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl and n-octadecyl groups. Cyclic aliphatic hydrocarbon groups include cycloalkyl groups such as cyclopentyl, cyclohexyl, cycloheptyl and cyclooctyl; decahydronaphthyl, adamantyl, norbornyl and the following groups (* indicates a bond represents a hand.) and other polycyclic alicyclic hydrocarbon groups.

Aromatic hydrocarbon groups include phenyl, naphthyl, anthryl, biphenylyl, phenanthryl and fluorenyl groups.

［式（ａ－ｇ３）中、
Ｘ^a43は、酸素原子、カルボニル基、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^a45は、少なくとも１つのハロゲン原子を有する炭素数１～１７の脂肪族炭化水素基を表す。
＊は結合手を表す。］ R ^a42 includes, as a substituent, a halogen atom or a group represented by formula (a-g3). A halogen atom includes a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, preferably a fluorine atom.

[In the formula (a-g3),
X ^a43 represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group.
A ^a45 represents a C 1-17 aliphatic hydrocarbon group having at least one halogen atom.
* represents a bond. ]

Examples of the aliphatic hydrocarbon group for A ^a45 include groups similar to those exemplified for R ^a42 .
R ^a42 is preferably an aliphatic hydrocarbon group which may have a halogen atom, more preferably an alkyl group having a halogen atom and/or an aliphatic hydrocarbon group having a group represented by formula (a-g3) .
When R ^a42 is an aliphatic hydrocarbon group having a halogen atom, it is preferably an aliphatic hydrocarbon group having a fluorine atom, more preferably a perfluoroalkyl group or a perfluorocycloalkyl group, still more preferably having a carbon number of It is a perfluoroalkyl group having 1 to 6 carbon atoms, particularly preferably a perfluoroalkyl group having 1 to 3 carbon atoms. Perfluoroalkyl groups include perfluoromethyl, perfluoroethyl, perfluoropropyl, perfluorobutyl, perfluoropentyl, perfluorohexyl, perfluoroheptyl and perfluorooctyl groups. A perfluorocyclohexyl group etc. are mentioned as a perfluorocycloalkyl group.
When R ^a42 is an aliphatic hydrocarbon group having a group represented by formula (a-g3), including the number of carbon atoms contained in the group represented by formula (a-g3), the aliphatic hydrocarbon The total number of carbon atoms in the group is preferably 15 or less, more preferably 12 or less. When it has a group represented by formula (a-g3) as a substituent, the number thereof is preferably one.

［式（ａ－ｇ２）中、
Ａ^a46は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す。
Ｘ^a44は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^a47は、ハロゲン原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す。
ただし、Ａ^a46、Ａ^a47及びＸ^a44の炭素数の合計は１８以下であり、Ａ^a46及びＡ^a47のうち、少なくとも一方は、少なくとも１つのハロゲン原子を有する。
＊はカルボニル基との結合手を表す。］ When R ^a42 has an aliphatic hydrocarbon group having a group represented by formula (a-g3), R ^a42 is more preferably a group represented by formula (a-g2).

[In the formula (a-g2),
A ^a46 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
X ^a44 represents a carbonyloxy group or an oxycarbonyl group.
A ^a47 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a halogen atom.
However, the total number of carbon atoms of A ^a46 , A ^a47 and X ^a44 is 18 or less, and at least one of A ^a46 and A ^a47 has at least one halogen atom.
* represents a bond with a carbonyl group. ]

The number of carbon atoms in the aliphatic hydrocarbon group of A ^a46 is preferably 1-6, more preferably 1-3.
The number of carbon atoms in the aliphatic hydrocarbon group of A ^a47 is preferably 4 to 15, more preferably 5 to 12, and A ^a47 is more preferably a cyclohexyl group or an adamantyl group.

A more preferred structure of the partial structure represented by *-A ^a46 -X ^a44 -A ^a47 (* is a bond with a carbonyl group) is the following structure.

The alkanediyl group of A ^a41 includes methylene group, ethylene group, propane-1,3-diyl group, butane-1,4-diyl group, pentane-1,5-diyl group and hexane-1,6-diyl group. straight-chain alkanediyl groups such as; Branched alkanediyl groups such as 2-methylbutane-1,4-diyl group can be mentioned.
Examples of substituents on the alkanediyl group of A ^a41 include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.
A ^a41 is preferably an alkanediyl group having 1 to 4 carbon atoms, more preferably an alkanediyl group having 2 to 4 carbon atoms, and still more preferably an ethylene group.

The aliphatic hydrocarbon groups of A ^a42 , A ^a43 and A ^a44 in group (a-g1) may have carbon-carbon unsaturated bonds, but chain and cyclic saturated aliphatic hydrocarbon groups and groups formed by combining these are preferred. The saturated aliphatic hydrocarbon group includes a linear or branched alkyl group, a monocyclic or polycyclic alicyclic hydrocarbon group, and a combination of an alkyl group and an alicyclic hydrocarbon group. An aliphatic hydrocarbon group etc. are mentioned. Specifically, methylene group, ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group, 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2-diyl group and the like.
Substituents of the aliphatic hydrocarbon groups of A ^a42 , A ^a43 and A ^a44 include a hydroxy group and an alkoxy group having 1 to 6 carbon atoms.
s is preferably zero.

Examples of the group (a-g1) in which X ^a42 represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group include the following groups. In the following examples, * and ** each represent a bond, and ** is a bond with --O--CO--R ^a42 .

［式（ａ４－２）中、
Ｒ^f1は、水素原子又はメチル基を表す。
Ａ^f1は、炭素数１～６のアルカンジイル基を表す。
Ｒ^f2は、フッ素原子を有する炭素数１～１０の炭化水素基を表す。］ Structural units represented by formula (a4-1) are preferably structural units represented by formulas (a4-2) and (a4-3).

[In formula (a4-2),
R ^f1 represents a hydrogen atom or a methyl group.
A ^f1 represents an alkanediyl group having 1 to 6 carbon atoms.
R ^f2 represents a hydrocarbon group having 1 to 10 carbon atoms and having a fluorine atom. ]

The alkanediyl group of A ^f1 includes methylene group, ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group and pentane-1,5-diyl group. , hexane-1,6-diyl group and other linear alkanediyl groups; 1-methylpropane-1,3-diyl group, 2-methylpropane-1,3-diyl group, 2-methylpropane-1,2 -diyl group, 1-methylbutane-1,4-diyl group, 2-methylbutane-1,4-diyl group and other branched alkanediyl groups.

Hydrocarbon groups for R ^f2 include aliphatic hydrocarbon groups and aromatic hydrocarbon groups, and aliphatic hydrocarbon groups include groups formed by chain, cyclic and combinations thereof. As the aliphatic hydrocarbon group, an alkyl group and an alicyclic hydrocarbon group are preferable.
Alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-octyl and 2 - ethylhexyl group.
Alicyclic hydrocarbon groups may be monocyclic or polycyclic. Examples of monocyclic alicyclic hydrocarbon groups include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, methylcyclohexyl, dimethylcyclohexyl, cycloheptyl, cyclooctyl, cycloheptyl and cyclodecyl groups. A cycloalkyl group can be mentioned. Polycyclic alicyclic hydrocarbon groups include decahydronaphthyl group, adamantyl group, 2-alkyladamantan-2-yl group, 1-(adamantan-1-yl)alkane-1-yl group, norbornyl group, Methylnorbornyl and isobornyl groups are included.

Examples of the hydrocarbon group having a fluorine atom for R ^f2 include an alkyl group having a fluorine atom and an alicyclic hydrocarbon group having a fluorine atom.
Alkyl groups having a fluorine atom include difluoromethyl, trifluoromethyl, 1,1-difluoroethyl, 2,2-difluoroethyl, 2,2,2-trifluoroethyl, perfluoroethyl, 1 , 1,2,2-tetrafluoropropyl group, 1,1,2,2,3,3-hexafluoropropyl group, perfluoroethylmethyl group, 1-(trifluoromethyl)-1,2,2,2- tetrafluoroethyl group, 1-(trifluoromethyl)-2,2,2-trifluoroethyl group, perfluoropropyl group, 1,1,2,2-tetrafluorobutyl group, 1,1,2,2,3 ,3-hexafluorobutyl group, 1,1,2,2,3,3,4,4-octafluorobutyl group, perfluorobutyl group, 1,1-bis(trifluoro)methyl-2,2,2- trifluoroethyl group, 2-(perfluoropropyl)ethyl group, 1,1,2,2,3,3,4,4-octafluoropentyl group, perfluoropentyl group, 1,1,2,2,3,3 , 4,4,5,5-decafluoropentyl group, 1,1-bis(trifluoromethyl)-2,2,3,3,3-pentafluoropropyl group, 2-(perfluorobutyl)ethyl group, 1 , 1,2,2,3,3,4,4,5,5-decafluorohexyl group, 1,1,2,2,3,3,4,4,5,5,6,6-dodecafluoro Fluorinated alkyl groups such as a hexyl group, a perfluoropentylmethyl group and a perfluorohexyl group can be mentioned.
The alicyclic hydrocarbon group having a fluorine atom includes fluorinated cycloalkyl groups such as a perfluorocyclohexyl group and a perfluoroadamantyl group.

A ^f1 in formula (a4-2) is preferably an alkanediyl group having 2 to 4 carbon atoms, more preferably an ethylene group.
R ^f2 is preferably a fluorinated alkyl group having 1 to 6 carbon atoms.

［式（ａ４－３）中、
Ｒ^f11は、水素原子又はメチル基を表す。
Ａ^f11は、炭素数１～６のアルカンジイル基を表す。
Ａ^f13は、フッ素原子を有していてもよい炭素数１～１８の脂肪族炭化水素基を表す。
Ｘ^f12は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ａ^f14は、フッ素原子を有していてもよい炭素数１～１７の脂肪族炭化水素基を表す。
ただし、Ａ^f13及びＡ^f14の少なくとも１つは、フッ素原子を有する脂肪族炭化水素基を表す。］

[In formula (a4-3),
R ^f11 represents a hydrogen atom or a methyl group.
A ^f11 represents an alkanediyl group having 1 to 6 carbon atoms.
A ^f13 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms which may have a fluorine atom.
X ^f12 represents a carbonyloxy group or an oxycarbonyl group.
A ^f14 represents an aliphatic hydrocarbon group having 1 to 17 carbon atoms which may have a fluorine atom.
However, at least one of A ^f13 and A ^f14 represents an aliphatic hydrocarbon group having a fluorine atom. ]

The alkanediyl group for A ^f11 includes the same alkanediyl groups for A ^f1 .

Aliphatic hydrocarbon groups for A ^f13 include chain and cyclic aliphatic hydrocarbon groups, and divalent aliphatic hydrocarbon groups formed by combining these. The aliphatic hydrocarbon may have a carbon-carbon unsaturated bond, but is preferably a saturated aliphatic hydrocarbon group.
The aliphatic hydrocarbon group optionally having a fluorine atom for A ^f13 is preferably a saturated aliphatic hydrocarbon group optionally having a fluorine atom, more preferably a perfluoroalkanediyl group.
The divalent chain type aliphatic hydrocarbon group which may have a fluorine atom includes alkanediyl groups such as a methylene group, an ethylene group, a propanediyl group, a butanediyl group and a pentanediyl group; a difluoromethylene group and a perfluoroethylene group; and perfluoroalkanediyl groups such as perfluoropropanediyl, perfluorobutanediyl and perfluoropentanediyl groups.
The bivalent cyclic aliphatic hydrocarbon group which may have a fluorine atom may be a group containing both monocyclic and polycyclic groups. The monocyclic aliphatic hydrocarbon group includes a cyclohexanediyl group, a perfluorocyclohexanediyl group, and the like. The polycyclic divalent aliphatic hydrocarbon group includes an adamantanediyl group, a norbornanediyl group, a perfluoroadamantanediyl group, and the like.

The aliphatic hydrocarbon group for A ^f14 includes either a chain type or a cyclic type, and an aliphatic hydrocarbon group formed by combining them. The aliphatic hydrocarbon may have a carbon-carbon unsaturated bond, but is preferably a saturated aliphatic hydrocarbon group.
The aliphatic hydrocarbon group optionally having a fluorine atom for A ^f14 is preferably an aliphatic saturated hydrocarbon group optionally having a fluorine atom.
Chain type aliphatic hydrocarbon groups which may have a fluorine atom include trifluoromethyl group, difluoromethyl group, methyl group, perfluoroethyl group, 1,1,1-trifluoroethyl group, 1,1 , 2,2-tetrafluoroethyl group, ethyl group, perfluoropropyl group, 1,1,1,2,2-pentafluoropropyl group, propyl group, perfluorobutyl group, 1,1,2,2,3,3 , 4,4-octafluorobutyl group, butyl group, perfluoropentyl group, 1,1,1,2,2,3,3,4,4-nonafluoropentyl group, pentyl group, hexyl group, perfluorohexyl group, Examples include heptyl group, perfluoroheptyl group, octyl group and perfluorooctyl group.
The cyclic aliphatic hydrocarbon group which may have a fluorine atom may be either monocyclic or polycyclic. Groups containing monocyclic aliphatic hydrocarbon groups include cyclopropylmethyl, cyclopropyl, cyclobutylmethyl, cyclopentyl, cyclohexyl, and perfluorocyclohexyl groups. Groups containing polycyclic aliphatic hydrocarbon groups include adamantyl groups, adamantylmethyl groups, norbornyl groups, norbornylmethyl groups, perfluoroadamantyl groups, and perfluoroadamantylmethyl groups.

In formula (a4-3), A ^f11 is preferably an ethylene group.
The aliphatic hydrocarbon group of A ^f13 is preferably an aliphatic hydrocarbon group having 1 to 6 carbon atoms, more preferably an aliphatic hydrocarbon group having 2 to 3 carbon atoms.
The aliphatic hydrocarbon group of A ^f14 is preferably an aliphatic hydrocarbon group having 3 to 12 carbon atoms, more preferably an aliphatic hydrocarbon group having 3 to 10 carbon atoms. Among them, A ^f14 is preferably a group containing an alicyclic hydrocarbon group having 3 to 12 carbon atoms, more preferably a cyclopropylmethyl group, a cyclopentyl group, a cyclohexyl group, a norbornyl group and an adamantyl group.

Examples of the structural unit represented by formula (a4-2) include structural units shown below and structural units in which a methyl group corresponding to R ^f1 in the structural units below is replaced with a hydrogen atom.

Examples of the structural unit represented by formula (a4-3) include structural units shown below and structural units in which a methyl group corresponding to R ^f11 in the structural units below is replaced with a hydrogen atom.

［式（ａ４－４）中、
Ｒ^f21は、水素原子又はメチル基を表す。
Ａ^f21は、－（ＣＨ₂）_j1－、－（ＣＨ₂）_j2－Ｏ－（ＣＨ₂）_j3－又は－（ＣＨ₂）_j4－ＣＯ－Ｏ－（ＣＨ₂）_j5－を表す。
ｊ１～ｊ５は、それぞれ独立に、１～６のいずれかの整数を表す。
Ｒ^f22は、フッ素原子を有する炭素数１～１０の炭化水素基を表す。］ Structural units (a4) also include structural units represented by formula (a4-4).

[In the formula (a4-4),
R ^f21 represents a hydrogen atom or a methyl group.
A ^f21 represents -(CH ₂ ) _j1 -, -(CH ₂ ) _j2 -O-(CH ₂ ) _j3 - or -(CH ₂ ) _j4 -CO-O-(CH ₂ ) _j5 -.
j1 to j5 each independently represent an integer of 1 to 6;
R ^f22 represents a hydrocarbon group having 1 to 10 carbon atoms and having a fluorine atom. ]

The hydrocarbon group having a fluorine atom for R ^f22 includes the same hydrocarbon groups as those for R ^f2 in formula (a4-2). R ^f22 is preferably an alkyl group having 1 to 10 carbon atoms having a fluorine atom or an alicyclic hydrocarbon group having 1 to 10 carbon atoms having a fluorine atom, more preferably an alkyl group having 1 to 10 carbon atoms having a fluorine atom. An alkyl group having 1 to 6 carbon atoms and having a fluorine atom is more preferred.

In formula (a4-4), A ^f21 is preferably —(CH ₂ ) _j1 —, more preferably an ethylene group or a methylene group, even more preferably a methylene group.

Examples of structural units represented by formula (a4-4) include the following structural units and structural units in which a methyl group corresponding to R ^f21 is replaced with a hydrogen atom in structural units represented by the following formulas: be done.

When the resin (A) has the structural unit (a4), the content thereof is preferably 1 to 20 mol%, more preferably 2 to 15 mol%, based on the total structural units of the resin (A), and 3 ~10 mol% is more preferred.

［式（ａ５－１）中、
Ｒ⁵¹は、水素原子又はメチル基を表す。
Ｒ⁵²は、炭素数３～１８の脂環式炭化水素基を表し、該脂環式炭化水素基に含まれる水素原子は炭素数１～８の脂肪族炭化水素基又はヒドロキシ基で置換されていてもよい。但し、Ｌ⁵⁵との結合位置にある炭素原子に結合する水素原子は、炭素数１～８の脂肪族炭化水素基で置換されない。
Ｌ⁵⁵は、単結合又は炭素数１～１８の２価の飽和炭化水素基を表し、該飽和炭化水素基に含まれるメチレン基は、酸素原子又はカルボニル基に置き換わっていてもよい。］ <Structural unit (a5)>
Examples of non-leaving hydrocarbon groups possessed by the structural unit (a5) include linear, branched and cyclic hydrocarbon groups. Among them, the structural unit (a5) preferably contains an alicyclic hydrocarbon group.
Examples of the structural unit (a5) include structural units represented by formula (a5-1).

[In formula (a5-1),
^R51 represents a hydrogen atom or a methyl group.
R ⁵² represents an alicyclic hydrocarbon group having 3 to 18 carbon atoms, the hydrogen atoms contained in the alicyclic hydrocarbon group being substituted with an aliphatic hydrocarbon group having 1 to 8 carbon atoms or a hydroxy group; may However, the hydrogen atom bonded to the carbon atom at the bonding position with L ⁵⁵ is not substituted with an aliphatic hydrocarbon group having 1 to 8 carbon atoms.
L ⁵⁵ represents a single bond or a divalent saturated hydrocarbon group having 1 to 18 carbon atoms, and the methylene group contained in the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group. ]

The alicyclic hydrocarbon group for R ⁵² may be either monocyclic or polycyclic. Examples of monocyclic alicyclic hydrocarbon groups include cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl groups. Examples of polycyclic alicyclic hydrocarbon groups include adamantyl groups and norbornyl groups.
C1-C8 aliphatic hydrocarbon groups include, for example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, pentyl group, hexyl group, Examples include alkyl groups such as octyl and 2-ethylhexyl.
The substituted alicyclic hydrocarbon group includes a 3-hydroxyadamantyl group and a 3-methyladamantyl group.
R ⁵² is preferably an unsubstituted alicyclic hydrocarbon group having 3 to 18 carbon atoms, more preferably an adamantyl group, a norbornyl group or a cyclohexyl group.

The bivalent saturated hydrocarbon group for L ⁵⁵ includes a bivalent saturated aliphatic hydrocarbon group and a saturated bivalent alicyclic hydrocarbon group, preferably a saturated aliphatic hydrocarbon group. .
Examples of divalent aliphatic saturated hydrocarbon groups include alkanediyl groups such as methylene, ethylene, propanediyl, butanediyl and pentanediyl groups.
The bivalent alicyclic saturated hydrocarbon group may be either monocyclic or polycyclic. The monocyclic alicyclic saturated hydrocarbon group includes cycloalkanediyl groups such as cyclopentanediyl group and cyclohexanediyl group. Examples of the polycyclic divalent alicyclic saturated hydrocarbon group include an adamantanediyl group and a norbornanediyl group.

式（Ｌ１－１）中、
Ｘ^x1は、カルボニルオキシ基又はオキシカルボニル基を表す。
Ｌ^x1は、炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x2は、単結合又は炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x1及びＬ^x2の合計炭素数は、１６以下である。
式（Ｌ１－２）中、
Ｌ^x3は、炭素数１～１７の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x4は、単結合又は炭素数１～１６の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x3及びＬ^x4の合計炭素数は、１７以下である。
式（Ｌ１－３）中、
Ｌ^x5は、炭素数１～１５の２価の脂肪族飽和炭化水素基を表す。
Ｌ^x6及びＬ^x7は、それぞれ独立に、単結合又は炭素数１～１４の２価の脂肪族飽和炭化水素基を表す。
ただし、Ｌ^x5、Ｌ^x6及びＬ^x7の合計炭素数は、１５以下である。
式（Ｌ１－４）中、
Ｌ^x8及びＬ^x9は、単結合又は炭素数１～１２の２価の脂肪族飽和炭化水素基を表す。
Ｗ^x1は、炭素数３～１５の２価の脂環式飽和炭化水素基を表す。
ただし、Ｌ^x8、Ｌ^x9及びＷ^x1の合計炭素数は、１５以下である。 Examples of the saturated hydrocarbon group in which the methylene group is replaced with an oxygen atom or a carbonyl group include groups represented by formulas (L1-1) to (L1-4). In the following formula, * represents a bond with an oxygen atom.

In formula (L1-1),
X ^x1 represents a carbonyloxy group or an oxycarbonyl group.
L ^x1 represents a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
L ^x2 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
However, the total carbon number of L ^x1 and L ^x2 is 16 or less.
In formula (L1-2),
L ^x3 represents a divalent aliphatic saturated hydrocarbon group having 1 to 17 carbon atoms.
L ^x4 represents a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 16 carbon atoms.
However, the total carbon number of L ^x3 and L ^x4 is 17 or less.
In formula (L1-3),
L ^x5 represents a divalent aliphatic saturated hydrocarbon group having 1 to 15 carbon atoms.
L ^x6 and L ^x7 each independently represent a single bond or a divalent saturated aliphatic hydrocarbon group having 1 to 14 carbon atoms.
However, the total carbon number of L ^x5 , L ^x6 and L ^x7 is 15 or less.
In formula (L1-4),
L ^x8 and L ^x9 each represent a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms.
W ^x1 represents a divalent saturated alicyclic hydrocarbon group having 3 to 15 carbon atoms.
However, the total carbon number of L ^x8 , L ^x9 and W ^x1 is 15 or less.

L ^x1 is preferably a C 1-8 divalent aliphatic saturated hydrocarbon group, more preferably a methylene group or an ethylene group.
L ^x2 is preferably a single bond or a C 1-8 divalent aliphatic saturated hydrocarbon group, more preferably a single bond.
L ^x3 is preferably a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x4 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x5 is preferably a C 1-8 divalent aliphatic saturated hydrocarbon group, more preferably a methylene group or an ethylene group.
L ^x6 is preferably a single bond or a C 1-8 divalent aliphatic saturated hydrocarbon group, more preferably a methylene group or an ethylene group.
L ^x7 is preferably a single bond or a divalent aliphatic saturated hydrocarbon group having 1 to 8 carbon atoms.
L ^x8 is preferably a single bond or a divalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms, more preferably a single bond or a methylene group.
L ^x9 is preferably a single bond or a divalent saturated aliphatic hydrocarbon group having 1 to 8 carbon atoms, more preferably a single bond or a methylene group.
W ^x1 is preferably a divalent saturated alicyclic hydrocarbon group having 3 to 10 carbon atoms, more preferably a cyclohexanediyl group or an adamantanediyl group.

Examples of the group represented by formula (L1-1) include the divalent groups shown below.

Examples of the group represented by formula (L1-2) include the divalent groups shown below.

Examples of the group represented by formula (L1-3) include the divalent groups shown below.

Examples of the group represented by formula (L1-4) include the divalent groups shown below.

L ⁵⁵ is preferably a single bond or a group represented by formula (L1-1).

Examples of the structural unit (a5-1) include structural units shown below and structural units in which a methyl group corresponding to R ⁵¹ in the following structural units is replaced with a hydrogen atom.

When the resin (A) has the structural unit (a5), the content thereof is preferably 1 to 30 mol%, more preferably 2 to 20 mol%, based on the total structural units of the resin (A), and 3 ~15 mol% is more preferred.

Resin (A) is preferably a resin composed of structural unit (a1) and structural unit (s), that is, a copolymer of monomer (a1) and monomer (s).
Structural unit (s) is preferably at least one of structural unit (a2) and structural unit (a3). Structural unit (a2) is preferably a structural unit represented by formula (a2-1).
Structural unit (a3) is preferably selected from structural units represented by formula (a3-1), structural units represented by formula (a3-2) and structural units represented by formula (a3-4) at least one.

Each structural unit that constitutes the resin (A) may be used alone or in combination of two or more. Using a monomer that induces these structural units, it is produced by a known polymerization method (e.g., radical polymerization method). can do. The content of each structural unit in the resin (A) can be adjusted by adjusting the amount of monomer used for polymerization.
The weight average molecular weight of the resin (A) is preferably 2,000 or more (more preferably 2,500 or more, still more preferably 3,000 or more) and 50,000 or less (more preferably 30,000 or less, further preferably is 15,000 or less).

<Resins other than resin (A)>
The resist composition of the present invention may contain a resin other than resin (A). Examples of such a resin include a resin consisting only of the structural unit (s), a resin containing the structural unit (a4) (but not containing the structural unit (a1); hereinafter sometimes referred to as "resin (X)"), and the like. is mentioned. Among them, a resin containing the structural unit (a4) is preferred.
In the resin (X), the content of the structural unit (a4) is preferably 40 mol% or more, more preferably 45 mol% or more, and even more preferably 50 mol% or more, based on the total structural units of the resin (X). .
Structural units that the resin (X) may further include structural units (a2), structural units (a3), and structural units derived from other known monomers.
The weight average molecular weight of resin (X) is preferably 6,000 or more (more preferably 7,000 or more) and 80,000 or less (more preferably 60,000 or less). The means for measuring the weight-average molecular weight of resin (X) is the same as for resin (A).
When the resist composition contains resin (X), its content is preferably 1 to 60 parts by mass, more preferably 2 to 50 parts by mass, relative to 100 parts by mass of resin (A). It is preferably 2 to 40 parts by mass, particularly preferably 3 to 30 parts by mass.

The total content of the resin (A) and the resin other than the resin (A) is preferably 80% by mass or more and 99% by mass or less, preferably 90% by mass or more and 99% by mass or less, relative to the solid content of the resist composition. .
The solid content and resin content of the resist composition can be measured by known analytical means such as liquid chromatography or gas chromatography.

<Solvent (E)>
The content of the solvent (E) is usually 90% by mass or more, preferably 92% by mass or more, more preferably 94% by mass or more, and usually 99.9% by mass or less, preferably 99% by mass or less in the resist composition. is. The content of the solvent (E) can be measured by known analysis means such as liquid chromatography or gas chromatography.

Examples of the solvent (E) include glycol ether esters such as ethyl cellosolve acetate, methyl cellosolve acetate and propylene glycol monomethyl ether acetate; glycol ethers such as propylene glycol monomethyl ether; ethyl lactate, butyl acetate, amyl acetate and ethyl pyruvate; ketones such as acetone, methyl isobutyl ketone, 2-heptanone and cyclohexanone; cyclic esters such as γ-butyrolactone; The solvent (E) may contain one kind alone, or may contain two or more kinds.

<Quencher (C)>
The quencher (C) includes a salt or a basic nitrogen-containing organic compound that generates an acid weaker in acidity than the acid generated from the salt (aa) and the acid generator (B).

<Basic nitrogen-containing organic compound>
Basic nitrogen-containing organic compounds include amines and ammonium salts. Amines include aliphatic amines and aromatic amines. Aliphatic amines include primary, secondary and tertiary amines.
Specifically, 1-naphthylamine, 2-naphthylamine, aniline, diisopropylaniline, 2-, 3- or 4-methylaniline, 4-nitroaniline, N-methylaniline, N,N-dimethylaniline, diphenylamine, hexylamine , heptylamine, octylamine, nonylamine, decylamine, dibutylamine, dipentylamine, dihexylamine, diheptylamine, dioctylamine, dinonylamine, didecylamine, triethylamine, trimethylamine, tripropylamine, tributylamine, tripentylamine, trihexylamine, triheptylamine, trioctylamine, trinonylamine, tridecylamine, methyldibutylamine, methyldipentylamine, methyldihexylamine, methyldicyclohexylamine, methyldiheptylamine, methyldioctylamine, methyldinonylamine, methyldidecylamine , ethyldibutylamine, ethyldipentylamine, ethyldihexylamine, ethyldiheptylamine, ethyldioctylamine, ethyldinonylamine, ethyldidecylamine, dicyclohexylmethylamine, tris[2-(2-methoxyethoxy)ethyl]amine, triisopropanolamine, ethylenediamine, tetramethylenediamine, hexamethylenediamine, 4,4'-diamino-1,2-diphenylethane, 4,4'-diamino-3,3'-dimethyldiphenylmethane, 4,4'-diamino- 3,3′-diethyldiphenylmethane, piperazine, morpholine, piperidine, and hindered amine compounds having a piperidine skeleton described in JP-A-11-52575, imidazole, 4-methylimidazole, pyridine, 4-methylpyridine, 1,2 -di(2-pyridyl)ethane, 1,2-di(4-pyridyl)ethane, 1,2-di(2-pyridyl)ethene, 1,2-di(4-pyridyl)ethene, 1,3-di (4-pyridyl)propane, 1,2-di(4-pyridyloxy)ethane, di(2-pyridyl)ketone, 4,4'-dipyridyl sulfide, 4,4'-dipyridyl disulfide, 2,2'-dipyridyl Amine, 2,2'-dipicolylamine, bipyridine, etc., preferably diisopropylaniline, particularly preferably 2,6-diisopropylaniline.

Ammonium salts include tetramethylammonium hydroxide, tetraisopropylammonium hydroxide, tetrabutylammonium hydroxide, tetrahexylammonium hydroxide, tetraoctylammonium hydroxide, phenyltrimethylammonium hydroxide, 3-(trifluoromethyl)phenyltrimethyl ammonium hydroxide, tetra-n-butylammonium salicylate and choline;

<Salts that generate weakly acidic acids>
The acidity of the salt that generates an acid weaker than the acid generated from the salt (aa) and the acid generator (B) is indicated by the acid dissociation constant (pKa). The salt that generates an acid weaker in acidity than the acid generated from the salt (aa) and the acid generator (B) is a salt whose acid dissociation constant is usually −3<pKa, Salts with −1<pKa<7 are preferred, and salts with 0<pKa<5 are more preferred. Examples of the salt that generates an acid weaker in acidity than the acid generated from the salt (aa) and the acid generator (B) include the salt represented by the following formula, the weak acid inner salt represented by the formula (D), And JP-A-2012-229206, JP-A-2012-6908, JP-A-2012-72109, JP-A-2011-39502 and the salts described in JP-A-2011-191745. Preferred is the weak acid inner salt represented by formula (D) (hereinafter sometimes referred to as "weak acid inner salt (D)").

［式（Ｄ）中、
Ｒ^D1及びＲ^D2は、それぞれ独立に、炭素数１～１２の炭化水素基、炭素数１～６のアルコキシ基、炭素数２～７のアシル基、炭素数２～７のアシルオキシ基、炭素数２～７のアルコキシカルボニル基、ニトロ基又はハロゲン原子を表す。
ｍ’及びｎ’は、それぞれ独立に、０～４のいずれかの整数を表し、ｍ’が２以上の場合、複数のＲ^D1は同一又は相異なり、ｎ’が２以上の場合、複数のＲ^D2は同一又は相異なる。］

[in formula (D),
R ^D1 and R ^D2 are each independently a hydrocarbon group having 1 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an acyl group having 2 to 7 carbon atoms, an acyloxy group having 2 to 7 carbon atoms, and a carbon number represents 2 to 7 alkoxycarbonyl groups, nitro groups or halogen atoms;
m' and n' each independently represents an integer of 0 to 4, and when m' is 2 or more, multiple R ^D1 are the same or different, and when n' is 2 or more, multiple R ^D2 are the same or different. ]

In the weak acid inner salt (D), the hydrocarbon groups represented by R ^D1 and R ^D2 include aliphatic hydrocarbon groups, alicyclic hydrocarbon groups, aromatic hydrocarbon groups, and combinations thereof. and the like.
The aliphatic hydrocarbon group includes alkyl groups such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, t-butyl group, pentyl group, hexyl group and nonyl group.
The alicyclic hydrocarbon group may be monocyclic or polycyclic, and may be saturated or unsaturated. Examples thereof include cycloalkyl groups such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cyclononyl group and cyclododecyl group, norbornyl group and adamantyl group.
Aromatic hydrocarbon groups include phenyl group, 1-naphthyl group, 2-naphthyl group, 2-methylphenyl group, 3-methylphenyl group, 4-methylphenyl group, 4-ethylphenyl group and 4-propylphenyl group. , 4-isopropylphenyl group, 4-butylphenyl group, 4-t-butylphenyl group, 4-hexylphenyl group, 4-cyclohexylphenyl group, anthryl group, p-adamantylphenyl group, tolyl group, xylyl group, cumenyl group , a mesityl group, a biphenyl group, a phenanthryl group, a 2,6-diethylphenyl group, and an aryl group such as 2-methyl-6-ethylphenyl.
Groups formed by combining these groups include alkyl-cycloalkyl groups, cycloalkyl-alkyl groups, aralkyl groups (e.g., phenylmethyl group, 1-phenylethyl group, 2-phenylethyl group, 1-phenyl-1 -propyl group, 1-phenyl-2-propyl group, 2-phenyl-2-propyl group, 3-phenyl-1-propyl group, 4-phenyl-1-butyl group, 5-phenyl-1-pentyl group, 6 -phenyl-1-hexyl group, etc.).

The alkoxy group includes a methoxy group, an ethoxy group, and the like.
The acyl group includes acetyl group, propanoyl group, benzoyl group, cyclohexanecarbonyl group and the like.
Examples of the acyloxy group include groups in which an oxy group (--O--) is bonded to the above acyl group.
Examples of the alkoxycarbonyl group include groups in which a carbonyl group (--CO--) is bonded to the above alkoxy group.
A fluorine atom, a chlorine atom, a bromine atom etc. are mentioned as a halogen atom.

In formula (D), R ^D1 and R ^D2 are each independently an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or 2 to 2 carbon atoms. 4 acyl groups, acyloxy groups having 2 to 4 carbon atoms, alkoxycarbonyl groups having 2 to 4 carbon atoms, nitro groups or halogen atoms are preferred.
Each of m' and n' is preferably an integer of 0 to 2, more preferably 0. When m' is 2 or more, multiple R ^D1 are the same or different, and when n' is 2 or more, multiple R ^D2 are the same or different.

Examples of the weak acid inner salt (D) include the following compounds.

The content of the quencher (C) in the solid content of the resist composition is preferably 0.01 to 5% by mass, more preferably 0.01 to 4% by mass, and particularly preferably 0.01 to 3%. % by mass.

<Other ingredients>
If necessary, the resist composition may contain components other than the components described above (hereinafter sometimes referred to as "other components (F)"). As other components (F), additives known in the field of resists, such as sensitizers, dissolution inhibitors, surfactants, stabilizers and dyes, can be used.

<Preparation of resist composition>
The resist composition comprises a resin (A), an acid generator containing a salt (aa), and, if necessary, a resin other than the resin (A), an acid generator (B), a solvent (E), a quencher It can be prepared by mixing (C) and other components (F). The mixing order is arbitrary and not particularly limited. The temperature during mixing can be appropriately selected from 10 to 40° C. depending on the type of resin or the like and the solubility of the resin or the like in the solvent (E). An appropriate mixing time can be selected from 0.5 to 24 hours depending on the mixing temperature. The mixing means is also not particularly limited, and stirring and mixing can be used.
After mixing each component, it is preferable to filter using a filter having a pore size of about 0.003 to 0.2 μm.

[Method for producing resist pattern]
The method for producing a resist pattern of the present invention comprises:
(1) a step of applying the resist composition of the present invention onto a substrate;
(2) a step of drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer; and (5) developing the heated composition layer.

The coating of the resist composition on the substrate can be carried out using a commonly used device such as a spin coater. Examples of substrates include inorganic substrates such as silicon wafers. Before applying the resist composition, the substrate may be washed, or an antireflection film or the like may be formed on the substrate.

By drying the applied composition, the solvent is removed and a composition layer is formed. Drying is carried out, for example, by evaporating the solvent using a heating device such as a hot plate (so-called pre-baking), or by using a decompression device. The heating temperature is preferably 50 to 200° C., and the heating time is preferably 10 to 180 seconds. The pressure for drying under reduced pressure is preferably about 1 to 1.0×10 ⁵ Pa.

The resulting composition layer is usually exposed using an exposure machine. The exposure machine may be an immersion exposure machine. As the exposure light source, a KrF excimer laser (wavelength: 248 nm), an ArF excimer laser (wavelength: 193 nm), an _F2 excimer laser (wavelength: 157 nm) that emits a laser beam in the ultraviolet region, a solid-state laser source (YAG or semiconductor laser etc.) and emits harmonic laser light in the far ultraviolet region or vacuum ultraviolet region by wavelength conversion, electron beam, and extreme ultraviolet light (EUV). can be done. In the present specification, these irradiations with radiation may be collectively referred to as "exposure". During exposure, exposure is usually performed through a mask corresponding to the desired pattern. When the exposure light source is an electron beam, exposure may be performed by direct drawing without using a mask.

The exposed composition layer is subjected to a heat treatment (so-called post-exposure bake) in order to promote the deprotection reaction at the acid-labile groups. The heating temperature is usually about 50 to 200°C, preferably about 70 to 150°C.

The composition layer after heating is usually developed using a developer using a developing device. The developing method includes a dipping method, a paddle method, a spraying method, a dynamic dispensing method, and the like. The developing temperature is preferably 5 to 60° C., and the developing time is preferably 5 to 300 seconds. A positive resist pattern or a negative resist pattern can be produced by selecting the type of developer as follows.

When producing a positive resist pattern from the resist composition, an alkaline developer is used as the developer. The alkaline developer may be any of various alkaline aqueous solutions used in this field. Examples include aqueous solutions of tetramethylammonium hydroxide and (2-hydroxyethyl)trimethylammonium hydroxide (commonly known as choline). The alkaline developer may contain a surfactant.
After development, the resist pattern is preferably washed with ultrapure water, and then water remaining on the substrate and pattern is removed.

When a negative resist pattern is produced from the resist composition, a developer containing an organic solvent (hereinafter sometimes referred to as "organic developer") is used as the developer.
Examples of organic solvents contained in the organic developer include ketone solvents such as 2-hexanone and 2-heptanone; glycol ether ester solvents such as propylene glycol monomethyl ether acetate; ester solvents such as butyl acetate; glycols such as propylene glycol monomethyl ether. ether solvents; amide solvents such as N,N-dimethylacetamide; aromatic hydrocarbon solvents such as anisole;
The content of the organic solvent in the organic developer is preferably 90% by mass or more and 100% by mass or less, more preferably 95% by mass or more and 100% by mass or less, and still more preferably substantially only the organic solvent.
As the organic developer, a developer containing butyl acetate and/or 2-heptanone is preferred. The total content of butyl acetate and 2-heptanone in the organic developer is preferably 50% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and substantially contains butyl acetate and/or 2-heptanone. - more preferably only heptanone.
The organic developer may contain a surfactant. In addition, the organic developer may contain a trace amount of water.
During development, the development may be stopped by replacing the organic developer with a solvent of a different type.

It is preferable to wash the resist pattern after development with a rinsing liquid. The rinse liquid is not particularly limited as long as it does not dissolve the resist pattern, and a solution containing a general organic solvent can be used, preferably an alcohol solvent or an ester solvent.
After cleaning, it is preferable to remove the rinse liquid remaining on the substrate and pattern.

<Application>
The resist composition of the present invention is a resist composition for KrF excimer laser exposure, a resist composition for ArF excimer laser exposure, a resist composition for electron beam (EB) exposure or a resist composition for EUV exposure, particularly ArF It is suitable as a resist composition for excimer laser exposure and useful for fine processing of semiconductors.

EXAMPLES The present invention will be described more specifically with reference to examples. In the examples, "%" and "parts" representing the content or amount used are based on mass unless otherwise specified.
A weight average molecular weight is the value calculated|required by the gel permeation chromatography. The analysis conditions for gel permeation chromatography are as follows.
Column: TSKgel Multipore HXL-M x 3+guardcolumn (manufactured by Tosoh Corporation)
Eluent: Tetrahydrofuran Flow rate: 1.0 mL/min
Detector: RI detector Column temperature: 40℃
Injection volume: 100 μl
Molecular weight standard: Standard polystyrene (manufactured by Tosoh Corporation)

The structure of the compound was confirmed by measuring the molecular peak using mass spectrometry (LC: Agilent Model 1100, MASS: Agilent Model LC/MSD). In the examples below, the value of this molecular peak is indicated by "MASS".

式（Ｉ－１－ａ）で表される塩を、特開２０１２－１９３１６０号公報に記載された方法で合成した。
式（Ｉ－１－ａ）で表される塩５．６４部、式（Ｉ－１－ｂ）で表される化合物３．３９部、クロロホルム３５部及び硫酸０．１部を仕込み、２３℃で３０分間攪拌した後、６０℃で、モレキュラーシーブ存在下、１時間還流攪拌した。得られた反応物を２３℃まで冷却し、クロロホルム１８５部を添加撹拌後、１０％炭酸カリウム水溶液４５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液した。回収された有機層に、イオン交換水７０部を仕込み２３℃で３０分間攪拌し、分液することにより有機層を回収した。この水洗の操作を５回行った。得られた有機層を濃縮した後、濃縮残に酢酸エチル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣をアセトニトリルに溶解し、濃縮することにより、式（Ｉ－１）で表される塩４．１７部を得た。
ＭＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ２６３．１
ＭＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３９７．１ Example 1: Synthesis of salt represented by formula (I-1)

A salt represented by formula (I-1-a) was synthesized by the method described in JP-A-2012-193160.
5.64 parts of the salt represented by the formula (I-1-a), 3.39 parts of the compound represented by the formula (I-1-b), 35 parts of chloroform and 0.1 part of sulfuric acid were charged and heated to 23°C. After stirring for 30 minutes at 60° C., the mixture was stirred under reflux in the presence of molecular sieves for 1 hour. The obtained reactant was cooled to 23°C, 185 parts of chloroform was added and stirred, then 45 parts of 10% potassium carbonate aqueous solution was added, and the mixture was stirred at 23°C for 30 minutes. After that, it was allowed to stand and liquid-separated. 70 parts of ion-exchanged water was added to the recovered organic layer, and the mixture was stirred at 23° C. for 30 minutes, and separated to recover the organic layer. This washing operation was performed 5 times. After concentrating the obtained organic layer, 50 parts of ethyl acetate was added to the concentrated residue and the mixture was stirred, and then the supernatant was removed. The resulting residue was dissolved in acetonitrile and concentrated to obtain 4.17 parts of the salt represented by formula (I-1).
MS (ESI(+) Spectrum): M ⁺ 263.1
MS (ESI (-) Spectrum): M ^- 397.1

式（Ｉ－１１－ａ）で表される塩を、特開２０１２－１９３１６０号公報に記載された方法で合成した。
式（Ｉ－１１－ａ）で表される塩７．４６部、式（Ｉ－１－ｂ）で表される化合物３．３９部、クロロホルム３５部及び硫酸０．１部を仕込み、２３℃で３０分間攪拌した後、６０℃で、モレキュラーシーブ存在下、１時間還流攪拌した。得られた反応物を２３℃まで冷却し、クロロホルム１８５部を添加撹拌後、１０％炭酸カリウム水溶液４５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液した。回収された有機層に、イオン交換水７０部を仕込み２３℃で３０分間攪拌し、分液することにより有機層を回収した。この水洗の操作を５回行った。得られた有機層を濃縮した後、濃縮残にｔｅｒｔ－ブチルメチルエーテル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣をアセトニトリルに溶解し、濃縮することにより、式（Ｉ－１１）で表される塩４．１７部を得た。
ＭＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ２６３．１
ＭＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ５７５．２ Example 2: Synthesis of salt represented by formula (I-11)

A salt represented by formula (I-11-a) was synthesized by the method described in JP-A-2012-193160.
7.46 parts of the salt represented by the formula (I-11-a), 3.39 parts of the compound represented by the formula (I-1-b), 35 parts of chloroform and 0.1 part of sulfuric acid were charged and heated to 23°C. After stirring for 30 minutes at 60° C., the mixture was stirred under reflux in the presence of molecular sieves for 1 hour. The obtained reactant was cooled to 23°C, 185 parts of chloroform was added and stirred, then 45 parts of 10% potassium carbonate aqueous solution was added, and the mixture was stirred at 23°C for 30 minutes. After that, it was allowed to stand and liquid-separated. 70 parts of ion-exchanged water was added to the recovered organic layer, and the mixture was stirred at 23° C. for 30 minutes, and separated to recover the organic layer. This washing operation was performed 5 times. After concentrating the obtained organic layer, 50 parts of tert-butyl methyl ether was added to the concentrated residue and stirred, and then the supernatant was removed. The obtained residue was dissolved in acetonitrile and concentrated to obtain 4.17 parts of the salt represented by the formula (I-11).
MS (ESI(+) Spectrum): M ⁺ 263.1
MS (ESI (-) Spectrum): M ^- 575.2

式（Ｉ－８１－ａ）で表される塩５．３７部、式（Ｉ－１－ｂ）で表される化合物３．３９部、クロロホルム３５部及び硫酸０．１部を仕込み、２３℃で３０分間攪拌した後、６０℃で、モレキュラーシーブ存在下、１時間還流攪拌した。得られた反応物を２３℃まで冷却し、クロロホルム１８５部を添加撹拌後、１０％炭酸カリウム水溶液４５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液した。回収された有機層に、イオン交換水７０部を仕込み２３℃で３０分間攪拌し、分液することにより有機層を回収した。この水洗の操作を５回行った。得られた有機層を濃縮した後、濃縮残に酢酸エチル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣を濃縮した後、濃縮残にｔｅｒｔ－ブチルメチルエーテル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣をアセトニトリルに溶解し、濃縮することにより、式（Ｉ－８１）で表される塩３．９８部を得た。
ＭＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ２３７．１
ＭＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ３９７．１ Example 3: Synthesis of salt represented by formula (I-81)

5.37 parts of the salt represented by the formula (I-81-a), 3.39 parts of the compound represented by the formula (I-1-b), 35 parts of chloroform and 0.1 part of sulfuric acid were charged and heated to 23°C. After stirring for 30 minutes at 60° C., the mixture was stirred under reflux in the presence of molecular sieves for 1 hour. The obtained reactant was cooled to 23°C, 185 parts of chloroform was added and stirred, then 45 parts of 10% potassium carbonate aqueous solution was added, and the mixture was stirred at 23°C for 30 minutes. After that, it was allowed to stand and liquid-separated. 70 parts of ion-exchanged water was added to the recovered organic layer, and the mixture was stirred at 23° C. for 30 minutes, and separated to recover the organic layer. This washing operation was performed 5 times. After concentrating the obtained organic layer, 50 parts of ethyl acetate was added to the concentrated residue and the mixture was stirred, and then the supernatant was removed. After concentrating the obtained residue, 50 parts of tert-butyl methyl ether was added to the concentrated residue and stirred, and then the supernatant was removed. The obtained residue was dissolved in acetonitrile and concentrated to obtain 3.98 parts of the salt represented by the formula (I-81).
MS (ESI(+) Spectrum): M ⁺ 237.1
MS (ESI (-) Spectrum): M ^- 397.1

式（Ｉ－９１－ａ）で表される塩７．１９部、式（Ｉ－１－ｂ）で表される化合物３．３９部、クロロホルム３５部及び硫酸０．１部を仕込み、２３℃で３０分間攪拌した後、６０℃で、モレキュラーシーブ存在下、１時間還流攪拌した。得られた反応物を２３℃まで冷却し、クロロホルム１８５部を添加撹拌後、１０％炭酸カリウム水溶液４５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液した。回収された有機層に、イオン交換水７０部を仕込み２３℃で３０分間攪拌し、分液することにより有機層を回収した。この水洗の操作を５回行った。得られた有機層を濃縮した後、濃縮残にｔｅｒｔ－ブチルメチルエーテル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣をアセトニトリルに溶解し、濃縮することにより、式（Ｉ－９１）で表される塩３．３８部を得た。
ＭＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ２３７．１
ＭＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ５７５．２ Example 4: Synthesis of salt represented by formula (I-91)

7.19 parts of the salt represented by the formula (I-91-a), 3.39 parts of the compound represented by the formula (I-1-b), 35 parts of chloroform and 0.1 part of sulfuric acid were charged at 23°C. After stirring for 30 minutes at 60° C., the mixture was stirred under reflux in the presence of molecular sieves for 1 hour. The obtained reactant was cooled to 23°C, 185 parts of chloroform was added and stirred, then 45 parts of 10% potassium carbonate aqueous solution was added, and the mixture was stirred at 23°C for 30 minutes. After that, it was allowed to stand and liquid-separated. 70 parts of ion-exchanged water was added to the recovered organic layer, and the mixture was stirred at 23° C. for 30 minutes, and separated to recover the organic layer. This washing operation was performed 5 times. After concentrating the obtained organic layer, 50 parts of tert-butyl methyl ether was added to the concentrated residue and stirred, and then the supernatant was removed. The obtained residue was dissolved in acetonitrile and concentrated to obtain 3.38 parts of the salt represented by the formula (I-91).
MS (ESI(+) Spectrum): M ⁺ 237.1
MS (ESI (-) Spectrum): M ^- 575.2

式（Ｉ－１０－ａ）で表される塩６．２９部、式（Ｉ－１－ｂ）で表される化合物３．３９部、クロロホルム３５部及び硫酸０．１部を仕込み、２３℃で３０分間攪拌した後、６０℃で、モレキュラーシーブ存在下、１時間還流攪拌した。得られた反応物を２３℃まで冷却し、クロロホルム１８５部を添加撹拌後、１０％炭酸カリウム水溶液４５部を加え、２３℃で３０分間攪拌した。その後、静置し、分液した。回収された有機層に、イオン交換水７０部を仕込み２３℃で３０分間攪拌し、分液することにより有機層を回収した。この水洗の操作を５回行った。得られた有機層を濃縮した後、濃縮残に酢酸エチル５０部を加えて攪拌した後、上澄液を除去した。得られた残渣をアセトニトリルに溶解し、濃縮することにより、式（Ｉ－３０）で表される塩４．１７部を得た。
ＭＳ（ＥＳＩ（＋）Ｓｐｅｃｔｒｕｍ）：Ｍ^＋ ３０５．１
ＭＳ（ＥＳＩ（－）Ｓｐｅｃｔｒｕｍ）：Ｍ^－ ４１９．１ Example 5: Synthesis of salt represented by formula (I-30)

6.29 parts of the salt represented by the formula (I-10-a), 3.39 parts of the compound represented by the formula (I-1-b), 35 parts of chloroform and 0.1 part of sulfuric acid were charged at 23°C. After stirring for 30 minutes at 60° C., the mixture was stirred under reflux in the presence of molecular sieves for 1 hour. The obtained reactant was cooled to 23°C, 185 parts of chloroform was added and stirred, then 45 parts of 10% potassium carbonate aqueous solution was added, and the mixture was stirred at 23°C for 30 minutes. After that, it was allowed to stand and liquid-separated. 70 parts of ion-exchanged water was added to the recovered organic layer, and the mixture was stirred at 23° C. for 30 minutes, and separated to recover the organic layer. This washing operation was performed 5 times. After concentrating the obtained organic layer, 50 parts of ethyl acetate was added to the concentrated residue and the mixture was stirred, and then the supernatant was removed. The obtained residue was dissolved in acetonitrile and concentrated to obtain 4.17 parts of the salt represented by the formula (I-30).
MS (ESI(+) Spectrum): M ⁺ 305.1
MS (ESI (-) Spectrum): M ^- 419.1

Synthesis of Resin Compounds (monomers) used for synthesizing resin (A) are shown below. Hereinafter, these compounds are referred to as "monomer (a1-1-3)" and the like according to their formula numbers.

Synthesis Example 1: Synthesis of Resin A1 As monomers, monomer (a1-1-3), monomer (a1-2-9), monomer (a2-1-3) and monomer (a3-4-2) are used, The molar ratio [monomer (a1-1-3):monomer (a1-2-9):monomer (a2-1-3):monomer (a3-4-2)] was 45:14:2.5:38. 5, and propylene glycol monomethyl ether acetate in an amount 1.5 times the total amount of monomers was added to obtain a solution. To this solution, 1 mol % and 3 mol % of azobisisobutyronitrile and azobis(2,4-dimethylvaleronitrile) were added as initiators to the total amount of monomers, respectively, and these were heated at 73° C. for about 5 hours. bottom. The resulting reaction mixture was poured into a large amount of methanol/water mixed solvent to precipitate the resin, which was filtered. The resulting resin is again dissolved in propylene glycol monomethyl ether acetate, the resulting solution is poured into a methanol/water mixed solvent to precipitate the resin, and the resin is filtered. Resin A1 with a molecular weight of 7.6×10 ³ was obtained with a yield of 68%. This resin A1 has the following structural units.

Synthesis Example 2 Synthesis of Resin X1 Monomer (a4-1-7) was used as a monomer, and methyl isobutyl ketone was added in an amount 1.5 times the total amount of monomers to form a solution. To this solution, 0.7 mol % and 2.1 mol % of azobisisobutyronitrile and azobis(2,4-dimethylvaleronitrile) were added as initiators to the total amount of monomers, respectively, and these were stirred at 75°C. Heated for about 5 hours. The resulting reaction mixture was poured into a large amount of methanol/water mixed solvent to precipitate the resin, which was filtered to obtain Resin X1 having a weight average molecular weight of 1.7×10 ⁴ with a yield of 77%. This resin X1 has the following structural units.

Synthesis Example 3: Synthesis of Resin X2 Monomer (a5-1-1) and monomer (a4-0-12) were used as monomers, and the molar ratio [monomer (a5-1-1):monomer (a4-0- 12)] were mixed at a ratio of 50:50, and methyl isobutyl ketone was added in an amount of 1.2 times the mass of the total amount of monomers to obtain a solution. To this solution, 3 mol % of azobis(2,4-dimethylvaleronitrile) was added as an initiator with respect to the total amount of monomers, and the mixture was heated at 70° C. for about 5 hours. The resulting reaction mixture was poured into a large amount of methanol/water mixed solvent to precipitate the resin, which was filtered to obtain Resin X having a weight average molecular weight of 1.0×10 ⁴ with a yield of 91%. This resin X2 has the following structural units.

<Preparation of resist composition>
As shown in Table 8, a resist composition was prepared by mixing the following components and filtering the resulting mixture through a fluororesin filter having a pore size of 0.2 μm.

<Resin>
A1, X1, X2: Resin A1, Resin X1, Resin X2
<Salt (aa)>
I-1: salt represented by formula (I-1) I-11: salt represented by formula (I-11) I-81: salt represented by formula (I-81) I-91: formula Salt represented by (I-91) I-30: Salt represented by formula (I-30) <acid generator>
B1-21: a salt represented by the formula (B1-21) (synthesized according to the examples of JP-A-2012-224611)
B1-22: a salt represented by the formula (B1-22) (synthesized according to the examples of JP-A-2012-224611)
IX-1: synthesized according to the examples of JP-A-2011-37837 IX-2: synthesized according to the examples of JP-A-2012-193160 IX-3: in the same manner as in the examples of JP-A-2012-193160 synthesis

<Compound (D)>
D1: (manufactured by Tokyo Chemical Industry Co., Ltd.)

<Solvent>
Propylene glycol monomethyl ether acetate 265 parts Propylene glycol monomethyl ether 20 parts 2-heptanone 20 parts γ-butyrolactone 3.5 parts

<Production of resist pattern and its evaluation>
An organic antireflection film composition (ARC-29; manufactured by Nissan Chemical Industries, Ltd.) was applied to a silicon wafer and baked at 205° C. for 60 seconds to form an organic reflective film having a film thickness of 78 nm on the wafer. A protective film was formed. Then, the above resist composition was applied (spin-coated) onto the organic antireflection film so that the film thickness after drying was 85 nm. After coating, the silicon wafer was pre-baked on a direct hot plate at the temperature indicated in the "PB" column of Table 8 for 60 seconds to form a composition layer. A contact hole pattern (hole pitch 90 nm) was formed on a silicon wafer having a composition layer formed thereon, using an ArF excimer stepper for immersion exposure (XT: 1900Gi; manufactured by ASML, NA = 1.35, 3/4 Annular XY polarization). A mask for forming a hole diameter of 55 nm) was used to perform exposure while changing the exposure dose stepwise. Ultrapure water was used as the liquid immersion medium.
After exposure, post-exposure baking was performed on a hot plate at the temperature listed in the "PEB" column of Table 8 for 60 seconds. Next, the composition layer on the silicon wafer is developed using butyl acetate (manufactured by Tokyo Kasei Kogyo Co., Ltd.) as a developer by a dynamic dispensing method at 23° C. for 20 seconds to form a negative resist pattern. manufactured.

In the resist pattern obtained after development, the effective sensitivity was defined as the amount of exposure at which the hole diameter formed using the mask was 50 nm.

<CD uniformity (CDU) evaluation>
In the effective sensitivity, the hole diameter of a pattern formed with a mask having a hole diameter of 55 nm was measured 24 times for each hole, and the average value was taken as the average hole diameter of one hole. A standard deviation is obtained using a population of 400 measured average hole diameters of a pattern formed by a mask with a hole diameter of 55 nm in the same wafer,
"○" when the standard deviation is 1.80 nm or less,
A case where the standard deviation was larger than 1.80 nm was judged as "x".
Table 9 shows the results. Numerical values in parentheses indicate standard deviations (nm).

INDUSTRIAL APPLICABILITY The salt of the present invention and the resist composition containing the salt are suitable for microfabrication of semiconductors and extremely useful industrially because the CD uniformity of the resulting resist pattern is excellent.

Claims (7)

A salt comprising an anion represented by formula (aa1) and a cation represented by any one of formulas (b2-1) to (b2-4) .

[In the formula (aa1),
X ¹ represents a trivalent group represented by formula (X ¹ -1).
X ^a and X ^b each independently represent an oxygen atom or a sulfur atom.
Ring W represents a ring having at least one substituent selected from group A and represented by any one of formulas (w1-1) to (w1-3) and formula (w1-6).

(* represents a bond with X ^a or X ^b .)
Group A: hydroxy group, cyano group, carboxyl group, aromatic hydrocarbon group having 6 to 10 carbon atoms , hydroxyalkyl group having 1 to 6 carbon atoms and aralkyl group having 7 to 12 carbon atoms .
L ^b1 is a group represented by any of the following or a group represented by any of formulas (X1-A) to (X1-C), formula (X1-E) and formula (X1-F) show.

(* represents a bond with the carbon atom or oxygen atom of —C(Q ¹ )(Q ² )—.)
Q ¹ and Q ² independently represent a fluorine atom or a C 1-6 perfluoroalkyl group. ]

[In the formula, * represents a bond with an oxygen atom, X ^a or X ^b , and * on the left is a bond with an oxygen atom. ]

[In the formulas (X1-A) to (X1-C), the formulas (X1-E) and the formulas (X1-F),
X ¹¹ represents -CH ₂ -, -(CH ₂ ) ₂ - or -(CH ₂ ) ₄ - .
X ¹² represents -CH ₂ -, -(CH ₂ ) ₂ -, -(CH ₂ ) ₄ -, -CH ₂ -adamantanediyl group- or -adamantanediyl group- .
X ¹⁵ and X ¹⁷ each independently represent -CH ₂ -, -(CH ₂ ) ₂ -, -(CH ₂ ) ₄ -, -CH ₂ -adamantanediyl group- or -adamantanediyl group- .
X ¹⁶ and X ¹⁸ each independently represent a single bond, -CH ₂ - or -(CH ₂ ) ₂ -.
* represents a bond with the carbon atom or oxygen atom of -C(Q ¹ )(Q ² )-, and * on the left is a bond with the carbon atom of -C(Q ¹ )(Q ² )- is. ]

[In the formulas (b2-1) to (b2-4),
R ^b4 to R ^b6 each independently represent an aliphatic hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms or an aromatic hydrocarbon group having 6 to 36 carbon atoms; The hydrogen atom contained in the aliphatic hydrocarbon group is a hydroxy group, an alkoxy group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 18 carbon atoms. It may be substituted, and the hydrogen atom contained in the alicyclic hydrocarbon group is substituted with a halogen atom, an aliphatic hydrocarbon group having 1 to 18 carbon atoms, an acyl group having 2 to 4 carbon atoms, or a glycidyloxy group. A hydrogen atom contained in the aromatic hydrocarbon group may be substituted with a halogen atom, a hydroxy group, or an alkoxy group having 1 to 12 carbon atoms.
R ^b4 and R ^b5 may form a ring together with the sulfur atom to which they are bonded, and -CH ₂ - contained in the ring may be replaced with -O-, -SO- or -CO- .
R ^b7 and R ^b8 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
m2 and n2 each independently represent an integer of 0 to 5;
When m2 is 2 or more, the plurality of R ^b7 may be the same or different, and when n2 is 2 or more, the plurality of R ^b8 may be the same or different.
R ^b9 and R ^b10 each independently represent an aliphatic hydrocarbon group having 1 to 36 carbon atoms or an alicyclic hydrocarbon group having 3 to 36 carbon atoms.
R ^b9 and R ^b10 may form a ring together with the sulfur atom to which they are bonded, and —CH ₂ — contained in the ring may be replaced with —O—, —SO— or —CO— .
R ^b11 represents a hydrogen atom, an aliphatic hydrocarbon group having 1 to 36 carbon atoms, an alicyclic hydrocarbon group having 3 to 36 carbon atoms or an aromatic hydrocarbon group having 6 to 18 carbon atoms.
R ^b12 represents an aliphatic hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms or an aromatic hydrocarbon group having 6 to 18 carbon atoms, and may be substituted with an aromatic hydrocarbon group having 6 to 18 carbon atoms, and the hydrogen atoms contained in the aromatic hydrocarbon group are alkoxy groups having 1 to 12 carbon atoms or 1 to 1 carbon atoms. It may be substituted with 12 alkylcarbonyloxy groups.
R ^b11 and R ^b12 may together form a ring containing —CH—CO— to which they are bonded, and —CH 2 — contained in the ring is —O— _, —SO— Alternatively, it may be replaced with -CO-.
R ^b13 to R ^b18 each independently represent a hydroxy group, an aliphatic hydrocarbon group having 1 to 12 carbon atoms or an alkoxy group having 1 to 12 carbon atoms.
L ^b31 represents -S- or -O-.
o2, p2, s2 and t2 each independently represents an integer of 0 to 5;
q2 and r2 each independently represent an integer of 0 to 4;
u2 represents 0 or 1;
When o2 is 2 or more, the plurality of R ^b13 may be the same or different, when p2 is 2 or more, the plurality of R ^b14 may be the same or different, and when q2 is 2 or more , the plurality of R ^b15 may be the same or different, when r2 is 2 or more, the plurality of R ^b16 may be the same or different, and when s2 is 2 or more, the plurality of R ^b17 may be They may be the same or different, and when t2 is 2 or more, a plurality of R ^b18 may be the same or different. ] The salt according to claim 1, wherein ring W is a ring represented by formula (w1-1), a ring represented by formula (w1-2) or a ring represented by formula (w1-6) .

[In formula (w1-1), formula (w1-2) and formula (w1-6) ,
The ring has at least one substituent selected from Group A. * represents a bond with X ^a or X ^b . ] 3. The salt according to claim 1 or 2 , wherein L ^b1 is *--CO-- or a group represented by the following.

(* represents a bond with the carbon atom of —C(Q ¹ )(Q ² )—.) An acid generator containing the salt according to any one of claims 1 to 3 . A resist composition comprising the acid generator according to claim 4 and a resin having an acid-labile group. 6. The resist composition according to claim 5 , further comprising a salt that generates an acid weaker in acidity than the acid generated from the acid generator. (1) a step of applying the resist composition according to claim 5 or 6 onto a substrate;
(2) a step of drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the composition layer after exposure; and (5) developing the composition layer after heating;
A method of manufacturing a resist pattern comprising: